Pub Date : 2006-09-01DOI: 10.1109/DEIV.2006.357345
R. Ikeda, E. Kaneko
Electric railways and mono-rails in Japan are operated by DC feeding systems. HSCB (high speed circuit breakers) are generally used for these electric installations. Recently, HSVCB (high speed vacuum circuit breakers) have been investigated. HSVCB makes current superimposed on fault current so that the current is forced to be zero and interrupts the current. HSVCB has an advantage such as small noise and environmental harmony. Therefore, an electric railway that adopts HSVCB has increased by the advancement of the vacuum technology in recent years. In this paper, we would like to clarity the basic performance of the HSVCB applied to the railway feeding systems
{"title":"Fault Analysis in DC Electric Railways Feeding System","authors":"R. Ikeda, E. Kaneko","doi":"10.1109/DEIV.2006.357345","DOIUrl":"https://doi.org/10.1109/DEIV.2006.357345","url":null,"abstract":"Electric railways and mono-rails in Japan are operated by DC feeding systems. HSCB (high speed circuit breakers) are generally used for these electric installations. Recently, HSVCB (high speed vacuum circuit breakers) have been investigated. HSVCB makes current superimposed on fault current so that the current is forced to be zero and interrupts the current. HSVCB has an advantage such as small noise and environmental harmony. Therefore, an electric railway that adopts HSVCB has increased by the advancement of the vacuum technology in recent years. In this paper, we would like to clarity the basic performance of the HSVCB applied to the railway feeding systems","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"39 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133379792","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2006-09-01DOI: 10.1109/DEIV.2006.357318
A. Sato, T. Iwao, M. Yumoto
Remarkable characteristic of cathode spot of low pressure arc can remove the oxide layer preferentially. Recently, cathode spot of low pressure arc have been used for cleaning metal oxide surface before the thermal spray or surface modification. However, there are few reports on the cathode spot movement or the oxide removal process. The experiment carried out by using the SS400 cathode work piece and the used cylindrical copper anode. The cathode spot movement taken by the high speed video camera is observed and analyzed by using the plasma image processing (PIP). The surfaces of work piece were covered with thick oxide of 9.67nm. The surface work piece of surface after processing was analyzed by using the laser microscope. The cathode spots movement has the difference as the processing time increases and the oxide layer roughness changes
{"title":"Cathode Spot Movement of Low Pressure Arc Removing Oxide Layer","authors":"A. Sato, T. Iwao, M. Yumoto","doi":"10.1109/DEIV.2006.357318","DOIUrl":"https://doi.org/10.1109/DEIV.2006.357318","url":null,"abstract":"Remarkable characteristic of cathode spot of low pressure arc can remove the oxide layer preferentially. Recently, cathode spot of low pressure arc have been used for cleaning metal oxide surface before the thermal spray or surface modification. However, there are few reports on the cathode spot movement or the oxide removal process. The experiment carried out by using the SS400 cathode work piece and the used cylindrical copper anode. The cathode spot movement taken by the high speed video camera is observed and analyzed by using the plasma image processing (PIP). The surfaces of work piece were covered with thick oxide of 9.67nm. The surface work piece of surface after processing was analyzed by using the laser microscope. The cathode spots movement has the difference as the processing time increases and the oxide layer roughness changes","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"58 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133385378","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2006-09-01DOI: 10.1109/DEIV.2006.357310
D. I. Proskurovsky
A method of cleaning of vacuum arc plasma from droplet fraction of cathode erosion by means of arrangement of conditions for igniting and operating of "droplet spots" has been proposed. Such conditions are realized at reflective arc discharge burning. The plasma of this discharge has substantially higher temperature and concentration of particles. The experiments performed have shown that, compared to usual vacuum arc, arc of reflective discharge provides multiple decrease of number of droplets, not evaporated on their way through plasma. The experiment results have been discussed in the term of heat exchange between droplets and surrounding plasma. The proposed method opens up new opportunities for cleaning of vacuum arc plasma from droplets
{"title":"Use of Droplet Spots Burning for Decreasing of Droplet Fraction in Vacuum Arc Plasma","authors":"D. I. Proskurovsky","doi":"10.1109/DEIV.2006.357310","DOIUrl":"https://doi.org/10.1109/DEIV.2006.357310","url":null,"abstract":"A method of cleaning of vacuum arc plasma from droplet fraction of cathode erosion by means of arrangement of conditions for igniting and operating of \"droplet spots\" has been proposed. Such conditions are realized at reflective arc discharge burning. The plasma of this discharge has substantially higher temperature and concentration of particles. The experiments performed have shown that, compared to usual vacuum arc, arc of reflective discharge provides multiple decrease of number of droplets, not evaporated on their way through plasma. The experiment results have been discussed in the term of heat exchange between droplets and surrounding plasma. The proposed method opens up new opportunities for cleaning of vacuum arc plasma from droplets","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"149 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115617701","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2006-09-01DOI: 10.1109/DEIV.2006.357240
Suharyanto, S. Michizono, Y. Saito, Tumiran, Y. Yamano, S. Kobayashi
Secondary electron emission (SEE) coefficients of alumina ceramics with three different surface finishes have been measured using a scanning electron microscope with a single-pulse electron beam (100 pA, 1 ms). SEE coefficients of those aluminas with annealing process became lower after mechanical grinding operations even though its average roughness was almost same as those of as-sintered ones. SEE coefficients of mirror-finished samples were the smallest among the samples. Changes of SEE coefficient with incident angle of primary electrons for smooth and rough surfaces are also discussed
{"title":"Influence of Mechanical Finishing on Secondary Electron Emission of Alumina Ceramics","authors":"Suharyanto, S. Michizono, Y. Saito, Tumiran, Y. Yamano, S. Kobayashi","doi":"10.1109/DEIV.2006.357240","DOIUrl":"https://doi.org/10.1109/DEIV.2006.357240","url":null,"abstract":"Secondary electron emission (SEE) coefficients of alumina ceramics with three different surface finishes have been measured using a scanning electron microscope with a single-pulse electron beam (100 pA, 1 ms). SEE coefficients of those aluminas with annealing process became lower after mechanical grinding operations even though its average roughness was almost same as those of as-sintered ones. SEE coefficients of mirror-finished samples were the smallest among the samples. Changes of SEE coefficient with incident angle of primary electrons for smooth and rough surfaces are also discussed","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"88 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114507626","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2006-09-01DOI: 10.1109/DEIV.2006.357301
A. Chaly, I. N. Poluyanova, V. Poluyanov
Maximum interrupting capacity of the butt CuCr 70/30 contacts at external uniform AMF has been experimentally investigated for AMF induction range 0-1.2 T. It has been found that dependency of maximum interrupting current density versus AMF induction has a tendency to saturate when the latter achieves the level of the first characteristic point B1 on Volt-Tesla characteristic. Radial energy losses have been evaluated on the basis of measured anode mass losses. 1D thermal model has been used for evaluation maximum interrupting current density. At the same time radial energy losses have been taken into consideration. Calculated results demonstrate good agreement with the experimental data if critical temperature equal to ~2000 K is considered. This value of critical temperature is supported by several experiments described in literature
{"title":"Maximum interrupting Capacity of CuCr Contacts under the effect of uniform axial magnetic field (AMF)","authors":"A. Chaly, I. N. Poluyanova, V. Poluyanov","doi":"10.1109/DEIV.2006.357301","DOIUrl":"https://doi.org/10.1109/DEIV.2006.357301","url":null,"abstract":"Maximum interrupting capacity of the butt CuCr 70/30 contacts at external uniform AMF has been experimentally investigated for AMF induction range 0-1.2 T. It has been found that dependency of maximum interrupting current density versus AMF induction has a tendency to saturate when the latter achieves the level of the first characteristic point B1 on Volt-Tesla characteristic. Radial energy losses have been evaluated on the basis of measured anode mass losses. 1D thermal model has been used for evaluation maximum interrupting current density. At the same time radial energy losses have been taken into consideration. Calculated results demonstrate good agreement with the experimental data if critical temperature equal to ~2000 K is considered. This value of critical temperature is supported by several experiments described in literature","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"50 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115142298","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2006-09-01DOI: 10.1109/DEIV.2006.357251
T. Shioiri, N. Asari, S. Saito, H. Nakamuta, M. Homma, K. Suzuki
Experiments were conducted to determine the conditioning effects of a chromium oxide coating on a ceramic surface. Chromium oxide is known to have a small secondary electron emission coefficient. With a chromium oxide coating, conditioning effects were completed early and flash over voltage increased. While luminescence was observed on a bare ceramic surface under a high applied voltage, none was observed on the sample coated with chromium oxide. One cause of increasing flashover voltage due to coated chromium oxide is depression of the secondary electron avalanche. Another is considered to be depressed surface charge due to decreasing surface resistance
{"title":"Effect of chromium oxide coating on surface flashover characteristics of ceramic in vacuum","authors":"T. Shioiri, N. Asari, S. Saito, H. Nakamuta, M. Homma, K. Suzuki","doi":"10.1109/DEIV.2006.357251","DOIUrl":"https://doi.org/10.1109/DEIV.2006.357251","url":null,"abstract":"Experiments were conducted to determine the conditioning effects of a chromium oxide coating on a ceramic surface. Chromium oxide is known to have a small secondary electron emission coefficient. With a chromium oxide coating, conditioning effects were completed early and flash over voltage increased. While luminescence was observed on a bare ceramic surface under a high applied voltage, none was observed on the sample coated with chromium oxide. One cause of increasing flashover voltage due to coated chromium oxide is depression of the secondary electron avalanche. Another is considered to be depressed surface charge due to decreasing surface resistance","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"11 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121996327","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2006-09-01DOI: 10.1109/DEIV.2006.357428
H. Yoshimura, H. Kanakusa, K. Nakazawa, A. Hatta
A unique technique of the fabricating sub micron sized silicon (Si) cones structure has been found. (Yoshimura, 2002) The technique consists of two processes: 1) depositing fine metal particles or layer, 2) etching in microwave plasma with negatively bias. A size distribution of unevenness on the surface of deposited aluminum (Al) layer was observed from samples after several minutes etching. A similar distribution of the cone shaped products were observed from 60 minutes etched samples also. The change of shape of the unevenness and cone shaped products under varied etching time was observed by using FE-SEM. The EDX spectrum of Al vs. Si was observed. In this paper, the relationship of distribution between the unevenness on Al layer and size of the cone products will be presented
{"title":"Effect of Thin Aluminum Layer on Fabricating Silicon Micro Cone Structures","authors":"H. Yoshimura, H. Kanakusa, K. Nakazawa, A. Hatta","doi":"10.1109/DEIV.2006.357428","DOIUrl":"https://doi.org/10.1109/DEIV.2006.357428","url":null,"abstract":"A unique technique of the fabricating sub micron sized silicon (Si) cones structure has been found. (Yoshimura, 2002) The technique consists of two processes: 1) depositing fine metal particles or layer, 2) etching in microwave plasma with negatively bias. A size distribution of unevenness on the surface of deposited aluminum (Al) layer was observed from samples after several minutes etching. A similar distribution of the cone shaped products were observed from 60 minutes etched samples also. The change of shape of the unevenness and cone shaped products under varied etching time was observed by using FE-SEM. The EDX spectrum of Al vs. Si was observed. In this paper, the relationship of distribution between the unevenness on Al layer and size of the cone products will be presented","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"215 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124229376","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2006-09-01DOI: 10.1109/DEIV.2006.357224
V. A. Nevrovsky
This paper discusses ways of free macroparticle generation in real conditions of vacuum electric devices and physical processes occurring at the particle interaction with an electrode. As a result, a model of vacuum breakdown initiation was suggested, including release of loosely bonded particles by electric field, their acceleration to an opposite electrode, impacts onto the electrode and formation of potentially electron emitting centers. Some published observations and data on breakdowns in centimeter gaps with long delays (tens of microseconds) indirectly indicate short-term existence of emission centers immediately prior breakdown, and thus they support the model. Mechanism of the emission center formation by plastic deformation of material in the impact zone in presence of electric field is discussed. A final stage of breakdown initiation involves emission current interaction with the anode, leading to the anode thermal instability
{"title":"Clump Hypothesis and Mechanisms of Breakdown Initiation in Centimeter Vacuum Gaps","authors":"V. A. Nevrovsky","doi":"10.1109/DEIV.2006.357224","DOIUrl":"https://doi.org/10.1109/DEIV.2006.357224","url":null,"abstract":"This paper discusses ways of free macroparticle generation in real conditions of vacuum electric devices and physical processes occurring at the particle interaction with an electrode. As a result, a model of vacuum breakdown initiation was suggested, including release of loosely bonded particles by electric field, their acceleration to an opposite electrode, impacts onto the electrode and formation of potentially electron emitting centers. Some published observations and data on breakdowns in centimeter gaps with long delays (tens of microseconds) indirectly indicate short-term existence of emission centers immediately prior breakdown, and thus they support the model. Mechanism of the emission center formation by plastic deformation of material in the impact zone in presence of electric field is discussed. A final stage of breakdown initiation involves emission current interaction with the anode, leading to the anode thermal instability","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"140 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124445433","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2006-09-01DOI: 10.1109/DEIV.2006.357324
G. Shafir, S. Goldsmith, E. Cheifetz
Ion velocity distribution (IVD) and ion charge state distribution (ICSD) of silver ions in a plasma beam emitted by two compact, serially connected, and simultaneously operating vacuum arcs was measured using a dynamic time of flight diagnostics. The anode and cathode of each arc were made of two strips of silver layers pasted on an alumina wafer and separated by a narrow 100 mum gap. The two arcs were laterally separated by 0.015 m and located on the same horizontal plane, emitting two plasma plums, which merged into a single one few cm away from the arcs. Each arc was ignited by high voltage breakdown on the alumina surface gap by 3mus 100 A current. The IVD of the merged plasma beam was analyzed 0.7 m away from the arcs, and compared with that of the ions emitted by a single arc. When only a single arc was active, the plasma beam consisted of more than 90 % of Ag ions with average velocity = (0.7-0.8)times104m/s and charge state z=1. About 10% of the beam ion population consisted of oxygen and carbon. When the two arcs operated simultaneously, the form of the IVD was significantly different, containing a second peak with velocity of =(1.15-1.25)times104m/s, significantly higher than that observed with a single arc. However, the integrated ion charge in the merged beam was lower by 30% from the sum of the ion charge obtained from the plasma of each arc. It was found that the observed phenomena were correlated with a formation of conducting channel between the cathode of the first serially connected arc and the anode of the second arc, occurring when the plasma plums expanding from the two arcs merged. When a physical barrier was inserted between the two arcs to prevent a contact between the two expanding plums, the observed plasma shunting did not occur, although the two beams merged in space beyond the barrier, as before. The effect on the IVD due to arc transfer from the first cathode to the second arc anode is currently being investigated.
{"title":"Charge and velocity distribution of ions emitted from two simultaneously operating and serially connected vacuum arcs","authors":"G. Shafir, S. Goldsmith, E. Cheifetz","doi":"10.1109/DEIV.2006.357324","DOIUrl":"https://doi.org/10.1109/DEIV.2006.357324","url":null,"abstract":"Ion velocity distribution (IVD) and ion charge state distribution (ICSD) of silver ions in a plasma beam emitted by two compact, serially connected, and simultaneously operating vacuum arcs was measured using a dynamic time of flight diagnostics. The anode and cathode of each arc were made of two strips of silver layers pasted on an alumina wafer and separated by a narrow 100 mum gap. The two arcs were laterally separated by 0.015 m and located on the same horizontal plane, emitting two plasma plums, which merged into a single one few cm away from the arcs. Each arc was ignited by high voltage breakdown on the alumina surface gap by 3mus 100 A current. The IVD of the merged plasma beam was analyzed 0.7 m away from the arcs, and compared with that of the ions emitted by a single arc. When only a single arc was active, the plasma beam consisted of more than 90 % of Ag ions with average velocity <vl> = (0.7-0.8)times104m/s and charge state z=1. About 10% of the beam ion population consisted of oxygen and carbon. When the two arcs operated simultaneously, the form of the IVD was significantly different, containing a second peak with velocity of <vpeak1>=(1.15-1.25)times104m/s, significantly higher than that observed with a single arc. However, the integrated ion charge in the merged beam was lower by 30% from the sum of the ion charge obtained from the plasma of each arc. It was found that the observed phenomena were correlated with a formation of conducting channel between the cathode of the first serially connected arc and the anode of the second arc, occurring when the plasma plums expanding from the two arcs merged. When a physical barrier was inserted between the two arcs to prevent a contact between the two expanding plums, the observed plasma shunting did not occur, although the two beams merged in space beyond the barrier, as before. The effect on the IVD due to arc transfer from the first cathode to the second arc anode is currently being investigated.","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"16 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122266125","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2006-09-01DOI: 10.1109/DEIV.2006.357440
Y. Gotoh, T. Kojima, A. Oowada, M. Nagao, H. Tsuji, J. Ishikawa, S. Sakai
The purpose of the present study is to demonstrate the feasibility of plasma treated silicon field emission arrays used as a charge neutralization device in ion implantation system. Silicon field emission arrays (Si-FEAs) were treated in plasma to form carbonized layer. Electron emission properties of the plasma treated Si-FEAs have been measured in various gaseous ambient. The examined gases were hydrogen, oxygen, methane, carbon monoxide and carbon dioxide. Either gas was introduced to the vacuum chamber until the pressure reaches to the partial pressure in the ion implantation system
{"title":"Electron emission properties of plasma treated silicon ield emission arrays in gaseous ambient","authors":"Y. Gotoh, T. Kojima, A. Oowada, M. Nagao, H. Tsuji, J. Ishikawa, S. Sakai","doi":"10.1109/DEIV.2006.357440","DOIUrl":"https://doi.org/10.1109/DEIV.2006.357440","url":null,"abstract":"The purpose of the present study is to demonstrate the feasibility of plasma treated silicon field emission arrays used as a charge neutralization device in ion implantation system. Silicon field emission arrays (Si-FEAs) were treated in plasma to form carbonized layer. Electron emission properties of the plasma treated Si-FEAs have been measured in various gaseous ambient. The examined gases were hydrogen, oxygen, methane, carbon monoxide and carbon dioxide. Either gas was introduced to the vacuum chamber until the pressure reaches to the partial pressure in the ion implantation system","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"29 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123321838","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
京公网安备 11010802042870号
京ICP备2023020795号-1
扫码关注我们
求助内容：
应助结果提醒方式：