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Phonon dispersion in gallium nitride 氮化镓中的声子色散
Pub Date : 1996-04-29 DOI: 10.1109/SIM.1996.570889
F. Demangeot, J. Frandon, M. Renucci, B. Beaumont, P. Gibart
GaN layers grown on sapphire (0001) substrates were studied at room temperature by Raman Spectroscopy. Directional dependance of frequency and polarization properties of the extraordinary modes, resulting from the anisotropic wurtzite, was evidenced by macro- and micro-Raman measurements. Second order Raman spectra were recorded and their completely symmetric component was analyzed in terms of phonon density of states. Due to the lack of phonon spectrum calculations, use was made of available q-dispersion curves of the closely related ZnO compound for phonon assignment.
用拉曼光谱在室温下研究了在蓝宝石(0001)衬底上生长的氮化镓层。各向异性纤锌矿导致的异常模式的频率和极化特性的方向依赖性通过宏观和微观拉曼测量得到了证明。记录了二阶拉曼光谱,并从态声子密度的角度分析了其完全对称分量。由于缺乏声子谱计算,我们利用了密切相关的ZnO化合物的q色散曲线进行声子分配。
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引用次数: 1
Point defects in undoped semi-insulating GaAs: correlation between thermally stimulated current and positron annihilation spectroscopies 未掺杂半绝缘砷化镓中的点缺陷:热激发电流与正电子湮没光谱之间的关系
Pub Date : 1996-04-29 DOI: 10.1109/SIM.1996.570928
Z. Fang, D. Look, S. Kuisma, K. Saarinen, P. Hautojarvi
Point defects and the main electron traps in undoped semi-insulating GaAs grown by vertical gradient freeze and high- and low-pressure liquid encapsulated Czochralski techniques have been studied by positron annihilation (PAS) and thermally stimulated current (TSC) spectroscopies, respectively. We find good correlations between the concentrations of the TSC traps T/sub 2/ (0.63 eV) and T/sub 5/ (0.35 eV), and the PAS identified-defects As/sub Ga/ and V/sub As/, respectively. A good correlation between the concentration of intrinsic acceptors (V/sub Ga/ and Ga/sub As/) measured by PAS, and the total acceptor concentration measured by infrared absorption, is also found.
用正电子湮灭(PAS)和热激发电流(TSC)分别研究了垂直梯度冻结法和高压、低压液体封装法生长的未掺杂半绝缘GaAs中的点缺陷和主电子陷阱。我们发现TSC捕集体浓度T/sub 2/ (0.63 eV)和T/sub 5/ (0.35 eV)与PAS识别缺陷As/sub Ga/和V/sub As/之间存在良好的相关性。本征受体(V/sub Ga/和Ga/sub As/)浓度与红外吸收测定的总受体浓度之间存在良好的相关性。
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引用次数: 3
Characterisation of deep-level defects in semi-insulating GaAs and InP by high resolution photoinduced transient spectroscopy (HRPITS) 半绝缘GaAs和InP中深能级缺陷的高分辨率光致瞬态光谱表征
Pub Date : 1996-04-29 DOI: 10.1109/SIM.1996.570926
P. Kamiński, M. Pawłowski, R. Cwirko, M. Palczewska, R. Kozłowski
Deep levels in undoped semi-insulating (SI) GaAs and Fe-doped SI InP investigated by photoinduced transient spectroscopy (PITS). It is demonstrated that the resolution of this method can be improved by direct computer fitting of digitally recorded photocurrent decays.
利用光致瞬态光谱(PITS)研究了未掺杂半绝缘(SI) GaAs和掺铁SI InP的深能级。结果表明,通过直接对数字记录的光电流衰减进行计算机拟合,可以提高该方法的分辨率。
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引用次数: 0
Subpicosecond response of GaAs Fabry-Perot microcavities GaAs Fabry-Perot微腔的亚皮秒响应
Pub Date : 1996-04-29 DOI: 10.1109/SIM.1996.571110
R. Buhleier, J. Iehl, J. Collet, V. Bardinal, C. Fontaine, R. Legros
The temporal and spectral response of bulk GaAs Fabry-Perot microcavities have been investigated in the subpicosecond regime at room temperature. Time resolved reflectivity measurements show a strong reshaping of a Gaussian fs-pulse after reflection from a microcavity caused by group velocity dispersion. The pulse distortion agrees fairly well with model calculations using Fourier transform analysis. Time integrated degenerate four-wave mixing experiments show that response times of the cavity as short as 300 fs were achieved.
本文研究了室温下亚皮秒状态下GaAs法布里-珀罗微腔的时间和光谱响应。时间分辨反射率测量表明,在群速度色散引起的微腔反射后,高斯fs脉冲有很强的重塑。脉冲畸变与利用傅里叶变换分析的模型计算结果相当吻合。时间积分简并四波混频实验表明,腔体的响应时间可短至300fs。
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引用次数: 0
Deep trap characterization of Al./sub 48/In./sub 52/As/In/sub .52/(Ga/sub .7/Al/sub .3/)/sub .48/As heterostructures al /sub 48/In深圈闭表征。/sub 52/As/In/sub .52/(Ga/sub .7/Al/sub .3/)/sub .48/As异质结构
Pub Date : 1996-04-29 DOI: 10.1109/SIM.1996.571102
K. Rezzoug, F. Ducroquet, G. Guillot, L. Giraudet, J.P. Praseuth
Electron traps in AlInAs/In/sub .52/(Ca/sub 1-x/Al/sub x/)/sub .48/As (x=0.3) heterostructures are investigated by deep level transient spectroscopy. Two dominant traps with activation energies of 0.31 and 0.59 eV are observed in quaternary and ternary layers respectively. Both these levels are supposed to be intrinsic defects from the same origin. Another defect at E/sub c/-0.4 eV is detected at the AlInAs/InCaAlAs interface. The concentration of this trap is found to be non uniformly distributed on the wafer and possible impurity contamination is suggested.
用深能级瞬态光谱研究了AlInAs/ in /sub .52/(Ca/sub - 1-x/Al/sub . x/)/sub .48/As (x=0.3)异质结构中的电子陷阱。在四元层和三元层中分别观察到活化能为0.31和0.59 eV的两个优势圈闭。这两个层次都被认为是同一根源的内在缺陷。在AlInAs/InCaAlAs接口处检测到E/sub c/-0.4 eV的另一个缺陷。发现该陷阱的浓度在晶圆上分布不均匀,可能存在杂质污染。
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引用次数: 2
Characterization of conduction in LTG-GaAs LTG-GaAs中导电的表征
Pub Date : 1996-04-29 DOI: 10.1109/SIM.1996.570870
J. Bourgoin, K. Khirouni, J. Nagle
The d.c. and a.c. electrical conduction has been studied in GaAs layer grown by molecular beam epitaxy between 150/spl deg/C and 400/spl deg/C. It is found that the admittance versus frequency, Y(/spl omega/), exhibits a universal behaviour. At low frequencies Y(/spl omega/) is constant, then exhibits a minimum at /spl omega//sub m/. At high frequencies Y(/spl omega/) varies linearly as /spl omega/ showing that conduction occurs via hopping. The temperature dependence of Y(0) indicates that this hopping conduction occurs in a partially filled band related to EL2 defects, the direct relationship between /spl omega//sub m/ and Y(0) demonstrates the existence of a percolation regime, i.e. of a conduction limited by insulating regions which we attribute to space charge regions developed around as precipitates.
研究了分子束外延生长在150 ~ 400℃范围内的砷化镓层的直流和交流电导率。发现导纳与频率的关系Y(/spl ω /)具有普遍的特性。在低频Y(/spl ω /)是恒定的,然后在/spl ω //sub m/处呈现最小值。在高频下,Y(/spl ω /)随/spl ω /线性变化,表明传导是通过跳频发生的。Y(0)的温度依赖性表明,这种跳变传导发生在与EL2缺陷相关的部分填充带中,/spl ω //sub m/与Y(0)之间的直接关系表明,存在一种渗透状态,即由绝缘区域限制的传导,我们将其归因于周围以沉淀形式发展的空间电荷区域。
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引用次数: 1
First results of s.i. GaAs single crystal growth applying the vapour pressure controlled Czochralski method 应用蒸气压控制的Czochralski法生长砷化镓单晶的初步结果
Pub Date : 1996-04-29 DOI: 10.1109/SIM.1996.570868
M. Neubert, M. Seifert, P. Rudolph, K. Trompa, M. Pietsch
The purpose of this paper is to show the current stage of development of the Vapour Pressure Controlled Czochralski Method (VCZ) at the Institute of Crystal Growth (IKZ) in Berlin. First 3" s.i. GaAs crystals, grown in our laboratory, will be presented. The paper briefly summarizes investigations on i) crystal perfection i.e., etch pit density (EPD), cell structure, precipitates and, ii) electrical data, The properties of the crystals are acceptable for s.i. GaAs. An average EPD in the range from 1 to 2/spl times/10/sup 4/ cm/sup -2/ is just achieved but, does not yet match the requirements of very low EPD material.
本文的目的是展示柏林晶体生长研究所(IKZ)蒸汽压力控制的Czochralski方法(VCZ)的当前发展阶段。将展示在我们实验室中生长的第一个3英寸si砷化镓晶体。本文简要总结了晶体完美性,即蚀刻坑密度(EPD),电池结构,沉淀物和ii)电学数据的研究,晶体的性能可用于si GaAs。平均EPD范围为1至2/spl倍/10/sup 4/ cm/sup -2/,但尚未达到极低EPD材料的要求。
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引用次数: 2
Observations of low frequency admittance between isolated GaAs structures formed by ion implantation and by epitaxy on epitaxial buffer layers prepared at high and low temperatures 在高温和低温制备的外延缓冲层上,离子注入和外延形成的孤立GaAs结构之间低频导纳的观察
Pub Date : 1996-04-29 DOI: 10.1109/SIM.1996.570876
F. Boroumand, A. Khalid, M. Hopkinson, J. Swanson
Comparisons have been made of the frequency dependence of the backgate admittance of GaAs structures prepared by MBE on undoped buffer layers prepared at high and low temperatures and of ion implanted structures. A model is offered to explain extra capacitive currents at low frequencies. Inductive and negative resistance behaviours which appear to be related have not been explained. None of these phenomena were apparent in the LT based structures.
比较了高温、低温制备的未掺杂缓冲层和离子注入结构对MBE制备的GaAs结构的后门导纳的频率依赖性。给出了一个解释低频时额外电容电流的模型。感应和负电阻行为似乎是相关的,但尚未得到解释。这些现象在LT基结构中都不明显。
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引用次数: 1
LT GaAs semi-insulating layers applied in vertical-cavity surface-emitting lasers 垂直腔面发射激光器中低温砷化镓半绝缘层的研究
Pub Date : 1996-04-29 DOI: 10.1109/SIM.1996.571113
K. Reginski, A. Malag, D. Radomska, M. Bugajski
In this paper we report on the optimization of the MBE growth process for obtaining semi-insulating LT-GaAs layers applied in vertical-cavity surface-emitting-lasers. The technological conditions for growing LT-GaAs layers have been found and test processes for growing the laser structure at the optimum conditions have been performed. Although numerous optoelectronic applications of LT GaAs have been demonstrated we believe that this is one of the rare cases when LT GaAs has been used in semiconductor laser technology.
本文报道了用于垂直腔面发射激光器的半绝缘LT-GaAs层的MBE生长工艺的优化。找到了生长LT-GaAs层的工艺条件,并进行了在最佳条件下生长激光结构的测试过程。虽然已经证明了LT GaAs的许多光电应用,但我们相信这是LT GaAs在半导体激光技术中使用的罕见案例之一。
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引用次数: 0
ZnCdSe-ZnSe heterostructures grown by MOVPE: influence of the cadmium precursor MOVPE生长ZnCdSe-ZnSe异质结构:镉前驱体的影响
Pub Date : 1996-04-29 DOI: 10.1109/SIM.1996.570914
S. Sanchez, T. Cloitre, P. Bigenwald, A. Chergui, B. Honerlague, R. Aulombard
Graded index separate confinement heterostructures (GRIN-SCH) for microgun blue-green laser were grown by MOVPE. A first study was carried out using selenium hydride, dimethyl cadmium and two dimethylzine adducts as Se, Cd and Zn precursor respectively. This combination leads to intense prereactions and poor layer morphology. To limit this problem we have then used the tetrahydrothiophene:dimethylcadmium adduct. We have first investigated the quality of thick ZnCdSe layers grown using this adduct. GRIN-SCH structures grown using the two cadmium metalorganics were studied using photoluminescence and optical pumping experiments. Stimulated emission was observed for the two kind of samples.
利用MOVPE生长了微枪蓝绿激光器的梯度折射率分离约束异质结构(GRIN-SCH)。以氢化硒、二甲基镉和两种二甲基锌加合物分别作为硒、镉和锌的前驱体进行了初步研究。这种组合导致了强烈的预反应和不良的层形态。为了限制这个问题,我们使用了四氢噻吩:二甲基镉加合物。我们首先研究了使用这种加合物生长的ZnCdSe厚层的质量。利用光致发光和光泵浦实验研究了两种镉金属有机物生长的GRIN-SCH结构。观察了两种样品的受激辐射。
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Proceedings of Semiconducting and Semi-Insulating Materials Conference
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