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Origin of lone pair binding energy shifts in photoemission from adsorbed molecules: CSOV analysis for the Cu5CO cluster 吸附分子光发射中孤对结合能转移的起源:Cu5CO簇的CSOV分析
Pub Date : 1985-05-01 Epub Date: 2003-09-26 DOI: 10.1016/0378-5963(85)90075-3
P.S. Bagus, K. Hermann

The chemisorptive interaction of the CO/Cu(100) system is studied with a Cu5(1,4)CO cluster model using the constrained space orbital variation (CSOV) analysis. This analysis has been used previously to examine the origin of the CO-metal bond and to show that the energetic importance of the metal to CO π donation is larger than that of the CO to metal σ donation. In the present work, we use it to determine the origin of the differential CO 5σ ionization potential shift observed in the photoemission spectra of CO/Cu(100). This shift is shown to be largely due to electrostatic, environmental potential effects. It does not indicate the nature of the CO-metal bond but does indicate the CO adsorption geometry.

采用约束空间轨道变分(CSOV)方法建立Cu5(1,4)CO簇模型,研究了CO/Cu(100)体系的化学吸附相互作用。这一分析已被用于检验CO-金属键的起源,并表明金属对CO π的能量重要性大于CO对金属σ的能量重要性。在本工作中,我们用它来确定在CO/Cu(100)的光发射光谱中观察到的CO 5σ微分电离势位移的来源。这种转变在很大程度上是由于静电、环境的潜在影响。它不能表明CO-金属键的性质,但可以表明CO的吸附几何形状。
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引用次数: 1
An investigation of the interaction of polycrystalline zirconium with O2, N2, CO and N2O 多晶锆与O2、N2、CO和N2O相互作用的研究
Pub Date : 1985-05-01 Epub Date: 2003-09-26 DOI: 10.1016/0378-5963(85)90057-1
Gar B. Hoflund, Douglas A. Asbury, David F. Cox , Richard E. Gilbert

The chemisorption of oxygen at room temperature on polycrystalline zirconium has been studied using AES and ESCA as a function of sample pretreatment. It is shown that annealing at high temperature greatly reduces the ability of zirconium to chemisorb oxygen but that its activity can be restored by argon-ion bombardment. This suggests that chemisorption may be site specific and that the concentration of these sites can be manipulated by varying sample pretreatment.

采用原子发射光谱法(AES)和原子能谱法(ESCA)研究了常温下氧在多晶锆上的化学吸附。结果表明,高温退火大大降低了锆的化学吸收氧的能力,但氩离子轰击可以恢复其活性。这表明化学吸附可能是位点特异性的,这些位点的浓度可以通过不同的样品预处理来控制。
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引用次数: 3
XVV Auger and APS spectra of Fe-Ni alloys Fe-Ni合金的XVV俄歇和APS光谱
Pub Date : 1985-05-01 Epub Date: 2003-09-26 DOI: 10.1016/0378-5963(85)90048-0
G. Cubiotti, F. Sacchetti

The two-hole and the two-electron spectra, which are related to the XVV Auger and to the APS spectra, respectively, have been computed for an Fe-Ni alloy of different compositions. A recently proposed theory has been used which, by means of some approximations, is capable of treating the two-particle spectra of a Hubbard-type Hamiltonian in the important case of a not completely filled valence band. In that situation, the role of the Coulomb repulsion between two particles is quite relevant in determining shifts and broadenings of the spectra. The Coulomb correlation results also in a renormalization of the one-particle spectrum. The results show that, while the Auger spectra are contributed to by both spin up and spin down bands, the APS spectra are contributed to only by spin down bands.

本文计算了一种不同成分的铁镍合金的双空穴能谱和双电子能谱,它们分别与xv俄钻能谱和APS能谱有关。最近提出的一种理论,通过一些近似,能够在价带未完全填充的重要情况下处理哈伯德型哈密顿量的两粒子谱。在这种情况下,两个粒子之间的库仑斥力在确定谱的位移和加宽方面的作用是相当相关的。库仑相关也导致单粒子谱的重整化。结果表明,俄歇谱由自旋上升带和自旋下降带共同贡献,而APS谱只由自旋下降带贡献。
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引用次数: 0
Epitaxy at {111}fcc/{110}bcc metal interfaces {111}fcc/{110}bcc金属界面的外延
Pub Date : 1985-05-01 Epub Date: 2003-02-10 DOI: 10.1016/0378-5963(85)90185-0
Jan H. Van Der Merwe, M.W.H. Braun

This paper reviews a theory that justifies “lattice match” assumptions in epitaxy and the application of the theory to epitaxy at {111}fcc/{110}bcc metal interfaces. The basic assumptions of the model are (i) that the adatom-substrate interaction has the periodicity and symmetry of the substrate surface, (ii) that the overlayer is crystalline, (iii) that the adatom-adatom interaction is harmonic and (iv) that the ideal epitaxial configurations are the same as for rigid half crystals. The theory correlates epitaxy with lattice match and predicts the occurrence of the Nishiyama-Wassermann and Kurdjumov-Sachs orientations in thick overlayers with astonishing accuracy. In thin overlayers there is good qualitative agreement with empirical data. The theory stresses the need for quantifying the Fourier coefficients.

本文综述了在{111}fcc/{110}bcc金属界面外延中证明“晶格匹配”假设的理论以及该理论在外延中的应用。该模型的基本假设是:(i) adatom-adatom相互作用具有衬底表面的周期性和对称性,(ii)覆盖层是结晶的,(iii) adatom-adatom相互作用是谐波的,(iv)理想的外延结构与刚性半晶体相同。该理论将外延与晶格匹配联系起来,并以惊人的精度预测了厚覆层中Nishiyama-Wassermann和Kurdjumov-Sachs取向的发生。在薄覆盖层中,与经验数据有很好的定性一致性。该理论强调了量化傅里叶系数的必要性。
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引用次数: 22
Low energy ion scattering of clean and oxygen-covered Ni(110) 清洁和氧覆盖Ni(110)的低能离子散射
Pub Date : 1985-05-01 Epub Date: 2003-09-26 DOI: 10.1016/0378-5963(85)90041-8
P. Higginbottom, J. Homer, D.J. O'Connor, R.J. MacDonald

Low energy ion scattering can provide atom location and structural information from a number of different measurements. Low angle scattering can yield information on atom location and surface crystallography from the measurement of the azimuthal angular distribution of scattered particles. Large angle backscattering provides a direct measurement of shadow cone geometry and combined with the angular dependence of the backscattered yield, this large angle scattering event can provide accurate information on the surface structure. Studies of the angular distribution of recoil ions from the surface can also provide information on the site from which the recoil came. These three techniques have been applied to the study of the Ni(110) surface and to oxygen adsorption on that surface. A comparison of the information available from each technique is presented.

低能离子散射可以从许多不同的测量中提供原子位置和结构信息。低角散射可以通过测量散射粒子的方位角分布来获得原子位置和表面晶体学的信息。大角度后向散射提供了一种直接测量阴影锥几何形状的方法,并结合后向散射产率的角度依赖性,这种大角度散射事件可以提供精确的表面结构信息。对反冲离子从表面的角度分布的研究也可以提供反冲产生的位置的信息。这三种技术已应用于Ni(110)表面及其氧吸附的研究。对每种技术的可用信息进行了比较。
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引用次数: 0
Derivation of charge transfer parameters at semiconductor-liquid interfaces 半导体-液体界面电荷转移参数的推导
Pub Date : 1985-05-01 Epub Date: 2003-02-10 DOI: 10.1016/0378-5963(85)90242-9
S. Hinckley , D. Haneman

The excess-carrier charge transfer velocity, υcp, is an important parameter describing the efficiency of charge transfer across a solid-liquid interface. By using recent theory to analyze current-voltage curves of photoelectrochemical cells, we have been able to derive values of υcp for CdSe films in aqueous polysulfide electrolytes and measure the effects of varying the sulfur concentration. The parameter, υcp, is found to vary at short circuit conditions, from 1.2 × 106 to 1.36 × 106 cm s−1 on increasing the sulfur concentration from 0 to 3.0M. In addition it has been found that υvp has only a weak voltage dependence described by an equation linear in voltage.

过量载流子电荷转移速度(cp)是描述电荷在固液界面转移效率的重要参数。利用最新的理论分析了光电化学电池的电流-电压曲线,得到了CdSe薄膜在多硫化物水溶液中的 cp值,并测量了硫浓度变化的影响。在短路条件下,当硫浓度从0增加到3.0M时,参数 cp变化从1.2 × 106到1.36 × 106 cm s−1。此外,还发现,在电压线性方程中, vp只有微弱的电压依赖性。
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引用次数: 3
Thin film CdS/CdTe solar cells 薄膜CdS/CdTe太阳能电池
Pub Date : 1985-05-01 Epub Date: 2003-02-10 DOI: 10.1016/0378-5963(85)90243-0
W.J. Danaher, L.E. Lyons, G.C. Morris

The effects of processes used in making thin film ITO/CdS/CdTe/Au heterojunction solar cells have been investigated. In particular, air annealing the ITO/CdS/CdTe layer is shown, from spectral evidence, to produce a heterojunction. XPS evidence shows that this heating forms CdO and TeO2 on the CdTe surface and that these are removed by a KOH etch. A further bromine/methanol etch leaves a Te-rich surface which forms an injecting contact with the Au top electrode into which the Te mixes.

研究了ITO/CdS/CdTe/Au薄膜异质结太阳能电池制备工艺的影响。特别是,从光谱证据来看,ITO/CdS/CdTe层的空气退火可以产生异质结。XPS证据表明,这种加热在CdTe表面形成了CdO和TeO2,这些被KOH蚀刻去除。进一步的溴/甲醇蚀刻留下富Te的表面,与Au顶部电极形成注入接触,Te混合在其中。
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引用次数: 19
Long-range force and interfacial energy between dissimilar metals 异种金属间的远程力和界面能
Pub Date : 1985-05-01 Epub Date: 2003-02-10 DOI: 10.1016/0378-5963(85)90239-9
N.H. March, B.V. Paranjape

The Lifshitz theory is applied to calculate the long-range dispersion force between two semi-infinite half planes of dissimilar metals. It is shown that the asymptotic form of the force F, for large separation d between the half planes is F = C12/d3, where an explicit expression is given for C12 in terms of the two plasma frequencies ωp2 and ωp1 of the interacting metals. Attention is then given to the contributions to the interfacial energy of the composite system. In an ideal situation, in which the two metals had (a) the same crystal structure, (b) identical lattice parameters and (c) no charge transfer, the interfacial energy is the sum σ1 + σ2 of the surface energies of the two pure metals involved. It is argued that the charge transfer contribution (c) takes the form (ΔW)2/ρ2lc, where ΔW is the difference in work functions of the two pure metals and lc is a characteristic length. Contributions arising from departures for ideal lattice matching, embodied in point (b) above can be estimated from the isothermal compressibility, κT, of the pure metals. Further, invoking for a pure metal the known approximate relation that σκT ∼ 1 Å. this lattice mismatch contribution is expressed again in terms of surface energies. It will usually alter the contribution σ1 + σ2 of ine interfacial energy by a multiplying factor less than, but quite near to unity.

应用Lifshitz理论计算了不同金属的半无限半平面间的长程色散力。结果表明,对于半平面之间的大间距d,力F的渐近形式为F = C12/d3,其中C12用相互作用金属的两个等离子体频率ωp2和ωp1给出了显式表达式。然后注意对复合体系界面能的贡献。在两种金属(a)晶体结构相同,(b)晶格参数相同,(c)无电荷转移的理想情况下,界面能为两种纯金属表面能的σ1 + σ2之和。认为电荷转移贡献(c)的形式为(ΔW)2/ρ2lc,其中ΔW为两种纯金属的功函数之差,lc为特征长度。由理想晶格匹配的偏离所产生的贡献,体现在上面(b)点,可以从纯金属的等温压缩率κT来估计。进一步,对纯金属调用已知的近似关系σκT ~ 1 Å。这种晶格失配的贡献再次用表面能表示。它通常会改变线界面能的贡献σ1 + σ2,其倍数小于,但非常接近于1。
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引用次数: 1
Subsurface compositional modification of Au-Cu alloys sputtered with Ar, Xe, Ne and Kr ions Ar、Xe、Ne和Kr离子溅射Au-Cu合金的亚表面成分改性
Pub Date : 1985-05-01 Epub Date: 2003-09-26 DOI: 10.1016/0378-5963(85)90043-1
T. Koshikawa

Surface and subsurface compositional changes in Au-Cu alloys and thin films sputtered with 2 keV Ar, Xe, Ne and Kr ions were observed with low energy (60 eV for Cu and 69 eV for Au) and high energy (239 eV for Au and 920 eV for Cu) Auger peaks at temperatures between liquid nitrogen and room temperature. For a Au0.56Cu0.44 alloy, Au enrichment at the surface and depletion beneath the surface was observed with high energy as well as low energy Auger peaks. But the compositional change assessed with low energy Auger peaks is greater than that assessed with high energy peaks. This was also calculated with the simulation of sputtering including ion radiation-enhanced segregation and diffusion. This shows clearly that the Gibbsian segregation plays an important role in composition changes at the surface and subsurface of the ion-sputtered alloy. Compositional changes of Au-Cu thin film alloys prepared by the co-evaporation technique were also observed following sputtering with Ar, Xe, Ne and Kr. Except in the case of Xe, the coevaporated composition was preserved during sputtering at low temperatures (<-120°C).

以2 keV Ar、Xe、Ne和Kr离子溅射的Au-Cu合金和薄膜,在液氮和室温之间的温度下,出现了低能(Cu为60 eV, Au为69 eV)和高能(Au为239 eV, Cu为920 eV)的俄钻峰,表面和亚表面成分发生了变化。对于Au0.56Cu0.44合金,在表面上观察到Au的富集,而在表面下观察到Au的耗尽,并观察到高能量和低能的俄歇峰。但低能量俄歇峰评价的成分变化大于高能量俄歇峰评价的成分变化。这也计算了模拟溅射,包括离子辐射增强的偏析和扩散。这清楚地表明,吉本氏偏析在离子溅射合金表面和亚表面成分变化中起着重要的作用。用Ar、Xe、Ne和Kr溅射制备的Au-Cu薄膜合金,在低温(<-120℃)溅射过程中,除Xe外,其余共蒸发成分均保持不变。
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引用次数: 0
Transition density of states for cleaved and excited-oxygen exposed surfaces of Ge(111) derived from the M2,3M4,5V Auger transition 由M2,3M4,5V俄歇跃迁得到的Ge(111)劈裂面和受激氧暴露面态的跃迁密度
Pub Date : 1985-05-01 Epub Date: 2003-09-26 DOI: 10.1016/0378-5963(85)90049-2
R.H. Brockman, G.J. Russell

The M2,3M4,5V Auger transition obtained from vacuum-cleaved Ge(111) surfaces has been debroadened to remove inelastic scattering, instrumental effects and core level lifetime broadening. The resultant spectrum was further separated into its component - M2M4,5V, M3M4,5V - transitions to obtain the transition density of states function (TDOS). For the 15.3 eV wide valence band, four definite peaks were found at -4.3, -8.0, -11.9 and -13.7 eV and the main TDOS peak at - 4.3 eV is at variance with the accepted bulk value of approximately - 2.7 eV (analogous to previous silicon results). Detailed AES measurements for excited-oxygen exposed cleaved germanium surfaces are also reported. For oxygen exposures in the range 0.1 to 103 L a continuous shift was observed in the negative excursion of the M2,3M4,5V [N'(E)] transition and the derived TDOS curves showed that a number of oxygen-induced peaks appeared at well-defined energies, -7.7, -8.4, -11.3, -13.5, -14.9, -17.8 and -19.7 eV, below the vacuum level. Three of these peaks, -11.3, -14.9 and -19.7 eV, are consistent with GeO2 formation. For the range of exposures studied, the valence-band spectroscopic data reported have been interpreted as showing the simultaneous existence of both atomic and molecular chemisorption states and their coexistence with GeO2 formation during the early oxidation stage.

从真空切割的Ge(111)表面得到的M2,3M4,5V俄歇跃迁被去宽,以消除非弹性散射,仪器效应和芯能级寿命延长。将所得光谱进一步分离为M2M4,5V, M3M4,5V -跃迁分量,得到态函数的跃迁密度(TDOS)。对于15.3 eV宽的价带,在-4.3、-8.0、-11.9和-13.7 eV处发现了四个确定的峰,并且-4.3 eV处的主要TDOS峰与约- 2.7 eV的可接受体积值存在差异(类似于先前硅的结果)。详细的AES测量激发态氧暴露的切割锗表面也报道。在0.1 ~ 103 L的氧暴露范围内,M2,3M4,5V [N'(E)]跃迁的负偏移连续变化,导出的TDOS曲线显示,在真空水平以下,在-7.7,-8.4,-11.3,-13.5,-14.9,-17.8和-19.7 eV的明确能量处出现了许多氧诱导峰。其中-11.3、-14.9和-19.7 eV三个峰与GeO2的形成一致。对于所研究的暴露范围,所报告的价带光谱数据被解释为表明原子和分子化学吸附状态同时存在,并且在氧化早期阶段与GeO2的形成共存。
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引用次数: 1
期刊
Applications of Surface Science
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