Pub Date : 2006-09-01DOI: 10.1109/DEIV.2006.357411
T. Ose, Y. Sanmaru, T. Kitamura, S. Hosoda, K. Toyoda, M. Cho
As the power level of geostationary satellites increases, discharge phenomena on solar array become serious threat to safe operation. Therefore, it is important to clarify the mechanism of charging and arcing phenomena of the satellite. In this paper, we measured the spectrum of arcs by spectroscopy. We examined the condition of arc plasma when the arc shifted from primary arc to secondary arc by means of measuring arc plasma temperature and identifying material emitted from solar array. It was confirmed that the higher the arc plasma temperature in temporary sustained arc rose before shifting to the temporary sustained arc, the longer the time duration of temporary sustained arc became. Moreover, we confirmed that the arc shifted easily to temporary sustained arc if metallic vapor of aluminum which composed substrate is emitted more than metallic vapor of silver which composed electrode
{"title":"Emission Spectral Analysis of Arc Plasma on Solar Array in GEO Environment","authors":"T. Ose, Y. Sanmaru, T. Kitamura, S. Hosoda, K. Toyoda, M. Cho","doi":"10.1109/DEIV.2006.357411","DOIUrl":"https://doi.org/10.1109/DEIV.2006.357411","url":null,"abstract":"As the power level of geostationary satellites increases, discharge phenomena on solar array become serious threat to safe operation. Therefore, it is important to clarify the mechanism of charging and arcing phenomena of the satellite. In this paper, we measured the spectrum of arcs by spectroscopy. We examined the condition of arc plasma when the arc shifted from primary arc to secondary arc by means of measuring arc plasma temperature and identifying material emitted from solar array. It was confirmed that the higher the arc plasma temperature in temporary sustained arc rose before shifting to the temporary sustained arc, the longer the time duration of temporary sustained arc became. Moreover, we confirmed that the arc shifted easily to temporary sustained arc if metallic vapor of aluminum which composed substrate is emitted more than metallic vapor of silver which composed electrode","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"10 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126069819","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2006-09-01DOI: 10.1109/DEIV.2006.357385
Y. You, F. Meyer, K. Chung
Edge plasma of the ORNL CAPRICE ECR ion source is studied by directly measuring, with electrical probes, its local plasma parameters such as plasma density, temperature and electron energy distributions at different RF power levels and different locations from the resonant zone. Edge plasma can be approximated to be bi-Maxwellian, whose characteristics become more pronounced farther from the ECR zone. These trends are consistently explained by the collective long-range Spitzer collision mechanism in terms of steep temperature gradient between the triangular plasma region and the gap region during the bounce motions between the magnetic poles, so that the low energy electrons are more collisional and are pitch-angle scattered to the loss cones, while the high energy electrons are less collisional and can reach farther edge position
{"title":"Bi-Maxwellian electron energy distributions in the edge of the CAPRICE ECR ion sources","authors":"Y. You, F. Meyer, K. Chung","doi":"10.1109/DEIV.2006.357385","DOIUrl":"https://doi.org/10.1109/DEIV.2006.357385","url":null,"abstract":"Edge plasma of the ORNL CAPRICE ECR ion source is studied by directly measuring, with electrical probes, its local plasma parameters such as plasma density, temperature and electron energy distributions at different RF power levels and different locations from the resonant zone. Edge plasma can be approximated to be bi-Maxwellian, whose characteristics become more pronounced farther from the ECR zone. These trends are consistently explained by the collective long-range Spitzer collision mechanism in terms of steep temperature gradient between the triangular plasma region and the gap region during the bounce motions between the magnetic poles, so that the low energy electrons are more collisional and are pitch-angle scattered to the loss cones, while the high energy electrons are less collisional and can reach farther edge position","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"223 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126123875","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2006-09-01DOI: 10.1109/DEIV.2006.357427
T. Nebiki, T. Narusawa
We have studied focusing of MeV He ion beams by fine glass capillary optics. The glass capillary optics are formed by using a puller as to have outlet diameters of sub-microns to several tens microns. The majority of incident ions are lost by the collision with the inner wall. However, impingent MeV ions to such insulating capillaries charge up the inner wall surface resulting in self-organized potential barrier. This electric field gently guides the ions through the capillary without significant energy loss. In this way a part of incident ions is focused and emitted through the outlet of the optics having the same diameter as the capillary outlet
{"title":"Glass capillary optics for focusing of high energy ion beams","authors":"T. Nebiki, T. Narusawa","doi":"10.1109/DEIV.2006.357427","DOIUrl":"https://doi.org/10.1109/DEIV.2006.357427","url":null,"abstract":"We have studied focusing of MeV He ion beams by fine glass capillary optics. The glass capillary optics are formed by using a puller as to have outlet diameters of sub-microns to several tens microns. The majority of incident ions are lost by the collision with the inner wall. However, impingent MeV ions to such insulating capillaries charge up the inner wall surface resulting in self-organized potential barrier. This electric field gently guides the ions through the capillary without significant energy loss. In this way a part of incident ions is focused and emitted through the outlet of the optics having the same diameter as the capillary outlet","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"52 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130318093","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2006-09-01DOI: 10.1109/DEIV.2006.357287
S. Ochi, S. Miyamoto, H. Koga, N. Kan, T. Harada, T. Ito, K. Koyama, S. Yamade
Silver tungsten-carbide (AgWC) has been used for contact materials of low surge type vacuum interrupter because of their properties such as low chopping current and low erosion. However the interrupting capability of AgWC is relatively less than CuCr. Generally, in order to increase the interrupting capability, axial magnetic field (AMF) is applied for large rated currents. On the other hand, it is known that the contact materials greatly affect the interrupting capability and chopping current. In this paper, in order to increase the interrupting capability of low surge type vacuum interrupters, the effect of the intensity of AMF and composition of AgWC under AMF on the interrupting capability were investigated. The contents of Ag and WC were varied and cobalt (Co) was added as a third element. Also the chopping currents were investigated. As a result, it was found that an increase of Co and a decrease of Ag content tended to increase the interrupting capability
{"title":"The Effect of contact material composition of AgWC and Axial Magnetic Field intensity on interrupting capability and chopping current","authors":"S. Ochi, S. Miyamoto, H. Koga, N. Kan, T. Harada, T. Ito, K. Koyama, S. Yamade","doi":"10.1109/DEIV.2006.357287","DOIUrl":"https://doi.org/10.1109/DEIV.2006.357287","url":null,"abstract":"Silver tungsten-carbide (AgWC) has been used for contact materials of low surge type vacuum interrupter because of their properties such as low chopping current and low erosion. However the interrupting capability of AgWC is relatively less than CuCr. Generally, in order to increase the interrupting capability, axial magnetic field (AMF) is applied for large rated currents. On the other hand, it is known that the contact materials greatly affect the interrupting capability and chopping current. In this paper, in order to increase the interrupting capability of low surge type vacuum interrupters, the effect of the intensity of AMF and composition of AgWC under AMF on the interrupting capability were investigated. The contents of Ag and WC were varied and cobalt (Co) was added as a third element. Also the chopping currents were investigated. As a result, it was found that an increase of Co and a decrease of Ag content tended to increase the interrupting capability","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"90 2 Pt 1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129179111","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2006-09-01DOI: 10.1109/DEIV.2006.357370
T. Iwao, A. Sato, M. Yumoto
Cathode spots of a low-pressure arc can remove oxide layers and evaporate impurities on metal surfaces. Removal of the oxide layer using cathode spots is expected to solve recent obstacles to chemical and mechanical cleaning methods. Various phenomena of cathode spots have been investigated for pre-treatment of atmospheric pressure plasma spray (APPS). This study addressed the dependence of initial surface roughness for treated surface by cathode spots of low pressure arc. The test pieces (SS 400) are used, and they are compared with the treated surface by cathode spots and mechanical blasted surfaces in order to know the dependence of initial surface roughness for treated surface by cathode spot of low pressure arc. Results show that the treated surface roughness on the test piece surface by low pressure arc increases with increasing the initial surface roughness at 100 Pa of atmospheric pressure. In addition, it decreases with increasing the current
{"title":"Dependence of Initial Surface Roughness for Treated Surface by Cathode Spots of Low Pressure Arc","authors":"T. Iwao, A. Sato, M. Yumoto","doi":"10.1109/DEIV.2006.357370","DOIUrl":"https://doi.org/10.1109/DEIV.2006.357370","url":null,"abstract":"Cathode spots of a low-pressure arc can remove oxide layers and evaporate impurities on metal surfaces. Removal of the oxide layer using cathode spots is expected to solve recent obstacles to chemical and mechanical cleaning methods. Various phenomena of cathode spots have been investigated for pre-treatment of atmospheric pressure plasma spray (APPS). This study addressed the dependence of initial surface roughness for treated surface by cathode spots of low pressure arc. The test pieces (SS 400) are used, and they are compared with the treated surface by cathode spots and mechanical blasted surfaces in order to know the dependence of initial surface roughness for treated surface by cathode spot of low pressure arc. Results show that the treated surface roughness on the test piece surface by low pressure arc increases with increasing the initial surface roughness at 100 Pa of atmospheric pressure. In addition, it decreases with increasing the current","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"24 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127739992","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2006-09-01DOI: 10.1109/DEIV.2006.357398
A. Goncharov, I. Brown
We review some recent developments of the electrostatic plasma lens and some novel plasma devices based on the 'plasma lens concept' of magnetic insulation of electrons and equipotentialization along magnetic field lines. The plasma lens configuration of crossed electric and magnetic fields provides an attractive and simple method for establishing a stable plasma discharge at low pressure, and has been used to develop some low cost, low maintenance plasma devices for ion cleaning, surface activation, and polishing of substrates prior to film deposition. Recent embodiments of these devices use permanent magnets and possess considerable flexibility with respect to spatial configuration. Results of preliminary experiments on the application of these devices to ion treatment and coating deposition are summarized
{"title":"Plasma Devices Based on the Plasma Lens Configuration - Basic Results and Application","authors":"A. Goncharov, I. Brown","doi":"10.1109/DEIV.2006.357398","DOIUrl":"https://doi.org/10.1109/DEIV.2006.357398","url":null,"abstract":"We review some recent developments of the electrostatic plasma lens and some novel plasma devices based on the 'plasma lens concept' of magnetic insulation of electrons and equipotentialization along magnetic field lines. The plasma lens configuration of crossed electric and magnetic fields provides an attractive and simple method for establishing a stable plasma discharge at low pressure, and has been used to develop some low cost, low maintenance plasma devices for ion cleaning, surface activation, and polishing of substrates prior to film deposition. Recent embodiments of these devices use permanent magnets and possess considerable flexibility with respect to spatial configuration. Results of preliminary experiments on the application of these devices to ion treatment and coating deposition are summarized","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"44 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127656437","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2006-09-01DOI: 10.1109/DEIV.2006.357435
R. Tanaka, Y. Matsuba, T. Nakada, K. Sakemura, N. Negishi, Y. Okuda, H. Sato, A. Watanabe, T. Yoshikawa, K. Ogasawara, M. Nanba, S. Okazaki, K. Tanioka, N. Egami, N. Koshida
For practical advantages of the HEED (high-efficiency electron emission device) such as a low driving voltage, a high emission current density, especially application to an ultra high sensitive compact image sensor can be expected. A prototype active-matrix HEED image sensor integrated with scanning driver circuits was developed with a HARP (high-gain avalanche rushing amorphous photoconductor) target. It was demonstrated that the prototype 256 times 192 pixels active-matrix HEED array operates well as an effective probe for high-resolution image pickup under dim lighting. The possibility of the active-matrix HEED for development of next-generation image sensor with ultra high sensitivity and high definition was concluded in this report
{"title":"Development of an active-matrix \"HEED\" cold cathode and its application to an image sensor","authors":"R. Tanaka, Y. Matsuba, T. Nakada, K. Sakemura, N. Negishi, Y. Okuda, H. Sato, A. Watanabe, T. Yoshikawa, K. Ogasawara, M. Nanba, S. Okazaki, K. Tanioka, N. Egami, N. Koshida","doi":"10.1109/DEIV.2006.357435","DOIUrl":"https://doi.org/10.1109/DEIV.2006.357435","url":null,"abstract":"For practical advantages of the HEED (high-efficiency electron emission device) such as a low driving voltage, a high emission current density, especially application to an ultra high sensitive compact image sensor can be expected. A prototype active-matrix HEED image sensor integrated with scanning driver circuits was developed with a HARP (high-gain avalanche rushing amorphous photoconductor) target. It was demonstrated that the prototype 256 times 192 pixels active-matrix HEED array operates well as an effective probe for high-resolution image pickup under dim lighting. The possibility of the active-matrix HEED for development of next-generation image sensor with ultra high sensitivity and high definition was concluded in this report","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"62 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121279331","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2006-09-01DOI: 10.1109/DEIV.2006.357434
Q. Zou, T. Ishibashi, H. Ohi, K. Nakazawa, H. Kanakusa, A. Hatta
Microplasma has been studied with gaps from 10 to 1000 mum at near atmospheric pressure in a scanning electron microscope (SEM) chamber using CNTs for cathode. The field emission and gas discharge experiments were carried out at the same configuration. It was confirmed that field electron emission effectively provided primary electrons into the gap, which ignited discharge easily. In the case of gas discharge using carbon nanotubes for cathode, the cathode surface was not damaged even if the discharge current was more than 150 mA
{"title":"Microplasma Discharge Using Carbon Nanotubes for Cathode","authors":"Q. Zou, T. Ishibashi, H. Ohi, K. Nakazawa, H. Kanakusa, A. Hatta","doi":"10.1109/DEIV.2006.357434","DOIUrl":"https://doi.org/10.1109/DEIV.2006.357434","url":null,"abstract":"Microplasma has been studied with gaps from 10 to 1000 mum at near atmospheric pressure in a scanning electron microscope (SEM) chamber using CNTs for cathode. The field emission and gas discharge experiments were carried out at the same configuration. It was confirmed that field electron emission effectively provided primary electrons into the gap, which ignited discharge easily. In the case of gas discharge using carbon nanotubes for cathode, the cathode surface was not damaged even if the discharge current was more than 150 mA","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123976268","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2006-09-01DOI: 10.1109/DEIV.2006.357390
I. Litovko
The simulation of the extraction of charge particle beam from a vacuum arc based source has been used for investigation of the beam quality and optimization for specific application possibilities. A few examples are used to demonstrate the capabilities and limits of these simulations. The simulation can provide the basis for optimizing the extraction system and acceleration gap for source and for decreasing losses of the extracted beam
{"title":"Computer Simulation of Beam Extraction and Transport for Vacuum Arc Based Ion and Electron Sources","authors":"I. Litovko","doi":"10.1109/DEIV.2006.357390","DOIUrl":"https://doi.org/10.1109/DEIV.2006.357390","url":null,"abstract":"The simulation of the extraction of charge particle beam from a vacuum arc based source has been used for investigation of the beam quality and optimization for specific application possibilities. A few examples are used to demonstrate the capabilities and limits of these simulations. The simulation can provide the basis for optimizing the extraction system and acceleration gap for source and for decreasing losses of the extracted beam","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"26 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122973268","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2006-09-01DOI: 10.1109/DEIV.2006.357343
Wang Er-zhi, Han Changwei, L. Xiaoming, Cao Yundong
In the charge simulation method (CSM), the determination of simulated charges in electrode depends, to a great extent, on the experience of calculators. Meanwhile, the problem is encountered in arranging the simulated charges in the thin electrode. Many investigators have been dedicating for solving these problems, one of the better way is using optimization strategy. Due to the optimized variables are so large that it will turn the optimization unworkable. In this paper, the method of selecting a proper function to determine the coordinate of simulated charges is proposed which makes optimized variables much reduced. In addition, the boundary displacement technique is proposed which brings the thin electrode problem well resolved
{"title":"Electric Field Calculation for Vacuum Interrupter by Optimized Charge Simulation Method","authors":"Wang Er-zhi, Han Changwei, L. Xiaoming, Cao Yundong","doi":"10.1109/DEIV.2006.357343","DOIUrl":"https://doi.org/10.1109/DEIV.2006.357343","url":null,"abstract":"In the charge simulation method (CSM), the determination of simulated charges in electrode depends, to a great extent, on the experience of calculators. Meanwhile, the problem is encountered in arranging the simulated charges in the thin electrode. Many investigators have been dedicating for solving these problems, one of the better way is using optimization strategy. Due to the optimized variables are so large that it will turn the optimization unworkable. In this paper, the method of selecting a proper function to determine the coordinate of simulated charges is proposed which makes optimized variables much reduced. In addition, the boundary displacement technique is proposed which brings the thin electrode problem well resolved","PeriodicalId":369861,"journal":{"name":"2006 International Symposium on Discharges and Electrical Insulation in Vacuum","volume":"60 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123019094","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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