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Epitaxy at {111}fcc/{110}bcc metal interfaces {111}fcc/{110}bcc金属界面的外延
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90185-0
Jan H. Van Der Merwe, M.W.H. Braun

This paper reviews a theory that justifies “lattice match” assumptions in epitaxy and the application of the theory to epitaxy at {111}fcc/{110}bcc metal interfaces. The basic assumptions of the model are (i) that the adatom-substrate interaction has the periodicity and symmetry of the substrate surface, (ii) that the overlayer is crystalline, (iii) that the adatom-adatom interaction is harmonic and (iv) that the ideal epitaxial configurations are the same as for rigid half crystals. The theory correlates epitaxy with lattice match and predicts the occurrence of the Nishiyama-Wassermann and Kurdjumov-Sachs orientations in thick overlayers with astonishing accuracy. In thin overlayers there is good qualitative agreement with empirical data. The theory stresses the need for quantifying the Fourier coefficients.

本文综述了在{111}fcc/{110}bcc金属界面外延中证明“晶格匹配”假设的理论以及该理论在外延中的应用。该模型的基本假设是:(i) adatom-adatom相互作用具有衬底表面的周期性和对称性,(ii)覆盖层是结晶的,(iii) adatom-adatom相互作用是谐波的,(iv)理想的外延结构与刚性半晶体相同。该理论将外延与晶格匹配联系起来,并以惊人的精度预测了厚覆层中Nishiyama-Wassermann和Kurdjumov-Sachs取向的发生。在薄覆盖层中,与经验数据有很好的定性一致性。该理论强调了量化傅里叶系数的必要性。
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引用次数: 22
High-rate hollow-cathode amorphous silicon deposition 高速空心阴极非晶硅沉积
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90225-9
Chris M. Horwitz, David R. McKenzie

Amorphous silicon has been deposited at high rates using an RF-excited hollow cathode. Films of 0.6 μm have been formed in 6 min, thus overcoming an important barrier to economic fabrication of amorphous silicon devices. In addition, the films are resistant to abrasion, which may be a consequence of the extremely high ion bombardment which the growing films are subject to. Infrared spectra have confirmed that the bonding of hydrogen is predominantly in the preferred monohydride form, without any external substrate heating.

利用射频激发空心阴极以高速率沉积非晶硅。在6分钟内形成了0.6 μm的薄膜,从而克服了经济制造非晶硅器件的重要障碍。此外,薄膜耐磨损,这可能是生长薄膜所受到的极高离子轰击的结果。红外光谱证实,在没有任何外部衬底加热的情况下,氢的键合主要以首选的一氢化物形式进行。
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引用次数: 6
Thin film CdS/CdTe solar cells 薄膜CdS/CdTe太阳能电池
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90243-0
W.J. Danaher, L.E. Lyons, G.C. Morris

The effects of processes used in making thin film ITO/CdS/CdTe/Au heterojunction solar cells have been investigated. In particular, air annealing the ITO/CdS/CdTe layer is shown, from spectral evidence, to produce a heterojunction. XPS evidence shows that this heating forms CdO and TeO2 on the CdTe surface and that these are removed by a KOH etch. A further bromine/methanol etch leaves a Te-rich surface which forms an injecting contact with the Au top electrode into which the Te mixes.

研究了ITO/CdS/CdTe/Au薄膜异质结太阳能电池制备工艺的影响。特别是,从光谱证据来看,ITO/CdS/CdTe层的空气退火可以产生异质结。XPS证据表明,这种加热在CdTe表面形成了CdO和TeO2,这些被KOH蚀刻去除。进一步的溴/甲醇蚀刻留下富Te的表面,与Au顶部电极形成注入接触,Te混合在其中。
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引用次数: 19
An investigation of the interaction of polycrystalline zirconium with O2, N2, CO and N2O 多晶锆与O2、N2、CO和N2O相互作用的研究
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90057-1
Gar B. Hoflund, Douglas A. Asbury, David F. Cox , Richard E. Gilbert

The chemisorption of oxygen at room temperature on polycrystalline zirconium has been studied using AES and ESCA as a function of sample pretreatment. It is shown that annealing at high temperature greatly reduces the ability of zirconium to chemisorb oxygen but that its activity can be restored by argon-ion bombardment. This suggests that chemisorption may be site specific and that the concentration of these sites can be manipulated by varying sample pretreatment.

采用原子发射光谱法(AES)和原子能谱法(ESCA)研究了常温下氧在多晶锆上的化学吸附。结果表明,高温退火大大降低了锆的化学吸收氧的能力,但氩离子轰击可以恢复其活性。这表明化学吸附可能是位点特异性的,这些位点的浓度可以通过不同的样品预处理来控制。
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引用次数: 3
Effect of different methods of oxidation on SiSiO2 interface state properties 不同氧化方法对SiSiO2界面态性质的影响
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90231-4
J. Majhi, D.Krishna Rao

Three different methods of oxidation - thermal, TCE, and anodic — were applied to n-type (111) silicon 10 ohm cm resistivity samples. MOS test samples were fabricated and their interface state properties were characterized by C-V and AC field effect techniques. From C-V measurements the interface state density at mid gap was found to be less in TCE (2 × 1010 cm−2 eV−1) and anodic (1 × 1010 cm−2 eV−1) samples than in dry (5 × 1010 cm−2 eV−1) oxidized samples. The mobile charges were also less in TCE (2 × 1010 cm−2) and anodic (5 × 1010 cm−2) samples. Using the AC field effect technique, the frequency (2–100 kHz) and temperature dependence of field effect mobility, μFE, were studied. By applying Garrett's theory of frequency dependence of μFE, the relaxation times of interface states were found to vary from 30 to 3 μs in dry, 8 to 4 μs in TCE, and 4.5 to 1.5 μs in anodic samples in the temperature range 230 to 370 K. Using Rupprecht's theory of temperature dependence of relaxation times, thedominant energy levels, Ec - ET, were found to be shallower in TCE (0.04 eV) and anodic (0.06 eV) than in dry (0.1 eV) oxidized samples. The capture cross-section of these samples was found to be small, in the range 10−20 to 10−21 cm2. In TCE and anodic samples the shallow interface state levels indicate stronger interactions between silicon and oxygen atoms at the interface. The observed low densities of interface states and mobile charges in these samples also show improved passivation of silicon.

采用热氧化、TCE氧化和阳极氧化三种不同的氧化方法对n型(111)硅10欧姆cm电阻率样品进行了氧化处理。制备了MOS测试样品,并用C-V和AC场效应技术对其界面态特性进行了表征。从C-V测量中发现,TCE (2 × 1010 cm−2 eV−1)和阳极(1 × 1010 cm−2 eV−1)样品的中间间隙界面态密度小于干燥(5 × 1010 cm−2 eV−1)氧化样品。TCE (2 × 1010 cm−2)和阳极(5 × 1010 cm−2)样品的移动电荷也较少。利用交流场效应技术,研究了场效应迁移率μFE的频率(2 ~ 100 kHz)和温度依赖性。应用μFE频率依赖理论,在230 ~ 370 K温度范围内,干态样品的界面态弛豫时间为30 ~ 3 μs, TCE样品的界面态弛豫时间为8 ~ 4 μs,阳极样品的界面态弛豫时间为4.5 ~ 1.5 μs。利用Rupprecht的弛豫时间温度依赖理论,发现TCE (0.04 eV)和阳极(0.06 eV)的主导能级Ec - ET比干燥(0.1 eV)氧化样品浅。这些样品的捕获截面很小,在10−20至10−21 cm2的范围内。在TCE和阳极样品中,浅界面态水平表明界面上硅和氧原子之间的相互作用更强。在这些样品中观察到的低密度界面态和移动电荷也表明硅的钝化得到改善。
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引用次数: 0
Transition density of states for cleaved and excited-oxygen exposed surfaces of Ge(111) derived from the M2,3M4,5V Auger transition 由M2,3M4,5V俄歇跃迁得到的Ge(111)劈裂面和受激氧暴露面态的跃迁密度
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90049-2
R.H. Brockman, G.J. Russell

The M2,3M4,5V Auger transition obtained from vacuum-cleaved Ge(111) surfaces has been debroadened to remove inelastic scattering, instrumental effects and core level lifetime broadening. The resultant spectrum was further separated into its component - M2M4,5V, M3M4,5V - transitions to obtain the transition density of states function (TDOS). For the 15.3 eV wide valence band, four definite peaks were found at -4.3, -8.0, -11.9 and -13.7 eV and the main TDOS peak at - 4.3 eV is at variance with the accepted bulk value of approximately - 2.7 eV (analogous to previous silicon results). Detailed AES measurements for excited-oxygen exposed cleaved germanium surfaces are also reported. For oxygen exposures in the range 0.1 to 103 L a continuous shift was observed in the negative excursion of the M2,3M4,5V [N'(E)] transition and the derived TDOS curves showed that a number of oxygen-induced peaks appeared at well-defined energies, -7.7, -8.4, -11.3, -13.5, -14.9, -17.8 and -19.7 eV, below the vacuum level. Three of these peaks, -11.3, -14.9 and -19.7 eV, are consistent with GeO2 formation. For the range of exposures studied, the valence-band spectroscopic data reported have been interpreted as showing the simultaneous existence of both atomic and molecular chemisorption states and their coexistence with GeO2 formation during the early oxidation stage.

从真空切割的Ge(111)表面得到的M2,3M4,5V俄歇跃迁被去宽,以消除非弹性散射,仪器效应和芯能级寿命延长。将所得光谱进一步分离为M2M4,5V, M3M4,5V -跃迁分量,得到态函数的跃迁密度(TDOS)。对于15.3 eV宽的价带,在-4.3、-8.0、-11.9和-13.7 eV处发现了四个确定的峰,并且-4.3 eV处的主要TDOS峰与约- 2.7 eV的可接受体积值存在差异(类似于先前硅的结果)。详细的AES测量激发态氧暴露的切割锗表面也报道。在0.1 ~ 103 L的氧暴露范围内,M2,3M4,5V [N'(E)]跃迁的负偏移连续变化,导出的TDOS曲线显示,在真空水平以下,在-7.7,-8.4,-11.3,-13.5,-14.9,-17.8和-19.7 eV的明确能量处出现了许多氧诱导峰。其中-11.3、-14.9和-19.7 eV三个峰与GeO2的形成一致。对于所研究的暴露范围,所报告的价带光谱数据被解释为表明原子和分子化学吸附状态同时存在,并且在氧化早期阶段与GeO2的形成共存。
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引用次数: 1
Derivation of charge transfer parameters at semiconductor-liquid interfaces 半导体-液体界面电荷转移参数的推导
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90242-9
S. Hinckley , D. Haneman

The excess-carrier charge transfer velocity, υcp, is an important parameter describing the efficiency of charge transfer across a solid-liquid interface. By using recent theory to analyze current-voltage curves of photoelectrochemical cells, we have been able to derive values of υcp for CdSe films in aqueous polysulfide electrolytes and measure the effects of varying the sulfur concentration. The parameter, υcp, is found to vary at short circuit conditions, from 1.2 × 106 to 1.36 × 106 cm s−1 on increasing the sulfur concentration from 0 to 3.0M. In addition it has been found that υvp has only a weak voltage dependence described by an equation linear in voltage.

过量载流子电荷转移速度(cp)是描述电荷在固液界面转移效率的重要参数。利用最新的理论分析了光电化学电池的电流-电压曲线,得到了CdSe薄膜在多硫化物水溶液中的 cp值,并测量了硫浓度变化的影响。在短路条件下,当硫浓度从0增加到3.0M时,参数 cp变化从1.2 × 106到1.36 × 106 cm s−1。此外,还发现,在电压线性方程中, vp只有微弱的电压依赖性。
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引用次数: 3
Structure of iron oxide films prepared by evaporating various iron oxide powders 各种氧化铁粉末蒸发制备的氧化铁薄膜的结构
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90194-1
C. Kaito, Y. Nakata, Y. Saito, K. Fujita

Crystalline films composed of mixtures (1) Fe, Fe3O4 and FeO, (2) FeO and Fe3O4, and (3) Fe3O4 were obtained by evaporating FeO powder (1) in a vacuum of 10−5 Torr; (2) in an oxygen atmosphere of 10−4−10−3 Torr; and (3) in an oxygen atmosphere of 10−1 Torr, respectively. Films of γ-Fe2O3 were obtained by evaporating Fe3O4 powder in an oxygen atmosphere of 10−4 Torr, or by evaporating α-Fe2O3 powder in a vacuum of 10−5 Torr. The γ-Fe2O3 films gave only amorphous haloes in electron diffraction patterns. High resolution electron microscope images of the films showed crossed lattice fringes (whose spacings were assigned to the γ-Fe2O3 crystal) in areas 2 nm in extent. The formation of various iron oxide films is discussed in connection with experimental results from the oxidation of iron.

将FeO粉末(1)在10−5 Torr真空中蒸发,得到由(1)Fe、Fe3O4和FeO、(2)FeO和Fe3O4、(3)Fe3O4混合物组成的结晶膜;(2)在10−4−10−3托的氧气氛中;和(3)分别在10−1 Torr的氧气氛中。Fe3O4粉末在10−4 Torr的氧气气氛中蒸发,α-Fe2O3粉末在10−5 Torr的真空气氛中蒸发,得到了γ-Fe2O3薄膜。γ-Fe2O3薄膜在电子衍射图上仅呈现出非晶光晕。高分辨率电子显微镜图像显示,在2nm范围内的交叉晶格条纹(其间距分配给γ-Fe2O3晶体)。结合铁氧化的实验结果,讨论了各种氧化铁膜的形成。
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引用次数: 5
Long-range force and interfacial energy between dissimilar metals 异种金属间的远程力和界面能
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90239-9
N.H. March, B.V. Paranjape

The Lifshitz theory is applied to calculate the long-range dispersion force between two semi-infinite half planes of dissimilar metals. It is shown that the asymptotic form of the force F, for large separation d between the half planes is F = C12/d3, where an explicit expression is given for C12 in terms of the two plasma frequencies ωp2 and ωp1 of the interacting metals. Attention is then given to the contributions to the interfacial energy of the composite system. In an ideal situation, in which the two metals had (a) the same crystal structure, (b) identical lattice parameters and (c) no charge transfer, the interfacial energy is the sum σ1 + σ2 of the surface energies of the two pure metals involved. It is argued that the charge transfer contribution (c) takes the form (ΔW)2/ρ2lc, where ΔW is the difference in work functions of the two pure metals and lc is a characteristic length. Contributions arising from departures for ideal lattice matching, embodied in point (b) above can be estimated from the isothermal compressibility, κT, of the pure metals. Further, invoking for a pure metal the known approximate relation that σκT ∼ 1 Å. this lattice mismatch contribution is expressed again in terms of surface energies. It will usually alter the contribution σ1 + σ2 of ine interfacial energy by a multiplying factor less than, but quite near to unity.

应用Lifshitz理论计算了不同金属的半无限半平面间的长程色散力。结果表明,对于半平面之间的大间距d,力F的渐近形式为F = C12/d3,其中C12用相互作用金属的两个等离子体频率ωp2和ωp1给出了显式表达式。然后注意对复合体系界面能的贡献。在两种金属(a)晶体结构相同,(b)晶格参数相同,(c)无电荷转移的理想情况下,界面能为两种纯金属表面能的σ1 + σ2之和。认为电荷转移贡献(c)的形式为(ΔW)2/ρ2lc,其中ΔW为两种纯金属的功函数之差,lc为特征长度。由理想晶格匹配的偏离所产生的贡献,体现在上面(b)点,可以从纯金属的等温压缩率κT来估计。进一步,对纯金属调用已知的近似关系σκT ~ 1 Å。这种晶格失配的贡献再次用表面能表示。它通常会改变线界面能的贡献σ1 + σ2,其倍数小于,但非常接近于1。
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引用次数: 1
Low energy ion scattering of clean and oxygen-covered Ni(110) 清洁和氧覆盖Ni(110)的低能离子散射
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90041-8
P. Higginbottom, J. Homer, D.J. O'Connor, R.J. MacDonald

Low energy ion scattering can provide atom location and structural information from a number of different measurements. Low angle scattering can yield information on atom location and surface crystallography from the measurement of the azimuthal angular distribution of scattered particles. Large angle backscattering provides a direct measurement of shadow cone geometry and combined with the angular dependence of the backscattered yield, this large angle scattering event can provide accurate information on the surface structure. Studies of the angular distribution of recoil ions from the surface can also provide information on the site from which the recoil came. These three techniques have been applied to the study of the Ni(110) surface and to oxygen adsorption on that surface. A comparison of the information available from each technique is presented.

低能离子散射可以从许多不同的测量中提供原子位置和结构信息。低角散射可以通过测量散射粒子的方位角分布来获得原子位置和表面晶体学的信息。大角度后向散射提供了一种直接测量阴影锥几何形状的方法,并结合后向散射产率的角度依赖性,这种大角度散射事件可以提供精确的表面结构信息。对反冲离子从表面的角度分布的研究也可以提供反冲产生的位置的信息。这三种技术已应用于Ni(110)表面及其氧吸附的研究。对每种技术的可用信息进行了比较。
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引用次数: 0
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Applications of Surface Science
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