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Conference on High Density Microsystem Design and Packaging and Component Failure Analysis, 2006. HDP'06.最新文献

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Design and implementation of a high efficient power converter for self-powered UHF RFID applications 自供电超高频RFID应用的高效功率转换器的设计与实现
C. Chen, M. G. Nejad, L. Zheng
This paper is an investigation of off-chip solution of power converters for passive UHF RFID transponders. The power converter, consisting of a chain of Schottky diodes and capacitors, is designed and then implemented on Rogers4350 PCB substrate. The ISM unlicensed frequency bands 915 MHz is used for RF signal. The de-embedded measurement results show that with minimum input power of -4.7dBm, the power converter achieves 1.8V/5muA output driving capability, which is sufficient for the transponder operation. It corresponds to a 3.6m operating distance when 4-W EIRP radiation is allowed
本文研究了无源超高频RFID应答器功率转换器的片外解决方案。该功率转换器由一系列肖特基二极管和电容组成,设计并在罗杰斯4350 PCB基板上实现。射频信号使用ISM免授权频段915mhz。去嵌入测量结果表明,在最小输入功率为-4.7dBm的情况下,功率变换器的输出驱动能力为1.8V/5muA,足以满足应答器的工作要求。在允许4w EIRP辐射的情况下,对应3.6m的工作距离
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引用次数: 3
High thermally conductive and high reliability under-fill 高导热性和高可靠性下填料
Y. Abe, K. Yamada, N. Abe, F. Tanaka, T. Fujiki
The miniaturization of flip-chip package is examined in many manufacturers. A thermal conductivity of underfill material has been regarded as important. Silica is contained in conventional under-fill as filler. Thermal conductivity of under-fill which contains silica filler is around 0.4W/mK. More than 1 W/mK of thermal conductivity is required for high thermally conductive under-fill. However, it is difficult to confirm if thermal conductivities are more than 1W/mK when silica is chosen as filler, since thermal conductivity of silica is about 1.3 W/mK. The various kinds of aluminum nitride were examined. High thermally conductive under-fill has been developed. It is filled with fine particle size aluminum nitride which will provide high thermal conductivity and good fluidity. And this under-fill realized over 2W/mK of thermal conductivity by control of loading level of the aluminum nitride filler. Also, this product satisfies the basic requirements for the under-fill, such as the JEDEC level 3 preconditioning test and temperature cycle test
许多制造商都在研究倒装芯片封装的小型化问题。下填料的导热系数一直被认为是重要的。常规底填料中含有二氧化硅作为填料。含硅填料的下填料导热系数约为0.4W/mK。高导热下填料的导热系数要求大于1w /mK。然而,当选择二氧化硅作为填料时,由于二氧化硅的导热系数约为1.3 W/mK,因此很难确定导热系数是否大于1W/mK。对不同种类的氮化铝进行了研究。高导热下填料已被开发。采用细粒度氮化铝填充,具有高导热性和良好的流动性。通过控制氮化铝填料的掺量,实现了2W/mK以上的导热系数。同时满足JEDEC 3级预处理试验、温度循环试验等下充填料的基本要求
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引用次数: 5
Computer modeling of a micro-manufactured one-turn inductor 微制造单匝电感器的计算机建模
Hua Lu, D. Flynn, C. Bailey, M. Desmulliez
The results of a finite element computer modelling analysis of a micro-manufactured one-turn magnetic inductor using the software package ANSYS 10.0 are presented. The inductor is designed for a DC-DC converter used in microelectronic devices. It consists of a copper conductor with a rectangular cross-section plated with an insulation layer and a layer of magnetic core. The analysis has focused on the effects of the frequency and the air gaps on the on the inductance values and the Joule losses in the core and conductor. It has been found that an inductor with small multiple air gaps has lower losses than an inductor with a single larger gap
介绍了利用ANSYS 10.0软件对微制造单匝磁感应器进行有限元计算机建模分析的结果。该电感是为用于微电子器件的DC-DC变换器而设计的。它由一个矩形横截面镀有绝缘层和一层磁芯的铜导体组成。重点分析了频率和气隙对磁芯和导体中电感值和焦耳损耗的影响。已经发现具有小的多个气隙的电感比具有单个较大气隙的电感具有更低的损耗
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引用次数: 2
IC fillet-lifting mechanism on wave soldering after reflow soldering 回流焊后波峰焊的IC起角机构
G. Izuta, T. Tanabe, J. Murai, M. Murakami, K. Suganuma
Solder joint separation of IC leads is caused by partial melting and displacement of a lead-free solder joint having Pb contamination in process of wave soldering after reflow soldering. An evaluation method of solder joint separation was developed by focusing on the vertical displacement of the joint, which is defined by IC package size and curvature of a printed circuit board (PCB). It has been clarified that the critical displacement causing the solder joint separation is 15 micrometers or less by the model experiment of wave soldering process. Based on the above data, a new in-process measurement tool of PCBs curvature in wave soldering has been developed. The results of practical wave soldering agree well with the model experiment values
IC引线的焊点分离是由于在波峰焊过程中含有铅污染的无铅焊点在回流焊后发生部分熔化和移位造成的。针对集成电路封装尺寸和印刷电路板(PCB)曲率所决定的焊点垂直位移,提出了一种评价焊点分离度的方法。通过波峰焊模型实验,明确了导致焊点分离的临界位移小于等于15微米。在此基础上,开发了一种新的波峰焊线路板曲率测量工具。实际波峰焊结果与模型实验值吻合较好
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引用次数: 0
Hybrid interconnects using silicon/FR-4 substrates for board-level 10 Gb/s signal broadcasting 采用硅/FR-4衬底的混合互连,用于板级10gb /s信号广播
Yin-Jung Chang, D. Guidotti, L. Wan, G. Chang
An opto/digital interconnect prototype for board-level 1times4 optical-to-digital signal broadcasting operating at 10 Gb/s per channel over an interconnect distance of 10 cm is demonstrated. An improved 1 times4 multimode interference (MMI) splitter at 1550 nm with linearly-tapered output facet is heterogeneously integrated with 4 p-i-n photodetectors (PDs) on a silicon (Si) bench. The Si bench itself is hybrid integrated onto an FR-4 printed-circuit board (PCB) with 4 receiver channels. A novel fabrication/integration approach demonstrates the capability of simultaneously aligning multiple polymer waveguides with multiple optoelectronic (OE) devices during the waveguide fabrication process. The combined excess loss of the MMI splitter and the mirror loss per channel is less than 3.5 dB and the entire system is fully functional at 10 Gb/s
介绍了一种用于板级1times4光转数字信号广播的光/数字互连原型,其工作速度为每通道10gb /s,互连距离为10cm。在硅(Si)平台上,采用4个p-i-n光电探测器(pd)异质集成了一种改进的1倍4多模干涉(MMI)分路器,该分路器的输出面为线性锥形,波长1550 nm。Si工作台本身是混合集成到具有4个接收通道的FR-4印刷电路板(PCB)上。一种新的制造/集成方法证明了在波导制造过程中同时将多个聚合物波导与多个光电(OE)器件对齐的能力。MMI分路器和每通道镜像损耗的综合额外损耗小于3.5 dB,整个系统在10gb /s的速度下完全正常工作
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引用次数: 1
Experimental optimization of process parameters for diode laser soldering of BGA BGA二极管激光焊接工艺参数的实验优化
Yulin Wang, Z. Xiong, X. Zou, H. Ding
It has been shown that diode laser soldering is suitable for electronic packaging especially for the rework of ball grid array (BGA) chips, because laser soldering technique for BGA packaging has several distinct advantages over conventional methods. In this study, we build an experimental prototype laser soldering workstation and have some researches on the laser bumping process. We first summarize researches and applications of laser soldering in electronics assembly in recent years. Then our diode laser soldering system is introduced. In order to study the influence of different parameters for obtaining a good solder joint, some experiments are carried out with a continuous-wave (CW) diode laser rating up to 2.4 watts on the soldering process. We study some key parameters including laser power, irradiation time, reflow height, the amount of flux and misalignment. Experimental results are compared and analyzed. In the end, optimized process parameters are given as a conclusion
研究表明,二极管激光焊接技术适用于电子封装,特别是球栅阵列(BGA)芯片的返工,因为用于球栅阵列封装的激光焊接技术与传统方法相比有几个明显的优点。在本研究中,我们建立了一个实验原型激光焊接工作站,并对激光碰撞工艺进行了一些研究。本文首先综述了近年来激光焊接在电子装配中的研究和应用。然后介绍了我们的二极管激光焊接系统。为了研究不同参数对获得良好焊点的影响,利用额定功率高达2.4瓦的连续波(CW)二极管激光器对焊接过程进行了实验。研究了激光功率、辐照时间、回流高度、通量和误差等关键参数。对实验结果进行了比较和分析。最后给出了优化后的工艺参数作为结论
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引用次数: 2
Design, manufacture and testing of microengineered stencils used for sub 100 micron wafer level bumping 用于100微米以下晶圆级碰撞的微工程模板的设计、制造和测试
N. Gorman, R. Kay, I. Roney, M. Desmulliez
Summary form only given. The advances of chip scale packaging technologies have induced an increase of the density of solder joints in microelectronics products. Pitch sizes are consequently due to further decrease, leading to joint structures at sub 100mum dimensions. Stencil printing for wafer bumping with fine particle solder pastes is potentially a low-cost assembly solution for fine pitch solder joint interconnects. For ultra fine pitch applications stencil printing has been perceived to have reached its practical limits, in consequence a requirement to understand all the processes that impact on the performance of stencil printing at ultra fine pitch is needed. Paste roll, aperture filling & release, post print behaviour and paste open time need to be examined as experimental inputs, alongside the following parameters: fine particle Pb-free solder pastes and solder paste rheology, particle size distribution, metal content, flux type and stencil aperture attributes. The complexity in using stencil technology at such fine pitch geometries has indicated that the quality, consistency and yield are determined by a combination of variables that are involved in the stencil manufacture, paste formulation, and the print process performance of the paste from the stencil. With the WEEE and RoHS Directives being introduced to the electronics manufacturing industry we also have the change to Sn-Pb solders with Pb free alloys to consider. These changes in composition required for Pb free solder alloys and the behavioural changes caused by them during manufacturing processes mean that more process variables need to be understood. Along with the continual miniaturization in microelectronics, the number of variables and parameters that can be involved in stencil printing technology make tight process controls and consistent high yielding interconnects even more difficult to achieve. This paper will report on the advancements of stencil technology using novel micro-engineering techniques to achieve the quality required for printing at ultra fine pitches in terms of aperture tolerances, repeatability and side-wall smoothness. This study, coupled with the improvements in Pb free solder paste, shows that deposits can be produced at ultra fine pitch with types 6, 7 & 8 pastes. Tests also show that subtle differences in the performance of type-6 and type-7 and most recently type 8 mean that there should be careful selection of pastes made that are specific to application geometries. Investigations into the effects of different shaped aperture openings in the stencil also reveal that solder paste deposit volume can be controlled. Sufficient volumes of the fine particle solder paste are required during reflowing to obtain an adequate stand off between the flip chip device and substrate pad. Print consistency and uniformity of the bumps generated are also governed by the volume of solder paste for each deposit all of which will be shown to be more controllable with
只提供摘要形式。芯片级封装技术的进步导致了微电子产品中焊点密度的增加。因此,节距尺寸进一步减小,导致接头结构尺寸低于100mm。用细颗粒焊锡膏进行晶圆碰撞的模板印刷是一种潜在的低成本组装解决方案,用于细间距焊点互连。对于超细间距的应用,丝网印刷已经达到了它的实际极限,因此需要了解在超细间距下影响丝网印刷性能的所有过程。浆料卷、孔径填充和释放、打印后行为和浆料打开时间需要作为实验输入进行检查,同时还需要检查以下参数:细颗粒无铅锡膏和锡膏流变性、粒度分布、金属含量、助焊剂类型和模板孔径属性。在如此精细的几何间距上使用模板技术的复杂性表明,质量、一致性和产量是由一系列变量决定的,这些变量涉及到模板制造、浆料配方和从模板中获得的浆料的打印过程性能。随着WEEE和RoHS指令被引入电子制造业,我们也要考虑使用无铅合金的Sn-Pb焊料的变化。在制造过程中,无铅焊料合金所需的这些成分变化以及由它们引起的行为变化意味着需要了解更多的工艺变量。随着微电子技术的不断小型化,模板印刷技术中涉及的变量和参数的数量使得严格的过程控制和一致的高产量互连更加难以实现。本文将介绍利用新型微工程技术实现超细间距印刷所需的质量,包括孔径公差、可重复性和侧壁光滑度。通过对无铅锡膏的改进,表明6型、7型和8型锡膏可以在超细间距下形成镀层。测试还表明,6型和7型以及最近的8型在性能上的细微差别意味着应该仔细选择特定于应用程序几何形状的浆料。对不同形状的孔径开口对锡膏沉积的影响的研究也表明,锡膏沉积体积是可以控制的。在回流过程中需要足够体积的细颗粒锡膏,以在倒装芯片器件和衬底之间获得足够的隔离。产生的凸起的打印一致性和均匀性也取决于每个沉积的锡膏的体积,所有这些都将被证明是先进的电铸模板更可控的
{"title":"Design, manufacture and testing of microengineered stencils used for sub 100 micron wafer level bumping","authors":"N. Gorman, R. Kay, I. Roney, M. Desmulliez","doi":"10.1109/HDP.2006.1707616","DOIUrl":"https://doi.org/10.1109/HDP.2006.1707616","url":null,"abstract":"Summary form only given. The advances of chip scale packaging technologies have induced an increase of the density of solder joints in microelectronics products. Pitch sizes are consequently due to further decrease, leading to joint structures at sub 100mum dimensions. Stencil printing for wafer bumping with fine particle solder pastes is potentially a low-cost assembly solution for fine pitch solder joint interconnects. For ultra fine pitch applications stencil printing has been perceived to have reached its practical limits, in consequence a requirement to understand all the processes that impact on the performance of stencil printing at ultra fine pitch is needed. Paste roll, aperture filling & release, post print behaviour and paste open time need to be examined as experimental inputs, alongside the following parameters: fine particle Pb-free solder pastes and solder paste rheology, particle size distribution, metal content, flux type and stencil aperture attributes. The complexity in using stencil technology at such fine pitch geometries has indicated that the quality, consistency and yield are determined by a combination of variables that are involved in the stencil manufacture, paste formulation, and the print process performance of the paste from the stencil. With the WEEE and RoHS Directives being introduced to the electronics manufacturing industry we also have the change to Sn-Pb solders with Pb free alloys to consider. These changes in composition required for Pb free solder alloys and the behavioural changes caused by them during manufacturing processes mean that more process variables need to be understood. Along with the continual miniaturization in microelectronics, the number of variables and parameters that can be involved in stencil printing technology make tight process controls and consistent high yielding interconnects even more difficult to achieve. This paper will report on the advancements of stencil technology using novel micro-engineering techniques to achieve the quality required for printing at ultra fine pitches in terms of aperture tolerances, repeatability and side-wall smoothness. This study, coupled with the improvements in Pb free solder paste, shows that deposits can be produced at ultra fine pitch with types 6, 7 & 8 pastes. Tests also show that subtle differences in the performance of type-6 and type-7 and most recently type 8 mean that there should be careful selection of pastes made that are specific to application geometries. Investigations into the effects of different shaped aperture openings in the stencil also reveal that solder paste deposit volume can be controlled. Sufficient volumes of the fine particle solder paste are required during reflowing to obtain an adequate stand off between the flip chip device and substrate pad. Print consistency and uniformity of the bumps generated are also governed by the volume of solder paste for each deposit all of which will be shown to be more controllable with ","PeriodicalId":406794,"journal":{"name":"Conference on High Density Microsystem Design and Packaging and Component Failure Analysis, 2006. HDP'06.","volume":"242 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-06-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122529474","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
The growth behavior of intermetallic compound layers of Sn-3Ag / Cu and Sn/Cu joints during soldering and aging Sn- 3ag /Cu和Sn/Cu接头在焊接和时效过程中金属间化合物层的生长行为
Cong‐qian Cheng, Peng Yang, Jie Zhao, Feng Zhu, Qing-Yang Song
The growth behaviors of Sn-3Ag/Cu and Sn/Cu IMC layers during soldering and aging have been investigated. In the soldering experiments, both the Sn-3Ag/Cu and Sn/Cu were soldered at 270 degC for different time. In the aging experiments, the Sn-3Ag/Cu and Sn/Cu joints were firstly soldered at 270 degC for 60s, and aged at 120 degC, 170 degC, 190 degC for various time. Then all the samples were observed under scanning electron microscopy (SEM). The average thickness of IMC layers was measured by using Q500IW image analysis meter. The results indicated that in the soldering the growth rate of Sn-3Ag/Cu IMC layers was faster than that of Sn/Cu. However, in the aging the growth rate of Sn-3Ag/Cu IMC layers was lower than that of Sn/Cu. The activation energies of Sn-3Ag/Cu and Sn/Cu IMC layers in the aging were about 90KJ/mol and 52KJ/mol respectively
研究了Sn- 3ag /Cu和Sn/Cu IMC层在焊接和时效过程中的生长行为。在焊接实验中,Sn- 3ag /Cu和Sn/Cu均在270℃下进行不同时间的焊接。在时效实验中,Sn- 3ag /Cu和Sn/Cu接头先在270℃下焊接60s,然后在120℃、170℃、190℃进行不同时间的时效处理。然后用扫描电子显微镜(SEM)对样品进行观察。采用Q500IW型图像分析仪测量IMC层的平均厚度。结果表明,在焊接过程中Sn- 3ag /Cu IMC层的生长速度要快于Sn/Cu的生长速度。时效过程中Sn- 3ag /Cu IMC层的生长速率低于Sn/Cu IMC层的生长速率。时效过程中Sn- 3ag /Cu和Sn/Cu IMC层的活化能分别约为90KJ/mol和52KJ/mol
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引用次数: 1
Silver migration control in electrically conductive adhesives 导电胶粘剂中银迁移控制
Yi Li, C. Wong
Although conductive adhesives have been studied for many years as a lead-free alternative in electronic industry, applications of electrically conductive adhesives (ECAs) for electronic interconnect are limited to low voltage display driver devices. This is due to the serious concerns associated with the long-term reliability and high voltage application issues caused by the silver migration. In this study, a novel approach to reduce silver migration and enhance the long-term reliability of conductive adhesives is discovered by using self-assembled monolayer molecular wires. The approach enhances the long-term reliability and durability of conductive adhesives and enables the ECA for high voltage applications. In addition, the self-assembled molecular wires help the dispersion of conductive fillers (in particular, nano-sized (<100 nm) conductive fillers) in the polymer matrix and enhance the electrical conductivity of conductive adhesives. Due to the high current density of those functional molecular monolayers, the current carrying capability of conductive adhesives can also be improved significantly
导电性胶粘剂作为一种无铅替代品在电子工业中已经被研究多年,但导电性胶粘剂在电子互连中的应用仅限于低压显示驱动器件。这是由于银迁移引起的长期可靠性和高压应用问题引起的严重问题。在本研究中,发现了一种利用自组装单层分子线来减少银迁移和提高导电胶粘剂长期可靠性的新方法。该方法提高了导电胶粘剂的长期可靠性和耐久性,并使ECA适用于高压应用。此外,自组装分子线有助于导电填料(特别是纳米级(<100 nm)导电填料)在聚合物基体中的分散,提高导电粘合剂的导电性。由于这些功能分子单层的高电流密度,导电胶粘剂的载流能力也可以显著提高
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引用次数: 4
Effect of Bi on the kinetics of intermetallics growth in Sn-3Ag-0.5Cu/Cu solder joint Bi对Sn-3Ag-0.5Cu/Cu焊点金属间化合物生长动力学的影响
Jie Zhao, Linge Qi, Lai Wang
Three lead-free solder alloys, Sn-3Ag-0.5Cu, Sn-3Ag-0.5Cu-1Bi and Sn-3Ag-0.5Cu-3Bi, were used in the current experiments to investigated the microstructural evolution as well as the kinetics of intermetallic compound (IMC) layer growth. The experimental results indicated that the thickness of Cu6Sn5 intermetallic layer at the solder/Cu interface increases with aging temperature, while the growth rate of IMC in Sn-3Ag-0.5Cu-3Bi/Cu joints is slower than that in Sn-3Ag-0.5Cu-1Bi/Cu joints and Sn-Ag-Cu solder joints. The effect of Bi element is attributed to the accumulation of Bi near the joint and the enhancement of the activation energy by the addition of Bi
本实验采用Sn-3Ag-0.5Cu、Sn-3Ag-0.5Cu- 1bi和Sn-3Ag-0.5Cu- 3bi三种无铅钎料合金,研究了钎料的显微组织演变和金属间化合物(IMC)层生长动力学。实验结果表明,随着时效温度的升高,钎料/Cu界面处的Cu6Sn5金属间层厚度增加,而Sn-3Ag-0.5Cu-3Bi/Cu钎料中IMC的增长速度要慢于Sn-3Ag-0.5Cu-1Bi/Cu钎料和Sn-Ag-Cu钎料。Bi元素的作用主要是由于Bi元素在接头附近的富集和Bi元素的加入提高了活化能
{"title":"Effect of Bi on the kinetics of intermetallics growth in Sn-3Ag-0.5Cu/Cu solder joint","authors":"Jie Zhao, Linge Qi, Lai Wang","doi":"10.1109/HDP.2006.1707598","DOIUrl":"https://doi.org/10.1109/HDP.2006.1707598","url":null,"abstract":"Three lead-free solder alloys, Sn-3Ag-0.5Cu, Sn-3Ag-0.5Cu-1Bi and Sn-3Ag-0.5Cu-3Bi, were used in the current experiments to investigated the microstructural evolution as well as the kinetics of intermetallic compound (IMC) layer growth. The experimental results indicated that the thickness of Cu6Sn5 intermetallic layer at the solder/Cu interface increases with aging temperature, while the growth rate of IMC in Sn-3Ag-0.5Cu-3Bi/Cu joints is slower than that in Sn-3Ag-0.5Cu-1Bi/Cu joints and Sn-Ag-Cu solder joints. The effect of Bi element is attributed to the accumulation of Bi near the joint and the enhancement of the activation energy by the addition of Bi","PeriodicalId":406794,"journal":{"name":"Conference on High Density Microsystem Design and Packaging and Component Failure Analysis, 2006. HDP'06.","volume":"3 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-06-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114093438","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
期刊
Conference on High Density Microsystem Design and Packaging and Component Failure Analysis, 2006. HDP'06.
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