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Thermomechanical stresses of 6.2 cm-diameter Czochralski-grown radiopure Li2MoO4 crystals 6.2 cm直径czochralski生长的放射性Li2MoO4晶体的热力学应力
IF 2 4区 材料科学 Q3 CRYSTALLOGRAPHY Pub Date : 2025-12-16 DOI: 10.1016/j.jcrysgro.2025.128464
C. Stelian , P. de Marcillac , A. Giuliani , M. Velazquez
Crucial experiments to discover the origin of the neutrino mass and the nature of neutrino particles require the detection of extremely rare events, such as the neutrinoless double beta (0ν2β) decay. The core of large-scale heat-scintillation cryogenic bolometers used for the detection of such rare events will be made of hundreds of 45 mm-edge cubic Li2MoO4 (LMO) single crystals. LMO crystals of diameters close to 65 mm were grown in an optimized Czochralski (Cz) furnace configuration. Cutting a 62 mm diameter ingot revealed a radial cleavage at the top of the crystal, and a small crack located at the periphery of the bottom part of the crystal. Numerical modeling of heat transfer, convection and thermal stress in this configuration was applied to investigate these small defects, which anyway have no impact on the quality of the useful part of the ingot. Numerical results show that the thermal stress is smaller than the critical value of the tensile stress (7 MPa) over the entire crystal longitudinal section, except for a small region located at the periphery of the bottom part of the ingot. This explains the small crack observed after cutting. Numerical calculations performed for a shoulder angle greater than that in the experimental case show that the average values of the thermal stress are not significantly changed.
发现中微子质量起源和中微子粒子性质的关键实验需要探测到极其罕见的事件,如无中微子双β (0ν2β)衰变。用于探测此类罕见事件的大尺度热闪烁低温热辐射计的核心将由数百个45毫米边缘的立方Li2MoO4 (LMO)单晶组成。在优化的chzochralski (Cz)炉结构中生长出直径接近65 mm的LMO晶体。切割直径为62 mm的铸锭时,晶体顶部出现径向解理,晶体底部外围出现小裂纹。采用数值模拟的方法对这种结构下的传热、对流和热应力进行了研究,这些小缺陷对铸锭有用部分的质量没有影响。数值结果表明,除了钢锭底部外围的一小部分区域外,整个结晶纵断面的热应力均小于拉应力临界值(7 MPa)。这解释了切割后观察到的小裂纹。数值计算表明,当肩角大于实验值时,热应力的平均值没有明显变化。
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引用次数: 0
Numerical modeling of traveling magnetic fields for dopant homogenization in Czochralski β-Ga2O3 growth – a feasibility study chzochralski β-Ga2O3生长中掺杂均匀化的行磁场数值模拟-可行性研究
IF 2 4区 材料科学 Q3 CRYSTALLOGRAPHY Pub Date : 2025-12-15 DOI: 10.1016/j.jcrysgro.2025.128463
Gagan Kumar Chappa, Natasha Dropka
Dopant segregation in β-Ga2O3 crystals significantly compromises device performance by causing non-uniform electrical and optical properties. This study employs three-dimensional numerical simulations to investigate the effect of a traveling magnetic field (TMF) on melt homogenization during Czochralski crystal growth.
A Multiphysics framework couples heat and species transport with magnetohydrodynamics to quantify convective mixing efficiency, with a focus on solute homogenization. Various Lorentz force density fields generated by the KRISTMAG® heaters were applied to the melt. Once the flow reached a fully developed state, a tracer was introduced to evaluate and compare stirring efficiency across the different configurations. Results indicate that TMF application substantially accelerates tracer homogenization, with the most pronounced enhancement observed at field strengths of 75–125 N/m3. In the configuration where only the crystal rotates, TMF application with a –90° phase shift reduces homogenization times by approximately 97 % (33 times) compared to baseline conditions. Similarly, in counter-rotating crystal-crucible configurations, homogenization times decreased by 63 % (2.7 times) with a +90° phase shift. These findings collectively demonstrate the feasibility of TMF application as an effective strategy for mitigating dopant segregation and enhancing crystal quality in β-Ga2O3 Czochralski growth.
β-Ga2O3晶体中的掺杂偏析会导致器件的电学和光学性质不均匀,从而严重影响器件的性能。本文采用三维数值模拟的方法研究了行磁场(TMF)对chzochralski晶体生长过程中熔体均匀化的影响。多物理场框架将热量和物质输运与磁流体动力学耦合,以量化对流混合效率,重点是溶质均质化。将KRISTMAG ~®加热器产生的各种洛伦兹力密度场应用于熔体。一旦流动达到充分发展的状态,就会引入示踪剂来评估和比较不同配置下的搅拌效率。结果表明,施用TMF显著加速了示踪剂的均匀化,在场强为75-125 N/m3时,增强效果最为明显。在只有晶体旋转的配置中,与基线条件相比,-90°相移的TMF应用可将均匀化时间减少约97%(33倍)。同样,在反向旋转的晶体坩埚结构中,当相移为+90°时,均质时间减少了63%(2.7倍)。这些发现共同证明了TMF作为减轻β-Ga2O3 Czochralski生长中掺杂偏析和提高晶体质量的有效策略的可行性。
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引用次数: 0
Crystallographic integration of highly preferred orientated peptization derived nano anatase TiO2 纳米锐钛矿TiO2的结晶学集成
IF 2 4区 材料科学 Q3 CRYSTALLOGRAPHY Pub Date : 2025-12-15 DOI: 10.1016/j.jcrysgro.2025.128462
Fariha Zannat, Md. Ashraful Alam, Raton Kumar Bishwas, Shirin Akter Jahan
Highly crystalline anatase TiO2 nanoparticles (NPs) with preferred (101) orientation were synthesized via peptization method using titanium isopropoxide (TTIP) as the precursor. The time dependent growth of anatase crystals was examined using X-ray diffraction (XRD) and transmission electron microscopy (TEM) contributing nano beam diffraction (NBD) analysis. Average crystallite size values obtained from several standard evaluation methods verified the successful formation of nanocrystalline anatase. The crystallite size of the synthesized NPs decreases with increasing the interval of time. Rietveld refinement analysis confirmed that the NPs consisted entirely of 100 % anatase phase. The anatase exhibited a high crystallinity of 74.26 %. Enhanced crystallinity, together with the obtained crystallographic parameters, confirms the successful synthesis of highly crystalline anatase with superior properties relative to the standard material. The NPs exhibited a band gap of 3.0651 eV, indicating enhanced photocatalytic activity. A zeta potential of 75.59 mV confirmed excellent colloidal stability, while TGA revealed an activation energy (Ea) of 53.22 kJ/mole, reflecting highly reactive species. NBD revealed that the atoms were preferentially oriented along the (101) crystal plane, exhibiting bright spots on the diffracted surface and a highly preferred d-spacing of 0.358 nm. The synthesized NPs also demonstrated excellent photocatalytic performance, achieving 97.5 % degradation of crystal violet dye.
以异丙酸钛(TTIP)为前驱体,采用聚合法制备了具有101取向的高结晶锐钛矿型TiO2纳米颗粒(NPs)。采用x射线衍射(XRD)和透射电子显微镜(TEM)对锐钛矿晶体生长的时间依赖性进行了研究。通过几种标准评价方法获得的平均晶粒尺寸值验证了纳米晶锐钛矿的成功形成。合成的NPs的晶粒尺寸随时间的增加而减小。Rietveld细化分析证实NPs完全由100%锐钛矿相组成。锐钛矿结晶度高达74.26%。增强的结晶度,加上获得的晶体学参数,证实了高结晶锐钛矿的成功合成,相对于标准材料具有优越的性能。NPs的带隙为3.0651 eV,表明其光催化活性增强。zeta电位为75.59 mV,具有良好的胶体稳定性;TGA活化能(Ea)为53.22 kJ/mol,反应活性强。NBD表明,原子沿(101)晶面优先取向,在衍射表面出现亮点,优选d-间距为0.358 nm。合成的NPs还表现出优异的光催化性能,对结晶紫染料的降解率达到97.5%。
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引用次数: 0
Growth and stress control of large-diameter barium fluoride crystals with heavy yttrium doping concentration for radiation detection 辐射检测用重钇掺杂大直径氟化钡晶体的生长和应力控制
IF 2 4区 材料科学 Q3 CRYSTALLOGRAPHY Pub Date : 2025-12-13 DOI: 10.1016/j.jcrysgro.2025.128460
Jing Zhang , Jiahe Li , Xiang Li , Jiawei Xu , Lili Zheng , Junfeng Chen
Barium fluoride (BaF2) crystal has received significant attention in high-energy physics due to its unique sub-ns ultrafast scintillation component. Previous studies have demonstrated that slow scintillation component in BaF2 crystal can be effectively suppressed through yttrium (Y) doping. Although crack-free growth of 10 at%Y-doped BaF2 crystals with cross-sections up to 35 × 35 mm2 have been achieved, high-concentration Y-doped BaF2 crystals with large size are difficult to obtain due to cracking arising from thermal stress and mechanical stress caused by segregation of Y. This study aims to address cracking issues in Y-doped BaF2 crystals through integrated thermophysical analysis and experimental parameter optimization. Upon comparing the thermophysical properties of undoped and Y-doped BaF2 crystals, the impact of a high concentration of Y-doping was studied quantitatively, thereby establishing a criterion for thermal field tolerance. Significantly, the critical strain threshold was determined based on experimental cracking results, from which optimized parameter boundaries were derived. Through iterative experimental refinement, we successfully achieved crack-free growth of 4-inch BaF2 crystals with 15 at%Y doping. The grown crystal exhibits good optical homogeneity, maintaining > 90% transmittance across most of the visible spectrum. This parameter optimization framework demonstrates transferability for large-scale doped crystal growth systems.
氟化钡(BaF2)晶体由于其独特的亚ns超快闪烁成分,在高能物理领域受到了广泛的关注。以往的研究表明,通过掺杂钇(Y)可以有效抑制BaF2晶体中的慢闪烁成分。虽然已经实现了10 at%的y掺杂BaF2晶体无裂纹生长,其横截面可达35 × 35 mm2,但由于y偏析引起的热应力和机械应力引起的裂纹,很难获得大尺寸的高浓度y掺杂BaF2晶体。本研究旨在通过综合热物理分析和实验参数优化来解决y掺杂BaF2晶体的裂纹问题。通过比较未掺杂和掺y的BaF2晶体的热物理性质,定量研究了高浓度y掺杂对BaF2晶体热物理性能的影响,从而建立了热场容限的判据。重要的是,根据试验开裂结果确定了临界应变阈值,并由此导出了优化参数边界。通过反复的实验改进,我们成功地实现了15 at%Y掺杂下4英寸BaF2晶体的无裂纹生长。生长的晶体表现出良好的光学均匀性,在大部分可见光谱中保持90%的透射率。该参数优化框架证明了大规模掺杂晶体生长系统的可转移性。
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引用次数: 0
Synchrotron X-ray topography investigation on dislocation propagation in heavily arsenic-doped silicon crystal necks 重砷硅晶体颈中位错扩展的同步加速器x射线形貌研究
IF 2 4区 材料科学 Q3 CRYSTALLOGRAPHY Pub Date : 2025-12-13 DOI: 10.1016/j.jcrysgro.2025.128459
A. Lankinen , T.O. Tuomi , O. Anttila , S. Sintonen , P. Kostamo , P.J. McNally , C. Paulmann
Geometric analysis of synchrotron X-ray topographs of samples cut from heavily arsenic doped silicon crystal neck were used for the determination of the directions and the Burgers vectors of dislocations, which revealed their type. Straight dislocation lines in heavily As-doped silicon neck were observed in addition to easily eliminated half-loop dislocations. The straight dislocations were more resilient and disappeared later during the neck growth. Growth of a structural crystal body proved that the neck was dislocation free, but the straight dislocations associated with the heavy As-doping likely necessitate a longer neck growth than could be used in lightly doped silicon crystals.
对重砷掺杂硅晶体颈部切割样品的同步加速器x射线形貌进行几何分析,确定了位错的方向和Burgers向量,从而揭示了它们的类型。除易消除的半环位错外,在高掺砷硅颈中还观察到直线位错线。直型脱位弹性更强,在颈部生长后期消失。结构晶体的生长证明了颈部是无位错的,但是与重砷掺杂相关的直线位错可能需要比轻掺杂硅晶体更长的颈部生长。
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引用次数: 0
β-Ga2O3 crystal growth with cold container crucibles: Large-scale oxide crystal growth from cold crucible method 用冷坩埚法生长β-Ga2O3晶体:用冷坩埚法生长大规模氧化物晶体
IF 2 4区 材料科学 Q3 CRYSTALLOGRAPHY Pub Date : 2025-12-13 DOI: 10.1016/j.jcrysgro.2025.128461
Masanori Kitahara , Taketoshi Tomida , Vladimir Kochurikhin , Gushchina Liudmila , Kei Kamada , Yasuhiro Shoji , Koichi Kakimoto , Akira Yoshikawa
Oxide crystal growth from cold crucible was applied to trial enlargement of β-Ga2O3 single crystals in both diameter and length. Using a 150-mm Cu basket with automatic diameter control, stable seeding, necking, and shoulder formation were achieved. Consequently, single crystals with diameters of up to 32 mm and body lengths of 50.8 mm (2 in.) were successfully obtained, demonstrating considerable progress in crystal scaling. X-ray rocking curve analysis confirmed the full width at half maximum values, which were comparable to those of edge-defined film-fed growth substrates. Glow discharge mass spectrometry revealed no trace of Ir, Pt, and Rh impurities. These findings highlight the oxide crystal growth from cold crucible as a scalable, contamination-free, and cost-effective method for producing large β-Ga2O3 crystals, advancing their potential for power electronic applications.
采用冷坩埚氧化晶生长法,对β-Ga2O3单晶的直径和长度进行了扩大试验。使用自动直径控制的150毫米铜篮,实现了稳定的播种、颈化和肩形。因此,成功地获得了直径达32毫米、体长50.8毫米(2英寸)的单晶,表明晶体结垢取得了相当大的进展。x射线摇摆曲线分析证实了全宽度为最大值的一半,与边缘定义的薄膜生长基质相当。辉光放电质谱分析未发现Ir、Pt和Rh杂质的痕迹。这些发现强调了在冷坩埚中生长氧化物晶体是一种可扩展的、无污染的、具有成本效益的生产大型β-Ga2O3晶体的方法,提高了它们在电力电子应用中的潜力。
{"title":"β-Ga2O3 crystal growth with cold container crucibles: Large-scale oxide crystal growth from cold crucible method","authors":"Masanori Kitahara ,&nbsp;Taketoshi Tomida ,&nbsp;Vladimir Kochurikhin ,&nbsp;Gushchina Liudmila ,&nbsp;Kei Kamada ,&nbsp;Yasuhiro Shoji ,&nbsp;Koichi Kakimoto ,&nbsp;Akira Yoshikawa","doi":"10.1016/j.jcrysgro.2025.128461","DOIUrl":"10.1016/j.jcrysgro.2025.128461","url":null,"abstract":"<div><div>Oxide crystal growth from cold crucible was applied to trial enlargement of β-Ga<sub>2</sub>O<sub>3</sub> single crystals in both diameter and length. Using a 150-mm Cu basket with automatic diameter control, stable seeding, necking, and shoulder formation were achieved. Consequently, single crystals with diameters of up to 32 mm and body lengths of 50.8 mm (2 in.) were successfully obtained, demonstrating considerable progress in crystal scaling. X-ray rocking curve analysis confirmed the full width at half maximum values, which were comparable to those of edge-defined film-fed growth substrates. Glow discharge mass spectrometry revealed no trace of Ir, Pt, and Rh impurities. These findings highlight the oxide crystal growth from cold crucible as a scalable, contamination-free, and cost-effective method for producing large β-Ga<sub>2</sub>O<sub>3</sub> crystals, advancing their potential for power electronic applications.</div></div>","PeriodicalId":353,"journal":{"name":"Journal of Crystal Growth","volume":"677 ","pages":"Article 128461"},"PeriodicalIF":2.0,"publicationDate":"2025-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145789272","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Optimizing growth interface shape in CdZnTe single crystal growth using vertical Bridgman method 垂直Bridgman法优化CdZnTe单晶生长界面形状
IF 2 4区 材料科学 Q3 CRYSTALLOGRAPHY Pub Date : 2025-12-09 DOI: 10.1016/j.jcrysgro.2025.128456
Bing Yan, Weihua Liu, Chang Yu, Pandeng Gao, Tuanjie Liang, Kaifeng Liao, Biru Jiang, Tiantai Wang, Fan Liu, Hongyu Liang, Kun Feng, Li Huang
CdZnTe (CZT) is an ideal substrate for growing HgCdTe (MCT) epitaxial layers in infrared devices. A convex growth interface is desired but is typically difficult to form during the Bridgman process of CZT crystals owing to their low thermal conductivity. Obtaining high-quality CZT single crystals with high yields remains a challenge. This study proposes a method for achieving a slightly convex interface during the CZT crystal growth process. The presence of the slightly convex interface is confirmed via Zn component mapping calibration. Single crystals were reproducibly obtained using this method, improving the crystal quality of CZT for high-performance device applications. The obtained CZT crystals were characterized via optical microscopy, infrared transmission microscopy, high-resolution X-ray diffraction, X-ray tomography (XRT), and Fourier transform infrared spectroscopy. The etch pit density of (111)-B (tellurium-polar face) CZT sliced wafers was < 4.0 × 103 cm−2. For the double-grinding wafers, the Te inclusions in the CZT volume of were sparsely distributed, and their sizes could be controlled to < 5 μm. The typical full width at half maximum of the Bragg diffraction peaks was < 18″. A uniform XRT image of (111)-B CZT polished wafers was obtained. The responsivity of the prepared mid-wave 640 × 512 MCT FPA final image was uniform, with no noticeable electro-optical clustering. Additionally, the noise-equivalent temperature difference was measured to be 14.5 mK, indicating the high quality of the as-grown CZT crystals. This study provides useful guidelines for CZT crystals growth and a promising method for reducing the current cost of commercial CZT substrates.
CdZnTe (CZT)是红外器件中生长HgCdTe (MCT)外延层的理想衬底。由于CZT晶体的低导热性,在布里奇曼过程中很难形成凸生长界面。获得高产量的高质量CZT单晶仍然是一个挑战。本研究提出了一种在CZT晶体生长过程中实现微凸界面的方法。通过Zn分量映射标定确认了微凸界面的存在。该方法可重复性地获得单晶,提高了CZT的晶体质量,可用于高性能器件。通过光学显微镜、红外透射显微镜、高分辨率x射线衍射、x射线断层扫描(XRT)和傅里叶变换红外光谱对所得CZT晶体进行了表征。(111)-B(碲极面)CZT薄片的蚀刻坑密度为4.0 × 103 cm−2。对于双磨晶片,其CZT体积中的Te夹杂物分布较为稀疏,其尺寸可控制在<; 5 μm;布拉格衍射峰的典型半峰全宽为<; 18″。获得了(111)-B CZT抛光晶片的均匀XRT图像。制备的中波640 × 512 MCT FPA最终图像响应度均匀,没有明显的光电聚类现象。此外,测得的噪声等效温差为14.5 mK,表明生长的CZT晶体质量高。该研究为CZT晶体的生长提供了有用的指导,并为降低目前商用CZT衬底的成本提供了一种有前途的方法。
{"title":"Optimizing growth interface shape in CdZnTe single crystal growth using vertical Bridgman method","authors":"Bing Yan,&nbsp;Weihua Liu,&nbsp;Chang Yu,&nbsp;Pandeng Gao,&nbsp;Tuanjie Liang,&nbsp;Kaifeng Liao,&nbsp;Biru Jiang,&nbsp;Tiantai Wang,&nbsp;Fan Liu,&nbsp;Hongyu Liang,&nbsp;Kun Feng,&nbsp;Li Huang","doi":"10.1016/j.jcrysgro.2025.128456","DOIUrl":"10.1016/j.jcrysgro.2025.128456","url":null,"abstract":"<div><div>CdZnTe (CZT) is an ideal substrate for growing HgCdTe (MCT) epitaxial layers in infrared devices. A convex growth interface is desired but is typically difficult to form during the Bridgman process of CZT crystals owing to their low thermal conductivity. Obtaining high-quality CZT single crystals with high yields remains a challenge. This study proposes a method for achieving a slightly convex interface during the CZT crystal growth process. The presence of the slightly convex interface is confirmed via Zn component mapping calibration. Single crystals were reproducibly obtained using this method, improving the crystal quality of CZT for high-performance device applications. The obtained CZT crystals were characterized via optical microscopy, infrared transmission microscopy, high-resolution X-ray diffraction, X-ray tomography (XRT), and Fourier transform infrared spectroscopy. The etch pit density of (111)-B (tellurium-polar face) CZT sliced wafers was &lt; 4.0 × 10<sup>3</sup> cm<sup>−2</sup>. For the double-grinding wafers, the Te inclusions in the CZT volume of were sparsely distributed, and their sizes could be controlled to &lt; 5 μm. The typical full width at half maximum of the Bragg diffraction peaks was &lt; 18″. A uniform XRT image of (111)-B CZT polished wafers was obtained. The responsivity of the prepared mid-wave 640 × 512 MCT FPA final image was uniform, with no noticeable electro-optical clustering. Additionally, the noise-equivalent temperature difference was measured to be 14.5 mK, indicating the high quality of the as-grown CZT crystals. This study provides useful guidelines for CZT crystals growth and a promising method for reducing the current cost of commercial CZT substrates.</div></div>","PeriodicalId":353,"journal":{"name":"Journal of Crystal Growth","volume":"676 ","pages":"Article 128456"},"PeriodicalIF":2.0,"publicationDate":"2025-12-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145733896","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A study on solid–liquid interface shape optimization and dislocation suppression for 4.5-inch InP single crystal growth based on vertical gradient freezing technique 基于垂直梯度冻结技术的4.5英寸InP单晶固液界面形状优化及位错抑制研究
IF 2 4区 材料科学 Q3 CRYSTALLOGRAPHY Pub Date : 2025-12-09 DOI: 10.1016/j.jcrysgro.2025.128458
Zhuochen Duan , Hua Wei , Dingzhang Wu , Junhong Lv , Tinglong Liu , Xueqiang Wu , Hanbao Liu , Feng Lin , Jie Yang , Feng Qiu , Shikun Pu , Feng Hui , Chong Wang
Owing to its advantages of a small axial temperature gradient and high-precision thermal field control, the Vertical Gradient Freeze (VGF) method has emerged as a mainstream technique for industrial InP single crystal growth. However, during the growth of large-sized InP crystal via VGF, defects such as twins and dislocations frequently form at the shouldering stage due to rapid crystallization area expansion, non-uniform latent heat release, and loss of control over the solid–liquid interface shape at the crystallization front. This study establishes a finite element-based physical model for 4.5-inch InP single crystal growth under unsteady thermal fields. Based on systematic growth parameter regulation and heat-transfer structure optimization, the evolution of the solid–liquid interface shape is investigated during the whole growth process. Calculated results indicate that for large-diameter crystals, the key to achieving a planar solid–liquid interface lies in adopting a slower growth rate and a lower axial temperature gradient. Under current heat exchange conditions, the crystal growth interface undergoes a dynamic evolution along the ingot axis, typically transitioning from slightly convex to relatively flat, and finally to slightly concave. Consequently, a set of thermal field structure for optimizing axial heat distribution are designed and implemented in single-crystal growth experiments. Our experimental results demonstrate consistency with the simulation, showing that the solid–liquid interface maintains a prolonged slightly convex shape in shouldering growth then shifts to a slightly concave profile in equal-diameter growth Consequently, the statistical probability of twin formation in these InP ingots undergone heat-field optimization decreases by approximately 20 % compared to those with the current-adopted heat-field.
垂直梯度冻结法(Vertical gradient Freeze, VGF)由于具有轴向温度梯度小、热场控制精度高的优点,已成为工业铟单晶生长的主流技术。然而,在VGF生长大尺寸InP晶体的过程中,由于结晶面积迅速扩大,潜热释放不均匀,结晶前沿固液界面形状失去控制,在肩带阶段往往会形成孪晶和位错等缺陷。本研究建立了非定常热场下4.5英寸InP单晶生长的有限元物理模型。基于系统的生长参数调节和传热结构优化,研究了整个生长过程中固液界面形状的演变。计算结果表明,对于大直径晶体,采用较慢的生长速率和较低的轴向温度梯度是实现平面固液界面的关键。在当前换热条件下,晶体生长界面沿铸锭轴线动态演化,通常由微凸过渡到相对平坦,最后再过渡到微凹。为此,设计并实现了一套用于单晶生长实验的轴向热分布优化的热场结构。实验结果与模拟结果一致,表明固液界面在肩形生长过程中保持长时间的微凸形状,在等径生长过程中变为微凹形状。因此,经过热场优化的InP锭中孪晶形成的统计概率比目前采用热场优化的InP锭中孪晶形成的统计概率降低了约20%。
{"title":"A study on solid–liquid interface shape optimization and dislocation suppression for 4.5-inch InP single crystal growth based on vertical gradient freezing technique","authors":"Zhuochen Duan ,&nbsp;Hua Wei ,&nbsp;Dingzhang Wu ,&nbsp;Junhong Lv ,&nbsp;Tinglong Liu ,&nbsp;Xueqiang Wu ,&nbsp;Hanbao Liu ,&nbsp;Feng Lin ,&nbsp;Jie Yang ,&nbsp;Feng Qiu ,&nbsp;Shikun Pu ,&nbsp;Feng Hui ,&nbsp;Chong Wang","doi":"10.1016/j.jcrysgro.2025.128458","DOIUrl":"10.1016/j.jcrysgro.2025.128458","url":null,"abstract":"<div><div>Owing to its advantages of a small axial temperature gradient and high-precision thermal field control, the Vertical Gradient Freeze (VGF) method has emerged as a mainstream technique for industrial InP single crystal growth. However, during the growth of large-sized InP crystal via VGF, defects such as twins and dislocations frequently form at the shouldering stage due to rapid crystallization area expansion, non-uniform latent heat release, and loss of control over the solid–liquid interface shape at the crystallization front. This study establishes a finite element-based physical model for 4.5-inch InP single crystal growth under unsteady thermal fields. Based on systematic growth parameter regulation and heat-transfer structure optimization, the evolution of the solid–liquid interface shape is investigated during the whole growth process. Calculated results indicate that for large-diameter crystals, the key to achieving a planar solid–liquid interface lies in adopting a slower growth rate and a lower axial temperature gradient. Under current heat exchange conditions, the crystal growth interface undergoes a dynamic evolution along the ingot axis, typically transitioning from slightly convex to relatively flat, and finally to slightly concave. Consequently, a set of thermal field structure for optimizing axial heat distribution are designed and implemented in single-crystal growth experiments. Our experimental results demonstrate consistency with the simulation, showing that the solid–liquid interface maintains a prolonged slightly convex shape in shouldering growth then shifts to a slightly concave profile in equal-diameter growth Consequently, the statistical probability of twin formation in these InP ingots undergone heat-field optimization decreases by approximately 20 % compared to those with the current-adopted heat-field.</div></div>","PeriodicalId":353,"journal":{"name":"Journal of Crystal Growth","volume":"676 ","pages":"Article 128458"},"PeriodicalIF":2.0,"publicationDate":"2025-12-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145733899","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Solid-phase crystallization of amorphous Ga2O3/sapphire(0001) thin films monitored using in-situ multimodal X-ray probe technique 利用原位多模态x射线探针技术监测非晶Ga2O3/蓝宝石(0001)薄膜的固相结晶
IF 2 4区 材料科学 Q3 CRYSTALLOGRAPHY Pub Date : 2025-12-09 DOI: 10.1016/j.jcrysgro.2025.128457
Daseul Ham , Seonghyun Han , Su Yong Lee , Jihye Seo , Do Young Noh , Hyon Chol Kang
We investigated the crystallization behavior and structural evolution of amorphous Ga2O3 thin films deposited on sapphire (0001) substrates via solid phase epitaxy (SPE) using a synchrotron-based in-situ multimodal X-ray probe station. Real-time X-ray diffraction (XRD) and electrical conductance measurements during post-annealing revealed that crystallization into the α-Ga2O3 phase begins at approximately 500 °C, accompanied by a marked increase in conductance owing to thermally activated carrier transport. High-resolution XRD confirmed the formation of a high-quality α-Ga2O3 film with the c-axis oriented along the surface normal and fully relaxed lattice parameters in the in-plane and out-of-plane directions. Azimuthal angle scans revealed six-fold symmetry, confirming epitaxial in-plane alignment between the α-Ga2O3 film and sapphire (0001) substrate. Rocking curve analysis yielded dislocation densities of ∼1.07 × 108 (screw) and ∼4.34 × 109 cm−2 (edge), corresponding to a total threading dislocation density of approximately 4.45 × 109 cm−2, which is comparable to previously reported values for directly grown α-Ga2O3 films. These findings demonstrate that SPE is a promising alternative to conventional epitaxy for producing high-quality α-Ga2O3 thin films. This approach enables phase-selective crystallization with excellent structural quality, without the need for high-temperature deposition or complex substrate engineering, thereby offering a viable pathway for integration into thermally sensitive device platforms.
利用同步加速器原位多模态x射线探针站,研究了采用固相外延(SPE)沉积在蓝宝石(0001)衬底上的非晶Ga2O3薄膜的结晶行为和结构演变。实时x射线衍射(XRD)和退火后的电导率测量表明,α-Ga2O3相的结晶开始于500℃左右,同时由于热激活的载流子输运,电导率显著增加。高分辨率XRD证实形成了高质量的α-Ga2O3薄膜,其c轴沿表面法线取向,晶格参数在面内和面外完全松弛。方位角扫描显示了六重对称,证实了α-Ga2O3薄膜与蓝宝石(0001)衬底之间的外延面内取向。摆动曲线分析得出位错密度为~ 1.07 × 108(螺旋)和~ 4.34 × 109 cm−2(边缘),对应于总螺纹位错密度约为4.45 × 109 cm−2,这与之前报道的直接生长α-Ga2O3薄膜的值相当。这些发现表明,SPE是制备高质量α-Ga2O3薄膜的有希望的替代传统外延的方法。这种方法可以实现具有优异结构质量的相选择结晶,而不需要高温沉积或复杂的衬底工程,从而为集成到热敏器件平台提供了可行的途径。
{"title":"Solid-phase crystallization of amorphous Ga2O3/sapphire(0001) thin films monitored using in-situ multimodal X-ray probe technique","authors":"Daseul Ham ,&nbsp;Seonghyun Han ,&nbsp;Su Yong Lee ,&nbsp;Jihye Seo ,&nbsp;Do Young Noh ,&nbsp;Hyon Chol Kang","doi":"10.1016/j.jcrysgro.2025.128457","DOIUrl":"10.1016/j.jcrysgro.2025.128457","url":null,"abstract":"<div><div>We investigated the crystallization behavior and structural evolution of amorphous Ga<sub>2</sub>O<sub>3</sub> thin films deposited on sapphire (0001) substrates via solid phase epitaxy (SPE) using a synchrotron-based <em>in-situ</em> multimodal X-ray probe station. Real-time X-ray diffraction (XRD) and electrical conductance measurements during post-annealing revealed that crystallization into the α-Ga<sub>2</sub>O<sub>3</sub> phase begins at approximately 500 °C, accompanied by a marked increase in conductance owing to thermally activated carrier transport. High-resolution XRD confirmed the formation of a high-quality α-Ga<sub>2</sub>O<sub>3</sub> film with the <em>c</em>-axis oriented along the surface normal and fully relaxed lattice parameters in the in-plane and out-of-plane directions. Azimuthal angle scans revealed six-fold symmetry, confirming epitaxial in-plane alignment between the α-Ga<sub>2</sub>O<sub>3</sub> film and sapphire (0001) substrate. Rocking curve analysis yielded dislocation densities of ∼1.07 × 10<sup>8</sup> (screw) and ∼4.34 × 10<sup>9</sup> cm<sup>−2</sup> (edge), corresponding to a total threading dislocation density of approximately 4.45 × 10<sup>9</sup> cm<sup>−2</sup>, which is comparable to previously reported values for directly grown α-Ga<sub>2</sub>O<sub>3</sub> films. These findings demonstrate that SPE is a promising alternative to conventional epitaxy for producing high-quality α-Ga<sub>2</sub>O<sub>3</sub> thin films. This approach enables phase-selective crystallization with excellent structural quality, without the need for high-temperature deposition or complex substrate engineering, thereby offering a viable pathway for integration into thermally sensitive device platforms.</div></div>","PeriodicalId":353,"journal":{"name":"Journal of Crystal Growth","volume":"676 ","pages":"Article 128457"},"PeriodicalIF":2.0,"publicationDate":"2025-12-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145733901","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Effects of Sr2+ doping on the X-ray detection properties of Cs3Cu2I5 crystal Sr2+掺杂对Cs3Cu2I5晶体x射线探测性能的影响
IF 2 4区 材料科学 Q3 CRYSTALLOGRAPHY Pub Date : 2025-12-09 DOI: 10.1016/j.jcrysgro.2025.128454
Wenjie Zhang , Qisheng Chen , Qinhua Wei , Hang Yin , Gao Tang , Suyin Zhang , Xilei Sun , Yanliang Liu , Laishun Qin
Cs3Cu2I5 single crystals are considered excellent scintillators and semiconductors for indirect and direct X-ray detection. In this paper, the strategy of heterovalent ion (Sr2+) doping was adopted to improve X-ray detection properties further. High-quality pure Cs3Cu2I5 and Sr-doped Cs3Cu2I5 single crystals were grown by the Bridgman method. The crystal structure and doping concentration was characterized using XRD, XPS and ICP-MS. The carrier mobility was increased from 0.063 cm2/Vs to 3.524 cm2/Vs while the sensitivity and detection limit of crystal were improved by doping with Sr2+. The properties of direct X-ray detection were improved while the PLQY, scintillation light yield, and energy resolution were all decreased. The defect and activation energies were investigated by thermoluminescence (TL) and variable temperature XEL. Finally, the mechanism is also discussed. The doping of Sr2+ is an effective method to tuning the performance of direct X-ray detection.
Cs3Cu2I5单晶被认为是用于间接和直接x射线探测的优秀闪烁体和半导体。本文采用异价离子(Sr2+)掺杂的策略,进一步提高了材料的x射线探测性能。采用Bridgman法制备了高质量的纯Cs3Cu2I5和sr掺杂Cs3Cu2I5单晶。采用XRD、XPS和ICP-MS对其晶体结构和掺杂浓度进行了表征。Sr2+的掺杂提高了晶体的灵敏度和检出限,载流子迁移率由0.063 cm2/Vs提高到3.524 cm2/Vs。直接x射线探测性能得到改善,但PLQY、闪烁光产率和能量分辨率均有所降低。利用热释光(TL)和变温XEL对其缺陷能和活化能进行了研究。最后,对其机理进行了探讨。Sr2+的掺杂是调整x射线直接探测性能的有效方法。
{"title":"Effects of Sr2+ doping on the X-ray detection properties of Cs3Cu2I5 crystal","authors":"Wenjie Zhang ,&nbsp;Qisheng Chen ,&nbsp;Qinhua Wei ,&nbsp;Hang Yin ,&nbsp;Gao Tang ,&nbsp;Suyin Zhang ,&nbsp;Xilei Sun ,&nbsp;Yanliang Liu ,&nbsp;Laishun Qin","doi":"10.1016/j.jcrysgro.2025.128454","DOIUrl":"10.1016/j.jcrysgro.2025.128454","url":null,"abstract":"<div><div>Cs<sub>3</sub>Cu<sub>2</sub>I<sub>5</sub> single crystals are considered excellent scintillators and semiconductors for indirect and direct X-ray detection. In this paper, the strategy of heterovalent ion (Sr<sup>2+</sup>) doping was adopted to improve X-ray detection properties further. High-quality pure Cs<sub>3</sub>Cu<sub>2</sub>I<sub>5</sub> and Sr-doped Cs<sub>3</sub>Cu<sub>2</sub>I<sub>5</sub> single crystals were grown by the Bridgman method. The crystal structure and doping concentration was characterized using XRD, XPS and ICP-MS. The carrier mobility was increased from 0.063 cm<sup>2</sup>/Vs to 3.524 cm<sup>2</sup>/Vs while the sensitivity and detection limit of crystal were improved by doping with Sr<sup>2+</sup>. The properties of direct X-ray detection were improved while the PLQY, scintillation light yield, and energy resolution were all decreased. The defect and activation energies were investigated by thermoluminescence (TL) and variable temperature XEL. Finally, the mechanism is also discussed. The doping of Sr<sup>2+</sup> is an effective method to tuning the performance of direct X-ray detection.</div></div>","PeriodicalId":353,"journal":{"name":"Journal of Crystal Growth","volume":"676 ","pages":"Article 128454"},"PeriodicalIF":2.0,"publicationDate":"2025-12-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145733898","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
期刊
Journal of Crystal Growth
全部 Geobiology Appl. Clay Sci. Geochim. Cosmochim. Acta J. Hydrol. Org. Geochem. Carbon Balance Manage. Contrib. Mineral. Petrol. Int. J. Biometeorol. IZV-PHYS SOLID EART+ J. Atmos. Chem. Acta Oceanolog. Sin. Acta Geophys. ACTA GEOL POL ACTA PETROL SIN ACTA GEOL SIN-ENGL AAPG Bull. Acta Geochimica Adv. Atmos. Sci. Adv. Meteorol. Am. J. Phys. Anthropol. Am. J. Sci. Am. Mineral. Annu. Rev. Earth Planet. Sci. Appl. Geochem. Aquat. Geochem. Ann. Glaciol. Archaeol. Anthropol. Sci. ARCHAEOMETRY ARCT ANTARCT ALP RES Asia-Pac. J. Atmos. Sci. ATMOSPHERE-BASEL Atmos. Res. Aust. J. Earth Sci. Atmos. Chem. Phys. Atmos. Meas. Tech. Basin Res. Big Earth Data BIOGEOSCIENCES Geostand. Geoanal. Res. GEOLOGY Geosci. J. Geochem. J. Geochem. Trans. Geosci. Front. Geol. Ore Deposits Global Biogeochem. Cycles Gondwana Res. Geochem. Int. Geol. J. Geophys. Prospect. Geosci. Model Dev. GEOL BELG GROUNDWATER Hydrogeol. J. Hydrol. Earth Syst. Sci. Hydrol. Processes Int. J. Climatol. Int. J. Earth Sci. Int. Geol. Rev. Int. J. Disaster Risk Reduct. Int. J. Geomech. Int. J. Geog. Inf. Sci. Isl. Arc J. Afr. Earth. Sci. J. Adv. Model. Earth Syst. J APPL METEOROL CLIM J. Atmos. Oceanic Technol. J. Atmos. Sol. Terr. Phys. J. Clim. J. Earth Sci. J. Earth Syst. Sci. J. Environ. Eng. Geophys. J. Geog. Sci. Mineral. Mag. Miner. Deposita Mon. Weather Rev. Nat. Hazards Earth Syst. Sci. Nat. Clim. Change Nat. Geosci. Ocean Dyn. Ocean and Coastal Research npj Clim. Atmos. Sci. Ocean Modell. Ocean Sci. Ore Geol. Rev. OCEAN SCI J Paleontol. J. PALAEOGEOGR PALAEOCL PERIOD MINERAL PETROLOGY+ Phys. Chem. Miner. Polar Sci. Prog. Oceanogr. Quat. Sci. Rev. Q. J. Eng. Geol. Hydrogeol. RADIOCARBON Pure Appl. Geophys. Resour. Geol. Rev. Geophys. Sediment. Geol.
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