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2010 15th Asia and South Pacific Design Automation Conference (ASP-DAC)最新文献

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Is 3D integration an opportunity or just a hype? 3D整合是一个机会还是只是一种炒作?
Pub Date : 2010-01-18 DOI: 10.1109/ASPDAC.2010.5419826
Jin-Fu Li, Cheng-Wen Wu
Three-dimensional (3D) integration using through silicon via (TSV) is an emerging technology for integrated circuit designs. 3D integration technology provides numerous opportunities to designers looking for more cost-effective system chip solutions. In addition to stacking homogeneous memory dies, 3D integration technology supports heterogeneous integration of memories, logic, sensors, etc. It eases the interconnect performance limitation, provides higher functionality, results in small form factor, etc. On the other hand, there are challenges that should be overcome before volume production of TSV-based 3D ICs becomes possible, e.g., technological challenges, yield and test challenges, thermal and power challenges, infrastructure challenges, etc.
利用硅通孔(TSV)进行三维集成是一种新兴的集成电路设计技术。3D集成技术为设计人员寻找更具成本效益的系统芯片解决方案提供了许多机会。除了堆叠同质内存芯片外,3D集成技术还支持存储器、逻辑、传感器等的异构集成。它减轻了互连性能限制,提供了更高的功能,实现了小尺寸等。另一方面,在基于tsv的3D集成电路实现量产之前,还需要克服一些挑战,例如技术挑战、良率和测试挑战、热功耗挑战、基础设施挑战等。
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引用次数: 25
Joint variable partitioning and bank selection instruction optimization on embedded systems with multiple memory banks 多存储库嵌入式系统的联合变量分区与存储库选择指令优化
Pub Date : 2010-01-18 DOI: 10.1109/ASPDAC.2010.5419909
Tiantian Liu, Minming Li, C. Xue
Multiple memory banks with bank switching is a technique to increase memory size without extending address buses. A special instruction, Bank Selection Instruction (BSL) is inserted into the original programs to modify the bank register to point to the right bank, which increases both the code size and runtime overhead. In this paper, we carefully partition variables into different banks and insert BSLs at different positions so that the overheads can be minimized. Minimizing code size and minimizing runtime overhead are two objectives investigated in this paper. Experiments show that the algorithms proposed can reduce the overhead caused by BSLs efficiently.
带有银行交换的多个存储库是一种无需扩展地址总线即可增加内存大小的技术。在原程序中插入一条特殊的指令——银行选择指令(Bank Selection instruction, BSL),将银行寄存器修改为指向正确的银行,这既增加了代码大小,也增加了运行时开销。在本文中,我们仔细地将变量划分为不同的银行,并在不同的位置插入bsl,从而使开销最小化。最小化代码大小和最小化运行时开销是本文研究的两个目标。实验表明,所提出的算法可以有效地降低bsl带来的开销。
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引用次数: 9
Rule-based optimization of reversible circuits 基于规则的可逆电路优化
Pub Date : 2010-01-18 DOI: 10.1109/ASPDAC.2010.5419684
Mona Arabzadeh, Mehdi Saeedi, M. S. Zamani
Reversible logic has applications in various research areas including low-power design and quantum computation. In this paper, a rule-based optimization approach for reversible circuits is proposed which uses both negative and positive control Toffoli gates during the optimization. To this end, a set of rules for removing NOT gates and optimizing sub-circuits with common-target gates are proposed. To evaluate the proposed approach, the best-reported synthesized circuits and the results of a recent synthesis algorithm which uses both negative and positive controls are used. Our experiments reveal the potential of the proposed approach in optimizing synthesized circuits.
可逆逻辑在包括低功耗设计和量子计算在内的各个研究领域都有应用。本文提出了一种基于规则的可逆电路优化方法,该方法在优化过程中同时使用负控制和正控制Toffoli门。为此,提出了一套去除非门和优化带有共目标门的子电路的规则。为了评估所提出的方法,使用了报道最好的合成电路和最近使用负控制和正控制的合成算法的结果。我们的实验揭示了所提出的方法在优化合成电路方面的潜力。
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引用次数: 70
Post-silicon debugging for multi-core designs 多核设计的后硅调试
Pub Date : 2010-01-18 DOI: 10.1109/ASPDAC.2010.5419885
V. Bertacco
Escaped errors in released silicon are growing in number due to the increasing complexity of modern processor designs and shrinking production schedules. Worsening the problem are recent trends towards chip multiprocessors (CMPs) with complex and sometimes non-deterministic memory subsystems prone to subtle, devastating bugs. This deteriorating situation is causing a growing portion of the validation effort to shift to post-silicon, when the first few hardware prototypes become available and where validation experiments are run directly on newly manufactured prototype hardware. While post-silicon validation enables much higher raw performance in test execution, it is a much more challenging environment for bug diagnosis and correction. In this work we briefly overview some of the current methodologies used in industry. We then discuss some recent ideas developed in our research group to leverage the performance advantage of post-silicon validation, while sidestepping its limitations of low internal node observability and expensive bug fixing. Finally we present some of today's general trends in post-silicon validation research.
由于现代处理器设计的日益复杂和生产时间表的缩短,已发布的硅中的逃逸错误数量正在增加。使问题更加恶化的是,芯片多处理器(cmp)具有复杂的、有时不确定的内存子系统,容易出现微妙的、毁灭性的错误。这种不断恶化的情况导致越来越多的验证工作转移到后硅,当最初的几个硬件原型可用时,验证实验直接在新制造的原型硬件上运行。虽然后硅验证能够在测试执行中实现更高的原始性能,但对于错误诊断和纠正来说,它是一个更具挑战性的环境。在这项工作中,我们简要概述了目前工业中使用的一些方法。然后,我们讨论了我们研究小组最近开发的一些想法,以利用后硅验证的性能优势,同时避开其低内部节点可观察性和昂贵的错误修复的局限性。最后,我们提出了一些当今后硅验证研究的一般趋势。
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引用次数: 4
Manifold construction and parameterization for nonlinear manifold-based model reduction 基于非线性流形模型约简的流形构造与参数化
Pub Date : 2010-01-18 DOI: 10.1109/ASPDAC.2010.5419893
Chenjie Gu, J. Roychowdhury
We present a new manifold construction and parameterization algorithm for model reduction approaches based on projection on manifolds. The new algorithm employs two key ideas: (1) we define an ideal manifold for nonlinear model reduction to be the solution of a set of differential equations with the property that the tangent space at any point on the manifold spans the same subspace as the low-order subspace (e.g., Krylov subspace generated by moment-matching techniques) of the linearized system; (2) we propose the concept of normalized integral curve equations, which are repeatedly solved to identify an almost-ideal manifold.
提出了一种新的基于流形投影的流形构造和参数化算法。该算法采用了两个关键思想:(1)我们将用于非线性模型约简的理想流形定义为一组微分方程的解,其性质是流形上任意点的切空间与线性化系统的低阶子空间(例如由矩匹配技术生成的Krylov子空间)张成相同的子空间;(2)我们提出了归一化积分曲线方程的概念,通过重复求解来确定一个近似理想流形。
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引用次数: 1
A novel Si-Tunnel FET based SRAM design for ultra low-power 0.3V VDD applications 一种新颖的基于硅隧道场效应晶体管的SRAM设计,用于超低功耗0.3V VDD应用
Pub Date : 2010-01-18 DOI: 10.1109/ASPDAC.2010.5419897
Jawar Singh, K. Ramakrishnan, S. Mookerjea, S. Datta, N. Vijaykrishnan, D. Pradhan
Steep sub-threshold transistors are promising candidates to replace the traditional MOSFETs for sub-threshold leakage reduction. In this paper, we explore the use of Inter-Band Tunnel Field Effect Transistors (TFETs) in SRAMs at ultra low supply voltages. The uni-directional current conducting TFETs limit the viability of 6T SRAM cells. To overcome this limitation, 7T SRAM designs were proposed earlier at the cost of extra silicon area. In this paper, we propose a novel 6T SRAM design using Si-TFETs for reliable operation with low leakage at ultra low voltages. We also demonstrate that a functional 6T TFET SRAM design with comparable stability margins and faster performances at low voltages can be realized using proposed design when compared with the 7T TFET SRAM cell. We achieve a leakage reduction improvement of 700X and 1600X over traditional CMOS SRAM designs at VDD of 0.3V and 0.5V respectively which makes it suitable for use at ultra-low power applications.
陡峭亚阈值晶体管是取代传统mosfet降低亚阈值泄漏的有希望的候选器件。在本文中,我们探索了在超低电源电压下在sram中使用带间隧道场效应晶体管(tfet)。单向导电tfet限制了6T SRAM电池的生存能力。为了克服这一限制,早期提出了7T SRAM设计,但代价是额外的硅面积。在本文中,我们提出了一种新的6T SRAM设计,该设计使用si - tfet在超低电压下可靠地工作,并且具有低泄漏。我们还证明,与7T TFET SRAM单元相比,使用所提出的设计可以实现具有相当稳定裕度和低电压下更快性能的功能性6T TFET SRAM设计。在VDD分别为0.3V和0.5V时,我们实现了比传统CMOS SRAM设计减少700X和1600X的漏损,这使得它适合用于超低功耗应用。
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引用次数: 90
An extension of the generalized Hamiltonian method to S-parameter descriptor systems 广义哈密顿方法在s参数描述系统中的推广
Pub Date : 2010-01-18 DOI: 10.1109/ASPDAC.2010.5419922
Zheng Zhang, N. Wong
A generalized Hamiltonian method (GHM) was recently proposed for the passivity test of hybrid descriptor systems [1]. This paper extends the GHM theory to its S-parameter counterpart. Based on the S-parameter GHM, a passivity test flow is proposed, which is capable of detecting nonpassive regions of descriptor-form physical models. The proposed method is applicable to S-parameter and hybrid systems either in the standard state-space or descriptor forms. Experimental results confirm the effectiveness and accuracy of the proposed method.
最近提出了一种用于混合广义系统无源性检验的广义哈密顿方法[1]。本文将GHM理论推广到s参数理论。基于s参数GHM,提出了一种能够检测描述符形式物理模型非被动区域的无源测试流程。该方法适用于标准状态空间或描述符形式的s参数和混合系统。实验结果验证了该方法的有效性和准确性。
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引用次数: 5
Analyzing electrical effects of RTA-driven local anneal temperature variation 分析rta驱动局部退火温度变化的电效应
Pub Date : 2010-01-18 DOI: 10.1109/ASPDAC.2010.5419792
V. Joshi, K. Agarwal, D. Sylvester, D. Blaauw
Suppresing device leakage while maximizing drive current is the prime focus of semiconductor industry. Rapid Thermal Annealing (RTA) drives process development on this front by enabling fabrication steps such as shallow juction formation that require a low thermal budget. However, decrease in junction anneal time for more aggresive device scaling has reduced the characteristic thermal length to dimensions less than the typical die size. Also, the amount of heat transferred, and hence the local anneal temperature, is affected by the layout pattern dependence of optical properties in a region. This variation in local anneal temperature causes a variation in performance and leakage across the chip by affecting the threshold voltage (Vth) and extrinsic transistor resistance (Rext). In this work, we propose a new local anneal temperature variation aware analysis framework which incorporates the effect of RTA induced temperature variation into timing and leakage analysis. We solve for chip level anneal temperature distribution, and employ TCAD based device level models for drive current (Ion) and leakage current (Ioff) dependence on anneal temperature variation, to capture the variation in device performance and leakage based on its position in the layout. Experimental results based on a 45nm experimental test chip show anneal temperature variation of up to ∼10.5°C, which results in ∼6.8% variation in device performance and ∼2.45X variation in device leakage across the chip. The corresponding variation in inverter delay was found to be ∼7.3%. The temperature variation for a 65nm test chip was found to be ∼8.65°C.
在最大限度地提高驱动电流的同时抑制器件泄漏是半导体工业的主要焦点。快速热退火(RTA)通过实现需要低热预算的浅结形成等制造步骤,推动了这方面的工艺发展。然而,减少结退火时间更积极的器件缩放减少了特征热长度的尺寸小于典型的模具尺寸。此外,传热量,从而局部退火温度,是由布局模式依赖的光学性质在一个区域的影响。这种局部退火温度的变化通过影响阈值电压(Vth)和外部晶体管电阻(ext)导致性能和芯片泄漏的变化。在这项工作中,我们提出了一个新的局部退火温度变化感知分析框架,该框架将RTA引起的温度变化影响纳入时序和泄漏分析。我们求解了芯片级退火温度分布,并采用基于TCAD的器件级模型来计算驱动电流(Ion)和泄漏电流(Ioff)对退火温度变化的依赖,以捕捉器件性能和泄漏在布局中位置的变化。基于45nm实验测试芯片的实验结果显示,退火温度变化高达~ 10.5°C,这导致器件性能变化~ 6.8%,器件泄漏在芯片上变化~ 2.45倍。相应的逆变器延迟变化为~ 7.3%。65nm测试芯片的温度变化为~ 8.65°C。
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引用次数: 7
Fixed-outline thermal-aware 3D floorplanning 固定轮廓热感知3D地板规划
Pub Date : 2010-01-18 DOI: 10.1109/ASPDAC.2010.5419822
Linfu Xiao, S. Sinha, Jingyu Xu, Evangeline F. Y. Young
In this paper, we present a novel algorithm for 3D floorplanning with fixed outline constraints and a particular emphasis on thermal awareness. A computationally efficient thermal model that can be used to guide the thermal-aware floorplanning algorithm to reduce the peak temperature is proposed. We also present a novel white space redistribution algorithm to dissipate hotspot. Thermal through-silicon via (TSV) insertion is performed during the floorplanning process as a means to control the peak temperature. Experimental results are very promising and demonstrate that the proposed floorplanning algorithm has a high success rate at meeting the fixed-outline constraints while effectively limiting the rise in peak temperature.
在本文中,我们提出了一种具有固定轮廓约束和特别强调热意识的3D地板规划新算法。提出了一种计算效率高的热模型,可用于指导热感知地板规划算法降低峰值温度。我们还提出了一种新的空白空间再分配算法来消除热点。热硅通孔(TSV)插入在平面规划过程中进行,作为控制峰值温度的一种手段。实验结果表明,该算法在满足固定轮廓约束条件下具有很高的成功率,同时有效地限制了峰值温度的上升。
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引用次数: 27
A hierarchical bin-based legalizer for standard-cell designs with minimal disturbance 基于分层盒的标准单元设计合法化器,干扰最小
Pub Date : 2010-01-18 DOI: 10.1109/ASPDAC.2010.5419819
Yu-Min Lee, Tsung-You Wu, Po-Yi Chiang
In this work, a hierarchical bin-based legalization approach, HiBinLegalizer, is developed to legalize standard cells with minimal movement. First, a chip is divided into several bins with equal size. Then, starting with the most crowed unlegalized bin, a merging procedure for bins is used to integrate bins into a cross-shape region or a square-shape region until the cell density in that region is less than a specific cell-density-threshold. After that, an efficient legalization method which simultaneously preserves the cell orders in each row and minimizes the weighted sum of movement distances is developed to legalize cells in that region to limit the movable scope. To improve the legalization quality, HiBinLegalizer refreshes the positions of legalized cells during legalization. The legalizing procedure is repeated until all cells are non-overlapped. Compared with the state-of-the-art method, Abacus, HiBin-Legalizer can reduce the total movement of cells to be 48% in average and save the largest movement of cells to be 140% in average. Moreover, HiBinLegalizer can reduce the HPWL by 47% and obtain average 1.11x runtime speed up.
在这项工作中,开发了一种基于分层bin的合法化方法HiBinLegalizer,以最小的移动对标准细胞进行合法化。首先,一个芯片被分成几个大小相等的容器。然后,从最拥挤的非法bin开始,使用bin合并过程将bin整合到十字形区域或方形区域,直到该区域的细胞密度小于特定的细胞密度阈值。在此基础上,提出了一种既保留每行细胞顺序又使移动距离加权和最小的有效合法化方法,对该区域内的细胞进行合法化,以限制移动范围。为了提高合法化质量,HiBinLegalizer会在合法化过程中刷新已合法化细胞的位置。重复合法化过程,直到所有细胞都不重叠。与最先进的Abacus方法相比,HiBin-Legalizer可以将细胞的总移动平均减少48%,将细胞的最大移动平均节省140%。此外,HiBinLegalizer可以将HPWL降低47%,并获得平均1.11倍的运行时速度。
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引用次数: 13
期刊
2010 15th Asia and South Pacific Design Automation Conference (ASP-DAC)
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