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Photoresponsivity Enhancement of Monolayer MoS2 by Silicon Quantum Dots 硅量子点增强MoS2单层的光响应性
Pub Date : 2023-08-03 DOI: 10.1002/pssr.202300220
Minseon Gu, Keun Wook Lee, Beomjin Park, Beom Soo Joo, Young Jun Chang, Dong-Wook Park, Moonsup Han
Hybrid 2D/0D structures with various 2D materials and 0D quantum dots (QDs) have been studied to overcome the limitations of 2D materials. In this work, a hybrid structure with MoS2 and silicon quantum dots (Si QDs) as a photodetector is developed. The I–V transfer characteristics show a threshold voltage shift after decorating Si QDs on MoS2, which results from an n‐type doping effect to the MoS2 channel from the Si QDs. The field‐effect mobility of the MoS2/Si QDs device is increased by ≈5.8 times compared with that of the bare MoS2 device. It is understood that the mobility enhancement is attributed to the surface defect passivation of MoS2 at the interface with Si QDs. It is observed that the photoresponsivity of the MoS2/Si QDs structure is improved by ≈7.7 times compared with that of the bare MoS2 device under 500 nm illumination. Additionally, it is observed that the photoluminescence (PL) intensity of MoS2 is increased about 4.5 times after decoration of Si QDs. The band alignment as type I at the interface between the Si QDs and MoS2 is interpreted. The mobility enhancement and the photoexcited charge transfer (CT) between the MoS2 and the Si QDs due to the illumination lead to enhancing the photoresponsivity of the MoS2/Si QDs hybrid structure.
为了克服2D材料的局限性,研究了多种2D材料和0D量子点(QDs)的混合2D/0D结构。在这项工作中,开发了一种以二硫化钼和硅量子点(Si QDs)作为光电探测器的混合结构。在MoS2上修饰Si量子点后,I-V转移特性显示出阈值电压偏移,这是由于Si量子点对MoS2通道的n型掺杂效应所致。MoS2/Si量子点器件的场效应迁移率比裸MoS2器件提高了约5.8倍。迁移率的增强归因于MoS2与Si量子点界面处的表面缺陷钝化。结果表明,在500 nm光照下,MoS2/Si量子点结构的光响应性比裸MoS2器件提高了约7.7倍。另外,经过Si量子点修饰后,MoS2的光致发光强度提高了约4.5倍。在Si量子点和MoS2之间的界面处,波段对准为I型。光照增强了MoS2和Si量子点之间的迁移率和光激发电荷转移(CT),从而提高了MoS2/Si量子点杂化结构的光响应性。
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引用次数: 0
Anisotropic optical properties of monolayer aligned single‐walled carbon nanotubes 单层排列单壁碳纳米管的各向异性光学特性
Pub Date : 2023-08-02 DOI: 10.1002/pssr.202300199
G. Ermolaev, Ying Xie, Liu Qian, Mikhail K. Tatmyshevskiy, A. Slavich, Aleksey Arsenin, Jin Zhang, V. Volkov, A. Chernov
Two‐dimensional materials are the fundamental building blocks for modern optoelectronics and photonics. Optically anisotropic monolayers give even more flexibility in device design and performance. However, the random orientation of optical axes in the large‐scale samples prevents anisotropic monolayers from widespread use. The alternative structure is a monolayer of aligned single‐walled carbon nanotubes (SWCNTs) with an anisotropic dielectric tensor. Here, we measure aligned SWCNTs monolayer anisotropic optical constants in a broad spectral range (250 – 1700 nm) for the first time. We discovered that it has a large birefringence of Δn ∽ 0.2 and a high dichroism of Δk ∽ 0.4. Moreover, we demonstrated that aligned SWCNTs monolayer optical response could be described by an effective medium approximation using the graphene dielectric function. Besides, it gives a universal approach for a determination of carbon concentration in nanotubes structures. It also applies for other types of carbon nanotubes, such as multi‐walled and randomly oriented carbon nanotubes arrays. Hence, our results add aligned SWCNTs monolayer optical constants to the optical anisotropy database, which facilitates the longstanding challenge of using one‐dimensional structures in two dimensions, and provide a rapid characterization method for carbon nanotubes.This article is protected by copyright. All rights reserved.
二维材料是现代光电子学和光子学的基本组成部分。光学各向异性单层在器件设计和性能上提供了更大的灵活性。然而,大尺度样品中光轴的随机取向阻碍了各向异性单层材料的广泛应用。另一种结构是具有各向异性介电张量的单层排列单壁碳纳米管(SWCNTs)。在这里,我们首次在宽光谱范围(250 - 1700 nm)测量了对齐的SWCNTs单层各向异性光学常数。我们发现它具有Δn∽0.2的大双折射和Δk∽0.4的高二色性。此外,我们证明了排列的SWCNTs单层光学响应可以通过使用石墨烯介电函数的有效介质近似来描述。此外,它还为纳米管结构中碳浓度的测定提供了一种通用的方法。它也适用于其他类型的碳纳米管,如多壁和随机取向的碳纳米管阵列。因此,我们的研究结果将SWCNTs单层光学常数添加到光学各向异性数据库中,从而解决了在二维中使用一维结构的长期挑战,并为碳纳米管的快速表征提供了一种方法。这篇文章受版权保护。版权所有。
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引用次数: 0
Phase‐Change and Ovonic Materials (Fourth Edition) 相变与电子材料(第四版)
Pub Date : 2023-08-01 DOI: 10.1002/pssr.202300129
P. Noé, B. Kooi, M. Wuttig
Once again, it is our great pleasure to continue the EPCOS tradition by presenting this fourth edition of the special issue on Phase-Change and Ovonic Materials that is published each year as part of the European Symposium on Phase-Change and Ovonic Sciences (EPCOS). We have to admit that the 2022 edition of EPCOS had a special spirit as it marked the long-awaited return to a face-to-face on-site symposium after a two-year hiatus due to the Covid crisis. Last September, the 2022 edition of EPCOS was the most successful in terms of attendance in the history of EPCOS. This is no coincidence and once again, in this editorial, Harish Bhaskaran, Luci Bywater and the Oxford team are sincerely thanked on behalf of the entire EPCOS community for making this success possible even if unfortunately, some of the EPCOS major actors could not join us at the Wolfson College in Oxford this year. As in the three previous editions, this special issue again aims to summarize recent and innovative scientific and technological achievements in the field of phase-change materials, as well as their possible new fields of application. In addition to recent advances in this field, the objective is also to present emerging interests in neuromorphic computing, phase-change and nonlinear photonics or plasmonics. This special issue thus provides an overview of the state of the art, both experimental and theoretical, for experienced and young researchers interested in these topics. As usual, let us first recall, for the younger and newer members of our ever-evolving community, that EPCOS was born in Switzerland in 2001, with the aim to provide a platform to discuss and promote the fundamental science of phase-change materials (PCM). This goal also included their applications in rewritable optical discs (e.g., first with CDs and later with the successfully developed DVD and Blu-ray Disc formats) and thus initially PCOS referred to phase-change optical storage (which was diversified in 2005 to phase-change and ovonic science). In fact, EPCOS was born from the first PCOS symposium held in Japan in 1990, thanks to Professor Masahiro Okuda, who was the advisor of EPCOS during its early years. In recent years, the field has diversified considerably. While the scientific and technological fingerprints of the field’s founding father, the late Stanford Ovshinsky, are still very recognizable, the number of topics covered has continued to grow significantly with applications including non-volatile electronic memories, optoelectronics, photonics, and neuromorphic computing. The 2022 edition of EPCOS has confirmed that EPCOS is the premier international conference on this exciting and evergreen topic. This 2022 edition, which follows the 2021 virtual edition, was somewhat of a challenge for the EPCOS community. However, its unprecedented success confirmed the close ties between key players in the field, both academic and industrial. By again covering a rich variety of topics beyond phase-c
再一次,我们非常高兴能够延续EPCOS的传统,推出第四版相变和椭圆材料特刊,该特刊每年出版一次,作为欧洲相变和椭圆科学研讨会(EPCOS)的一部分。不得不承认,2022年的EPCOS,在因新冠疫情中断两年之后,终于回到了面对面的现场研讨会,这是一种特殊的精神。去年9月,2022年的EPCOS是EPCOS历史上出席人数最多的一届。这并非巧合,在这篇社论中,我再次代表整个EPCOS社区衷心感谢Harish Bhaskaran、Luci Bywater和牛津团队,尽管不幸的是,今年EPCOS的一些主要参与者无法参加牛津大学沃尔夫森学院的活动。与前三版一样,本期特刊再次旨在总结相变材料领域的最新和创新科技成果,以及它们可能的新应用领域。除了这一领域的最新进展外,会议的目标还包括展示神经形态计算、相变和非线性光子学或等离子体学方面的新兴兴趣。因此,这一期特刊为对这些主题感兴趣的有经验和年轻的研究人员提供了对实验和理论两方面的艺术状态的概述。与往常一样,让我们首先回顾一下,对于我们不断发展的社区的年轻和新成员,EPCOS于2001年在瑞士诞生,旨在提供一个讨论和促进相变材料(PCM)基础科学的平台。这一目标还包括它们在可重写光盘中的应用(例如,首先是cd,后来是成功开发的DVD和蓝光光盘格式),因此最初的PCOS指的是相变光学存储(在2005年多样化到相变和电子科学)。事实上,EPCOS诞生于1990年在日本举行的第一届PCOS研讨会,这要归功于EPCOS早期的顾问Masahiro Okuda教授。近年来,该领域已相当多样化。虽然该领域的创始人,已故的斯坦福·奥夫辛斯基的科学和技术指纹仍然非常清晰,但所涵盖的主题数量继续显著增长,应用包括非易失性电子存储器,光电子学,光子学和神经形态计算。2022年的EPCOS已经证实,EPCOS是这一令人兴奋和常青主题的首要国际会议。继2021年的虚拟版之后,2022年的版本对EPCOS社区来说是一个挑战。然而,它前所未有的成功证实了学术界和工业界关键参与者之间的密切联系。通过再次涵盖相变存储器以外的丰富多样的主题,第四期特刊将再次标志着EPCOS的历史。Park等人关于使用Sb2Te3/TiTe2异质结构取代传统和规范的GST (Ge2Sb2Te5)合金用于存储级存储器和神经形态计算硬件的论文是第一个例子[pssr.202200451]。事实上,对于这些最近推出的新型相变存储器(PCM)应用,需要比通常的GST225合金获得的更快的SET速度和更低的RESET能量。在本研究中,基于溅射沉积的非晶Sb2Te3和TiTe2纳米层的多层PCM器件显示出快速的SET速度(30 ns),与基于gst的参考PCM相比,RESET能量降低了80%以上,并且在高电阻状态下电阻漂移也更低。这些非常有希望的结果值得未来的社区工作,例如评估这种新型异质结构在编程周期中的耐久性。类似的目标也激励了Kashem等人提出的工作。[202200419],他们提出了结合非晶化结晶动力学和电热效应的有限元模拟框架,以更好地描述PCM纳米级器件的RESET-SET-READ操作。他们的结论是,基于GST合金的模型可以解释器件运行过程中结晶度动态变化的影响,并且他们的结果与实验观察结果一致,从而更好地理解器件动力学。该模型将允许研究任何器件几何形状,以探索编程脉冲和材料工程以及器件结构对器件性能的影响。例如,模拟结果预测了热电效应对RESET电流要求的影响,以及加热器高度对热损失和RESET电流的重要作用。 存储级存储器应用的PCM技术的另一个挑战是通过使用多层单元(mlc)来提高存储密度,如Zhao等人所示。P. no<s:1>大学格勒诺布尔阿尔卑斯CEA, Leti F-38000格勒诺布尔,法国E-mail: pierre.noe@cea.fr格罗宁根大学尼延堡4,NL-9747 AG格罗宁根,荷兰M. Wuttig I.物理研究所(IA)德国亚琛工业大学Sommerfeldstraße, 52074亚琛,德国M. Wuttig jra - Institute Green IT jra - fit Forschungszentrum j<s:1>利希有限公司和亚琛工业大学52056亚琛
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引用次数: 0
Charge‐Mediated Copper‐Iodide‐Based Artificial Synaptic Device with Ultrahigh Neuromorphic Efficacy 具有超高神经形态效能的电荷介导的碘化铜人工突触装置
Pub Date : 2023-08-01 DOI: 10.1002/pssr.202300191
D. S. Assi, Hongli Huang, Kadir Ufuk Kandira, Nasser S. Alsulaiman, Vaskuri C. S. Theja, Hasan T. Abbas, V. Karthikeyan, Vellaisamy A. L. Roy
In the realm of artificial intelligence, ultrahigh‐performance neuromorphic computing plays a significant role in executing multiple complex operations in parallel while adhering to a more biologically plausible model. Despite their importance, developing an artificial synaptic device to match the human brain's efficiency is an extremely complex task involving high energy consumption and poor parallel processing latency. Herein, a simple molecule, copper‐iodide‐based artificial synaptic device demonstrating core synaptic functions of human neural networks is introduced. Exceptionally high carrier mobility and dielectric constant in the developed device lead to superior efficacies in neuromorphic characteristics with ultrahigh paired‐pusle facilitation index (>195). The results demonstrate biomimetic capabilities that exert a direct influence on neural networks across multiple timescales, ranging from short‐ to long‐term memory. This flexible reconfiguration of neural excitability provided by the copper‐iodide‐based synaptic device positions it as a promising candidate for creating advanced artificial intelligence systems.
在人工智能领域,超高性能的神经形态计算在并行执行多个复杂操作方面发挥着重要作用,同时遵循更合理的生物学模型。尽管它们很重要,但开发一种人造突触装置来匹配人类大脑的效率是一项极其复杂的任务,涉及高能量消耗和低并行处理延迟。本文介绍了一种基于碘化铜的简单分子人工突触装置,该装置展示了人类神经网络的核心突触功能。在开发的装置中,异常高的载流子迁移率和介电常数导致具有超高成对脉冲促进指数的神经形态特征的优越效率(>195)。研究结果表明,仿生能力在多个时间尺度(从短期到长期记忆)上对神经网络产生直接影响。这种基于碘化铜的突触装置提供的神经兴奋性的灵活重构使其成为创建先进人工智能系统的有希望的候选者。
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引用次数: 0
Ultrasmall CoSe2 Nanoparticles Grown on MoS2 Nanofilms: A New Catalyst for Hydrogen Evolution Reaction 在MoS2纳米膜上生长的超小CoSe2纳米颗粒:一种新的析氢反应催化剂
Pub Date : 2023-08-01 DOI: 10.1002/pssr.202300169
Jia Liang, Yingchao Yang, Jing Zhang, Pei Dong, J. Lou
{"title":"Ultrasmall CoSe2 Nanoparticles Grown on MoS2 Nanofilms: A New Catalyst for Hydrogen Evolution Reaction","authors":"Jia Liang, Yingchao Yang, Jing Zhang, Pei Dong, J. Lou","doi":"10.1002/pssr.202300169","DOIUrl":"https://doi.org/10.1002/pssr.202300169","url":null,"abstract":"","PeriodicalId":20059,"journal":{"name":"physica status solidi (RRL) – Rapid Research Letters","volume":"64 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2023-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"77631962","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A hybrid supercapacitor from nickel cobalt sulfide and activated carbon for energy storage application 一种由硫化镍钴和活性炭混合制成的储能超级电容器
Pub Date : 2023-07-29 DOI: 10.1002/pssr.202300211
A. Markhabayeva, Anarova S. Assiya, Abdullin A. Khabibulla, Kalkozova K. Zhanar, Tulegenova T. Aida, N. Nuraje
{"title":"A hybrid supercapacitor from nickel cobalt sulfide and activated carbon for energy storage application","authors":"A. Markhabayeva, Anarova S. Assiya, Abdullin A. Khabibulla, Kalkozova K. Zhanar, Tulegenova T. Aida, N. Nuraje","doi":"10.1002/pssr.202300211","DOIUrl":"https://doi.org/10.1002/pssr.202300211","url":null,"abstract":"","PeriodicalId":20059,"journal":{"name":"physica status solidi (RRL) – Rapid Research Letters","volume":"68 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2023-07-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"91164122","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Synthesis of Calcium Manganese Oxide Films Using a Sol‐Gel Method and Evaluation of Color and Photocatalytic Properties 溶胶-凝胶法制备氧化钙锰膜及其颜色和光催化性能评价
Pub Date : 2023-07-29 DOI: 10.1002/pssr.202300233
Ryohei Oka, T. Hayakawa
{"title":"Synthesis of Calcium Manganese Oxide Films Using a Sol‐Gel Method and Evaluation of Color and Photocatalytic Properties","authors":"Ryohei Oka, T. Hayakawa","doi":"10.1002/pssr.202300233","DOIUrl":"https://doi.org/10.1002/pssr.202300233","url":null,"abstract":"","PeriodicalId":20059,"journal":{"name":"physica status solidi (RRL) – Rapid Research Letters","volume":"1 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2023-07-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"80641149","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Al Incorporation up to 99% in Metalorganic Chemical Vapor Deposition‐Grown Monoclinic (AlxGa1–x)2O3 Films Using Trimethylgallium 金属有机化学气相沉积-使用三甲基镓生长的单斜(AlxGa1-x)2O3薄膜中Al掺入率高达99%
Pub Date : 2023-07-29 DOI: 10.1002/pssr.202300224
A. Bhuiyan, Lingyu Meng, Hsien-Lien Huang, C. Chae, Jinwoo Hwang, Hongping Zhao
Growths of monoclinic (AlxGa1−x)2O3 thin films up to 99% Al contents are demonstrated via metalorganic chemical vapor deposition (MOCVD) using trimethylgallium (TMGa) as the Ga precursor. The utilization of TMGa, rather than triethylgallium, enables a significant improvement of the growth rates (>2.5 μm h−1) of β‐(AlxGa1−x)2O3 thin films on (010), (100), and ( 2¯ 01) β‐Ga2O3 substrates. By systematically tuning the precursor molar flow rates, growth of coherently strained phase pure β‐(AlxGa1−x)2O3 films is demonstrated by comprehensive material characterizations via high‐resolution X‐ray diffraction (XRD) and atomic‐resolution scanning transmission electron microscopy (STEM) imaging. Monoclinic (AlxGa1−x)2O3 films with Al contents up to 99, 29, and 16% are achieved on (100), (010), and ( 2¯ 01) β‐Ga2O3 substrates, respectively. Beyond 29% of Al incorporation, the (010) (AlxGa1−x)2O3 films exhibit β‐ to γ‐phase segregation. β‐(AlxGa1−x)2O3 films grown on ( 2¯ 01) β‐Ga2O3 show local segregation of Al along (100) plane. Record‐high Al incorporations up to 99% in monoclinic (AlxGa1−x)2O3 grown on (100) Ga2O3 are confirmed from XRD, STEM, electron nanodiffraction, and X‐ray photoelectron spectroscopy measurements. These results indicate great promises of MOCVD development of β‐(AlxGa1−x)2O3 films and heterostructures with high Al content and growth rates using TMGa for next‐generation high‐power and high‐frequency electronic devices.
以三甲基镓(TMGa)为前驱体,通过金属有机化学气相沉积(MOCVD)法制备了Al含量高达99%的单斜(AlxGa1−x)2O3薄膜。利用TMGa,而不是三乙基镓,可以显著提高β‐(AlxGa1−x)2O3薄膜在(010)、(100)和(2¯01)β‐Ga2O3衬底上的生长速率(>2.5 μm h−1)。通过系统地调整前驱体摩尔流速率,通过高分辨率x射线衍射(XRD)和原子分辨率扫描透射电子显微镜(STEM)成像的综合材料表征,证明了相干应变相纯β - (AlxGa1−x)2O3薄膜的生长。在(100),(010)和(2¯01)β - Ga2O3衬底上分别获得Al含量高达99%,29%和16%的单斜斜(AlxGa1−x)2O3薄膜。当Al掺入量超过29%时,(010)(AlxGa1−x)2O3薄膜表现出β - γ相偏析。在(2¯01)β‐Ga2O3上生长的β‐(AlxGa1−x)2O3薄膜显示Al沿(100)平面局部偏析。通过XRD, STEM,电子纳米衍射和x射线光电子能谱测量证实,在(100)Ga2O3上生长的单斜(AlxGa1−x)2O3中,铝的掺入率高达99%。这些结果表明,利用TMGa开发具有高Al含量和生长速率的β - (AlxGa1−x)2O3薄膜和异质结构的MOCVD具有很大的前景,可用于下一代高功率和高频电子器件。
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引用次数: 1
Interface Structure and Doping of Chemical Vapor Deposition‐Grown MoS2 on 4H–SiC by Microscopic Analyses and Ab Initio Calculations 化学气相沉积生长MoS2在4H-SiC上的界面结构和掺杂的微观分析和从头计算
Pub Date : 2023-07-25 DOI: 10.1002/pssr.202300218
S. Panasci, I. Deretzis, E. Schilirò, A. La Magna, F. Roccaforte, A. Koos, B. Pécz, S. Agnello, M. Cannas, F. Giannazzo
The interface structure and electronic properties of monolayer (1L) MoS2 domains grown by chemical vapor deposition on 4H–SiC(0001) are investigated by microscopic/spectroscopic analyses combined with ab initio calculations. The triangular domains are epitaxially oriented on the (0001) basal plane, with the presence of a van der Waals (vdW) gap between 1L–MoS2 and the SiC terraces. The high crystalline quality of the domains is confirmed by photoluminescence emission. Furthermore, a very low tensile strain (ε ≈ 0.03%) of 1L–MoS2, consistent with the small in‐plane lattice mismatch, and a p‐type doping of (0.45 ± 0.11) × 1013 cm−2, is evaluated by Raman mapping. Density functional theory (DFT) calculations of the MoS2/4H–SiC(0001) system are also performed, considering different levels of refinement of the model: 1) the simple case of the junction between Si‐terminated SiC and MoS2, showing a covalent bond between the Si–S atoms and n‐type doping of MoS2; 2) the complete passivation of Si dangling bonds with a monolayer (1 ML) of oxygen atoms, resulting in a vdW bond with dSi–S ≈ 3.84 Å bond length and p‐type doping of MoS2; and 3) partial (¼ ML and ½ ML) oxygen coverages of the 4H–SiC surface, resulting in intermediate values of dSi–S and doping behavior.
采用显微/光谱分析和从头计算相结合的方法研究了化学气相沉积在4H-SiC(0001)上生长的单层(1L) MoS2畴的界面结构和电子性能。三角形畴在(0001)基面上外延取向,在1L-MoS2和SiC阶地之间存在范德华(vdW)间隙。光致发光证实了结构域的高结晶性。此外,通过拉曼映射评估了1L-MoS2的极低拉伸应变(ε≈0.03%),与小的平面内晶格失配一致,p型掺杂为(0.45±0.11)× 1013 cm−2。本文还对MoS2/ 4h - SiC(0001)体系进行了密度泛函理论(DFT)计算,考虑了模型的不同改进程度:1)Si端SiC和MoS2之间的结的简单情况,显示Si - s原子之间的共价键和MoS2的n型掺杂;2)单层(1 ML)氧原子完全钝化Si悬空键,得到键长dSi-S≈3.84 Å的vdW键和p型MoS2掺杂;3) 4H-SiC表面的部分(¼ML和½ML)氧覆盖,导致dSi-S的中间值和掺杂行为。
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引用次数: 0
Optical and Electrical Properties of Polystyrene/Poly‐methyl methacrylate Polymeric Blend Filled with Semiconductor and Insulator Nanofillers 半导体和绝缘体纳米填料填充聚苯乙烯/聚甲基丙烯酸甲酯聚合物共混物的光学和电学性能
Pub Date : 2023-07-21 DOI: 10.1002/pssr.202300145
A. El-Gamal
The present study deals with the effect of adding different fillers (semiconductor and insulator) on a polystyrene (PS)/poly‐methyl methacrylate (PMMA) polymer blend using casting method. A constant content (1 wt%) of semiconductors [multiwalled carbon nanotubes (MWCNTs), polyaniline (PANI), zinc oxide nanoparticles (NPs), and titanium dioxide NPs] and insulator [silicon dioxide NPs] fillers is used. Transmission electron microscopy images for MWCNTs show that most nanotubes have an average diameter of 7–11 nm. Moreover, the average size of all metal nano‐oxides is almost 20 nm and confirmed by X‐ray diffraction. Fourier‐transform infrared spectroscopy confirms the formation and the interaction between PS/PMMA polymer blend and fillers. The structural, mechanical, optical, and dielectric properties of the prepared polymer nanocomposites are studied using different tools. Optical characteristics such as absorbance, reflection, bandgap energy (E g), and optical dielectric components (real and imaginary) are studied. These results reveal that pure 20PS/80PMMA film has E g(direct) = 4.46 eV, which drops as different fillers are incorporated into the blend. The addition of MWCNTs, PANI to the PS/PMMA blend improves the electrical conductivity due to the growth of conductive paths between the filler and the blending matrix.
采用浇铸法研究了不同填料(半导体和绝缘体)对聚苯乙烯(PS)/聚甲基丙烯酸甲酯(PMMA)共混物的影响。使用恒定含量(1wt %)的半导体[多壁碳纳米管(MWCNTs)、聚苯胺(PANI)、氧化锌纳米颗粒(NPs)和二氧化钛NPs]和绝缘体[二氧化硅NPs]填料。MWCNTs的透射电镜图像显示,大多数纳米管的平均直径为7-11 nm。此外,经X射线衍射证实,所有金属纳米氧化物的平均尺寸接近20 nm。傅里叶变换红外光谱证实了PS/PMMA聚合物共混物与填料之间的形成和相互作用。利用不同的工具研究了所制备的聚合物纳米复合材料的结构、力学、光学和介电性能。光学特性,如吸光度,反射,带隙能量(E g),和光介电分量(实和虚)进行了研究。结果表明,纯20PS/80PMMA薄膜的E g(direct) = 4.46 eV,随着不同填料的加入而下降。在PS/PMMA共混物中加入MWCNTs、PANI,由于填料和共混基体之间导电通路的生长,提高了导电性能。
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引用次数: 0
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physica status solidi (RRL) – Rapid Research Letters
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