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Plasma nitrogen fixation for plant cultivation with air‐derived dinitrogen pentoxide 等离子体固氮法利用气源五氧化二氮培育植物
IF 3.5 3区 物理与天体物理 Q2 PHYSICS, APPLIED Pub Date : 2024-07-11 DOI: 10.1002/ppap.202400096
Shouki Takeshi, Keisuke Takashima, Shota Sasaki, Atsushi Higashitani, Toshiro Kaneko
The development of a nonconventional nitrogen fertilizer, which can be fixed in agricultural fields using decentralized renewable energy sources, presents a feasible solution for sustainable on‐site nitrogen fixation and fertilization. This study focuses on plasma‐generated dinitrogen pentoxide (N2O5) as a prospective mediator for the on‐site nitrogen fertilization, allowing nitrogen fertilization directly into culture media. Basal dinitrogen pentoxide fertilization demonstrated almost 100% dinitrogen pentoxide dissolution efficiency as nitrate in a culture medium and nitrogen fertilization effect on plant growth without explicit symptoms of damage. Top‐dressing of dinitrogen pentoxide was also an efficient method for transferring nitrogen into the soil as nitrate, which improved plant growth and suppressed nitrogen deficiency symptoms, while overdose caused adverse effects.
利用分散的可再生能源在农田中固定的非常规氮肥的开发,为可持续的现场固氮和施肥提供了一个可行的解决方案。本研究将等离子体产生的五氧化二氮(N2O5)作为现场氮肥的前瞻性媒介,使氮肥直接进入培养基。基础五氧化二氮施肥表明,五氧化二氮在培养基中作为硝酸盐的溶解效率几乎达到 100%,氮肥对植物生长的影响没有明显的损害症状。将五氧化二氮作为硝酸盐施入土壤表层也是一种有效的氮转移方法,它能改善植物生长并抑制缺氮症状,而过量施用则会造成不良影响。
{"title":"Plasma nitrogen fixation for plant cultivation with air‐derived dinitrogen pentoxide","authors":"Shouki Takeshi, Keisuke Takashima, Shota Sasaki, Atsushi Higashitani, Toshiro Kaneko","doi":"10.1002/ppap.202400096","DOIUrl":"https://doi.org/10.1002/ppap.202400096","url":null,"abstract":"The development of a nonconventional nitrogen fertilizer, which can be fixed in agricultural fields using decentralized renewable energy sources, presents a feasible solution for sustainable on‐site nitrogen fixation and fertilization. This study focuses on plasma‐generated dinitrogen pentoxide (N<jats:sub>2</jats:sub>O<jats:sub>5</jats:sub>) as a prospective mediator for the on‐site nitrogen fertilization, allowing nitrogen fertilization directly into culture media. Basal dinitrogen pentoxide fertilization demonstrated almost 100% dinitrogen pentoxide dissolution efficiency as nitrate in a culture medium and nitrogen fertilization effect on plant growth without explicit symptoms of damage. Top‐dressing of dinitrogen pentoxide was also an efficient method for transferring nitrogen into the soil as nitrate, which improved plant growth and suppressed nitrogen deficiency symptoms, while overdose caused adverse effects.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":"64 1","pages":""},"PeriodicalIF":3.5,"publicationDate":"2024-07-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141613968","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Optical emission characterization of an atmospheric pressure dielectric barrier discharge in nitrogen: Evolution of CN emissions during PTFE etching 氮气中常压介质阻挡层放电的光学发射特征:聚四氟乙烯蚀刻过程中的 CN 发射演变
IF 3.5 3区 物理与天体物理 Q2 PHYSICS, APPLIED Pub Date : 2024-07-08 DOI: 10.1002/ppap.202400036
Alex Destrieux, Williams M. Caceres Ferreira, Zachary Costantino, Jacopo Profili, Gaetan Laroche
The present work investigates the etching of coated polytetrafluoroethylene (PTFE) films using an atmospheric pressure dielectric barrier discharge operating in nitrogen in a filamentary regime. For different treatment durations, the optical emission spectra were recorded over time. Most of the emissions are attributed to the N2 second positive system. The presence of CN is also observed, and its emissions rise with the exposure time of PTFE. This rise is attributed to the density of CN produced. The X‐ray photoelectron spectroscopy surface characterization suggests two etching regimes. This is linked with a change in slope in the intensity evolution of the optical emissions of the CN. At longer times, a fluorinated deposit on the electrode is observed, confirming a different nature of the etched material.
本研究使用氮气中的常压介质阻挡放电技术,以丝状方式研究了聚四氟乙烯(PTFE)涂层薄膜的蚀刻问题。针对不同的处理持续时间,记录了随时间变化的光学发射光谱。大部分发射归因于 N2 第二正向系统。此外,还观察到 CN 的存在,其发射随着 PTFE 暴露时间的延长而上升。这种上升归因于产生的 CN 的密度。X 射线光电子能谱表面特性分析表明存在两种蚀刻机制。这与氯化萘光学发射强度演变斜率的变化有关。在较长的时间内,电极上会出现含氟沉积物,这证实了蚀刻材料的不同性质。
{"title":"Optical emission characterization of an atmospheric pressure dielectric barrier discharge in nitrogen: Evolution of CN emissions during PTFE etching","authors":"Alex Destrieux, Williams M. Caceres Ferreira, Zachary Costantino, Jacopo Profili, Gaetan Laroche","doi":"10.1002/ppap.202400036","DOIUrl":"https://doi.org/10.1002/ppap.202400036","url":null,"abstract":"The present work investigates the etching of coated polytetrafluoroethylene (PTFE) films using an atmospheric pressure dielectric barrier discharge operating in nitrogen in a filamentary regime. For different treatment durations, the optical emission spectra were recorded over time. Most of the emissions are attributed to the N<jats:sub>2</jats:sub> second positive system. The presence of CN is also observed, and its emissions rise with the exposure time of PTFE. This rise is attributed to the density of CN produced. The X‐ray photoelectron spectroscopy surface characterization suggests two etching regimes. This is linked with a change in slope in the intensity evolution of the optical emissions of the CN. At longer times, a fluorinated deposit on the electrode is observed, confirming a different nature of the etched material.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":"2 1","pages":""},"PeriodicalIF":3.5,"publicationDate":"2024-07-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141569943","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Antimycotic effects of the plasma gun on the yeast Candida glabrata tested on various surfaces 等离子枪对在各种表面上测试的光滑念珠菌酵母的抗霉菌作用
IF 3.5 3区 物理与天体物理 Q2 PHYSICS, APPLIED Pub Date : 2024-07-05 DOI: 10.1002/ppap.202400057
Kristína Trebulová, Inna Orel, Jean‐Michel Pouvesle, Eric Robert, Amaury Rouillard, Augusto Stancampiano, Jan Hrudka, Přemysl Menčík, Zdenka Kozáková, Zuzana Měšťánková, Darina Kužmová, Ivana Paličková, Alois Čížek, František Krčma
This work focuses on the antimycotic effects of the plasma gun as a potential tool for the treatment of superficial infections. Candida glabrata was chosen as a model microorganism. The preliminary tests have been done on the agar plates to establish the basic plasma parameters. To render this research more appropriate to the real application, more complex inoculation substrates, pork skin and 3D‐printed models of the dog ear canal have been used. The results of this work confirm the high efficiency of cold plasma in the inhibition of yeasts on different surfaces and will lead to further experiments.
这项研究的重点是等离子枪的抗真菌效果,它是治疗浅表感染的一种潜在工具。我们选择了白色念珠菌作为模型微生物。在琼脂平板上进行了初步测试,以确定等离子体的基本参数。为了使这项研究更适合实际应用,使用了更复杂的接种基质、猪皮和狗耳道 3D 打印模型。这项工作的结果证实了冷等离子体在不同表面抑制酵母菌的高效性,并将引发进一步的实验。
{"title":"Antimycotic effects of the plasma gun on the yeast Candida glabrata tested on various surfaces","authors":"Kristína Trebulová, Inna Orel, Jean‐Michel Pouvesle, Eric Robert, Amaury Rouillard, Augusto Stancampiano, Jan Hrudka, Přemysl Menčík, Zdenka Kozáková, Zuzana Měšťánková, Darina Kužmová, Ivana Paličková, Alois Čížek, František Krčma","doi":"10.1002/ppap.202400057","DOIUrl":"https://doi.org/10.1002/ppap.202400057","url":null,"abstract":"This work focuses on the antimycotic effects of the plasma gun as a potential tool for the treatment of superficial infections. <jats:italic>Candida glabrata</jats:italic> was chosen as a model microorganism. The preliminary tests have been done on the agar plates to establish the basic plasma parameters. To render this research more appropriate to the real application, more complex inoculation substrates, pork skin and 3D‐printed models of the dog ear canal have been used. The results of this work confirm the high efficiency of cold plasma in the inhibition of yeasts on different surfaces and will lead to further experiments.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":"20 1","pages":""},"PeriodicalIF":3.5,"publicationDate":"2024-07-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141569947","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Plasma jet printing of silver patterns on flexible substrates: Conductive properties and control mechanism 等离子喷射在柔性基底上打印银色图案:导电性能和控制机制
IF 3.5 3区 物理与天体物理 Q2 PHYSICS, APPLIED Pub Date : 2024-07-05 DOI: 10.1002/ppap.202400110
Jiaqing Xue, Deping Yu, Yingxin Zhao, Xufeng Yue, Jianing Cai, Peng Zhang, Keming Peng
Plasma jet printing, which does not require preprocessing and postprocessing, is a promising technology for manufacturing flexible electronics. The conductive properties should be confirmed to ensure the performance of the flexible electronics. In this study, the conductive properties and control mechanism of plasma jet‐printed silver patterns were investigated. Analyses show that high‐energy particles in the plasma decomposed organic solvents and induced the interconnection between silver nanoparticles. The plasma jet‐printed silver patterns had high uniformity in vertical spatial distribution. The dense packing of the silver patterns was achieved by increasing the number of printed layers, reducing the print speed, and increasing the focusing ratio. Oxidation of the silver nanoparticles was reduced and the conductivity was improved by increasing the focusing ratio.
等离子喷射打印无需预处理和后处理,是制造柔性电子器件的一项前景广阔的技术。为确保柔性电子器件的性能,应确认其导电性能。本研究对等离子喷射打印银图案的导电性能和控制机制进行了研究。分析表明,等离子体中的高能粒子分解了有机溶剂,诱导了银纳米粒子之间的相互连接。等离子体喷射印制的银图案在垂直空间分布上具有很高的均匀性。通过增加印制层数、降低印制速度和提高聚焦比,实现了银图案的致密堆积。通过增加聚焦比,银纳米粒子的氧化减少了,导电性提高了。
{"title":"Plasma jet printing of silver patterns on flexible substrates: Conductive properties and control mechanism","authors":"Jiaqing Xue, Deping Yu, Yingxin Zhao, Xufeng Yue, Jianing Cai, Peng Zhang, Keming Peng","doi":"10.1002/ppap.202400110","DOIUrl":"https://doi.org/10.1002/ppap.202400110","url":null,"abstract":"Plasma jet printing, which does not require preprocessing and postprocessing, is a promising technology for manufacturing flexible electronics. The conductive properties should be confirmed to ensure the performance of the flexible electronics. In this study, the conductive properties and control mechanism of plasma jet‐printed silver patterns were investigated. Analyses show that high‐energy particles in the plasma decomposed organic solvents and induced the interconnection between silver nanoparticles. The plasma jet‐printed silver patterns had high uniformity in vertical spatial distribution. The dense packing of the silver patterns was achieved by increasing the number of printed layers, reducing the print speed, and increasing the focusing ratio. Oxidation of the silver nanoparticles was reduced and the conductivity was improved by increasing the focusing ratio.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":"83 1","pages":""},"PeriodicalIF":3.5,"publicationDate":"2024-07-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141569953","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Selective productions of reactive species in dielectric barrier discharge by controlling dual duty cycle 通过控制双占空比在介质阻挡层放电中选择性产生反应物
IF 3.5 3区 物理与天体物理 Q2 PHYSICS, APPLIED Pub Date : 2024-07-05 DOI: 10.1002/ppap.202400098
Jun S. Lim, Kirubel A. Admasu, Eun H. Choi
This study analyzes the selective productions of nitrogen oxides and ozone in dielectric barrier discharge due to temperature controlled by the dual duty cycle. In this work, we varied the dual duty cycle of the output voltage in the power supply, which alternatively generates distinguished high and low‐temperature modes for selective productions of nitrogen oxides and ozone. The alternating nitric oxide and ozone by dual duty cycle were measured at a maximum of 100 ppm and 100 ppm in the gas phase, respectively. In the evaluation of DI water treated by dual duty cycle, nitrogen oxides, and ozone have been observed simultaneously in the liquid phase. These results offer new insights into the selective production of temperature‐dependent chemical characteristics for advanced plasma applications.
本研究分析了电介质阻挡层放电中氮氧化物和臭氧的选择性生成是由双占空比控制的温度引起的。在这项工作中,我们改变了电源输出电压的双占空比,从而交替产生了不同的高温和低温模式,以选择性地产生氮氧化物和臭氧。双占空比交替产生的一氧化氮和臭氧在气相中的最大含量分别为 100 ppm 和 100 ppm。在对经过双占空比处理的去离子水进行评估时,在液相中同时观测到了氮氧化物和臭氧。这些结果为先进等离子体应用中温度相关化学特性的选择性产生提供了新的见解。
{"title":"Selective productions of reactive species in dielectric barrier discharge by controlling dual duty cycle","authors":"Jun S. Lim, Kirubel A. Admasu, Eun H. Choi","doi":"10.1002/ppap.202400098","DOIUrl":"https://doi.org/10.1002/ppap.202400098","url":null,"abstract":"This study analyzes the selective productions of nitrogen oxides and ozone in dielectric barrier discharge due to temperature controlled by the dual duty cycle. In this work, we varied the dual duty cycle of the output voltage in the power supply, which alternatively generates distinguished high and low‐temperature modes for selective productions of nitrogen oxides and ozone. The alternating nitric oxide and ozone by dual duty cycle were measured at a maximum of 100 ppm and 100 ppm in the gas phase, respectively. In the evaluation of DI water treated by dual duty cycle, nitrogen oxides, and ozone have been observed simultaneously in the liquid phase. These results offer new insights into the selective production of temperature‐dependent chemical characteristics for advanced plasma applications.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":"47 1","pages":""},"PeriodicalIF":3.5,"publicationDate":"2024-07-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141546978","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Study of a full coaxial atmospheric pressure plasma jet device and its application to the modification of polytetrafluoroethylene 全同轴常压等离子体喷射装置及其在聚四氟乙烯改性中的应用研究
IF 3.5 3区 物理与天体物理 Q2 PHYSICS, APPLIED Pub Date : 2024-07-05 DOI: 10.1002/ppap.202400078
Dai Zhang, Shuchang Xu, Zhenguo Hou, Xijiang Chang, Zhonghang Wu, Zilan Xiong
In this article, a compact and portable microwave atmospheric pressure plasma jet (MW‐APPJ) generator based on a coaxial transmission line resonator (CTLR) was proposed. Based on the electromagnetic simulations, the jet generator was designed as a tapered inner conductor structure that ensures plasma generation at low power. A self‐igniting argon (Ar) plasma jet of 10 mm length was generated at an input power of ~20 W and maintained at 2 W. Thanks to the high efficiency of the CTLR structure, plasmas of mixed reactive gases were also realized. Intrinsic plasma parameters and active species were determined using optical emission spectroscopy. Furthermore, the MW‐APPJ device was used to modify the polytetrafluoroethylene surface, and improvement of hydrophilicity was achieved without thermal damage.
本文提出了一种基于同轴传输线谐振器(CTLR)的紧凑型便携式微波大气压等离子体射流(MW-APPJ)发生器。根据电磁模拟,喷射发生器被设计成锥形内导体结构,以确保在低功率下产生等离子体。由于 CTLR 结构的高效率,还实现了混合反应气体的等离子体。利用光学发射光谱测定了等离子体的内在参数和活性物种。此外,还利用 MW-APPJ 设备对聚四氟乙烯表面进行了改性,并在无热损伤的情况下提高了亲水性。
{"title":"Study of a full coaxial atmospheric pressure plasma jet device and its application to the modification of polytetrafluoroethylene","authors":"Dai Zhang, Shuchang Xu, Zhenguo Hou, Xijiang Chang, Zhonghang Wu, Zilan Xiong","doi":"10.1002/ppap.202400078","DOIUrl":"https://doi.org/10.1002/ppap.202400078","url":null,"abstract":"In this article, a compact and portable microwave atmospheric pressure plasma jet (MW‐APPJ) generator based on a coaxial transmission line resonator (CTLR) was proposed. Based on the electromagnetic simulations, the jet generator was designed as a tapered inner conductor structure that ensures plasma generation at low power. A self‐igniting argon (Ar) plasma jet of 10 mm length was generated at an input power of ~20 W and maintained at 2 W. Thanks to the high efficiency of the CTLR structure, plasmas of mixed reactive gases were also realized. Intrinsic plasma parameters and active species were determined using optical emission spectroscopy. Furthermore, the MW‐APPJ device was used to modify the polytetrafluoroethylene surface, and improvement of hydrophilicity was achieved without thermal damage.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":"25 1","pages":""},"PeriodicalIF":3.5,"publicationDate":"2024-07-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141546982","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Outside Front Cover: Plasma Process. Polym. 7/2024 封面外页:等离子工艺Polym.7/2024
IF 3.5 3区 物理与天体物理 Q2 PHYSICS, APPLIED Pub Date : 2024-07-05 DOI: 10.1002/ppap.202370039
{"title":"Outside Front Cover: Plasma Process. Polym. 7/2024","authors":"","doi":"10.1002/ppap.202370039","DOIUrl":"https://doi.org/10.1002/ppap.202370039","url":null,"abstract":"","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":"15 1","pages":""},"PeriodicalIF":3.5,"publicationDate":"2024-07-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141569946","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Vacuum‐ultraviolet‐photoionization chamber for the investigation of ion‐based surface treatment and thin film deposition at atmospheric pressure 用于研究常压下离子型表面处理和薄膜沉积的真空-超紫外-光离子化室
IF 3.5 3区 物理与天体物理 Q2 PHYSICS, APPLIED Pub Date : 2024-07-05 DOI: 10.1002/ppap.202400103
Kerstin Sgonina, Christian Schulze, Alexander Quack, Jan Benedikt
The vacuum‐ultraviolet‐photoionization chamber was constructed to allow controlled ion generation and well‐defined surface treatment with these ions at atmospheric pressure. It utilizes atmospheric helium plasma as a photon source and separates the ion generation from the plasma by an aerodynamic window. The ions are guided to the grounded substrate by a weak electric field, while the diffusive transport of neutrals is reduced by a helium gas flow along the substrate. Ionic species and the absolute ion flux were determined in the substrate region. Ion‐based thin film deposition using a precursor was investigated as a model process. The proposed system enables future investigation of e.g. the isolated interaction of ions with biological substrates.
真空-超紫外-光离子化室的建造是为了在大气压力下控制离子的产生并用这些离子进行明确的表面处理。它利用大气氦等离子体作为光子源,并通过空气动力学窗口将离子生成与等离子体分离。离子在弱电场的引导下到达接地基底,而中性物质的扩散传输则通过沿基底的氦气流来减少。测定了基底区域的离子种类和绝对离子通量。作为一个模型过程,研究了使用前驱体的离子薄膜沉积。所提出的系统有助于今后研究离子与生物基质之间的相互作用。
{"title":"Vacuum‐ultraviolet‐photoionization chamber for the investigation of ion‐based surface treatment and thin film deposition at atmospheric pressure","authors":"Kerstin Sgonina, Christian Schulze, Alexander Quack, Jan Benedikt","doi":"10.1002/ppap.202400103","DOIUrl":"https://doi.org/10.1002/ppap.202400103","url":null,"abstract":"The vacuum‐ultraviolet‐photoionization chamber was constructed to allow controlled ion generation and well‐defined surface treatment with these ions at atmospheric pressure. It utilizes atmospheric helium plasma as a photon source and separates the ion generation from the plasma by an aerodynamic window. The ions are guided to the grounded substrate by a weak electric field, while the diffusive transport of neutrals is reduced by a helium gas flow along the substrate. Ionic species and the absolute ion flux were determined in the substrate region. Ion‐based thin film deposition using a precursor was investigated as a model process. The proposed system enables future investigation of e.g. the isolated interaction of ions with biological substrates.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":"25 1","pages":""},"PeriodicalIF":3.5,"publicationDate":"2024-07-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141569948","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Dielectric barrier discharge plasma catalysis for diesel particulate matter oxidation: Optimization and synergistic differences in transition metal catalysts 用于柴油微粒物质氧化的介质阻挡放电等离子催化:过渡金属催化剂的优化和协同差异
IF 3.5 3区 物理与天体物理 Q2 PHYSICS, APPLIED Pub Date : 2024-07-05 DOI: 10.1002/ppap.202400073
Baoyong Ren, Wei Wang, Zuliang Wu, Jing Li, Erhao Gao, Jiali Zhu, Shuiliang Yao
Nonthermal plasma (NTP) enhanced catalytic oxidation of diesel particulate matter (DPM) is promising for applications. The synergistic effects of transition metal oxides (MOx, M = Mn, Cu, Ce, Fe, Co, Ti) and dielectric barrier discharge (DBD) plasma on DPM oxidation were investigated, and Fe2O3 showed the best synergistic effect. Cobalt‐doped iron oxide (Co–FeOx) displaying a spinel structure showed the best performance among M–FeOx (M = Co, Ce, Cu, Zn, Mn). The main intermediate product generated during the catalytic oxidation of DPM is monodentate carbonate. Under DBD plasma, a strong oxidizing intermediate ferrate (FeO42−) mainly produced at 100–200°C can promote the low‐temperature oxidation of DPM.
非热等离子体(NTP)增强催化氧化柴油微粒物质(DPM)的应用前景广阔。研究了过渡金属氧化物(MOx,M = Mn、Cu、Ce、Fe、Co、Ti)和介质阻挡放电(DBD)等离子体对 DPM 氧化的协同效应,其中 Fe2O3 的协同效应最佳。在 M-FeOx(M = Co、Ce、Cu、Zn、Mn)中,具有尖晶石结构的掺钴氧化铁(Co-FeOx)表现出最佳性能。DPM 催化氧化过程中产生的主要中间产物是单齿碳酸盐。在 DBD 等离子体下,主要在 100-200°C 时产生的强氧化性中间产物铁酸(FeO42-)可促进 DPM 的低温氧化。
{"title":"Dielectric barrier discharge plasma catalysis for diesel particulate matter oxidation: Optimization and synergistic differences in transition metal catalysts","authors":"Baoyong Ren, Wei Wang, Zuliang Wu, Jing Li, Erhao Gao, Jiali Zhu, Shuiliang Yao","doi":"10.1002/ppap.202400073","DOIUrl":"https://doi.org/10.1002/ppap.202400073","url":null,"abstract":"Nonthermal plasma (NTP) enhanced catalytic oxidation of diesel particulate matter (DPM) is promising for applications. The synergistic effects of transition metal oxides (MO<jats:sub><jats:italic>x</jats:italic></jats:sub>, <jats:italic>M</jats:italic> = Mn, Cu, Ce, Fe, Co, Ti) and dielectric barrier discharge (DBD) plasma on DPM oxidation were investigated, and Fe<jats:sub>2</jats:sub>O<jats:sub>3</jats:sub> showed the best synergistic effect. Cobalt‐doped iron oxide (Co–FeO<jats:sub><jats:italic>x</jats:italic></jats:sub>) displaying a spinel structure showed the best performance among <jats:italic>M</jats:italic>–FeO<jats:sub><jats:italic>x</jats:italic></jats:sub> (<jats:italic>M</jats:italic> = Co, Ce, Cu, Zn, Mn). The main intermediate product generated during the catalytic oxidation of DPM is monodentate carbonate. Under DBD plasma, a strong oxidizing intermediate ferrate (FeO<jats:sub>4</jats:sub><jats:sup>2−</jats:sup>) mainly produced at 100–200°C can promote the low‐temperature oxidation of DPM.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":"23 1","pages":""},"PeriodicalIF":3.5,"publicationDate":"2024-07-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141546980","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Issue Information: Plasma Process. Polym. 7/2024 发行信息:等离子工艺。Polym.7/2024
IF 3.5 3区 物理与天体物理 Q2 PHYSICS, APPLIED Pub Date : 2024-07-05 DOI: 10.1002/ppap.202370040
{"title":"Issue Information: Plasma Process. Polym. 7/2024","authors":"","doi":"10.1002/ppap.202370040","DOIUrl":"https://doi.org/10.1002/ppap.202370040","url":null,"abstract":"","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":"132 1","pages":""},"PeriodicalIF":3.5,"publicationDate":"2024-07-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141546985","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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Plasma Processes and Polymers
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