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Alphavoltaic Performance of 4H-SiC Schottky Barrier Diodes 4H-SiC 肖特基势垒二极管的阿尔法光伏性能
IF 1.8 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-08-22 DOI: 10.1109/tns.2024.3447772
A. Shilpa, N V L Narasimha Murty
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引用次数: 0
Mechanism and Physical Model of the Single-Event Leakage Current for SiC JBS Diodes SiC JBS 二极管单事件泄漏电流的机理和物理模型
IF 1.8 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-08-21 DOI: 10.1109/tns.2024.3446850
Xiaoping Dong, Mingmin Huang, Yao Ma, Chengwen Fu, Mu He, Zhimei Yang, Yun Li, Min Gong
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引用次数: 0
New Developments for the Trigger-Time-Event System for the W7-X Experiment W7-X 试验触发-时间-事件系统的新发展
IF 1.8 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-08-19 DOI: 10.1109/tns.2024.3445502
J. Schacht, T. Brockmann, M. Marquardt, J. Recknagel, T. Schröder
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引用次数: 0
Cross-Chip Partial Reconfiguration for the Initialisation of Modular and Scalable Heterogeneous Systems 用于模块化和可扩展异构系统初始化的跨芯片部分重新配置
IF 1.8 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-08-19 DOI: 10.1109/tns.2024.3446309
Marvin Fuchs, Hendrik Krause, Timo Muscheid, Lukas Scheller, Luis E. Ardila-Perez, Oliver Sander
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引用次数: 0
Proton Irradiation Effects on Dual Delta-Doped AlGaAs/InGaAs/AlGaAs Pseudomorphic High-Electron-Mobility Transistors 质子辐照对双Δ掺杂 AlGaAs/InGaAs/AlGaAs 伪态高电子迁移率晶体管的影响
IF 1.9 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-08-19 DOI: 10.1109/TNS.2024.3445351
Shuhao Hou;Shangli Dong;Jianqun Yang;Zhongli Liu;Enhao Guan;Jinhua Liu;Gang Lin;Guojian Shao;Yubao Zhang;Jicheng Jiang;Xingji Li
In this article, we mainly studied the proton irradiation effects on novel dual delta-doping GaAs-based pseudomorphic high-electron-mobility transistors (PHEMTs). The conventional heterojunction high-electron-mobility transistors (HFETs) were selected as control. The insensitivity of Co $^{60}~gamma $ -rays (up to 100 Mrad) indicates that displacement effects predominate in the degradation of threshold voltages ( $V_{mathrm {TH}}$ ) and drain current ( $I_{mathrm {DS}}$ ). Based on the incident depth of protons in device, there are two types of irradiation effects: uniform (thin target) and nonuniform (thick target). For the former, 3-, 40-, and 80-MeV protons were employed to explore the energy dependence in PHEMTs. It was found that the effect of protons on PHEMTs depends on nonionizing energy loss (NIEL), and it is possible to predict the impact of different protons on $V_{mathrm {TH}}$ by NIEL alone. As for nonuniform irradiation, the incident range of 150-keV protons in gated and ungated regions of both PHEMTs and HFETs determines the case in which $I_{mathrm {DS}}$ decreases, while $V_{mathrm {TH}}$ remains constant as the fluence increases. Finally, this novel PHEMT with a higher donor concentration (provided by double delta doping) and higher mobility (InGaAs channel) was found to have a greater radiation hardness than HFETs.
本文主要研究了质子辐照对基于砷化镓的新型双δ掺杂拟态高电子迁移率晶体管(PHEMT)的影响。我们选择了传统的异质结高电子迁移率晶体管(HFET)作为对照。Co $^{60}~gamma $ 射线(高达 100 Mrad)的不敏感性表明,位移效应在阈值电压($V_{mathrm {TH}}$ )和漏极电流($I_{mathrm {DS}}$ )的衰减中占主导地位。根据质子在器件中的入射深度,可分为均匀(薄靶)和非均匀(厚靶)两种辐照效应。对于前者,采用 3、40 和 80-MeV 质子来探索 PHEMT 的能量依赖性。研究发现,质子对 PHEMT 的影响取决于非电离能量损耗(NIEL),仅通过 NIEL 就可以预测不同质子对 $V_{mathrm {TH}}$ 的影响。至于非均匀辐照,PHEMT 和 HFET 的栅极和非栅极区域中 150-keV 质子的入射范围决定了 $I_{mathrm {DS}}$ 会降低,而 $V_{mathrm {TH}}$ 会随着通量的增加而保持不变。最后,我们发现这种新型 PHEMT 具有更高的供体浓度(通过双三角掺杂提供)和更高的迁移率(InGaAs 沟道),与 HFET 相比具有更高的辐射硬度。
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引用次数: 0
IEEE Transactions on Nuclear Science information for authors 电气和电子工程师学会《核科学学报》为作者提供的信息
IF 1.9 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-08-16 DOI: 10.1109/TNS.2024.3437929
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引用次数: 0
In Memoriam Miguel Angel Aguirre 悼念米格尔-安赫尔-阿吉雷
IF 1.9 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-08-16 DOI: 10.1109/TNS.2024.3435108
Recounts the career and contributions of Miguel Angel Aguirre.
讲述米格尔-安赫尔-阿吉雷的职业生涯和贡献。
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引用次数: 0
IEEE Transactions on Nuclear Science publication information 电气和电子工程师学会《核科学学报》出版物信息
IF 1.9 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-08-16 DOI: 10.1109/TNS.2024.3437928
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引用次数: 0
IEEE Nuclear Science Symposium, Medical Imaging Conference, and Room Temperature Semiconductor Detector Conference 电气和电子工程师协会核科学研讨会、医学影像会议和室温半导体探测器会议
IF 1.9 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-08-16 DOI: 10.1109/TNS.2024.3440705
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引用次数: 0
IEEE Transactions on Nuclear Science 2024 Best Paper Award 电气和电子工程师学会《核科学学报》2024 年度最佳论文奖
IF 1.9 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-08-16 DOI: 10.1109/TNS.2024.3423928
Zane W. Bell
The IEEE Transactions on Nuclear Science Best Paper Award is an annual award recognizing the most significant paper published in the TRANSACTIONS in a given year. The award is sponsored by the IEEE Nuclear and Plasma Sciences Society and the winning paper is selected according to its quantifiable usefulness to the community. The authors of papers published in the TRANSACTIONS in the third year prior to the year of the award are eligible for consideration. Thus, the 2024 award is awarded to the paper published in calendar year 2021 judged to be the most useful to our community based on metrics calculated for the years 2021, 2022, and 2023.
电气和电子工程师学会核科学论文集最佳论文奖是一个年度奖项,旨在表彰该年度在《核科学论文集》上发表的最重要的论文。该奖项由 IEEE 核与等离子体科学协会赞助,获奖论文根据其对社区的量化有用性进行评选。获奖前第三年在 TRANSACTIONS 上发表论文的作者有资格参选。因此,2024 年的奖项将授予 2021 日历年发表的论文,根据 2021 年、2022 年和 2023 年计算的指标,该论文被判定为对我们的社区最有用。
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引用次数: 0
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