首页 > 最新文献

Applications of Surface Science最新文献

英文 中文
Destructive and non-destructive depth profiling using ESCA 使用ESCA进行破坏性和非破坏性深度剖面分析
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90062-5
K.L. Smith, J.S. Hammond

While the chemical analysis of a surface has become commonplace using a variety of techniques including Auger Electron Spectroscopy (AES) and Electron Spectroscopy for Chemical Analysis (ESCA), it is often advantageous to differentiate between the chemistry of the surface and the near surface. The method used to make this distinction depends on the thickness of the layers to be differentiated. If the combined thickness of the layers is greater than 100 Å, then the surface must be physically removed by ion bombardment before the subsurface components can be identified. An example of the chemistry revealed by this method is given in a sputter profile of an eight layer, 3000 Å, metal magnetic tape. The internal interfaces show more oxidation than the bulk of the metal layers. If the combined thickness of the layers is less than 100 Å, then the surface and subsurface components can be identified by non-destructive techniques. This is accomplished by using high energy excitation or by angle resolved studies. Examples will be shown of the change in the surface and near surface chemistry of polystyrene as it is treated in H2 and H2O plasmas. The degree of oxidation of the polymer surface can be monitored as a function of reaction depth using angle resolved ESCA. Extending the range of angle resolved studies by using Au Mα X-rays is shown for a native oxide on silicon.

虽然使用包括俄歇电子能谱(AES)和电子能谱化学分析(ESCA)在内的各种技术对表面进行化学分析已经变得司空见惯,但区分表面和近表面的化学性质通常是有利的。用于进行这种区分的方法取决于要区分的层的厚度。如果层的总厚度大于100 Å,则必须通过离子轰击物理去除表面,然后才能识别地下成分。以八层3000 Å金属磁带的溅射剖面为例,给出了该方法所揭示的化学性质。内部界面比大部分金属层表现出更多的氧化。如果层的总厚度小于100 Å,则可以通过非破坏性技术识别表面和次表面成分。这是通过使用高能激发或角分辨研究来完成的。当聚苯乙烯在H2和H2O等离子体中处理时,将展示其表面和近表面化学变化的例子。利用角分辨ESCA可以监测聚合物表面的氧化程度作为反应深度的函数。用Au - m - α x射线扩展了硅上天然氧化物的角度分辨研究范围。
{"title":"Destructive and non-destructive depth profiling using ESCA","authors":"K.L. Smith,&nbsp;J.S. Hammond","doi":"10.1016/0378-5963(85)90062-5","DOIUrl":"10.1016/0378-5963(85)90062-5","url":null,"abstract":"<div><p>While the chemical analysis of a surface has become commonplace using a variety of techniques including Auger Electron Spectroscopy (AES) and Electron Spectroscopy for Chemical Analysis (ESCA), it is often advantageous to differentiate between the chemistry of the surface and the near surface. The method used to make this distinction depends on the thickness of the layers to be differentiated. If the combined thickness of the layers is greater than 100 Å, then the surface must be physically removed by ion bombardment before the subsurface components can be identified. An example of the chemistry revealed by this method is given in a sputter profile of an eight layer, 3000 Å, metal magnetic tape. The internal interfaces show more oxidation than the bulk of the metal layers. If the combined thickness of the layers is less than 100 Å, then the surface and subsurface components can be identified by non-destructive techniques. This is accomplished by using high energy excitation or by angle resolved studies. Examples will be shown of the change in the surface and near surface chemistry of polystyrene as it is treated in H<sub>2</sub> and H<sub>2</sub>O plasmas. The degree of oxidation of the polymer surface can be monitored as a function of reaction depth using angle resolved ESCA. Extending the range of angle resolved studies by using Au Mα X-rays is shown for a native oxide on silicon.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 288-298"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90062-5","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"88040074","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Surface intermediates in the reaction of methanol, formaldehyde and methyl formate on copper (110) 甲醇、甲醛和甲酸甲酯在铜上反应的表面中间体(110)
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90072-8
B.A. Sexton, A.E. Hughes, N.R. Avery

The adsorption and reactions of methanol, methyl formate and formaldehyde on clean and oxygen-covered copper (110) surfaces has been studied with EELS, UPS and temperature programmed desorption (TPD). We report spectroscopic data for (a) the condensed multilayers at 90 K, (b) the surface monolayers and (c) the reaction intermediates formate (HCOO) and methoxy (CH3O) generated by reaction with surface atomic oxygen. On the clean surface methanol and methyl formate bond via the oxygen and carbonyl lone pair orbitals, whereas formaldehyde always polymerizes to surface paraformaldehyde above 120 K. Atomic oxygen generates methoxy by reaction with methanol and formate by reaction with formaldehyde as reported previously. Methyl formate undergoes nucleophilic attack to form both methoxy and formate in the presence of atomic oxygen, in a similar fashion to the reaction on Ag (110). Whereas the oxidation reactions of these molecules on copper catalysts can be explained with reference to the observed intermediates, no evidence is found for the dimerization of formaldehyde or the dehydrogenation of methanol to form methyl formate: reactions which are quite facile under higher pressure conditions.

用EELS、UPS和程序升温解吸(TPD)研究了甲醇、甲酸甲酯和甲醛在清洁和氧包覆铜(110)表面的吸附和反应。我们报告了(a)在90k下凝聚多层膜的光谱数据,(b)表面单层和(c)与表面原子氧反应产生的反应中间体甲酸酯(HCOO)和甲氧基(ch30)。在干净的表面上,甲醇和甲酸甲酯通过氧和羰基孤对轨道结合,而甲醛在120 K以上总是聚合成表面多聚甲醛。如前所述,氧原子与甲醇反应生成甲氧基,与甲醛反应生成甲酸。甲酸甲酯在氧原子的存在下经历亲核攻击形成甲氧基和甲酸甲酯,类似于在Ag(110)上的反应。虽然这些分子在铜催化剂上的氧化反应可以用观察到的中间体来解释,但没有发现甲醛二聚化或甲醇脱氢形成甲酸甲酯的证据,这些反应在高压条件下很容易发生。
{"title":"Surface intermediates in the reaction of methanol, formaldehyde and methyl formate on copper (110)","authors":"B.A. Sexton,&nbsp;A.E. Hughes,&nbsp;N.R. Avery","doi":"10.1016/0378-5963(85)90072-8","DOIUrl":"10.1016/0378-5963(85)90072-8","url":null,"abstract":"<div><p>The adsorption and reactions of methanol, methyl formate and formaldehyde on clean and oxygen-covered copper (110) surfaces has been studied with EELS, UPS and temperature programmed desorption (TPD). We report spectroscopic data for (a) the condensed multilayers at 90 K, (b) the surface monolayers and (c) the reaction intermediates formate (HCOO) and methoxy (CH<sub>3</sub>O) generated by reaction with surface atomic oxygen. On the clean surface methanol and methyl formate bond via the oxygen and carbonyl lone pair orbitals, whereas formaldehyde always polymerizes to surface paraformaldehyde above 120 K. Atomic oxygen generates methoxy by reaction with methanol and formate by reaction with formaldehyde as reported previously. Methyl formate undergoes nucleophilic attack to form both methoxy and formate in the presence of atomic oxygen, in a similar fashion to the reaction on Ag (110). Whereas the oxidation reactions of these molecules on copper catalysts can be explained with reference to the observed intermediates, no evidence is found for the dimerization of formaldehyde or the dehydrogenation of methanol to form methyl formate: reactions which are quite facile under higher pressure conditions.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 404-414"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90072-8","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"73409069","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 11
Chemically deposited alloy semiconductor thin films 化学沉积合金半导体薄膜
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90244-2
M. Skyllas-Kazacos, J.F. McCann, R. Arruzza

The chemical deposition method has been employed in the preparation of alloy semiconductor thin films. Thin films of Cd1−xHgxS and Cd1−xPbxS alloys were deposited onto titanium substrates from thiourea solutions. A monotonic decrease in the bandgaps of the semiconductor alloys was obtained as the Hg and Pb ratio was increased. Bandgap values of 1.8 and 1.6eV were measured for electrodes with a Hg: Cd ratio and a Pb: Cd ratio of 0.18 respectively, considerably lower than the bandgap of pure CdS.

化学沉积法已被应用于合金半导体薄膜的制备。在硫脲溶液中沉积了Cd1−xHgxS和Cd1−xPbxS合金薄膜。随着汞、铅比的增加,半导体合金的带隙单调减小。当Hg: Cd比和Pb: Cd比为0.18时,电极的带隙值分别为1.8 ev和1.6eV,明显低于纯CdS的带隙。
{"title":"Chemically deposited alloy semiconductor thin films","authors":"M. Skyllas-Kazacos,&nbsp;J.F. McCann,&nbsp;R. Arruzza","doi":"10.1016/0378-5963(85)90244-2","DOIUrl":"10.1016/0378-5963(85)90244-2","url":null,"abstract":"<div><p>The chemical deposition method has been employed in the preparation of alloy semiconductor thin films. Thin films of Cd<sub>1−<em>x</em></sub>Hg<sub><em>x</em></sub>S and Cd<sub>1−<em>x</em></sub>Pb<sub><em>x</em></sub>S alloys were deposited onto titanium substrates from thiourea solutions. A monotonic decrease in the bandgaps of the semiconductor alloys was obtained as the Hg and Pb ratio was increased. Bandgap values of 1.8 and 1.6eV were measured for electrodes with a Hg: Cd ratio and a Pb: Cd ratio of 0.18 respectively, considerably lower than the bandgap of pure CdS.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 1091-1097"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90244-2","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74422966","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 7
Photoelectron yield in x-ray grazing-incidence diffraction x射线掠入射衍射中的光电子产率
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90058-3
R.M. Imamov, E.Kh. Mukhamedzhanov, A.V. Maslov, E.M. Pashaev, A.M. Afanas'ev

Peculiarities of the photoelectron yield in conditions of X-ray grazing-incidence diffraction are discussed. The high sensitivity of photoelectron emission angular dependence on structural perfection of the crystal subsurface layers is demonstrated. A method for evaluation of the escape depths of photoelectrons with different energies is proposed.

讨论了x射线掠入射衍射条件下光电子产率的特性。证明了晶体亚表面层结构完善程度对光电子发射角依赖性的高灵敏度。提出了一种评价不同能量光电子逃逸深度的方法。
{"title":"Photoelectron yield in x-ray grazing-incidence diffraction","authors":"R.M. Imamov,&nbsp;E.Kh. Mukhamedzhanov,&nbsp;A.V. Maslov,&nbsp;E.M. Pashaev,&nbsp;A.M. Afanas'ev","doi":"10.1016/0378-5963(85)90058-3","DOIUrl":"10.1016/0378-5963(85)90058-3","url":null,"abstract":"<div><p>Peculiarities of the photoelectron yield in conditions of X-ray grazing-incidence diffraction are discussed. The high sensitivity of photoelectron emission angular dependence on structural perfection of the crystal subsurface layers is demonstrated. A method for evaluation of the escape depths of photoelectrons with different energies is proposed.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 259-266"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90058-3","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"75303308","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A toroidal angle-resolving electron spectrometer for surface studies 用于表面研究的环形角分辨电子光谱仪
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90052-2
R.C.G. Leckey, J.D. Riley

An electron spectrometer with toroidal geometry has been developed which enables angularly resolved spectra to be obtained simultaneously at a large number of angles. This reduces data acquisition times by a factor of 100 and makes accessible many experiments on surfaces and interfaces which involve reactive materials or which require long experiment times. Photoelectron spectra of gases are presented which demonstrate the analyzer's energy and angular resolution showing it to be more than adequate for surface studies.

研制了一种环形电子能谱仪,可在多个角度同时获得角分辨光谱。这将数据采集时间减少了100倍,并且可以在涉及活性材料或需要长时间实验的表面和界面上进行许多实验。气体的光电子能谱显示了分析仪的能量和角分辨率,表明它对表面研究绰绰有余。
{"title":"A toroidal angle-resolving electron spectrometer for surface studies","authors":"R.C.G. Leckey,&nbsp;J.D. Riley","doi":"10.1016/0378-5963(85)90052-2","DOIUrl":"10.1016/0378-5963(85)90052-2","url":null,"abstract":"<div><p>An electron spectrometer with toroidal geometry has been developed which enables angularly resolved spectra to be obtained simultaneously at a large number of angles. This reduces data acquisition times by a factor of 100 and makes accessible many experiments on surfaces and interfaces which involve reactive materials or which require long experiment times. Photoelectron spectra of gases are presented which demonstrate the analyzer's energy and angular resolution showing it to be more than adequate for surface studies.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 196-205"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90052-2","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"75532059","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 5
The synthesis of tellurium oxide by high dose oxygen ion-implantation 大剂量氧离子注入法合成氧化碲
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90201-6
Amarjit Singh, E.J. Knystautas, R. Lapointe

High dose ion-implantation was used to synthesize stoichiometric TeO2 layers over tellurium films at 30 keV. Using infrared absorption spectroscopy it was concluded that the stoichiometric layer could be produced with 16O2+ ions to a fluence of 4.8×1017 ions cm−2, which is in close agreement with the estimated oxygen dose.

采用高剂量离子注入在30kev的碲薄膜上合成化学计量TeO2层。利用红外吸收光谱分析得出,在4.8×1017离子cm - 2的影响下,16O2+离子可以形成化学计量层,这与估计的氧剂量非常吻合。
{"title":"The synthesis of tellurium oxide by high dose oxygen ion-implantation","authors":"Amarjit Singh,&nbsp;E.J. Knystautas,&nbsp;R. Lapointe","doi":"10.1016/0378-5963(85)90201-6","DOIUrl":"10.1016/0378-5963(85)90201-6","url":null,"abstract":"<div><p>High dose ion-implantation was used to synthesize stoichiometric TeO<sub>2</sub> layers over tellurium films at 30 keV. Using infrared absorption spectroscopy it was concluded that the stoichiometric layer could be produced with <sup>16</sup>O<sub>2</sub><sup>+</sup> ions to a fluence of 4.8×10<sup>17</sup> ions cm<sup>−2</sup>, which is in close agreement with the estimated oxygen dose.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 681-685"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90201-6","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"75675713","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 5
X-ray diffraction investigations on Au/Si alloy films Au/Si合金薄膜的x射线衍射研究
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90196-5
W. Fischer , P. Wissmann, H. Zitzmann

Gold/silicon binary mixtures are prepared by depositing thin gold films onto Si(111) single crystals and subsequently annealing at various temperatures. The structure of the films is studied in situ with the help of an ultra-high-vacuum X-ray diffraction chamber. After deposition at room temperature the gold films are homogeneous with a plane-parallel morphology. After annealing at 630 K the Au 111 peak suddenly disappears in the X-ray spectrum indicating that a eutectic melt has been formed. Cooling leads to a regeneration of the peak at 590 K. This temperature is distinctly smaller than the eutectic temperature reported in the literature (643 K). Obviously small gold islands are formed which are embedded into the silicon surface.

金/硅二元混合物是通过在Si(111)单晶上沉积薄金薄膜并随后在不同温度下退火来制备的。利用超高真空x射线衍射室对薄膜的结构进行了原位研究。在室温下沉积后,金膜呈均匀的平面平行形貌。在630 K退火后,Au 111峰在x射线光谱中突然消失,表明共晶熔体已经形成。冷却导致590 K时峰值的再生。这一温度明显低于文献报道的共晶温度(643 K)。显然,硅表面形成了嵌入的小金岛。
{"title":"X-ray diffraction investigations on Au/Si alloy films","authors":"W. Fischer ,&nbsp;P. Wissmann,&nbsp;H. Zitzmann","doi":"10.1016/0378-5963(85)90196-5","DOIUrl":"10.1016/0378-5963(85)90196-5","url":null,"abstract":"<div><p>Gold/silicon binary mixtures are prepared by depositing thin gold films onto Si(111) single crystals and subsequently annealing at various temperatures. The structure of the films is studied in situ with the help of an ultra-high-vacuum X-ray diffraction chamber. After deposition at room temperature the gold films are homogeneous with a plane-parallel morphology. After annealing at 630 K the Au 111 peak suddenly disappears in the X-ray spectrum indicating that a eutectic melt has been formed. Cooling leads to a regeneration of the peak at 590 K. This temperature is distinctly smaller than the eutectic temperature reported in the literature (643 K). Obviously small gold islands are formed which are embedded into the silicon surface.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 638-644"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90196-5","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"83695408","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 5
Ion-beam-induced isotope composition changes in metal surfaces and recoil implantation 离子束诱导金属表面同位素组成变化及反冲注入
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90038-8
J. Okano, T. Ochiai, H. Nishimura

It was found that the isotope ratios of 58Ni/60Ni and 63Cu/65Cu measured by SIMS changed by a few percent at the initial stage of ion bombardment for well-polished pure metal samples. A similar change was also found for silver, palladium, titanium and chromium targets. The isotope ratios, the light to the heavy, for the fresh surfaces were low at first and increased with time to reach constant values as the ion bombardment continued. It was pointed out that the main process able to induce such a large mass effect would be preferential recoil implantation of isotopes by primary ions.

结果表明,在离子轰击初始阶段,经过抛光处理的纯金属样品的58Ni/60Ni和63Cu/65Cu同位素比值发生了几个百分点的变化。在银、钯、钛和铬靶上也发现了类似的变化。新鲜表面的同位素比率(轻与重)起初很低,随着时间的推移而增加,随着离子轰击的继续而达到恒定值。指出能够产生如此大质量效应的主要过程是原生离子对同位素的优先反冲注入。
{"title":"Ion-beam-induced isotope composition changes in metal surfaces and recoil implantation","authors":"J. Okano,&nbsp;T. Ochiai,&nbsp;H. Nishimura","doi":"10.1016/0378-5963(85)90038-8","DOIUrl":"10.1016/0378-5963(85)90038-8","url":null,"abstract":"<div><p>It was found that the isotope ratios of <sup>58</sup>Ni/<sup>60</sup>Ni and <sup>63</sup>Cu/<sup>65</sup>Cu measured by SIMS changed by a few percent at the initial stage of ion bombardment for well-polished pure metal samples. A similar change was also found for silver, palladium, titanium and chromium targets. The isotope ratios, the light to the heavy, for the fresh surfaces were low at first and increased with time to reach constant values as the ion bombardment continued. It was pointed out that the main process able to induce such a large mass effect would be preferential recoil implantation of isotopes by primary ions.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 72-81"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90038-8","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"84071242","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Impurity-induced surface acoustic wave attenuation in doped amorphous GeH thin films 掺杂非晶GeH薄膜中杂质诱导的表面声波衰减
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90208-9
K.L. Bhatia, S. Hunklinger

The technique of surface acoustic wave (SAW) has been applied to doped amorphous GeH films to gain information on the nature of defects. The attenuation of SAW of 300 MHz and 1.5 GHz has been measured in sputtered films of a-GeH doped with P or B at temperatures between 0.5 and 475 K. Sound velocity measurements are also made. A strong absorption maximum at low temperature is observed in a-Ge(H,P) and a-Ge(H,B) films. Distinct effects of annealing on the attenuation and velocity of SAW are observed. These impurity induced features are discussed in the light of acoustoelectric interaction. It is interesting to observe that a-Ge(H,B) film seems to have tunneling states characteristic of glasses.

表面声波(SAW)技术已被应用于掺杂非晶GeH薄膜中,以获得缺陷性质的信息。在掺杂P或B的a-GeH溅射薄膜中,在0.5 ~ 475 K的温度范围内测量了300 MHz和1.5 GHz的声呐衰减。还进行了声速测量。在A - ge (H,P)和A - ge (H,B)薄膜中观察到低温下的强吸收最大值。退火对声表面波的衰减和速度有明显的影响。从声电相互作用的角度讨论了这些杂质诱导的特征。有趣的是,a-Ge(H,B)薄膜似乎具有玻璃所特有的隧道态。
{"title":"Impurity-induced surface acoustic wave attenuation in doped amorphous GeH thin films","authors":"K.L. Bhatia,&nbsp;S. Hunklinger","doi":"10.1016/0378-5963(85)90208-9","DOIUrl":"10.1016/0378-5963(85)90208-9","url":null,"abstract":"<div><p>The technique of surface acoustic wave (SAW) has been applied to doped amorphous GeH films to gain information on the nature of defects. The attenuation of SAW of 300 MHz and 1.5 GHz has been measured in sputtered films of a-GeH doped with P or B at temperatures between 0.5 and 475 K. Sound velocity measurements are also made. A strong absorption maximum at low temperature is observed in a-Ge(H,P) and a-Ge(H,B) films. Distinct effects of annealing on the attenuation and velocity of SAW are observed. These impurity induced features are discussed in the light of acoustoelectric interaction. It is interesting to observe that a-Ge(H,B) film seems to have tunneling states characteristic of glasses.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 756-762"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90208-9","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"88202686","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Properties of CdTe films formed by compound vacuum evaporation 复合真空蒸发制备碲化镉薄膜的性能
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90205-3
M.B. Winn, L.E. Lyons

CdTe thin films formed by compound evaporation onto glass substrates, held at between 40 and 460°C, exhibited abrupt changes of physical properties at ca. 270°C. The resistivity changed from 0.1 ω m to 100 kω m, and a marked increase in crystallinity and absorption edge sharpness was noted. These changes resulted from a decrease in the free tellurium content of the films at ca. 270°C.

当温度保持在40 ~ 460℃之间时,在玻璃衬底上形成的碲化镉薄膜的物理性质在270℃左右发生突变。电阻率从0.1 ω m增加到100 km ω m,结晶度和吸收边缘锐度明显增加。这些变化是由于在约270°C时薄膜的游离碲含量减少所致。
{"title":"Properties of CdTe films formed by compound vacuum evaporation","authors":"M.B. Winn,&nbsp;L.E. Lyons","doi":"10.1016/0378-5963(85)90205-3","DOIUrl":"10.1016/0378-5963(85)90205-3","url":null,"abstract":"<div><p>CdTe thin films formed by compound evaporation onto glass substrates, held at between 40 and 460°C, exhibited abrupt changes of physical properties at ca. 270°C. The resistivity changed from 0.1 ω m to 100 kω m, and a marked increase in crystallinity and absorption edge sharpness was noted. These changes resulted from a decrease in the free tellurium content of the films at ca. 270°C.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 724-730"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90205-3","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"85378121","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 5
期刊
Applications of Surface Science
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1