This study utilizes Atomic Layer Deposition (ALD) technology, employing Trimethylgallium (TMG) and Ozone (O3) as precursors to fabricate Ga2O3 thin films. To enhance the crystallinity of the films, the effects of seed layers and annealing processes on the Ga2O3 thin films were investigated. High-quality β-Ga2O3 thin films were successfully grown on sapphire substrates. Experimental results indicate that directly depositing Ga2O3 on sapphire substrates did not yield satisfactory β-Ga2O3 films. To improve the crystallinity, a Ga2O3 seed layer was prepared on the sapphire substrate, and high-temperature annealing was employed to promote crystallization of the Ga2O3 seed layer, providing artificial nucleation sites for subsequent thin film deposition. The influence of the annealing temperature and seed layer thickness on the quality of the secondary Ga2O3 films was also studied. It was found that a seed layer with a thickness of 16.5 nm, followed by annealing at 1000 °C, resulted in Ga2O3 films with optimal crystallinity. After the deposition of the thin film, post-deposition annealing was performed to investigate the effects of annealing temperature on the structural and optical properties of the Ga2O3 films. The results show that with increasing annealing temperature, the optical band gap of the films enlarged, the proportion of high-valence gallium increased, and the crystallinity improved. Thus, it can be concluded that optimized annealing conditions lead to higher quality Ga2O3 films. The optical band gap of the Ga2O3 film treated with 30 min of annealing reached its maximum value of approximately 5.24 eV. Under a 5 V bias, the photocurrent was 1.9 × 10−4 A, the dark current was 4.9 × 10−7 A, and the photo-dark ratio was 388, which showed significant improvement compared to the as-deposited sample. At a 10 V bias, the device’s response time (τx) was 0.3 s, and its decay time (τd) was 0.28 s.
扫码关注我们
求助内容:
应助结果提醒方式:
