{"title":"Expectation to Vacuum Nano-electronics","authors":"H. Mimura","doi":"10.3131/JVSJ2.60.2","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.2","url":null,"abstract":"","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"88785980","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"真空計測における Japan Calibration Service System：計量法に基づく校正事業者登録制度（JCSS）への取り組み，「誤差」から「トレーサビリティー」と「不確かさ」へ","authors":"隆英 堀, 秀樹 吉澤, 智成 田中","doi":"10.3131/jvsj2.60.182","DOIUrl":"https://doi.org/10.3131/jvsj2.60.182","url":null,"abstract":"","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"87410694","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"真空技術者資格認定試験の問題解説(5);真空技術者資格認定試験の問題解説(5);Guidance for the Vacuum Engineer Examination (5)","authors":"Kazue Takahashi","doi":"10.3131/jvsj2.60.279","DOIUrl":"https://doi.org/10.3131/jvsj2.60.279","url":null,"abstract":"","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"84760650","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Nano-scale structures of a single graphene oxide (GO) layer deposited on Au(111) covered with the octanethiolate self-assembled monolayer (C8S-SAM) have been investigated by scanning tunneling microscopy (STM). Using a spin-coating method, we found that GO ‰akes are isolated and are dispersed on the C8S-SAM/Au(111) surface whereas these are likely to pile up on the bare Au(111) surface. Furthermore, the C8S-SAM formed on Au(111) enables us to deposit GO keeping the surface clean even if we prepared the sample in the atmosphere. By using the C8S-SAM/Au(111) substrate, we succeeded in observing an STM image of the unreduced GO. The STM image of a single GO layer exhibits the grain-like structure having the range in height from 0.6 to 1.1 nm. The biasdependent STM study indicated that the STM image of GO is stably and reproducibly obtained at the voltage where the density of states of GO exists.
{"title":"走査トンネル顕微鏡を用いた単層酸化グラフェンのナノスケール観察;走査トンネル顕微鏡を用いた単層酸化グラフェンのナノスケール観察;Nanoscale Observation of a Single Graphene Oxide layer Using Scanning Tunneling Microscopy","authors":"S. Katano, Tao Wei, Takumi Sasajima, Y. Uehara","doi":"10.3131/JVSJ2.60.495","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.495","url":null,"abstract":"Nano-scale structures of a single graphene oxide (GO) layer deposited on Au(111) covered with the octanethiolate self-assembled monolayer (C8S-SAM) have been investigated by scanning tunneling microscopy (STM). Using a spin-coating method, we found that GO ‰akes are isolated and are dispersed on the C8S-SAM/Au(111) surface whereas these are likely to pile up on the bare Au(111) surface. Furthermore, the C8S-SAM formed on Au(111) enables us to deposit GO keeping the surface clean even if we prepared the sample in the atmosphere. By using the C8S-SAM/Au(111) substrate, we succeeded in observing an STM image of the unreduced GO. The STM image of a single GO layer exhibits the grain-like structure having the range in height from 0.6 to 1.1 nm. The biasdependent STM study indicated that the STM image of GO is stably and reproducibly obtained at the voltage where the density of states of GO exists.","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"80437556","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Influence of Space Charge on the Relative Sensitivity Coefficient of a Triode Gauge","authors":"Shigemi Suginuma, M. Hirata, T. Kobata","doi":"10.3131/jvsj2.60.490","DOIUrl":"https://doi.org/10.3131/jvsj2.60.490","url":null,"abstract":"","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"73223757","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"電子線照射装置の工業利用への展開;電子線照射装置の工業利用への展開;Expansion of Industrial Use of Electron Beam Processing System","authors":"Yasuyuki Okumura","doi":"10.3131/JVSJ2.60.64","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.64","url":null,"abstract":"電子線照射装置は電子を高真空中で高電圧により加速させ た後,加速電子を大気中に取り出すもので,高電圧技術, ビーム工学技術,そして高真空技術の複合技術で構成される 装置である.この加速電子を物質に当てることで加速電子が もつエネルギーを物質に与え,様々な反応を引き起こす.通 常の化学反応で用いる熱エネルギーと比較してエネルギー利 用率が高く,反応促進剤などの添加剤不要,かつ低温で効果 が得られる.また電子線は放射線の一種であるが,電源の ON/OFF で放射線の発生を制御できるなど,取り扱いが容 易で安全性が高い.そして単位時間あたりの材料に与えるエ ネルギーは,同様の現象を起こすことができるガンマ線と比 較すると桁違いに大きい.そのため連続生産性が高く工業用 途に好適な装置といえる1). 電子線照射技術は放射線劣化の研究からはじまり,1952 年にチャールスビー教授がポリエチレンの電子線架橋を発見 した後,様々な産業分野で利用されることとなった.近年で は電子線照射装置の改良改善が進むとともに,電子線照射に 適した素材が開発されるなど,工業利用,技術開発が活発に 行われている.本稿では電子線照射装置の工業利用や,研究 開発が進められている照射技術の概要や利点,用途を紹介す る.","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"81195284","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Problem-Solving Exercise for Basic Understanding of Vacuum Science and Technology (1)","authors":"K. Shibata","doi":"10.3131/jvsj2.60.201","DOIUrl":"https://doi.org/10.3131/jvsj2.60.201","url":null,"abstract":"","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"87383390","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
To observe specular oscillations in ion-surface scattering originating from layer-by-layer desorption of an electron stimulated desorbed (ESD) surface, a 15 keV proton beam was impinged on the surface with an angle of incidence less than 1°. We prepared an experimental system to examine the scattering yields of re‰ecting protons by conveniently employing a ‰uorescent screen to view scattering yields (scattering patterns) and a commercial digital camera for yield measurements. Because the present energy of the proton beam was too low to illuminate the screen, a micro-channel plate was inserted in front of the screen. Measurements with electron irradiation show obvious damping specular oscillations; the widths of angular distributions of scattered protons simultaneously oscillated with increasing electron ‰uence. From the measured periods of the oscillations, the ESD rates of thermal desorption from KBr(001) at 1.5 keV electrons irradiation were obtained for sample temperatures.
{"title":"Detection System for KeV Proton Beam Scattered from an ESD-surface with Monolayer Pits of Alkali Halide Crystal","authors":"Y. Fukazawa, Ryoki Nakagawa, Y. Susuki","doi":"10.3131/JVSJ2.60.153","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.153","url":null,"abstract":"To observe specular oscillations in ion-surface scattering originating from layer-by-layer desorption of an electron stimulated desorbed (ESD) surface, a 15 keV proton beam was impinged on the surface with an angle of incidence less than 1°. We prepared an experimental system to examine the scattering yields of re‰ecting protons by conveniently employing a ‰uorescent screen to view scattering yields (scattering patterns) and a commercial digital camera for yield measurements. Because the present energy of the proton beam was too low to illuminate the screen, a micro-channel plate was inserted in front of the screen. Measurements with electron irradiation show obvious damping specular oscillations; the widths of angular distributions of scattered protons simultaneously oscillated with increasing electron ‰uence. From the measured periods of the oscillations, the ESD rates of thermal desorption from KBr(001) at 1.5 keV electrons irradiation were obtained for sample temperatures.","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"87413282","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Norio Nawachi, K. Itoh, Yosuke Isagi, Yoshiaki Yoshida, K. Okamoto, T. Nakatani
Characterization of Carbon Thin Films Prepared by High Power Impulse Magnetron Sputtering Norio NAWACHI1, Koichi ITOH1, Yosuke ISAGI1, Yoshiaki YOSHIDA2, Keishi OKAMOTO2 and Tatsuyuki NAKATANI3 1West Region Industrial Research Center, Hiroshima Prefectural Technology Research Institute, 2101 Agaminami, Kure-shi, Hiroshima 7370004, Japan 2Toyo Advanced Technologies Co., Ltd., 5338 Ujina-higashi, Minami-ku, Hiroshima-shi, Hiroshima 7348501, Japan 3Research Institute of Technology, Okayama University of Science, 11 Ridai-cho, Kita-ku, Okayama-shi, Okayama 7000005, Japan
{"title":"Characterization of Carbon Thin Films Prepared by High Power Impulse Magnetron Sputtering","authors":"Norio Nawachi, K. Itoh, Yosuke Isagi, Yoshiaki Yoshida, K. Okamoto, T. Nakatani","doi":"10.3131/JVSJ2.60.341","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.341","url":null,"abstract":"Characterization of Carbon Thin Films Prepared by High Power Impulse Magnetron Sputtering Norio NAWACHI1, Koichi ITOH1, Yosuke ISAGI1, Yoshiaki YOSHIDA2, Keishi OKAMOTO2 and Tatsuyuki NAKATANI3 1West Region Industrial Research Center, Hiroshima Prefectural Technology Research Institute, 2101 Agaminami, Kure-shi, Hiroshima 7370004, Japan 2Toyo Advanced Technologies Co., Ltd., 5338 Ujina-higashi, Minami-ku, Hiroshima-shi, Hiroshima 7348501, Japan 3Research Institute of Technology, Okayama University of Science, 11 Ridai-cho, Kita-ku, Okayama-shi, Okayama 7000005, Japan","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"90053893","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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