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Numerical investigation of plasmon-enhanced emission from a nanofiber coupled single photon emitter 纳米纤维耦合单光子发射器的等离子体增强发射数值研究
IF 2.3 4区 物理与天体物理 Q3 PHYSICS, APPLIED Pub Date : 2023-12-06 DOI: 10.35848/1882-0786/ad1318
Yining Xuan, Rui Sun, Soyoung Baek, M. Sadgrove, Keiichi Edamatsu
This study explores the enhancement of emission from a single photon emitter in a quantum communication network by coupling the source with an optical nanofiber and leveraging gold nanoparticles for Purcell enhancement. Large Purcell enhancements of more than 50 times were recently reported experimentally, but understanding of important issues, including the maximum Purcell factor, and limits to quantum efficiency due to ohmic losses, is still lacking. Our findings reveal that the reported experimental results are reasonable, and confirm that such composite devices provide a promising route for high-efficiency single photon sources coupled to an optical fiber-based quantum communication network.
本研究探讨了量子通信网络中单光子发射器的发射增强,方法是将源与光学纳米纤维耦合,并利用金纳米粒子进行珀塞尔增强。最近的实验报道了Purcell增强超过50倍,但对重要问题的理解,包括最大Purcell因子,以及由于欧姆损失而限制的量子效率,仍然缺乏。我们的研究结果表明,报告的实验结果是合理的,并证实了这种复合器件为高效率的单光子源耦合到基于光纤的量子通信网络提供了一条有前途的途径。
{"title":"Numerical investigation of plasmon-enhanced emission from a nanofiber coupled single photon emitter","authors":"Yining Xuan, Rui Sun, Soyoung Baek, M. Sadgrove, Keiichi Edamatsu","doi":"10.35848/1882-0786/ad1318","DOIUrl":"https://doi.org/10.35848/1882-0786/ad1318","url":null,"abstract":"\u0000 This study explores the enhancement of emission from a single photon emitter in a quantum communication network by coupling the source with an optical nanofiber and leveraging gold nanoparticles for Purcell enhancement. Large Purcell enhancements of more than 50 times were recently reported experimentally, but understanding of important issues, including the maximum Purcell factor, and limits to quantum efficiency due to ohmic losses, is still lacking. Our findings reveal that the reported experimental results are reasonable, and confirm that such composite devices provide a promising route for high-efficiency single photon sources coupled to an optical fiber-based quantum communication network.","PeriodicalId":8093,"journal":{"name":"Applied Physics Express","volume":"5 1","pages":""},"PeriodicalIF":2.3,"publicationDate":"2023-12-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"138594737","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Structural characterization of epitaxial ScAlN films grown on GaN by low-temperature sputtering 通过低温溅射在氮化镓上生长的外延 ScAlN 薄膜的结构特征
IF 2.3 4区 物理与天体物理 Q3 PHYSICS, APPLIED Pub Date : 2023-12-04 DOI: 10.35848/1882-0786/ad120b
A. Kobayashi, Yoshio Honda, Takuya Maeda, Tomoya Okuda, K. Ueno, Hiroshi Fujioka
ScAlN has garnered substantial attention for its robust piezoelectric and ferroelectric properties, holding promise for diverse electronic device applications. However, the interplay between its structural attributes and physical properties remains poorly understood. Correlations between Sc composition, lattice constants, and film strains were revealed utilizing high-resolution X-ray diffraction, reciprocal space mapping, and machine learning analyses. Our machine-learning model predicted c-axis lattice constants of ScAlN grown on GaN under various conditions and suggested that sputtering permits coherent growth over a wide compositional range. These findings advance the understanding of ScAlN and provide valuable insights for the research and development of ScAlN-based device.
ScAlN因其强大的压电和铁电特性而获得了大量关注,有望用于各种电子设备应用。然而,其结构属性和物理性质之间的相互作用仍然知之甚少。利用高分辨率x射线衍射、互反空间映射和机器学习分析揭示了Sc成分、晶格常数和薄膜应变之间的相关性。我们的机器学习模型预测了在不同条件下在GaN上生长的ScAlN的c轴晶格常数,并表明溅射允许在很宽的成分范围内相干生长。这些发现促进了对ScAlN的理解,并为基于ScAlN的器件的研究和开发提供了有价值的见解。
{"title":"Structural characterization of epitaxial ScAlN films grown on GaN by low-temperature sputtering","authors":"A. Kobayashi, Yoshio Honda, Takuya Maeda, Tomoya Okuda, K. Ueno, Hiroshi Fujioka","doi":"10.35848/1882-0786/ad120b","DOIUrl":"https://doi.org/10.35848/1882-0786/ad120b","url":null,"abstract":"\u0000 ScAlN has garnered substantial attention for its robust piezoelectric and ferroelectric properties, holding promise for diverse electronic device applications. However, the interplay between its structural attributes and physical properties remains poorly understood. Correlations between Sc composition, lattice constants, and film strains were revealed utilizing high-resolution X-ray diffraction, reciprocal space mapping, and machine learning analyses. Our machine-learning model predicted c-axis lattice constants of ScAlN grown on GaN under various conditions and suggested that sputtering permits coherent growth over a wide compositional range. These findings advance the understanding of ScAlN and provide valuable insights for the research and development of ScAlN-based device.","PeriodicalId":8093,"journal":{"name":"Applied Physics Express","volume":"22 12","pages":""},"PeriodicalIF":2.3,"publicationDate":"2023-12-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"138601752","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Separate evaluation of interface and oxide hole traps in SiO2/GaN MOS structures with below- and above-gap light excitation 用低于和高于隙的光激发分别评估 SiO2/GaN MOS 结构中的界面和氧化物空穴陷阱
IF 2.3 4区 物理与天体物理 Q3 PHYSICS, APPLIED Pub Date : 2023-12-04 DOI: 10.35848/1882-0786/ad120a
Takuma Kobayashi, Kazuki Tomigahara, M. Nozaki, T. Shimura, Heiji Watanabe
Understanding the traps in metal-oxide-semiconductor (MOS) structures is crucial to fabricate MOS transistors with high performance and reliability. In this study, we evaluated the hole traps in SiO2/GaN MOS structures through photo-assisted capacitance-voltage measurements. Below- and above-gap light was used to distinguish between the contributions of fast interface and slow oxide hole traps. While annealing in oxygen is effective in reducing the oxide hole traps, a high density of hole traps exceeding 1012 cm-2eV-1 remains at the interface. Although these traps are donor-type and thus hidden in n-type MOS structures, they could impair the switching performance of GaN MOS transistors.
了解金属氧化物半导体(MOS)结构中的陷阱对于制造高性能、高可靠性的MOS晶体管至关重要。在这项研究中,我们通过光辅助电容电压测量来评估SiO2/GaN MOS结构中的空穴陷阱。利用间隙下和间隙上的光来区分快界面和慢氧化空穴阱的贡献。虽然在氧气中退火可以有效地减少氧化物空穴陷阱,但在界面处仍然存在密度超过1012 cm-2eV-1的空穴陷阱。虽然这些陷阱是供体型的,因此隐藏在n型MOS结构中,但它们可能会损害GaN MOS晶体管的开关性能。
{"title":"Separate evaluation of interface and oxide hole traps in SiO2/GaN MOS structures with below- and above-gap light excitation","authors":"Takuma Kobayashi, Kazuki Tomigahara, M. Nozaki, T. Shimura, Heiji Watanabe","doi":"10.35848/1882-0786/ad120a","DOIUrl":"https://doi.org/10.35848/1882-0786/ad120a","url":null,"abstract":"\u0000 Understanding the traps in metal-oxide-semiconductor (MOS) structures is crucial to fabricate MOS transistors with high performance and reliability. In this study, we evaluated the hole traps in SiO2/GaN MOS structures through photo-assisted capacitance-voltage measurements. Below- and above-gap light was used to distinguish between the contributions of fast interface and slow oxide hole traps. While annealing in oxygen is effective in reducing the oxide hole traps, a high density of hole traps exceeding 1012 cm-2eV-1 remains at the interface. Although these traps are donor-type and thus hidden in n-type MOS structures, they could impair the switching performance of GaN MOS transistors.","PeriodicalId":8093,"journal":{"name":"Applied Physics Express","volume":"16 11","pages":""},"PeriodicalIF":2.3,"publicationDate":"2023-12-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"138602954","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Demonstration of III-nitride vertical-cavity surface-emitting lasers with a topside dielectric curved mirror 带顶部电介质曲面镜的Ⅲ-氮化物垂直腔表面发射激光器演示
IF 2.3 4区 物理与天体物理 Q3 PHYSICS, APPLIED Pub Date : 2023-12-02 DOI: 10.35848/1882-0786/ad119b
Nathan C. Palmquist, Jared A. Kearns, Stephenn M Gee, Arturo Juan, Srinivas Gandrothula, Michael Lam, S. Denbaars, S. Nakamura
We report long cavity (65lambda) GaN-based vertical-cavity surface-emitting lasers (VCSELs) with a topside dielectric concave mirror, an ion implanted current aperture, and a bottomside nanoporous GaN distributed Bragg reflector. Under pulsed operation, a VCSEL with a 10µm aperture and a curved mirror with a radius of curvature (ROC) of 120µm had a threshold current density of 14kA/cm2, and a maximum output power of 370µW for a lasing mode at 404.5nm. The longitudinal performance has a side-mode suppression ratio of 30dB up to a current density of approximately 40kA/cm2. Multiple transverse mode profiles are observed across several devices.
我们报道了长腔(65lambda) GaN基垂直腔面发射激光器(VCSELs),该激光器具有上部介质凹面镜,离子注入电流孔径和底部纳米多孔GaN分布Bragg反射器。在脉冲工作条件下,孔径为10µm、曲率半径(ROC)为120µm的VCSEL在404.5nm激光模式下的阈值电流密度为14kA/cm2,最大输出功率为370µW。纵向性能的侧模抑制比为30dB,电流密度约为40kA/cm2。在多个器件上观察到多个横向模廓。
{"title":"Demonstration of III-nitride vertical-cavity surface-emitting lasers with a topside dielectric curved mirror","authors":"Nathan C. Palmquist, Jared A. Kearns, Stephenn M Gee, Arturo Juan, Srinivas Gandrothula, Michael Lam, S. Denbaars, S. Nakamura","doi":"10.35848/1882-0786/ad119b","DOIUrl":"https://doi.org/10.35848/1882-0786/ad119b","url":null,"abstract":"\u0000 We report long cavity (65lambda) GaN-based vertical-cavity surface-emitting lasers (VCSELs) with a topside dielectric concave mirror, an ion implanted current aperture, and a bottomside nanoporous GaN distributed Bragg reflector. Under pulsed operation, a VCSEL with a 10µm aperture and a curved mirror with a radius of curvature (ROC) of 120µm had a threshold current density of 14kA/cm2, and a maximum output power of 370µW for a lasing mode at 404.5nm. The longitudinal performance has a side-mode suppression ratio of 30dB up to a current density of approximately 40kA/cm2. Multiple transverse mode profiles are observed across several devices.","PeriodicalId":8093,"journal":{"name":"Applied Physics Express","volume":"123 32","pages":""},"PeriodicalIF":2.3,"publicationDate":"2023-12-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"138606912","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
High-pressure plasma etching up to 9 atm toward uniform processing inside narrow grooves of high-precision X-ray crystal optics 高达 9 atm 的高压等离子体蚀刻,实现高精度 X 射线晶体光学器件窄槽内的均匀加工
IF 2.3 4区 物理与天体物理 Q3 PHYSICS, APPLIED Pub Date : 2023-12-02 DOI: 10.35848/1882-0786/ad119a
Shotaro Matsumura, Iori Ogasahara, Masafumi Miyake, T. Osaka, D. Toh, J. Yamada, M. Yabashi, K. Yamauchi, Y. Sano
We developed a new etching technique using plasma generated at high pressure up to 9 atm. Operating at 9-atm pressure with a 30-μm-diameter wire electrode, we demonstrate the generation of well-ordered plasma at a narrow gap of ~10 μm between the electrode and workpiece, and realize a high spatial resolution in processing of <40 μm during processing. This technique should allow for the processing of the high-precision X-ray crystal optical devices with compact and complex structures, such as a micro channel-cut crystal monochromator with an extremely narrow (sub-100 μm width) groove for realization of Fourier-transform-limited X-ray lasers with high intensity.
我们开发了一种新的蚀刻技术,使用在高达9atm的高压下产生的等离子体。在9-atm的压力下,采用直径为30 μm的丝电极,在电极与工件之间约10 μm的窄间隙内产生了有序的等离子体,并在加工过程中实现了<40 μm的高空间分辨率。该技术可用于加工结构紧凑复杂的高精度x射线晶体光学器件,如极窄(宽度小于100 μm)沟槽的微通道切割晶体单色器,以实现高强度傅里叶变换受限x射线激光器。
{"title":"High-pressure plasma etching up to 9 atm toward uniform processing inside narrow grooves of high-precision X-ray crystal optics","authors":"Shotaro Matsumura, Iori Ogasahara, Masafumi Miyake, T. Osaka, D. Toh, J. Yamada, M. Yabashi, K. Yamauchi, Y. Sano","doi":"10.35848/1882-0786/ad119a","DOIUrl":"https://doi.org/10.35848/1882-0786/ad119a","url":null,"abstract":"\u0000 We developed a new etching technique using plasma generated at high pressure up to 9 atm. Operating at 9-atm pressure with a 30-μm-diameter wire electrode, we demonstrate the generation of well-ordered plasma at a narrow gap of ~10 μm between the electrode and workpiece, and realize a high spatial resolution in processing of <40 μm during processing. This technique should allow for the processing of the high-precision X-ray crystal optical devices with compact and complex structures, such as a micro channel-cut crystal monochromator with an extremely narrow (sub-100 μm width) groove for realization of Fourier-transform-limited X-ray lasers with high intensity.","PeriodicalId":8093,"journal":{"name":"Applied Physics Express","volume":"125 18","pages":""},"PeriodicalIF":2.3,"publicationDate":"2023-12-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"138606968","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Effective suppression of interface states in recessed-gate MIS-HEMTs by TMAH wet etching 通过 TMAH 湿法蚀刻有效抑制凹栅极 MIS-HEMT 中的界面态
IF 2.3 4区 物理与天体物理 Q3 PHYSICS, APPLIED Pub Date : 2023-12-02 DOI: 10.35848/1882-0786/ad1199
Yu Li, Guohao Yu, Heng Wang, Jiaan Zhou, Zheming Wang, Runxian Xing, Shaoqian Lu, An Yang, Bingliang Zhang, Yong Cai, Zhongming Zeng, Baoshun Zhang
The effect of tetramethylammonium hydroxide (TMAH) treatment prior to gate dielectric deposition on the performance of recessed-gate AlGaN/GaN metal-insulator-semiconductor high electron mobility transistors (MIS-HEMTs) was investigated. By using of TMAH wet etching, low roughness etched surface of 0.173 nm was obtained. The capacitance-voltage characteristics of MIS heterostructures showed the interface states reduced by one order of magnitude. When temperature was increased to 473 K, the treated MIS-HEMTs delivered small threshold voltage shift (ΔVTH) of ~-0.53 V. From the dynamic measurement, ΔVTH obtained without treatment was observed more severely (~-1 V) when compared to the treated one (~-0.01 V).
研究了栅极介质沉积前四甲基氢氧化铵(TMAH)处理对嵌入式栅极AlGaN/GaN金属-绝缘体-半导体高电子迁移率晶体管(MIS-HEMTs)性能的影响。采用TMAH湿法蚀刻,获得了0.173 nm的低粗糙度蚀刻表面。MIS异质结构的电容电压特性表明界面状态减小了一个数量级。当温度升高到473 K时,经过处理的miss - hemt的阈值电压位移(ΔVTH)很小,为~-0.53 V。从动态测量来看,与处理后的ΔVTH (~-0.01 V)相比,未经处理的ΔVTH (~-1 V)更严重。
{"title":"Effective suppression of interface states in recessed-gate MIS-HEMTs by TMAH wet etching","authors":"Yu Li, Guohao Yu, Heng Wang, Jiaan Zhou, Zheming Wang, Runxian Xing, Shaoqian Lu, An Yang, Bingliang Zhang, Yong Cai, Zhongming Zeng, Baoshun Zhang","doi":"10.35848/1882-0786/ad1199","DOIUrl":"https://doi.org/10.35848/1882-0786/ad1199","url":null,"abstract":"\u0000 The effect of tetramethylammonium hydroxide (TMAH) treatment prior to gate dielectric deposition on the performance of recessed-gate AlGaN/GaN metal-insulator-semiconductor high electron mobility transistors (MIS-HEMTs) was investigated. By using of TMAH wet etching, low roughness etched surface of 0.173 nm was obtained. The capacitance-voltage characteristics of MIS heterostructures showed the interface states reduced by one order of magnitude. When temperature was increased to 473 K, the treated MIS-HEMTs delivered small threshold voltage shift (ΔVTH) of ~-0.53 V. From the dynamic measurement, ΔVTH obtained without treatment was observed more severely (~-1 V) when compared to the treated one (~-0.01 V).","PeriodicalId":8093,"journal":{"name":"Applied Physics Express","volume":"117 17","pages":""},"PeriodicalIF":2.3,"publicationDate":"2023-12-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"138607410","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Polarization-induced magnetoelectric effect in Fe3Ga/HfO2/Fe3Ga heterojunction Fe3Ga/HfO2/Fe3Ga异质结的极化磁电效应
IF 2.3 4区 物理与天体物理 Q3 PHYSICS, APPLIED Pub Date : 2023-12-01 DOI: 10.35848/1882-0786/ad0db8
Zhijian He, Daifeng Zou, Qiong Yang, Tianpeng Duan, Yingjun Tan, Chihou Lei, Shuhong Xie and Yunya Liu
Fe3Ga/HfO2/Fe3Ga heterojunction possesses reasonable lattice mismatch and good ferroelectric at the nanoscale. However, its magnetoelectric coupling is unexplored. Based on the first-principles calculations, we demonstrate that the magnetoelectric coupling in Fe3Ga/HfO2/Fe3Ga heterojunction is induced by polarization, which is different from the common strain-mediated magnetoelectric effect. The polarization-induced magnetoelectric effect of heterojunction is explained by the analyses of orbital-resolved density of states and spin densities, finding that the interfaces between Fe3Ga and HfO2 play an important role in magnetoelectric coupling, offering an alternative pathway for generating magnetoelectric coupling at room temperature.
Fe3Ga/HfO2/Fe3Ga异质结具有合理的晶格失配和良好的纳米级铁电性。然而,它的磁电耦合是未知的。基于第一性原理计算,我们证明了Fe3Ga/HfO2/Fe3Ga异质结中的磁电耦合是由极化引起的,不同于一般的应变介导磁电效应。通过分析态的轨道分辨密度和自旋密度来解释异质结极化诱导的磁电效应,发现Fe3Ga和HfO2之间的界面在磁电耦合中起着重要作用,为室温下产生磁电耦合提供了另一种途径。
{"title":"Polarization-induced magnetoelectric effect in Fe3Ga/HfO2/Fe3Ga heterojunction","authors":"Zhijian He, Daifeng Zou, Qiong Yang, Tianpeng Duan, Yingjun Tan, Chihou Lei, Shuhong Xie and Yunya Liu","doi":"10.35848/1882-0786/ad0db8","DOIUrl":"https://doi.org/10.35848/1882-0786/ad0db8","url":null,"abstract":"Fe3Ga/HfO2/Fe3Ga heterojunction possesses reasonable lattice mismatch and good ferroelectric at the nanoscale. However, its magnetoelectric coupling is unexplored. Based on the first-principles calculations, we demonstrate that the magnetoelectric coupling in Fe3Ga/HfO2/Fe3Ga heterojunction is induced by polarization, which is different from the common strain-mediated magnetoelectric effect. The polarization-induced magnetoelectric effect of heterojunction is explained by the analyses of orbital-resolved density of states and spin densities, finding that the interfaces between Fe3Ga and HfO2 play an important role in magnetoelectric coupling, offering an alternative pathway for generating magnetoelectric coupling at room temperature.","PeriodicalId":8093,"journal":{"name":"Applied Physics Express","volume":"43 3","pages":""},"PeriodicalIF":2.3,"publicationDate":"2023-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"138509371","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Analysis and measurement of high frequency piezoelectric ring resonator 高频压电环形谐振器的分析与测量
IF 2.3 4区 物理与天体物理 Q3 PHYSICS, APPLIED Pub Date : 2023-11-27 DOI: 10.35848/1882-0786/ad1003
Tingting Yang, Yao Cai, Chao Gao, Qinwen Xu, Yang Zou, Yan Liu, Wenjuan Liu, Cheng Lei, Chengliang Sun
This paper introduces a piezoelectric ring resonator, comprising a Mo-ScAlN-Mo sandwich structure and shaped into a ring with a hollow center. The vibrational modes of the resonator are elucidated through simulation and theoretical analysis, and the impact of diverse geometric parameters on the resonant frequency is explored. A high frequency resonator with a resonance frequency of 4.168 GHz has been fabricated. The electrical parameters of this resonator are extracted by fitting the Modified Butterworth-Van Dyke (MBVD) equivalent circuit model and the measured results. This work establishes a theoretical foundation for designing resonators with adjustable frequencies on a single wafer.
本文介绍了一种压电环形谐振器,它由 Mo-ScAlN-Mo 夹层结构组成,并被塑造成一个中心中空的环形。通过模拟和理论分析阐明了谐振器的振动模式,并探讨了不同几何参数对谐振频率的影响。共振频率为 4.168 GHz 的高频谐振器已经制作完成。通过拟合修正巴特沃斯-范戴克(MBVD)等效电路模型和测量结果,提取了该谐振器的电气参数。这项工作为在单晶圆上设计频率可调的谐振器奠定了理论基础。
{"title":"Analysis and measurement of high frequency piezoelectric ring resonator","authors":"Tingting Yang, Yao Cai, Chao Gao, Qinwen Xu, Yang Zou, Yan Liu, Wenjuan Liu, Cheng Lei, Chengliang Sun","doi":"10.35848/1882-0786/ad1003","DOIUrl":"https://doi.org/10.35848/1882-0786/ad1003","url":null,"abstract":"This paper introduces a piezoelectric ring resonator, comprising a Mo-ScAlN-Mo sandwich structure and shaped into a ring with a hollow center. The vibrational modes of the resonator are elucidated through simulation and theoretical analysis, and the impact of diverse geometric parameters on the resonant frequency is explored. A high frequency resonator with a resonance frequency of 4.168 GHz has been fabricated. The electrical parameters of this resonator are extracted by fitting the Modified Butterworth-Van Dyke (MBVD) equivalent circuit model and the measured results. This work establishes a theoretical foundation for designing resonators with adjustable frequencies on a single wafer.","PeriodicalId":8093,"journal":{"name":"Applied Physics Express","volume":"50 1","pages":""},"PeriodicalIF":2.3,"publicationDate":"2023-11-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139234794","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Concentration monitoring through a refractive index compass based on metasurface 基于超表面的折射率罗经浓度监测
4区 物理与天体物理 Q3 PHYSICS, APPLIED Pub Date : 2023-11-14 DOI: 10.35848/1882-0786/ad0c79
Wenjie Sun, Yikai Chen, Xilong Liu, Junfeng Li, Zekai Wang, Shijun Zhu, Zhonghua Shen
Abstract We have designed a directly-displayed refractive index detection chip based on an ultra-thin rotating metal nanopillars. When environments fluctuate, it can focus the detection signal on different directions as designed. This refractive index compass can be easily attached to conventional portable devices due to its compact structure, and has a wide adjustable working range. By utilizing multiple sets of phase information contained in a single metasurface, the environmental refractive index on surface or solution concentration can be accurately determined by observing the position and color of the focal point under dual wavelength common incidence.
摘要设计了一种基于超薄旋转金属纳米柱的直显式折射率检测芯片。当环境波动时,它可以根据设计将检测信号聚焦到不同的方向。该折射率罗盘结构紧凑,可方便地安装在传统的便携式设备上,工作范围可调。利用单个超表面包含的多组相位信息,通过观察双波长共入射下焦点的位置和颜色,可以准确地确定表面或溶液浓度上的环境折射率。
{"title":"Concentration monitoring through a refractive index compass based on metasurface","authors":"Wenjie Sun, Yikai Chen, Xilong Liu, Junfeng Li, Zekai Wang, Shijun Zhu, Zhonghua Shen","doi":"10.35848/1882-0786/ad0c79","DOIUrl":"https://doi.org/10.35848/1882-0786/ad0c79","url":null,"abstract":"Abstract We have designed a directly-displayed refractive index detection chip based on an ultra-thin rotating metal nanopillars. When environments fluctuate, it can focus the detection signal on different directions as designed. This refractive index compass can be easily attached to conventional portable devices due to its compact structure, and has a wide adjustable working range. By utilizing multiple sets of phase information contained in a single metasurface, the environmental refractive index on surface or solution concentration can be accurately determined by observing the position and color of the focal point under dual wavelength common incidence.","PeriodicalId":8093,"journal":{"name":"Applied Physics Express","volume":"4 2","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-11-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134954400","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Acoustic collimation based on an ultra-thin metasurface 基于超薄超表面的声学准直
4区 物理与天体物理 Q3 PHYSICS, APPLIED Pub Date : 2023-11-13 DOI: 10.35848/1882-0786/ad0c05
Rui Tian, Hao Zhou, Jie Hu
Abstract How to modulate the acoustic waves at small scales has been an area of intense investigation. In this paper, an artificial ultrathin structure with a series of zigzag-shaped grooves located in the center and bilateral symmetry is designed to realize ultra-strong directional collimated acoustic beams. The simulations agree well with the theoretical analysis and show that the acoustic collimated structure has high directivity at the resonant frequency with the beam length exceeding 40 wavelengths. The structure has deep subwavelength scales and simple design, which are expected to have applications in fields like directional acoustic radiation, medical ultrasound detection, et
如何在小尺度上调制声波一直是一个研究热点。本文设计了一种人造超薄结构,其中心有一系列之字形凹槽,两侧对称,实现了超强定向准直声束。仿真结果与理论分析吻合较好,表明声准直结构在光束长度超过40波长的谐振频率处具有较高的指向性。该结构具有较深的亚波长尺度和简单的设计,有望在定向声辐射、医用超声检测等领域得到应用
{"title":"Acoustic collimation based on an ultra-thin metasurface","authors":"Rui Tian, Hao Zhou, Jie Hu","doi":"10.35848/1882-0786/ad0c05","DOIUrl":"https://doi.org/10.35848/1882-0786/ad0c05","url":null,"abstract":"Abstract How to modulate the acoustic waves at small scales has been an area of intense investigation. In this paper, an artificial ultrathin structure with a series of zigzag-shaped grooves located in the center and bilateral symmetry is designed to realize ultra-strong directional collimated acoustic beams. The simulations agree well with the theoretical analysis and show that the acoustic collimated structure has high directivity at the resonant frequency with the beam length exceeding 40 wavelengths. The structure has deep subwavelength scales and simple design, which are expected to have applications in fields like directional acoustic radiation, medical ultrasound detection, et","PeriodicalId":8093,"journal":{"name":"Applied Physics Express","volume":"53 4","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-11-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"136281916","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
期刊
Applied Physics Express
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