G-series nerve agents are more lethal and noxious among all classes of nerve agents. In search of better surface for the monitoring and removal of G-series nerve agents (Tabun, Sarin, Soman and Cyclosarin), the sensitivity and selectivity of bowl-shaped silicon carbide (b-SiC) is explored. The sensor ability of Silicon Carbide properties is evaluated at ωB97XD/6–31 + G(d,p) method of density functional theory (DFT). Interaction energy revealed the thermodynamic stability of all complexes and the Soman@b-SiC is found the most stable complex with the highest interaction energy of -34.29 kcal/mole. The natural bond orbital (NBO) charge analysis showed the charge transfer during complexation. A noteworthy change in frontier molecular orbitals energy gap (EH-L) is observed for all complexes. Noncovalent interaction (NCI) analysis confirmed the presence of noncovalent interactions between the nerve agents and b-SiC. NBO charge transfer is validated through electronic density differences (EDD). The overall results of the study confirmed that bowl-shaped silicon carbide can act as a better sensor for G-series nerve agent and can be effective in using as next generation sensing material.
在各类神经毒剂中,G 系列神经毒剂更具杀伤力和毒性。为了寻找更好的表面来监测和清除 G 系列神经毒剂(塔崩、沙林、索曼和环沙林),我们探索了碗形碳化硅(b-SiC)的灵敏度和选择性。采用密度泛函理论(DFT)的 ωB97XD/6-31 + G(d,p) 方法评估了碳化硅特性的传感器能力。相互作用能揭示了所有复合物的热力学稳定性,发现 Soman@b-SiC 是最稳定的复合物,其相互作用能最高,为 -34.29 kcal/mole。自然键轨道(NBO)电荷分析表明了络合过程中的电荷转移。所有复合物的前沿分子轨道能隙(EH-L)都发生了显著变化。非共价相互作用(NCI)分析证实了神经毒剂与 b-SiC 之间存在非共价相互作用。通过电子密度差(EDD)验证了神经毒剂的电荷转移。研究的总体结果证实,碗形碳化硅可作为 G 系列神经毒剂的更好传感器,并可有效用作下一代传感材料。
{"title":"Exploring the Sensitivity of Bowl-shaped Silicon Carbide Nanocluster towards G-Series Nerve Agents: A Density Functional Theory Approach","authors":"Naveen Kosar, Arooj Fatima, Abdulrahman Allangawi, Khurshid Ayub, Muhammad Imran, Tariq Mahmood","doi":"10.1007/s12633-024-03097-3","DOIUrl":"10.1007/s12633-024-03097-3","url":null,"abstract":"<div><p>G-series nerve agents are more lethal and noxious among all classes of nerve agents. In search of better surface for the monitoring and removal of G-series nerve agents (Tabun, Sarin, Soman and Cyclosarin), the sensitivity and selectivity of bowl-shaped silicon carbide (<i>b</i>-SiC) is explored. The sensor ability of Silicon Carbide properties is evaluated at ωB97XD/6–31 + G(d,p) method of density functional theory (DFT). Interaction energy revealed the thermodynamic stability of all complexes and the Soman@<i>b</i>-SiC is found the most stable complex with the highest interaction energy of -34.29 kcal/mole. The natural bond orbital (NBO) charge analysis showed the charge transfer during complexation. A noteworthy change in frontier molecular orbitals energy gap (E<sub>H-L</sub>) is observed for all complexes. Noncovalent interaction (NCI) analysis confirmed the presence of noncovalent interactions between the nerve agents and <i>b</i>-SiC. NBO charge transfer is validated through electronic density differences (EDD). The overall results of the study confirmed that bowl-shaped silicon carbide can act as a better sensor for G-series nerve agent and can be effective in using as next generation sensing material.</p></div>","PeriodicalId":776,"journal":{"name":"Silicon","volume":"16 15","pages":"5757 - 5770"},"PeriodicalIF":2.8,"publicationDate":"2024-08-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142226183","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-19DOI: 10.1007/s12633-024-03110-9
Mehdi Rahmani, Mohamed-Ali Zaïbi
Silicon nanowires are part of nanostructures, characterized by a high surface to volume ratio or large aspect ratio (AR), between 10 and 104. The new physicochemical properties of SiNWs compared to those of planar silicon are inevitable parameters for involving these nanostructures in the fields of nanotechnology, environment, medicine, pharmacy and others. Nevertheless, the passivation of nanowires by metal nanoparticles or a suitable semiconductor enhances their photocatalytic activities. Likewise, the addition of appropriate organic compounds improves the sensor of these nanostructures. In this paper, we first summarize an overview bottom-up and top-down production of silicon nanowires, and then the advantages and drawbacks of each method are described. Some potential implications of SiNWs in optoelectronics, photocatalysts and biosensors have been detailed. In each application, the main elements of enhancement of the composite-based on silicon nanowires covered with metal nanoparticles or functionalized with an organic compound are discussed.
Graphical Abstract
Research Highlights
1- MACE technique for SiNWs elaboration
2- Catalytic and photocatalytic efficiency of silicon nanowires
3- The effect of metal nanoparticles covered nanowires of silicon on catalytic and photocatalytic efficiency
4- The effect of sunlight on photocatalytic efficiency
5- The functionalization of nanowires by specific organic compounds to the cure of certain human diseases
6- The physicochemical properties of SiNWs and the origin of their involvement to produce probes immobilizing DNA on the surface
7- The implication of SiNWs in Schottky diodes (SD) and organic Schottky diodes (OSD)
8- The effect of organic molecules in the SiNWs layer
{"title":"The Notability of Silicon Nanowires in Optoelectronic, Environment and Health","authors":"Mehdi Rahmani, Mohamed-Ali Zaïbi","doi":"10.1007/s12633-024-03110-9","DOIUrl":"10.1007/s12633-024-03110-9","url":null,"abstract":"<div><p>Silicon nanowires are part of nanostructures, characterized by a high surface to volume ratio or large aspect ratio (AR), between 10 and 10<sup>4</sup>. The new physicochemical properties of SiNWs compared to those of planar silicon are inevitable parameters for involving these nanostructures in the fields of nanotechnology, environment, medicine, pharmacy and others. Nevertheless, the passivation of nanowires by metal nanoparticles or a suitable semiconductor enhances their photocatalytic activities. Likewise, the addition of appropriate organic compounds improves the sensor of these nanostructures. In this paper, we first summarize an overview bottom-up and top-down production of silicon nanowires, and then the advantages and drawbacks of each method are described. Some potential implications of SiNWs in optoelectronics, photocatalysts and biosensors have been detailed. In each application, the main elements of enhancement of the composite-based on silicon nanowires covered with metal nanoparticles or functionalized with an organic compound are discussed.</p><h3>Graphical Abstract</h3><p>Research Highlights</p><p>1- MACE technique for SiNWs elaboration</p><p>2- Catalytic and photocatalytic efficiency of silicon nanowires</p><p>3- The effect of metal nanoparticles covered nanowires of silicon on catalytic and photocatalytic efficiency</p><p>4- The effect of sunlight on photocatalytic efficiency</p><p>5- The functionalization of nanowires by specific organic compounds to the cure of certain human diseases</p><p>6- The physicochemical properties of SiNWs and the origin of their involvement to produce probes immobilizing DNA on the surface</p><p>7- The implication of SiNWs in Schottky diodes (SD) and organic Schottky diodes (OSD)</p><p>8- The effect of organic molecules in the SiNWs layer</p><div><figure><div><div><picture><source><img></source></picture></div></div></figure></div></div>","PeriodicalId":776,"journal":{"name":"Silicon","volume":"16 15","pages":"5525 - 5547"},"PeriodicalIF":2.8,"publicationDate":"2024-08-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142204770","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-16DOI: 10.1007/s12633-024-03101-w
Mohamed J. Saadh, Mohammed Ahmed Mustafa, Qusay Husam Aziz, Anupam Yadav, Mandeep Kaur, Khalid Mujasam Batoo, Muhammad Farzik Ijaz, Salim B. Alsaadi, Eftikhaar Hasan Kadhum, Ahmed Read Al-Tameemi, Khaldoon T. Falih, Laith H. Alzubaidi, Irfan Ahmad
Here, the abilities of Fe-Si42, Fe-Al21N21, Cu-C60, Cu-B30P30, Fe-SiNT(9, 0), Fe-AlNNT(9, 0), Cu-CNT(6, 0) and Cu-BPNT(6, 0) as nano-catalysts of OER and ORR processes are investigated in alkaline environment. The calculated formation energy of Fe- and Cu-doped nanocages and Fe- and Cu-doped nanotubes (Fe-Si42, Fe-Al21N21, Fe and Cu doped nanotubes) are acceptable values and these structures are stable. The Fe-AlNNT(9, 0) and Cu-BPNT(6, 0) have higher capacity for adsorption of OER/ORR species than other studied catalysts. The *OH removal and *OOH formation on Fe-Si42, Fe-Al21N21, Fe and Cu doped nanotubes are potential-determining steps for OER/ORR processes in alkaline environment. The Fe-AlNNT(9, 0) and Cu-BPNT(6, 0) catalysts for OER/ORR processes have lower over-potential than other studied catalysts. The Fe-AlNNT(9, 0) and Cu-BPNT(6, 0) as effective catalysts are suggested to catalyze the OER/ORR processes in alkaline environment.
{"title":"Metal Doped Nanocages and Metal Doped Nanotubes as Effective Catalysts for ORR and OER","authors":"Mohamed J. Saadh, Mohammed Ahmed Mustafa, Qusay Husam Aziz, Anupam Yadav, Mandeep Kaur, Khalid Mujasam Batoo, Muhammad Farzik Ijaz, Salim B. Alsaadi, Eftikhaar Hasan Kadhum, Ahmed Read Al-Tameemi, Khaldoon T. Falih, Laith H. Alzubaidi, Irfan Ahmad","doi":"10.1007/s12633-024-03101-w","DOIUrl":"10.1007/s12633-024-03101-w","url":null,"abstract":"<div><p>Here, the abilities of Fe-Si<sub>42</sub>, Fe-Al<sub>21</sub>N<sub>21</sub>, Cu-C<sub>60</sub>, Cu-B<sub>30</sub>P<sub>30</sub>, Fe-SiNT(9, 0), Fe-AlNNT(9, 0), Cu-CNT(6, 0) and Cu-BPNT(6, 0) as nano-catalysts of OER and ORR processes are investigated in alkaline environment. The calculated formation energy of Fe- and Cu-doped nanocages and Fe- and Cu-doped nanotubes (Fe-Si<sub>42</sub>, Fe-Al<sub>21</sub>N<sub>21</sub>, Fe and Cu doped nanotubes) are acceptable values and these structures are stable. The Fe-AlNNT(9, 0) and Cu-BPNT(6, 0) have higher capacity for adsorption of OER/ORR species than other studied catalysts. The *OH removal and *OOH formation on Fe-Si<sub>42</sub>, Fe-Al<sub>21</sub>N<sub>21</sub>, Fe and Cu doped nanotubes are potential-determining steps for OER/ORR processes in alkaline environment. The Fe-AlNNT(9, 0) and Cu-BPNT(6, 0) catalysts for OER/ORR processes have lower over-potential than other studied catalysts. The Fe-AlNNT(9, 0) and Cu-BPNT(6, 0) as effective catalysts are suggested to catalyze the OER/ORR processes in alkaline environment.</p></div>","PeriodicalId":776,"journal":{"name":"Silicon","volume":"16 15","pages":"5739 - 5756"},"PeriodicalIF":2.8,"publicationDate":"2024-08-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142226155","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-15DOI: 10.1007/s12633-024-03111-8
Gaurav Gupta, Sanjeev Rai
This article investigates a vertically grown double gate silicon channel and germanium source dopingless TFET using the charge plasma concept for enhanced analog performance. The germanium layer used in the underlap region significantly improves device characteristics. For studying the DC performance, analog/RF performance and various non-idealities of the Vertical Si-Ge Heterojunction Dopingless (VHJDL) TFET device calibrated numerical simulator is employed. Moreover, the device performance is examined by varying the different structural parameters, and parasitic phenomena are investigated. The simulated results exhibited that VHJDL TFET device can achieve desirable analog and digital performance such as ION as high as (approx) 80µA/µm along with an ION/IOFF ratio of 6.784 × 1012 and a cut-off frequency (fT) being equal to 64.7 GHz.
{"title":"Vertical Double Gate Si-Ge Heterojunction Dopingless TFET Based on Charge Plasma Concept for Enhanced Analog Performance","authors":"Gaurav Gupta, Sanjeev Rai","doi":"10.1007/s12633-024-03111-8","DOIUrl":"10.1007/s12633-024-03111-8","url":null,"abstract":"<div><p>This article investigates a vertically grown double gate silicon channel and germanium source dopingless TFET using the charge plasma concept for enhanced analog performance. The germanium layer used in the underlap region significantly improves device characteristics. For studying the DC performance, analog/RF performance and various non-idealities of the Vertical Si-Ge Heterojunction Dopingless (VHJDL) TFET device calibrated numerical simulator is employed. Moreover, the device performance is examined by varying the different structural parameters, and parasitic phenomena are investigated. The simulated results exhibited that VHJDL TFET device can achieve desirable analog and digital performance such as I<sub>ON</sub> as high as <span>(approx)</span> 80µA/µm along with an I<sub>ON</sub>/I<sub>OFF</sub> ratio of 6.784 × 10<sup>12</sup> and a cut-off frequency (f<sub>T</sub>) being equal to 64.7 GHz.</p></div>","PeriodicalId":776,"journal":{"name":"Silicon","volume":"16 15","pages":"5725 - 5737"},"PeriodicalIF":2.8,"publicationDate":"2024-08-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142204813","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-14DOI: 10.1007/s12633-024-03112-7
Ao Wu, Weizhong Chen, Xiangwei Zeng, Zikai Wei, Yufan Xiao
A novel Superjunction LIGBT with integrated planar Self-Biased PMOS (abbrev.SBP) and planar Self-Biased NMOS (abbrev.SBN), named DM-SJ-LIGBT is proposed and investigated. The SBN is connected in parallel with the main Gate, thus it is adaptively turned on and turned off with the main Gate. The gate and drain of SBP are shorted together to emitter electrode, and the P-pillar work as the source of SBP. Consequently, the SBP could realize adaptively turned on and turned off ability without additional gate signal control .At the forward conduction state, the planar SBN and trench main Gate are turned on with double electron channel, thus it effectively reduce ({V}_{ON}) compared with the conventional SJ-LIGBT. However, the SBP is turn-off state with ({V}_{GS,P}>{V}_{TH,P}). At the turn off state, The SBP is automatically turned on to extract the holes when the ({V}_{GS,P}<{V}_{TH,P}), which reduces the turn-off loss ({E}_{OFF}) significantly. Consequently, the DM-SJ-LIGBT obtains a superior trade-off relationship between forward conduction voltage ({V}_{ON}) and ({E}_{OFF}) . At the same ({E}_{OFF}) of 0.61 mJ/(cm^2), the ({V}_{ON}) of the DM-SJ-LIGBT with ({T}_{SBN}) =100nm and the DM-SJ-LIGBT with ({T}_{SBN}) =50 nm is 11% and 22% lower than the conventional SJ-LIGBT, respectively. Moreover, When ({V}_{ON}) is 1.36 V, the ({E}_{OFF}) of the DM-SJ-LIGBT with ({T}_{SBN})=100nm and the DM-SJ-LIGBT with ({T}_{SBN})=50 nm are 0.354 and 0.147 mJ/(cm^2) respectively, which is 42% and 76% less than that of the conventional SJ-LIGBT.
{"title":"A Low Energy Loss Superjunction LIGBT with Integrated Double Self-Biased MOS","authors":"Ao Wu, Weizhong Chen, Xiangwei Zeng, Zikai Wei, Yufan Xiao","doi":"10.1007/s12633-024-03112-7","DOIUrl":"10.1007/s12633-024-03112-7","url":null,"abstract":"<div><p>A novel Superjunction LIGBT with integrated planar Self-Biased PMOS (abbrev.SBP) and planar Self-Biased NMOS (abbrev.SBN), named DM-SJ-LIGBT is proposed and investigated. The SBN is connected in parallel with the main Gate, thus it is adaptively turned on and turned off with the main Gate. The gate and drain of SBP are shorted together to emitter electrode, and the P-pillar work as the source of SBP. Consequently, the SBP could realize adaptively turned on and turned off ability without additional gate signal control .At the forward conduction state, the planar SBN and trench main Gate are turned on with double electron channel, thus it effectively reduce <span>({V}_{ON})</span> compared with the conventional SJ-LIGBT. However, the SBP is turn-off state with <span>({V}_{GS,P}>{V}_{TH,P})</span>. At the turn off state, The SBP is automatically turned on to extract the holes when the <span>({V}_{GS,P}<{V}_{TH,P})</span>, which reduces the turn-off loss <span>({E}_{OFF})</span> significantly. Consequently, the DM-SJ-LIGBT obtains a superior trade-off relationship between forward conduction voltage <span>({V}_{ON})</span> and <span>({E}_{OFF})</span> . At the same <span>({E}_{OFF})</span> of 0.61 mJ/<span>(cm^2)</span>, the <span>({V}_{ON})</span> of the DM-SJ-LIGBT with <span>({T}_{SBN})</span> =100nm and the DM-SJ-LIGBT with <span>({T}_{SBN})</span> =50 nm is 11% and 22% lower than the conventional SJ-LIGBT, respectively. Moreover, When <span>({V}_{ON})</span> is 1.36 V, the <span>({E}_{OFF})</span> of the DM-SJ-LIGBT with <span>({T}_{SBN})</span>=100nm and the DM-SJ-LIGBT with <span>({T}_{SBN})</span>=50 nm are 0.354 and 0.147 mJ/<span>(cm^2)</span> respectively, which is 42% and 76% less than that of the conventional SJ-LIGBT.</p></div>","PeriodicalId":776,"journal":{"name":"Silicon","volume":"16 15","pages":"5715 - 5724"},"PeriodicalIF":2.8,"publicationDate":"2024-08-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142204814","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-14DOI: 10.1007/s12633-024-03117-2
A. Arunkumar, S. R. Venkataraman, S. Vishvanathperumal, V. Navaneethakrishnan
Rubber blending is a prominent technique for enhancing properties in final rubber products. This study investigates the interplay of filler concentration and surface modification in EPDM/SBR blend composites with halloysite nanotubes (HNTs). The effects of γ-Aminopropyltriethoxysilane (APTES) and resorcinol-hexamethylenetetramine (RH) modifiers were examined. Comparing rubber blend composites with modified and unmodified HNTs, the findings reveal significant enhancements using RH-modified HNTs. These composites outperform those with APTES-modified and unmodified HNTs, notably improving mechanical properties. The addition of fillers increases crosslink density and filler-rubber interaction, reducing mole percent uptake. These trends result in significantly improved abrasion resistance in the composites. FESEM images show that RH-modified HNTs have superior distribution compared to APTES-modified and unmodified HNTs, highlighting their effective interaction and dispersion. These findings can guide the optimization and production of outdoor applications.
{"title":"Comparative Analysis of Cure Behaviors, Mechanical Properties, and Swelling Resistance in EPDM/SBR Composites with HNTs, APTES-Modified HNTs, and RH-Modified HNTs","authors":"A. Arunkumar, S. R. Venkataraman, S. Vishvanathperumal, V. Navaneethakrishnan","doi":"10.1007/s12633-024-03117-2","DOIUrl":"10.1007/s12633-024-03117-2","url":null,"abstract":"<div><p>Rubber blending is a prominent technique for enhancing properties in final rubber products. This study investigates the interplay of filler concentration and surface modification in EPDM/SBR blend composites with halloysite nanotubes (HNTs). The effects of γ-Aminopropyltriethoxysilane (APTES) and resorcinol-hexamethylenetetramine (RH) modifiers were examined. Comparing rubber blend composites with modified and unmodified HNTs, the findings reveal significant enhancements using RH-modified HNTs. These composites outperform those with APTES-modified and unmodified HNTs, notably improving mechanical properties. The addition of fillers increases crosslink density and filler-rubber interaction, reducing mole percent uptake. These trends result in significantly improved abrasion resistance in the composites. FESEM images show that RH-modified HNTs have superior distribution compared to APTES-modified and unmodified HNTs, highlighting their effective interaction and dispersion. These findings can guide the optimization and production of outdoor applications.</p></div>","PeriodicalId":776,"journal":{"name":"Silicon","volume":"16 15","pages":"5691 - 5714"},"PeriodicalIF":2.8,"publicationDate":"2024-08-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142204812","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
The tracking-resistant silicone rubber with superior water resistance is very essential for outdoor high-voltage transmission field. In this work, aminepropyltriethoxysilane-immobilized silica (APTES-SiO2) was prepared through dehydration condensation between the ethoxy groups of aminepropyltriethoxysilane (APTES) and hydroxyl groups on the SiO2 surface. The effects of APTES-SiO2 on the vulcanization, mechanical properties, thermal stability and tracking resistance of addition-cure liquid silicone rubber (ALSR) were studied. The results revealed that APTES-SiO2 and platinum catalyst (Pt) synergistically improved the tracking resistance of ALSR, and APTES-SiO2/ALSR also possessed excellent water resistance. When the content of APTES and Pt was 0.15 phr (parts per hundreds of rubber) and 15 ppm (parts per million), respectively, APTES-SiO2/ALSR reached 1A4.5 level. Furthermore, the tracking resistance of ALSR showed little deterioration even after immersion in water for 30 days. The results of thermogravimetry (TG) and thermogravimetry-Fourier transform infrared spectroscopy (TG-FTIR) indicated that APTES-SiO2 and Pt synergistically promoted the radical crosslinking of ALSR chains at high temperature, which was favorable to the formation of compact ceramic protected layer, thus significantly improved the tracking resistance of ALSR.