首页 > 最新文献

Journal of Crystal Growth最新文献

英文 中文
MOCVD/MOVPE epitaxy of group III-V nitride with atomistic Prospective & cost Effectiveness 利用原子论前瞻性和成本效益对 III-V 族氮化物进行 MOCVD/MOVPE 外延
IF 1.7 4区 材料科学 Q3 CRYSTALLOGRAPHY Pub Date : 2024-10-28 DOI: 10.1016/j.jcrysgro.2024.127975
P.K. Saxena, P. Srivastava, Anshika Srivastava
The present study deals with the comparison between two procedures of AlN epitaxy: the Si (111) surface without and with a predose of TMAl. The variation in growth temperature is examined in the samples of both procedures. The use of the pulsed atomic-layer epitaxy (PALE) technique has also been demonstrated successfully to justify the experimental evidence. It was found that PALE is one of the most promising techniques to address the issues associated with the perplexing and controversial question of the initial nucleation process—TMAl or NH3—first, with the capability to overcome the parasitic gas phase chemical kinetics. The reproduction of the MOCVD/MOVPE experimental growth processes pertaining to AlN buffer layer growth on Si (111) substrate is done through simulation. The work also reviews the previously reported modeling approaches of MOCVD reactor, geometry dependent gas phase chemical kinetics and surface diffusion processes involved in growing films. Synergistic use of different aspects to model an entire film’s growth is carried out within the framework of the TNL-EpiGrow simulator software. Additionally, the simulation results have been matched with the experimental results, and good agreement has been achieved among them, indicating the reliability of the simulations. The TNL-EpiGrow simulator helps in better understanding the MOCVD/MOVPE growth mechanism at atomistic scale and to achieve the optimum growth conditions of group III-V nitrides, thus, helps in reduction of the epitaxy experimentation cost. The simulation studies of different AlN MOCVD growth processes provide valuable and deeper insight, which is generally not available. The simulation studies used MOCVD AIXTRON 200/4 RF-S horizontal flow reactor geometry architecture in all the cases. The major issue of gas phase parasitic reactions, the impact of variations in temperature, and the V/III ratio on the crystal quality of the film has been examined in details. The pulsed atomic-layer epitaxy (PALE) technique implemented in the TNL-EpiGrow simulator was exploited to examine the improvement in the crystal quality. The TNL-Chemical Kinetics utility package is exploited to simulate gas and surface phase chemical reactions. The adsorption, hopping, and desorption mechanism rates are computed using kinetic Monte Carlo (kMC) algorithms implemented in the TNL-EpiGrow simulator to reproduce the real MOCVD reactor based deposition experiments.
本研究比较了两种氮化铝外延方法:在硅 (111) 表面不添加和添加 TMAl 的情况下。这两种方法都对样品生长温度的变化进行了研究。脉冲原子层外延(PALE)技术的使用也成功证明了实验证据的正确性。研究发现,脉冲原子层外延技术是最有希望解决与初始成核过程(TMAl 或 NH3-first)这一令人困惑和有争议的问题相关的技术之一,它能够克服寄生气相化学动力学。通过模拟再现了有关在硅(111)基底上生长 AlN 缓冲层的 MOCVD/MOVPE 实验生长过程。该研究还回顾了之前报道的 MOCVD 反应器建模方法、与几何形状相关的气相化学动力学以及薄膜生长过程中涉及的表面扩散过程。在 TNL-EpiGrow 模拟器软件的框架内,利用不同方面的协同作用来模拟整个薄膜的生长过程。此外,模拟结果与实验结果进行了比对,两者之间取得了良好的一致性,这表明模拟结果是可靠的。TNL-EpiGrow 模拟器有助于更好地理解原子尺度的 MOCVD/MOVPE 生长机理,实现 III-V 族氮化物的最佳生长条件,从而有助于降低外延实验成本。对不同 AlN MOCVD 生长过程的模拟研究提供了宝贵而深入的见解,而这些见解通常是无法获得的。模拟研究在所有情况下都使用了 MOCVD AIXTRON 200/4 RF-S 水平流反应器几何结构。详细研究了气相寄生反应、温度变化和 V/III 比率对薄膜晶体质量的影响等主要问题。利用 TNL-EpiGrow 模拟器实施的脉冲原子层外延(PALE)技术,研究了晶体质量的改善情况。TNL 化学动力学工具包用于模拟气相和表相化学反应。使用 TNL-EpiGrow 模拟器中实施的动力学蒙特卡罗(kMC)算法计算吸附、跳跃和解吸机制速率,以再现基于 MOCVD 反应器的真实沉积实验。
{"title":"MOCVD/MOVPE epitaxy of group III-V nitride with atomistic Prospective & cost Effectiveness","authors":"P.K. Saxena,&nbsp;P. Srivastava,&nbsp;Anshika Srivastava","doi":"10.1016/j.jcrysgro.2024.127975","DOIUrl":"10.1016/j.jcrysgro.2024.127975","url":null,"abstract":"<div><div>The present study deals with the comparison between two procedures of AlN epitaxy: the Si (111) surface without and with a predose of TMAl. The variation in growth temperature is examined in the samples of both procedures. The use of the pulsed atomic-layer epitaxy (PALE) technique has also been demonstrated successfully to justify the experimental evidence. It was found that PALE is one of the most promising techniques to address the issues associated with the perplexing and controversial question of the initial nucleation process—TMAl or NH<sub>3</sub>—first, with the capability to overcome the parasitic gas phase chemical kinetics. The reproduction of the MOCVD/MOVPE experimental growth processes pertaining to AlN buffer layer growth on Si (111) substrate is done through simulation. The work also reviews the previously reported modeling approaches of MOCVD reactor, geometry dependent gas phase chemical kinetics and surface diffusion processes involved in growing films. Synergistic use of different aspects to model an entire film’s growth is carried out within the framework of the TNL-EpiGrow simulator software. Additionally, the simulation results have been matched with the experimental results, and good agreement has been achieved among them, indicating the reliability of the simulations. The TNL-EpiGrow simulator helps in better understanding the MOCVD/MOVPE growth mechanism at atomistic scale and to achieve the optimum growth conditions of group III-V nitrides, thus, helps in reduction of the epitaxy experimentation cost. The simulation studies of different AlN MOCVD growth processes provide valuable and deeper insight, which is generally not available. The simulation studies used MOCVD AIXTRON 200/4 RF-S horizontal flow reactor geometry architecture in all the cases. The major issue of gas phase parasitic reactions, the impact of variations in temperature, and the V/III ratio on the crystal quality of the film has been examined in details. The pulsed atomic-layer epitaxy (PALE) technique implemented in the TNL-EpiGrow simulator was exploited to examine the improvement in the crystal quality. The TNL-Chemical Kinetics utility package is exploited to simulate gas and surface phase chemical reactions. The adsorption, hopping, and desorption mechanism rates are computed using kinetic Monte Carlo (kMC) algorithms implemented in the TNL-EpiGrow simulator to reproduce the real MOCVD reactor based deposition experiments.</div></div>","PeriodicalId":353,"journal":{"name":"Journal of Crystal Growth","volume":"650 ","pages":"Article 127975"},"PeriodicalIF":1.7,"publicationDate":"2024-10-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142652418","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Pre-planting amorphous carbon films based on Ir composite substrates for diamond nucleation 基于 Ir 复合基底的预植非晶碳薄膜,用于金刚石成核
IF 1.7 4区 材料科学 Q3 CRYSTALLOGRAPHY Pub Date : 2024-10-26 DOI: 10.1016/j.jcrysgro.2024.127945
Junfeng Li , Bing Zhou , D.G. Piliptsou , Hui Sun , Yanxia Wu , Hongjun Hei , Jie Gao , Shengwang Yu
A tunable locally ordered amorphous carbon layer was pre-implanted on the iridium (Ir) composite substrate using a multi-excitation source plasma coating system. The nucleation interface was mainly studied by scanning electron microscopy, Raman spectroscopy, and X-ray photoelectron spectroscopy. The results show that by designing and modulating the content and ordering of sp2/sp3 hybridized carbon bonds in the amorphous carbon on the surface of Ir thin films, an overall ordered diamond nucleation layer was obtained. When the pulse frequency of the carbon source was regulated to 9 Hz, the (100) diamond grains were uniformly aligned without the appearance of twins after 4 h of growth, and the nucleation density was 7.5 × 109 cm−2, which was subsequently expected to obtain single-crystal diamond by grain boundary annihilation. Based on the Ir-amorphous carbon pre-growth layer, it can accelerate the dissolution-precipitation process of carbon ions into the Ir film to form a supersaturated solid solution during the bias nucleation, and increase the nucleation sites, which is of great significance for improving the nucleation density of large-size single-crystal diamond heterogeneous epitaxy.
利用多激发源等离子涂层系统在铱(Ir)复合基底上预先植入了可调局部有序非晶碳层。主要通过扫描电子显微镜、拉曼光谱和 X 射线光电子能谱对成核界面进行了研究。结果表明,通过设计和调节 Ir 薄膜表面无定形碳中 sp2/sp3 杂化碳键的含量和有序度,可以获得整体有序的金刚石成核层。当调节碳源的脉冲频率为 9 Hz 时,经过 4 h 的生长,(100)金刚石晶粒均匀排列,没有出现孪晶,成核密度为 7.5 × 109 cm-2,随后有望通过晶界湮灭获得单晶金刚石。基于Ir-非晶碳预生长层,可以在偏核过程中加速碳离子在Ir膜中的溶解-沉淀过程,形成过饱和固溶体,增加成核位点,对提高大尺寸单晶金刚石异质外延的成核密度具有重要意义。
{"title":"Pre-planting amorphous carbon films based on Ir composite substrates for diamond nucleation","authors":"Junfeng Li ,&nbsp;Bing Zhou ,&nbsp;D.G. Piliptsou ,&nbsp;Hui Sun ,&nbsp;Yanxia Wu ,&nbsp;Hongjun Hei ,&nbsp;Jie Gao ,&nbsp;Shengwang Yu","doi":"10.1016/j.jcrysgro.2024.127945","DOIUrl":"10.1016/j.jcrysgro.2024.127945","url":null,"abstract":"<div><div>A tunable locally ordered amorphous carbon layer was pre-implanted on the iridium (Ir) composite substrate using a multi-excitation source plasma coating system. The nucleation interface was mainly studied by scanning electron microscopy, Raman spectroscopy, and X-ray photoelectron spectroscopy. The results show that by designing and modulating the content and ordering of sp<sup>2</sup>/sp<sup>3</sup> hybridized carbon bonds in the amorphous carbon on the surface of Ir thin films, an overall ordered diamond nucleation layer was obtained. When the pulse frequency of the carbon source was regulated to 9 Hz, the (100) diamond grains were uniformly aligned without the appearance of twins after 4 h of growth, and the nucleation density was 7.5 × 10<sup>9</sup> cm<sup>−2</sup>, which was subsequently expected to obtain single-crystal diamond by grain boundary annihilation. Based on the Ir-amorphous carbon pre-growth layer, it can accelerate the dissolution-precipitation process of carbon ions into the Ir film to form a supersaturated solid solution during the bias nucleation, and increase the nucleation sites, which is of great significance for improving the nucleation density of large-size single-crystal diamond heterogeneous epitaxy.</div></div>","PeriodicalId":353,"journal":{"name":"Journal of Crystal Growth","volume":"649 ","pages":"Article 127945"},"PeriodicalIF":1.7,"publicationDate":"2024-10-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142537022","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Fokker-Planck equation for the crystal-size probability density in progressive nucleation and growth with application to lognormal, Gaussian and gamma distributions 渐进成核和生长过程中晶体尺寸概率密度的福克-普朗克方程及其在对数正态分布、高斯分布和伽马分布中的应用
IF 1.7 4区 材料科学 Q3 CRYSTALLOGRAPHY Pub Date : 2024-10-24 DOI: 10.1016/j.jcrysgro.2024.127970
M. Tomellini , M. De Angelis
The Fokker Planck (FP) equation for the probability density function (PDF) of crystal size in phase transformations ruled by progressive nucleation and growth, has been derived. Crystals are grouped in sub-sets, we refer to as τ-crystals, where τ is the birth time of the set. It is shown that the size PDF is the superposition of the PDF of the crystal sub-sets (τ-PDFs), with weight given by the nucleation rate. The growth and diffusion coefficients entering the FP equations are estimated as a function of both τ-PDFs and nucleation rate. The functional form of these coefficients is studied for solutions of the FP equation for τ-crystals given by the lognormal, Gaussian and gamma distributions. For the first two distributions, the effect of fluctuations, nucleation rate and growth rate, on the shape of the distribution has been investigated. It is shown that for an exponential decay of the fluctuation term, the shape of the PDF is mainly governed by both the time constant for nucleation and the strength of the fluctuation. It is found that τ-PDFs given by the one-parameter gamma distributions are suitable to deal with KJMA (Kolmogorov Johnson Mehl Avrami) compliant phase transformations, where the fluctuation term is proportional to crystal size. The connection between the FP equation for the size PDF and the evolution equation for the density of crystal populations is also discussed.
福克-普朗克(FP)方程推导出了在渐进成核和生长的相变过程中晶体尺寸的概率密度函数(PDF)。晶体被分组为子集,我们称之为 τ 晶体,其中 τ 是子集的诞生时间。研究表明,尺寸 PDF 是晶体子集(τ-PDF)PDF 的叠加,其权重由成核率决定。进入 FP 方程的生长和扩散系数是作为 τ-PDFs 和成核率的函数估算的。针对对数正态分布、高斯分布和伽马分布给出的 τ 晶体 FP 方程的解,研究了这些系数的函数形式。对于前两种分布,研究了波动、成核率和生长率对分布形状的影响。研究表明,对于指数衰减的波动项,PDF 的形状主要受成核时间常数和波动强度的影响。研究发现,由单参数伽马分布给出的 τ-PDF 适合于处理 KJMA(Kolmogorov Johnson Mehl Avrami)顺应相变,其中波动项与晶体尺寸成正比。此外,还讨论了尺寸 PDF 的 FP 方程与晶体群密度演化方程之间的联系。
{"title":"Fokker-Planck equation for the crystal-size probability density in progressive nucleation and growth with application to lognormal, Gaussian and gamma distributions","authors":"M. Tomellini ,&nbsp;M. De Angelis","doi":"10.1016/j.jcrysgro.2024.127970","DOIUrl":"10.1016/j.jcrysgro.2024.127970","url":null,"abstract":"<div><div>The Fokker Planck (FP) equation for the probability density function (PDF) of crystal size in phase transformations ruled by progressive nucleation and growth, has been derived. Crystals are grouped in sub-sets, we refer to as <span><math><mi>τ</mi></math></span>-crystals, where <span><math><mi>τ</mi></math></span> is the birth time of the set. It is shown that the size PDF is the superposition of the PDF of the crystal sub-sets (<span><math><mi>τ</mi></math></span>-PDFs), with weight given by the nucleation rate. The growth and diffusion coefficients entering the FP equations are estimated as a function of both <span><math><mi>τ</mi></math></span>-PDFs and nucleation rate. The functional form of these coefficients is studied for solutions of the FP equation for <span><math><mi>τ</mi></math></span>-crystals given by the lognormal, Gaussian and gamma distributions. For the first two distributions, the effect of fluctuations, nucleation rate and growth rate, on the shape of the distribution has been investigated. It is shown that for an exponential decay of the fluctuation term, the shape of the PDF is mainly governed by both the time constant for nucleation and the strength of the fluctuation. It is found that <span><math><mi>τ</mi></math></span>-PDFs given by the one-parameter gamma distributions are suitable to deal with KJMA (Kolmogorov Johnson Mehl Avrami) compliant phase transformations, where the fluctuation term is proportional to crystal size. The connection between the FP equation for the size PDF and the evolution equation for the density of crystal populations is also discussed.</div></div>","PeriodicalId":353,"journal":{"name":"Journal of Crystal Growth","volume":"650 ","pages":"Article 127970"},"PeriodicalIF":1.7,"publicationDate":"2024-10-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142652526","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Establishment of Multi-Physics coupling model and analysis on thermal stress and crack risk in directional growth of TiAl alloys under electromagnetic confinement 建立多物理场耦合模型,分析电磁约束下钛铝合金定向生长的热应力和裂纹风险
IF 1.7 4区 材料科学 Q3 CRYSTALLOGRAPHY Pub Date : 2024-10-24 DOI: 10.1016/j.jcrysgro.2024.127969
Jiaxin Li, Jun Shen, Shaokai Zheng, Jiajun Zhao, Wei Wang, Xudong Wang, Zengdi Li, Xiaoyu Gao
The electromagnetic confinement directional solidification (EMCDS) technique is an optimal method for preparing large-size and non-contamination directional TiAl alloy crystals. Despite its advantages, the high temperature gradient inherent to this process induces thermal stress within the ingot, which increases the risk of cracking. To address this challenge, an innovative Integrated Multi-Physics Coupling Model was established to map and study the thermal stress field during EMCDS in this study. It synchronized the computation of the electromagnetic field, temperature field, solute field, flow field, and stress field during the crystal growth of TiAl alloy, and its high accuracy was proved by the micro-indentation experiment. Our analysis reveals that transverse temperature differences are crucial in inducing thermal stresses, and identifies that hot cracks and cold cracks are prone to occur respectively at the area of radial 23R along the sample (X = 23R) and on the sample surface, which aligns with experimental observations impressively. This model can more accurately and efficiently optimize the process parameters of the EMCDS process to avoid cracks and promote its industrial application.
电磁约束定向凝固(EMCDS)技术是制备大尺寸、无污染定向钛铝合金晶体的最佳方法。尽管该工艺具有诸多优点,但其固有的高温梯度会在铸锭内部产生热应力,从而增加开裂的风险。为应对这一挑战,本研究建立了一个创新的集成多物理场耦合模型,用于绘制和研究 EMCDS 过程中的热应力场。该模型同步计算了 TiAl 合金晶体生长过程中的电磁场、温度场、溶质场、流场和应力场,其高精度得到了显微压痕实验的证实。我们的分析表明,横向温差是诱发热应力的关键,并确定热裂纹和冷裂纹分别易发生在沿样品径向 23R 的区域(X = 23R)和样品表面,这与实验观察结果惊人地一致。该模型可以更准确、更有效地优化 EMCDS 工艺参数,避免裂纹的产生,促进其工业应用。
{"title":"Establishment of Multi-Physics coupling model and analysis on thermal stress and crack risk in directional growth of TiAl alloys under electromagnetic confinement","authors":"Jiaxin Li,&nbsp;Jun Shen,&nbsp;Shaokai Zheng,&nbsp;Jiajun Zhao,&nbsp;Wei Wang,&nbsp;Xudong Wang,&nbsp;Zengdi Li,&nbsp;Xiaoyu Gao","doi":"10.1016/j.jcrysgro.2024.127969","DOIUrl":"10.1016/j.jcrysgro.2024.127969","url":null,"abstract":"<div><div>The electromagnetic confinement directional solidification (EMCDS) technique is an optimal method for preparing large-size and non-contamination directional TiAl alloy crystals. Despite its advantages, the high temperature gradient inherent to this process induces thermal stress within the ingot, which increases the risk of cracking. To address this challenge, an innovative Integrated Multi-Physics Coupling Model was established to map and study the thermal stress field during EMCDS in this study. It synchronized the computation of the electromagnetic field, temperature field, solute field, flow field, and stress field during the crystal growth of TiAl alloy, and its high accuracy was proved by the micro-indentation experiment. Our analysis reveals that transverse temperature differences are crucial in inducing thermal stresses, and identifies that hot cracks and cold cracks are prone to occur respectively at the area of radial <span><math><mrow><mfrac><mn>2</mn><mn>3</mn></mfrac><mi>R</mi></mrow></math></span> along the sample (X = <span><math><mrow><mfrac><mn>2</mn><mn>3</mn></mfrac><mi>R</mi></mrow></math></span>) and on the sample surface, which aligns with experimental observations impressively. This model can more accurately and efficiently optimize the process parameters of the EMCDS process to avoid cracks and promote its industrial application.</div></div>","PeriodicalId":353,"journal":{"name":"Journal of Crystal Growth","volume":"649 ","pages":"Article 127969"},"PeriodicalIF":1.7,"publicationDate":"2024-10-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142537024","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Relationship between temperature gradient and growth rate during CZ silicon crystal growth CZ 硅晶体生长过程中的温度梯度与生长速度之间的关系
IF 1.7 4区 材料科学 Q3 CRYSTALLOGRAPHY Pub Date : 2024-10-24 DOI: 10.1016/j.jcrysgro.2024.127942
Shin-ichi Nishizawa
Temperature distribution in the growing crystal is the most important parameter that determines the grown-in-defects, growth rate, etc. There is a discussion either higher growth rate leads to larger thermal gradient or smaller thermal gradient. In this study, in order to make clear the reason of this discrepancy, the effects of growth rate on the shape of melt/crystal interface, and temperature distribution in growing crystal were investigated by numerical modeling. Firstly, as increasing the growth rate, the shape of melt/crystal interface becomes more concave. And temperature gradient along center axis on growing crystal increases as increasing the growth rate. On the other hand, temperature gradient along surface of growing crystal decreases as increasing the growth rate. To obtain higher growth rate, heat transfer should be enhanced. Along the center axis, heat transfer in vertical direction by heat conduction is dominant. Then concave interface shape and larger thermal gradient along center axis were obtained. In the periphery of grown crystal near the triple points, because of concave interface shape, heat transfer in radial direction, and radiative heat transfer from growing crystal become more important than heat transfer in vertical direction. Then smaller thermal gradient along the growing crystal surface was obtained. This surface temperature profile agrees well with Abe’s measurement results. It is cleared that higher growth rate leads to the higher heat transfer, and melt/crystal interface shape, and temperature distribution in growing crystal are determined by the balance of growth rate and heat transfer between heat conduction in vertical direction and heat conduction in radial direction combined with radiation heat transfer from crystal surface.
生长晶体中的温度分布是决定生长缺陷、生长速度等的最重要参数。对于生长速率越高导致热梯度越大还是越小导致热梯度越大,一直存在争议。在本研究中,为了明确造成这种差异的原因,我们通过数值建模研究了生长速率对熔体/晶体界面形状以及生长晶体中温度分布的影响。首先,随着生长速率的增加,熔体/晶体界面的形状变得更加凹陷。随着生长速率的增加,生长晶体上沿中心轴的温度梯度也随之增加。另一方面,沿生长晶体表面的温度梯度随着生长率的增加而减小。要获得更高的生长率,就必须加强传热。沿着中心轴,热传导在垂直方向上的传热占主导地位。因此,沿中心轴的界面呈凹形,热梯度较大。在生长晶体外围靠近三重点的地方,由于界面呈凹形,径向传热和生长晶体的辐射传热比垂直方向传热更重要。因此,沿生长晶体表面的热梯度较小。这一表面温度曲线与 Abe 的测量结果非常吻合。由此可见,生长速率越高,热量传递越多,熔体/晶体的界面形状以及生长晶体的温度分布取决于生长速率和热量传递之间的平衡,即垂直方向的热传导、径向方向的热传导以及晶体表面的辐射传热。
{"title":"Relationship between temperature gradient and growth rate during CZ silicon crystal growth","authors":"Shin-ichi Nishizawa","doi":"10.1016/j.jcrysgro.2024.127942","DOIUrl":"10.1016/j.jcrysgro.2024.127942","url":null,"abstract":"<div><div>Temperature distribution in the growing crystal is the most important parameter that determines the grown-in-defects, growth rate, etc. There is a discussion either higher growth rate leads to larger thermal gradient or smaller thermal gradient. In this study, in order to make clear the reason of this discrepancy, the effects of growth rate on the shape of melt/crystal interface, and temperature distribution in growing crystal were investigated by numerical modeling. Firstly, as increasing the growth rate, the shape of melt/crystal interface becomes more concave. And temperature gradient along center axis on growing crystal increases as increasing the growth rate. On the other hand, temperature gradient along surface of growing crystal decreases as increasing the growth rate. To obtain higher growth rate, heat transfer should be enhanced. Along the center axis, heat transfer in vertical direction by heat conduction is dominant. Then concave interface shape and larger thermal gradient along center axis were obtained. In the periphery of grown crystal near the triple points, because of concave interface shape, heat transfer in radial direction, and radiative heat transfer from growing crystal become more important than heat transfer in vertical direction. Then smaller thermal gradient along the growing crystal surface was obtained. This surface temperature profile agrees well with Abe’s measurement results. It is cleared that higher growth rate leads to the higher heat transfer, and melt/crystal interface shape, and temperature distribution in growing crystal are determined by the balance of growth rate and heat transfer between heat conduction in vertical direction and heat conduction in radial direction combined with radiation heat transfer from crystal surface.</div></div>","PeriodicalId":353,"journal":{"name":"Journal of Crystal Growth","volume":"649 ","pages":"Article 127942"},"PeriodicalIF":1.7,"publicationDate":"2024-10-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142537058","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Diffracting crystals of an intrinsically disordered protein (IDP) AtPP16-1 grown in 1.3 V cm−1 DC field 在 1.3 V cm-1 直流电场中生长的本征无序蛋白 (IDP) AtPP16-1 衍射晶体
IF 1.7 4区 材料科学 Q3 CRYSTALLOGRAPHY Pub Date : 2024-10-24 DOI: 10.1016/j.jcrysgro.2024.127959
Noorul Huda, Halavath Ramesh, Abani K. Bhuyan
DC electric field as weak as ∼1.3 V cm−1 induces crystal nucleation in very dilute protein solutions lacking precipitant. The basis of such growth is the microscopic model of interaction of protein dipoles with the Stark field, leading to glass-like amorphous aggregation and reconfiguration of the aggregates for crystal nucleation. This modest approach is very different from an earlier and rather ‘aggressive’ one in which electric field of ∼1 kV or orders of magnitude in excess is used to influence charge migration in a highly concentrated protein solution having precipitant confined to the crystallization drop. As an application of the precipitant-lacking ultralow protein method, the present work seeks the assistance of internally supplied 1.3 V cm−1 DC field to crystallize an intrinsically disordered protein (IDP) called AtPP16-1 in a 0.017 mg mL−1 solution. Crystallization is allowed in cuvette cells of spectrometers with online electric field, enabling measurement of real time changes in spectral features. The average crystal size increases with the time of passage of the electric field, from ∼0.042 at 10 min to 0.165 µm at the end of 300 min. The cubic crystals diffract electron and X-ray. Electron diffraction spot indexing yields lattice spacing dhkl ∼ 2.85 Å, consistent with 2.88 Å found from powder X-ray diffraction analysis. This level of lattice spacing will correspond to moderately resolved crystal structure of the IDP.
在缺乏沉淀剂的极稀薄蛋白质溶液中,弱至 1.3 V cm-1 的直流电场可诱导晶体成核。这种生长的基础是蛋白质偶极子与斯塔克电场相互作用的微观模型,它导致玻璃状无定形聚集,并重新配置聚集体以形成晶体核。这种适度的方法与早期相当 "激进 "的方法截然不同,早期的方法是在高浓度蛋白质溶液中使用 1 kV 或更高数量级的电场来影响电荷迁移,而沉淀剂则被限制在结晶滴中。作为缺乏沉淀剂的超低蛋白质方法的一种应用,本研究工作寻求内部提供的 1.3 V cm-1 直流电场的帮助,以结晶 0.017 mg mL-1 溶液中名为 AtPP16-1 的本征无序蛋白 (IDP)。结晶可在具有在线电场的光谱仪的比色池中进行,从而能够测量光谱特征的实时变化。晶体的平均尺寸随电场通过时间的增加而增大,从 10 分钟时的 0.042 微米增至 300 分钟结束时的 0.165 微米。立方晶体可衍射电子和 X 射线。电子衍射光斑索引得出的晶格间距 dhkl ∼ 2.85 Å,与粉末 X 射线衍射分析得出的 2.88 Å 一致。这种晶格间距相当于 IDP 的中等分辨率晶体结构。
{"title":"Diffracting crystals of an intrinsically disordered protein (IDP) AtPP16-1 grown in 1.3 V cm−1 DC field","authors":"Noorul Huda,&nbsp;Halavath Ramesh,&nbsp;Abani K. Bhuyan","doi":"10.1016/j.jcrysgro.2024.127959","DOIUrl":"10.1016/j.jcrysgro.2024.127959","url":null,"abstract":"<div><div>DC electric field as weak as ∼1.3 V cm<sup>−1</sup> induces crystal nucleation in very dilute protein solutions lacking precipitant. The basis of such growth is the microscopic model of interaction of protein dipoles with the Stark field, leading to glass-like amorphous aggregation and reconfiguration of the aggregates for crystal nucleation. This modest approach is very different from an earlier and rather ‘aggressive’ one in which electric field of ∼1 kV or orders of magnitude in excess is used to influence charge migration in a highly concentrated protein solution having precipitant confined to the crystallization drop. As an application of the precipitant-lacking ultralow protein method, the present work seeks the assistance of internally supplied 1.3 V cm<sup>−1</sup> DC field to crystallize an intrinsically disordered protein (IDP) called <em>At</em>PP16-1 in a 0.017 mg mL<sup>−1</sup> solution. Crystallization is allowed in cuvette cells of spectrometers with online electric field, enabling measurement of real time changes in spectral features. The average crystal size increases with the time of passage of the electric field, from ∼0.042 at 10 min to 0.165 µm at the end of 300 min. The cubic crystals diffract electron and X-ray. Electron diffraction spot indexing yields lattice spacing <em>d<sub>hkl</sub></em> ∼ 2.85 Å, consistent with 2.88 Å found from powder X-ray diffraction analysis. This level of lattice spacing will correspond to moderately resolved crystal structure of the IDP.</div></div>","PeriodicalId":353,"journal":{"name":"Journal of Crystal Growth","volume":"649 ","pages":"Article 127959"},"PeriodicalIF":1.7,"publicationDate":"2024-10-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142537057","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Investigation of the effect of the flow rate of coolant on the kinetics of carbon dioxide hydrate growth using sigmoidal growth model 利用曲线生长模型研究冷却剂流速对二氧化碳水合物生长动力学的影响
IF 1.7 4区 材料科学 Q3 CRYSTALLOGRAPHY Pub Date : 2024-10-24 DOI: 10.1016/j.jcrysgro.2024.127960
Shaghayegh Jahangiri, Fashad Varaminian
Relaxation time plays a crucial role in studying reaction kinetics and other processes. This study addresses the importance of relaxation time and suggests methods to minimize it. In this article, we adjust the relaxation time by extracting heat from the hydrate formation process through variations in the flow rate of the cooling fluid. It has been demonstrated that heat transfer plays a dominant role in this process. The kinetics of carbon dioxide hydrate growth were evaluated by increasing the flow rate of cooling fluid using modified sigmoidal growth curve equations, including Logistics and Gompertz. It was conducted a nonlinear least-squares regression analysis to fit sigmoidal functions to the cumulative formation curves of hydrate generated from gas uptake in the static reactor over time. The percentage of error between Areal and Amodel shows that the Gompertz model with Q = 14.59 Lit/min at T = 276 K and Q = 20.25 Lit/min at T = 277 K is the best model for predicting the maximum consumption capacity of CO2. The results also showed that increasing the cooling fluid’s flow rate reduces relaxation time at any temperature. Moreover, increasing the flow rate of the cooling fluid decreased the average relaxation time by 2 % to 60 % at T = 276 K and by 7 % to 22 % at T = 277 K compared to the lowest investigated flow rate. Additionally, reducing the experimental temperature while keeping the flow rate of the cooling fluid constant led to a reduction in the relaxation time.
弛豫时间在研究反应动力学和其他过程中起着至关重要的作用。本研究探讨了弛豫时间的重要性,并提出了尽量缩短弛豫时间的方法。在本文中,我们通过改变冷却液的流速从水合物形成过程中提取热量来调整弛豫时间。事实证明,热传递在这一过程中起着主导作用。通过增加冷却流体的流速,使用修正的西格码增长曲线方程(包括 Logistics 和 Gompertz)评估了二氧化碳水合物的增长动力学。进行了非线性最小二乘回归分析,以拟合静态反应器中气体吸收产生的水合物随时间变化的累积形成曲线的 sigmoidal 函数。Areal 与 Amodel 之间的误差百分比表明,Gompertz 模型在 T = 276 K 时 Q = 14.59 升/分钟,在 T = 277 K 时 Q = 20.25 升/分钟,是预测二氧化碳最大消耗能力的最佳模型。结果还表明,提高冷却液的流速可缩短任何温度下的弛豫时间。此外,与最低研究流速相比,增加冷却液流速可使平均弛豫时间在 T = 276 K 时缩短 2 % 至 60 %,在 T = 277 K 时缩短 7 % 至 22 %。此外,在保持冷却液流速不变的情况下降低实验温度也会导致弛豫时间缩短。
{"title":"Investigation of the effect of the flow rate of coolant on the kinetics of carbon dioxide hydrate growth using sigmoidal growth model","authors":"Shaghayegh Jahangiri,&nbsp;Fashad Varaminian","doi":"10.1016/j.jcrysgro.2024.127960","DOIUrl":"10.1016/j.jcrysgro.2024.127960","url":null,"abstract":"<div><div>Relaxation time plays a crucial role in studying reaction kinetics and other processes. This study addresses the importance of relaxation time and suggests methods to minimize it. In this article, we adjust the relaxation time by extracting heat from the hydrate formation process through variations in the flow rate of the cooling fluid. It has been demonstrated that heat transfer plays a dominant role in this process. The kinetics of carbon dioxide hydrate growth were evaluated by increasing the flow rate of cooling fluid using modified sigmoidal growth curve equations, including Logistics and Gompertz. It was conducted a nonlinear least-squares regression analysis to fit sigmoidal functions to the cumulative formation curves of hydrate generated from gas uptake in the static reactor over time. The percentage of error between A<sub>real</sub> and A<sub>model</sub> shows that the Gompertz model with Q = 14.59 Lit/min at T = 276 K and Q = 20.25 Lit/min at T = 277 K is the best model for predicting the maximum consumption capacity of CO<sub>2</sub>. The results also showed that increasing the cooling fluid’s flow rate reduces relaxation time at any temperature. Moreover, increasing the flow rate of the cooling fluid decreased the average relaxation time by 2 % to 60 % at T = 276 K and by 7 % to 22 % at T = 277 K compared to the lowest investigated flow rate. Additionally, reducing the experimental temperature while keeping the flow rate of the cooling fluid constant led to a reduction in the relaxation time.</div></div>","PeriodicalId":353,"journal":{"name":"Journal of Crystal Growth","volume":"649 ","pages":"Article 127960"},"PeriodicalIF":1.7,"publicationDate":"2024-10-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142552961","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Application of continuous stirring tank reactor for controllable synthesis of Cu7S4 nanocrystals 应用连续搅拌槽反应器可控合成 Cu7S4 纳米晶体
IF 1.7 4区 材料科学 Q3 CRYSTALLOGRAPHY Pub Date : 2024-10-23 DOI: 10.1016/j.jcrysgro.2024.127967
Zengmin Tang , Meng Chen , Yukun Tang , Jingjing Du , Lijian Xu
As a typical model for a chemical reactor in industry, the continuous stirring tank reactor has been widely used in waste-water treatment, industrial catalysis, and biological fermentation as well as great application prospects in the synthesis of nanomaterials. In this report, a convenient lab-scale continuous stirring tank reactor was assembled and utilized to synthesize Cu7S4 nanocrystals by injecting cupric bromide and sulfur solution in the presence of ascorbic acid and polyethyleneimine at 60 °C. The morphology control of Cu7S4 nanocrystals was accomplished by simply adjusting the agitation speed. Cu7S4 nanofibers with an average diameter of 48 ± 4.42 nm and a length of several micrometers were obtained at 80 rpm. Cu7S4 nanoplates with a thickness of 89 ± 13.56 nm and a plane size of 103 ± 16.47 nm were synthesized at 90 rpm, and the size of the nanoplates was regulated by continuously increasing the agitation speed from 90 rpm to 1000 rpm. Furthermore, the influences of two additional conditions (the mean residence time and the concentration of the feed solution) on the morphology of Cu7S4 nanocrystals, were also investigated. Therefore, these results could facilitate the understanding of the behaviors of CSTR in the synthesis of Cu7S4 nanocrystals and could also provide an important reference for the continuous synthesis of other nanoparticles.
连续搅拌槽式反应器作为工业化学反应器的典型模式,已广泛应用于废水处理、工业催化、生物发酵等领域,在纳米材料合成中也有很大的应用前景。本报告组装了一个便捷的实验室规模连续搅拌罐反应器,并利用该反应器在抗坏血酸和聚乙烯亚胺存在下,于 60 ℃ 注入溴化铜和硫溶液合成 Cu7S4 纳米晶体。只需调节搅拌速度,就能控制 Cu7S4 纳米晶体的形态。在 80 rpm 转速下,可获得平均直径为 48 ± 4.42 nm、长度为几微米的 Cu7S4 纳米纤维。在 90 rpm 转速下合成了厚度为 89 ± 13.56 nm、平面尺寸为 103 ± 16.47 nm 的 Cu7S4 纳米板,并通过将搅拌速度从 90 rpm 持续增加到 1000 rpm 来调节纳米板的尺寸。此外,还研究了两个附加条件(平均停留时间和进料溶液浓度)对 Cu7S4 纳米晶体形态的影响。因此,这些结果有助于理解 CSTR 在合成 Cu7S4 纳米晶体中的行为,也可为其他纳米粒子的连续合成提供重要参考。
{"title":"Application of continuous stirring tank reactor for controllable synthesis of Cu7S4 nanocrystals","authors":"Zengmin Tang ,&nbsp;Meng Chen ,&nbsp;Yukun Tang ,&nbsp;Jingjing Du ,&nbsp;Lijian Xu","doi":"10.1016/j.jcrysgro.2024.127967","DOIUrl":"10.1016/j.jcrysgro.2024.127967","url":null,"abstract":"<div><div>As a typical model for a chemical reactor in industry, the continuous stirring tank reactor has been widely used in waste-water treatment, industrial catalysis, and biological fermentation as well as great application prospects in the synthesis of nanomaterials. In this report, a convenient lab-scale continuous stirring tank reactor was assembled and utilized to synthesize Cu<sub>7</sub>S<sub>4</sub> nanocrystals by injecting cupric bromide and sulfur solution in the presence of ascorbic acid and polyethyleneimine at 60 °C. The morphology control of Cu<sub>7</sub>S<sub>4</sub> nanocrystals was accomplished by simply adjusting the agitation speed. Cu<sub>7</sub>S<sub>4</sub> nanofibers with an average diameter of 48 ± 4.42 nm and a length of several micrometers were obtained at 80 rpm. Cu<sub>7</sub>S<sub>4</sub> nanoplates with a thickness of 89 ± 13.56 nm and a plane size of 103 ± 16.47 nm were synthesized at 90 rpm, and the size of the nanoplates was regulated by continuously increasing the agitation speed from 90 rpm to 1000 rpm. Furthermore, the influences of two additional conditions (the mean residence time and the concentration of the feed solution) on the morphology of Cu<sub>7</sub>S<sub>4</sub> nanocrystals, were also investigated. Therefore, these results could facilitate the understanding of the behaviors of CSTR in the synthesis of Cu<sub>7</sub>S<sub>4</sub> nanocrystals and could also provide an important reference for the continuous synthesis of other nanoparticles.</div></div>","PeriodicalId":353,"journal":{"name":"Journal of Crystal Growth","volume":"649 ","pages":"Article 127967"},"PeriodicalIF":1.7,"publicationDate":"2024-10-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142537025","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
SAT solver-driven approach for validating local electron counting rule 验证局部电子计数规则的 SAT 求解器驱动方法
IF 1.7 4区 材料科学 Q3 CRYSTALLOGRAPHY Pub Date : 2024-10-22 DOI: 10.1016/j.jcrysgro.2024.127927
Tetsuji Kuboyama , Akira Kusaba
Determining large, complex surface structures is essential for understanding and modeling crystal growth. For semiconductor surfaces, the electron counting (EC) rule is known to be useful for predicting surface stability. In this study, a scheme is proposed to automatically determine if a sampled surface structure locally satisfies the EC rule using a Boolean Satisfiability Problem (SAT) solver. This automatic determination is demonstrated on the GaN(0001)-(6 × 6) surface system with H and Ga adsorption as an example. The scheme is also applicable to the automatic generation of surface structures that are expected to be relatively stable, and is expected to accelerate the study of large and complex surface structures of various semiconductor materials.
确定复杂的大型表面结构对于理解晶体生长和建立晶体生长模型至关重要。对于半导体表面,已知电子计数(EC)规则有助于预测表面稳定性。本研究提出了一种方案,利用布尔可满足性问题(SAT)求解器自动确定采样表面结构是否局部满足 EC 规则。以 GaN(0001)-(6 × 6) 表面系统吸附 H 和 Ga 为例,演示了这种自动判定方法。该方案还适用于自动生成预期相对稳定的表面结构,有望加速对各种半导体材料的大型复杂表面结构的研究。
{"title":"SAT solver-driven approach for validating local electron counting rule","authors":"Tetsuji Kuboyama ,&nbsp;Akira Kusaba","doi":"10.1016/j.jcrysgro.2024.127927","DOIUrl":"10.1016/j.jcrysgro.2024.127927","url":null,"abstract":"<div><div>Determining large, complex surface structures is essential for understanding and modeling crystal growth. For semiconductor surfaces, the electron counting (EC) rule is known to be useful for predicting surface stability. In this study, a scheme is proposed to automatically determine if a sampled surface structure locally satisfies the EC rule using a Boolean Satisfiability Problem (SAT) solver. This automatic determination is demonstrated on the GaN(0001)-(6 × 6) surface system with H and Ga adsorption as an example. The scheme is also applicable to the automatic generation of surface structures that are expected to be relatively stable, and is expected to accelerate the study of large and complex surface structures of various semiconductor materials.</div></div>","PeriodicalId":353,"journal":{"name":"Journal of Crystal Growth","volume":"650 ","pages":"Article 127927"},"PeriodicalIF":1.7,"publicationDate":"2024-10-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142652412","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Fabrication of hydrothermal PPKTP and its spontaneous parametric down-conversion characteristics 水热法 PPKTP 制备及其自发参数下转换特性
IF 1.7 4区 材料科学 Q3 CRYSTALLOGRAPHY Pub Date : 2024-10-22 DOI: 10.1016/j.jcrysgro.2024.127968
X.D. Song , X.L. He , H.Y. Song , W.D. Zhao , J.F. Tong , W.Y. Wu , H.T. Zhou , J.L. Wang , Y.B. Zuo , C.L. Zhang
High-voltage electric field polarization, selective corrosion, current monitoring, and other methods are used to develop hydrothermal PPKTP. It is found that the reversal domain nucleation of hydrothermal-grown KTP crystals has four kinds of microscopic morphology, namely, strip shape, spindle shape, bullet shape and irregular shape, in the process of high voltage electric field polarization. Compared with the leakage current in the process of polarization of flux-grown KTP crystals, the hydrothermal-grown KTP crystals only exist when the applied electric field is much larger than the coercive field. The leakage current can be suppressed by multiple loading of short pulses, and the PPKTP with a poled period of 10 μm and 46 μm were fabricated, respectively. Subsequently, based on the fabricated PPKTP, the SPDC characteristics are studied. To the PPKTP with a poled period of 10 μm, the quantum entanglement source whose brightness exceeds 2.1 kHz @ 810 nm is prepared by the SPDC technique. Otherwise, the PPKTP with a poled period of 46 μm is used for SPDC, and the brightness of entangled photon pairs in channel 1 and channel 2 are 3.21 kHz @ 1560 nm and 5.31 kHz @ 1560 nm, respectively.
采用高压电场极化、选择性腐蚀、电流监测等方法研制水热法PPKTP。研究发现,在高压电场极化过程中,水热法生长的 KTP 晶体的反转域成核具有四种微观形态,即条状、纺锤状、子弹状和不规则状。与通量生长的 KTP 晶体极化过程中的漏电流相比,水热生长的 KTP 晶体只有在外加电场远大于矫顽力场时才存在漏电流。通过多次加载短脉冲可以抑制漏电流,并分别制备出了极化周期为 10 μm 和 46 μm 的 PPKTP。随后,以制作的 PPKTP 为基础,对 SPDC 特性进行了研究。对于极化周期为 10 μm 的 PPKTP,利用 SPDC 技术制备了亮度超过 2.1 kHz @ 810 nm 的量子纠缠源。否则,使用极化周期为 46 μm 的 PPKTP 进行 SPDC,通道 1 和通道 2 中纠缠光子对的亮度分别为 3.21 kHz @ 1560 nm 和 5.31 kHz @ 1560 nm。
{"title":"Fabrication of hydrothermal PPKTP and its spontaneous parametric down-conversion characteristics","authors":"X.D. Song ,&nbsp;X.L. He ,&nbsp;H.Y. Song ,&nbsp;W.D. Zhao ,&nbsp;J.F. Tong ,&nbsp;W.Y. Wu ,&nbsp;H.T. Zhou ,&nbsp;J.L. Wang ,&nbsp;Y.B. Zuo ,&nbsp;C.L. Zhang","doi":"10.1016/j.jcrysgro.2024.127968","DOIUrl":"10.1016/j.jcrysgro.2024.127968","url":null,"abstract":"<div><div>High-voltage electric field polarization, selective corrosion, current monitoring, and other methods are used to develop hydrothermal PPKTP. It is found that the reversal domain nucleation of hydrothermal-grown KTP crystals has four kinds of microscopic morphology, namely, strip shape, spindle shape, bullet shape and irregular shape, in the process of high voltage electric field polarization. Compared with the leakage current in the process of polarization of flux-grown KTP crystals, the hydrothermal-grown KTP crystals only exist when the applied electric field is much larger than the coercive field. The leakage current can be suppressed by multiple loading of short pulses, and the PPKTP with a poled period of 10 μm and 46 μm were fabricated, respectively. Subsequently, based on the fabricated PPKTP, the SPDC characteristics are studied. To the PPKTP with a poled period of 10 μm, the quantum entanglement source whose brightness exceeds 2.1 kHz @ 810 nm is prepared by the SPDC technique. Otherwise, the PPKTP with a poled period of 46 μm is used for SPDC, and the brightness of entangled photon pairs in channel 1 and channel 2 are 3.21 kHz @ 1560 nm and 5.31 kHz @ 1560 nm, respectively.</div></div>","PeriodicalId":353,"journal":{"name":"Journal of Crystal Growth","volume":"650 ","pages":"Article 127968"},"PeriodicalIF":1.7,"publicationDate":"2024-10-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142652460","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
期刊
Journal of Crystal Growth
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1