Eloïse Mestre, Inna Orel, Daniel Henze, Laura Chauvet, Sebastian Burhenn, Sébastien Dozias, Fabienne Brulé‐Morabito, Judith Golda, Claire Douat
Outside Front Cover: Plasma Processes & Polymers focuses on the interdisciplinary field of low temperature plasma science, covering both experimental and theoretical aspects of fundamental and applied research in materials science, physics, chemistry and engineering in the area of plasma sources and plasma-based treatments.
{"title":"Outside Front Cover: Plasma Process. Polym. 4/2024","authors":"Eloïse Mestre, Inna Orel, Daniel Henze, Laura Chauvet, Sebastian Burhenn, Sébastien Dozias, Fabienne Brulé‐Morabito, Judith Golda, Claire Douat","doi":"10.1002/ppap.202370033","DOIUrl":"https://doi.org/10.1002/ppap.202370033","url":null,"abstract":"<b>Outside Front Cover</b>: <i>Plasma Processes & Polymers</i> focuses on the interdisciplinary field of low temperature plasma science, covering both experimental and theoretical aspects of fundamental and applied research in materials science, physics, chemistry and engineering in the area of plasma sources and plasma-based treatments.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":"382 1","pages":""},"PeriodicalIF":3.5,"publicationDate":"2024-04-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140585507","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Ruihang Bai, Haiwei Zhu, Jiacheng Li, Dawei Liu, Xin Lu
Released in March 2023, GPT‐4 has shown remarkable proficiency in various scientific areas, including atmospheric pressure plasma research. The paper discusses how GPT‐4, supported by ScholarAI and Wolfram plugins, enhances research efficiency with its vast knowledge and inferencing skills. It focuses on plasma‐water‐based nitrogen fixation experiments, demonstrating GPT‐4's abilities in explanation, analysis, prediction, planning, and verification. The study also addresses challenges like interpreting non‐textual data and keeping pace with scientific advancements. It highlights GPT‐4's role in improving nitrogen fixation process efficiency, showcasing its utility in scientific analysis and decision‐making. The paper emphasizes the evolving role of AI in research and the need for the scientific community to adapt to the rise of more advanced AI systems.
{"title":"Exploring the potential of ChatGPT in enhancing atmospheric pressure plasma research techniques","authors":"Ruihang Bai, Haiwei Zhu, Jiacheng Li, Dawei Liu, Xin Lu","doi":"10.1002/ppap.202400028","DOIUrl":"https://doi.org/10.1002/ppap.202400028","url":null,"abstract":"Released in March 2023, GPT‐4 has shown remarkable proficiency in various scientific areas, including atmospheric pressure plasma research. The paper discusses how GPT‐4, supported by ScholarAI and Wolfram plugins, enhances research efficiency with its vast knowledge and inferencing skills. It focuses on plasma‐water‐based nitrogen fixation experiments, demonstrating GPT‐4's abilities in explanation, analysis, prediction, planning, and verification. The study also addresses challenges like interpreting non‐textual data and keeping pace with scientific advancements. It highlights GPT‐4's role in improving nitrogen fixation process efficiency, showcasing its utility in scientific analysis and decision‐making. The paper emphasizes the evolving role of AI in research and the need for the scientific community to adapt to the rise of more advanced AI systems.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":"43 1","pages":""},"PeriodicalIF":3.5,"publicationDate":"2024-04-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140585891","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Tijs Dekoster, Rita Vos, Karolien Jans, Willem Van Roy, Bernard Nisol, Bastien Duckert, Anja Vanleenhove, Annelies Delabie
Atmospheric pressure plasma deposition (APPD) of poly(ethylene oxide) (PEO)-like antifouling coatings provides an attractive way to reduce biofouling for reliable biosensor operation. Cold atmospheric pressure plasma jets are designed to operate in open air. This paper demonstrates the impact of open-air processing on the composition and properties of PEO-like coatings by APPD with vinyl ether precursors. The open-air environment inhibits polymerization as indicated by low deposition rates, oxygen incorporation in the coatings, and instability of the coatings in water. The composition and stability of the coatings improve by appropriate nozzle design and by deposition in an environment with lower air content. The resulting PEO-like coatings are stable and antifouling for an antibody solution and inhibit adhesion of human fibroblast cells.
{"title":"Impact of open-air processing on atmospheric pressure plasma deposition of poly(ethylene oxide) coatings for antifouling applications","authors":"Tijs Dekoster, Rita Vos, Karolien Jans, Willem Van Roy, Bernard Nisol, Bastien Duckert, Anja Vanleenhove, Annelies Delabie","doi":"10.1002/ppap.202400019","DOIUrl":"https://doi.org/10.1002/ppap.202400019","url":null,"abstract":"Atmospheric pressure plasma deposition (APPD) of poly(ethylene oxide) (PEO)-like antifouling coatings provides an attractive way to reduce biofouling for reliable biosensor operation. Cold atmospheric pressure plasma jets are designed to operate in open air. This paper demonstrates the impact of open-air processing on the composition and properties of PEO-like coatings by APPD with vinyl ether precursors. The open-air environment inhibits polymerization as indicated by low deposition rates, oxygen incorporation in the coatings, and instability of the coatings in water. The composition and stability of the coatings improve by appropriate nozzle design and by deposition in an environment with lower air content. The resulting PEO-like coatings are stable and antifouling for an antibody solution and inhibit adhesion of human fibroblast cells.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":"39 1","pages":""},"PeriodicalIF":3.5,"publicationDate":"2024-03-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140301408","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
We revisit one of the most used techniques for quantifying the aqueous OH radicals (OHaq) in plasma–liquid systems, the molecular probe method which obtains the [OHaq] by measuring a stable material formed through a rapid reaction between the molecular probe and the OHaq. In this study, we used disodium terephthalate (NaTA) as the molecular probe; the experimental results with a theoretical analysis suggest that to obtain the correct OHaq concentration, the concentration of the molecular probe should be greater than a certain value, which depends on the types of the plasma–liquid systems. However, this is not the case in most of the existing reports in which the NaTA is often much less than the requisite value.
{"title":"Revisiting the application of molecular probe diagnostics on quantifying aqueous OH radicals in plasma–liquid systems","authors":"Qingjin Tang, Mingjia Zhang, Binhong Wu, Xin Wang, Xin Tu, Kostya (Ken) Ostrikov, Linsheng Liu, Qiang Chen","doi":"10.1002/ppap.202300229","DOIUrl":"https://doi.org/10.1002/ppap.202300229","url":null,"abstract":"We revisit one of the most used techniques for quantifying the aqueous OH radicals (OH<sub>aq</sub>) in plasma–liquid systems, the molecular probe method which obtains the [OH<sub>aq</sub>] by measuring a stable material formed through a rapid reaction between the molecular probe and the OH<sub>aq</sub>. In this study, we used disodium terephthalate (NaTA) as the molecular probe; the experimental results with a theoretical analysis suggest that to obtain the correct OH<sub>aq</sub> concentration, the concentration of the molecular probe should be greater than a certain value, which depends on the types of the plasma–liquid systems. However, this is not the case in most of the existing reports in which the NaTA is often much less than the requisite value.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":"234 1","pages":""},"PeriodicalIF":3.5,"publicationDate":"2024-03-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140301602","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Namgun Kim, Whan Kyun Kim, Dongjun Shin, Jong Kyu Kim, Chan Min Lee, Kuk Han Yoon, Youngju Ko, Heeyeop Chae
A comparative study of argon (Ar) and helium (He) plasmas is conducted in quasi‐atomic layer etching (ALE) processes for silicon (Si). The ALE window is identified to be between 35 and 55 V for Ar and 25–45 V for He, with an etch per cycle of 6.0 Å/cycle for Ar and 7.5 Å/cycle for He. Thirty percent thicker chlorination layers are observed with Cl2/He ALE than with Cl2/Ar ALE in the chlorination step. The penetration depth of He ions is twice that of Ar ions, with a standard deviation of 4.5 times greater. This study demonstrates that He ions in the removal steps considerably affect the subsequent modification steps in Si ALE.
在硅 (Si) 的准原子层蚀刻 (ALE) 过程中，对氩 (Ar) 和氦 (He) 等离子体进行了比较研究。确定氩气的 ALE 窗口在 35 至 55 V 之间，氦气的 ALE 窗口在 25 至 45 V 之间，氩气的蚀刻周期为 6.0 Å/周期，氦气的蚀刻周期为 7.5 Å/周期。在氯化步骤中，Cl2/He ALE 比 Cl2/Ar ALE 的氯化层厚 30%。He 离子的穿透深度是 Ar 离子的两倍，标准偏差是 Ar 离子的 4.5 倍。这项研究表明，He 离子在去除步骤中对 Si ALE 的后续改性步骤有很大影响。
{"title":"Quasi‐atomic layer etching of silicon with surface chlorination and removal using Ar or He plasmas","authors":"Namgun Kim, Whan Kyun Kim, Dongjun Shin, Jong Kyu Kim, Chan Min Lee, Kuk Han Yoon, Youngju Ko, Heeyeop Chae","doi":"10.1002/ppap.202400016","DOIUrl":"https://doi.org/10.1002/ppap.202400016","url":null,"abstract":"A comparative study of argon (Ar) and helium (He) plasmas is conducted in quasi‐atomic layer etching (ALE) processes for silicon (Si). The ALE window is identified to be between 35 and 55 V for Ar and 25–45 V for He, with an etch per cycle of 6.0 Å/cycle for Ar and 7.5 Å/cycle for He. Thirty percent thicker chlorination layers are observed with Cl<jats:sub>2</jats:sub>/He ALE than with Cl<jats:sub>2</jats:sub>/Ar ALE in the chlorination step. The penetration depth of He ions is twice that of Ar ions, with a standard deviation of 4.5 times greater. This study demonstrates that He ions in the removal steps considerably affect the subsequent modification steps in Si ALE.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":"132 1","pages":""},"PeriodicalIF":3.5,"publicationDate":"2024-03-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140196910","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
A touchable plasma device based on coplanar dielectric barrier discharge (CDBD) is designed for hand hygiene. The biological safety is evaluated from the aspects of electrical and thermal properties. The peak value of current through the human body (~3.5 mA) and the highest device surface temperature (~40°C) are lower than the threshold of perception current and thermal damage temperature, respectively. The typical bacteria that are present on our hands in daily life Escherichia coli and Staphylococcus aureus are selected to verify the sterilization performance of the device. The results of human contact safety evaluation and sterilization test have demonstrated that this proposed CDBD device is reliable and user‐friendly for applications in hand hygiene.
{"title":"Characteristics and performance of an integrated coplanar dielectric barrier discharge device for hand hygiene","authors":"Shiyun Liu, Haosheng Jin, Yunyang Lu, Li Wan, Danhua Mei, Zhi Fang","doi":"10.1002/ppap.202400011","DOIUrl":"https://doi.org/10.1002/ppap.202400011","url":null,"abstract":"A touchable plasma device based on coplanar dielectric barrier discharge (CDBD) is designed for hand hygiene. The biological safety is evaluated from the aspects of electrical and thermal properties. The peak value of current through the human body (~3.5 mA) and the highest device surface temperature (~40°C) are lower than the threshold of perception current and thermal damage temperature, respectively. The typical bacteria that are present on our hands in daily life <jats:italic>Escherichia coli</jats:italic> and <jats:italic>Staphylococcus aureus</jats:italic> are selected to verify the sterilization performance of the device. The results of human contact safety evaluation and sterilization test have demonstrated that this proposed CDBD device is reliable and user‐friendly for applications in hand hygiene.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":"101 1","pages":""},"PeriodicalIF":3.5,"publicationDate":"2024-03-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140196907","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Martin Bellmann, Amelia Loesch‐Zhang, Dennis M. J. Möck, Jörn Appelt, Andreas Geissler, Wolfgang Viöl
Atmospheric pressure plasma polymerization represents a promising coating technology, addressing drawbacks of traditional processes (solvent use, multistep procedures, etc.) while enabling deposition of thin cross‐linked polymer layers with high contour fidelity. We address technological challenges with a novel plasma device that integrates multiple plasma source benefits and investigate the suitability of two plant‐based precursors, chia and tung oil, for plasma polymerization to hydrophobize glass and paper. Chia oil enables the deposition of thin, covalently bonded hydrophobic polymer layers. Such coatings have diverse applications especially inside the paper industry, where water repellents in the form of internal and surface sizing have always been an essential functionalization step. Using bio‐based precursors and reducing extra chemicals contributes to substituting fossil‐based or harmful substances.
{"title":"Hydrophobic glass and paper coatings based on plasma polymerized vegetable oils using a novel atmospheric pressure plasma concept","authors":"Martin Bellmann, Amelia Loesch‐Zhang, Dennis M. J. Möck, Jörn Appelt, Andreas Geissler, Wolfgang Viöl","doi":"10.1002/ppap.202300224","DOIUrl":"https://doi.org/10.1002/ppap.202300224","url":null,"abstract":"Atmospheric pressure plasma polymerization represents a promising coating technology, addressing drawbacks of traditional processes (solvent use, multistep procedures, etc.) while enabling deposition of thin cross‐linked polymer layers with high contour fidelity. We address technological challenges with a novel plasma device that integrates multiple plasma source benefits and investigate the suitability of two plant‐based precursors, chia and tung oil, for plasma polymerization to hydrophobize glass and paper. Chia oil enables the deposition of thin, covalently bonded hydrophobic polymer layers. Such coatings have diverse applications especially inside the paper industry, where water repellents in the form of internal and surface sizing have always been an essential functionalization step. Using bio‐based precursors and reducing extra chemicals contributes to substituting fossil‐based or harmful substances.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":"3 1","pages":""},"PeriodicalIF":3.5,"publicationDate":"2024-02-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139953573","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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