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Off-specular and out-of-plane vibrational electron energy loss spectra of benzene and pyridine adsorbed on Pt(110) 苯和吡啶在Pt(110)上吸附的非镜面和面外振动电子能量损失谱
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90071-6
G.L. Nyberg, S.R. Bare, P. Hofmann, D.A. King, M. Surman

The VEEL spectra of benzene, deuterobenzene, and pyridine adsorbed on Pt(110) at room temperature have been examined in emission planes both coincident with and orthogonal to the plane of incidence. The inelastic peak intensities are found to be almost independent of angle in both directions. This implies that neither of the established mechanisms, nor others presently examined, is an adequate description of the scattering. It also leads to a reassignment of the benzene spectrum.

本文研究了室温下吸附在Pt(110)上的苯、对苯和吡啶在与入射面重合和正交的发射平面上的VEEL光谱。发现非弹性峰值强度在两个方向上几乎与角度无关。这意味着,无论是已建立的机制,还是目前研究的其他机制,都不能充分描述散射。它还会导致苯的光谱重新分配。
{"title":"Off-specular and out-of-plane vibrational electron energy loss spectra of benzene and pyridine adsorbed on Pt(110)","authors":"G.L. Nyberg,&nbsp;S.R. Bare,&nbsp;P. Hofmann,&nbsp;D.A. King,&nbsp;M. Surman","doi":"10.1016/0378-5963(85)90071-6","DOIUrl":"10.1016/0378-5963(85)90071-6","url":null,"abstract":"<div><p>The VEEL spectra of benzene, deuterobenzene, and pyridine adsorbed on Pt(110) at room temperature have been examined in emission planes both coincident with and orthogonal to the plane of incidence. The inelastic peak intensities are found to be almost independent of angle in both directions. This implies that neither of the established mechanisms, nor others presently examined, is an adequate description of the scattering. It also leads to a reassignment of the benzene spectrum.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 392-403"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90071-6","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"91511687","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Surface intermediates in the reaction of methanol, formaldehyde and methyl formate on copper (110) 甲醇、甲醛和甲酸甲酯在铜上反应的表面中间体(110)
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90072-8
B.A. Sexton, A.E. Hughes, N.R. Avery

The adsorption and reactions of methanol, methyl formate and formaldehyde on clean and oxygen-covered copper (110) surfaces has been studied with EELS, UPS and temperature programmed desorption (TPD). We report spectroscopic data for (a) the condensed multilayers at 90 K, (b) the surface monolayers and (c) the reaction intermediates formate (HCOO) and methoxy (CH3O) generated by reaction with surface atomic oxygen. On the clean surface methanol and methyl formate bond via the oxygen and carbonyl lone pair orbitals, whereas formaldehyde always polymerizes to surface paraformaldehyde above 120 K. Atomic oxygen generates methoxy by reaction with methanol and formate by reaction with formaldehyde as reported previously. Methyl formate undergoes nucleophilic attack to form both methoxy and formate in the presence of atomic oxygen, in a similar fashion to the reaction on Ag (110). Whereas the oxidation reactions of these molecules on copper catalysts can be explained with reference to the observed intermediates, no evidence is found for the dimerization of formaldehyde or the dehydrogenation of methanol to form methyl formate: reactions which are quite facile under higher pressure conditions.

用EELS、UPS和程序升温解吸(TPD)研究了甲醇、甲酸甲酯和甲醛在清洁和氧包覆铜(110)表面的吸附和反应。我们报告了(a)在90k下凝聚多层膜的光谱数据,(b)表面单层和(c)与表面原子氧反应产生的反应中间体甲酸酯(HCOO)和甲氧基(ch30)。在干净的表面上,甲醇和甲酸甲酯通过氧和羰基孤对轨道结合,而甲醛在120 K以上总是聚合成表面多聚甲醛。如前所述,氧原子与甲醇反应生成甲氧基,与甲醛反应生成甲酸。甲酸甲酯在氧原子的存在下经历亲核攻击形成甲氧基和甲酸甲酯,类似于在Ag(110)上的反应。虽然这些分子在铜催化剂上的氧化反应可以用观察到的中间体来解释,但没有发现甲醛二聚化或甲醇脱氢形成甲酸甲酯的证据,这些反应在高压条件下很容易发生。
{"title":"Surface intermediates in the reaction of methanol, formaldehyde and methyl formate on copper (110)","authors":"B.A. Sexton,&nbsp;A.E. Hughes,&nbsp;N.R. Avery","doi":"10.1016/0378-5963(85)90072-8","DOIUrl":"10.1016/0378-5963(85)90072-8","url":null,"abstract":"<div><p>The adsorption and reactions of methanol, methyl formate and formaldehyde on clean and oxygen-covered copper (110) surfaces has been studied with EELS, UPS and temperature programmed desorption (TPD). We report spectroscopic data for (a) the condensed multilayers at 90 K, (b) the surface monolayers and (c) the reaction intermediates formate (HCOO) and methoxy (CH<sub>3</sub>O) generated by reaction with surface atomic oxygen. On the clean surface methanol and methyl formate bond via the oxygen and carbonyl lone pair orbitals, whereas formaldehyde always polymerizes to surface paraformaldehyde above 120 K. Atomic oxygen generates methoxy by reaction with methanol and formate by reaction with formaldehyde as reported previously. Methyl formate undergoes nucleophilic attack to form both methoxy and formate in the presence of atomic oxygen, in a similar fashion to the reaction on Ag (110). Whereas the oxidation reactions of these molecules on copper catalysts can be explained with reference to the observed intermediates, no evidence is found for the dimerization of formaldehyde or the dehydrogenation of methanol to form methyl formate: reactions which are quite facile under higher pressure conditions.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 404-414"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90072-8","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"73409069","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 11
Chemically deposited alloy semiconductor thin films 化学沉积合金半导体薄膜
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90244-2
M. Skyllas-Kazacos, J.F. McCann, R. Arruzza

The chemical deposition method has been employed in the preparation of alloy semiconductor thin films. Thin films of Cd1−xHgxS and Cd1−xPbxS alloys were deposited onto titanium substrates from thiourea solutions. A monotonic decrease in the bandgaps of the semiconductor alloys was obtained as the Hg and Pb ratio was increased. Bandgap values of 1.8 and 1.6eV were measured for electrodes with a Hg: Cd ratio and a Pb: Cd ratio of 0.18 respectively, considerably lower than the bandgap of pure CdS.

化学沉积法已被应用于合金半导体薄膜的制备。在硫脲溶液中沉积了Cd1−xHgxS和Cd1−xPbxS合金薄膜。随着汞、铅比的增加,半导体合金的带隙单调减小。当Hg: Cd比和Pb: Cd比为0.18时,电极的带隙值分别为1.8 ev和1.6eV,明显低于纯CdS的带隙。
{"title":"Chemically deposited alloy semiconductor thin films","authors":"M. Skyllas-Kazacos,&nbsp;J.F. McCann,&nbsp;R. Arruzza","doi":"10.1016/0378-5963(85)90244-2","DOIUrl":"10.1016/0378-5963(85)90244-2","url":null,"abstract":"<div><p>The chemical deposition method has been employed in the preparation of alloy semiconductor thin films. Thin films of Cd<sub>1−<em>x</em></sub>Hg<sub><em>x</em></sub>S and Cd<sub>1−<em>x</em></sub>Pb<sub><em>x</em></sub>S alloys were deposited onto titanium substrates from thiourea solutions. A monotonic decrease in the bandgaps of the semiconductor alloys was obtained as the Hg and Pb ratio was increased. Bandgap values of 1.8 and 1.6eV were measured for electrodes with a Hg: Cd ratio and a Pb: Cd ratio of 0.18 respectively, considerably lower than the bandgap of pure CdS.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 1091-1097"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90244-2","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74422966","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 7
Photoelectron yield in x-ray grazing-incidence diffraction x射线掠入射衍射中的光电子产率
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90058-3
R.M. Imamov, E.Kh. Mukhamedzhanov, A.V. Maslov, E.M. Pashaev, A.M. Afanas'ev

Peculiarities of the photoelectron yield in conditions of X-ray grazing-incidence diffraction are discussed. The high sensitivity of photoelectron emission angular dependence on structural perfection of the crystal subsurface layers is demonstrated. A method for evaluation of the escape depths of photoelectrons with different energies is proposed.

讨论了x射线掠入射衍射条件下光电子产率的特性。证明了晶体亚表面层结构完善程度对光电子发射角依赖性的高灵敏度。提出了一种评价不同能量光电子逃逸深度的方法。
{"title":"Photoelectron yield in x-ray grazing-incidence diffraction","authors":"R.M. Imamov,&nbsp;E.Kh. Mukhamedzhanov,&nbsp;A.V. Maslov,&nbsp;E.M. Pashaev,&nbsp;A.M. Afanas'ev","doi":"10.1016/0378-5963(85)90058-3","DOIUrl":"10.1016/0378-5963(85)90058-3","url":null,"abstract":"<div><p>Peculiarities of the photoelectron yield in conditions of X-ray grazing-incidence diffraction are discussed. The high sensitivity of photoelectron emission angular dependence on structural perfection of the crystal subsurface layers is demonstrated. A method for evaluation of the escape depths of photoelectrons with different energies is proposed.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 259-266"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90058-3","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"75303308","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A toroidal angle-resolving electron spectrometer for surface studies 用于表面研究的环形角分辨电子光谱仪
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90052-2
R.C.G. Leckey, J.D. Riley

An electron spectrometer with toroidal geometry has been developed which enables angularly resolved spectra to be obtained simultaneously at a large number of angles. This reduces data acquisition times by a factor of 100 and makes accessible many experiments on surfaces and interfaces which involve reactive materials or which require long experiment times. Photoelectron spectra of gases are presented which demonstrate the analyzer's energy and angular resolution showing it to be more than adequate for surface studies.

研制了一种环形电子能谱仪,可在多个角度同时获得角分辨光谱。这将数据采集时间减少了100倍,并且可以在涉及活性材料或需要长时间实验的表面和界面上进行许多实验。气体的光电子能谱显示了分析仪的能量和角分辨率,表明它对表面研究绰绰有余。
{"title":"A toroidal angle-resolving electron spectrometer for surface studies","authors":"R.C.G. Leckey,&nbsp;J.D. Riley","doi":"10.1016/0378-5963(85)90052-2","DOIUrl":"10.1016/0378-5963(85)90052-2","url":null,"abstract":"<div><p>An electron spectrometer with toroidal geometry has been developed which enables angularly resolved spectra to be obtained simultaneously at a large number of angles. This reduces data acquisition times by a factor of 100 and makes accessible many experiments on surfaces and interfaces which involve reactive materials or which require long experiment times. Photoelectron spectra of gases are presented which demonstrate the analyzer's energy and angular resolution showing it to be more than adequate for surface studies.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 196-205"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90052-2","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"75532059","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 5
Ion-beam-induced isotope composition changes in metal surfaces and recoil implantation 离子束诱导金属表面同位素组成变化及反冲注入
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90038-8
J. Okano, T. Ochiai, H. Nishimura

It was found that the isotope ratios of 58Ni/60Ni and 63Cu/65Cu measured by SIMS changed by a few percent at the initial stage of ion bombardment for well-polished pure metal samples. A similar change was also found for silver, palladium, titanium and chromium targets. The isotope ratios, the light to the heavy, for the fresh surfaces were low at first and increased with time to reach constant values as the ion bombardment continued. It was pointed out that the main process able to induce such a large mass effect would be preferential recoil implantation of isotopes by primary ions.

结果表明,在离子轰击初始阶段,经过抛光处理的纯金属样品的58Ni/60Ni和63Cu/65Cu同位素比值发生了几个百分点的变化。在银、钯、钛和铬靶上也发现了类似的变化。新鲜表面的同位素比率(轻与重)起初很低,随着时间的推移而增加,随着离子轰击的继续而达到恒定值。指出能够产生如此大质量效应的主要过程是原生离子对同位素的优先反冲注入。
{"title":"Ion-beam-induced isotope composition changes in metal surfaces and recoil implantation","authors":"J. Okano,&nbsp;T. Ochiai,&nbsp;H. Nishimura","doi":"10.1016/0378-5963(85)90038-8","DOIUrl":"10.1016/0378-5963(85)90038-8","url":null,"abstract":"<div><p>It was found that the isotope ratios of <sup>58</sup>Ni/<sup>60</sup>Ni and <sup>63</sup>Cu/<sup>65</sup>Cu measured by SIMS changed by a few percent at the initial stage of ion bombardment for well-polished pure metal samples. A similar change was also found for silver, palladium, titanium and chromium targets. The isotope ratios, the light to the heavy, for the fresh surfaces were low at first and increased with time to reach constant values as the ion bombardment continued. It was pointed out that the main process able to induce such a large mass effect would be preferential recoil implantation of isotopes by primary ions.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 72-81"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90038-8","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"84071242","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Molecular cluster calculations for the analysis of CO chemisorption on the Rh(110) surface 用于分析CO在Rh(110)表面化学吸附的分子簇计算
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90076-5
Pei-Lin Cao, Yue Wu, Yun-Qi Chen, De-Juan Zheng

Self-consistent Hartree-Fock-Slater molecular cluster calculations for the chemisorption of carbon monoxide on a Rh(110) surface both at on-top and at on-fourfold “pocket” sites are presented. The calculations are performed using Rh5CO clusters, with the carbon-oxygen distance equal to the free molecular value. The bond energy on the on-top site is found to be about two times larger than on the on-fourfold site and the optimized dRh-C is equal to 1.80 and 1.85 Å for the on-top and the on-fourfold sites respectively. In the total DOS and difference curve for the on-top site, the 4g̃s, 1g̃p + 5g̃s, and CO 2π-induced peaks are located 10.2, 7.2, and 3.0 eV below EF, in good agreement with the UPS results. The CO 2π-induced peak is stronger for the on-fourfold site, and the CO 2π orbital will gain more electrons (0.83 compared with 0.55 for the on-top site) if in some way CO is chemisorbed on this site.

自一致的Hartree-Fock-Slater分子簇计算一氧化碳在Rh(110)表面上的化学吸附都在上和上四倍“口袋”的位置被提出。计算是使用Rh5CO簇进行的,碳氧距离等于自由分子值。结果表明,顶位键能约为四重位键能的2倍,优化后的dRh-C分别为1.80和1.85 Å。在顶部位置的总DOS和差值曲线中,4g、1g + 5g和CO 2π诱导峰分别位于EF以下10.2、7.2和3.0 eV,与UPS结果吻合较好。CO 2π的诱导峰在四重位上更强,如果CO以某种方式被化学吸附在这个位置上,CO 2π轨道将获得更多的电子(0.83比0.55)。
{"title":"Molecular cluster calculations for the analysis of CO chemisorption on the Rh(110) surface","authors":"Pei-Lin Cao,&nbsp;Yue Wu,&nbsp;Yun-Qi Chen,&nbsp;De-Juan Zheng","doi":"10.1016/0378-5963(85)90076-5","DOIUrl":"10.1016/0378-5963(85)90076-5","url":null,"abstract":"<div><p>Self-consistent Hartree-Fock-Slater molecular cluster calculations for the chemisorption of carbon monoxide on a Rh(110) surface both at on-top and at on-fourfold “pocket” sites are presented. The calculations are performed using Rh<sub>5</sub>CO clusters, with the carbon-oxygen distance equal to the free molecular value. The bond energy on the on-top site is found to be about two times larger than on the on-fourfold site and the optimized <em>d</em><sub>Rh-C</sub> is equal to 1.80 and 1.85 Å for the on-top and the on-fourfold sites respectively. In the total DOS and difference curve for the on-top site, the 4g̃s, 1g̃p + 5g̃s, and CO 2π-induced peaks are located 10.2, 7.2, and 3.0 eV below <em>E</em><sub>F</sub>, in good agreement with the UPS results. The CO 2π-induced peak is stronger for the on-fourfold site, and the CO 2π orbital will gain more electrons (0.83 compared with 0.55 for the on-top site) if in some way CO is chemisorbed on this site.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 452-458"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90076-5","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"91442020","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Compositional analysis of thin film amorphous semiconductors and insulators using LIMA 用LIMA分析薄膜非晶半导体和绝缘体的成分
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90226-0
G.J. Smith, D.J. Eagle, W.I. Milne

LIMA (Laser-induced Ion Mass Analysis) is a new technique capable of compositional analysis of thin films and surface regions. Under UHV conditions a focused laser beam evaporates and ionizes a microvolume of specimen material from which a mass spectrum is obtained. LIMA has been used to examine a range of thin film materials with applications in electronic devices. The neutral photon probe avoids charging problems, and low conductivity materials are examined without prior metallization. Analyses of insulating silicon oxides, nitrides, and oxynitrides confirm estimates of composition from infrared measurements. However, the hydrogen content of hydrogenated amorphous silicon (a-Si:H) found by LIMA shows no correlation with values given by infrared absorption analysis. Explanations are proposed and discussed.

激光诱导离子质量分析(LIMA)是一种能够对薄膜和表面区域进行成分分析的新技术。在特高压条件下,聚焦激光束蒸发并电离微体积的样品材料,从中获得质谱。LIMA已被用于检查各种薄膜材料在电子设备中的应用。中性光子探针避免了充电问题,低导电性材料无需事先金属化即可检测。对绝缘硅氧化物、氮化物和氧氮化物的分析证实了红外测量得出的成分估计。然而,LIMA发现的氢化非晶硅(a-Si:H)的氢含量与红外吸收分析结果没有相关性。提出并讨论了解释。
{"title":"Compositional analysis of thin film amorphous semiconductors and insulators using LIMA","authors":"G.J. Smith,&nbsp;D.J. Eagle,&nbsp;W.I. Milne","doi":"10.1016/0378-5963(85)90226-0","DOIUrl":"10.1016/0378-5963(85)90226-0","url":null,"abstract":"<div><p>LIMA (Laser-induced Ion Mass Analysis) is a new technique capable of compositional analysis of thin films and surface regions. Under UHV conditions a focused laser beam evaporates and ionizes a microvolume of specimen material from which a mass spectrum is obtained. LIMA has been used to examine a range of thin film materials with applications in electronic devices. The neutral photon probe avoids charging problems, and low conductivity materials are examined without prior metallization. Analyses of insulating silicon oxides, nitrides, and oxynitrides confirm estimates of composition from infrared measurements. However, the hydrogen content of hydrogenated amorphous silicon (a-Si:H) found by LIMA shows no correlation with values given by infrared absorption analysis. Explanations are proposed and discussed.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 930-936"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90226-0","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"87360712","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Impurity-induced surface acoustic wave attenuation in doped amorphous GeH thin films 掺杂非晶GeH薄膜中杂质诱导的表面声波衰减
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90208-9
K.L. Bhatia, S. Hunklinger

The technique of surface acoustic wave (SAW) has been applied to doped amorphous GeH films to gain information on the nature of defects. The attenuation of SAW of 300 MHz and 1.5 GHz has been measured in sputtered films of a-GeH doped with P or B at temperatures between 0.5 and 475 K. Sound velocity measurements are also made. A strong absorption maximum at low temperature is observed in a-Ge(H,P) and a-Ge(H,B) films. Distinct effects of annealing on the attenuation and velocity of SAW are observed. These impurity induced features are discussed in the light of acoustoelectric interaction. It is interesting to observe that a-Ge(H,B) film seems to have tunneling states characteristic of glasses.

表面声波(SAW)技术已被应用于掺杂非晶GeH薄膜中,以获得缺陷性质的信息。在掺杂P或B的a-GeH溅射薄膜中,在0.5 ~ 475 K的温度范围内测量了300 MHz和1.5 GHz的声呐衰减。还进行了声速测量。在A - ge (H,P)和A - ge (H,B)薄膜中观察到低温下的强吸收最大值。退火对声表面波的衰减和速度有明显的影响。从声电相互作用的角度讨论了这些杂质诱导的特征。有趣的是,a-Ge(H,B)薄膜似乎具有玻璃所特有的隧道态。
{"title":"Impurity-induced surface acoustic wave attenuation in doped amorphous GeH thin films","authors":"K.L. Bhatia,&nbsp;S. Hunklinger","doi":"10.1016/0378-5963(85)90208-9","DOIUrl":"10.1016/0378-5963(85)90208-9","url":null,"abstract":"<div><p>The technique of surface acoustic wave (SAW) has been applied to doped amorphous GeH films to gain information on the nature of defects. The attenuation of SAW of 300 MHz and 1.5 GHz has been measured in sputtered films of a-GeH doped with P or B at temperatures between 0.5 and 475 K. Sound velocity measurements are also made. A strong absorption maximum at low temperature is observed in a-Ge(H,P) and a-Ge(H,B) films. Distinct effects of annealing on the attenuation and velocity of SAW are observed. These impurity induced features are discussed in the light of acoustoelectric interaction. It is interesting to observe that a-Ge(H,B) film seems to have tunneling states characteristic of glasses.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 756-762"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90208-9","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"88202686","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A DLTS technique for surface state capture cross-section measurement of MOS diodes 用于MOS二极管表面态捕获截面测量的DLTS技术
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90234-X
Dipankar Sengupta, M.Mohan Chandra, Vikram Kumar

A modified DLTS technique is proposed for the direct measurement of capture cross-section of MOS surface states. The nature of temperature and energy dependence σn is inferred from data analysis. Temperature dependence of σn is shown to be consistent with the observed DLTS line shapes.

提出了一种改进的DLTS技术,用于直接测量MOS表面态的俘获截面。从数据分析中推断出温度和能量依赖的性质σn。σn的温度依赖性与观测到的DLTS线形一致。
{"title":"A DLTS technique for surface state capture cross-section measurement of MOS diodes","authors":"Dipankar Sengupta,&nbsp;M.Mohan Chandra,&nbsp;Vikram Kumar","doi":"10.1016/0378-5963(85)90234-X","DOIUrl":"10.1016/0378-5963(85)90234-X","url":null,"abstract":"<div><p>A modified DLTS technique is proposed for the direct measurement of capture cross-section of MOS surface states. The nature of temperature and energy dependence <em>σ</em><sub>n</sub> is inferred from data analysis. Temperature dependence of <em>σ</em><sub>n</sub> is shown to be consistent with the observed DLTS line shapes.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 1004-1010"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90234-X","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"78687637","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
期刊
Applications of Surface Science
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