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Development of EUV interference lithography for 25 nm line/space patterns 用于25nm线/空间图案的EUV干涉光刻技术的发展
Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2023-09-01 DOI: 10.1016/j.mne.2023.100215
A.K. Sahoo , P.-H. Chen , C.-H. Lin , R.-S. Liu , B.-J. Lin , T.-S. Kao , P.-W. Chiu , T.-P. Huang , W.-Y. Lai , J. Wang , Y.-Y. Lee , C.-K. Kuan

In this study, we present the performance of an extreme ultraviolet interference lithography (EUV-IL) setup that was reconstructed at Taiwan Light Source 21B2 EUV beamline in the National Synchrotron Radiation Research Center (NSRRC), Taiwan. An easy-to-perform fabrication method to produce a high-quality transmission grating mask and a simple design of experimental setup for EUV-IL were developed. The current EUV-IL setup is capable of fabricating line/space patterns down to 25 nm half-pitch in hydrogen silsesquioxane (HSQ) resist. Preliminary exposure results revealed that optimized slit width and exposure time significantly improved line/space pattern quality. The current EUV-IL tool at NSRRC can be used for nano-patterning and resist screening to advance the next generation of semiconductor devices.

在本研究中,我们介绍了在台湾国家同步辐射研究中心(NSRRC)的台湾光源21B2 EUV束线重建的极紫外干涉光刻(EUV-IL)装置的性能。提出了一种生产高质量透射光栅掩模的简单制造方法和EUV-IL实验装置的简单设计。当前的EUV-IL设置能够在氢倍半硅氧烷(HSQ)抗蚀剂中制造低至25nm半间距的线/空间图案。初步曝光结果显示,优化的狭缝宽度和曝光时间显著提高了线/空间图案的质量。NSRRC目前的EUV-IL工具可用于纳米图案化和抗蚀剂屏蔽,以推动下一代半导体器件的发展。
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引用次数: 0
UV-assisted punching of microgel shapes for oral biomacromolecule delivery 用于口服生物大分子递送的微凝胶形状的紫外线辅助打孔
Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2023-09-01 DOI: 10.1016/j.mne.2023.100221
Shahana Bishnoi , Xiaoli Liu , Lasse Højlund Eklund Thamdrup , Ritika Singh Petersen , Leticia Hosta-Rigau , Stephan Sylvest Keller

Hydrogel based carriers have been predominantly investigated to combat the prominent challenges faced by oral biomacromolecule delivery. Several micromolding, microfluidic and photolithographic techniques have been described for the fabrication of non-spherical hydrogel based microcarriers. However, these techniques are unsuitable for loading biomacromolecules as integral part of the fabrication process due to the use of high temperatures, solvents and multiple processing steps. Here, we introduce UV-assisted punching as a novel two-step fabrication technique for the development of biocompatible microgel shapes for oral drug administration. Poly-ethylene glycol (PEG) microgel shapes with lateral dimensions of 25–100 μm and a height of 25 μm were fabricated on a flexible poly vinyl alcohol (PVA) substrate with a robust cycloolefin polymer (COP) stamp. The proposed process uses UV-initiated crosslinking of aqueous solutions at ambient temperatures, thereby providing a highly attractive method for the fabrication of biomacromolecule loaded hydrogel based carriers. For the proof-of-concept, the microgel shapes were loaded with the fluorescently labelled model biomacromolecule bovine serum albumin without any additional steps. The successful loading is demonstrated by fluorescence microscopy. In vitro studies are performed to quantify the macromolecular content and the release profile associated with the fabricated microgel shapes.

基于水凝胶的载体主要用于对抗口服生物大分子递送所面临的突出挑战。已经描述了几种用于制备基于非球形水凝胶的微载体的微成型、微流体和光刻技术。然而,由于使用高温、溶剂和多个处理步骤,这些技术不适合作为制造过程的组成部分装载生物大分子。在这里,我们介绍了紫外线辅助打孔作为一种新的两步制备技术,用于开发用于口服给药的生物相容性微凝胶形状。在柔性聚乙烯醇(PVA)基底上制备了横向尺寸为25–100μm、高度为25μm的聚乙二醇(PEG)微凝胶形状,并带有坚固的环烯烃聚合物(COP)印章。所提出的方法在环境温度下使用UV引发的水溶液交联,从而为制备负载生物大分子的水凝胶基载体提供了一种极具吸引力的方法。为了验证概念,在没有任何额外步骤的情况下,用荧光标记的模型生物大分子牛血清白蛋白加载微凝胶形状。荧光显微镜证明了成功的装载。进行体外研究以量化与所制造的微凝胶形状相关的大分子含量和释放曲线。
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引用次数: 0
Overcoming the response instability of MoS2 humidity sensors by hydrochloric acid surface treatment 盐酸表面处理克服二硫化钼湿度传感器响应不稳定性
Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2023-09-01 DOI: 10.1016/j.mne.2023.100216
Maria Kainourgiaki, Menelaos Tsigkourakos, Evangelos Skotadis, Evangelos Aslanidis, Dimitris Tsoukalas

The synthesis of MoS2 with chemical vapor deposition (CVD) using sodium molybdate (Na2MoO4) as the Mo precursor produces a big number of large flakes (∼100-300 μm) compared to other CVD methods that use different precursors. In this work, humidity sensors based on MoS2 are developed, whereby MoS2 is grown using this Mo precursor in an aqueous solution form. The final devices exhibit a response-switching during operation under high (>50%) relative humidity conditions, due to the presence of Na2MoO4 residues on their surface. By decreasing the concentration of the aqueous Mo precursor during the CVD process we partially diminish the switching effect, as the Na2MoO4 residue is reduced To completely overcome this issue, we present a post-fabrication surface treatment using hydrochloric acid that removes the Na2MoO4 residue from the devices' surface. Rinsing the devices with an HCl solution results in the elimination of the response-switching effect and the sensors demonstrate a constant positive response from the initial operation steps.

与使用不同前体的其他CVD方法相比,使用钼酸钠(Na2MoO4)作为Mo前体的化学气相沉积(CVD)合成MoS2会产生大量大薄片(~100-300μm)。在这项工作中,开发了基于MoS2的湿度传感器,从而使用这种水溶液形式的Mo前体生长MoS2。由于表面存在Na2MoO4残留物,最终设备在高(>;50%)相对湿度条件下运行时表现出响应切换。通过在CVD过程中降低水性Mo前体的浓度,我们部分减少了切换效应,因为Na2MoO4残留物减少了。为了完全克服这个问题,我们提出了一种使用盐酸的制造后表面处理,该处理可以去除器件表面的Na2MoO4残留物。用HCl溶液冲洗设备可以消除响应切换效应,并且传感器在初始操作步骤中表现出恒定的正响应。
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引用次数: 1
Functionalization of polyethylene terephthalate fabrics with au@Cu2O core@shell nanocrystals for environmental purifications 用au@Cu2O core@shell纳米晶体功能化聚对苯二甲酸乙二醇酯织物用于环境净化
Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2023-09-01 DOI: 10.1016/j.mne.2023.100217
Jhen-Yang Wu , Mei-Jing Fang , Tomoyuki Kurioka , Ting-Hsuan Lai , Ming-Yu Kuo , Yi-Hsuan Chiu , Chun-Wen Tsao , Yi-An Chen , Hsuan-Hung Kuo , Yu-An Chien , Po-Wei Cheng , Bo-You Lin , Sue-Min Chang , Chun-Yi Chen , Masato Sone , Tso-Fu Mark Chang , Yung-Jung Hsu

Wastewater containing synthetic dyes has caused a significant risk to the environment and human health. Among the various methods to treat wastewater, photocatalysis recommends itself as a particularly efficient tool for the removal of dyes from industrial effluents. In this work, Au@Cu2O core@shell nanocrystals with controllable shell thicknesses from 38.1 ± 2.8 (Au@Cu2O-2), 48.1 ± 3.7 (Au@Cu2O-3) to 59.1 ± 4.1 nm (Au@Cu2O-4) have been prepared and immobilized on polyethylene terephthalate (PET) fabrics for applications in photocatalytic degradation of methylene orange (MO). The influence of the shell thickness of Au@Cu2O on the photocatalytic performance of the functionalized PET fabrics has been examined. Among all the samples tested, immobilization of Au@Cu2O-3 rendered PET fabrics the largest photocatalytic activity for MO degradation, achieving an apparent rate constant of MO degradation of 7.43 × 10−3 min−1. A plausible mechanism accounting for the degradation process of MO over the functionalized PET has been proposed based on the results of scavenger experiments. This work has provided a delicate yet practical functional textile paradigm by combining the photocatalytic capability of Au@Cu2O and the adaptable feature of PET fabrics. The findings from this study can deliver a viable idea for the design of versatile textiles with competent photocatalytic capacity for environmental purifications and energy conversion.

含有合成染料的废水对环境和人类健康造成了重大风险。在处理废水的各种方法中,光催化被认为是从工业废水中去除染料的一种特别有效的工具。在该工作中,Au@Cu2Ocore@shell具有38.1±2.8可控壳层厚度的纳米晶体(Au@Cu2O-2),48.1±3.7(Au@Cu2O-3)至59.1±4.1纳米(Au@Cu2O-4)制备并固定在聚对苯二甲酸乙二醇酯(PET)织物上,用于光催化降解亚甲基橙(MO)。壳体厚度的影响Au@Cu2O对功能化PET织物的光催化性能进行了研究。在所有测试的样品中Au@Cu2O-3使PET织物具有最大的光催化降解MO的活性,实现了7.43×10−3 min−1的MO降解表观速率常数。基于清除剂实验的结果,提出了一种合理的机制来解释功能化PET上MO的降解过程。这项工作结合了Au@Cu2O以及PET织物的适应性特征。这项研究的发现可以为设计具有良好光催化能力的多功能纺织品提供一个可行的想法,用于环境净化和能源转换。
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引用次数: 1
Microcalorimeter fabrication and new measurement methodology for thermal sensing in microfluidics 微热量计的制造及微流体热传感新测量方法
Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2023-09-01 DOI: 10.1016/j.mne.2023.100222
Martina Freisa, Thi Hong Nhung Dinh, David Bouville, Laurent Couraud, Isabelle Le Potier, Jean Gamby

This work describes the integration of a Resistance Thermal Detector (RTD) microcalorimeter integrated into a 324 nL microfluidic channel. The sensor is fabricated in a clean room using photolithography and evaporation techniques, and it has a platinum serpentine with 60 windings. The RTDs undergo testing in the 30 to 45 °C temperature range, exhibiting great linearity and a sensitivity of 8.42 Ω/°C. Additionally, to perform the thermic measurement, we also provide a circuit architecture that ensures stability against external thermal fluctuations and the self-heating Joule effect. We showed that this measurement method allow us to achieve a precision of ±6.7·10−3 °C, compared to ±0.178 °C total fluctuations found by using the traditional 2-wire method.

这项工作描述了将电阻热检测器(RTD)微热量计集成到324nL微流体通道中。该传感器是在洁净室中使用光刻和蒸发技术制造的,它有一个带有60个绕组的铂蛇形管。RTD在30至45°C的温度范围内进行测试,表现出良好的线性度和8.42Ω/°C的灵敏度。此外,为了进行热测量,我们还提供了一种电路架构,以确保对外部热波动和自热焦耳效应的稳定性。我们表明,与使用传统双线法发现的±0.178°C的总波动相比,这种测量方法使我们能够实现±6.7·10−3°C的精度。
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引用次数: 0
High strength Ni matrix TiO2 composites by supercritical CO2 assisted Co-electrodeposition with different sizes of TiO2 particle 超临界CO2辅助不同粒径TiO2电沉积高强度Ni基TiO2复合材料
Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2023-09-01 DOI: 10.1016/j.mne.2023.100219
Yu-An Chien, Chun-Yi Chen, Tomoyuki Kurioka, Masato Sone, Tso-Fu Mark Chang

High strength Ni matrix TiO2 composites are prepared by co-electrodeposition with an electrolyte composed of Ni Watts bath, surfactants, CO2 in the supercritical fluid state and various sizes of TiO2 particles. The surfactants and supercritical CO2 (SC-CO2) are used to emulsify the aqueous Ni Watts bath to promote the incorporation of TiO2 particles into the Ni matrix. TiO2 particles with three different average sizes are used in the co-electrodeposition to evaluate the effect on properties of the Ni-TiO2 composites. The grain sizes of the Ni matrix in the composites are compared from the X-ray diffraction results and the Scherrer eq. A refined average grain size in the Ni matrix is observed when using TiO2 particles with a larger size. The TiO2 is evaluated by energy-dispersive X-ray spectroscopy (EDX), and the TiO2 distribution is quantified by the coefficient of variation (cov) of the local density of Ti from the EDX result. The TiO2 content attained 4.5 wt% with the lowest cov value (which suggests the most uniform distribution) in the composite when the smallest (21 nm) TiO2 particles are used. The TiO2 content achieves 22.3 wt% with the highest cov value (which suggests the least uniform distribution) when the largest (5 μm) TiO2 particles are used. Microhardness of the Ni-TiO2 composites is found to be highly depended on the cov value. Hence, the Ni-TiO2 composite prepared with the smallest TiO2 particles shows the highest microhardness at 1274 HV.

通过与由Ni Watts浴、表面活性剂、超临界流体状态下的CO2和各种尺寸的TiO2颗粒组成的电解质共同电沉积制备了高强度Ni基TiO2复合材料。表面活性剂和超临界CO2(SC-CO2)用于乳化含水Ni Watts浴,以促进TiO2颗粒结合到Ni基体中。在共电沉积中使用了三种不同平均尺寸的TiO2颗粒来评估对Ni-TiO2复合材料性能的影响。根据X射线衍射结果和Scherrer方程比较了复合材料中Ni基体的晶粒尺寸。当使用具有较大尺寸的TiO2颗粒时,观察到Ni基体中的精细平均晶粒尺寸。通过能量色散X射线光谱(EDX)评估TiO2,并通过来自EDX结果的Ti局部密度的变异系数(cov)量化TiO2分布。当使用最小(21nm)的TiO2颗粒时,TiO2含量达到4.5wt%,在复合物中具有最低的cov值(这表明分布最均匀)。当使用最大(5μm)的TiO2颗粒时,TiO2含量达到22.3wt%,具有最高的cov值(这表明分布最不均匀)。研究发现,Ni-TiO2复合材料的显微硬度高度依赖于cov值。因此,用最小的TiO2颗粒制备的Ni-TiO2复合材料在1274HV下显示出最高的显微硬度。
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引用次数: 0
Guest editorial: Plasmonics and nanophotonics: Trends, techniques and applications 嘉宾评论:等离子体和纳米光子学:趋势、技术和应用
Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2023-09-01 DOI: 10.1016/j.mne.2023.100194
Dieter P. Kern , Monika Fleischer , Marc Brecht , Helmut Schift
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引用次数: 0
Ru/Ta bilayer approach to EUV mask absorbers: Experimental patterning and simulated imaging perspective Ru/Ta双分子层方法用于EUV掩膜吸收:实验模式和模拟成像视角
Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2023-09-01 DOI: 10.1016/j.mne.2023.100223
Devesh Thakare , Jean-François de Marneffe , Annelies Delabie , Vicky Philipsen

The optical properties and geometry of EUV mask absorbers play an essential role in determining the imaging performance of a mask in EUV lithography. Imaging metrics, including Normalized Image Log Slope (NILS), Telecentricity Error (TCE), and Best Focus Variation (BFV) through pitch deteriorate because of Mask 3-Dimensional (M3D) effects in EUV lithography, which limits the production efficiency. Alternative absorbers, including alloys of Ru and Ta, are anticipated to reduce some of the M3D effects; however, patterning these materials is challenging due to their low etch rates and poor etch selectivity against the Ru mask capping layer. Therefore, we propose a Ru/Ta bilayer approach to EUV mask absorbers and investigate it from a patterning and imaging standpoint. The top Ru layer thickness is calculated using the thin film interference phenomena, and we determine the bottom Ta layer that can produce improved NILS by utilizing the total absorber thickness optimization methodology. We demonstrate the patterning of the Ru/Ta bilayer using a two-step etch; the top Ru layer is patterned with Cl2-O2 Reactive Ion Etch (RIE), and the bottom Ta layer with Cl2-N2 RIE. The geometry and morphology of the patterned bilayer stack are investigated using TEM (Transmission Electron Microscopy), and interdiffusion at the interface of Ru and Ta is studied using EDS-STEM (Energy Dispersive X-ray Spectroscopy-Scanning Transmission Electron Microscopy). The non-ideal traits of the Ru/Ta bilayer stack, determined by experimental characterization techniques, are used to simulate the imaging performance and then compared against an ideal Ru/Ta bilayer stack, along with the reference Ta-based absorber. Even when non-idealities are considered, the simulation findings demonstrate that the Ru/Ta bilayer absorber exhibits improved NILS and reduced BFV compared to the Ta-based absorber. The outcomes encourage further research into the possibilities of multilayer absorbers, to tailor their optical characteristics by varying the thickness of individual layers.

EUV掩模吸收体的光学性质和几何形状在决定EUV光刻中掩模的成像性能方面起着至关重要的作用。由于EUV光刻中的掩模三维(M3D)效应,包括归一化图像对数斜率(NILS)、远心误差(TCE)和通过间距的最佳聚焦变化(BFV)在内的成像指标恶化,这限制了生产效率。替代吸收剂,包括Ru和Ta的合金,预计将减少一些M3D效应;然而,图案化这些材料是具有挑战性的,因为它们的蚀刻速率低并且对Ru掩模覆盖层的蚀刻选择性差。因此,我们提出了一种用于EUV掩模吸收体的Ru/Ta双层方法,并从图案化和成像的角度对其进行了研究。利用薄膜干涉现象计算了顶部Ru层的厚度,并利用总吸收层厚度优化方法确定了可以产生改进NILS的底部Ta层。我们展示了使用两步蚀刻来图案化Ru/Ta双层;顶部Ru层用Cl2-O2反应离子蚀刻(RIE)图案化并且底部Ta层用Cl1-N2 RIE图案化。使用TEM(透射电子显微镜)研究了图案化双层堆叠的几何结构和形态,并使用EDS-STEM(能量分散X射线光谱扫描透射电子显微镜(Energy Dispersive X-ray Spectroscopy Scanning Transmission Electron Microscopy))研究了Ru和Ta界面处的相互扩散。通过实验表征技术确定的Ru/Ta双层堆叠的非理想特性用于模拟成像性能,然后与理想Ru/Ta单层堆叠以及参考Ta基吸收体进行比较。即使考虑了非理想性,模拟结果也表明,与Ta基吸收体相比,Ru/Ta双层吸收体表现出改进的NILS和降低的BFV。这些结果鼓励进一步研究多层吸收体的可能性,通过改变单个层的厚度来调整其光学特性。
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引用次数: 0
3D-printed microfluidic system for the in situ diagnostics and screening of nanoparticles synthesis parameters 3d打印微流控系统用于纳米颗粒合成参数的原位诊断和筛选
Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2023-09-01 DOI: 10.1016/j.mne.2023.100224
V.V. Shapovalov , S.V. Chapek , A.A. Tereshchenko , A.N. Bulgakov , A.P. Bagliy , V.V. Volkov , P.V. Konarev , M.A. Soldatov , S.A. Soldatov , A.A. Guda , A.V. Soldatov

Fine tuning of the material properties requires many trials and errors during the synthesis. The metal nanoparticles undergo several stages of reduction, clustering, coalescence and growth upon their formation. Resulting properties of the colloidal solution thus depend on the concentrations of the reagents, external temperature, synthesis protocol and qualification of the researcher determines the reproducibility and quality. Automatized flow systems overcome the difficulties inherent for the conventional batch approaches. Microfluidic systems represent a good alternative for the high throughput data collection. The recent advances in 3D-printing made complex topologies in microfluidic devices cheaper and easily customizable. However, channels of the cured photopolymer resin attract metal ions upon synthesis and create crystallization centers. In our work we present 3D-printed system for the noble metal nanoparticle synthesis in slugs. Alternating flows of oil and aqueous reaction mixtures prevent metal deposition on the channel walls. Elongated droplets are convenient for optical and X-ray diagnostics using conventional methods. We demonstrate the work of the system using Ag nanoparticles synthesis for machine-learning assisted tuning of the plasmon resonance frequency.

材料特性的微调需要在合成过程中进行多次试验和误差。金属纳米颗粒在形成时经历还原、聚集、聚结和生长的几个阶段。因此,胶体溶液的最终性质取决于试剂的浓度、外部温度、合成方案和研究人员的资格决定了再现性和质量。自动化流动系统克服了传统分批方法固有的困难。微流体系统代表了高通量数据收集的一个很好的替代方案。3D打印的最新进展使微流体设备中的复杂拓扑结构更便宜且易于定制。然而,固化的光聚合物树脂的通道在合成时吸引金属离子并产生结晶中心。在我们的工作中,我们提出了在蛞蝓中合成贵金属纳米颗粒的3D打印系统。油和水性反应混合物的交替流动防止金属沉积在通道壁上。细长液滴便于使用传统方法进行光学和X射线诊断。我们展示了使用Ag纳米颗粒合成用于机器学习辅助调谐等离子体共振频率的系统的工作。
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引用次数: 1
Unidirectional frequency conversion of surface plasmon polaritons on metal nanowires 金属纳米线表面等离子激元的单向频率转换
Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2023-06-01 DOI: 10.1016/j.mne.2023.100193
Aurélie Broussier , Ali Issa , Loïc O. Le Cunff , Régis Deturche , Tien Hoa Nguyen , Dinh Xuan Quyen , Tao Xu , Sylvain Blaize , Safi Jradi , Christophe Couteau , Renaud Bachelot

Hybrid nanoplasmonics is one of the most promising branch of nanophotonics which aims, in particular, to control the energy transfer between donor and acceptor nano-emitters via surface plasmons. Recently, an approach of nano-emitters positioning was introduced. It is based on two-photon polymerization of a photosensitive material which contains quantum dots as nano-emitters. This technique allowed for the integration of green quantum dots on plasmonic silver nanowires. In this article, we report on the use of this approach for integrating both green and red quantum dots on silver nanowires. The coupling between nano-emitters and propagating surface plasmons that are supported by the silver nanowires is reported and observed through their scattering at the nanowire ends. For both colors, a parametric study of the distance between the quantum dots and the nanowire extremity shows that precise control of the position of the launching sites enables control of light intensity at the wire end, through surface plasmon propagation length. More interestingly, by integrating two kinds of quantum dots on the same nanowire, we realized an efficient donor-acceptor hybrid nano-system, where green surface plasmons polaritons (from donors) are transformed into red plasmons (from acceptors) at controlled sites of the plasmonic guides, as a result of a frequency conversion of the plasmons polaritons.

混合纳米等离子体是纳米光子学中最有前途的分支之一,其特别目的是通过表面等离子体控制供体和受体纳米发射体之间的能量转移。最近,介绍了一种纳米发射器定位方法。它是基于一种光敏材料的双光子聚合,该材料包含量子点作为纳米发射器。这种技术允许在等离子体银纳米线上集成绿色量子点。在这篇文章中,我们报道了这种方法在银纳米线上集成绿色和红色量子点的使用。报道了纳米发射体和由银纳米线支撑的传播表面等离子体之间的耦合,并通过它们在纳米线末端的散射进行了观察。对于这两种颜色,对量子点和纳米线末端之间距离的参数研究表明,对发射点位置的精确控制能够通过表面等离子体传播长度控制线末端的光强度。更有趣的是,通过在同一纳米线上集成两种量子点,我们实现了一种高效的施主-受主混合纳米系统,其中,由于等离子体激元的频率转换,绿色表面等离子体激元(来自施主)在等离子体激元引导的受控位置处转化为红色等离子体激元。
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引用次数: 0
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Micro and Nano Engineering
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