Pub Date : 2006-09-01DOI: 10.1109/DEIV.2006.357365
T. Nakayama, T. Takizawa, Y. Sakamoto, K. Kashiwagi
[Outline] We investigate about the increase of conductivity of zinc oxide thin films by irradiating a surface wave excited hydrogen plasma. [Experiment] Zinc oxide thin films are irradiated by surface wave hydrogen plasma generated by means of microwave. The changes of the conductivity of the thin films are evaluated by using a resistivity meter. The zinc oxide thin films used here have the thickness of 1500Aring which is formed by the reactant ion plating method. Diagnosis of a film is thicknessmeter. The surface of thin films and the chemical bond state of the depth direction are measured by XRD and XPS, SIMS. The XRD and XPS, SIMS are utilized to observe the crystal and chemical structures. Transmissivity is measured by spectrophotometer. [Result] The surface resistance changes from infinite to 3.0 times 10 2[/sq], without losing transparency by irradiating hydrogen microwave surface wave plasma at a zinc oxide thin film
{"title":"The surface modification effect by irradiation of a surface wave excited hydrogen plasma onto zinc oxide thin films","authors":"T. Nakayama, T. Takizawa, Y. Sakamoto, K. Kashiwagi","doi":"10.1109/DEIV.2006.357365","DOIUrl":"https://doi.org/10.1109/DEIV.2006.357365","url":null,"abstract":"[Outline] We investigate about the increase of conductivity of zinc oxide thin films by irradiating a surface wave excited hydrogen plasma. [Experiment] Zinc oxide thin films are irradiated by surface wave hydrogen plasma generated by means of microwave. The changes of the conductivity of the thin films are evaluated by using a resistivity meter. The zinc oxide thin films used here have the thickness of 1500Aring which is formed by the reactant ion plating method. Diagnosis of a film is thicknessmeter. The surface of thin films and the chemical bond state of the depth direction are measured by XRD and XPS, SIMS. The XRD and XPS, SIMS are utilized to observe the crystal and chemical structures. Transmissivity is measured by spectrophotometer. [Result] The surface resistance changes from infinite to 3.0 times 10 2[/sq], without losing transparency by irradiating hydrogen microwave surface wave plasma at a zinc oxide thin film","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"180 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116439557","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2006-09-01DOI: 10.1109/DEIV.2006.357359
A. F. Alexandrov, H. Lee, C. Choi, V. Plaksin, V. Riaby, V. Savinov
The phenomenon of discharge current diversion by conductive parts (electrodes, design elements or substrates) in contact with plasmas is considered for both DC and AC discharges. For the first time, atmospheric plasmatrons are analysed together with the glow discharge devices. A special experiment has been carried out that proved directly the correctness of the proposed approach. The negative sides of the phenomenon are discussed. In some practical cases, non-evident problems are formulated and their solutions are proposed
{"title":"Fractional Diversion of Discharge Current into Conductive Bodies in Contact with Plasmas","authors":"A. F. Alexandrov, H. Lee, C. Choi, V. Plaksin, V. Riaby, V. Savinov","doi":"10.1109/DEIV.2006.357359","DOIUrl":"https://doi.org/10.1109/DEIV.2006.357359","url":null,"abstract":"The phenomenon of discharge current diversion by conductive parts (electrodes, design elements or substrates) in contact with plasmas is considered for both DC and AC discharges. For the first time, atmospheric plasmatrons are analysed together with the glow discharge devices. A special experiment has been carried out that proved directly the correctness of the proposed approach. The negative sides of the phenomenon are discussed. In some practical cases, non-evident problems are formulated and their solutions are proposed","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129797498","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2006-09-01DOI: 10.1109/DEIV.2006.357420
N. V. Tatarinova
Studies of charged particle emission connected with resonance gas desorption are of great importance for understanding of processes providing both pre-breakdown conductivity of a vacuum gap and probable formation and sustaining of vacuum arc (vacuum breakdown). For operational high voltage electrodes such currents may be rather negligible thanks to low numbers of defects such as pores on their surfaces. This paper presents some results of experiments conducted for special porous electrodes
{"title":"A resonance gas desorption as an initiating factor of the vacuum insulation damage","authors":"N. V. Tatarinova","doi":"10.1109/DEIV.2006.357420","DOIUrl":"https://doi.org/10.1109/DEIV.2006.357420","url":null,"abstract":"Studies of charged particle emission connected with resonance gas desorption are of great importance for understanding of processes providing both pre-breakdown conductivity of a vacuum gap and probable formation and sustaining of vacuum arc (vacuum breakdown). For operational high voltage electrodes such currents may be rather negligible thanks to low numbers of defects such as pores on their surfaces. This paper presents some results of experiments conducted for special porous electrodes","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"2 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128236064","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2006-09-01DOI: 10.1109/DEIV.2006.357381
N. Iizuka, N. Kishi, I. Song, T. Sakamoto, Y. Kobayashi, S. Mohanty, M. Watanabe, A. Okino, E. Hotta
A high repetitive, compact and low-debris Xenon Z-pinch discharge system has been designed and fabricated as an EUV light source, in which a newly developed gas jet-type Z-pinch source is used. The discharge head has a coaxial double nozzle and a diffuser. Xenon Z-pinch plasma that emits EUV light is produced between the inner nozzle and the corresponding diffuser. An annular shell of a He gas curtain produced by the outer nozzle is specially designed for shielding the debris and suppressing the inner gas expansion. We have succeeded in generating EUV emitting plasma of 0.14 mm FWHM diameter and 0.80 mm FWHM length. We have also developed a new pulse power supply system, which has two magnetic pulse compression stages to achieve higher discharge current
{"title":"Optimization of a gas jet-type Z-pinch discharge EUV light source","authors":"N. Iizuka, N. Kishi, I. Song, T. Sakamoto, Y. Kobayashi, S. Mohanty, M. Watanabe, A. Okino, E. Hotta","doi":"10.1109/DEIV.2006.357381","DOIUrl":"https://doi.org/10.1109/DEIV.2006.357381","url":null,"abstract":"A high repetitive, compact and low-debris Xenon Z-pinch discharge system has been designed and fabricated as an EUV light source, in which a newly developed gas jet-type Z-pinch source is used. The discharge head has a coaxial double nozzle and a diffuser. Xenon Z-pinch plasma that emits EUV light is produced between the inner nozzle and the corresponding diffuser. An annular shell of a He gas curtain produced by the outer nozzle is specially designed for shielding the debris and suppressing the inner gas expansion. We have succeeded in generating EUV emitting plasma of 0.14 mm FWHM diameter and 0.80 mm FWHM length. We have also developed a new pulse power supply system, which has two magnetic pulse compression stages to achieve higher discharge current","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"272 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115178770","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2006-09-01DOI: 10.1109/DEIV.2006.357396
R. Hollinger, M. Galonska, R. Mayr
In order to compare the beam quality produced by the ion source CHORDIS and the vacuum arc ion source VARIS, beam emittance measurements have been performed. The ion sources were equipped with a multi-aperture accel-decel extraction system, which is usually chosen for beam time operation at GSI. A slit-grid emittance measurement device was used for these investigations. Further on, sophisticated computer simulations with Kobra3-INP have been carried out
{"title":"Emittance Studies of the High Current Ion Sources at GSI","authors":"R. Hollinger, M. Galonska, R. Mayr","doi":"10.1109/DEIV.2006.357396","DOIUrl":"https://doi.org/10.1109/DEIV.2006.357396","url":null,"abstract":"In order to compare the beam quality produced by the ion source CHORDIS and the vacuum arc ion source VARIS, beam emittance measurements have been performed. The ion sources were equipped with a multi-aperture accel-decel extraction system, which is usually chosen for beam time operation at GSI. A slit-grid emittance measurement device was used for these investigations. Further on, sophisticated computer simulations with Kobra3-INP have been carried out","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"127 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116437070","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2006-09-01DOI: 10.1109/DEIV.2006.357257
Y. Niwa, K. Sasage, K. Yokokura, E. Kaneko
Vacuum interrupters have been widely used for power distribution systems with the development of vacuum arc control technology by magnetic field. There are two major electrode types: transversal magnetic field electrode and axial magnetic field (AMF) electrode. In the former, the vacuum arc column is rotated by the magnetic force generated by the transversal magnetic field, which is radial direction to the electrode, and the current flowing in the arc. In the latter, the vacuum arc is diffused and stabilized by the axial magnetic field, which is parallel to the arc current. Transversal magnetic field electrodes have been researched experimentally. To increase interruption ability by preventing local heating of the electrode, the relationship between the arc behavior and the interruption ability was researched. A high speed video camcorder was used to observe the arc behavior. The interruption ability of the transversal magnetic field electrode was evaluated using Weil test circuit. The arc observations and interruption test results indicate the relationship between the arc behavior, the magnetic field, and the interruption ability
{"title":"The Arc Behavior and the Interruption Ability of the Transversal Magnetic Field Electrode in the Vacuum Interrupter","authors":"Y. Niwa, K. Sasage, K. Yokokura, E. Kaneko","doi":"10.1109/DEIV.2006.357257","DOIUrl":"https://doi.org/10.1109/DEIV.2006.357257","url":null,"abstract":"Vacuum interrupters have been widely used for power distribution systems with the development of vacuum arc control technology by magnetic field. There are two major electrode types: transversal magnetic field electrode and axial magnetic field (AMF) electrode. In the former, the vacuum arc column is rotated by the magnetic force generated by the transversal magnetic field, which is radial direction to the electrode, and the current flowing in the arc. In the latter, the vacuum arc is diffused and stabilized by the axial magnetic field, which is parallel to the arc current. Transversal magnetic field electrodes have been researched experimentally. To increase interruption ability by preventing local heating of the electrode, the relationship between the arc behavior and the interruption ability was researched. A high speed video camcorder was used to observe the arc behavior. The interruption ability of the transversal magnetic field electrode was evaluated using Weil test circuit. The arc observations and interruption test results indicate the relationship between the arc behavior, the magnetic field, and the interruption ability","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"60 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131970254","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2006-09-01DOI: 10.1109/DEIV.2006.357291
E. Prozorov, K. Ulyanov, V. Fedorov
The effect of axisymmetric 2D magnetic field on plasma formation and cathode spots configuration in a vacuum-arc discharge has been examined experimentally. It has been demonstrated that the magnetic field with the cross component about the discharge axis, has a significant effect on the plasma column shape and the speed of cathode spots expanding. The arc plasma in the magnetic field looks like a truncated cone, expanding towards the anode. Cathode spots occupy a part of the cathode area that decreases with the magnetic field increase. Arguments proving that the cathode spots location and the arc plasma form can be determined by the principle of the voltage minimum have been given. The mechanism, related to the retrograde movement of the cathode spot, with the effect of the azimuthal magnetic field on the current axial component balanced by the effect of the axial magnetic field on the azimuthal current component, has also been discussed
{"title":"Effect of the Axial-Symmetrical Two-Dimensional Magnetic Field on the Configuration of a Vacuum Arc Discharge","authors":"E. Prozorov, K. Ulyanov, V. Fedorov","doi":"10.1109/DEIV.2006.357291","DOIUrl":"https://doi.org/10.1109/DEIV.2006.357291","url":null,"abstract":"The effect of axisymmetric 2D magnetic field on plasma formation and cathode spots configuration in a vacuum-arc discharge has been examined experimentally. It has been demonstrated that the magnetic field with the cross component about the discharge axis, has a significant effect on the plasma column shape and the speed of cathode spots expanding. The arc plasma in the magnetic field looks like a truncated cone, expanding towards the anode. Cathode spots occupy a part of the cathode area that decreases with the magnetic field increase. Arguments proving that the cathode spots location and the arc plasma form can be determined by the principle of the voltage minimum have been given. The mechanism, related to the retrograde movement of the cathode spot, with the effect of the azimuthal magnetic field on the current axial component balanced by the effect of the axial magnetic field on the azimuthal current component, has also been discussed","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132184470","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2006-09-01DOI: 10.1109/DEIV.2006.357361
V. Plaksin, V. Riaby, Ji Hoon Kim, C. Choi, Heon-Ju Lee
A novel arc plasma source is proposed, which has low anode erosion rate allowing it to generate nearly spectrally clean plasma flow at the lifetime of 103~104 hours. The temperature of plasma near the nozzle exit is below 100 degC at arc power up to 2 kW. The design and characteristics of the plasmatron are discussed. Vacuum experiments with heterogeneous plasma-chemical processes showed that this device can serve as an effective tool for plasma-chemical treatment at pressures P~100 mbar. As an example, plasma-chemical etching processes for mono-crystal silicon in CF4 plasma and photo-resist on a silicon wafer in air, O2 and CF4 plasmas have been demonstrated
{"title":"Plasma-Chemical Processing of Silicon Substrates Using a Novel Arc Plasmatron","authors":"V. Plaksin, V. Riaby, Ji Hoon Kim, C. Choi, Heon-Ju Lee","doi":"10.1109/DEIV.2006.357361","DOIUrl":"https://doi.org/10.1109/DEIV.2006.357361","url":null,"abstract":"A novel arc plasma source is proposed, which has low anode erosion rate allowing it to generate nearly spectrally clean plasma flow at the lifetime of 103~104 hours. The temperature of plasma near the nozzle exit is below 100 degC at arc power up to 2 kW. The design and characteristics of the plasmatron are discussed. Vacuum experiments with heterogeneous plasma-chemical processes showed that this device can serve as an effective tool for plasma-chemical treatment at pressures P~100 mbar. As an example, plasma-chemical etching processes for mono-crystal silicon in CF4 plasma and photo-resist on a silicon wafer in air, O2 and CF4 plasmas have been demonstrated","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"12 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128554815","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2006-09-01DOI: 10.1109/DEIV.2006.357260
Yundong Cao, Shibo Yin, M. Zong, Chunguang Hou
A novel scheme combined the intelligent monitoring and fault diagnosis of mechanical characteristics for vacuum circuit breakers (VCBs) is proposed. The main principle of monitoring and diagnostic is stated and the design of hardware and software has been realized. By applying the developed on-line monitoring and diagnostic system, the mechanical characteristics of VCBs can be obtained and the detectable faults have been clearly identified, located, displayed and stored. The less maintenance and lower cost can be realized. Furthermore, the availability and reliability of the power system can be improved
{"title":"On-line Monitoring of Mechanical Characteristics for Vacuum Circuit Breaker","authors":"Yundong Cao, Shibo Yin, M. Zong, Chunguang Hou","doi":"10.1109/DEIV.2006.357260","DOIUrl":"https://doi.org/10.1109/DEIV.2006.357260","url":null,"abstract":"A novel scheme combined the intelligent monitoring and fault diagnosis of mechanical characteristics for vacuum circuit breakers (VCBs) is proposed. The main principle of monitoring and diagnostic is stated and the design of hardware and software has been realized. By applying the developed on-line monitoring and diagnostic system, the mechanical characteristics of VCBs can be obtained and the detectable faults have been clearly identified, located, displayed and stored. The less maintenance and lower cost can be realized. Furthermore, the availability and reliability of the power system can be improved","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"52 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133493565","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2006-09-01DOI: 10.1109/DEIV.2006.357431
Y. Sekimori, Y. Yamano, S. Kobayashi, Y. Saito
Gases desorption from an electrode by electron irradiation are regarded as one of causes leading to vacuum breakdown. Desorbed gases stimulated by several-keV electrons from oxygen-free copper were analyzed by using a quadrupole mass spectrometer (QMS). In order to measure gases desorbed from the sample electrode with QMS directionally, a cooling shroud was surrounded with the QMS. The cooled shroud with cooling medium can adsorb not only background gases but also the gases desorbed from the wall of the vacuum chamber by the impacts of reflected or scattered electrons, and prevent them from entering the QMS detector directly. In this experiment, two types of cooling medium were used. When a liquid nitrogen was used into the shroud as cooling medium, gas analysis showed that desorbed gas components from the sample electrode were H2, H2O and CO, and in particular desorption of H2 was significant. Using liquid helium as cooling medium, it was confirmed that gases including H2 gas were condensed on the shroud. However in this experimental condition the desorbed gases from the sample electrode was not confirmed
{"title":"Analysis of Several-keV Electron Stimulated Desorption Gases from Oxygen-free Copper Electrode with a Directional Quadrupole Mass Spectrometer","authors":"Y. Sekimori, Y. Yamano, S. Kobayashi, Y. Saito","doi":"10.1109/DEIV.2006.357431","DOIUrl":"https://doi.org/10.1109/DEIV.2006.357431","url":null,"abstract":"Gases desorption from an electrode by electron irradiation are regarded as one of causes leading to vacuum breakdown. Desorbed gases stimulated by several-keV electrons from oxygen-free copper were analyzed by using a quadrupole mass spectrometer (QMS). In order to measure gases desorbed from the sample electrode with QMS directionally, a cooling shroud was surrounded with the QMS. The cooled shroud with cooling medium can adsorb not only background gases but also the gases desorbed from the wall of the vacuum chamber by the impacts of reflected or scattered electrons, and prevent them from entering the QMS detector directly. In this experiment, two types of cooling medium were used. When a liquid nitrogen was used into the shroud as cooling medium, gas analysis showed that desorbed gas components from the sample electrode were H2, H2O and CO, and in particular desorption of H2 was significant. Using liquid helium as cooling medium, it was confirmed that gases including H2 gas were condensed on the shroud. However in this experimental condition the desorbed gases from the sample electrode was not confirmed","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"11 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121820565","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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