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Study on the photoelectric and electromagnetic properties of nonmetal elements X(X=B, C, N) doping bilayer CdS 非金属元素 X(X=B、C、N)掺杂双层 CdS 的光电和电磁特性研究
IF 4.2 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-11-27 DOI: 10.1016/j.mssp.2024.109167
Junqing Wen , Mengqian Shi , Guoxiang Chen , Si Li
In this paper, the electronic, magnetic and optical properties of nonmetal elements doping BL-CdS systems are calculated by DFT + U. The stable structures of nonmetal elements doping BL-CdS are obtained by calculating Ef. The analysis of electronic structures indicates that BL-CdS is semiconductor with direct band gap 2.56eV. The 2B@2S and 2C@2S systems exhibit semiconductor characteristics. B@S, C@S, N@S and 2N@2S systems present magnetic semiconductor properties and magnetism mainly comes from the spin polarization of impurity atoms. Cd atoms lose electrons, S and impurity atoms get electrons. With increase in the number of impurity atoms, number of electrons obtained is gradually increasing. The work function of BL-CdS is 6.26eV. B@S and 2C@2S have the smaller work function, indicating that two systems have higher electron mobility. The calculation of optical properties shows that BL-CdS has good photoelectric properties in visible light and the doping systems have better photoelectric properties in ultraviolet region or infrared region. ML-CdS, BL-CdS, 2B@2S systems show high performance of photocatalytic water splitting. The research results provide ideas for nano-spintronic devices and photodetectors.
本文采用 DFT + U 方法计算了掺杂非金属元素的 BL-CdS 系统的电子、磁学和光学性质,并通过计算 Ef 得到了掺杂非金属元素的 BL-CdS 的稳定结构。电子结构分析表明,BL-CdS 是直接带隙为 2.56eV 的半导体。2B@2S 和 2C@2S 系统表现出半导体特性。B@S、C@S、N@S 和 2N@2S 系统具有磁性半导体特性,磁性主要来自杂质原子的自旋极化。镉原子失去电子,S 原子和杂质原子得到电子。随着杂质原子数目的增加,得到的电子数目也逐渐增加。BL-CdS 的功函数为 6.26eV。B@S 和 2C@2S 的功函数较小,表明这两个体系具有较高的电子迁移率。光学性质的计算表明,BL-CdS 在可见光下具有良好的光电性质,而掺杂体系在紫外区或红外区具有更好的光电性质。ML-CdS、BL-CdS、2B@2S 体系具有较高的光催化水分离性能。这些研究成果为纳米自旋电子器件和光电探测器提供了思路。
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引用次数: 0
Fabrication of cathode Bi2S3-rGO nanocomposites electrode for hybrid supercapacitors to enhance the energy storage properties 制备用于混合超级电容器的阴极 Bi2S3-rGO 纳米复合材料电极以提高储能性能
IF 4.2 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-11-27 DOI: 10.1016/j.mssp.2024.109164
S. Suganya , M. Aparna , G. Janani , S. Sambasivam , Aboud Ahmed Awadh Bahajjaj , Fen Ran , S. Sudhahar
In this work, the two-dimensional Bi2S3-rGO nanocomposites have been successfully prepared through facile hydrothermal-assisted ultrasonication technique. The synthesized samples have been characterized for XRD, Raman, FESEM, EDX, HRTEM, SAED, XPS, and BET studies for studying their structure, vibrations, morphologies, purity, and chemical states. The CV analysis have been studied for fabricated Bi2S3 and Bi2S3-rGO NCs electrodes in three-electrode technique, in which the Bi2S3-rGO NCs electrode exhibits 247.8 C/g of excellent specific capacities in contrast to Bi2S3 electrode (76.0 C/g) at the appropriate scan rate of 10 mV/s, due to the synergistic effects of both Bi2S3 and rGO in hybrid electrode. The Bi2S3-rGO NCs electrode shows 296.7 C/g of total (QT), 171.6 C/g of inner (QI), and 125.0 C/g of outer (QO) specific capacities from Trasatti analysis. The EIS study provides the Rs and Rct values of 0.65 and 1.30 Ω for Bi2S3-rGO NCs electrode, suggesting their good ion transportation characteristics. Also, the cyclic stability has been studied for Bi2S3-rGO NCs electrode and it provides 84.03 % of good capacitive retention and 104.31 % of coulombic efficiency over 3000 cycles. Additionally, the hybrid supercapacitor device (HSC) of Bi2S3-rGO//AC has been fabricated, which shows 110.1 C/g of specific capacity, 25.8 Wh/kg of energy density (EHSC), and 844.9 W/kg of power density (PHSC) at 1 A/g current density. Further, the fabricated device exhibits 86.3 % better capacitive retention and a coulombic efficiency (η) of 100.1 % at the current density of 10 A/g over 10,000 GCD cycles.
本研究采用简便的水热辅助超声技术成功制备了二维 Bi2S3-rGO 纳米复合材料。对合成的样品进行了 XRD、拉曼、FESEM、EDX、HRTEM、SAED、XPS 和 BET 表征,以研究其结构、振动、形貌、纯度和化学状态。在三电极技术中,对制备的 Bi2S3 和 Bi2S3-rGO NCs 电极进行了 CV 分析,结果表明,与 Bi2S3 电极(76.0 C/g)相比,Bi2S3-rGO NCs 电极在 10 mV/s 的适当扫描速率下显示出 247.8 C/g 的优异比容量,这归功于混合电极中 Bi2S3 和 rGO 的协同效应。根据 Trasatti 分析,Bi2S3-rGO NCs 电极的总比容量(QT∗′)为 296.7 C/g,内比容量(QI∗′)为 171.6 C/g,外比容量(QO∗′)为 125.0 C/g。通过 EIS 研究,Bi2S3-rGO NCs 电极的 Rs 值为 0.65 Ω,Rct 值为 1.30 Ω,这表明它们具有良好的离子传输特性。此外,还对 Bi2S3-rGO NCs 电极的循环稳定性进行了研究,结果表明该电极在 3000 次循环中的电容保持率为 84.03%,库仑效率为 104.31%。此外,还制作了 Bi2S3-rGO//AC 混合超级电容器器件(HSC),在 1 A/g 电流密度下,比容量为 110.1 C/g,能量密度(EHSC)为 25.8 Wh/kg,功率密度(PHSC)为 844.9 W/kg。此外,在 10 A/g 的电流密度下,该器件的电容保持率提高了 86.3%,库仑效率 (η) 在 10,000 次 GCD 循环中达到 100.1%。
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引用次数: 0
Dislocations in 4H-SiC epilayers for power devices: Identification, formation, and regulation 用于功率器件的 4H-SiC 外延层中的位错:识别、形成和调节
IF 4.2 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-11-26 DOI: 10.1016/j.mssp.2024.109147
Yifei Li , Pengxiang Hou , Shuangyuan Pan , Pin Wang , Weiwei Cheng , Jing Wang , Le Yu , Zheyang Li , Rui Jin
4H-SiC is highly promising for modern electronics, particularly in high-temperature, high-frequency, and high-power applications. However, the presence of dislocations in 4H-SiC epilayers significantly affects the performance and reliability of 4H-SiC-based power devices, thus limiting their widespread application. This review provides an overview of the classification, fundamental properties, and inspection methods of dislocations in 4H-SiC epilayers. The mechanisms of dislocation nucleation, propagation, and conversion during epitaxial growth are presented. Furthermore, strategies to mitigate dislocations, with a particular focus on enhancing the efficiency of BPD-TED conversion, are comprehensively discussed. By offering insights into dislocation behavior in 4H-SiC epilayers, this review highlights the challenges and emerging directions in the study of dislocations.
4H-SiC 在现代电子技术中大有可为,尤其是在高温、高频和大功率应用领域。然而,4H-SiC 外延层中位错的存在严重影响了基于 4H-SiC 的功率器件的性能和可靠性,从而限制了其广泛应用。本综述概述了 4H-SiC 表层中位错的分类、基本特性和检测方法。此外,还介绍了位错在外延生长过程中的成核、传播和转换机制。此外,还全面讨论了减少位错的策略,特别是提高 BPD-TED 转换效率的策略。通过对 4H-SiC 外延层中位错行为的深入分析,本综述强调了位错研究的挑战和新方向。
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引用次数: 0
Current density and thickness dependent anisotropic thermal conductivity of electroplated copper thin films 电镀铜薄膜的电流密度和随厚度变化的各向异性热导率
IF 4.2 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-11-26 DOI: 10.1016/j.mssp.2024.109152
Hongbang Zhang , Song Hu , Miao Tian , Xiaokun Gu
Electroplated copper thin films are essential in microelectronics, widely used for back-end interconnects, through-silicon vias, and redistribution layers. Currently, their thermal conductivity is frequently estimated indirectly using the four-point probe method and the Wiedemann-Franz law, with limited research on their anisotropy and influencing factors. In this paper, we report the measurements on the electrical and thermal properties of electroplated copper thin films under different current densities during plating and thicknesses using the four-point probe method and frequency-domain thermoreflectance. The results indicate that current density and film thickness significantly influence the microstructure of the copper thin films, resulting in pronounced anisotropy in thermal conductivity. Scanning electron microscopy and electron backscatter diffraction analyses further reveal the microstructural features responsible for this anisotropy and explain how current density affects the internal structure of electroplated copper films, impacting their thermal conductivity. These insights provide valuable theoretical guidance for designing and optimizing electroplated copper films in electronic applications.
电镀铜薄膜是微电子技术中必不可少的材料,广泛用于后端互连、硅通孔和再分布层。目前,人们通常使用四点探针法和维德曼-弗兰茨定律间接估算其热导率,而对其各向异性和影响因素的研究却十分有限。本文利用四点探针法和频域热反射法测量了电镀铜薄膜在电镀过程中不同电流密度和不同厚度下的电学和热学特性。结果表明,电流密度和薄膜厚度对铜薄膜的微观结构有显著影响,从而导致热导率的明显各向异性。扫描电子显微镜和电子反向散射衍射分析进一步揭示了造成这种各向异性的微观结构特征,并解释了电流密度如何影响电镀铜薄膜的内部结构,从而影响其热导率。这些见解为设计和优化电子应用中的电镀铜薄膜提供了宝贵的理论指导。
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引用次数: 0
Electronic, optical, and magnetic properties of defect-engineered 1T-PdS2 monolayer: A first-principles investigation 缺陷工程 1T-PdS2 单层的电子、光学和磁学特性:第一原理研究
IF 4.2 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-11-26 DOI: 10.1016/j.mssp.2024.109144
Muhammad Yar Khan , Tariq Usman , Asif Ilyas , Arzoo Hassan , Umer Younis , Atta Ullah , Syed Awais Ahmad , Abdullah Al Souwaileh
Based on first principles calculations, we scrutinized the impact of vacancies and doping on the electronic, magnetic, and optical properties of the 1T-PdS2 monolayer. Our findings highlight the importance of noticeable behaviors arise by introducing different types of vacancies. Especially, a single palladium vacancy (V1Pd) transforms the semiconducting nature of 1T-PdS2 into a semi-metallic nature, while sulfur vacancies (V1S, V2S), and a combination of palladium and sulfur vacancy (V1Pd+1S) maintain its semiconducting nature. The V1Pd and V1Pd+1S vacancies generate magnetic ground states with marvelous magnetic dipole moments of 4μB and 2μB, respectively, whereas the V1S and V2S defects provides nonmagnetic ground states. In addition, the defective 1T-PdS2 monolayer presents amplified absorption efficiency in infrared region, proposing its potential applications in solar energy utilization. Most importantly, our defective system reveals red-shift phenomenon in the imaginary component of the dielectric function and absorption spectrum. These outstanding features suggests the applicability of defective 1T-PdS2 monolayer for photovoltaic and optoelectronic applications.
基于第一原理计算,我们仔细研究了空位和掺杂对 1T-PdS2 单层的电子、磁性和光学特性的影响。我们的研究结果凸显了引入不同类型空位所产生的显著行为的重要性。特别是单个钯空位(V1Pd)将 1T-PdS2 的半导体性质转变为半金属性质,而硫空位(V1S、V2S)以及钯和硫空位的组合(V1Pd+1S)则保持了其半导体性质。V1Pd 和 V1Pd+1S 空位产生了磁性基态,其磁偶极矩分别为 4μB 和 2μB,而 V1S 和 V2S 缺陷则提供了非磁性基态。此外,有缺陷的 1T-PdS2 单层在红外区域的吸收效率有所提高,这为其在太阳能利用方面的应用提供了可能性。最重要的是,我们的缺陷系统揭示了介电函数和吸收光谱虚部的红移现象。这些突出特点表明,有缺陷的 1T-PdS2 单层可应用于光伏和光电领域。
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引用次数: 0
Deformation characteristics and subsurface damage of monocrystalline silicon under repeated nano-scratching 重复纳米划痕下单晶硅的变形特征和次表层损伤
IF 4.2 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-11-26 DOI: 10.1016/j.mssp.2024.109169
Yang He , Liangchi Zhang
In the context of grinding and polishing of monocrystalline silicon, abrasive particles repeatedly scratch the surface. The resultant subsurface damage significantly degrades the performance of monocrystalline silicon as a semiconductor substrate or optical component. However, the exact mechanism of material removal in monocrystalline silicon subjected to repeated nano-scratching remains inadequately understood. To address this gap, we conducted an in-depth study of the deformation characteristics of monocrystalline silicon via repeated nano-scratch tests. The nano-scratching was performed using atomic force microscopy (AFM) with a diamond tip, which had a radius of approximately 62 nm, under a normal load of about 23 μN. We employed scanning electron microscopy and transmission electron microscopy to analyze the states of the removed material, focusing on the mechanisms of material removal in ductile-regime machining. Our findings indicated that the monocrystalline silicon surface was removed through the formation of continuous curved chips composed of amorphous phase structures. Subsurface deformation from a single nano-scratching was through amorphization and machining defects, including dislocations, stacking faults, and lattice distortions. With repeated nano-scratching, these defects further underwent amorphization and became randomly distributed, rather than occurring in the <111> direction. Moreover, the subsurface defects exhibited a tendency not to expand or penetrate deeper with increasing nano-scratching cycles. This study provides crucial insights into the evolution of subsurface damage under repeated nano-scratching, offering valuable guidance for optimizing grinding and polishing processes to achieve high-quality subsurface and further enhance the performance of monocrystalline silicon.
在对单晶硅进行研磨和抛光时,磨料颗粒会反复划伤其表面。由此造成的表面下损伤会大大降低单晶硅作为半导体衬底或光学元件的性能。然而,人们对单晶硅在反复纳米划痕作用下材料去除的确切机制仍缺乏足够的了解。针对这一空白,我们通过重复纳米划痕试验对单晶硅的变形特性进行了深入研究。我们使用原子力显微镜(AFM)和半径约为 62 nm 的金刚石针尖,在约 23 μN 的正常载荷下进行了纳米划痕试验。我们使用扫描电子显微镜和透射电子显微镜分析了被去除材料的状态,重点研究了韧性机理加工中的材料去除机制。我们的研究结果表明,单晶硅表面是通过形成由非晶相结构组成的连续弯曲切屑而被去除的。单次纳米划痕产生的次表面变形是通过非晶化和加工缺陷(包括位错、堆积断层和晶格畸变)产生的。随着纳米划痕的反复进行,这些缺陷进一步发生非晶化,并变得随机分布,而不是沿<111>方向出现。此外,随着纳米划痕周期的增加,表面下缺陷呈现出不扩展或不深入的趋势。这项研究对反复纳米划痕下的次表面损伤演变提供了重要的见解,为优化研磨和抛光工艺以获得高质量的次表面和进一步提高单晶硅的性能提供了宝贵的指导。
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引用次数: 0
The effects of α-sodium alkenesulfonate and alkylphenol polyoxyethylene ether phosphate on the inhibition of copper chemical mechanical polishing α-烯磺酸钠和烷基酚聚氧乙烯醚磷酸酯对铜化学机械抛光抑制作用的影响
IF 4.2 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-11-25 DOI: 10.1016/j.mssp.2024.109145
Tongtong Zhang , Yuling Liu , Hongdong Zhao , Xiaodong Luan , Chong Luo
In this work, α-sodium alkene sulfonate (α-AOS) and alkylphenol polyoxyethylene ether phosphate (APE-10P) were tested as environmentally friendly inhibitors in slurries to replace toxic benzotriazole. α-AOS and APE-10P can improve slurry dispersion, increase the inhibition efficiency to 79.6 % and polishing rate reduced to 8414 Å/min; Reduced corrosion and surface roughness decreased from 3.10 nm to 1.41 nm; By measuring the particle size of polishing solution, it has been proven that the addition of two active agents effectively improves the dispersion of the solution, reduces the distance between silica sol colloids, and reduces the particle size of silica sol from 71.5 nm to 68.5 nm; To verify the stability of the polishing solution, the Zeta potential of the polishing solution on the first day was −40.99 mV, and on the seventh day it was −36.6 mV, which can meet the stability requirements for at least seven days and meet industrial requirements. Calculation proves that APE-10P and α-AOS can spontaneously adsorb on Cu surfaces. This work focuses on the mechanism of inhibition in Cu CMP, which provides some inspirations for the development of environmentally friendly slurries.
α-AOS和APE-10P可改善浆液的分散性,使抑制效率提高到79.6%,抛光速率降低到8414埃/分钟;降低了腐蚀性,表面粗糙度从3.10 nm降低到1.41 nm。41 nm;通过测量抛光液的粒度,证明两种活性剂的加入有效改善了溶液的分散性,减小了硅溶胶之间的距离,硅溶胶的粒度从 71.5 nm 减小到 68.5 nm;为了验证抛光液的稳定性,抛光液第一天的 Zeta 电位为 -40.99 mV,第七天为 -36.6 mV,至少可以满足七天的稳定性要求,符合工业要求。计算证明 APE-10P 和 α-AOS 能自发吸附在铜表面。这项工作主要研究了 Cu CMP 中的抑制机理,为开发环境友好型泥浆提供了一些启示。
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引用次数: 0
Unveiling role of exchange-correlation functions in investigating physical properties of CsMnCl3 perovskite for optoelectronic applications 揭示交换相关函数在研究光电应用中 CsMnCl3 包晶物理特性中的作用
IF 4.2 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-11-25 DOI: 10.1016/j.mssp.2024.109138
Sidra Sabir , Shakeel Ahmad , Abdul Ghafar Wattoo
Metal halide perovskites have garnered significant attention for their transformative applications in photovoltaics, optoelectronics, and photocatalysis. This study pioneers an in-depth examination of the structural, electronic, elastic, mechanical, and optical properties of CsMnCl3 perovskite using GGA-PBE and GGA + U calculations with diverse exchange-correlation functionals (PBE, RPBE, PW91, WC, and PBEsol) within the CASTEP code. The structural parameters of CsMnCl3 perovskite are substantially affected by the exchange-correlation function, particularly the lattice constants, which exhibit functional-dependent variations. The material demonstrates metallic properties under GGA-PBE, while it manifests semiconductor behavior with an indirect energy bandgap energy (R→G) under other functionals GGA + U with PBE, RPBE, PW91, WC, and PBEsol. Notably, the calculated energy bandgaps exhibit functional-specific variations: 1.956 eV (GGA + U-PBE), 2.041 eV (GGA + U-RPBE), 1.994 eV (GGA + U-PW91), 1.890 eV (GGA + U-WC), and 1.895 eV (GGA + U-PBEsol). The compound shows low reflectivity, a large absorption coefficient value, and good optical conductivity in the visible region. Moreover, the Born stability criterion suggests that material is mechanically stable, and ductile according to Poisson scale/Pugh's ratio. It has an anisotropic nature according to the anisotropy index. These exceptional results advocate its suitability for flexible optoelectronic applications.
金属卤化物包晶因其在光伏、光电子和光催化领域的变革性应用而备受关注。本研究利用 CASTEP 代码中的 GGA-PBE 和 GGA + U 计算以及不同的交换相关函数(PBE、RPBE、PW91、WC 和 PBEsol),率先对 CsMnCl3 包晶的结构、电子、弹性、机械和光学特性进行了深入研究。CsMnCl3 包晶体的结构参数受到交换相关函数的很大影响,尤其是晶格常数,它呈现出随函数而变的特性。该材料在 GGA-PBE 下表现出金属特性,而在其他函数 GGA + U with PBE、RPBE、PW91、WC 和 PBEsol 下则表现出间接能带隙能 (R→G) 的半导体行为。值得注意的是,计算出的能带隙呈现出特定函数的变化:1.956 eV(GGA + U-PBE)、2.041 eV(GGA + U-RPBE)、1.994 eV(GGA + U-PW91)、1.890 eV(GGA + U-WC)和 1.895 eV(GGA + U-PBEsol)。该化合物在可见光区域显示出较低的反射率、较大的吸收系数值和良好的光导率。此外,博恩稳定性准则表明该材料具有机械稳定性,并且根据泊松比/普氏比具有延展性。根据各向异性指数,它具有各向异性。这些优异的结果证明它适合柔性光电应用。
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引用次数: 0
High-throughput design and computational screening of PdBiSe-like equiatomic system with multi-fold fermions 高通量设计和计算筛选具有多费米子的 PdBiSe 类等原子系统
IF 4.2 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-11-25 DOI: 10.1016/j.mssp.2024.109129
Diwei Shi , Jiexi Song , Yanqing Qin , Xinyu Chen , Shiyu Du
The PdBiSe-like structure material stands out as singular topological properties, characterized by its unique six-fold degenerate fermions. With the aim of exploring more topological materials of PdBiSe-like system, we embarked on thorough high-throughput screening and computational analysis of PdBiSe-like structures, utilizing first-principles calculations coupling the OQMD and MP Database. This meticulous process yielded 75 stable phases, 9 of which are previously discovered phases, while the remaining 66 represent hitherto unreported novel configurations. Notably, through intricate band structure calculations, we uncovered that 31 of these structures possess six-fold degenerate fermions at R high-symmetry points within reciprocal space. As a result, our high-throughput screening not only reconfirmed the 9 known PdBiSe-like topological materials but also unearthed 22 new topological quantum materials, recognized with six-fold degenerate fermion states proximate to the Fermi level, thereby expanding the topological material realm of PdBiSe-like system.
类钯孪晶结构材料具有奇异的拓扑特性,其特点是具有独特的六折变性费米子。为了探索更多的类钯铋系拓扑材料,我们利用 OQMD 和 MP 数据库的第一性原理计算,对类钯铋结构进行了彻底的高通量筛选和计算分析。这一细致的过程产生了 75 个稳定相,其中 9 个是以前发现的相,其余 66 个代表了迄今未报道的新构型。值得注意的是,通过复杂的带状结构计算,我们发现其中 31 种结构在倒易空间的 R 个高对称点上具有六倍退化费米子。因此,我们的高通量筛选不仅再次证实了 9 种已知的类钯铋拓扑材料,而且还发现了 22 种新的拓扑量子材料,这些材料在费米级附近具有六倍退化费米子态,从而拓展了类钯铋体系的拓扑材料领域。
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引用次数: 0
Room temperature analysis of vanillin and folic acid in food samples using a BiOBr/GCE sensor: An empathetic and efficient approach 使用 BiOBr/GCE 传感器对食品样品中的香兰素和叶酸进行室温分析:感同身受的高效方法
IF 4.2 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-11-25 DOI: 10.1016/j.mssp.2024.109161
Dhamodharan A , Jhansirani K , Perumal K , Yajun Gao , Huan Pang
This study presents the development of an innovative sensor for detecting vanillin (VAN) in food samples containing folic acid (FA), an essential nutritional additive. Although these compounds offer significant health benefits, excessive consumption can lead to adverse effects, including VAN-induced allergic reactions and an increased risk of colorectal cancer associated with high levels of FA. This sensor addresses the critical need for precise quantification of VAN and FA in food samples, ensuring food safety and optimal nutritional balance. Biogenically synthesized BiOBr (BOB) nanostructures were efficiently immobilized on a glassy carbon electrode (GCE), exhibiting well-defined physical characteristics. The BOB/GCE sensor leverages the unique properties of both components to enhance its sensing capabilities. The BOB material increases the sensor's surface area, allowing for better adsorption of target molecules. Meanwhile, the BOB/GCE provides excellent electrical conductivity, facilitating efficient electron transfer. The sensor detects VAN and FA through electrochemical reactions, which occur when the target molecules interact with the BOB/GCE surface. This nanostructured platform was optimized for the rapid electrochemical detection of VAN and FA, offering a broad linear response range and a notably low detection limit (LOD). Linear calibration curves were obtained for VAN (4.3–113 μM) and FA (5.6–96.5 μM), with impressive detection limits of (0.057 μM and 0.068 μM) respectively. Anti-interference tests and real-sample analyses confirmed the material's potential for developing advanced electrochemical sensors. The BOB/GCE is ideally suited for real-time sensing in food applications, with recovery values validated against HPLC standards to ensure precision and accuracy.
本研究介绍了一种创新型传感器的开发情况,该传感器用于检测含有叶酸(FA)的食品样品中的香兰素(VAN),叶酸是一种重要的营养添加剂。虽然这些化合物对健康大有益处,但过量食用会导致不良影响,包括由 VAN 引起的过敏反应以及与高水平 FA 相关的结肠直肠癌风险增加。该传感器满足了精确定量食品样品中 VAN 和 FA 的关键需求,确保了食品安全和最佳营养平衡。生物合成的 BiOBr(BOB)纳米结构被有效固定在玻璃碳电极(GCE)上,表现出明确的物理特性。BOB/GCE 传感器利用这两种成分的独特特性增强了传感能力。BOB 材料增加了传感器的表面积,从而可以更好地吸附目标分子。同时,BOB/GCE 具有出色的导电性,有利于有效的电子转移。当目标分子与 BOB/GCE 表面发生相互作用时,传感器通过电化学反应检测 VAN 和 FA。该纳米结构平台经过优化,可用于 VAN 和 FA 的快速电化学检测,具有宽广的线性响应范围和明显较低的检测限 (LOD)。VAN (4.3-113 μM)和 FA (5.6-96.5 μM)的线性校准曲线,检测限分别为 0.057 μM 和 0.068 μM。抗干扰测试和实际样品分析证实了这种材料在开发先进电化学传感器方面的潜力。BOB/GCE 非常适合食品应用中的实时传感,其回收值已根据 HPLC 标准进行了验证,以确保精度和准确性。
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引用次数: 0
期刊
Materials Science in Semiconductor Processing
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