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Application of the first-order bipolar model to harmonic distortion analysis of HBT's 一阶双极模型在HBT谐波畸变分析中的应用
B. Meskoob, S. Prasad
Although large-signal models for GaAs MESFETs have been developed extensively, the same is not true for heterojunction bipolar transistors (HBT's). A first-order model, based on first-order device physics, is used for harmonic distortion analysis of an InGaAs/InAlAs/InP inverted HBT. It is shown that the first-order model is adequate at medium power levels and inadequate at higher power levels where the device is driven into hard saturation and cutoff.<>
虽然GaAs mesfet的大信号模型已经得到了广泛的发展,但对于异质结双极晶体管(HBT)来说,情况并非如此。采用基于一阶器件物理的一阶模型对InGaAs/InAlAs/InP倒置HBT进行了谐波畸变分析。结果表明,一阶模型在中等功率水平下是合适的,而在高功率水平下则不合适,此时器件被驱动到硬饱和和截止。
{"title":"Application of the first-order bipolar model to harmonic distortion analysis of HBT's","authors":"B. Meskoob, S. Prasad","doi":"10.1109/CORNEL.1993.303093","DOIUrl":"https://doi.org/10.1109/CORNEL.1993.303093","url":null,"abstract":"Although large-signal models for GaAs MESFETs have been developed extensively, the same is not true for heterojunction bipolar transistors (HBT's). A first-order model, based on first-order device physics, is used for harmonic distortion analysis of an InGaAs/InAlAs/InP inverted HBT. It is shown that the first-order model is adequate at medium power levels and inadequate at higher power levels where the device is driven into hard saturation and cutoff.<<ETX>>","PeriodicalId":129440,"journal":{"name":"Proceedings of IEEE/Cornell Conference on Advanced Concepts in High Speed Semiconductor Devices and Circuits","volume":"361 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1993-08-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122791653","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Flow modulation growth of III-V compound semiconductors using a multichamber OMVPE reactor 多腔OMVPE反应器中III-V型化合物半导体的流动调制生长
B. L. Pitts, D. Emerson, M. Matragrano, K. L. Whittingham, B.P. Butterfield, J. Shealy
The flow modulation growth of high purity InP and GaAs based III-V compound semiconductors is demonstrated using a multichamber organometallic vapor phase epitaxy (OMVPE) apparatus. Flow modulation is performed by rotating substrates through spatially separated group III and group V rich zones without valve switching. This system has multiwafer capability and excellent compositional and thickness uniformity. In addition, using the appropriate flow conditions, phosphide and arsenide based superlattice structures can also be produced without the use of mechanical valve switching. High purity InP and GaAs have been realized, yielding low temperature (77 K) mobilities exceeding 110,000 and 115,000 cm/sup 2V s, respectively. Excellent transport and optical properties were also observed for GaInP-GaAs and GaInAs-InP structures. The multichamber reactor is a useful tool for both research and manufacturing of optoelectronic and high speed compound semiconductor devices.<>
利用多腔有机金属气相外延(OMVPE)装置,研究了高纯度InP和GaAs基III-V化合物半导体的流动调制生长。流量调制是通过旋转基片通过空间分离的III族和V族富区来实现的,没有阀门开关。该系统具有多晶片性能、良好的成分和厚度均匀性。此外,在适当的流动条件下,也可以在不使用机械阀门开关的情况下产生磷化物和砷化物基超晶格结构。已经实现了高纯度的InP和GaAs,低温(77 K)迁移率分别超过110,000和115,000 cm/sup 2V s。GaInP-GaAs和GaInAs-InP结构也具有优异的输运和光学性质。多腔室反应器是研究和制造光电和高速化合物半导体器件的有用工具。
{"title":"Flow modulation growth of III-V compound semiconductors using a multichamber OMVPE reactor","authors":"B. L. Pitts, D. Emerson, M. Matragrano, K. L. Whittingham, B.P. Butterfield, J. Shealy","doi":"10.1109/CORNEL.1993.303077","DOIUrl":"https://doi.org/10.1109/CORNEL.1993.303077","url":null,"abstract":"The flow modulation growth of high purity InP and GaAs based III-V compound semiconductors is demonstrated using a multichamber organometallic vapor phase epitaxy (OMVPE) apparatus. Flow modulation is performed by rotating substrates through spatially separated group III and group V rich zones without valve switching. This system has multiwafer capability and excellent compositional and thickness uniformity. In addition, using the appropriate flow conditions, phosphide and arsenide based superlattice structures can also be produced without the use of mechanical valve switching. High purity InP and GaAs have been realized, yielding low temperature (77 K) mobilities exceeding 110,000 and 115,000 cm/sup 2V s, respectively. Excellent transport and optical properties were also observed for GaInP-GaAs and GaInAs-InP structures. The multichamber reactor is a useful tool for both research and manufacturing of optoelectronic and high speed compound semiconductor devices.<<ETX>>","PeriodicalId":129440,"journal":{"name":"Proceedings of IEEE/Cornell Conference on Advanced Concepts in High Speed Semiconductor Devices and Circuits","volume":"28 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1993-08-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123395106","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Qualitatively modeling heterojunction bipolar transistors for optimization: a neural network approach 用于优化的异质结双极晶体管的定性建模:一种神经网络方法
M. Vai, Zhimin Xu, S. Prasad
A neural network approach is developed to qualitatively model the relationship between fabrication process parameters and the characteristics of a heterojunction bipolar transistor (HBT). An equivalent circuit model is used as an intermediate representation format for this objective. The goal of this research project is to develop a method that can predict and explain changes in the behavior of a device without the need for precise problem formulations and computationally intensive methods. The primary use of such a neural network model is in a reverse modeling process which performs device optimization.<>
采用神经网络方法对异质结双极晶体管(HBT)的制造工艺参数与特性之间的关系进行了定性建模。等效电路模型被用作此目标的中间表示格式。该研究项目的目标是开发一种方法,可以预测和解释设备行为的变化,而不需要精确的问题公式和计算密集型方法。这种神经网络模型的主要用途是在执行设备优化的反向建模过程中。
{"title":"Qualitatively modeling heterojunction bipolar transistors for optimization: a neural network approach","authors":"M. Vai, Zhimin Xu, S. Prasad","doi":"10.1109/CORNEL.1993.303090","DOIUrl":"https://doi.org/10.1109/CORNEL.1993.303090","url":null,"abstract":"A neural network approach is developed to qualitatively model the relationship between fabrication process parameters and the characteristics of a heterojunction bipolar transistor (HBT). An equivalent circuit model is used as an intermediate representation format for this objective. The goal of this research project is to develop a method that can predict and explain changes in the behavior of a device without the need for precise problem formulations and computationally intensive methods. The primary use of such a neural network model is in a reverse modeling process which performs device optimization.<<ETX>>","PeriodicalId":129440,"journal":{"name":"Proceedings of IEEE/Cornell Conference on Advanced Concepts in High Speed Semiconductor Devices and Circuits","volume":"9 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1993-08-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115300258","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 8
Novel metal/2-DEG junction transistors 新型金属/2度结晶体管
W. Peatman, H. Park, B. Gelmont, M. Shur, P. Maki, E. R. Brown, M. Rooks
We present here the research on new metal/2-dimensional electron gas (2-DEG) Schottky contacts. This new high speed contact has unique characteristics which are particularly promising for applications in the fields of millimeter wave electronics and high speed, low power integrated circuits. We describe here two new transistors which utilize a side-gate formed by plating gate metal into a trench etched through the plane of the 2-DEG. The first transistor is the Schottky-gated resonant tunneling transistor (SG-RTT) which has demonstrated high transconductance and novel switching properties at room temperature. The second device is a novel 2-dimensional metal-semiconductor field effect transistor (2-D MESFET) which is particularly promising for low power, high speed integrated circuit applications. We also briefly discuss several applications of these new transistors.<>
本文介绍了一种新型金属/二维电子气肖特基触点的研究。这种新型高速触点具有独特的特性,在毫米波电子和高速、低功耗集成电路领域的应用尤其有前景。我们在这里描述了两种新的晶体管,它们利用将栅极金属电镀到通过2°g平面蚀刻的沟槽中形成的侧门。第一个晶体管是肖特基门控谐振隧道晶体管(SG-RTT),它在室温下表现出高跨导和新颖的开关特性。第二个器件是一种新型的二维金属半导体场效应晶体管(2-D MESFET),它特别有希望用于低功耗,高速集成电路应用。我们还简要讨论了这些新型晶体管的几种应用。
{"title":"Novel metal/2-DEG junction transistors","authors":"W. Peatman, H. Park, B. Gelmont, M. Shur, P. Maki, E. R. Brown, M. Rooks","doi":"10.1109/CORNEL.1993.303101","DOIUrl":"https://doi.org/10.1109/CORNEL.1993.303101","url":null,"abstract":"We present here the research on new metal/2-dimensional electron gas (2-DEG) Schottky contacts. This new high speed contact has unique characteristics which are particularly promising for applications in the fields of millimeter wave electronics and high speed, low power integrated circuits. We describe here two new transistors which utilize a side-gate formed by plating gate metal into a trench etched through the plane of the 2-DEG. The first transistor is the Schottky-gated resonant tunneling transistor (SG-RTT) which has demonstrated high transconductance and novel switching properties at room temperature. The second device is a novel 2-dimensional metal-semiconductor field effect transistor (2-D MESFET) which is particularly promising for low power, high speed integrated circuit applications. We also briefly discuss several applications of these new transistors.<<ETX>>","PeriodicalId":129440,"journal":{"name":"Proceedings of IEEE/Cornell Conference on Advanced Concepts in High Speed Semiconductor Devices and Circuits","volume":"2 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1993-08-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124509425","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
On the feasibility of intersubband transition lasers 论子带间跃迁激光器的可行性
A. Afzali-Kushaa, G. Haddad, T. Norris
The feasibility and potential of laser sources based on intersubband transitions in quantum wells and strained layers will be presented. The basic schemes and proposed structures for both electrically and optically pumped devices are discussed. Both conduction band and valence band quantum wells as well as strained layers may be used as the active layer of these lasers. These sources can be either optically or electrically pumped with each having its own advantages. Various material systems which are appropriate for these applications will be described.<>
介绍了基于量子阱和应变层的子带间跃迁的激光源的可行性和潜力。讨论了电泵浦和光泵浦器件的基本方案和结构。导带和价带量子阱以及应变层都可以作为这些激光器的有源层。这些源既可以是光学泵浦,也可以是电泵浦,各有各的优点。将描述适用于这些应用的各种材料系统。
{"title":"On the feasibility of intersubband transition lasers","authors":"A. Afzali-Kushaa, G. Haddad, T. Norris","doi":"10.1109/CORNEL.1993.303083","DOIUrl":"https://doi.org/10.1109/CORNEL.1993.303083","url":null,"abstract":"The feasibility and potential of laser sources based on intersubband transitions in quantum wells and strained layers will be presented. The basic schemes and proposed structures for both electrically and optically pumped devices are discussed. Both conduction band and valence band quantum wells as well as strained layers may be used as the active layer of these lasers. These sources can be either optically or electrically pumped with each having its own advantages. Various material systems which are appropriate for these applications will be described.<<ETX>>","PeriodicalId":129440,"journal":{"name":"Proceedings of IEEE/Cornell Conference on Advanced Concepts in High Speed Semiconductor Devices and Circuits","volume":"54 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1993-08-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122571651","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Design and fabrication of thermally-stable AlGaAs/GaAs microwave power HBTs 热稳定AlGaAs/GaAs微波功率HBTs的设计与制造
B. Bayraktaroglu, R. Fitch, J. Barrette, R. Scherer, L. Kehias, C.I. Huang
Record power density performance of AlGaAs/GaAs microwave power heterojunction bipolar transistors (HBTs) was accomplished through the use of novel design and fabrication techniques. Thermally-stable operation of HBTs up to their electronic limitation (10 mWspl mu/m/sup 2/ output power density at 10 GHz with 0.6 W CW output power, 7.1 dB gain and 60% PAE) was attained. The design of the HBT was based on a detailed electro-thermal device analysis which revealed the necessity to provide an effective heat transfer path between heat sources in a multi-emitter power device. Excess heat was transferred out of the device using thermal shunt and thermal lens techniques. The thermal resistance of the device was lowered by a factor of 2.5-3 compared to conventional devices.<>
采用新颖的设计和制造技术,实现了AlGaAs/GaAs微波功率异质结双极晶体管(HBTs)创纪录的功率密度性能。在10 GHz、0.6 W连续波输出功率、7.1 dB增益和60% PAE条件下,HBTs达到其电子极限(10 mWspl mu/m/sup 2/输出功率密度)的热稳定运行。HBT的设计基于对电热器件的详细分析,揭示了在多发射极功率器件中提供有效的热源之间传热路径的必要性。使用热分流和热透镜技术将多余的热量传递出设备。与传统器件相比,该器件的热阻降低了2.5-3倍
{"title":"Design and fabrication of thermally-stable AlGaAs/GaAs microwave power HBTs","authors":"B. Bayraktaroglu, R. Fitch, J. Barrette, R. Scherer, L. Kehias, C.I. Huang","doi":"10.1109/CORNEL.1993.303072","DOIUrl":"https://doi.org/10.1109/CORNEL.1993.303072","url":null,"abstract":"Record power density performance of AlGaAs/GaAs microwave power heterojunction bipolar transistors (HBTs) was accomplished through the use of novel design and fabrication techniques. Thermally-stable operation of HBTs up to their electronic limitation (10 mWspl mu/m/sup 2/ output power density at 10 GHz with 0.6 W CW output power, 7.1 dB gain and 60% PAE) was attained. The design of the HBT was based on a detailed electro-thermal device analysis which revealed the necessity to provide an effective heat transfer path between heat sources in a multi-emitter power device. Excess heat was transferred out of the device using thermal shunt and thermal lens techniques. The thermal resistance of the device was lowered by a factor of 2.5-3 compared to conventional devices.<<ETX>>","PeriodicalId":129440,"journal":{"name":"Proceedings of IEEE/Cornell Conference on Advanced Concepts in High Speed Semiconductor Devices and Circuits","volume":"15 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1993-08-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130101235","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 14
Encapsulated GaAs power MESFET 封装GaAs功率MESFET
N. Nguyen, J. Ibbetson, J. Yen, M. Hashemi, Utkarsh Mishra
Utilizing a combination of low-temperature-grown Al/sub 0.3/Ga/sub 0.7/As passivation, overlapping gate, MOCVD regrowth of the source/drain contacts, and isolation by boron ion implantation, we have fabricated a GaAs MESFET with a completely encapsulated channel. Electrical characterization of the device shows that the early catastrophic on-state breakdown is suppressed. In contrast to the usually observed characteristics in GaAs MESFET, the breakdown locus of the device also has a positive slope. These improvements should allow us to bias the device at a higher operating point, thereby increasing the obtainable maximum output power in the device.<>
利用低温生长Al/sub 0.3/Ga/sub 0.7/As钝化、重叠栅极、源极/漏极MOCVD再生和硼离子注入隔离相结合的方法,我们制备了具有完全封装通道的GaAs MESFET。该器件的电学特性表明,早期灾难性导通击穿被抑制。与通常在GaAs MESFET中观察到的特性相反,器件的击穿轨迹也具有正斜率。这些改进应该允许我们在更高的工作点偏置器件,从而增加器件可获得的最大输出功率。
{"title":"Encapsulated GaAs power MESFET","authors":"N. Nguyen, J. Ibbetson, J. Yen, M. Hashemi, Utkarsh Mishra","doi":"10.1109/CORNEL.1993.303128","DOIUrl":"https://doi.org/10.1109/CORNEL.1993.303128","url":null,"abstract":"Utilizing a combination of low-temperature-grown Al/sub 0.3/Ga/sub 0.7/As passivation, overlapping gate, MOCVD regrowth of the source/drain contacts, and isolation by boron ion implantation, we have fabricated a GaAs MESFET with a completely encapsulated channel. Electrical characterization of the device shows that the early catastrophic on-state breakdown is suppressed. In contrast to the usually observed characteristics in GaAs MESFET, the breakdown locus of the device also has a positive slope. These improvements should allow us to bias the device at a higher operating point, thereby increasing the obtainable maximum output power in the device.<<ETX>>","PeriodicalId":129440,"journal":{"name":"Proceedings of IEEE/Cornell Conference on Advanced Concepts in High Speed Semiconductor Devices and Circuits","volume":"6 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1993-08-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121182747","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Luminescence from Si-based materials and devices 硅基材料和器件的发光
J. Campbell, K.-H. Li, C. Tsai
While numerous luminescence effects have been reported for Si-based materials, with few exceptions the efficiencies have been extremely low. The observation of strong, room-temperature, visible emission from porous Si has renewed interest in and stimulated research on light emission from column IV materials. This paper reviews some of the accomplishments that may presage the development of Si-based light emitters.<>
虽然硅基材料已经报道了许多发光效应,但除了少数例外,效率非常低。从多孔硅中观察到的强的、室温的可见光发射,重新激发了人们对柱IV材料的光发射的研究兴趣。本文综述了一些可能预示着硅基发光材料发展的研究成果。
{"title":"Luminescence from Si-based materials and devices","authors":"J. Campbell, K.-H. Li, C. Tsai","doi":"10.1109/CORNEL.1993.303065","DOIUrl":"https://doi.org/10.1109/CORNEL.1993.303065","url":null,"abstract":"While numerous luminescence effects have been reported for Si-based materials, with few exceptions the efficiencies have been extremely low. The observation of strong, room-temperature, visible emission from porous Si has renewed interest in and stimulated research on light emission from column IV materials. This paper reviews some of the accomplishments that may presage the development of Si-based light emitters.<<ETX>>","PeriodicalId":129440,"journal":{"name":"Proceedings of IEEE/Cornell Conference on Advanced Concepts in High Speed Semiconductor Devices and Circuits","volume":"27 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1993-08-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116321531","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A proposed Stark shift electrooptic device operating in visible wavelengths 一种在可见光波段工作的斯塔克位移电光器件
A. A. Chowdhury, M. Rashed, C. Maziar
We report calculations of transition energies as a function of applied electric field for different combinations of GaP and AlP thicknesses. Most of the calculated red shifted transition energies fall within the orange/yellow region of the visible spectrum. These results may prove to be useful in designing Stark shift electrooptic devices operating in visible wavelengths.<>
我们报告了不同的GaP和AlP厚度组合的跃迁能量作为外加电场的函数的计算。大多数计算的红移跃迁能量落在可见光谱的橙色/黄色区域内。这些结果可能对设计工作在可见光波段的斯塔克位移电光器件有用。
{"title":"A proposed Stark shift electrooptic device operating in visible wavelengths","authors":"A. A. Chowdhury, M. Rashed, C. Maziar","doi":"10.1109/CORNEL.1993.303082","DOIUrl":"https://doi.org/10.1109/CORNEL.1993.303082","url":null,"abstract":"We report calculations of transition energies as a function of applied electric field for different combinations of GaP and AlP thicknesses. Most of the calculated red shifted transition energies fall within the orange/yellow region of the visible spectrum. These results may prove to be useful in designing Stark shift electrooptic devices operating in visible wavelengths.<<ETX>>","PeriodicalId":129440,"journal":{"name":"Proceedings of IEEE/Cornell Conference on Advanced Concepts in High Speed Semiconductor Devices and Circuits","volume":"83 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1993-08-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126197612","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A novel GaSb/AlSb/InAs high efficiency rectifying diode 一种新型GaSb/AlSb/InAs高效整流二极管
R. Ferro, R. Robson, W. Hooper, T. Hasenberg, L.D. Bailey, S. Newell
We have fabricated a novel type of interband resonant tunnel diode by MBE growth of a superlattice, each period of which consists of layers of GaSb, AlSb and InAs. The diode is designed to conduct in forward bias by resonant interband tunneling, so that the entire stack appears to be a short circuit. Reverse bias current is impeded by band gap blocking. The reverse breakdown voltage varies with the number of periods, with each period capable of blocking about 0.4 V. A four period diode conducts 5000 A/cm/sup 2/ at less than 0.3 V of forward bias.<>
我们利用超晶格的MBE生长制备了一种新型带间谐振隧道二极管,其每个周期由GaSb、AlSb和InAs层组成。该二极管被设计为通过共振带间隧道在正向偏置中导电,因此整个堆栈看起来像是短路。反向偏置电流受到带隙阻塞的阻碍。反向击穿电压随周期数的变化而变化,每个周期能够阻断约0.4 V。四周期二极管在小于0.3 V的正向偏压下传导5000a /cm/sup /。
{"title":"A novel GaSb/AlSb/InAs high efficiency rectifying diode","authors":"R. Ferro, R. Robson, W. Hooper, T. Hasenberg, L.D. Bailey, S. Newell","doi":"10.1109/CORNEL.1993.303103","DOIUrl":"https://doi.org/10.1109/CORNEL.1993.303103","url":null,"abstract":"We have fabricated a novel type of interband resonant tunnel diode by MBE growth of a superlattice, each period of which consists of layers of GaSb, AlSb and InAs. The diode is designed to conduct in forward bias by resonant interband tunneling, so that the entire stack appears to be a short circuit. Reverse bias current is impeded by band gap blocking. The reverse breakdown voltage varies with the number of periods, with each period capable of blocking about 0.4 V. A four period diode conducts 5000 A/cm/sup 2/ at less than 0.3 V of forward bias.<<ETX>>","PeriodicalId":129440,"journal":{"name":"Proceedings of IEEE/Cornell Conference on Advanced Concepts in High Speed Semiconductor Devices and Circuits","volume":"49 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1993-08-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126577609","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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Proceedings of IEEE/Cornell Conference on Advanced Concepts in High Speed Semiconductor Devices and Circuits
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