Pub Date : 2024-08-23DOI: 10.1016/j.susc.2024.122582
Asa Kiuchi , Yaoto Eda , Yousoo Kim , Tomoko K. Shimizu
Understanding the structure of catalyst surfaces with adsorbed molecules is key to improving catalyst design. Scanning tunneling microscopy (STM) allows the observation of adsorption states and sites and provides insights into diffusion and desorption processes; however, the presence of multiple types of molecules on the surface presents challenges such as the identification of species and verification of reaction progress, particularly at room temperature or higher. In this study, we develop a protocol for the height classification analysis of STM images using the Watershed algorithm. This method is applied to a system involving the co-adsorption of H2O and CO on the Fe3O4(111) surface, which represents the beginning of the water-gas shift reaction. Water molecules and dissociated OH species were identified in STM images of the Fe3O4(111) surface following the adsorption of water. Furthermore, gradual changes in the types of surface species were observed upon exposure of the surface to CO, indicating reaction progression. Our observations suggest that CO may react with molecular water rather than with dissociated OH on Fe sites. Despite its simplicity, the height classification analysis effectively identifies changes in the adsorbates on the catalyst surface. This method can be extended to other catalyst surfaces with adsorbed gasses.
了解带有吸附分子的催化剂表面结构是改进催化剂设计的关键。扫描隧道显微镜(STM)可以观察吸附状态和吸附位点,并深入了解扩散和解吸过程;然而,表面存在多种类型的分子会带来一些挑战,如物种识别和反应进展验证,尤其是在室温或更高温度下。在本研究中,我们利用分水岭算法制定了 STM 图像高度分类分析协议。该方法适用于涉及 Fe3O4(111)表面上 H2O 和 CO 共吸附的系统,该系统代表了水-气转移反应的开始。水被吸附后,Fe3O4(111) 表面的 STM 图像中出现了水分子和离解的 OH 物种。此外,在将表面暴露于 CO 时,还观察到表面物种类型的逐渐变化,这表明反应正在进行。我们的观察结果表明,CO 可能与分子水而不是与铁位点上离解的 OH 发生反应。尽管高度分类分析很简单,但它能有效识别催化剂表面吸附剂的变化。这种方法可以推广到其他有吸附气体的催化剂表面。
{"title":"Classification of adsorbates in scanning tunneling microscopy images of Fe3O4(111) surfaces exposed to water and carbon monoxide","authors":"Asa Kiuchi , Yaoto Eda , Yousoo Kim , Tomoko K. Shimizu","doi":"10.1016/j.susc.2024.122582","DOIUrl":"10.1016/j.susc.2024.122582","url":null,"abstract":"<div><p>Understanding the structure of catalyst surfaces with adsorbed molecules is key to improving catalyst design. Scanning tunneling microscopy (STM) allows the observation of adsorption states and sites and provides insights into diffusion and desorption processes; however, the presence of multiple types of molecules on the surface presents challenges such as the identification of species and verification of reaction progress, particularly at room temperature or higher. In this study, we develop a protocol for the height classification analysis of STM images using the Watershed algorithm. This method is applied to a system involving the co-adsorption of H<sub>2</sub>O and CO on the Fe<sub>3</sub>O<sub>4</sub>(111) surface, which represents the beginning of the water-gas shift reaction. Water molecules and dissociated OH species were identified in STM images of the Fe<sub>3</sub>O<sub>4</sub>(111) surface following the adsorption of water. Furthermore, gradual changes in the types of surface species were observed upon exposure of the surface to CO, indicating reaction progression. Our observations suggest that CO may react with molecular water rather than with dissociated OH on Fe sites. Despite its simplicity, the height classification analysis effectively identifies changes in the adsorbates on the catalyst surface. This method can be extended to other catalyst surfaces with adsorbed gasses.</p></div>","PeriodicalId":22100,"journal":{"name":"Surface Science","volume":"750 ","pages":"Article 122582"},"PeriodicalIF":2.1,"publicationDate":"2024-08-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S003960282400133X/pdfft?md5=a521c86ee1346871851784985be86359&pid=1-s2.0-S003960282400133X-main.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142088441","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-22DOI: 10.1016/j.susc.2024.122580
Yingying Wang , Jiayi Guo , Chenqi Bai , Lina Xu , Hongping Xiao , Qian Shi , Yihong Ding , Aidong Li , Guoyong Fang
As a nanofabrication technology, atomic layer deposition (ALD) has been widely used in the fields of displays, microelectronics, nanotechnology, catalysis, energy and coatings. It demonstrates excellent conformality, large-area uniformity and precise control of the sub-monolayer film. Al2O3 ALD using trimethylaluminum (TMA) and water (H2O) as precursors is the most ideal ALD model system. In this work, the reactions of TMA and H2O with the surface have been investigated using density functional theory (DFT) calculations in order to obtain more information on the reaction mechanism of the complicated H2O-based ALD of Al2O3. In the TMA reaction, the methyl ligands can be eliminated and new Al-O bonds can be formed via ligand exchange reactions. In the H2O reaction, the methyl ligand on the surface can be further eliminated and new AlO bonds can be formed. Meanwhile, the coupling reactions between the surface methyl and hydroxyl groups can further form new AlO bonds and release CH4 or H2O to densify the Al2O3 film. These complicated reaction mechanisms of Al2O3 H2O-based ALD can provide theoretical guidance for the precursor design and ALD growth of other oxides and aluminum-based compounds.
{"title":"H2O-based atomic layer deposition mechanism of aluminum oxide using trimethylaluminum","authors":"Yingying Wang , Jiayi Guo , Chenqi Bai , Lina Xu , Hongping Xiao , Qian Shi , Yihong Ding , Aidong Li , Guoyong Fang","doi":"10.1016/j.susc.2024.122580","DOIUrl":"10.1016/j.susc.2024.122580","url":null,"abstract":"<div><p>As a nanofabrication technology, atomic layer deposition (ALD) has been widely used in the fields of displays, microelectronics, nanotechnology, catalysis, energy and coatings. It demonstrates excellent conformality, large-area uniformity and precise control of the sub-monolayer film. Al<sub>2</sub>O<sub>3</sub> ALD using trimethylaluminum (TMA) and water (H<sub>2</sub>O) as precursors is the most ideal ALD model system. In this work, the reactions of TMA and H<sub>2</sub>O with the surface have been investigated using density functional theory (DFT) calculations in order to obtain more information on the reaction mechanism of the complicated H<sub>2</sub>O-based ALD of Al<sub>2</sub>O<sub>3</sub>. In the TMA reaction, the methyl ligands can be eliminated and new Al-O bonds can be formed via ligand exchange reactions. In the H<sub>2</sub>O reaction, the methyl ligand on the surface can be further eliminated and new Al<img>O bonds can be formed. Meanwhile, the coupling reactions between the surface methyl and hydroxyl groups can further form new Al<img>O bonds and release CH<sub>4</sub> or H<sub>2</sub>O to densify the Al<sub>2</sub>O<sub>3</sub> film. These complicated reaction mechanisms of Al<sub>2</sub>O<sub>3</sub> H<sub>2</sub>O-based ALD can provide theoretical guidance for the precursor design and ALD growth of other oxides and aluminum-based compounds.</p></div>","PeriodicalId":22100,"journal":{"name":"Surface Science","volume":"750 ","pages":"Article 122580"},"PeriodicalIF":2.1,"publicationDate":"2024-08-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142057961","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-22DOI: 10.1016/j.susc.2024.122579
Svetlozar Surnev , Jacek Goniakowski , Malihe Mohammadi , Claudine Noguera , Falko P. Netzer
The atomic structure of MoOx films formed upon a gradual thermal reduction of an ordered MoO3 monolayer on the Pd(100) substrate was explored via surface science characterization techniques and density functional theory (DFT) calculations. Two main reduction stages were identified. First, the initial oxygen excess was gradually eliminated by altering the domain boundary length, orientation, and atomic structure. The films nevertheless remained O-rich, with numerous terminal oxygen atoms (formation of MoO groups), and an elevated work function. Second, multiple ordered O-lean phases were formed, characterized by either very few or no terminal oxygen atoms, and a much smaller surface work function. According to calculations, the positive charging of the Pd substrate stabilizes the oxygen excess during the first stage, but during the second reduction stage, the substrate becomes negatively charged, stabilizing enhanced cation oxidation states. On their basis, the mechanisms underlying the oxygen release from the initial c(2 × 2) domains were disclosed. The experiments showed that the film reduction is perfectly reversible, which highlights the very promising properties of the MoO3/Pd system for heterogeneous catalysis.
{"title":"Reduction of a two-dimensional crystalline MoO3 monolayer","authors":"Svetlozar Surnev , Jacek Goniakowski , Malihe Mohammadi , Claudine Noguera , Falko P. Netzer","doi":"10.1016/j.susc.2024.122579","DOIUrl":"10.1016/j.susc.2024.122579","url":null,"abstract":"<div><p>The atomic structure of MoO<sub>x</sub> films formed upon a gradual thermal reduction of an ordered MoO<sub>3</sub> monolayer on the Pd(100) substrate was explored via surface science characterization techniques and density functional theory (DFT) calculations. Two main reduction stages were identified. First, the initial oxygen excess was gradually eliminated by altering the domain boundary length, orientation, and atomic structure. The films nevertheless remained O-rich, with numerous terminal oxygen atoms (formation of Mo<img>O groups), and an elevated work function. Second, multiple ordered O-lean phases were formed, characterized by either very few or no terminal oxygen atoms, and a much smaller surface work function. According to calculations, the positive charging of the Pd substrate stabilizes the oxygen excess during the first stage, but during the second reduction stage, the substrate becomes negatively charged, stabilizing enhanced cation oxidation states. On their basis, the mechanisms underlying the oxygen release from the initial c(2 × 2) domains were disclosed. The experiments showed that the film reduction is perfectly reversible, which highlights the very promising properties of the MoO<sub>3</sub>/Pd system for heterogeneous catalysis.</p></div>","PeriodicalId":22100,"journal":{"name":"Surface Science","volume":"750 ","pages":"Article 122579"},"PeriodicalIF":2.1,"publicationDate":"2024-08-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S0039602824001304/pdfft?md5=1525d168946b789b4b9dc648b293aa1e&pid=1-s2.0-S0039602824001304-main.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142049369","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-20DOI: 10.1016/j.susc.2024.122577
Dongsheng Wang , Yanqing Hou , Endong Ye , Jianxin Wang
Based on the first-principles ab initio calculation method of density functional theory (DFT), the adsorption models of Cl2 molecules on both the TiC0.89O0.11(001) intact surface and the carbon vacancy surface were established, followed by calculations and analysis of the adsorption structures, adsorption energy, differential charge density, and density of states (DOS). The results demonstrate that the adsorption process of Cl2 molecules on the TiC0.89O0.11(001) surface involves chemical adsorption, with a higher likelihood of dissociation into Cl atoms during adsorption. These dissociated Cl atoms can potentially interact with surface Ti and/or C atoms to form Ti-Cl bonds, C-Cl bonds, Ti-Cl-C bonds, and Ti-Cl-Ti bonds. Simultaneously, the stability of the adsorbed structure is influenced by both the bonding conditions between Cl atoms and surface atoms and the position of Cl atom adsorption (e.g., whether it is located above the vacancy C). Following adsorption, there is a weakening in the bonding strength of Ti-C or Ti-O bonds on the TiC0.89O0.11(001) surface. During the adsorption process, Cl atoms can either act as electron donors or acceptors. When the Ti-Cl bond structure is formed, Cl atoms function as electron acceptors; however, when the C-Cl bond structure is established, Cl atoms predominantly act as electron donors. Surface Ti atoms act as electron donors while surface C and O atoms function as electron acceptors. Additionally, the presence of surface carbon vacancy enhances the interaction between Cl and Ti atoms, weakens the interaction between Cl and C atoms, and attenuates the interaction between C, O, and Ti atoms in the structure. And it can augment the electron acquisition by Cl2 molecules upon adsorption, reduce the adsorption energy, and promote greater stability in the adsorption structure. All the effects contribute to facilitating TiCl4 formation.
基于密度泛函理论(DFT)的第一性原理ab initio计算方法,建立了Cl2分子在TiC0.89O0.11(001)完整表面和碳空位表面的吸附模型,并对吸附结构、吸附能、电荷差密度和状态密度(DOS)进行了计算和分析。结果表明,Cl2 分子在 TiC0.89O0.11(001)表面的吸附过程涉及化学吸附,在吸附过程中解离成 Cl 原子的可能性较大。这些解离的 Cl 原子有可能与表面的 Ti 原子和/或 C 原子相互作用,形成 Ti-Cl 键、C-Cl 键、Ti-Cl-C 键和 Ti-Cl-Ti 键。同时,吸附结构的稳定性受到 Cl 原子和表面原子之间的成键条件以及 Cl 原子吸附位置(如是否位于空缺 C 的上方)的影响。吸附后,TiC0.89O0.11(001) 表面上 Ti-C 或 Ti-O 键的结合强度会减弱。在吸附过程中,Cl 原子既可以充当电子供体,也可以充当电子受体。当形成 Ti-Cl 键结构时,Cl 原子充当电子受体;然而,当形成 C-Cl 键结构时,Cl 原子主要充当电子供体。表面 Ti 原子充当电子给体,而表面 C 原子和 O 原子则充当电子受体。此外,表面碳空位的存在增强了结构中 Cl 原子和 Ti 原子间的相互作用,减弱了 Cl 原子和 C 原子间的相互作用,削弱了 C、O 和 Ti 原子间的相互作用。此外,它还能增强 Cl2 分子在吸附时获得电子的能力,降低吸附能,提高吸附结构的稳定性。所有这些作用都有助于促进 TiCl4 的形成。
{"title":"Adsorption behavior of Cl2 on TiC0.89O0.11(001) surface based on the first principle calculation","authors":"Dongsheng Wang , Yanqing Hou , Endong Ye , Jianxin Wang","doi":"10.1016/j.susc.2024.122577","DOIUrl":"10.1016/j.susc.2024.122577","url":null,"abstract":"<div><p>Based on the first-principles ab initio calculation method of density functional theory (DFT), the adsorption models of Cl<sub>2</sub> molecules on both the TiC<sub>0.89</sub>O<sub>0.11</sub>(001) intact surface and the carbon vacancy surface were established, followed by calculations and analysis of the adsorption structures, adsorption energy, differential charge density, and density of states (DOS). The results demonstrate that the adsorption process of Cl<sub>2</sub> molecules on the TiC<sub>0.89</sub>O<sub>0.11</sub>(001) surface involves chemical adsorption, with a higher likelihood of dissociation into Cl atoms during adsorption. These dissociated Cl atoms can potentially interact with surface Ti and/or C atoms to form Ti-Cl bonds, C-Cl bonds, Ti-Cl-C bonds, and Ti-Cl-Ti bonds. Simultaneously, the stability of the adsorbed structure is influenced by both the bonding conditions between Cl atoms and surface atoms and the position of Cl atom adsorption (e.g., whether it is located above the vacancy C). Following adsorption, there is a weakening in the bonding strength of Ti-C or Ti-O bonds on the TiC<sub>0.89</sub>O<sub>0.11</sub>(001) surface. During the adsorption process, Cl atoms can either act as electron donors or acceptors. When the Ti-Cl bond structure is formed, Cl atoms function as electron acceptors; however, when the C-Cl bond structure is established, Cl atoms predominantly act as electron donors. Surface Ti atoms act as electron donors while surface C and O atoms function as electron acceptors. Additionally, the presence of surface carbon vacancy enhances the interaction between Cl and Ti atoms, weakens the interaction between Cl and C atoms, and attenuates the interaction between C, O, and Ti atoms in the structure. And it can augment the electron acquisition by Cl<sub>2</sub> molecules upon adsorption, reduce the adsorption energy, and promote greater stability in the adsorption structure. All the effects contribute to facilitating TiCl<sub>4</sub> formation.</p></div>","PeriodicalId":22100,"journal":{"name":"Surface Science","volume":"750 ","pages":"Article 122577"},"PeriodicalIF":2.1,"publicationDate":"2024-08-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S0039602824001286/pdfft?md5=52d5402f1dbddadac167e3e94a29a84d&pid=1-s2.0-S0039602824001286-main.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142083098","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-17DOI: 10.1016/j.susc.2024.122578
Amelia K. Sweet , Sara E. Mason
This study explores the potential of nitrobenzene as an anolyte material for nonaqueous redox flow batteries (RFBs) by theoretically examining its low-coverage adsorption behavior on neutral and charged Ag(111) model electrode surfaces. At the low coverage limit, DFT calculations show a preference for nitrobenzene to adsorb parallel to the surface, with the benzene ring and nitro group centered over HCP sites. Interactions between nitrobenzene and the surface were analyzed using induced charge density analysis, Bader charge analysis, and projected density of states (PDOS). It was found that nitrobenzene adsorbs primarily through van der Waals interactions with the surface. As nitrobenzene accumulates negative charge, the strength of adsorption diminishes. Understanding the electrode-electrolyte interface is crucial for enhancing RFB electrochemical performance, and this study sheds light on nitrobenzene's interaction with a model Ag electrode.
{"title":"Insights into the interaction of nitrobenzene and the Ag(111) surface: A DFT study","authors":"Amelia K. Sweet , Sara E. Mason","doi":"10.1016/j.susc.2024.122578","DOIUrl":"10.1016/j.susc.2024.122578","url":null,"abstract":"<div><p>This study explores the potential of nitrobenzene as an anolyte material for nonaqueous redox flow batteries (RFBs) by theoretically examining its low-coverage adsorption behavior on neutral and charged Ag(111) model electrode surfaces. At the low coverage limit, DFT calculations show a preference for nitrobenzene to adsorb parallel to the surface, with the benzene ring and nitro group centered over HCP sites. Interactions between nitrobenzene and the surface were analyzed using induced charge density analysis, Bader charge analysis, and projected density of states (PDOS). It was found that nitrobenzene adsorbs primarily through van der Waals interactions with the surface. As nitrobenzene accumulates negative charge, the strength of adsorption diminishes. Understanding the electrode-electrolyte interface is crucial for enhancing RFB electrochemical performance, and this study sheds light on nitrobenzene's interaction with a model Ag electrode.</p></div>","PeriodicalId":22100,"journal":{"name":"Surface Science","volume":"750 ","pages":"Article 122578"},"PeriodicalIF":2.1,"publicationDate":"2024-08-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142058045","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-17DOI: 10.1016/j.susc.2024.122570
F.B. Mahoungou-Nguimbi , L. Mouketo , B.R. Malonda-Boungou , A.T. Raji , B. M’Passi-Mabiala
<div><p>We report first-principles electronic structure calculations of the structural, electronic, and magnetic properties of model epitaxial layers consisting of nickel (Ni) atomic layers deposited on palladium (Pd) substrate, <em>i.e.</em>, Ni(001)<span><math><msub><mrow></mrow><mrow><mi>m</mi></mrow></msub></math></span> <span><math><mo>∣</mo></math></span>Pd<span><math><msub><mrow><mrow><mo>(</mo><mn>001</mn><mo>)</mo></mrow></mrow><mrow><mi>n</mi></mrow></msub></math></span> where <span><math><mrow><mi>m</mi><mo>=</mo><mn>1</mn><mo>,</mo><mn>2</mn><mo>,</mo><mn>6</mn></mrow></math></span> and <span><math><mrow><mi>n</mi><mo>=</mo><mn>3</mn><mo>,</mo><mn>10</mn><mo>,</mo></mrow></math></span> are layer thicknesses. We also investigate the effect of oxygen adsorption on the calculated properties. We found variation in magnetization of between <span><math><mrow><mo>≈</mo><mn>0</mn><mo>.</mo><mn>6</mn><msub><mrow><mi>μ</mi></mrow><mrow><mi>B</mi></mrow></msub></mrow></math></span> to 1.00 <span><math><msub><mrow><mi>μ</mi></mrow><mrow><mi>B</mi></mrow></msub></math></span> across the nickel layers. Also, finite magnetic moments albeit of small values of between 0.2 <span><math><msub><mrow><mi>μ</mi></mrow><mrow><mi>B</mi></mrow></msub></math></span> and 0.3 <span><math><msub><mrow><mi>μ</mi></mrow><mrow><mi>B</mi></mrow></msub></math></span> is found on the Pd at the interface. This magnetic moment on an otherwise non-magnetic Pd atoms has been adduced to interfacial strain due to lattice mismatch between the Ni and Pd layers at the Ni<span><math><mo>|</mo></math></span>Pd interface. The effect of adsorbed oxygen on the Ni<span><math><msub><mrow></mrow><mrow><mi>m</mi></mrow></msub></math></span> <span><math><mo>∣</mo></math></span>Pd<span><math><msub><mrow></mrow><mrow><mi>n</mi></mrow></msub></math></span> is that it increases the magnetic moment on the nickel layers. Also, regarding the magnitude of magnetic anisotropy energy (MAE), we found a high perpendicular values of 1.63 meV and 1.37 meV per unit cell respectively for Ni<span><math><msub><mrow></mrow><mrow><mi>m</mi></mrow></msub></math></span> <span><math><mo>∣</mo></math></span>Pd<sub>10</sub> (<span><math><mrow><mi>m</mi><mo>=</mo><mn>2</mn><mo>,</mo><mn>6</mn></mrow></math></span>) which are relatively higher than those reported for other transition metal epitaxial layers. However, the presence of oxygen atom on the Ni<span><math><mo>∣</mo></math></span>Pd changes the direction and magnitude of MAE. Indeed, O adsorption favours or enhances in-plane magnetization direction depending on the thickness of the Ni layers for a fixed Pd thickness. Plots of local density of states (LDOS) which include the effect of spin–orbit coupling (SOC), show that in the case of Ni<span><math><mo>∣</mo></math></span>Pd having perpendicular MAE, there appears a new SOC-induced electronic states below and above the Fermi level. These states appears to stabilize this type of magnetic anisotropy. On the ot
我们报告了由沉积在钯(Pd)基底上的镍(Ni)原子层(即 Ni(001)m∣Pd(001)n 其中 m=1,2,6 和 n=3,10 为层厚度)组成的模型外延层的结构、电子和磁性能的第一原理电子结构计算结果。我们还研究了氧吸附对计算特性的影响。我们发现镍层之间的磁化率变化在 ≈0.6μB 到 1.00μB 之间。此外,在界面处的钯上也发现了有限的磁矩,尽管数值很小,介于 0.2 μB 和 0.3 μB 之间。镍钯界面上的镍层和钯层之间的晶格不匹配导致界面应变,从而在原本无磁性的钯原子上产生了这种磁矩。吸附氧对 Nim ∣Pdn 的影响是增加了镍层上的磁矩。此外,关于磁各向异性能(MAE)的大小,我们发现 Nim ∣Pd10 (m=2,6)每单位晶胞的垂直值分别为 1.63 meV 和 1.37 meV,相对高于其他过渡金属外延层的垂直值。然而,Ni∣Pd 上氧原子的存在改变了 MAE 的方向和大小。事实上,在钯层厚度固定的情况下,镍层的厚度不同,氧的吸附对面内磁化方向的影响也不同。包含自旋轨道耦合(SOC)效应的局部态密度(LDOS)图显示,在具有垂直 MAE 的 Ni∣Pd 情况下,费米水平以下和以上出现了新的 SOC 诱导的电子态。这些状态似乎能稳定这种类型的磁各向异性。另一方面,面内 MAE 的特点是费米水平(EF)以下的 SOC 诱导的局部态以及 EF 处 DOS 的降低。我们的工作探索了物理、磁性和电子特性,这些特性可能有助于设计用于磁性或自旋电子应用的镍∣钯基超晶格。
{"title":"Ni thin-films on Pd surfaces and effects of oxygen adsorption: Ab-initio study of structures, electronic properties, magnetic anisotropy","authors":"F.B. Mahoungou-Nguimbi , L. Mouketo , B.R. Malonda-Boungou , A.T. Raji , B. M’Passi-Mabiala","doi":"10.1016/j.susc.2024.122570","DOIUrl":"10.1016/j.susc.2024.122570","url":null,"abstract":"<div><p>We report first-principles electronic structure calculations of the structural, electronic, and magnetic properties of model epitaxial layers consisting of nickel (Ni) atomic layers deposited on palladium (Pd) substrate, <em>i.e.</em>, Ni(001)<span><math><msub><mrow></mrow><mrow><mi>m</mi></mrow></msub></math></span> <span><math><mo>∣</mo></math></span>Pd<span><math><msub><mrow><mrow><mo>(</mo><mn>001</mn><mo>)</mo></mrow></mrow><mrow><mi>n</mi></mrow></msub></math></span> where <span><math><mrow><mi>m</mi><mo>=</mo><mn>1</mn><mo>,</mo><mn>2</mn><mo>,</mo><mn>6</mn></mrow></math></span> and <span><math><mrow><mi>n</mi><mo>=</mo><mn>3</mn><mo>,</mo><mn>10</mn><mo>,</mo></mrow></math></span> are layer thicknesses. We also investigate the effect of oxygen adsorption on the calculated properties. We found variation in magnetization of between <span><math><mrow><mo>≈</mo><mn>0</mn><mo>.</mo><mn>6</mn><msub><mrow><mi>μ</mi></mrow><mrow><mi>B</mi></mrow></msub></mrow></math></span> to 1.00 <span><math><msub><mrow><mi>μ</mi></mrow><mrow><mi>B</mi></mrow></msub></math></span> across the nickel layers. Also, finite magnetic moments albeit of small values of between 0.2 <span><math><msub><mrow><mi>μ</mi></mrow><mrow><mi>B</mi></mrow></msub></math></span> and 0.3 <span><math><msub><mrow><mi>μ</mi></mrow><mrow><mi>B</mi></mrow></msub></math></span> is found on the Pd at the interface. This magnetic moment on an otherwise non-magnetic Pd atoms has been adduced to interfacial strain due to lattice mismatch between the Ni and Pd layers at the Ni<span><math><mo>|</mo></math></span>Pd interface. The effect of adsorbed oxygen on the Ni<span><math><msub><mrow></mrow><mrow><mi>m</mi></mrow></msub></math></span> <span><math><mo>∣</mo></math></span>Pd<span><math><msub><mrow></mrow><mrow><mi>n</mi></mrow></msub></math></span> is that it increases the magnetic moment on the nickel layers. Also, regarding the magnitude of magnetic anisotropy energy (MAE), we found a high perpendicular values of 1.63 meV and 1.37 meV per unit cell respectively for Ni<span><math><msub><mrow></mrow><mrow><mi>m</mi></mrow></msub></math></span> <span><math><mo>∣</mo></math></span>Pd<sub>10</sub> (<span><math><mrow><mi>m</mi><mo>=</mo><mn>2</mn><mo>,</mo><mn>6</mn></mrow></math></span>) which are relatively higher than those reported for other transition metal epitaxial layers. However, the presence of oxygen atom on the Ni<span><math><mo>∣</mo></math></span>Pd changes the direction and magnitude of MAE. Indeed, O adsorption favours or enhances in-plane magnetization direction depending on the thickness of the Ni layers for a fixed Pd thickness. Plots of local density of states (LDOS) which include the effect of spin–orbit coupling (SOC), show that in the case of Ni<span><math><mo>∣</mo></math></span>Pd having perpendicular MAE, there appears a new SOC-induced electronic states below and above the Fermi level. These states appears to stabilize this type of magnetic anisotropy. On the ot","PeriodicalId":22100,"journal":{"name":"Surface Science","volume":"750 ","pages":"Article 122570"},"PeriodicalIF":2.1,"publicationDate":"2024-08-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142041147","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-14DOI: 10.1016/j.susc.2024.122571
Julián Del Plá, Reinaldo Pis Diez
Non periodic density functional theory calculations are used to investigate the role of cobalt atoms in the adsorption of thiophene on small Mo and MoCo clusters. Metallic aggregates play the role of those active sites found in the true catalysts. Two interaction modes between thiophene and metallic sites are considered, namely, the S-mode, in which the organosulfur molecule interacts through the S atom, and the R-mode, in which the interaction takes place through the thiophene ring. A large number of sites, in which thiophene effectively adsorbs, was found, both in the monometallic case and in the bimetallic one. Considerably larger adsorption energies were found when thiophene interacts via the R-mode than when adsorption occurs through the S-mode. The activation of C-S bonds is also more important for R-mode cases than for S-mode ones. Further analysis made on some selected systems and based on density of states and molecular orbital overlap population-projected density of states reveals that thiophene and metallic clusters interact in an energy range around −6.0 eV with respect to the Fermi energy. Bands observed at energies below −6.0 eV correspond to thiophene states that become shifted with respect to the values obtained for isolated thiophene depending on the strength of the interaction. Bands above -6.0 eV describe how C and S atoms interact with Co and Mo ones, providing both bonding and antibonding patterns that helps to understand the overall interaction. Most important is the finding that cobalt atoms seem to play no relevant role during the adsorption of thiophene on metallic sites. Thus, present results obtained using non periodic GGA density functional theory seem to point to cobalt taking part in another step of the overall HDS process, hydrogen adsorption or hydrogen attack to C-S bonds, for instance.
非周期性密度泛函理论计算用于研究钴原子在小钼和钼钴团簇吸附噻吩过程中的作用。金属团聚体扮演了真正催化剂中活性位点的角色。研究考虑了噻吩与金属位点之间的两种相互作用模式,即有机硫分子通过 S 原子相互作用的 S 模式和通过噻吩环相互作用的 R 模式。在单金属和双金属情况下,都发现了大量噻吩有效吸附的位点。当噻吩通过 R 模式相互作用时,吸附能明显大于通过 S 模式吸附时。C-S 键的活化在 R 模式情况下也比在 S 模式情况下更重要。根据状态密度和分子轨道重叠群体推算的状态密度对一些选定的系统进行的进一步分析表明,噻吩和金属团簇在费米能-6.0 eV 左右的能量范围内相互作用。在能量低于 -6.0 eV 时观察到的条带对应于噻吩态,这些噻吩态相对于孤立噻吩态的值会发生偏移,这取决于相互作用的强度。高于 -6.0 eV 的带描述了 C 原子和 S 原子如何与 Co 原子和 Mo 原子相互作用,提供了成键和反键模式,有助于理解整体相互作用。最重要的发现是,钴原子在金属位点吸附噻吩的过程中似乎没有发挥相关作用。因此,利用非周期性 GGA 密度泛函理论获得的当前结果似乎表明,钴参与了整个加氢脱硫过程的另一个步骤,例如氢吸附或氢对 C-S 键的攻击。
{"title":"A computational study of the role of cobalt in thiophene adsorption on small Mo and MoCo clusters as site models for the HDS process","authors":"Julián Del Plá, Reinaldo Pis Diez","doi":"10.1016/j.susc.2024.122571","DOIUrl":"10.1016/j.susc.2024.122571","url":null,"abstract":"<div><p>Non periodic density functional theory calculations are used to investigate the role of cobalt atoms in the adsorption of thiophene on small Mo and MoCo clusters. Metallic aggregates play the role of those active sites found in the true catalysts. Two interaction modes between thiophene and metallic sites are considered, namely, the S-mode, in which the organosulfur molecule interacts through the S atom, and the R-mode, in which the interaction takes place through the thiophene ring. A large number of sites, in which thiophene effectively adsorbs, was found, both in the monometallic case and in the bimetallic one. Considerably larger adsorption energies were found when thiophene interacts via the R-mode than when adsorption occurs through the S-mode. The activation of C-S bonds is also more important for R-mode cases than for S-mode ones. Further analysis made on some selected systems and based on density of states and molecular orbital overlap population-projected density of states reveals that thiophene and metallic clusters interact in an energy range around −6.0 eV with respect to the Fermi energy. Bands observed at energies below −6.0 eV correspond to thiophene states that become shifted with respect to the values obtained for isolated thiophene depending on the strength of the interaction. Bands above -6.0 eV describe how C and S atoms interact with Co and Mo ones, providing both bonding and antibonding patterns that helps to understand the overall interaction. Most important is the finding that cobalt atoms seem to play no relevant role during the adsorption of thiophene on metallic sites. Thus, present results obtained using non periodic GGA density functional theory seem to point to cobalt taking part in another step of the overall HDS process, hydrogen adsorption or hydrogen attack to C-S bonds, for instance.</p></div>","PeriodicalId":22100,"journal":{"name":"Surface Science","volume":"749 ","pages":"Article 122571"},"PeriodicalIF":2.1,"publicationDate":"2024-08-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141997659","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-14DOI: 10.1016/j.susc.2024.122575
Guocai Lv , Shengzhuo Li , Hao Zhang , Wenjuan Qian , Jie Cheng , Ping Qian
The primary cause of global warming is the emission of greenhouse gases such as CO2. So reducing CO2 emissions is vital. This paper investigates the impact of the atom K as a promoter of MgO on the CO2 adsorption properties using the DFT theoretical computational method. By analyzing the adsorption energy, bader charge as well as the density of states and COHP, it was found that K-promoting the MgO (100) surface resulted in a redistribution of charge on the MgO surface and enhanced CO2 adsorption compared to the pure MgO surface. The presence of K atoms causes orbital hybridization among O (CO2) and Mg atoms, O (CO2) atoms and K atoms, and the surface O atoms and K atoms. These interactions lead to the formation of (MgO)Mg-O(CO2) and (CO2)O−K−O(MgO) chemical bonds. The adsorption energy of CO2 on the K-promoted MgO surface increased from -0.32 eV to -1.01 eV compared to the pure surface, enhancing the adsorption of CO2.
全球变暖的主要原因是二氧化碳等温室气体的排放。因此,减少二氧化碳排放至关重要。本文利用 DFT 理论计算方法研究了作为氧化镁促进剂的原子 K 对 CO2 吸附特性的影响。通过分析吸附能、巴德电荷以及态密度和 COHP,发现与纯氧化镁表面相比,K 原子促进氧化镁 (100) 表面的电荷重新分布,增强了对 CO2 的吸附。K 原子的存在导致 O (CO2) 原子与镁原子、O (CO2) 原子与 K 原子以及表面 O 原子与 K 原子之间的轨道杂化。这些相互作用导致形成 (MgO)Mg-O(CO2) 和 (CO2)O-K-O(MgO) 化学键。与纯表面相比,二氧化碳在 K 促进的氧化镁表面上的吸附能从-0.32 eV 增加到-1.01 eV,从而增强了对二氧化碳的吸附。
{"title":"CO2 adsorption on a K-promoted MgO surface: A DFT theoretical study","authors":"Guocai Lv , Shengzhuo Li , Hao Zhang , Wenjuan Qian , Jie Cheng , Ping Qian","doi":"10.1016/j.susc.2024.122575","DOIUrl":"10.1016/j.susc.2024.122575","url":null,"abstract":"<div><p>The primary cause of global warming is the emission of greenhouse gases such as CO<sub>2</sub>. So reducing CO<sub>2</sub> emissions is vital. This paper investigates the impact of the atom K as a promoter of MgO on the CO<sub>2</sub> adsorption properties using the DFT theoretical computational method. By analyzing the adsorption energy, bader charge as well as the density of states and COHP, it was found that K-promoting the MgO (100) surface resulted in a redistribution of charge on the MgO surface and enhanced CO<sub>2</sub> adsorption compared to the pure MgO surface. The presence of K atoms causes orbital hybridization among O (CO<sub>2</sub>) and Mg atoms, O (CO<sub>2</sub>) atoms and K atoms, and the surface O atoms and K atoms. These interactions lead to the formation of (MgO)Mg-O(CO<sub>2</sub>) and (CO<sub>2</sub>)O−K−O(MgO) chemical bonds. The adsorption energy of CO<sub>2</sub> on the K-promoted MgO surface increased from -0.32 eV to -1.01 eV compared to the pure surface, enhancing the adsorption of CO<sub>2</sub>.</p></div>","PeriodicalId":22100,"journal":{"name":"Surface Science","volume":"749 ","pages":"Article 122575"},"PeriodicalIF":2.1,"publicationDate":"2024-08-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141997660","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-14DOI: 10.1016/j.susc.2024.122576
Manoj Kumar, Munish Sharma
Nitrogen oxides play a significant role in various biomedical conditions, including respiratory disorders, asthma, and cardiovascular problems, underscoring the urgent need for sensitive and selective devices in biomedical applications. This study offers a comprehensive analysis of the sensitivity of β-tellurene doped with 2.22 % tungsten to nitrogen oxides (NO, NO2, and N2O). Site-specific doping of tellurene with tungsten reduces the band gap and introduces magnetization in β-tellurene. The strong adsorption energies observed for NO, NO2, and N2O at site A (-2.45 eV, -2.39 eV, and -2.80 eV, respectively) suggest that W-doped β-Te monolayers are promising candidates for gas storage for these compounds. Conversely, weaker adsorption energies for the same gases at site B (-0.74 eV, -1.74 eV, and -0.09 eV) highlights the importance of doping location. The adsorption energy values at site B indicate that W-doped β-Te monolayers have potential as sensing materials for NO and as adsorbents for NO2 gas. Conversely, the weak adsorption energy for N2O at the B site demonstrates its non-interacting behaviour with the W-doped β-Te monolayer. Additionally, the negligible change in electronic properties and minimal charge transfer suggest that this configuration is unsuitable for N2O storage and sensing. The spin-resolved current-voltage characteristics of doped tellurene reveal distinct behaviors influenced by gas molecule adsorption. Overall, these findings underscore the potential of W-doped tellurene as a site-specific material for the adsorption and sensing of targeted gases.
氮氧化物在呼吸系统疾病、哮喘和心血管问题等各种生物医学疾病中起着重要作用,因此迫切需要在生物医学应用中使用灵敏的选择性器件。本研究全面分析了掺杂 2.22% 钨的β-碲对氮氧化物(NO、NO2 和 N2O)的敏感性。钨在碲中的特定位点掺杂降低了β-碲的带隙并引入了磁化。在位点 A 上观察到的 NO、NO2 和 N2O 的强吸附能(分别为 -2.45 eV、-2.39 eV 和 -2.80 eV)表明,掺杂 W 的 β-Te 单层很有希望成为这些化合物的气体存储候选材料。相反,相同气体在 B 位点的吸附能较弱(-0.74 eV、-1.74 eV 和 -0.09 eV),这凸显了掺杂位置的重要性。B 位点的吸附能值表明,掺 W 的 β-Te 单层具有作为 NO 传感材料和 NO2 气体吸附剂的潜力。相反,N2O 在 B 位点的吸附能很弱,这表明它与掺 W 的 β-Te 单层没有相互作用。此外,电子特性的变化可以忽略不计,电荷转移也微乎其微,这表明这种结构不适合用于 N2O 的储存和传感。掺杂聚烯烃的自旋分辨电流-电压特性显示出受气体分子吸附影响的独特行为。总之,这些发现强调了掺 W 的碲烯作为一种特定位点材料在吸附和传感目标气体方面的潜力。
{"title":"Adsorption and sensing potential of tungsten (W) doped beta tellurene (β-Te) monolayer towards nitrogen oxides: A first principle study","authors":"Manoj Kumar, Munish Sharma","doi":"10.1016/j.susc.2024.122576","DOIUrl":"10.1016/j.susc.2024.122576","url":null,"abstract":"<div><p>Nitrogen oxides play a significant role in various biomedical conditions, including respiratory disorders, asthma, and cardiovascular problems, underscoring the urgent need for sensitive and selective devices in biomedical applications. This study offers a comprehensive analysis of the sensitivity of β-tellurene doped with 2.22 % tungsten to nitrogen oxides (NO, NO<sub>2</sub>, and N<sub>2</sub>O). Site-specific doping of tellurene with tungsten reduces the band gap and introduces magnetization in β-tellurene. The strong adsorption energies observed for NO, NO<sub>2</sub>, and N<sub>2</sub>O at site A (-2.45 eV, -2.39 eV, and -2.80 eV, respectively) suggest that W-doped β-Te monolayers are promising candidates for gas storage for these compounds. Conversely, weaker adsorption energies for the same gases at site B (-0.74 eV, -1.74 eV, and -0.09 eV) highlights the importance of doping location. The adsorption energy values at site B indicate that W-doped β-Te monolayers have potential as sensing materials for NO and as adsorbents for NO<sub>2</sub> gas. Conversely, the weak adsorption energy for N<sub>2</sub>O at the B site demonstrates its non-interacting behaviour with the W-doped β-Te monolayer. Additionally, the negligible change in electronic properties and minimal charge transfer suggest that this configuration is unsuitable for N<sub>2</sub>O storage and sensing. The spin-resolved current-voltage characteristics of doped tellurene reveal distinct behaviors influenced by gas molecule adsorption. Overall, these findings underscore the potential of W-doped tellurene as a site-specific material for the adsorption and sensing of targeted gases.</p></div>","PeriodicalId":22100,"journal":{"name":"Surface Science","volume":"750 ","pages":"Article 122576"},"PeriodicalIF":2.1,"publicationDate":"2024-08-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142049504","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-14DOI: 10.1016/j.susc.2024.122574
O.M. Magnussen
Surface science studies of electrochemical interfaces and processes have gained increasing popularity in the last decades, owning to the increasing importance of electrochemistry for key technologies of the 21th century, especially in electric energy storage and conversion. In situ and operando surface-sensitive methods, such as scanning probe microscopy and surface X-ray diffraction, as well as complementary ab initio theory can provide atomic-scale information on solid electrode surface in contact with liquid electrolytes, including structural changes under reaction conditions. The level of detail obtainable by these approaches is illustrated in this short review for selected examples. These include the adsorption of sulfate and other oxyanions, where a crucial role of coadsorbed water is found, the restructuring of Cu electrode surfaces under hydrogen evolution and CO2 reduction conditions, and the mechanisms of electrochemical Pt oxidation and its correlation with Pt dissolution.
过去几十年来,由于电化学在 21 世纪关键技术(尤其是电能存储和转换技术)中的重要性与日俱增,有关电化学界面和过程的表面科学研究越来越受欢迎。扫描探针显微镜和表面 X 射线衍射等原位和操作表面敏感方法,以及互补的 ab initio 理论可以提供与液态电解质接触的固体电极表面的原子尺度信息,包括反应条件下的结构变化。本简短综述将举例说明这些方法所能获得的详细程度。这些例子包括硫酸根离子和其他氧阴离子的吸附(其中共吸附水起着关键作用)、氢气进化和二氧化碳还原条件下铜电极表面的结构重组,以及电化学铂氧化机制及其与铂溶解的相关性。
{"title":"The rise of electrochemical surface science: From in situ interface structure to operando dynamics","authors":"O.M. Magnussen","doi":"10.1016/j.susc.2024.122574","DOIUrl":"10.1016/j.susc.2024.122574","url":null,"abstract":"<div><p>Surface science studies of electrochemical interfaces and processes have gained increasing popularity in the last decades, owning to the increasing importance of electrochemistry for key technologies of the 21th century, especially in electric energy storage and conversion. <em>In situ</em> and <em>operando</em> surface-sensitive methods, such as scanning probe microscopy and surface X-ray diffraction, as well as complementary <em>ab initio</em> theory can provide atomic-scale information on solid electrode surface in contact with liquid electrolytes, including structural changes under reaction conditions. The level of detail obtainable by these approaches is illustrated in this short review for selected examples. These include the adsorption of sulfate and other oxyanions, where a crucial role of coadsorbed water is found, the restructuring of Cu electrode surfaces under hydrogen evolution and CO<sub>2</sub> reduction conditions, and the mechanisms of electrochemical Pt oxidation and its correlation with Pt dissolution.</p></div>","PeriodicalId":22100,"journal":{"name":"Surface Science","volume":"749 ","pages":"Article 122574"},"PeriodicalIF":2.1,"publicationDate":"2024-08-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142040354","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}