Critical Layer Thickness for Columnar Growth Nanostructures of CoPtbased AlloyOxide Granular Media used for Perpendicular Magnetic Recording Shingo SASAKI1, Yuzo SASAKI2 and Shin SAITO2 1Department of Intelligent Systems Engineering, National Institute of Technology, Ichinoseki College, Takanashi, Hagisho, Ichinoseki-shi, Iwate 0218511, Japan 2Department of Electronic Engineering, Graduate School of Engineering, Tohoku University, 6605, Aoba, Aramaki, Aoba-ku, Sendai-shi, Miyagi 9808579, Japan
{"title":"Critical Layer Thickness for Columnar Growth Nanostructures of CoPt-based Alloy-Oxide Granular Media used for Perpendicular Magnetic Recording","authors":"S. Sasaki, Y. Sasaki, S. Saito","doi":"10.3131/JVSJ2.60.112","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.112","url":null,"abstract":"Critical Layer Thickness for Columnar Growth Nanostructures of CoPtbased AlloyOxide Granular Media used for Perpendicular Magnetic Recording Shingo SASAKI1, Yuzo SASAKI2 and Shin SAITO2 1Department of Intelligent Systems Engineering, National Institute of Technology, Ichinoseki College, Takanashi, Hagisho, Ichinoseki-shi, Iwate 0218511, Japan 2Department of Electronic Engineering, Graduate School of Engineering, Tohoku University, 6605, Aoba, Aramaki, Aoba-ku, Sendai-shi, Miyagi 9808579, Japan","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"36 1","pages":"112-118"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"78051678","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Dislocations in 4H-SiC Epilayers","authors":"H. Saka","doi":"10.3131/JVSJ2.60.285","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.285","url":null,"abstract":"","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"27 1","pages":"285-291"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"85426599","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"2017「青少年のための科学の祭典」東京大会 in 小金井への真空実験の出展報告;2017「青少年のための科学の祭典」東京大会 in 小金井への真空実験の出展報告;Report on Exhibition of Vacuum Experiments at the 2017 Youngsters' Science Festival in Koganei","authors":"Masuaki Matsumoto","doi":"10.3131/jvsj2.60.514","DOIUrl":"https://doi.org/10.3131/jvsj2.60.514","url":null,"abstract":"","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"19 1","pages":"514-516"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"81820155","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"走査トンネル顕微鏡（STM）による有機薄膜太陽電池の局所性能評価","authors":"修 武内, 貴大 落合, 昭二 吉田, 秀実 重川","doi":"10.3131/jvsj2.60.381","DOIUrl":"https://doi.org/10.3131/jvsj2.60.381","url":null,"abstract":"","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"390 1","pages":"381-387"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"80529013","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"走査トンネル顕微鏡で見る近藤効果：Au(111)表面上の鉄フタロシアニン分子を例として","authors":"規志 塚原","doi":"10.3131/JVSJ2.60.165","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.165","url":null,"abstract":"","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"4 1","pages":"165-169"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"82400843","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"平成29年度学会賞，真空の匠，フェローの審査経過と顕彰業績紹介","authors":"鎭明 財満","doi":"10.3131/JVSJ2.60.239","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.239","url":null,"abstract":"","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"37 1","pages":"239-243"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86760037","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"The Report on Topical Meeting of the Vacuum Society of Japan in June 2017 “Low Temperature Science and Vacuum Science”","authors":"A. Itakura","doi":"10.3131/JVSJ2.60.410","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.410","url":null,"abstract":"","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"40 1","pages":"410-411"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"88061088","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
We fabricated Ni ˆlms on a Polyimide (PI) ˆlm and an Acrylonitrile-Butadiene-Styrene (ABS) resin substrate using unbalanced magnetron sputtering assisted by inductively coupled plasma. For the PI ˆlm, the eŠect of ion irradiation was controlled by substrate DC bias VS and magnetic ‰ux density toward the substrate BC. For the ABS resin substrate, the eŠect of ion irradiation was controlled by target DC power PT and magnetic ‰ux density toward the substrate BC. For each substrate, we investigated the eŠect of ion irradiation on the Ni ˆlm structures in detail. The eŠect of ion irradiation E was estimated by measured physical quantities with respect to sputtered atom ‰ux, ion ‰ux and ion energy. From xray diŠraction measurement, the crystallite size t(111) increased with the eŠect of ion irradiation. Minimum ˆlm resistivities of 9.0×10-6 and 1.4×10-5 Qcm were measured for BC=3 mT and E=0.24 on the PI ˆlm and BC=5 mT and E=0.98 on the ABS resin substrate, respectively. We conclude that controlling the eŠect of ion irradiation is eŠective for high quality Ni ˆlm formation on the PI ˆlm and the ABS resin substrate.
{"title":"Development of Thin Film Formation Technique Using Ion Irradiation Effect Control in Sputtering Method","authors":"H. Toyota","doi":"10.3131/JVSJ2.60.81","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.81","url":null,"abstract":"We fabricated Ni ˆlms on a Polyimide (PI) ˆlm and an Acrylonitrile-Butadiene-Styrene (ABS) resin substrate using unbalanced magnetron sputtering assisted by inductively coupled plasma. For the PI ˆlm, the eŠect of ion irradiation was controlled by substrate DC bias VS and magnetic ‰ux density toward the substrate BC. For the ABS resin substrate, the eŠect of ion irradiation was controlled by target DC power PT and magnetic ‰ux density toward the substrate BC. For each substrate, we investigated the eŠect of ion irradiation on the Ni ˆlm structures in detail. The eŠect of ion irradiation E was estimated by measured physical quantities with respect to sputtered atom ‰ux, ion ‰ux and ion energy. From xray diŠraction measurement, the crystallite size t(111) increased with the eŠect of ion irradiation. Minimum ˆlm resistivities of 9.0×10-6 and 1.4×10-5 Qcm were measured for BC=3 mT and E=0.24 on the PI ˆlm and BC=5 mT and E=0.98 on the ABS resin substrate, respectively. We conclude that controlling the eŠect of ion irradiation is eŠective for high quality Ni ˆlm formation on the PI ˆlm and the ABS resin substrate.","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"50 1","pages":"81-84"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"85824671","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Satoshi Ninomiya, Yuji Sakai, Lee Chuin Chen, Kenzo Hiraoka
Atmospheric pressure electrospray had been used previously in our laboratory to generate massive cluster ion beam for charged droplet ionization; a method we called electrospray droplet impact (EDI). Previous ion gun that employed atmospheric pressure electrospray lacks adequate beam current and density for surface and interface analysis. To improve the EDI beam performance, we have proposed a technique for producing a stable electrospray of aqueous solution under vacuum. It is well known that vacuum electrospray of volatile liquids is di‹cult because of the freezing of the liquids by evaporative cooling under vacuum. Vacuum electrospray of aqueous solution was achieved by irradiating the tip of the electrospray emitter with infrared or near-infrared laser to prevent the freezing under high vacuum (<0.05 Pa). A stable and large beam current was also obtained by optimizing the vacuum electrospray conditions. On the basis of these results, the vacuum electrospray can be expected to be a high-performance massive cluster ion gun.
{"title":"真空エレクトロスプレーを用いるイオン銃の開発;真空エレクトロスプレーを用いるイオン銃の開発;Development of an Ion Gun Using Vacuum Electrospray","authors":"Satoshi Ninomiya, Yuji Sakai, Lee Chuin Chen, Kenzo Hiraoka","doi":"10.3131/JVSJ2.60.321","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.321","url":null,"abstract":"Atmospheric pressure electrospray had been used previously in our laboratory to generate massive cluster ion beam for charged droplet ionization; a method we called electrospray droplet impact (EDI). Previous ion gun that employed atmospheric pressure electrospray lacks adequate beam current and density for surface and interface analysis. To improve the EDI beam performance, we have proposed a technique for producing a stable electrospray of aqueous solution under vacuum. It is well known that vacuum electrospray of volatile liquids is di‹cult because of the freezing of the liquids by evaporative cooling under vacuum. Vacuum electrospray of aqueous solution was achieved by irradiating the tip of the electrospray emitter with infrared or near-infrared laser to prevent the freezing under high vacuum (<0.05 Pa). A stable and large beam current was also obtained by optimizing the vacuum electrospray conditions. On the basis of these results, the vacuum electrospray can be expected to be a high-performance massive cluster ion gun.","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"36 1","pages":"321-327"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"83883697","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
H. Ogiso, K. Yukimura, S. Nakano, Hiroyuki Tanaka, S. Khumpuang, Yuuki Yabuta, Ryuichiro Kamei, S. Hara
Development of Miniature Sputtering Deposition Equipment for Minimal Fab with HiPIMS Operations Hisato OGISO1, Ken YUKIMURA2, Shizuka NAKANO1, Hiroyuki TANAKA2, Sommawan KHUMPUANG2, Yuuki YABUTA3, Ryuichiro KAMEI3 and Shiro HARA2 1Advanced Manufacturing Research Institute, National Institute of Industrial Science and Technology (AIST), 121 Namiki, Tsukuba-shi, Ibaraki 3058564 Japan 2Nanoelectronics Research Institute, National Institute of Industrial Science and Technology (AIST), 111 Umezono, Tsukuba-shi, Ibaraki 3058568, Japan 3Seinan-kogyo Co., Ltd., 4324 Kitakagaya, Summinoe-ku, Osaka-shi, Osaka 5590011 Japan
{"title":"Development of Miniature Sputtering Deposition Equipment for Minimal Fab with HiPIMS Operations","authors":"H. Ogiso, K. Yukimura, S. Nakano, Hiroyuki Tanaka, S. Khumpuang, Yuuki Yabuta, Ryuichiro Kamei, S. Hara","doi":"10.3131/JVSJ2.60.365","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.365","url":null,"abstract":"Development of Miniature Sputtering Deposition Equipment for Minimal Fab with HiPIMS Operations Hisato OGISO1, Ken YUKIMURA2, Shizuka NAKANO1, Hiroyuki TANAKA2, Sommawan KHUMPUANG2, Yuuki YABUTA3, Ryuichiro KAMEI3 and Shiro HARA2 1Advanced Manufacturing Research Institute, National Institute of Industrial Science and Technology (AIST), 121 Namiki, Tsukuba-shi, Ibaraki 3058564 Japan 2Nanoelectronics Research Institute, National Institute of Industrial Science and Technology (AIST), 111 Umezono, Tsukuba-shi, Ibaraki 3058568, Japan 3Seinan-kogyo Co., Ltd., 4324 Kitakagaya, Summinoe-ku, Osaka-shi, Osaka 5590011 Japan","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"128 1","pages":"365-371"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"87636518","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
京公网安备 11010802042870号
京ICP备2023020795号-1
扫码关注我们
求助内容：
应助结果提醒方式：