首页 > 最新文献

1998 Sixth International Workshop on Computational Electronics. Extended Abstracts (Cat. No.98EX116)最新文献

英文 中文
Electron relaxation in silicon quantum dots by acoustic phonon scattering 声子散射在硅量子点中的电子弛豫
M. Dur, A. Gunther, D. Vasileska, S. Goodnick
Acoustic phonon scattering of electrons in fully quantized systems based on n-type inversion layers on a [100] surface of p-type Si is studied theoretically. The confining potential normal to the Si/SiO/sub 2/ interface is modeled by a triangular quantum well. For the confinement in the lateral directions we assume a parabolic potential. The calculations reveal that the anisotropic electron-phonon interaction strongly affects the scattering rate. The calculated transition rate of electrons from the first excited to the ground state shows a strong dependence on spatial confinement and lattice temperature.
从理论上研究了基于n型反转层的p型Si[100]表面全量子化系统中电子的声子散射。法向Si/SiO/ sub2 /界面的限制势由三角形量子阱模拟。对于侧向约束,我们假定为抛物线势。计算结果表明,各向异性电子-声子相互作用对散射速率有较大影响。计算得到的电子从第一激发态到基态的跃迁速率与空间约束和晶格温度密切相关。
{"title":"Electron relaxation in silicon quantum dots by acoustic phonon scattering","authors":"M. Dur, A. Gunther, D. Vasileska, S. Goodnick","doi":"10.1109/IWCE.1998.742704","DOIUrl":"https://doi.org/10.1109/IWCE.1998.742704","url":null,"abstract":"Acoustic phonon scattering of electrons in fully quantized systems based on n-type inversion layers on a [100] surface of p-type Si is studied theoretically. The confining potential normal to the Si/SiO/sub 2/ interface is modeled by a triangular quantum well. For the confinement in the lateral directions we assume a parabolic potential. The calculations reveal that the anisotropic electron-phonon interaction strongly affects the scattering rate. The calculated transition rate of electrons from the first excited to the ground state shows a strong dependence on spatial confinement and lattice temperature.","PeriodicalId":357304,"journal":{"name":"1998 Sixth International Workshop on Computational Electronics. Extended Abstracts (Cat. No.98EX116)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134343068","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Simulations of Schottky barrier diodes and tunnel transistors 肖特基势垒二极管和隧道晶体管的模拟
K. Matsuzawa, K. Uchida, A. Nishiyama
We present the implementation and simulated results of a practical model to cover Schottky and Ohmic contacts. The model considers thermionic emission and spatially distributed tunneling. Simulations using the present model reproduce characteristics of Schottky barrier diodes and show the transition from Schottky to ohmic as the doping level is increased. As an application example, the immunity of a Schottky barrier tunnel transistor to the short channel effect is demonstrated.
我们提出了一个实用模型的实现和模拟结果,以涵盖肖特基和欧姆接触。该模型考虑了热离子发射和空间分布隧道效应。利用该模型的模拟再现了肖特基势垒二极管的特性,并显示了随着掺杂水平的增加,从肖特基势垒到欧姆势垒的转变。作为一个应用实例,证明了肖特基势垒隧道晶体管对短沟道效应的抗扰性。
{"title":"Simulations of Schottky barrier diodes and tunnel transistors","authors":"K. Matsuzawa, K. Uchida, A. Nishiyama","doi":"10.1109/IWCE.1998.742737","DOIUrl":"https://doi.org/10.1109/IWCE.1998.742737","url":null,"abstract":"We present the implementation and simulated results of a practical model to cover Schottky and Ohmic contacts. The model considers thermionic emission and spatially distributed tunneling. Simulations using the present model reproduce characteristics of Schottky barrier diodes and show the transition from Schottky to ohmic as the doping level is increased. As an application example, the immunity of a Schottky barrier tunnel transistor to the short channel effect is demonstrated.","PeriodicalId":357304,"journal":{"name":"1998 Sixth International Workshop on Computational Electronics. Extended Abstracts (Cat. No.98EX116)","volume":"53 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130097993","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
Investigation to suppress hot carrier effect in pocket-implanted nMOSFET by full band Monte Carlo simulation 全带蒙特卡罗模拟抑制口袋植入nMOSFET热载子效应的研究
T. Tanaka, S. Yamaguchi, K. Sukegawa, H. Goto
We have clarified two dimensional hot carrier (HC) properties of pocket implanted nMOSFETs by full band Monte Carlo device simulation, and we have shown that the HC generation can be suppressed, keeping better V/sub th/ roll-off, without deterioration of driving capability by properly choosing the pocket implant tilt angle. We have also confirmed this by measurements of gate and substrate currents and device lifetime of sub-quarter micron nMOSFETs.
我们通过全波段蒙特卡罗器件模拟阐明了口袋植入的nmosfet的二维热载流子(HC)特性,并证明通过适当选择口袋植入的倾斜角度可以抑制HC的产生,保持更好的V/sub /滚转,而不会降低驱动性能。我们还通过测量栅极和衬底电流以及亚四分之一微米nmosfet的器件寿命证实了这一点。
{"title":"Investigation to suppress hot carrier effect in pocket-implanted nMOSFET by full band Monte Carlo simulation","authors":"T. Tanaka, S. Yamaguchi, K. Sukegawa, H. Goto","doi":"10.1109/IWCE.1998.742750","DOIUrl":"https://doi.org/10.1109/IWCE.1998.742750","url":null,"abstract":"We have clarified two dimensional hot carrier (HC) properties of pocket implanted nMOSFETs by full band Monte Carlo device simulation, and we have shown that the HC generation can be suppressed, keeping better V/sub th/ roll-off, without deterioration of driving capability by properly choosing the pocket implant tilt angle. We have also confirmed this by measurements of gate and substrate currents and device lifetime of sub-quarter micron nMOSFETs.","PeriodicalId":357304,"journal":{"name":"1998 Sixth International Workshop on Computational Electronics. Extended Abstracts (Cat. No.98EX116)","volume":"12 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121484728","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A full-band cellular automaton for charge transport simulation in semiconductors 半导体中电荷输运模拟的全频带元胞自动机
M. Saraniti, S. Goodnick
The aim of the present work is to demonstrate a new simulation approach, based on the cellular automaton (CA) method, that includes a full-band representation of the electronic structure and of the phonon spectra, while maintaining the short simulation times typical of the previous nonparabolic CA. Simulation results are shown for charge transport in bulk Si to demonstrate the equivalence of this new approach with full-band EMC simulation results, as well as its efficiency.
本研究的目的是展示一种基于元胞自动机(CA)方法的新模拟方法,该方法包括电子结构和声子谱的全频带表示,同时保持以前非抛物型CA的典型短模拟时间。模拟结果显示了体硅中的电荷传输,以证明这种新方法与全频带EMC模拟结果的等效性,以及它的效率。
{"title":"A full-band cellular automaton for charge transport simulation in semiconductors","authors":"M. Saraniti, S. Goodnick","doi":"10.1109/IWCE.1998.742717","DOIUrl":"https://doi.org/10.1109/IWCE.1998.742717","url":null,"abstract":"The aim of the present work is to demonstrate a new simulation approach, based on the cellular automaton (CA) method, that includes a full-band representation of the electronic structure and of the phonon spectra, while maintaining the short simulation times typical of the previous nonparabolic CA. Simulation results are shown for charge transport in bulk Si to demonstrate the equivalence of this new approach with full-band EMC simulation results, as well as its efficiency.","PeriodicalId":357304,"journal":{"name":"1998 Sixth International Workshop on Computational Electronics. Extended Abstracts (Cat. No.98EX116)","volume":"17 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126853768","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 6
Numerical method for the calculation of self-consistent charge densities of reservoir-coupled quantum dots 水库耦合量子点自洽电荷密度的数值计算方法
A. Scholze, A. Schenk, W. Fichtner
The calculation of self-consistent charge densities is not a straightforward task in structures with zero-dimensional confinement. In contrast to the semi-classical case the density of states in a quantum dot depends on the potential. However, this dependence is not explicitly given and Newton-Raphson methods are therefore difficult to employ. In this paper we present a numerical method for the calculation of self-consistent electron densities in a quantum dot weakly coupled to a macroscopic reservoir using a multidimensional secant approach that partially overcomes the numerical limitations intrinsic to single-electron transistor device simulations.
在具有零维约束的结构中,计算自洽电荷密度并不是一项简单的任务。与半经典情况相反,量子点的态密度取决于势。然而,这种依赖关系并没有明确给出,因此牛顿-拉夫森方法很难采用。在本文中,我们提出了一种计算量子点与宏观储层弱耦合的自一致电子密度的数值方法,该方法使用多维割线方法部分克服了单电子晶体管器件模拟固有的数值限制。
{"title":"Numerical method for the calculation of self-consistent charge densities of reservoir-coupled quantum dots","authors":"A. Scholze, A. Schenk, W. Fichtner","doi":"10.1109/IWCE.1998.742700","DOIUrl":"https://doi.org/10.1109/IWCE.1998.742700","url":null,"abstract":"The calculation of self-consistent charge densities is not a straightforward task in structures with zero-dimensional confinement. In contrast to the semi-classical case the density of states in a quantum dot depends on the potential. However, this dependence is not explicitly given and Newton-Raphson methods are therefore difficult to employ. In this paper we present a numerical method for the calculation of self-consistent electron densities in a quantum dot weakly coupled to a macroscopic reservoir using a multidimensional secant approach that partially overcomes the numerical limitations intrinsic to single-electron transistor device simulations.","PeriodicalId":357304,"journal":{"name":"1998 Sixth International Workshop on Computational Electronics. Extended Abstracts (Cat. No.98EX116)","volume":"67 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124974048","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A domain decomposition method: a simulation study 一种区域分解方法:仿真研究
C. Cercignani, I. Gamba, J. Jerome, Chi-Wang Shu
In previous work (1998), the authors introduced a conceptual domain decomposition approach, combining drift-diffusion, kinetic, and high-field regimes. In this paper, we continue the program. We again define a global calibrator, a linear approximation to the Boltzmann transport equation, and solve this in one space and one velocity dimension. Second, we implement a global domain decomposition method, by systematic sampling of separation points between drift-diffusion and high field regimes. The interdomain boundary conditions are implemented through the stencil overlap of the algorithms in both regions.
在之前的工作(1998年)中,作者介绍了一种概念性的区域分解方法,结合了漂移扩散、动力学和高场机制。在本文中,我们继续这个程序。我们再次定义一个全局校准器,一个玻尔兹曼输运方程的线性近似,并在一个空间和一个速度维度中求解它。其次,我们实现了一个全局区域分解方法,通过系统采样漂移扩散和高场区域之间的分离点。域间边界条件是通过算法在两个区域的模板重叠实现的。
{"title":"A domain decomposition method: a simulation study","authors":"C. Cercignani, I. Gamba, J. Jerome, Chi-Wang Shu","doi":"10.1109/IWCE.1998.742740","DOIUrl":"https://doi.org/10.1109/IWCE.1998.742740","url":null,"abstract":"In previous work (1998), the authors introduced a conceptual domain decomposition approach, combining drift-diffusion, kinetic, and high-field regimes. In this paper, we continue the program. We again define a global calibrator, a linear approximation to the Boltzmann transport equation, and solve this in one space and one velocity dimension. Second, we implement a global domain decomposition method, by systematic sampling of separation points between drift-diffusion and high field regimes. The interdomain boundary conditions are implemented through the stencil overlap of the algorithms in both regions.","PeriodicalId":357304,"journal":{"name":"1998 Sixth International Workshop on Computational Electronics. Extended Abstracts (Cat. No.98EX116)","volume":"75 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132793532","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Accurate Monte Carlo modeling of terminal currents in short semiconductor devices by using a generalized Ramo-Shockley theorem 利用广义Ramo-Shockley定理对短半导体器件的终端电流进行精确蒙特卡罗建模
P. Houlet, Y. Awano, N. Yokoyama, C. Hamaguchi
The authors present an efficient and simple method using a generalized formulation of the Ramo-Shockley theorem for the calculation of the time-dependent terminal currents in multi-port devices within the ensemble Monte Carlo modeling, including the displacement current and the separate contribution of each particle type. Moreover, our technique is optimized for the cloud-in-cell and box integration framework. We emphasize that our formulation does not require any additional optimization theory, is easy to implement and does not increase CPU time consumption.
本文利用Ramo-Shockley定理的广义公式,提出了一种有效而简单的方法,用于在集合蒙特卡罗模型中计算多端口器件中随时间变化的终端电流,包括位移电流和每种粒子类型的单独贡献。此外,我们的技术针对云单元和盒集成框架进行了优化。我们强调我们的公式不需要任何额外的优化理论,易于实现,并且不会增加CPU时间消耗。
{"title":"Accurate Monte Carlo modeling of terminal currents in short semiconductor devices by using a generalized Ramo-Shockley theorem","authors":"P. Houlet, Y. Awano, N. Yokoyama, C. Hamaguchi","doi":"10.1109/IWCE.1998.742751","DOIUrl":"https://doi.org/10.1109/IWCE.1998.742751","url":null,"abstract":"The authors present an efficient and simple method using a generalized formulation of the Ramo-Shockley theorem for the calculation of the time-dependent terminal currents in multi-port devices within the ensemble Monte Carlo modeling, including the displacement current and the separate contribution of each particle type. Moreover, our technique is optimized for the cloud-in-cell and box integration framework. We emphasize that our formulation does not require any additional optimization theory, is easy to implement and does not increase CPU time consumption.","PeriodicalId":357304,"journal":{"name":"1998 Sixth International Workshop on Computational Electronics. Extended Abstracts (Cat. No.98EX116)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131189405","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Efficient 3D 'atomistic' simulation technique for studying of random dopant induced threshold voltage lowering and fluctuations in decanano MOSFETs decanano mosfet中随机掺杂诱导阈值电压降低和波动的高效三维“原子”模拟技术
A. Asenov
A 3D 'atomistic' simulation technique to study random dopant induced threshold voltage lowering and fluctuations in sub 0.1 /spl mu/m MOSFETs is presented. It allows statistical analysis of random impurity effects down to the individual impurity level. Efficient algorithms based on a single solution of Poisson's equation, followed by the solution of a simplified current continuity equation are used in the simulations.
提出了一种三维“原子”模拟技术,用于研究0.1 /spl mu/m以下随机掺杂诱导的mosfet阈值电压降低和波动。它允许对随机杂质效应进行统计分析,直至单个杂质水平。在模拟中采用了基于泊松方程单解和简化电流连续性方程解的高效算法。
{"title":"Efficient 3D 'atomistic' simulation technique for studying of random dopant induced threshold voltage lowering and fluctuations in decanano MOSFETs","authors":"A. Asenov","doi":"10.1109/IWCE.1998.742761","DOIUrl":"https://doi.org/10.1109/IWCE.1998.742761","url":null,"abstract":"A 3D 'atomistic' simulation technique to study random dopant induced threshold voltage lowering and fluctuations in sub 0.1 /spl mu/m MOSFETs is presented. It allows statistical analysis of random impurity effects down to the individual impurity level. Efficient algorithms based on a single solution of Poisson's equation, followed by the solution of a simplified current continuity equation are used in the simulations.","PeriodicalId":357304,"journal":{"name":"1998 Sixth International Workshop on Computational Electronics. Extended Abstracts (Cat. No.98EX116)","volume":"72 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116323880","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
Enhanced hole drift velocity in sub-0.1 /spl mu/m Si devices caused by anisotropic velocity overshoot 在低于0.1 /spl mu/m的Si器件中,各向异性速度超调提高了空穴漂移速度
Y. Tagawa, Y. Awano
We performed for the first time full band Monte Carlo simulations of anisotropic hole transport in sub-0.1 /spl mu/m Si devices. We found from this simulation of 0.05 /spl mu/m channel p-i-p diodes that the hole drift velocity in the channel with the orientation of <100> with respect to crystallographic direction is enhanced by the velocity overshoot effect, and that the average velocity in the middle of the channel is 25% higher than for a diode in <110> direction at room temperature. These results suggest that the current drive capability of sub-0.1 /spl mu/m pMOSFETs could be optimized by choosing the channel orientation in the <100> direction.
我们首次在低于0.1 /spl mu/m的Si器件中进行了各向异性空穴输运的全波段蒙特卡罗模拟。通过对0.05 /spl mu/m沟道p-i-p二极管的模拟,我们发现由于速度超调效应,相对于晶体学方向,沟道中方向为的空穴漂移速度得到了增强,并且在室温下,沟道中间的平均速度比方向相同的二极管高25%。这些结果表明,在0.1 /spl mu/m以下的pmosfet可以通过选择通道方向来优化电流驱动能力。
{"title":"Enhanced hole drift velocity in sub-0.1 /spl mu/m Si devices caused by anisotropic velocity overshoot","authors":"Y. Tagawa, Y. Awano","doi":"10.1109/IWCE.1998.742748","DOIUrl":"https://doi.org/10.1109/IWCE.1998.742748","url":null,"abstract":"We performed for the first time full band Monte Carlo simulations of anisotropic hole transport in sub-0.1 /spl mu/m Si devices. We found from this simulation of 0.05 /spl mu/m channel p-i-p diodes that the hole drift velocity in the channel with the orientation of <100> with respect to crystallographic direction is enhanced by the velocity overshoot effect, and that the average velocity in the middle of the channel is 25% higher than for a diode in <110> direction at room temperature. These results suggest that the current drive capability of sub-0.1 /spl mu/m pMOSFETs could be optimized by choosing the channel orientation in the <100> direction.","PeriodicalId":357304,"journal":{"name":"1998 Sixth International Workshop on Computational Electronics. Extended Abstracts (Cat. No.98EX116)","volume":"112 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128089101","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Three dimensional multi-grid Poisson solver 三维多网格泊松求解器
S. Wigger, M. Saraniti, S. Goodnick
The Newton multigrid method was shown to be an effective method for solving the nonlinear Poisson equation for semiconductor devices under thermal equilibrium conditions. This technique can also be used to solve problems involving reverse bias junctions. Assuming an insignificant concentration of minority carriers, such that no leakage current is present, and fixing the quasi-Fermi potential as a constant for majority carriers, the nonlinear Poisson equation can be used to simulate such situations.
牛顿多重网格法是求解热平衡条件下半导体器件非线性泊松方程的有效方法。该技术也可用于解决涉及反向偏压结的问题。假设少数载流子的浓度不显著,因此不存在漏电流,并且将大多数载流子的准费米势固定为常数,则可以使用非线性泊松方程来模拟这种情况。
{"title":"Three dimensional multi-grid Poisson solver","authors":"S. Wigger, M. Saraniti, S. Goodnick","doi":"10.1109/IWCE.1998.742739","DOIUrl":"https://doi.org/10.1109/IWCE.1998.742739","url":null,"abstract":"The Newton multigrid method was shown to be an effective method for solving the nonlinear Poisson equation for semiconductor devices under thermal equilibrium conditions. This technique can also be used to solve problems involving reverse bias junctions. Assuming an insignificant concentration of minority carriers, such that no leakage current is present, and fixing the quasi-Fermi potential as a constant for majority carriers, the nonlinear Poisson equation can be used to simulate such situations.","PeriodicalId":357304,"journal":{"name":"1998 Sixth International Workshop on Computational Electronics. Extended Abstracts (Cat. No.98EX116)","volume":"35 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129982997","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
期刊
1998 Sixth International Workshop on Computational Electronics. Extended Abstracts (Cat. No.98EX116)
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1