Birefringent and nonlinear optical (NLO) crystals are crucial for advanced optical applications, yet achieving large birefringence (Δn), noncentrosymmetric (NCS) structures, and broad transparency from solar-blind ultraviolet (SUV) to near-infrared (NIR) regions remains challenging. Here, we report a 4HPX family of twelve 4-hydroxypyridinium halides, constructed from 4-hydroxypyridinium cations [4HPH]+ and halide anions [X]− (X = F (I, II), Cl (III, VII, X), Br (IV, VIII, XI), I (V, VI, IX, XII)). Solution acidity dictates the structural transformations of this family, from centrosymmetric (I–IX) to NCS (X–XII) phases, where C─O bond lengths act as definitive structural fingerprints. Their optical bandgaps exceed those of all known halogen polyanion-based crystals due to the large HOMO–LUMO gaps of both [4HPH]+ and [X]− and can be systematically tuned via hydrogen-bond strength. The large hyperpolarizability and polarizability anisotropy of [4HPH]+ endow this family with exceptional Δn and suitable second–harmonic generation (SHG) responses. Notably, II [C5H6NO]+(HF2)− exhibits the largest Δn (0.293) within the 4HPX family and among reported water–free SUV crystals. Meanwhile, I–V (0.222–0.293) also outperform commercial birefringent materials. NLO crystals X–XII show SHG responses. This work provides valuable insights into the rational design of next-generation birefringent and NLO crystals.
{"title":"Protonation-Triggered Structural Transformations in 4-Hydroxypyridinium Halides for Solar-Blind UV Functional Crystals","authors":"Jing Lu, Xin Liu, Shuangxiong Zhao, Xuebing Deng, Qundong Fu, Jingyu Guo, Zheng Liu, Li-Ming Wu, Ling Chen","doi":"10.1002/ange.202524953","DOIUrl":"10.1002/ange.202524953","url":null,"abstract":"<p>Birefringent and nonlinear optical (NLO) crystals are crucial for advanced optical applications, yet achieving large birefringence (Δ<i>n</i>), noncentrosymmetric (NCS) structures, and broad transparency from solar-blind ultraviolet (SUV) to near-infrared (NIR) regions remains challenging. Here, we report a 4HPX family of twelve 4-hydroxypyridinium halides, constructed from 4-hydroxypyridinium cations [4HPH]<sup>+</sup> and halide anions [X]<sup>−</sup> (X = F (<b>I</b>, <b>II</b>), Cl (<b>III</b>, <b>VII</b>, <b>X</b>), Br (<b>IV</b>, <b>VIII</b>, <b>XI</b>), I (<b>V</b>, <b>VI</b>, <b>IX</b>, <b>XII</b>)). Solution acidity dictates the structural transformations of this family, from centrosymmetric (<b>I</b>–<b>IX</b>) to NCS (<b>X</b>–<b>XII</b>) phases, where C─O bond lengths act as definitive structural fingerprints. Their optical bandgaps exceed those of all known halogen polyanion-based crystals due to the large HOMO–LUMO gaps of both [4HPH]<sup>+</sup> and [X]<sup>−</sup> and can be systematically tuned via hydrogen-bond strength. The large hyperpolarizability and polarizability anisotropy of [4HPH]<sup>+</sup> endow this family with exceptional Δ<i>n</i> and suitable second–harmonic generation (SHG) responses. Notably, <b>II</b> [C<sub>5</sub>H<sub>6</sub>NO]<sup>+</sup>(HF<sub>2</sub>)<sup>−</sup> exhibits the largest Δ<i>n</i> (0.293) within the 4HPX family and among reported water–free SUV crystals. Meanwhile, <b>I</b>–<b>V</b> (0.222–0.293) also outperform commercial birefringent materials. NLO crystals <b>X</b>–<b>XII</b> show SHG responses. This work provides valuable insights into the rational design of next-generation birefringent and NLO crystals.</p>","PeriodicalId":7803,"journal":{"name":"Angewandte Chemie","volume":"138 7","pages":""},"PeriodicalIF":0.0,"publicationDate":"2026-01-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"146154584","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Fushan Yuan, Jie Jia, Hui-Ru Jin, Dr. Xufei Yan, Prof. Dr. Jialin Ming, Prof. Dr. Ying Xia
Fluorinated four-membered rings represent valuable structural motifs in bioactive molecules and pharmaceuticals; however, the asymmetric synthesis of such fluorinated frameworks bearing chiral quaternary carbon centers has not yet been achieved. Herein, we report a Rh-catalyzed enantioselective defluoroarylation of gem-difluorinated cyclobutenes with aryl boronates, enabling the asymmetric construction of fluorinated cyclobutenes bearing chiral quaternary carbon centers with high enantioselectivity via an addition/β-fluoride elimination process. In situ treatment with an additional distinct aryl boronate enables one-pot bis-defluoroarylation to give unsymmetrical diarylated cyclobutenes.
{"title":"Asymmetric Synthesis of Fluorinated Cyclobutenes Containing Quaternary Carbon Stereocenters by Rh-Catalyzed Defluoroarylation","authors":"Fushan Yuan, Jie Jia, Hui-Ru Jin, Dr. Xufei Yan, Prof. Dr. Jialin Ming, Prof. Dr. Ying Xia","doi":"10.1002/ange.202525455","DOIUrl":"https://doi.org/10.1002/ange.202525455","url":null,"abstract":"<p>Fluorinated four-membered rings represent valuable structural motifs in bioactive molecules and pharmaceuticals; however, the asymmetric synthesis of such fluorinated frameworks bearing chiral quaternary carbon centers has not yet been achieved. Herein, we report a Rh-catalyzed enantioselective defluoroarylation of <i>gem</i>-difluorinated cyclobutenes with aryl boronates, enabling the asymmetric construction of fluorinated cyclobutenes bearing chiral quaternary carbon centers with high enantioselectivity via an addition/β-fluoride elimination process. In situ treatment with an additional distinct aryl boronate enables <i>one-pot</i> bis-defluoroarylation to give unsymmetrical diarylated cyclobutenes.</p>","PeriodicalId":7803,"journal":{"name":"Angewandte Chemie","volume":"138 7","pages":""},"PeriodicalIF":0.0,"publicationDate":"2026-01-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"146162356","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Yuan Xiu, Kenny Lee, Di Wu, Maryam Hosseini, Patrick T. Spicer, Nathaniel Corrigan, Cyrille Boyer
Integrating molecular self-assembly with additive manufacturing has opened new avenues for the direct production of thermosetting polymers with intricate geometries and tailored microstructures. The wide range of available chemical compositions enables diverse applications for the materials, including nanostructured porous materials, solid polymer electrolytes, and inorganic composites. Here, we introduce a novel concept by developing photocurable polymeric inks with precisely controlled nanostructures suitable for direct ink writing (DIW). In particular, amphiphilic block copolymers (BCPs) synthesized via reversible addition–fragmentation chain-transfer (RAFT) polymerization is combined with a crosslinker that also acts as a selective solvent, yielding inks with stable and well-ordered nanostructures. Upon photocuring of these inks, the nanostructures were largely preserved, and reinitiation of the RAFT end-groups during network formation covalently anchored the nanodomains to the matrix, thereby improving nanoscale morphology retention and enhancing mechanical performance. These inks exhibit shear-thinning behavior with rapid structural recovery after extrusion, enabling high-fidelity DIW. Our strategy offers a powerful route to precisely fabricating hierarchical thermosetting materials under ambient conditions, requiring no complex processing steps and specialized equipment. This work significantly broadens possibilities for designing advanced thermosetting materials with customizable architecture and enhanced functionalities.
{"title":"Harnessing RAFT Polymerization for Hierarchical Structuring of Thermosets by Direct Ink Writing","authors":"Yuan Xiu, Kenny Lee, Di Wu, Maryam Hosseini, Patrick T. Spicer, Nathaniel Corrigan, Cyrille Boyer","doi":"10.1002/ange.202524271","DOIUrl":"https://doi.org/10.1002/ange.202524271","url":null,"abstract":"<p>Integrating molecular self-assembly with additive manufacturing has opened new avenues for the direct production of thermosetting polymers with intricate geometries and tailored microstructures. The wide range of available chemical compositions enables diverse applications for the materials, including nanostructured porous materials, solid polymer electrolytes, and inorganic composites. Here, we introduce a novel concept by developing photocurable polymeric inks with precisely controlled nanostructures suitable for direct ink writing (DIW). In particular, amphiphilic block copolymers (BCPs) synthesized via reversible addition–fragmentation chain-transfer (RAFT) polymerization is combined with a crosslinker that also acts as a selective solvent, yielding inks with stable and well-ordered nanostructures. Upon photocuring of these inks, the nanostructures were largely preserved, and reinitiation of the RAFT end-groups during network formation covalently anchored the nanodomains to the matrix, thereby improving nanoscale morphology retention and enhancing mechanical performance. These inks exhibit shear-thinning behavior with rapid structural recovery after extrusion, enabling high-fidelity DIW. Our strategy offers a powerful route to precisely fabricating hierarchical thermosetting materials under ambient conditions, requiring no complex processing steps and specialized equipment. This work significantly broadens possibilities for designing advanced thermosetting materials with customizable architecture and enhanced functionalities.</p>","PeriodicalId":7803,"journal":{"name":"Angewandte Chemie","volume":"138 7","pages":""},"PeriodicalIF":0.0,"publicationDate":"2026-01-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"146162401","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Yuan Xiu, Kenny Lee, Di Wu, Maryam Hosseini, Patrick T. Spicer, Nathaniel Corrigan, Cyrille Boyer
Integrating molecular self-assembly with additive manufacturing has opened new avenues for the direct production of thermosetting polymers with intricate geometries and tailored microstructures. The wide range of available chemical compositions enables diverse applications for the materials, including nanostructured porous materials, solid polymer electrolytes, and inorganic composites. Here, we introduce a novel concept by developing photocurable polymeric inks with precisely controlled nanostructures suitable for direct ink writing (DIW). In particular, amphiphilic block copolymers (BCPs) synthesized via reversible addition–fragmentation chain-transfer (RAFT) polymerization is combined with a crosslinker that also acts as a selective solvent, yielding inks with stable and well-ordered nanostructures. Upon photocuring of these inks, the nanostructures were largely preserved, and reinitiation of the RAFT end-groups during network formation covalently anchored the nanodomains to the matrix, thereby improving nanoscale morphology retention and enhancing mechanical performance. These inks exhibit shear-thinning behavior with rapid structural recovery after extrusion, enabling high-fidelity DIW. Our strategy offers a powerful route to precisely fabricating hierarchical thermosetting materials under ambient conditions, requiring no complex processing steps and specialized equipment. This work significantly broadens possibilities for designing advanced thermosetting materials with customizable architecture and enhanced functionalities.
{"title":"Harnessing RAFT Polymerization for Hierarchical Structuring of Thermosets by Direct Ink Writing","authors":"Yuan Xiu, Kenny Lee, Di Wu, Maryam Hosseini, Patrick T. Spicer, Nathaniel Corrigan, Cyrille Boyer","doi":"10.1002/ange.202524271","DOIUrl":"https://doi.org/10.1002/ange.202524271","url":null,"abstract":"<p>Integrating molecular self-assembly with additive manufacturing has opened new avenues for the direct production of thermosetting polymers with intricate geometries and tailored microstructures. The wide range of available chemical compositions enables diverse applications for the materials, including nanostructured porous materials, solid polymer electrolytes, and inorganic composites. Here, we introduce a novel concept by developing photocurable polymeric inks with precisely controlled nanostructures suitable for direct ink writing (DIW). In particular, amphiphilic block copolymers (BCPs) synthesized via reversible addition–fragmentation chain-transfer (RAFT) polymerization is combined with a crosslinker that also acts as a selective solvent, yielding inks with stable and well-ordered nanostructures. Upon photocuring of these inks, the nanostructures were largely preserved, and reinitiation of the RAFT end-groups during network formation covalently anchored the nanodomains to the matrix, thereby improving nanoscale morphology retention and enhancing mechanical performance. These inks exhibit shear-thinning behavior with rapid structural recovery after extrusion, enabling high-fidelity DIW. Our strategy offers a powerful route to precisely fabricating hierarchical thermosetting materials under ambient conditions, requiring no complex processing steps and specialized equipment. This work significantly broadens possibilities for designing advanced thermosetting materials with customizable architecture and enhanced functionalities.</p>","PeriodicalId":7803,"journal":{"name":"Angewandte Chemie","volume":"138 7","pages":""},"PeriodicalIF":0.0,"publicationDate":"2026-01-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"146162435","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Yuanzhi Zhong, Lihua Mo, Xudan Chen, Ying Yi, Dr. Jia-Wei Wang, Dr. Ling Wang, Dr. Xiao-Yi Yi, Dr. Zhimou Yang
Innovative strategies for efficient photocatalytic urea production are desirable due to the wide applications of urea and derivatives in agriculture and pharmaceuticals, which remain highly challenging. Here, we introduce a simple but efficient radical addition approach to address this challenge by fully utilizing the in situ, synchronously generated aminyl radical (·NH2) and hydroperoxyl radical (HO2·) via the coupling of photocatalytic NH3 oxidation and O2 reduction. The two radicals reassembled and cooperatively reacted with NH2COOH to form urea with markedly lower kinetic barrier than the industrial process. This approach not only achieved record-high urea production and conversion rates (42.6 mmol gcat−1 h−1 and 70%, respectively) but also enabled the direct, single-step synthesis of unsymmetrical urea derivatives with good yields.
{"title":"Photosynthesis of Urea by Cooperative Radicals Addition Using a Peptide as a Photocatalyst","authors":"Yuanzhi Zhong, Lihua Mo, Xudan Chen, Ying Yi, Dr. Jia-Wei Wang, Dr. Ling Wang, Dr. Xiao-Yi Yi, Dr. Zhimou Yang","doi":"10.1002/ange.202523565","DOIUrl":"10.1002/ange.202523565","url":null,"abstract":"<p>Innovative strategies for efficient photocatalytic urea production are desirable due to the wide applications of urea and derivatives in agriculture and pharmaceuticals, which remain highly challenging. Here, we introduce a simple but efficient radical addition approach to address this challenge by fully utilizing the in situ, synchronously generated aminyl radical (·NH<sub>2</sub>) and hydroperoxyl radical (HO<sub>2</sub>·) via the coupling of photocatalytic NH<sub>3</sub> oxidation and O<sub>2</sub> reduction. The two radicals reassembled and cooperatively reacted with NH<sub>2</sub>COOH to form urea with markedly lower kinetic barrier than the industrial process. This approach not only achieved record-high urea production and conversion rates (42.6 mmol g<sub>cat</sub><sup>−1</sup> h<sup>−1</sup> and 70%, respectively) but also enabled the direct, single-step synthesis of unsymmetrical urea derivatives with good yields.</p>","PeriodicalId":7803,"journal":{"name":"Angewandte Chemie","volume":"138 7","pages":""},"PeriodicalIF":0.0,"publicationDate":"2026-01-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"146162398","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Dr. Panpan Wang, Florian Paul, Dr. Marko Boehm, Dr. Jens Appel, Prof. Dr. Kirstin Gutekunst, Prof.Dr. Wolfgang Schuhmann, Dr. Felipe Conzuelo
Photosynthetische Mikroorganismen können zur lichtgetriebenen H2-Entwicklung genutzt werden. Eine Einschränkung ist jedoch die damit verbundene Bildung von molekularem Sauerstoff als Nebenprodukt der Photosynthese, der die Aktivität des Biokatalysators für die H2-Produktion, d. h. die Hydrogenase, inhibiert. Wir stellen eine elektrochemische Strategie vor, die eine effiziente Entfernung von O2 aus immobilisierten mikrobiellen Zellen und deren Umgebung ermöglicht.