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Enhancement of Oxidation Resistance via Chromium Boron Carbide on Diamond Particles 碳化硼铬增强金刚石颗粒抗氧化性能的研究
Pub Date : 2021-01-30 DOI: 10.3390/COATINGS11020162
Xuliang Zhang, Youhong Sun, Q. Meng, Wu Jinhao, He Linkai
To improve the oxidation resistance of diamond, chromium boron carbide (Cr–B–C) coatings were synthesized through high temperature solid state synthesis and molten salt method on diamond particles in this paper. After holding the raw material at 900 °C for 2 h, the diamond surface was completely and uniformly covered by Cr–B–C coatings. Oxidation resistance of the diamond coated Cr–B–C was determined by the thermogravimetric analysis (TGA). The results revealed that the Cr–B–C coatings held the diamonds for 100%-mass in air atmosphere until 1151 °C, which was much better than the uncoated diamonds (720 °C) and the B4C-coated diamonds (1090 °C). When Cr–B–C-coated diamond was annealed in air, Cr2O3 and B2O3 were formed as oxygen barrier layer to protect diamond from oxidation. The formation of B2O3 with high temperature fluidity was conducive to avoiding Cr2O3 delamination due to volume expansion during oxidation in air. Furthermore, the presence of Cr2O3 provided lasting protection by reducing the evaporation of B2O3. The oxidation products (B2O3 and Cr2O3) prove a complementary functional protection on diamond particles from oxidation.
为了提高金刚石的抗氧化性能,本文采用高温固相法和熔盐法在金刚石颗粒上合成了碳化硼铬(Cr-B-C)涂层。在900℃下保温2h后,金刚石表面被Cr-B-C涂层完全均匀覆盖。采用热重分析(TGA)测定了金刚石涂层Cr-B-C的抗氧化性能。结果表明,Cr-B-C涂层使金刚石在空气中保持100%质量直到1151℃,这比未涂层的金刚石(720℃)和涂层b4c的金刚石(1090℃)要好得多。cr - b -c涂层金刚石在空气中退火时,形成Cr2O3和B2O3作为氧障层,保护金刚石不被氧化。B2O3的形成具有高温流动性,有利于避免Cr2O3在空气中氧化时因体积膨胀而分层。此外,Cr2O3的存在通过减少B2O3的蒸发提供持久的保护。氧化产物(B2O3和Cr2O3)对金刚石颗粒具有互补的氧化保护作用。
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引用次数: 5
Wear and Corrosion Resistance Analysis of FeCoNiTiAlx High-Entropy Alloy Coatings Prepared by Laser Cladding 激光熔覆法制备FeCoNiTiAlx高熵合金涂层的耐磨损和耐腐蚀性能分析
Pub Date : 2021-01-29 DOI: 10.3390/COATINGS11020155
Zhaolei Sun, Mingyuan Zhang, Gaoqi Wang, Xuefeng Yang, Shouren Wang
FeCoNiTiAlx (x = 0, 0.5, 1) high-entropy alloy coatings were prepared by laser cladding technology. The phase, microstructure, hardness, wear resistance and corrosion resistance were tested and analyzed. The results showed Al element promoted the conversion from the FCC phase to the BCC phase. The coating presented dendritic structure due to the addition of the Al element, while the number of dendrites increased. And the average hardness of the coating increased from 204 to 623 HV. The addition of the Al element increases the corrosion current density of the coating from 1.270 × 10−5 to 3.489 × 10−5 A/cm2. The wear rate of the coatings decreases with the increase of Al content according to dry friction and wear, which indicates the wear resistance of the coating was improved by adding the Al element. According to the corrosion wear test in 3.5% NaCl solution, it can be found that the wear rate of the coating increases firstly and then decreases with the addition of the Al element, which indicates that the addition of the Al element intensifies the wear of the coating in 3.5% NaCl solution.
采用激光熔覆技术制备FeCoNiTiAlx (x = 0,0.5, 1)高熵合金涂层。对合金的相、组织、硬度、耐磨性和耐腐蚀性进行了测试和分析。结果表明,Al元素促进了FCC相向BCC相的转化。Al元素的加入使涂层呈现枝晶结构,枝晶数量增加。镀层的平均硬度由204 HV提高到623 HV。Al元素的加入使镀层的腐蚀电流密度从1.270 × 10−5增加到3.489 × 10−5 A/cm2。从干摩擦磨损的角度看,涂层的磨损率随Al含量的增加而降低,表明Al元素的加入提高了涂层的耐磨性。通过3.5% NaCl溶液中的腐蚀磨损试验可以发现,随着Al元素的加入,涂层的磨损速率先增大后减小,说明在3.5% NaCl溶液中,Al元素的加入加剧了涂层的磨损。
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引用次数: 10
Tuning the Optical Properties of MEH–PPV/PFO Hybrid Thin Films via the Incorporation of CsPbBr3 Quantum Dots 利用CsPbBr3量子点调谐MEH-PPV /PFO杂化薄膜的光学性能
Pub Date : 2021-01-29 DOI: 10.3390/COATINGS11020154
Saif M. H. Qaid, B. Al‐Asbahi, Hamid M. Ghaithan, A. Aldwayyan
The current work examines the effects of cesium lead bromide (CsPbBr3) perovskite quantum dots (PQDs) on the structural and optical properties of conjugated polymer blends of poly[2-methoxy-5-(2′-ethylhexyloxy)-1,4-phenylene vinylene] (MEH–PPV) and poly(9,9-di-n-octylfluorenyl-2,7-diyl) (PFO). MEH–PPV/PFO composite thin-films containing PQDs with weight ratios between 0.5 wt.% and 10 wt.% were prepared via a solution-blending method prior to spin-coating on glass substrates. The MEH–PPV/PFO composites’ crystallinity was improved, and the roughness was dramatically increased with higher PQDs content, as confirmed by X-ray diffraction (XRD) and atomic force microscopy (AFM), respectively. Conversely, a higher PQDs content resulted in a gradual reduction of the Urbach tail and an increase in the steepness parameter, thereby reducing the localized density of the electronic states within the forbidden bandgap of the hybrids. Moreover, a slight reduction in the direct and indirect bandgaps was found in PQDs/(MEH–PPV/PFO) composite films containing a higher PQDs content and provided evidence of the low concentration of the localized states. The incorporation of the PQDs resulted in enhanced non-radiative energy transfer processes in the MEH–PPV/PFO hybrids, which are very important for the development of optimized optoelectronic devices.
本文研究了铯-溴化铅(CsPbBr3)钙钛矿量子点(PQDs)对聚[2-甲氧基-5-(2 ' -乙基己氧基)-1,4-苯基乙烯](MEH-PPV)和聚(9,9-二-正辛基氟壬基-2,7-二基)(PFO)共轭聚合物共混物的结构和光学性质的影响。在玻璃基板上进行旋涂之前,通过溶液共混法制备了重量比在0.5 wt.% ~ 10 wt.%之间的含PQDs的MEH-PPV /PFO复合薄膜。x射线衍射(XRD)和原子力显微镜(AFM)分别证实,随着PQDs含量的增加,MEH-PPV /PFO复合材料的结晶度提高,粗糙度显著增加。相反,PQDs含量越高,会导致Urbach尾逐渐减小,陡度参数增大,从而降低杂化体禁带隙内电子态的局域密度。此外,在PQDs含量较高的PQDs/(MEH-PPV /PFO)复合薄膜中,直接带隙和间接带隙略有减小,证明了局域态浓度较低。PQDs的加入使MEH-PPV /PFO杂化材料的非辐射能量传递过程得到增强,这对优化光电器件的发展具有重要意义。
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引用次数: 6
Improvement in the Figure of Merit of ITO-Metal-ITO Sandwiched Films on Poly Substrate by High-Power Impulse Magnetron Sputtering 大功率脉冲磁控溅射提高ito -金属- ito夹层膜在Poly衬底上的优值
Pub Date : 2021-01-28 DOI: 10.3390/COATINGS11020144
Hui Li, Ying Gao, Shuo-Huang Yuan, D. Wuu, Wan‐Yu Wu, Sam Zhang
High-power impulse magnetron sputtering (HiPIMS) was used to deposit ITO/Ag/ITO (IAgI) and ITO/Cu/ITO (ICuI) sandwiched films on polyethylene naphthalate substrate at room temperature as flexible transparent conductive materials. The hybrid layers were constructed with 40 nm ITO bottom and top layers, and a 5–20 nm Ag or Cu interlayer. The microstructure and optoelectrical properties were estimated for these films with various thicknesses of the metal interlayer. Thanks to the high-power density and highly ionized plasma in the HiPIMS process, the IAgI and ICuI sandwich structures exhibited good crystallinity and smooth surfaces with high optical transmittance and low sheet resistance. The optimal figure of merit was obtained as 101.16 × 10−3·Ω−1 for the IAgI film and 4.83 × 10−3·Ω−1 for the ICuI film with the metal interlayer thickness of 10 nm, both of which are higher than that from a similar structure reported via sputtering at room temperature. These results indicate that HiPIMS is a promising technique to deposit transparent conductive films onto soft substrates for applications in flexible optoelectronic devices.
采用高功率脉冲磁控溅射(HiPIMS)技术在室温下在聚萘二甲酸乙二醇酯基底上沉积了ITO/Ag/ITO (IAgI)和ITO/Cu/ITO (ICuI)夹层膜,作为柔性透明导电材料。杂化层由40 nm的ITO底层和40 nm的ITO顶层和5-20 nm的Ag或Cu中间层构成。对不同厚度金属间层薄膜的微观结构和光电性能进行了分析。由于hiims过程中的高功率密度和高电离等离子体,IAgI和ICuI夹层结构具有良好的结晶度和光滑的表面,具有高透光率和低片阻。IAgI薄膜的最优优值为101.16 × 10−3·Ω−1,金属层厚度为10 nm的ICuI薄膜的最优优值为4.83 × 10−3·Ω−1,均高于室温溅射法制备的类似结构。这些结果表明,HiPIMS是一种很有前途的技术,可以将透明导电薄膜沉积在软基板上,用于柔性光电器件。
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引用次数: 18
Structural Features and Tribological Properties of Detonation Gun Sprayed Ti–Si–C Coating 爆轰枪喷涂Ti-Si-C涂层的结构特征及摩擦学性能
Pub Date : 2021-01-28 DOI: 10.3390/COATINGS11020141
B. Rakhadilov, D. Buitkenov, Zhuldyz Sagdoldina, B. Seitov, S. Kurbanbekov, Meruyert Adilkanova
The paper considers the research results of structural-phase state and tribological characteristics of detonation coatings based on Ti–Si–C, obtained at different filling volumes of the explosive gas mixture barrel of a detonation gun. The results analysis indicates that the phase composition and properties of detonation coatings strongly depend on the technological parameters of spraying. With an increase of the explosive mixture in the filling volume of the detonation barrel up to 70% of the coatings consist mainly of the TiC phase, because high temperature leads to a strong decomposition of Ti3SiC2 powders. Thus, the XRD results confirm that at 70% of the explosive gas mixture’s filling volume, partial decomposition and disintegration of the powders occurs after detonation spraying. We established that detonation coatings based on titanium carbosilicide obtained at the explosive gas mixture’s filling volume at 60% are characterized by high wear resistance and adhesive strength. Thermal annealing was performed after spraying in the temperature range of 700–900 °C for 1 h to reduce microstructural defects and improve the Ti–Si–C coating characteristics. As a result of the heat treatment in the Ti–Si–C system at 800 °C, we observed that an increase in the volume fraction of the Ti3SiC2 and TiO2 phases led to a 2-fold increase in microhardness. This means that the after-heat-treatment can provide a sufficient reaction time for the incomplete reaction of the Ti–Si–C (TSC) coating during the detonation gun spraying. Thus, annealing can provide an equal distribution of elements in the coatings.
本文综合考虑了在爆轰枪混合炸药管不同填充体积下获得的基于Ti-Si-C的爆轰涂层的结构相态和摩擦学特性的研究结果。分析结果表明,爆轰涂层的相组成和性能与喷涂工艺参数有很大关系。随着爆轰管填充体积中炸药混合物的增加,高达70%的涂层主要由TiC相组成,因为高温会导致Ti3SiC2粉末的强烈分解。由此可见,XRD结果证实,在爆炸性气体混合物填充体积达到70%时,爆轰喷涂后粉末发生部分分解崩解。结果表明,在爆炸气体填充量为60%时制备的碳化钛爆轰涂料具有较高的耐磨性和粘接强度。喷涂后在700 ~ 900℃温度范围内热处理1h,以减少微观组织缺陷,改善Ti-Si-C涂层性能。在800°C的Ti-Si-C体系中进行热处理,我们观察到Ti3SiC2和TiO2相体积分数的增加导致显微硬度提高了2倍。这意味着后热处理可以为Ti-Si-C (TSC)涂层在爆轰枪喷涂过程中的不完全反应提供足够的反应时间。因此,退火可以在涂层中提供均匀的元素分布。
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引用次数: 10
Laser Surface Texturing for Biomedical Applications: A Review 激光表面纹理在生物医学中的应用综述
Pub Date : 2021-01-22 DOI: 10.3390/COATINGS11020124
I. Shivakoti, G. Kibria, R. Čep, B. B. Pradhan, Ashis Sharma
For generating a texture or pattern on a work surface, one of the emerging processes is laser surface texturing (LST). It is an effective method for producing texture on a work surface. Literature shows that various lasers have been applied to generate textures on the surface of work materials. Recently, LST has shown tremendous potential in the field of biomedical applications. Applying the LST process, the efficacy of the biomaterial has been drastically improved. This paper presents an in-depth review of laser surface texturing for biomedical applications. The effect of LST on important biomaterial has been thoroughly studied; it was found that LST has extreme potential for surface modification of biomaterial and can be utilized for biomedical applications.
为了在工作表面上生成纹理或图案,激光表面纹理(LST)是新兴的工艺之一。这是一种在工件表面产生纹理的有效方法。文献表明,各种激光已经被应用于在工作材料表面产生纹理。近年来,LST在生物医学领域的应用显示出巨大的潜力。应用LST工艺,生物材料的功效得到了极大的提高。本文综述了激光表面纹理在生物医学领域的应用。LST对重要生物材料的影响已被深入研究;研究发现,LST在生物材料表面改性方面具有极大的潜力,可用于生物医学领域。
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引用次数: 50
Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor Ru(EtCp)2前驱体等离子体增强钌膜原子层沉积研究
Pub Date : 2021-01-21 DOI: 10.3390/COATINGS11020117
A. Rogozhin, A. Miakonkikh, E. Smirnova, A. A. Lomov, S. Simakin, K. Rudenko
Ruthenium thin films were deposited by plasma-enhanced atomic layer deposition (PEALD) technology using Ru(EtCp)2 and oxygen plasma on the modified surface of silicon and SiO2/Si substrates. The crystal structure, chemical composition, and morphology of films were characterized by grazing incidence XRD (GXRD), secondary ion mass spectrometry (SIMS), and atomic force microscopy (AFM) techniques, respectively. It was found that the mechanism of film growth depends crucially on the substrate temperature. The GXRD and SIMS analysis show that at substrate temperature T = 375 °C, an abrupt change in surface reaction mechanisms occurs, leading to the changing in film composition from RuO2 at low temperatures to pure Ru film at higher temperatures. It was confirmed by electrical resistivity measurements for Ru-based films. Mechanical stress in the films was also analyzed, and it was suggested that this factor increases the surface roughness of growing Ru films. The lowest surface roughness ~1.5 nm was achieved with a film thickness of 29 nm using SiO2/Si-substrate for deposition at 375 °C. The measured resistivity of Ru film is 18–19 µOhm·cm (as deposited).
采用等离子体增强原子层沉积(PEALD)技术,利用Ru(EtCp)2和氧等离子体在改性硅和SiO2/Si衬底表面沉积钌薄膜。利用掠入射x射线衍射(GXRD)、二次离子质谱(SIMS)和原子力显微镜(AFM)技术分别对薄膜的晶体结构、化学成分和形貌进行了表征。研究发现,薄膜的生长机制主要取决于衬底温度。GXRD和SIMS分析表明,在衬底温度T = 375℃时,表面反应机制发生突变,导致薄膜成分由低温下的RuO2转变为高温下的纯Ru薄膜。通过对钌基薄膜的电阻率测量证实了这一点。分析了薄膜中的机械应力,认为机械应力增加了生长Ru薄膜的表面粗糙度。采用SiO2/ si衬底在375℃下沉积,薄膜厚度为29 nm,表面粗糙度最低,为1.5 nm。Ru膜的电阻率测量值为18-19µOhm·cm(沉积状态)。
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引用次数: 4
Electrodeposited Hydroxyapatite-Based Biocoatings: Recent Progress and Future Challenges 电沉积羟基磷灰石基生物涂料:最新进展和未来挑战
Pub Date : 2021-01-19 DOI: 10.3390/COATINGS11010110
M. S. Safavi, F. Walsh, M. Surmeneva, R. Surmenev, J. Khalil-Allafi
Hydroxyapatite has become an important coating material for bioimplants, following the introduction of synthetic HAp in the 1950s. The HAp coatings require controlled surface roughness/porosity, adequate corrosion resistance and need to show favorable tribological behavior. The deposition rate must be sufficiently fast and the coating technique needs to be applied at different scales on substrates having a diverse structure, composition, size, and shape. A detailed overview of dry and wet coating methods is given. The benefits of electrodeposition include controlled thickness and morphology, ability to coat a wide range of component size/shape and ease of industrial processing. Pulsed current and potential techniques have provided denser and more uniform coatings on different metallic materials/implants. The mechanism of HAp electrodeposition is considered and the effect of operational variables on deposit properties is highlighted. The most recent progress in the field is critically reviewed. Developments in mineral substituted and included particle, composite HAp coatings, including those reinforced by metallic, ceramic and polymeric particles; carbon nanotubes, modified graphenes, chitosan, and heparin, are considered in detail. Technical challenges which deserve further research are identified and a forward look in the field of the electrodeposited HAp coatings is taken.
自20世纪50年代合成羟基磷灰石问世以来,羟基磷灰石已成为生物植入物的重要涂层材料。HAp涂层需要控制表面粗糙度/孔隙率,足够的耐腐蚀性,并需要表现出良好的摩擦学性能。沉积速度必须足够快,并且涂层技术需要在具有不同结构、成分、尺寸和形状的基底上以不同的尺度应用。对干法和湿法涂层进行了详细的概述。电沉积的优点包括控制厚度和形态,能够覆盖广泛的组件尺寸/形状以及易于工业加工。脉冲电流和电位技术在不同的金属材料/植入物上提供了更致密和更均匀的涂层。研究了HAp电沉积的机理,重点讨论了操作变量对镀层性能的影响。对该领域的最新进展进行了严格审查。矿物取代和含颗粒、复合羟基磷灰石涂层的发展,包括由金属、陶瓷和聚合物颗粒增强的羟基磷灰石涂层;碳纳米管,改性石墨烯,壳聚糖和肝素,详细考虑。指出了电沉积羟基磷灰石涂层有待进一步研究的技术难题,并对电沉积羟基磷灰石涂层的发展前景进行了展望。
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引用次数: 62
Electron Transfer through a Natural Oxide Layer on Real Metal Surfaces Occurring during Sliding with Polytetrafluoroethylene: Dependence on Heat of Formation of Metal Oxides 聚四氟乙烯滑动过程中通过真实金属表面天然氧化层的电子转移:对金属氧化物形成热的依赖
Pub Date : 2021-01-19 DOI: 10.3390/COATINGS11010109
Y. Momose
Electron emission (EE) from real metal surfaces occurring during sliding contact with a polytetrafluoroethylene (PTFE) rider has been investigated using the thermodynamic data of metal oxides and the X-ray photoelectron spectroscopy (XPS) intensity ratio of oxygen/metal on the surfaces. EE was termed triboelectron emission (TriboEE). Rolled metal sheets of 18 types were used. The metal‒oxygen bond energy calculated from the heat of the formation of metal oxide, (D(M–O)), was shown to be a key factor in dividing the EE into two routes, the so-called Schottky effect and the tunnel effect, due to the surface oxide layer. The metals in periodic groups 4 (Ti and Zr), 5 (V, Nb, and Ta), and 6 (Mo and W) maintained higher values of D(M–O), while, moving down the groups, the TriboEE intensity increased, being ascribed to the former route. In groups 10 (Ni, Pd, and Pt) and 11 (Cu, Ag, and Au), the D(M–O) values decreased moving down the groups, but the TriboEE intensity increased significantly, which can be attributed to the latter route. Furthermore, with the increase in the electrical conductivity of metals, the TriboEE intensity became remarkably high, while the D(M–O) value fell rapidly and became almost constant. The XPS results showed that the dependence of the D(M–O) and XPS metal core intensity on the O1s intensity and the XPS intensity ratio of the O1s/metal core was different between groups 10 and 11 and groups 4, 5, and 6. It was concluded that, under the electric field caused on the real metal surface by the friction with PTFE, the electron from metals with small D(M–O) values predominantly tunnels the surface oxide layer as a surface barrier, while with large D(M–O) values, the electron passes over the top of the barrier.
利用金属氧化物的热力学数据和表面上氧/金属的x射线光电子能谱(XPS)强度比,研究了实际金属表面与聚四氟乙烯(PTFE)衬垫滑动接触时发生的电子发射(EE)。EE被称为摩擦电子发射(TriboEE)。使用了18种类型的轧制金属板。根据金属氧化物的生成热计算的金属-氧键能(D(M-O))被证明是将EE分为两种路线的关键因素,即所谓的肖特基效应和隧道效应,由于表面氧化层的存在。第4族(Ti和Zr)、第5族(V、Nb和Ta)和第6族(Mo和W)的金属保持较高的D(M-O)值,而向下移动的金属的TriboEE强度增加,归因于前者的路线。在第10组(Ni, Pd, Pt)和第11组(Cu, Ag, Au)中,D(M-O)值随组的变化而降低,但TriboEE强度显著增加,可归因于后一种途径。此外,随着金属电导率的增加,TriboEE强度变得非常高,而D(M-O)值迅速下降并趋于稳定。XPS结果表明,D(M-O)和XPS金属芯强度对O1s强度的依赖性以及O1s/金属芯的XPS强度比值在第10、11组和第4、5、6组之间存在差异。结果表明,在实际金属表面与PTFE摩擦产生的电场作用下,D(M-O)值小的金属的电子主要通过表面氧化层形成表面势垒,而D(M-O)值大的金属的电子主要通过势垒顶部。
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引用次数: 0
Surface Analysis of Chamber Coating Materials Exposed to CF4/O2 Plasma 暴露于CF4/O2等离子体的腔室涂层材料表面分析
Pub Date : 2021-01-18 DOI: 10.3390/COATINGS11010105
S. Park, K. Kim, S. Hong
Coating the inner surfaces of high-powered plasma processing equipment has become crucial for reducing maintenance costs, process drift, and contaminants. The conventionally preferred alumina (Al2O3) coating has been replaced with yttria (Y2O3) due to the long-standing endurance achieved by fluorine-based etching; however, the continuous increase in radio frequency (RF) power necessitates the use of alternative coating materials to reduce process shift in a series of high-powered semiconductor manufacturing environments. In this study, we investigated the fluorine-based etching resistance of atmospheric pressure-sprayed alumina, yttria, yttrium aluminum garnet (YAG), and yttrium oxyfluoride (YOF). The prepared ceramic-coated samples were directly exposed to silicon oxide etching, and the surfaces of the plasma-exposed samples were characterized by scanning electron microscopy, energy-dispersive X-ray spectroscopy, and X-ray photoelectron spectroscopy. We found that an ideal coating material must demonstrate high plasma-induced structure distortion by the fluorine atom from the radical. For endurance to fluorine-based plasma exposure, the bonding structure with fluoride was shown to be more effective than oxide-based ceramics. Thus, fluoride-based ceramic materials can be promising candidates for chamber coating materials.
高功率等离子体处理设备的内表面涂层对于降低维护成本、工艺漂移和污染物至关重要。传统上首选的氧化铝(Al2O3)涂层已被钇(Y2O3)所取代,因为氟基蚀刻实现了长期的耐久性;然而,射频(RF)功率的不断增加需要使用替代涂层材料来减少一系列高功率半导体制造环境中的工艺转移。在本研究中,我们研究了常压喷涂氧化铝、钇、钇铝石榴石(YAG)和氧化氟化钇(YOF)的耐氟腐蚀性能。将制备的陶瓷涂层样品直接暴露于氧化硅蚀刻下,并利用扫描电镜、能量色散x射线能谱和x射线光电子能谱对等离子体暴露样品的表面进行了表征。我们发现理想的涂层材料必须表现出由自由基中的氟原子引起的高等离子体诱导结构畸变。对于氟基等离子体暴露的耐久性,与氟的键合结构被证明比氧化物基陶瓷更有效。因此,氟基陶瓷材料可以作为腔室涂层材料的有希望的候选者。
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引用次数: 9
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