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Measurement of Neutron-Induced Single-Event Upset Cross Section of UltraScale Kintex FPGA Using Time-of-Flight Technique 利用飞行时间技术测量中子诱导的超尺度Kintex FPGA单事件扰动截面
IF 1.9 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-10-18 DOI: 10.1109/TNS.2024.3482881
Yao Teng;Changqing Feng;Zhixin Tan;Zhengtao Liu;Zhizhen Qin;Songsong Tang;Ruirui Fan;Bin Zhou;Zhiliang Hu;Lei Zhao;Shubin Liu;Haofan Bai;Jiangbo Bai;Jie Bao;Ping Cao;Qiping Chen;Yonghao Chen;Wenhao Duan;Anchuan Fan;Minhao Gu;Changcai Han;Zijie Han;Guozhu He;Yongcheng He;Yang Hong;Yiwei Hu;Hanxiong Huang;Wei Jiang;Zhijie Jiang;Ling Kang;Changlin Lan;Bo Li;Feng Li;Qiang Li;Xiao Li;Yang Li;Jie Liu;Rong Liu;Yina Liu;Guangyuan Luan;Changjun Ning;Yijia Qiu;Jie Ren;Wenkai Ren;Zhizhou Ren;Xichao Ruan;Zhaohui Song;Kang Sun;Jingyu Tang;Shengda Tang;Jincheng Wang;Lijiao Wang;Pengcheng Wang;Zhaohui Wang;Zhongwei Wen;Xiaoguang Wu;Xuan Wu;Zepeng Wu;Cong Xia;Likun Xie;Han Yi;Tao Yu;Yongji Yu;Guohui Zhang;Hangchang Zhang;Qiwei Zhang;Xianpeng Zhang;Yuliang Zhang;Zhiyong Zhang;Maoyuan Zhao;Zhihao Zhou;Kejun Zhu;Chong Zou
The correlation between neutron energy and neutron-induced soft error rate (SER) is crucial for estimating the impact on electronic devices fabricated using complementary metal-oxide-semiconductor (CMOS) technology in diverse neutron environments, including those found in high-energy physics experiments, aviation settings, and so on. This article presents an investigation conducted independently at China spallation neutron source (CSNS) using the Back-n white neutron source and atmospheric neutron irradiation spectrometer (ANIS) neutron source to directly measure single-event upset (SEU) effects of the configuration random access memory (CRAM) and block random access memory (BRAM) in 20-nm CMOS technology-based UltraScale Kintex FPGA. By recording the frequency of SEU events and the time of flight (TOF), SEU cross sections can be calculated for different energies. Experiment in situ indicates a coherent alignment of different outcomes under neutron irradiation from Back-n and ANIS, despite their different neutron energy spectra. The SEU threshold energy is estimated to be $0.69~pm ~0.076$ MeV for CRAM and $0.80~pm ~0.013$ MeV for BRAM. The measured cross sections can reach saturation of $6.9times 10^{-15}$ cm2/bit and $1.6times 10^{-14}$ cm2/bit for CRAM and BRAM, respectively, while the neutron energy is about 20 MeV.
中子能量和中子诱导软误差率(SER)之间的相关性对于评估在不同中子环境下使用互补金属氧化物半导体(CMOS)技术制造的电子器件的影响至关重要,包括高能物理实验、航空环境等。本文利用Back-n白中子源和大气中子辐照光谱仪(ANIS)中子源,在中国散裂中子源(CSNS)上进行了独立研究,直接测量了基于20纳米CMOS技术的UltraScale Kintex FPGA中配置随机存取存储器(CRAM)和块随机存取存储器(BRAM)的单事件扰动(SEU)效应。通过记录SEU事件的频率和飞行时间(TOF),可以计算出不同能量下的SEU截面。原位实验表明,尽管Back-n和ANIS的中子能谱不同,但它们在中子辐照下的结果却不同。估计CRAM的SEU阈值能量为$0.69~ $ 0.076$ MeV, BRAM为$0.80~ $ 0.013$ MeV。CRAM和BRAM的测量截面分别达到$6.9 × 10^{-15}$ cm2/bit和$1.6 × 10^{-14}$ cm2/bit的饱和,而中子能量约为20 MeV。
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引用次数: 0
TechRxiv: Share Your Preprint Research with the World! TechRxiv:与世界分享您的预印本研究成果!
IF 1.9 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-10-18 DOI: 10.1109/TNS.2024.3479589
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引用次数: 0
IEEE Transactions on Nuclear Science publication information 电气和电子工程师学会《核科学学报》出版物信息
IF 1.9 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-10-18 DOI: 10.1109/TNS.2024.3476049
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引用次数: 0
β-Ga₂O₃-Based Solar-Blind Schottky Diode Alpha Particle Detector 基于β-Ga₂O₃的太阳盲肖特基二极管α粒子探测器
IF 1.9 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-10-17 DOI: 10.1109/TNS.2024.3482431
Hezhi Zhang;Jing Di;Man Hoi Wong;Song Zhang;Zengyin Dong;Xiaochuan Xia;Zhenzhong Zhang;Hongwei Liang
In this article, we report a $beta $ -Ga2O3-based solar-blind Schottky diode $alpha $ particle detector. The 20- $mu $ m unintentionally doped $beta $ -Ga2O3 drift region was grown on n $^{+} beta $ -Ga2O3 substrate. XRD rocking curve revealed high crystalline quality with a narrow full-width at half-maximum (FWHM) of 45.15 arcsec for the (002) diffraction peak. The bandgap of as-grown sample, estimated by absorption spectroscopy, was approximately 4.74 eV, placing it within the solar-blind region. The $3times 3$ mm square $beta $ -Ga2O3-based vertical detectors were fabricated by depositing Ni/Au Schottky contacts on drift region and Ti/Au ohmic contacts on substrate, respectively. Detection of241Am $alpha $ particle was performed under various reverse biases reaching 33% for energy resolution and 90% for charge collection efficiency (CCE) at −140 V. The measurement under 365-nm illumination indicated strong near-UV resistance for the $beta $ -Ga2O3-based detector compared with the SiC-based detector. These results demonstrate the promise of $beta $ -Ga2O3 detectors for solar-blind $alpha $ particle detection in field environments.
在本文中,我们报道了一个$beta $ - ga2o3基太阳盲肖特基二极管$alpha $粒子探测器。在n $^{+} beta $ - ga2o3衬底上生长了20- $mu $ m无意掺杂的$beta $ - ga2o3漂移区。XRD摇摆曲线显示,(002)衍射峰的半峰全宽(FWHM)为45.15 arcsec,晶体质量较高。通过吸收光谱估计,生长样品的带隙约为4.74 eV,处于太阳盲区。通过在漂移区沉积Ni/Au肖特基触点,在衬底沉积Ti/Au欧姆触点,制备了$3times 3$ mm方$beta $ - ga2o3垂直探测器。对241am $alpha $粒子的检测在不同的反向偏置下达到33% for energy resolution and 90% for charge collection efficiency (CCE) at −140 V. The measurement under 365-nm illumination indicated strong near-UV resistance for the $beta $ -Ga2O3-based detector compared with the SiC-based detector. These results demonstrate the promise of $beta $ -Ga2O3 detectors for solar-blind $alpha $ particle detection in field environments.
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引用次数: 0
Degradation Under Low Drain Bias Induced by Heavy Ion in SiC MOSFETs 碳化硅 MOSFET 在重离子诱导的低漏极偏压下的性能退化
IF 1.9 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-10-16 DOI: 10.1109/TNS.2024.3481367
Leshan Qiu;Yun Bai;Zewei Dong;Jieqin Ding;Jilong Hao;Yidan Tang;Xiaoli Tian;Chengzhan Li;Xinyu Liu
The safe operating area (SOA) for the drain bias of silicon carbide (SiC) metal oxide semiconductor field effect transistors (MOSFETs) in space applications has been limited due to the single-event effects (SEEs) induced by heavy-ion irradiation. At a drain bias lower than 5% of the rated voltage, SiC MOSFETs are typically considered to be in the charge collection region, which usually does not cause destructive damage. However, in this article, the degradation induced by heavy ions at drain biases below 50 V for 1200 V SiC MOSFETs has been observed. During irradiation, the drain leakage current ( ${I} {_{text {DSS}}}$ ) continuously increased with the accumulated dose. Meanwhile, the ${I} {_{text {DSS}}}$ degradation showed a correlation between the drain bias and the cell topology of SiC MOSFETs. After irradiation, unacceptable ${I} {_{text {DSS}}}$ degradation was still observed, but it recovered by about 40% after a month of room-temperature annealing. ${I} {_{text {DSS}}}$ also returned to its preirradiation level under negative gate bias, suggesting that the increase in ${I} {_{text {DSS}}}$ could be associated with a leakage current path through the channel region, resulting from defects within the oxide or at the SiO2/SiC interface, likely introduced by the microdose effect. The gate leakage current ( ${I} {_{text {GSS}}}$ ) was tested within the temperature range of 25 °C–250 °C to investigate the temperature impact for gate oxide latent damage activation. As the drain bias increased during irradiation, ${I} {_{text {GSS}}}$ also increased significantly at higher temperatures, suggesting that latent damage within the gate oxide had been formed during irradiation.
由于重离子辐照引起的单次事件效应(SEE),碳化硅(SiC)金属氧化物半导体场效应晶体管(MOSFET)在太空应用中漏极偏置的安全工作区(SOA)一直受到限制。在漏极偏压低于额定电压的 5%时,SiC MOSFET 通常被认为处于电荷收集区,通常不会造成破坏性损坏。然而,本文观察了 1200 V SiC MOSFET 在漏极偏压低于 50 V 时由重离子引起的退化。在辐照过程中,漏极漏电流(${I} {_{text {DSS}}$ )随着累积剂量的增加而持续增加。同时,${I} {_{text {DSS}}$ 的衰减显示出 SiC MOSFET 的漏极偏置和单元拓扑结构之间的相关性。辐照后,仍然观察到不可接受的 ${I} {_{text {DSS}}$ 退化,但经过一个月的室温退火后,退化程度恢复了约 40%。 在负栅极偏压条件下,{I} {_{text {DSS}}$ 也恢复到了辐照前的水平,这表明{I} {_{text {DSS}}$ 的增加可能与通过沟道区的漏电流路径有关,该路径由氧化物内部或 SiO2/SiC 界面上的缺陷造成,可能是由微剂量效应引入的。在 25 °C-250 °C 的温度范围内测试了栅极漏电流(${I} {_{text {GSS}}$ ),以研究温度对栅极氧化物潜伏损伤激活的影响。随着辐照过程中漏极偏压的增加,{I} {_{text {GSS}}$ 在较高温度下也显著增加,这表明栅极氧化物内部在辐照过程中形成了潜在损伤。
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引用次数: 0
Development of an SGEMP Simulation Code Based on a Hybrid Plasma Model and Its Validation 基于混合等离子体模型的SGEMP仿真代码的开发及其验证
IF 1.9 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-10-16 DOI: 10.1109/TNS.2024.3481421
Yifu Zhou;Wei Wu;Jinxi Li;Yifei Liu;Wenbing Wang;Xutong Wang
The system-generated electromagnetic pulse (SGEMP) is generated when an electronic system is exposed to the radiation environment. Due to the difficulty of experiments, numerical simulation has become a powerful tool in SGEMP research and in predicting SGEMP response of a given system. Furthermore, since the ionization of air has a strong effect on the SGEMP response, the simulation of air plasma plays an important role in the SGEMP simulation. In this work, an SGEMP simulation code based on a hybrid air plasma model is developed to simulate the SGEMP responses in cylindrical cavities. The simulation results are compared with experiments at different air pressures in order to validate the SGEMP simulation code. The simulation results agree well with experiments at pressures in the range of near vacuum to 3 torr. The effects of input parameters are also discussed. Simulation results show that the information on the angular distribution of emitted electrons is crucial in reproducing experimental results. The model developed in this article can be useful for SGEMP simulation study and for predicting experimental outputs.
系统产生的电磁脉冲(SGEMP)是电子系统暴露在辐射环境中产生的。由于实验的困难,数值模拟已成为研究和预测给定系统的SGEMP响应的有力工具。此外,由于空气的电离对SGEMP响应有很强的影响,因此空气等离子体的模拟在SGEMP模拟中起着重要的作用。本文开发了一种基于混合空气等离子体模型的SGEMP仿真程序,用于模拟圆柱形腔内的SGEMP响应。仿真结果与不同气压下的实验结果进行了比较,验证了SGEMP仿真代码的正确性。在近真空至3托压力范围内,模拟结果与实验结果吻合较好。讨论了输入参数的影响。仿真结果表明,发射电子的角度分布信息对于再现实验结果至关重要。本文建立的模型可用于SGEMP仿真研究和实验结果预测。
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引用次数: 0
Comparative Investigation on Ionizing Irradiation- Induced Threshold Voltage Degradation for 1200-V DT SiC MOSFET by Experiment and Simulation 通过实验和仿真比较研究电离辐照诱导的 1200-V DT SiC MOSFET 阈值电压衰减问题
IF 1.9 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-10-14 DOI: 10.1109/TNS.2024.3479201
Tao Liu;Rongyao Ma;Shaohong Li;Jingyu Tao;Zhiyu Wang;Hao Wu;Yiren Yu;Zijun Cheng;Shengdong Hu
Threshold voltage ( $V_{text {TH}}$ ) degradation mechanisms induced by the ionizing irradiation for the 1200-V double-trench (DT) silicon-carbide (SiC) metal-oxide semiconductor field-effect transistor (MOSFET) are investigated. The ionizing irradiation experiment is performed with different gate-source voltages ( $V_{text {GS}}$ ) and total ionizing doses (TIDs). The maximum $V_{text {TH}}$ shifts are −1.92 V for a $V_{text {GS}}$ of 0 V and a TID of 500 krad(Si), and −4.73 V for a $V_{text {GS}}$ of 20 V and a TID of 150 krad(Si), respectively. A novel method of investigation on TID-induced $V_{text {TH}}$ shift from energy domain and numerical simulation with the aid of the TCAD tool is exploited. Extensive simulations indicate that donor-like oxide traps with energy larger than 0.55 eV dominate the negative $V_{text {TH}}$ shift. The summation of two Gaussian distribution models is used to emulate trapped hole energy distribution, and the relative errors between measured and simulated $V_{text {TH}}$ shifts are within ±13.36% at a TID of 100 krad(Si).
研究了 1200 V 双沟槽(DT)碳化硅(SiC)金属氧化物半导体场效应晶体管(MOSFET)在电离辐照诱导下的阈值电压($V_{text {TH}}$ )衰减机制。电离辐照实验是在不同的栅源电压($V_{text {GS}}$)和总电离剂量(TIDs)下进行的。当 $V_{text {GS}$ 为 0 V 和 TID 为 500 krad(Si) 时,最大 $V_{text {TH}}$ 漂移为-1.92 V;当 $V_{text {GS}$ 为 20 V 和 TID 为 150 krad(Si) 时,最大 $V_{text {TH}}$ 漂移为-4.73 V。在 TCAD 工具的帮助下,利用一种新方法从能域和数值模拟方面研究了 TID 引起的 $V_{text {TH}}$ 漂移。大量的模拟结果表明,能量大于 0.55 eV 的供体类氧化物陷阱主导了 $V_{text {TH}}$ 的负偏移。在 100 krad(Si) 的 TID 条件下,测量值与模拟值之间的相对误差在 ±13.36% 以内。
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引用次数: 0
Adaptive Modeling Pulsed Neutron Burst Shape for Acquiring Net Inelastic Gamma Spectra 获取净非弹性伽马能谱的脉冲中子爆发形状自适应建模
IF 1.9 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-10-14 DOI: 10.1109/TNS.2024.3479291
Yi Ge;Jingang Liang;Qiong Zhang;Decheng Niu;Ya Jin;Quanwen Zhang;Liming Lv
Compact pulsed neutron generators emit fast neutrons that interact with the medium by inelastic scattering, producing characteristic gamma rays that reflect the concentrations of important elements, such as carbon and oxygen. The detection of these elements is crucial for applications such as detecting explosives, organic carbon, and density. In actual measurement, a proportion of the capture gamma rays is subtracted from the gamma rays collected during the neutron burst to obtain a net inelastic gamma spectrum. However, the different shapes of pulsed neutron burst due to hardware limitations can affect the subtraction factors of capture gamma rays. To address this challenge, an adaptive method for acquiring the net inelastic gamma energy spectra based on pulsed neutron burst shape modeling is proposed. The distribution function of capture gamma ray over time in the pulse period is derived based on modeling of the pulsed neutron burst shape and convolution. The fall and stable point on the pulsed neutron burst shape are adaptively identified through gradients and autocorrelation coefficients. Finally, a more accurate net inelastic gamma spectrum is obtained by calculating the subtraction factors during the burst based on the fit capture gamma time spectra. The different pulsed neutron burst shapes and environmental parameters are considered, and the adaptability and accuracy of our proposed method are verified through the Monte Carlo simulation.
紧凑型脉冲中子发生器发射的快中子通过非弹性散射与介质相互作用,产生特征伽马射线,反映碳和氧等重要元素的浓度。检测这些元素对于检测爆炸物、有机碳和密度等应用至关重要。在实际测量中,俘获伽马射线的一部分会从中子爆发期间收集的伽马射线中减去,从而得到非弹性伽马净光谱。然而,由于硬件的限制,脉冲中子爆发的不同形状会影响俘获伽马射线的减去系数。为解决这一难题,我们提出了一种基于脉冲中子脉冲串形状建模的自适应方法来获取净非弹性伽马能谱。根据脉冲中子猝发形状建模和卷积,得出俘获伽马射线在脉冲周期内随时间变化的分布函数。通过梯度和自相关系数自适应地识别脉冲中子猝发形状上的下降点和稳定点。最后,根据拟合俘获伽马时间频谱,计算脉冲串期间的减去因子,从而获得更精确的非弹性伽马净频谱。我们考虑了不同的脉冲中子猝发形状和环境参数,并通过蒙特卡罗模拟验证了我们提出的方法的适应性和准确性。
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引用次数: 0
High-Performance Radioluminescent Nuclear Battery Based on Ultrabright Cs₃Cu₂I₅:Tl Single Crystal Scintillator 基于超亮Cs₃Cu₂I₅:Tl单晶闪烁体的高性能辐射发光核电池
IF 1.9 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-10-08 DOI: 10.1109/TNS.2024.3476119
Runlong Gao;Xiao Ouyang;Qian Wang;Pengying Wan;Wuying Ma;Xue Du;Yuntao Wu;Linyue Liu;Xiaoping Ouyang
Developing scintillators with excellent luminescent properties is necessary for further boosting the power conversion efficiency (PCE) of radioluminescent (RL) nuclear battery. In this work, the electrical properties of RL nuclear battery based on ultrabright Cs3Cu2I5:Tl single crystal scintillator are investigated. The optimal open-circuit voltage and short-circuit current of Cs3Cu2I5:Tl RL nuclear battery are 0.37 V and $3.267~mu $ A/cm2, corresponding to the maximum output power density of 898 nW/cm2, which is, respectively, 1.18 and 2.95 times that of the RL nuclear battery based on ZnS:Ag and Lu2-xYxSiO5:Ce (LYSO:Ce) reference scintillators. After continuous X-ray irradiation with a total dose of approximately 6600 Gy, the luminescence properties of Cs3Cu2I5:Tl scintillator remained above 90% of its initial value. This work demonstrates the potential of Cs3Cu2I5:Tl scintillator serving as RL nuclear battery with high PCE and long-term stability.
开发具有优异发光性能的闪烁体是进一步提高辐射发光核电池功率转换效率的必要条件。本文研究了基于超亮Cs3Cu2I5:Tl单晶闪烁体的RL核电池的电学性能。Cs3Cu2I5:Tl RL核电池的最佳开路电压和短路电流分别为0.37 V和3.267~mu $ A/cm2,对应的最大输出功率密度为898 nW/cm2,分别是基于ZnS:Ag和Lu2-xYxSiO5:Ce (LYSO:Ce)参考闪烁体的RL核电池的1.18和2.95倍。在总剂量约6600 Gy的连续x射线照射下,Cs3Cu2I5:Tl闪烁体的发光性能保持在初始值的90%以上。本工作证明了Cs3Cu2I5:Tl闪烁体作为RL核电池具有高PCE和长期稳定性的潜力。
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引用次数: 0
Mixed-Field Radiation of 3-D MLC Flash Memories for Space Applications 用于太空应用的三维 MLC 闪存的混合场辐射
IF 1.9 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-10-07 DOI: 10.1109/TNS.2024.3474746
Lorenzo Gonzales;Salvatore Danzeca;Salvatore Fiore;Iztok Kramberger
This article presents the results of dynamic measurements of 3-D multilevel cell (MLC)NAND flash memories in a mixed-field radiation facility CERN High-energy AcceleRator Mixed field/facility (CHARM), CERN. The results show that the behavior of devices is comparable to tests with specific high energy particles, such as high energy protons, heavy ions, and to TID tests. The observed TID and single-event effects (SEEs) in flash memories from the existing relevant work are also observed in mixed field, making the environment suitable for an accelerated system level test. As the CHARM hadron energy spectrum is comparable to the low Earth orbit (LEO) environment, the facility is appropriate as an accelerated test for space applications. Furthermore, the volumetric characteristics of the devices can be observed in this 3-D radiation facility. Additionally, bad bit (BB) spread was observed, and the necessary radiation induced errors inNAND devices are discussed.
本文介绍了在欧洲核子研究中心(CERN)的混合场辐射设施 CERN High-energy AcceleRator Mixed Field/facility(CHARM)中对三维多级单元(MLC)NAND 闪存进行动态测量的结果。结果表明,器件的行为可与特定高能粒子(如高能质子、重离子)的测试以及 TID 测试相媲美。从现有相关工作中观察到的闪存中的 TID 和单事件效应 (SEE) 也在混合场中观察到,这使得环境适合于加速系统级测试。由于 CHARM 强子能谱与低地球轨道(LEO)环境相当,因此该设施适合作为空间应用的加速测试。此外,在这种三维辐射设施中还可以观察到设备的体积特性。此外,还观察到了坏位(BB)扩散,并讨论了必要的辐射诱导 NAND 器件中的误差。
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引用次数: 0
期刊
IEEE Transactions on Nuclear Science
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