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Light-controlled threshold switching memristive neuron devices for color photoreceptor 用于彩色感光器的光控阈值开关记忆神经元器件
IF 4.9 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-07-29 DOI: 10.1109/led.2024.3435437
Xuanyu Shan, Zhiyong Liu, Ye Tao, Yongjun Dong, Zhongqiang Wang, Jingyao Bian, Xiaoning Zhao, Ya Lin, Haiyang Xu, Yichun Liu
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引用次数: 0
Ultra-low Gate Leakage Current and Enhanced Gate Reliability in p-GaN HEMT with AlN/GaN/AlN Double Barriers Cap Layer 具有 AlN/GaN/AlN 双势垒帽层的 p-GaN HEMT 中的超低栅极漏电流和更高栅极可靠性
IF 4.9 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-07-29 DOI: 10.1109/led.2024.3435501
Kai Liu, Chong Wang, Xuefeng Zheng, Xiaohua Ma, Kuo Zhang, Wentao Zhang, Junchun Bai, Ang Li, Yue Hao
{"title":"Ultra-low Gate Leakage Current and Enhanced Gate Reliability in p-GaN HEMT with AlN/GaN/AlN Double Barriers Cap Layer","authors":"Kai Liu, Chong Wang, Xuefeng Zheng, Xiaohua Ma, Kuo Zhang, Wentao Zhang, Junchun Bai, Ang Li, Yue Hao","doi":"10.1109/led.2024.3435501","DOIUrl":"https://doi.org/10.1109/led.2024.3435501","url":null,"abstract":"","PeriodicalId":13198,"journal":{"name":"IEEE Electron Device Letters","volume":null,"pages":null},"PeriodicalIF":4.9,"publicationDate":"2024-07-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141863575","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Improvement of Field Emission Performance of Multilayered Porous Silicon-Based Electron Source through Hydrogen Passivation 通过氢钝化改善多层多孔硅电子源的场发射性能
IF 4.9 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-07-29 DOI: 10.1109/led.2024.3435405
Li He, Sailei Li, Qi He, Biqi Miao, Qinglei Jiang, Guiying Shen, Wei Luo
{"title":"Improvement of Field Emission Performance of Multilayered Porous Silicon-Based Electron Source through Hydrogen Passivation","authors":"Li He, Sailei Li, Qi He, Biqi Miao, Qinglei Jiang, Guiying Shen, Wei Luo","doi":"10.1109/led.2024.3435405","DOIUrl":"https://doi.org/10.1109/led.2024.3435405","url":null,"abstract":"","PeriodicalId":13198,"journal":{"name":"IEEE Electron Device Letters","volume":null,"pages":null},"PeriodicalIF":4.9,"publicationDate":"2024-07-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141863578","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Novel Low On-State Voltage Reverse-Conducting LIGBT with an Electron-Controlled Gate 带有电子控制栅极的新型低导通电压反向导电 LIGBT
IF 4.9 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-07-29 DOI: 10.1109/led.2024.3435037
Baoxing Duan, Jiasen Wang, Chunping Tang, Yintang Yang
{"title":"Novel Low On-State Voltage Reverse-Conducting LIGBT with an Electron-Controlled Gate","authors":"Baoxing Duan, Jiasen Wang, Chunping Tang, Yintang Yang","doi":"10.1109/led.2024.3435037","DOIUrl":"https://doi.org/10.1109/led.2024.3435037","url":null,"abstract":"","PeriodicalId":13198,"journal":{"name":"IEEE Electron Device Letters","volume":null,"pages":null},"PeriodicalIF":4.9,"publicationDate":"2024-07-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141863570","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Reservoir computing utilizing a complementary combination of n- and p-channel FeFETs 利用 n 沟道和 p 沟道 FeFET 的互补组合进行存储计算
IF 4.9 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-07-29 DOI: 10.1109/led.2024.3435422
Rikuo Suzuki, Kasidit Toprasertpong, Ryosho Nakane, Eishin Nako, Mitsuru Takenaka, Shinichi Takagi
{"title":"Reservoir computing utilizing a complementary combination of n- and p-channel FeFETs","authors":"Rikuo Suzuki, Kasidit Toprasertpong, Ryosho Nakane, Eishin Nako, Mitsuru Takenaka, Shinichi Takagi","doi":"10.1109/led.2024.3435422","DOIUrl":"https://doi.org/10.1109/led.2024.3435422","url":null,"abstract":"","PeriodicalId":13198,"journal":{"name":"IEEE Electron Device Letters","volume":null,"pages":null},"PeriodicalIF":4.9,"publicationDate":"2024-07-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141863577","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Investigation of p- and n-Type Quantum Dot Arrays Manufactured in 22nm FDSOI CMOS at 2-4 K and 300 K 研究在 2-4 K 和 300 K 温度条件下用 22 纳米 FDSOI CMOS 制造的 p 型和 n 型量子点阵列
IF 4.9 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-07-29 DOI: 10.1109/led.2024.3435380
Shai Bonen, Suyash Pati Tripathi, Julie McIntosh, Thomas Jager, Sorin P. Voinigescu
{"title":"Investigation of p- and n-Type Quantum Dot Arrays Manufactured in 22nm FDSOI CMOS at 2-4 K and 300 K","authors":"Shai Bonen, Suyash Pati Tripathi, Julie McIntosh, Thomas Jager, Sorin P. Voinigescu","doi":"10.1109/led.2024.3435380","DOIUrl":"https://doi.org/10.1109/led.2024.3435380","url":null,"abstract":"","PeriodicalId":13198,"journal":{"name":"IEEE Electron Device Letters","volume":null,"pages":null},"PeriodicalIF":4.9,"publicationDate":"2024-07-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141872630","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Single-Step Extraction of Transformer Attention with Dual-Gated Memtransistor Crossbars 利用双门控晶体管横杆单步提取变压器注意力
IF 4.9 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-07-29 DOI: 10.1109/led.2024.3435540
Nethmi Jayasinghe, Maeesha Binte Hashem, Dinithi Jayasuriya, Leila Rahimifard, Min-A Kang, Vinod K. Sangwan, Mark C. Hersam, Amit Ranjan Trivedi
{"title":"Single-Step Extraction of Transformer Attention with Dual-Gated Memtransistor Crossbars","authors":"Nethmi Jayasinghe, Maeesha Binte Hashem, Dinithi Jayasuriya, Leila Rahimifard, Min-A Kang, Vinod K. Sangwan, Mark C. Hersam, Amit Ranjan Trivedi","doi":"10.1109/led.2024.3435540","DOIUrl":"https://doi.org/10.1109/led.2024.3435540","url":null,"abstract":"","PeriodicalId":13198,"journal":{"name":"IEEE Electron Device Letters","volume":null,"pages":null},"PeriodicalIF":4.9,"publicationDate":"2024-07-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141872634","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Top-Gate Indium-Tin-Oxide Power Transistors Featuring High Breakdown Voltage of 156 V 具有 156 V 高击穿电压的顶栅氧化铟锡功率晶体管
IF 4.9 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-07-29 DOI: 10.1109/led.2024.3435428
Jiawei Xie, Yuxuan Wang, Zijie Zheng, Yuye Kang, Xuanqi Chen, Gerui Zheng, Rui Shao, Kaizhen Han, Xiao Gong
{"title":"Top-Gate Indium-Tin-Oxide Power Transistors Featuring High Breakdown Voltage of 156 V","authors":"Jiawei Xie, Yuxuan Wang, Zijie Zheng, Yuye Kang, Xuanqi Chen, Gerui Zheng, Rui Shao, Kaizhen Han, Xiao Gong","doi":"10.1109/led.2024.3435428","DOIUrl":"https://doi.org/10.1109/led.2024.3435428","url":null,"abstract":"","PeriodicalId":13198,"journal":{"name":"IEEE Electron Device Letters","volume":null,"pages":null},"PeriodicalIF":4.9,"publicationDate":"2024-07-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141863569","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Efficient Perovskite-Based Near-Infrared Micro Light-Emitting Diode and Size-Effect Analysis 基于 Perovskite 的高效近红外微型发光二极管及尺寸效应分析
IF 4.1 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-07-29 DOI: 10.1109/LED.2024.3434727
Wenjie Wei;Yikai Yun;Shaoqun Li;Zhuoying Jiang;Sijie Jiang;Jianfeng Du;Yuanyuan Tian;Hongqiang Luo;Jinchai Li;Kai Huang;Mengyu Chen;Cheng Li;Rong Zhang
The state-of-the-art micro-LEDs based on group III-V chips face the challenges in size-effect and mass transfer. Recently, perovskite LEDs have rapidly developed, and their solution processability may show great advance in the miniaturization and integration with driving circuit. However, the majority of research on perovskite micro-LEDs (micro-PeLEDs) have been focused on visible light, leaving the study of near-infrared micro-PeLEDs in its infancy. Herein, we report a photolithography-compatible method for the first demonstration of near-infrared micro-PeLEDs. A peak external quantum efficiency of 5.9% is achieved with $50~mu $ m pixel size and the size-effect of micro-PeLEDs is further discussed. The hyperspectral PL imaging shows the photoluminescence (PL) properties of the pixelized perovskite are not greatly affected by pixel size, and the electroluminescence (EL) analysis reveals that the size-related EL reduction is mainly caused by the inefficient current injection, which is easily to be optimized. Therefore, our work reveals that the perovskite with dispersed grains have an outstanding potential in the field of miniaturization.
基于 III-V 族芯片的先进微型 LED 面临着尺寸效应和传质方面的挑战。最近,包晶体 LED 得到了快速发展,其溶液可加工性可能会在微型化和与驱动电路集成方面取得巨大进步。然而,有关包晶体微型 LED(micro-PeLED)的研究大多集中在可见光领域,对近红外微型 LED 的研究尚处于起步阶段。在此,我们报告了一种光刻兼容方法,首次展示了近红外微型 LED。在 50~mu $ m 像素尺寸下实现了 5.9% 的峰值外部量子效率,并进一步讨论了微型 PeLED 的尺寸效应。高光谱聚光成像显示,像素化包晶石的光致发光(PL)特性受像素尺寸的影响不大,而电致发光(EL)分析表明,与尺寸相关的EL降低主要是由低效电流注入造成的,这一点很容易优化。因此,我们的研究揭示了具有分散晶粒的过氧化物在微型化领域的巨大潜力。
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引用次数: 0
Evidence of Widely Distributed Time Constants in the Vertical Charge Loss of 3-D Charge-Trap NAND Flash Memories 三维电荷捕获 NAND 闪存垂直电荷损耗中广泛分布的时间常数证据
IF 4.9 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-07-29 DOI: 10.1109/led.2024.3435345
David G. Refaldi, Gerardo Malavena, Luca Chiavarone, Alessandro S. Spinelli, Christian Monzio Compagnoni
{"title":"Evidence of Widely Distributed Time Constants in the Vertical Charge Loss of 3-D Charge-Trap NAND Flash Memories","authors":"David G. Refaldi, Gerardo Malavena, Luca Chiavarone, Alessandro S. Spinelli, Christian Monzio Compagnoni","doi":"10.1109/led.2024.3435345","DOIUrl":"https://doi.org/10.1109/led.2024.3435345","url":null,"abstract":"","PeriodicalId":13198,"journal":{"name":"IEEE Electron Device Letters","volume":null,"pages":null},"PeriodicalIF":4.9,"publicationDate":"2024-07-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141872633","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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IEEE Electron Device Letters
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