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Ordering in second stage alkali-metal-graphite intercalation compounds 第二阶段碱金属-石墨插层化合物的排序
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90202-8
G.R.S. Naylor

The two-dimensional ordering in second stage alkali-metal-graphite intercalation compounds is investigated. It is shown that all hexagonal incommensurate metal lattices form commensurate superlattices. Using this, the observed orientational ordering is modelled by the simple condition that the experimental structure is a superlattice with a local minimum (varying the incommensurate lattice dimension) of the average distance of the metal atom from its nearest graphite hexagon centre. This approach is used in a detailed study of the diffraction pattern of the low temperature phase of second stage rubidium graphite.

研究了第二阶段碱金属-石墨插层化合物的二维有序结构。结果表明,所有的六方不相称金属晶格都能形成相称的超晶格。利用这一点,观察到的取向有序可以通过一个简单的条件来模拟,即实验结构是一个超晶格,其局部最小值(改变不相称的晶格尺寸)是金属原子到最近的石墨六边形中心的平均距离。用这种方法对铷石墨低温相的衍射图进行了详细的研究。
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引用次数: 0
Low-loss waveguiding in ion-assisted-deposited thin films 离子辅助沉积薄膜中的低损耗波导
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90198-9
L.N. Binh, R.P. Netterfield, P.J. Martin

Reduction in the scattering losses of ZrO2, Al2O3, CeO2 and Ta2O5 waveguides fabricated on BK-7 glass substrates using ion-assisted evaporation techniques has been achieved. The lowest losses have been observed for an Al2O3 ion-assisted film using 1200 eV O21. These losses are of the order of 2–5 dB cm−1 and compare with > 15–20 dB cm1 for evaporated guides produced without ion assistance.

利用离子辅助蒸发技术,在BK-7玻璃衬底上制备的ZrO2、Al2O3、CeO2和Ta2O5波导的散射损耗降低。用1200 eV O21制备的Al2O3离子辅助薄膜的损耗最小。这些损耗在2-5 dB cm−1量级,与>15-20 dB cm2的蒸发指南生产没有离子协助。
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引用次数: 17
Profiling of hydrogen in a-Si:H by the H(19F,αγ)16O∗ reaction 用H(19F,αγ)16O *反应分析a-Si:H中的氢
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90223-5
S.H. Sie, D.R. McKenzie, G.B. Smith

The resonant reaction H(19F,αγ)16O was used to study the hydrogen content and distribution with depth in a-Si : H films. The films were prepared in a DC magnetron by glow discharge decomposition of silane at a pressure of 1 Pa. The results showed that a surface hydrogen peak was present for a film prepared at 310°C but disappeared when the films were prepared at 370°C. The total hydrogen content was one half of that calculated using infrared absorption spectroscopy. RBS was used to determine the film density and scanning electron microscopy was used to investigate microstructure.

采用共振反应H(19F,αγ)16O∗研究了a-Si: H薄膜中氢的含量和随深度的分布。在直流磁控管中,在1 Pa的压力下对硅烷进行辉光放电分解,制备了薄膜。结果表明,在310℃下制备的薄膜表面存在氢峰,而在370℃下制备的薄膜表面氢峰消失。总氢含量是用红外吸收光谱法计算的一半。用RBS测定膜密度,用扫描电镜观察微观结构。
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引用次数: 6
High resolution electron microscopic studies of the oxidation process of ZnTe films ZnTe薄膜氧化过程的高分辨电镜研究
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90192-8
Chihiro Kaito, Nobuyuki Nakamura, Yoshio Saito

ZnTe films of about 15 nm thickness were prepared by vacuum deposition from ZnTe power onto NaCl substrates heated to 300°C. Zinc oxide particles with a size of 5 nm which were formed on the surface of ZnTe crystals showed no epitaxial relationship with the latter. Tellurium crystals appeared on certain parts of the ZnTe crystals with specific epitaxial relationships such as (0111)[1010]Te(111)[110]ZnTe and (0111)[1010]Te(0001)[1010]ZnTe. Oxidation of the (110) surfaces of ZnTe crystals are slower than for any other plane. Images of the (110) films at an initial stage of oxidation contained faint superlattice fringes of about 0.85 nm spacing. On the basis of the matching between the HREM images and computer simulation images, the origin of the fringes was attributed to a periodic array of Zn vacancies introduced by the diffusion of Zn atoms to the surface of the ZnTe crystal.

将ZnTe粉末真空沉积在加热至300℃的NaCl衬底上,制备了厚度约为15 nm的ZnTe薄膜。在ZnTe晶体表面形成5nm大小的氧化锌颗粒,与ZnTe晶体无外延关系。碲晶体以特定的外延关系出现在ZnTe晶体的某些部分,如(0111)[1010]Te(111)[110]ZnTe和(0111)[1010]Te(0001)[1010]ZnTe。ZnTe晶体(110)表面的氧化比其他任何平面都要慢。氧化初期(110)薄膜的图像包含约0.85 nm间距的微弱超晶格条纹。根据HREM图像与计算机模拟图像的匹配,条纹的起源归因于锌原子扩散到ZnTe晶体表面所引入的锌空位的周期性阵列。
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引用次数: 3
An electron energy loss spectroscopic study of ethylene chemisorbed on Pd(110) at 110 K 乙烯在110 K下在Pd(110)上化学吸附的电子能量损失谱研究
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90069-8
Michael A. Chesters, Gordon S. McDougall , Martyn E. Pemble , Norman Sheppard

Adsorption of ethylene on the (110) surface of palladium at 110 K gives rise to two related but clearly distinguishable types of electron energy loss (EEL) spectra corresponding to low and high coverage. Most features in the spectra in both coverage regimes can be interpreted in terms of a π-complex of ethylene with the metal surface. Analysis of the corresponding ethylene-d4 EEL spectra and comparison with infrared, Raman and inelastic neutron scattering data for the analogous ethylene complex, Zeise's salt, supports this assignment. The selection rules applicable to dipole and impact scattering both on- and off-specular are employed to determine the orientation of the π-complexes with respect to the surface. At higher coverages additional loss features are observed. These are interpreted in terms of the presence of a small proportion of σ-diadsorbed ethylene complexes bonded to pairs of metal atoms.

乙烯在钯(110)表面在110 K下的吸附产生了两种相关但明显可区分的电子能量损失(EEL)谱,对应于低覆盖率和高覆盖率。在两种覆盖体系下,光谱中的大部分特征都可以用乙烯与金属表面的π配合物来解释。分析相应的乙烯-d4 EEL光谱,并与类似的乙烯配合物(Zeise’s salt)的红外、拉曼和非弹性中子散射数据进行比较,支持这一指派。适用于偶极子散射和冲击散射的选择规则被用于确定π配合物相对于表面的取向。在较高的覆盖率下,可以观察到额外的损失特征。这些解释是由于存在一小部分的σ-二吸附乙烯配合物与金属原子对结合。
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引用次数: 2
XVV Auger and APS spectra of Fe-Ni alloys Fe-Ni合金的XVV俄歇和APS光谱
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90048-0
G. Cubiotti, F. Sacchetti

The two-hole and the two-electron spectra, which are related to the XVV Auger and to the APS spectra, respectively, have been computed for an Fe-Ni alloy of different compositions. A recently proposed theory has been used which, by means of some approximations, is capable of treating the two-particle spectra of a Hubbard-type Hamiltonian in the important case of a not completely filled valence band. In that situation, the role of the Coulomb repulsion between two particles is quite relevant in determining shifts and broadenings of the spectra. The Coulomb correlation results also in a renormalization of the one-particle spectrum. The results show that, while the Auger spectra are contributed to by both spin up and spin down bands, the APS spectra are contributed to only by spin down bands.

本文计算了一种不同成分的铁镍合金的双空穴能谱和双电子能谱,它们分别与xv俄钻能谱和APS能谱有关。最近提出的一种理论,通过一些近似,能够在价带未完全填充的重要情况下处理哈伯德型哈密顿量的两粒子谱。在这种情况下,两个粒子之间的库仑斥力在确定谱的位移和加宽方面的作用是相当相关的。库仑相关也导致单粒子谱的重整化。结果表明,俄歇谱由自旋上升带和自旋下降带共同贡献,而APS谱只由自旋下降带贡献。
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引用次数: 0
Origin of lone pair binding energy shifts in photoemission from adsorbed molecules: CSOV analysis for the Cu5CO cluster 吸附分子光发射中孤对结合能转移的起源:Cu5CO簇的CSOV分析
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90075-3
P.S. Bagus, K. Hermann

The chemisorptive interaction of the CO/Cu(100) system is studied with a Cu5(1,4)CO cluster model using the constrained space orbital variation (CSOV) analysis. This analysis has been used previously to examine the origin of the CO-metal bond and to show that the energetic importance of the metal to CO π donation is larger than that of the CO to metal σ donation. In the present work, we use it to determine the origin of the differential CO 5σ ionization potential shift observed in the photoemission spectra of CO/Cu(100). This shift is shown to be largely due to electrostatic, environmental potential effects. It does not indicate the nature of the CO-metal bond but does indicate the CO adsorption geometry.

采用约束空间轨道变分(CSOV)方法建立Cu5(1,4)CO簇模型,研究了CO/Cu(100)体系的化学吸附相互作用。这一分析已被用于检验CO-金属键的起源,并表明金属对CO π的能量重要性大于CO对金属σ的能量重要性。在本工作中,我们用它来确定在CO/Cu(100)的光发射光谱中观察到的CO 5σ微分电离势位移的来源。这种转变在很大程度上是由于静电、环境的潜在影响。它不能表明CO-金属键的性质,但可以表明CO的吸附几何形状。
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引用次数: 1
A new method to determine backscattering factors for quantitative Auger analysis 定量俄歇分析中确定后向散射因子的新方法
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90047-9
Q. Wang, Q.J. Zhang, Z.Y. Hua

The backscattering factor is the most important parameter for matrix effect corrections in quantitative Auger analysis. Some of the methods previously published are reviewed. A new method is described for determining the backscattering factor using information provided by the background which is usually ignored in an Auger spectrum. Complicated calculations such as The Monte Carlo method were avoided, and the accuracy might be further improved since both the intensity of Auger electrons and the energy distribution of backscattered electrons were obtained under the same experimental conditions. The results are illustrated by a quantitative analysis of two copper alloys, Au-Cu and Ag-Cu.

在定量俄歇分析中,后向散射系数是修正矩阵效应的最重要参数。对一些已发表的方法进行了综述。本文描述了一种利用背景信息确定后向散射系数的新方法,这种信息在俄歇谱中通常被忽略。避免了蒙特卡罗法等复杂的计算,在相同的实验条件下,得到了俄歇电子的强度和背散射电子的能量分布,可以进一步提高精度。对Au-Cu和Ag-Cu两种铜合金进行了定量分析。
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引用次数: 1
Subsurface compositional modification of Au-Cu alloys sputtered with Ar, Xe, Ne and Kr ions Ar、Xe、Ne和Kr离子溅射Au-Cu合金的亚表面成分改性
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90043-1
T. Koshikawa

Surface and subsurface compositional changes in Au-Cu alloys and thin films sputtered with 2 keV Ar, Xe, Ne and Kr ions were observed with low energy (60 eV for Cu and 69 eV for Au) and high energy (239 eV for Au and 920 eV for Cu) Auger peaks at temperatures between liquid nitrogen and room temperature. For a Au0.56Cu0.44 alloy, Au enrichment at the surface and depletion beneath the surface was observed with high energy as well as low energy Auger peaks. But the compositional change assessed with low energy Auger peaks is greater than that assessed with high energy peaks. This was also calculated with the simulation of sputtering including ion radiation-enhanced segregation and diffusion. This shows clearly that the Gibbsian segregation plays an important role in composition changes at the surface and subsurface of the ion-sputtered alloy. Compositional changes of Au-Cu thin film alloys prepared by the co-evaporation technique were also observed following sputtering with Ar, Xe, Ne and Kr. Except in the case of Xe, the coevaporated composition was preserved during sputtering at low temperatures (<-120°C).

以2 keV Ar、Xe、Ne和Kr离子溅射的Au-Cu合金和薄膜,在液氮和室温之间的温度下,出现了低能(Cu为60 eV, Au为69 eV)和高能(Au为239 eV, Cu为920 eV)的俄钻峰,表面和亚表面成分发生了变化。对于Au0.56Cu0.44合金,在表面上观察到Au的富集,而在表面下观察到Au的耗尽,并观察到高能量和低能的俄歇峰。但低能量俄歇峰评价的成分变化大于高能量俄歇峰评价的成分变化。这也计算了模拟溅射,包括离子辐射增强的偏析和扩散。这清楚地表明,吉本氏偏析在离子溅射合金表面和亚表面成分变化中起着重要的作用。用Ar、Xe、Ne和Kr溅射制备的Au-Cu薄膜合金,在低温(<-120℃)溅射过程中,除Xe外,其余共蒸发成分均保持不变。
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引用次数: 0
Epitaxial growth of C40 structure silicides on (111)Si C40结构硅化物在(111)Si上的外延生长
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90183-7
H.C. Cheng, W.T. Lin, C.J. Chien, F.Y. Shiau, L.J. Chen

C40-type, hexagonal VSi2, MoSi2 and WSi2 have been grown epitaxially on (111)Si. V, Mo or W thin films, 250–300 rA in thickness, were electron gun deposited on (111)Si. Epitaxial growth of metal disilicides were induced by thermal annealing in vacuum. For VSi2 on (111)Si, epitaxial regions, 1–2 μm in size, were found to grow in samples 400–1000°C two-step annealed. MoSi2 grains, 0.2–2 μm in size, were observed to grow epitaxially on (111)Si following 1100°C annealing. WSi2 epitaxy, 0.4–1.2 μm in size, on (111)Si was obtained in samples annealed at 1050–1100°C. The orientation relationships between these metal silicides MSi2 and substrate Si were determined to be (0001)MSi2(111)Si, (2240)MSi2(224)Si and (2020)MSi2(202)Si. Regular interfacial dislocation networks were observed at silicides/Si interfaces. The dislocations were identified to be of edge type with 61〈112〉 Burgers vectors. The average spacings of dislocations are 250, 100 and 40 Å for VSi2/Si, MoSi2/Si and WSi2/Si systems, respectively. The disparities in dislocation spacings are attributed to the differences in lattice mismatches and thermal expansion coefficients among these silicide/Si systems. The discovery of a number of new epitaxial silicides presents the exciting possibilities that novel devices with desirable characteristics may be realized.

c40型、六边形VSi2、MoSi2和WSi2在(111)Si上外延生长。用电子枪在(111)Si表面沉积了厚度为250 ~ 300 rA的V、Mo或W薄膜。采用真空热退火方法诱导金属二硅化物外延生长。对于VSi2 on (111)Si,在400-1000°C两步退火的样品中生长出1-2 μm大小的外延区。在1100℃退火后,在(111)Si表面生长出0.2 ~ 2 μm的MoSi2晶粒。在1050 ~ 1100℃退火后,在(111)Si表面得到了尺寸为0.4 ~ 1.2 μm的WSi2外延。测定了金属硅化物MSi2与衬底Si的取向关系为(0001)MSi2(111)Si、(2240)MSi2(224)Si和(2020)MSi2(202)Si。在硅化物/硅界面上观察到规则的界面位错网络。位错为61 < 112 > Burgers向量的边缘型位错。VSi2/Si、MoSi2/Si和WSi2/Si体系的位错平均间距分别为250、100和40 Å。位错间距的差异归因于这些硅化物/硅体系中晶格失配和热膨胀系数的差异。许多新的外延硅化物的发现为实现具有理想特性的新型器件提供了令人兴奋的可能性。
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引用次数: 4
期刊
Applications of Surface Science
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