首页 > 最新文献

Proceedings of Semiconducting and Semi-Insulating Materials Conference最新文献

英文 中文
Low dislocation density 3-inch Si doped GaAs crystals by Vertical Boat growth 低位错密度3英寸Si掺杂GaAs晶体的垂直船形生长
Pub Date : 1996-04-29 DOI: 10.1109/SIM.1996.571099
Y. Hagi, S. Kawarabayashi, T. Inoue, R. Nakai, J. Kohno, T. Kawase, M. Tatsumi
3-inch Si doped GaAs crystals with low dislocation density (/spl les/100 cm/sup -2/) were developed by the Vertical Boat (VB) method. The shape of the solid/liquid interface was controlled by the temperature gradient near the interface. The desirable interface shape for low dislocation density was studied both empirically and through computer simulation. By improving the interface shape, the stable production of crystals with low dislocation density were achieved.
采用垂直船法(VB)制备了低位错密度(/spl les/100 cm/sup -2/)的3英寸Si掺杂GaAs晶体。固/液界面的形状受界面附近温度梯度的控制。通过经验和计算机模拟研究了低位错密度时理想的界面形状。通过改善界面形状,实现了低位错密度晶体的稳定生成。
{"title":"Low dislocation density 3-inch Si doped GaAs crystals by Vertical Boat growth","authors":"Y. Hagi, S. Kawarabayashi, T. Inoue, R. Nakai, J. Kohno, T. Kawase, M. Tatsumi","doi":"10.1109/SIM.1996.571099","DOIUrl":"https://doi.org/10.1109/SIM.1996.571099","url":null,"abstract":"3-inch Si doped GaAs crystals with low dislocation density (/spl les/100 cm/sup -2/) were developed by the Vertical Boat (VB) method. The shape of the solid/liquid interface was controlled by the temperature gradient near the interface. The desirable interface shape for low dislocation density was studied both empirically and through computer simulation. By improving the interface shape, the stable production of crystals with low dislocation density were achieved.","PeriodicalId":391894,"journal":{"name":"Proceedings of Semiconducting and Semi-Insulating Materials Conference","volume":"544 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1996-04-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126902790","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Infrared absorption related to the metastable state of arsenic antisite defects in electron-irradiated GaAs 电子辐照砷化镓中砷反位缺陷亚稳态与红外吸收的关系
Pub Date : 1996-03-15 DOI: 10.1109/SIM.1996.571095
S. Kuisma, K. Saarinen, P. Hautojärvi, C. Corbel
A metastable irradiation-induced vacancy is detected by positrons in semi-insulating GaAs. The vacancy is associated with the metastable state of an irradiation-induced as-antisite-related defect. This metastable state absorbs IR light in contrast to the metastable state of the as-antisite-related native EL2 defect. This property can be explained by the presence of other defects complexed with the as antisite in electron-irradiated GaAs.
用正电子在半绝缘的砷化镓中检测到亚稳态辐照引起的空位。该空位与辐照诱导的反位相关缺陷的亚稳态有关。这种亚稳态吸收红外光,与反位相关的原生EL2缺陷的亚稳态形成对比。这种性质可以解释为在电子辐照的砷化镓中存在与反位络合的其他缺陷。
{"title":"Infrared absorption related to the metastable state of arsenic antisite defects in electron-irradiated GaAs","authors":"S. Kuisma, K. Saarinen, P. Hautojärvi, C. Corbel","doi":"10.1109/SIM.1996.571095","DOIUrl":"https://doi.org/10.1109/SIM.1996.571095","url":null,"abstract":"A metastable irradiation-induced vacancy is detected by positrons in semi-insulating GaAs. The vacancy is associated with the metastable state of an irradiation-induced as-antisite-related defect. This metastable state absorbs IR light in contrast to the metastable state of the as-antisite-related native EL2 defect. This property can be explained by the presence of other defects complexed with the as antisite in electron-irradiated GaAs.","PeriodicalId":391894,"journal":{"name":"Proceedings of Semiconducting and Semi-Insulating Materials Conference","volume":"13 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1996-03-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115128898","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 5
SiGeC materials SiGeC材料
Pub Date : 1900-01-01 DOI: 10.1109/sim.1996.570938
H. Osten
The growth and properties of Sil,Cy and Sil~,GeXC, alloys pseudomorphically strained on Si(OO1) will be reviewed. Although the bulk solubility of carbon in silicon is small, epitaxial layers with more than 1 at.% C can be fabricated. The relation between substitutional and interstitial carbon incorporation will be presented. Substitutionally incorporated C atoms allow strain manipulation, including the growth of strain-free or inversely strained Sil~,GeXCy layers. The mechanical properties, microscopic structure, thermal stability, as well as the influence of C atoms on band structure will be discussed.
本文综述了在Si(OO1)表面进行假晶应变的Sil,Cy和Sil~,GeXC合金的生长和性能。虽然碳在硅中的体积溶解度很小,但外延层大于1 at。% C可以制造。本文将介绍取代碳与间隙碳结合的关系。取代加入的C原子允许应变操作,包括无应变或反应变的Sil~, gexy层的生长。讨论了其力学性能、微观结构、热稳定性以及C原子对能带结构的影响。
{"title":"SiGeC materials","authors":"H. Osten","doi":"10.1109/sim.1996.570938","DOIUrl":"https://doi.org/10.1109/sim.1996.570938","url":null,"abstract":"The growth and properties of Sil,Cy and Sil~,GeXC, alloys pseudomorphically strained on Si(OO1) will be reviewed. Although the bulk solubility of carbon in silicon is small, epitaxial layers with more than 1 at.% C can be fabricated. The relation between substitutional and interstitial carbon incorporation will be presented. Substitutionally incorporated C atoms allow strain manipulation, including the growth of strain-free or inversely strained Sil~,GeXCy layers. The mechanical properties, microscopic structure, thermal stability, as well as the influence of C atoms on band structure will be discussed.","PeriodicalId":391894,"journal":{"name":"Proceedings of Semiconducting and Semi-Insulating Materials Conference","volume":"57 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129302382","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
期刊
Proceedings of Semiconducting and Semi-Insulating Materials Conference
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1