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Growth of GaN single crystals and properties of homoepitaxial MOCVD layers GaN单晶的生长及同外延MOCVD层的性能
Pub Date : 1996-04-29 DOI: 10.1109/SIM.1996.570882
J. Baranowski, S. Porowski
Recently high quality GaN plates have been grown from the solution in liquid gallium at N/sub 2/ pressure up to 20 kbar and temperature close to 1600/spl deg/C. These single crystals have been used as substrates for homoepitaxial growth of GaN layer by MOCVD. The influence of the polarity of the Ga or N terminated surface of the substrate on the quality of the homoepitaxial layer is discussed. The structural and optical properties of homoepitaxial layers are presented and discussed.
近年来,在N/sub / 2/压力高达20 kbar,温度接近1600/spl°C的液态镓溶液中生长出了高质量的GaN板。这些单晶已被用作MOCVD法生长GaN层的衬底。讨论了衬底端端Ga或N极性对同外延层质量的影响。介绍并讨论了同外延层的结构和光学性质。
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引用次数: 1
Nanoscale mapping of dopant distributions in InP current blocking layers InP阻流层中掺杂物分布的纳米尺度映射
Pub Date : 1996-04-29 DOI: 10.1109/SIM.1996.570923
R. Hull, M. Moore, J. Walker
A novel application of combined electron and ion beam techniques for the study of dopant distributions in InP-based structures is described. It is demonstrated that dopant distributions in InP may be mapped from transmission electron microscope images with spatial resolution /spl sim/10 nm and compositional sensitivity /spl sim/10/sup 17/ cm/sup -3/. Applications to current blocking layers in InP laser diode structures are illustrated. Pertinent experimental observations relating to the origin of this unexpected dopant contrast are discussed.
本文描述了结合电子束和离子束技术用于研究inp基结构中掺杂物分布的一种新应用。结果表明,在空间分辨率为/spl sim/10 nm、成分灵敏度为/spl sim/10/sup 17/ cm/sup -3/的透射电镜图像中,可以映射出InP中掺杂物的分布。并举例说明了在InP激光二极管结构中电流阻挡层的应用。讨论了有关这一意想不到的掺杂对比的起源的相关实验观察。
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引用次数: 1
Effects of semi-insulating substrate on kink phenomena in GaAs MESFETs 半绝缘衬底对GaAs mesfet中扭结现象的影响
Pub Date : 1996-04-29 DOI: 10.1109/SIM.1996.571118
K. Horio, K. Satoh
Two-dimensional simulation of GaAs MESFETs with perfectly insulating substrate is made, and the results are compared with those for a case with more realistic semi-insulating substrate into which carriers call be injected. It is shown that the kink or sub-breakdown is explained by impact ionization of holes and the following hole trapping or hole accumulation in the semi-insulating substrate rather than by direct gate breakdown.
对具有完全绝缘衬底的GaAs mesfet进行了二维仿真,并与具有更真实的半绝缘衬底注入载流子的情况进行了比较。结果表明,半绝缘衬底中空穴的冲击电离和随后的空穴捕获或空穴积累可以解释结或亚击穿,而不是直接栅极击穿。
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引用次数: 0
Heteroepitaxy of Ge-Si/sub 1-x/Ge/sub x/ superlattices on Si (100) substrates by GeH/sub 4/-Si MBE GeH/sub - 4/-Si MBE在Si(100)衬底上异质外延Ge-Si/sub - 1-x/Ge/sub -x/超晶格
Pub Date : 1996-04-29 DOI: 10.1109/SIM.1996.570942
L. Orlov, V. A. Tolomasov, A. Potapov, Y. Drozdov, V. Vdovin
We applied GeH/sub 4/-Si MBE for growing Ge-Si/sub 1-x/Ge/sub x/ superlattices on Si(100). We investigated the distribution and the structure of defects inside heteroepitaxial Si/sub 1-x/Ge/sub x/ layers grown on Si(100). It was shown that the system has unique peculiarities of a dislocation structure formation. We found out that the plastic deformation on a layer-substrate heteroboundary eliminates strong elastic deformation inside the grown layer.
我们应用GeH/sub 4/-Si MBE在Si(100)上生长Ge-Si/sub 1-x/Ge/sub x/超晶格。我们研究了在Si(100)上生长的异质外延Si/sub - 1-x/Ge/sub -x/层内缺陷的分布和结构。结果表明,该体系具有位错结构形成的独特特性。我们发现,层-衬底异质边界上的塑性变形消除了生长层内部的强弹性变形。
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引用次数: 1
Lattice dynamics of Mn/sub x/Cd/sub 1-x/Te mixed crystals Mn/sub x/Cd/sub 1-x/Te混合晶体的晶格动力学
Pub Date : 1996-04-29 DOI: 10.1109/SIM.1996.570918
W. Gȩbicki, W. Szuszkiewicz, J. Kossut, M. Jouanne
Raman scattering spectra of cubic Mn/sub x/Cd/sub 1-x/Te mixed crystals are measured in the range of compositions 0.7/spl les/x/spl les/1.0. Simplified dynamical matrix of the mixed crystal based on rigid ion model and virtual crystal approximation is constructed and phonon density of states is calculated. The calculated phonon density of states is compared with experimental Raman spectra of the MnTe cubic crystal.
测量了立方Mn/sub x/Cd/sub 1-x/Te混合晶体在0.7/spl les/x/spl les/1.0范围内的拉曼散射光谱。基于刚性离子模型和虚晶体近似构造了混合晶体的简化动力学矩阵,并计算了态声子密度。计算的声子态密度与MnTe立方晶体的实验拉曼光谱进行了比较。
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引用次数: 0
Dopant level freeze-out in 6H-SiC Schottky diodes and junctions 6H-SiC肖特基二极管和结中的掺杂水平冻结
Pub Date : 1996-04-29 DOI: 10.1109/SIM.1996.571082
C. Raynaud, G. Guillot
Admittance spectroscopy is shown to be a very convenient tool for analysing majority carrier traps. We have studied by this technique different n- and p-type 6H-SiC Schottky diodes and pn junctions for different net doping levels, N-type and p-type doping are obtained by nitrogen and aluminum respectively, For nitrogen, we have detected two energy levels at E/sub c/-82 meV and E/sub c/-137 meV, which are respectively attributed to hexagonal and cubic sites in 6H-SiC. For aluminum, we have generally detected a rather large variation in the measured activation energy. This variation is supposed to depend on the net doping level, that is, on the compensation ratio.
导纳光谱被证明是分析大多数载流子陷阱的一种非常方便的工具。我们用这种技术研究了不同n型和p型的6H-SiC肖特基二极管和pn结的不同净掺杂水平,氮和铝分别获得了n型和p型掺杂,对于氮,我们检测到E/sub c/-82 meV和E/sub c/-137 meV两个能级,分别归因于6H-SiC中的六方位和立方位。对于铝,我们通常在测量的活化能中检测到相当大的变化。这种变化应该取决于净掺杂水平,即补偿比。
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引用次数: 2
Annealing characteristics of native defects in low-temperature-grown MBE GaAs 低温生长MBE GaAs中原生缺陷的退火特性
Pub Date : 1996-04-29 DOI: 10.1109/SIM.1996.570880
J. Darmo, F. Dubecký, P. Kordos, A. Forster
Deep-level states in low-temperature-grown MBE GaAs are analyzed from the viewpoint of thermal stability. Gallium vacancy V/sub Ga/-related states have two annealing stages with the on-set temperature at about 310 and 430/spl deg/C. Low temperature stage is connected with mobile arsenic interstitial A/sub Si/, while an interaction between V/sub Ga/ and arsenic antiside As/sub Ga/ is dominant in the later stage. Essential annealing kinetic characteristics were determined for both stages. Finally, the migration enthalpy for As/sub Ga/ and the formation enthalpy of annealing of the EL6 state were estimated.
从热稳定性的角度分析了低温生长MBE GaAs的深能级态。镓空位V/亚Ga/相关态有两个退火阶段,开机温度分别为310和430℃。低温阶段与砷的移动间隙A/sub Si/有关,而后期以V/sub Ga/与砷的反侧体As/sub Ga/相互作用为主。确定了两个阶段的基本退火动力学特性。最后,估计了As/sub Ga/的迁移焓和EL6态退火的形成焓。
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引用次数: 1
Atomic force microscopy and Raman scattering study of GaAs/InAs(111) A and B MOVPE heterostructures GaAs/InAs(111) A和B MOVPE异质结构的原子力显微镜和拉曼散射研究
Pub Date : 1996-04-29 DOI: 10.1109/SIM.1996.570935
J. Groenen, G. Attolini, E. Chimenti, C. Pelosi, P. P. Lottici, R. Carles
Surface morphology of GaAs/InAs [111] A and B heterostructures grown by metal organic vapour phase epitaxy have been investigated by atomic force microscopy. The large lattice mismatch induces the formation of pyramidal islands: their geometry greatly depends on the surface polarity and evolves with the growth time. The strain relaxation which accompanies the various growth mechanisms has been analyzed by Raman scattering. Valuable informations have been tracted from spatially-resolved measurements, resonance and symmetry-loss effects.
用原子力显微镜研究了金属有机气相外延生长的GaAs/InAs [111] A和B异质结构的表面形貌。大的晶格失配导致锥体岛的形成,它们的几何形状很大程度上取决于表面极性,并随着生长时间的推移而演变。用拉曼散射分析了伴随各种生长机制的应变松弛。从空间分辨测量、共振和对称损耗效应中提取了有价值的信息。
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引用次数: 1
Leakage current from non-alloyed metal on carbon controlled semi-insulating GaAs crystals 非合金金属在碳控制半绝缘砷化镓晶体上的漏电流
Pub Date : 1996-04-29 DOI: 10.1109/SIM.1996.570933
Y. Otoki, M. Sahara, S. Takahashi, S. Kuma, M. Onishi, M. Kashiwa
Leakage of carbon-controlled semi-insulating GaAs crystals was investigated using various pairs of n-type (AuGe, with alloying), non-alloyed (Au) and p-type (AuZn, with alloying) electrodes. Large leakage currents were observed under two conditions: when positive voltage was applied to non-alloyed or p-type electrode with opposite-side electrode of n-type. This leakage had no relation to carbon concentration which determine the semi-insulating properties. Properties of the non-alloyed electrode were found to be very similar to those of p-type electrode. A model is proposed which can explain all the results, taking into account band-bending near the electrode.
采用不同对n型(AuGe,含合金)、非合金(Au)和p型(AuZn,含合金)电极,研究了碳控半绝缘GaAs晶体的漏电现象。在两种情况下观察到大的泄漏电流:非合金电极或p型电极与n型电极的对面施加正电压。这种泄漏与决定半绝缘性能的碳浓度无关。非合金电极的性能与p型电极非常相似。考虑到电极附近的带弯曲,提出了一个可以解释所有结果的模型。
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引用次数: 0
Influence of fast neutrons on the recombination and electrical properties of neutron transmutation doped gallium arsenide 快中子对掺砷化镓中子嬗变复合及电学性能的影响
Pub Date : 1996-04-29 DOI: 10.1109/SIM.1996.571106
V. A. Bykovsky, V. I. Karas, V.F. Shoh, S. Strzelecka, A. Hruban, M. Gładysz
The electrical properties, photoluminescence and DLTS spectra of LEC gallium arsenide crystals after neutron transmutation doping (NTD) has been investigated as functions of starting material properties, irradiation dose and thermal to fast neutron fluences-ratio. The residual carbon acceptors interact with radiation induced defects (RD) in neutron irradiated GaAs crystals and formed nonradiative recombination centers, which are stable up to 700/spl deg/C.
研究了中子嬗变掺杂(NTD)后LEC砷化镓晶体的电学性质、光致发光和DLTS光谱随起始材料性质、辐照剂量和热快中子通量比的变化规律。在中子辐照的砷化镓晶体中,残余碳受体与辐射诱导缺陷(RD)相互作用,形成非辐射复合中心,该中心在高达700/spl℃的温度下稳定存在。
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引用次数: 0
期刊
Proceedings of Semiconducting and Semi-Insulating Materials Conference
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