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Frozen Differential Scattering in Reconfigurable Complex Media 可重构复杂介质中的冻结微分散射
IF 11 1区 物理与天体物理 Q1 OPTICS Pub Date : 2026-01-25 DOI: 10.1002/lpor.202502660
Philipp del Hougne
The sensitivity of transmission to the input wavefront is a hallmark feature of complex media and the basis for wavefront shaping techniques. Yet, intriguing special cases exist in which the output wavefront is “frozen” (agnostic to the input wavefront). This happens when special structure in the complex medium collapses the rank of its transmission matrix to unity. Here, an analogous, more universal phenomenon for differential scattering (including reflection) in reconfigurable complex media is demonstrated. Specifically, for a localized perturbation, the differential scattering matrix of any complex medium has rank one. One consequence is that the differential output signal is coherent irrespective of the input wavefront's coherence. Moreover, the thermal noise emitted into the frozen differential output mode has a structure that can be exploited for thermal noise management. Frozen differential scattering is experimentally evidenced in a rich‐scattering wireless link parametrized by a programmable meta‐atom. “Customized freezing” is achieved by optimizing the configuration of programmable meta‐atoms that parametrize the wireless link, as envisioned for 6G networks. Moreover, particular shapes of the frozen differential output mode are imposed, and a signal‐to‐thermal‐noise ratio is maximized. Potential applications include filtering and stabilization of differential wavefronts, as well as imaging, sensing, and communications in complex media.
传输对输入波前的灵敏度是复杂介质的一个显著特征,也是波前整形技术的基础。然而,存在一些有趣的特殊情况,其中输出波前是“冻结”的(与输入波前无关)。当复杂介质中的特殊结构将其传输矩阵的秩坍缩为一时,就会发生这种情况。这里,一个类似的,更普遍的现象,微分散射(包括反射)在可重构的复杂介质被证明。具体地说,对于局部扰动,任何复杂介质的微分散射矩阵都是一级的。一个结果是,不管输入波前的相干性如何,差分输出信号都是相干的。此外,发射到冻结差分输出模式的热噪声具有可用于热噪声管理的结构。在可编程元原子参数化的富散射无线链路中,实验证明了冻结微分散射。“定制冻结”是通过优化可编程元原子的配置来实现的,这些元原子可以参数化无线链路,正如6G网络所设想的那样。此外,特殊形状的冻结差分输出模式被施加,信号-热-噪声比被最大化。潜在的应用包括差分波前的滤波和稳定,以及复杂介质中的成像、传感和通信。
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引用次数: 0
6G Single-Pixel Meta-Encryption with Ultra-Robustness 具有超鲁棒性的6G单像素元加密
IF 11 1区 物理与天体物理 Q1 OPTICS Pub Date : 2026-01-24 DOI: 10.1002/lpor.202502566
Bo Yu, Yifei Xu, Wenwei Liu, Zhancheng Li, Yongliang Liu, Yuanshuo Liu, Qi Liu, Hua Cheng, Shuqi Chen
As a promising carrier for 6G communication, terahertz waves are particularly susceptible to eavesdropping and transmission sabotage during wireless propagation. However, the existing terahertz encryption schemes are challenging to intrinsically protect the wireless transmission, whose encryption systems are also bulky and hard to integrate. Here, to meet the requirement of confidential 6G wireless links, we propose a single-pixel meta-encryption scheme based on statistical optics empowered Hadamard metasurfaces, which can achieve strong security, key tolerance, and ultra-robustness. The metasurfaces are prepared by 3D printing technology for simple, rapid, and low-cost fabrication. By modulating terahertz waves with Hadamard metasurfaces and combining single-pixel imaging, the scheme achieves a key space size of 1090 and 31% key tolerance. Experimental results show that even if 97% of the optical path is severely blocked or there are 30% errors in the key, the transmitted images can be reconstructed. Our approach combines single-pixel imaging with terahertz metasurfaces to address security challenges in future wireless communication, paving the way for secure, robust, and efficient encryption frameworks applicable to communication networks from 6G to XG.
太赫兹波作为一种很有前景的6G通信载波,在无线传播过程中特别容易受到窃听和传输破坏。然而,现有的太赫兹加密方案难以从本质上保护无线传输,其加密系统体积庞大且难以集成。针对保密6G无线链路的需求,本文提出了一种基于统计光学增强Hadamard元表面的单像素元加密方案,该方案具有较强的安全性、密钥容忍度和超鲁棒性。这些超表面是通过3D打印技术制备的,制造简单、快速、低成本。该方案利用Hadamard超表面调制太赫兹波,结合单像素成像,实现了1090的密钥空间大小和31%的密钥容差。实验结果表明,即使97%的光路被严重阻挡或密钥有30%的误差,传输的图像也能被重建。我们的方法将单像素成像与太赫兹元表面相结合,以解决未来无线通信中的安全挑战,为适用于6G到XG通信网络的安全、稳健和高效的加密框架铺平道路。
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引用次数: 0
Laser‐Scanning Infrared‐Raman‐Fluorescence Microscopy for Metabolic Flux Imaging in Living Organisms 激光-扫描-红外-拉曼-荧光显微镜用于生物代谢通量成像
IF 11 1区 物理与天体物理 Q1 OPTICS Pub Date : 2026-01-24 DOI: 10.1002/lpor.202502715
Siming Wang, Pengcheng Fu, Hyeon Jeong Lee, Delong Zhang
Comprehensive observation of chemical dynamics in living systems is crucial for deciphering metabolic processes, yet current techniques force a compromise between molecular specificity and imaging throughput. This work presents laser‐scanning in situ pump‐probe infrared (IR) and Raman excitation (LS‐INSPIRE) microscopy, a real‐time multimodal imaging platform that simultaneously captures mid‐IR photothermal (MIP), stimulated Raman scattering (SRS), and two‐photon excited fluorescence (TPEF) signals within a single scan. A custom catoptric relay paired with a reverse‐Cassegrain objective yields chromatic‐aberration‐free imaging from UV to mid‐IR, delivering pixel‐registered, multichannel data across a large field of view. The capabilities are demonstrated by tracking deuterium incorporation into lipids in live cells, quantitatively mapping molecular markers during embryogenesis, and uncovering neural development and lipid metabolism mechanisms in Caenorhabditis elegans . LS‐INSPIRE transcends the longstanding trade‐off between molecular breadth and dynamic acquisition, establishing a versatile paradigm for chemical imaging in biology, medicine, and materials science.
全面观察生命系统中的化学动力学对于破译代谢过程至关重要,但目前的技术迫使分子特异性和成像吞吐量之间的妥协。这项工作提出了激光扫描原位泵浦探针红外(IR)和拉曼激发(LS - INSPIRE)显微镜,这是一个实时多模态成像平台,可以在一次扫描中同时捕获中红外光热(MIP)、受激拉曼散射(SRS)和双光子激发荧光(TPEF)信号。一个定制的反射继电器与一个反向卡塞格伦物镜配对,产生从紫外到中红外的无色差成像,在大视场内提供像素注册的多通道数据。通过跟踪活细胞中氘与脂质的结合,定量绘制胚胎发生过程中的分子标记,揭示秀丽隐杆线虫的神经发育和脂质代谢机制,证明了这种能力。LS‐INSPIRE超越了分子宽度和动态采集之间的长期权衡,为生物、医学和材料科学中的化学成像建立了一个通用的范例。
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引用次数: 0
Polarization-Controlled Tunable Beam Shift via Pancharatnam-Berry Phase Gradients in Photonic Crystal Slabs 光子晶体板中基于Pancharatnam-Berry相位梯度的偏振控制可调谐光束移
IF 11 1区 物理与天体物理 Q1 OPTICS Pub Date : 2026-01-24 DOI: 10.1002/lpor.202502419
Riwa Hao, Jiale Chen, Zi-xin Zhou, Yan-qing Lu, Jun-long Kou
When a light beam hits the interface between different media, the positions of the refracted and reflected beams deviate from those predicted by traditional geometric optics, resulting in beam shifts phenomenon. Beam shifts and manipulation technologies play an indispensable role in precision measurement, biochemical sensing, optical switching, and photodetection. Traditional beam shift phenomena, such as Goos-Hänchen shifts and Imbert-Fedorov shifts, typically require oblique incidence conditions, with the shift magnitudes often limited to the nanoscale, significantly constraining integration and reconfigurability. Moreover, these minute shifts are susceptible to environmental noise, making it challenging to meet the demands for large-range, high-sensitivity beam shifts. Photonic crystals offer strong light field manipulation capabilities and support a variety of polarization singularity configurations, including bound states in the continuum and circularly polarized singularities, providing a novel platform for the generation and control of beam shifts. This study leverages the geometric phase configuration to develop a multidimensional control framework for Imbert-Fedorov shifts based on photonic crystal slabs, achieving continuous tuning of beam shifts on the order of four wavelengths for a normal incident beam. This approach establishes a new paradigm for high-sensitivity optical sensing, beam manipulation, and reconfigurable photonic switching applications.
当光束到达不同介质的界面时,折射和反射光束的位置会偏离传统几何光学预测的位置,从而产生光束偏移现象。光束移位和操纵技术在精密测量、生化传感、光开关和光探测等领域发挥着不可或缺的作用。传统的光束移位现象,如Goos-Hänchen移位和Imbert-Fedorov移位,通常需要斜入射条件,移位幅度通常限制在纳米尺度,严重限制了集成和可重构性。此外,这些微小的偏移容易受到环境噪声的影响,这使得满足大范围、高灵敏度光束偏移的要求具有挑战性。光子晶体具有很强的光场操纵能力,支持多种偏振奇点构型,包括连续介质和圆偏振奇点的束缚态,为光束位移的产生和控制提供了一个新的平台。本研究利用几何相位配置开发了基于光子晶体板的Imbert-Fedorov位移的多维控制框架,实现了正常入射光束在四个波长量级上的连续调谐。这种方法为高灵敏度光学传感、光束操纵和可重构光子开关应用建立了新的范例。
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引用次数: 0
Beam Splitter With Arbitrary Splitting Ratio by Valley Edge Mode 分束器与任意分裂比的山谷边缘模式
IF 11 1区 物理与天体物理 Q1 OPTICS Pub Date : 2026-01-24 DOI: 10.1002/lpor.202502733
Guochao Wei, Jin Li, Beibei Wang, Zhenzhen Liu, Wei Zhu, Kang Du, Xiaoxi Zhou, Junjun Xiao, Shengxiang Wang
Photonic crystal beam splitters based on coupled topological interface states (TISs) circumvent the long coupling distances of conventional waveguides. However, their splitting ratio is quantized, limited by the discrete coupling lengths imposed by the lattice period, and their operation bandwidth is narrow due to the phase-matching requirement. To overcome these limitations, we propose and experimentally demonstrate a topological beam splitter composed of three intersecting interface channels coupled through a heterostructure. By engineering the symmetry-breaking parameters of the heterostructure, we achieve continuous control over the TIS mode profiles and the inter-channel coupling strength. This enables continuous tuning of the beam-splitting ratio, defined as the normalized field distribution between the two output ports, from 0:100 to 100:0. Crucially, the device bandwidth is determined by the intrinsic bandwidth of the TISs, which is significantly broader than that of phase-matched coupled waveguides. Our design provides a versatile platform for broadband, arbitrarily tunable beam splitting, promising advancements in wavelength-division multiplexing, on-chip optical communications, and topological lasers.
基于耦合拓扑界面态的光子晶体分束器克服了传统波导的长耦合距离。然而,它们的分裂比是量子化的,受晶格周期施加的离散耦合长度的限制,并且由于相位匹配的要求,它们的操作带宽很窄。为了克服这些限制,我们提出并实验证明了一种由三个相交的界面通道通过异质结构耦合组成的拓扑分束器。通过设计异质结构的对称破断参数,我们实现了对TIS模式轮廓和信道间耦合强度的连续控制。这使得连续调整分束比,定义为两个输出端口之间的归一化场分布,从0:100到100:0。至关重要的是,器件带宽由TISs的固有带宽决定,它比相位匹配耦合波导的固有带宽要宽得多。我们的设计为宽带、任意可调波束分裂提供了一个通用平台,在波分复用、片上光通信和拓扑激光器方面有前景的进步。
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引用次数: 0
Lithography Alignment Technologies: A Comprehensive Review of Advances and Challenges 光刻对准技术:进步与挑战的综合综述
IF 11 1区 物理与天体物理 Q1 OPTICS Pub Date : 2026-01-24 DOI: 10.1002/lpor.202501998
Feifan Xu, Jin Zhang, Weishi Li, Chengliang Pan, Haojie Xia
Lithography alignment, a core process in micro–nano fabrication, has evolved from the micron scale to the nanometer and even sub‐nanometer domain. However, this advancement has introduced unprecedented challenges related to precision, speed, and reliability. During multilayer pattern exposure, lithography alignment is crucial for achieving high‐resolution and accurate pattern transfer, which directly influences device performance and yield, ultimately determining the overall effectiveness and efficiency of the lithography process. This review provides a comprehensive overview of the development and key technological advancements in lithography alignment. First, recent breakthroughs in alignment mark optimization, signal enhancement, and compensation for asymmetric deformation of the mark are discussed. Next, the evolution of pre‐alignment, coarse alignment, and fine alignment technologies is outlined, including a systematic comparison of the alignment strategies adopted by major lithography machine manufacturers, such as ASML, Nikon, and Canon. Subsequently, the principles, implementations, advantages, and challenges of core technologies, including interferometric alignment, image‐processing‐based alignment, and grating‐modulated alignment, are reviewed. Additionally, the alignment requirements for advanced lithography technologies are discussed. Lastly, the open challenges associated with lithography alignment are highlighted, along with potential future trends and research directions. This review contributes to the literature by consolidating recent advancements and critically comparing current methodologies for lithography alignment.
光刻对准是微纳制造的核心工艺,已经从微米级发展到纳米级甚至亚纳米级。然而,这一进步在精度、速度和可靠性方面带来了前所未有的挑战。在多层模式曝光过程中,光刻对准对于实现高分辨率和精确的模式转移至关重要,它直接影响器件性能和良率,最终决定光刻工艺的整体有效性和效率。本文综述了光刻对准技术的发展和关键技术进展。首先,讨论了对准标记优化、信号增强和标记不对称变形补偿方面的最新进展。接下来,概述了预校准、粗校准和精细校准技术的发展,包括对主要光刻机制造商(如ASML、尼康和佳能)采用的校准策略的系统比较。随后,综述了干涉对准、基于图像处理的对准和光栅调制对准等核心技术的原理、实现、优势和挑战。此外,还讨论了先进光刻技术的对准要求。最后,重点介绍了光刻校准相关的开放挑战,以及潜在的未来趋势和研究方向。这篇综述通过巩固最近的进展和批判性地比较当前的光刻校准方法来促进文献。
{"title":"Lithography Alignment Technologies: A Comprehensive Review of Advances and Challenges","authors":"Feifan Xu, Jin Zhang, Weishi Li, Chengliang Pan, Haojie Xia","doi":"10.1002/lpor.202501998","DOIUrl":"https://doi.org/10.1002/lpor.202501998","url":null,"abstract":"Lithography alignment, a core process in micro–nano fabrication, has evolved from the micron scale to the nanometer and even sub‐nanometer domain. However, this advancement has introduced unprecedented challenges related to precision, speed, and reliability. During multilayer pattern exposure, lithography alignment is crucial for achieving high‐resolution and accurate pattern transfer, which directly influences device performance and yield, ultimately determining the overall effectiveness and efficiency of the lithography process. This review provides a comprehensive overview of the development and key technological advancements in lithography alignment. First, recent breakthroughs in alignment mark optimization, signal enhancement, and compensation for asymmetric deformation of the mark are discussed. Next, the evolution of pre‐alignment, coarse alignment, and fine alignment technologies is outlined, including a systematic comparison of the alignment strategies adopted by major lithography machine manufacturers, such as ASML, Nikon, and Canon. Subsequently, the principles, implementations, advantages, and challenges of core technologies, including interferometric alignment, image‐processing‐based alignment, and grating‐modulated alignment, are reviewed. Additionally, the alignment requirements for advanced lithography technologies are discussed. Lastly, the open challenges associated with lithography alignment are highlighted, along with potential future trends and research directions. This review contributes to the literature by consolidating recent advancements and critically comparing current methodologies for lithography alignment.","PeriodicalId":204,"journal":{"name":"Laser & Photonics Reviews","volume":"7 1","pages":""},"PeriodicalIF":11.0,"publicationDate":"2026-01-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"146042940","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":1,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Generation of Femtosecond Optical Vortices Entanglement 飞秒光涡旋纠缠的产生
IF 11 1区 物理与天体物理 Q1 OPTICS Pub Date : 2026-01-24 DOI: 10.1002/lpor.202501983
Hongbo Liu, Yanxiang Xie, Jiaming Li, Yunhao Zhang, Rongguo Yang, Kui Liu, Jiangrui Gao
Femtosecond optical vortices feature helical phase fronts within their transverse modes and also display a fixed phase difference among the longitudinal modes. This multi‐dimensional manipulation of femtosecond laser pulses forms a fundamental basis for various applications. While multiple techniques exist for generating traditional femtosecond optical vortices, a notable void persists in the domain of continuous‐variable entanglement. This letter introduces the demonstration of femtosecond optical vortices entanglement accomplished through the synchronously pumped optical parametric oscillator, which is designed with a nonplanar ring cavity to compensate for astigmatism without introducing additional dispersion. The generated light field exhibits both temporal multimode structures, manifested as supermodes in the femtosecond optical frequency comb, and spatial multimode structures carrying orbital angular momentum. Orbital angular momentum entanglement is clearly observed in the first three‐order supermodes. The femtosecond optical vortices entanglement, serving as a precursor of potential, holds the crucial key to unlocking enhanced capabilities in advanced information processing, securing quantum communication, and even paving the way for the realization of multi‐parameter quantum metrology.
飞秒光学涡旋在其横向模式内具有螺旋相位前沿,在纵向模式之间也表现出固定的相位差。这种飞秒激光脉冲的多维操作为各种应用奠定了基础。虽然有多种技术可以产生传统的飞秒光学涡流,但在连续变量纠缠领域仍然存在明显的空白。本文介绍了通过同步泵浦光参量振荡器实现飞秒光涡旋纠缠的演示,该振荡器设计了一个非平面环形腔来补偿像散而不引入额外的色散。所产生的光场既具有时间多模结构,表现为飞秒光学频率梳中的超模,又具有携带轨道角动量的空间多模结构。轨道角动量纠缠在前三阶超模中被清楚地观察到。飞秒光涡旋纠缠,作为势能的先驱,拥有解锁高级信息处理增强能力的关键,确保量子通信,甚至为实现多参数量子计量铺平道路。
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引用次数: 0
Quasi‐Bound States in the Continuum Calibrated Broadband Metasurface Enhanced Mid‐Infrared Absorption Spectroscopy 连续校准宽带超表面增强中红外吸收光谱中的准束缚态
IF 11 1区 物理与天体物理 Q1 OPTICS Pub Date : 2026-01-24 DOI: 10.1002/lpor.202502667
Shiqing Dong, Qian Wang, Dan Yang, Wenbo Duan, Yanan He, Hongchao Liu, Kesheng Shen, Chao Dong, Zunlue Zhu, Hai Lu
Infrared metasurfaces featuring artificially designed structures provide a versatile platform for tailoring sensor properties, holding great promise for next‐generation broadband surface‐enhanced mid‐infrared absorption spectroscopy. In particular, the over‐coupled metasurfaces provide broader sensing bandwidths with a simpler fabrication compared to under‐coupled pixelated metasurfaces. However, over‐coupled metasurfaces has encountered several technical bottlenecks, particularly in the numerical simulation of electromagnetically induced absorption mechanisms and in the extraction of broadband signal. Herein, we propose a metasurface design based on extinction property analysis that modularly controls quasi‐bound states in the continuum and dual over‐coupled resonances to enable trace detection and spectral fingerprinting identification, respectively. The quasi‐bound states in the continuum with surface sensitivity of 0.79 nm/nm serves as an intrinsic calibration reference, delivering a sharp spectral marker for high‐fidelity signal retrieval. The calibrated framework allows accurate retrieval of broadband vibrational signatures, while the over‐coupled resonances collectively amplify molecular absorption from 1800 to 1000 cm −1 . Our results demonstrate that extinction‐based analysis offers superior frequency resolution for visualizing the coupling between resonators and molecules. It underscores the potential of dual over‐coupled metasurfaces for identifying complex analytes such as microplastics and biomarkers, paving the way for advanced mid‐infrared sensing platforms.
具有人工设计结构的红外超表面为定制传感器特性提供了一个多功能平台,为下一代宽带表面增强中红外吸收光谱提供了巨大的希望。特别是,与欠耦合的像素化元表面相比,过耦合的元表面提供了更宽的传感带宽和更简单的制造。然而,超耦合超表面遇到了几个技术瓶颈,特别是在电磁感应吸收机制的数值模拟和宽带信号的提取方面。在此,我们提出了一种基于消光特性分析的超表面设计,该设计模块化地控制连续体和双超耦合共振中的准束缚态,分别实现痕量检测和光谱指纹识别。连续体中的准束缚态具有0.79 nm/nm的表面灵敏度,可作为内在校准参考,为高保真度信号检索提供清晰的光谱标记。校准的框架允许精确检索宽带振动特征,而过耦合共振共同放大分子吸收从1800到1000 cm−1。我们的研究结果表明,基于消光的分析为可视化谐振器和分子之间的耦合提供了优越的频率分辨率。它强调了双超耦合超表面在识别复杂分析物(如微塑料和生物标志物)方面的潜力,为先进的中红外传感平台铺平了道路。
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引用次数: 0
Omnidirectional‐Incidence On‐Chip Meta‐Optics Enabling Massive 3D Holographic Storage 全向入射芯片元光学实现大规模3D全息存储
IF 11 1区 物理与天体物理 Q1 OPTICS Pub Date : 2026-01-23 DOI: 10.1002/lpor.202502562
Cheng Yi, Chao Xu, Shuai Wan, Zejing Wang, Zirui Zhao, Xinglong Li, Runlong Rao, Wei Dai, Zhike He, Zhongyang Li, Yangyang Shi
With the ever‐increasing demand for high‐capacity and chip‐integrated information storage, on‐chip metasurface‐enabled optical holography offers a promising solution by manipulating various optical parameters. However, the incident azimuthal angle, an essential optical degree of freedom (DoF), remains underexplored and limited due to the lack of arbitrary direction‐decoupled and effective phase‐encoding mechanisms, constraining both the multiplexing capacity and channel scalability. Here, we propose and experimentally demonstrate an omnidirectional‐incidence on‐chip metasurface for massive 3D meta‐holographic storage. Specifically, by leveraging angular‐independent detour phase modulation together with the conjugate relation of optical responses under opposite on‐chip illuminations, we break the conjugate constraint and extend the azimuthal multiplexing to 360° angular space, achieving full utilization of arbitrary angular DoF. As a proof of concept, up to 32‐channel multiplane 3D meta‐holograms are successfully reconstructed by sequentially switching the azimuthal angles to 0°, 45°, 90°, 135°, 180°, 225°, 270°, and 315°, thereby surpassing typical azimuthal coding strategies. Moreover, our arbitrary azimuthal encoding for massive information storage relies solely on the displacements of identical meta‐atoms, simplifying design complexity and improving the fabrication robustness. We envision that the proposed omnidirectional azimuthal‐multiplexed on‐chip metasurfaces represent a powerful platform for high‐density optical information storage, high‐fidelity 3D displays, and secure optical encryption.
随着对高容量和芯片集成信息存储的需求不断增长,芯片上的超表面光学全息技术通过控制各种光学参数提供了一个很有前途的解决方案。然而,由于缺乏任意方向解耦和有效的相位编码机制,入射方位角(基本的光学自由度)仍然没有得到充分的研究和限制,从而限制了多路复用容量和信道可扩展性。在这里,我们提出并实验证明了一种用于大规模3D元全息存储的全向入射片上超表面。具体而言,通过利用与角度无关的绕行相位调制以及相反片上光照下光响应的共轭关系,我们打破了共轭约束,将方位复用扩展到360°角空间,实现了任意角自由度的充分利用。作为概念验证,通过将方位角依次切换为0°、45°、90°、135°、180°、225°、270°和315°,成功重建了多达32通道的多平面3D元全息图,从而超越了典型的方位角编码策略。此外,我们对海量信息存储的任意方位编码仅依赖于相同元原子的位移,从而简化了设计复杂性并提高了制造的鲁棒性。我们设想所提出的全向方位复用片上超表面为高密度光学信息存储、高保真3D显示和安全光学加密提供了一个强大的平台。
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引用次数: 0
Ultrafast Laser Two‐Photon Lithography for Metasurface Engineering: Advances in Fabrication and Photonic Applications 超快激光双光子光刻技术在超表面工程中的应用进展
IF 11 1区 物理与天体物理 Q1 OPTICS Pub Date : 2026-01-23 DOI: 10.1002/lpor.202502914
Mohamed Hassan Eisa, Ali Zia, Zainuriah Hassan, Sadaf Saeed
Ultrafast laser two‐photon lithography (TPL) has revolutionized micro/nanofabrication, enabling the creation of intricate 3D structures with sub‐diffraction‐limited resolution. The integration of TPL with metasurface engineering has unlocked new frontiers in photonic device design, offering unprecedented control over light‐matter interactions at the nanoscale. This review delves into the cutting‐edge advancements in TPL as applied to the fabrication of metasurfaces, which are thin, artificially structured materials with unique optical properties. We explore TPL's unparalleled precision of TPL, which allows the creation of complex metasurface geometries, facilitating breakthroughs in diverse applications, including high‐efficiency diffractive optics, next‐generation imaging systems, quantum optics, and dynamic tunable photonic devices. Key challenges, such as material limitations, process optimization, and scalability, are discussed along with promising solutions and future directions for overcoming these barriers. Furthermore, the potential of TPL to drive innovation in areas such as optical sensing, energy harvesting, and quantum information processing is critically analyzed. Through this comprehensive review, we highlight the transformative role of ultrafast laser two‐photon lithography in advancing metasurface technologies, positioning it as a cornerstone of the future of photonics.
超快激光双光子光刻技术(TPL)彻底改变了微/纳米制造,使亚衍射限制分辨率的复杂3D结构得以创建。TPL与超表面工程的结合为光子器件设计开辟了新的领域,在纳米尺度上对光物质相互作用提供了前所未有的控制。这篇综述深入研究了TPL在超表面制造方面的前沿进展,超表面是一种具有独特光学特性的薄的人工结构材料。我们探索了TPL无与伦比的精度,它允许创建复杂的超表面几何形状,促进各种应用的突破,包括高效衍射光学,下一代成像系统,量子光学和动态可调谐光子器件。关键的挑战,如材料限制、工艺优化和可扩展性,将与有希望的解决方案和克服这些障碍的未来方向一起讨论。此外,对TPL在光学传感、能量收集和量子信息处理等领域推动创新的潜力进行了批判性分析。通过这篇全面的综述,我们强调了超快激光双光子光刻在推进超表面技术方面的变革性作用,将其定位为光子学未来的基石。
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引用次数: 0
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