Pub Date : 2012-06-24DOI: 10.1109/SHUSER.2012.6268893
W. Munim, Mohamad Fahmi Hussin, Ismail Musirin
This paper presents switching technique for multiphase inverter. The development of two-level five-phase voltage source inverter (VSI) has been thoroughly reviewed and results of this investigation are presented. The combination of large and medium vectors has been examined theoretically while simulations were conducted for verification. The analysis of a five-phase space vector modulation was verified using the Matlab simulation. The simulations were carried out to identify the effectiveness of the combination of large and medium vectors. It was found that the combination of large and medium vectors has significantly reduced the harmonic distortion and therefore, can effectively eliminate the third harmonics which consequently produce a balanced sinusoidal signal.
{"title":"Switching technique for multiphase voltage source inverter","authors":"W. Munim, Mohamad Fahmi Hussin, Ismail Musirin","doi":"10.1109/SHUSER.2012.6268893","DOIUrl":"https://doi.org/10.1109/SHUSER.2012.6268893","url":null,"abstract":"This paper presents switching technique for multiphase inverter. The development of two-level five-phase voltage source inverter (VSI) has been thoroughly reviewed and results of this investigation are presented. The combination of large and medium vectors has been examined theoretically while simulations were conducted for verification. The analysis of a five-phase space vector modulation was verified using the Matlab simulation. The simulations were carried out to identify the effectiveness of the combination of large and medium vectors. It was found that the combination of large and medium vectors has significantly reduced the harmonic distortion and therefore, can effectively eliminate the third harmonics which consequently produce a balanced sinusoidal signal.","PeriodicalId":426671,"journal":{"name":"2012 IEEE Symposium on Humanities, Science and Engineering Research","volume":"54 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-06-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125476949","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2012-06-24DOI: 10.1109/SHUSER.2012.6268855
R. Alrozi, N. Zamanhuri, M. Osman
Adsorption of Remazol Brilliant Blue R (RBBR) by rambutan peel (RP) was examined. The adsorption experiments were carried out under different conditions of initial concentration (25-500 mg/L), solution pH 2-12 and RP dose (0.05-1.2 g). The influence of these parameters on the adsorption capacity was studied using the batch process. RBBR adsorption uptake was found to increase with increase in initial concentration and contact time. The RBBR adsorption was favourable at pH<;4. Langmuir, Freundlich and Temkin isotherm models were used to illustrate the experimental isotherms and isotherms constant. The equilibrium data were best represented by Langmuir isotherm model, showing maximum monolayer adsorption capacity of 112.69 mg/g. The rates of adsorption were found to obey the rules of pseudo-second order model with good correlation. The results suggested that RP has high potential to be used as effective adsorbent for RBBR removal.
{"title":"Adsorption of reactive dye Remazol Brilliant Blue R from aqueous solutions by rambutan peel","authors":"R. Alrozi, N. Zamanhuri, M. Osman","doi":"10.1109/SHUSER.2012.6268855","DOIUrl":"https://doi.org/10.1109/SHUSER.2012.6268855","url":null,"abstract":"Adsorption of Remazol Brilliant Blue R (RBBR) by rambutan peel (RP) was examined. The adsorption experiments were carried out under different conditions of initial concentration (25-500 mg/L), solution pH 2-12 and RP dose (0.05-1.2 g). The influence of these parameters on the adsorption capacity was studied using the batch process. RBBR adsorption uptake was found to increase with increase in initial concentration and contact time. The RBBR adsorption was favourable at pH<;4. Langmuir, Freundlich and Temkin isotherm models were used to illustrate the experimental isotherms and isotherms constant. The equilibrium data were best represented by Langmuir isotherm model, showing maximum monolayer adsorption capacity of 112.69 mg/g. The rates of adsorption were found to obey the rules of pseudo-second order model with good correlation. The results suggested that RP has high potential to be used as effective adsorbent for RBBR removal.","PeriodicalId":426671,"journal":{"name":"2012 IEEE Symposium on Humanities, Science and Engineering Research","volume":"8 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-06-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127079971","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2012-06-24DOI: 10.1109/SHUSER.2012.6268990
M. Rozana, M. Wahid, A. Arshad, M. N. Sarip, Z. Habibah, L. N. Ismail, M. Rusop, Wan Haliza Abd Majid, W. C. Gan
The morphology of PVDF-TrFE (70/30) thin film at various annealing temperature were investigated using non-contact mode Atomic Force Microscopy (AFM). Differential Scanning Calorimetry (DSC) technique was used to obtain TC, Tm, and TCrys of PVDF-TrFE. The prepared spin coated PVDF-TrFE (70/30) thin films were annealed at TC (113°C), Tm (154°C), TCrys (135°C) and Tc at cooling (55°C) in accordance to the DSC thermogram observed. Impedance Spectroscopy were conducted to study the dielectric characteristic of the thin films in order to substantiate the electrical behavior of the thin films From the results obtained, the thin films exhibited different morphologies depending on the annealing temperatures utilized. Formation of needle-like crsytallite structure was observed film annealed at and over Tm. Thin film re-crystallized at TC has an optimized dielectric constant of ~7.8 at 104 hz.
{"title":"Effect of various annealing temperature on the morphological and dielectric properties of Polyvinylidenefluoride-Trifluoroethylene thin film","authors":"M. Rozana, M. Wahid, A. Arshad, M. N. Sarip, Z. Habibah, L. N. Ismail, M. Rusop, Wan Haliza Abd Majid, W. C. Gan","doi":"10.1109/SHUSER.2012.6268990","DOIUrl":"https://doi.org/10.1109/SHUSER.2012.6268990","url":null,"abstract":"The morphology of PVDF-TrFE (70/30) thin film at various annealing temperature were investigated using non-contact mode Atomic Force Microscopy (AFM). Differential Scanning Calorimetry (DSC) technique was used to obtain T<sub>C</sub>, T<sub>m</sub>, and T<sub>Crys</sub> of PVDF-TrFE. The prepared spin coated PVDF-TrFE (70/30) thin films were annealed at T<sub>C</sub> (113°C), T<sub>m</sub> (154°C), T<sub>Crys</sub> (135°C) and T<sub>c</sub> at cooling (55°C) in accordance to the DSC thermogram observed. Impedance Spectroscopy were conducted to study the dielectric characteristic of the thin films in order to substantiate the electrical behavior of the thin films From the results obtained, the thin films exhibited different morphologies depending on the annealing temperatures utilized. Formation of needle-like crsytallite structure was observed film annealed at and over T<sub>m</sub>. Thin film re-crystallized at T<sub>C</sub> has an optimized dielectric constant of ~7.8 at 10<sup>4</sup> hz.","PeriodicalId":426671,"journal":{"name":"2012 IEEE Symposium on Humanities, Science and Engineering Research","volume":"44 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-06-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127359395","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2012-06-24DOI: 10.1109/SHUSER.2012.6268866
N. I. Taib, N. Kantasamy, S. Sumari, N. M. Rafi
LDH with nitrate in the interlayer and Mg-Al (3:1) in the layer have been synthesized by co-precipitation method. The adsorption of arsenic and phosphate onto MgAlNO3 hydrotalcite was evaluated with respect to pH, contact time, initial concentration and adsorbent dosage. The kinetic data were fitted into the pseudo-first-order equation, and the pseudo-second-order equations, and the intra-particle diffusion model. The results indicate that the pseudo-second-order model generates the best agreement with the experimental data for both arsenic and phosphate suggesting that the adsorption process might involve chemical sorption.
{"title":"Adsorption of arsenic (V) and phosphate onto MgAlNO3-LDHs","authors":"N. I. Taib, N. Kantasamy, S. Sumari, N. M. Rafi","doi":"10.1109/SHUSER.2012.6268866","DOIUrl":"https://doi.org/10.1109/SHUSER.2012.6268866","url":null,"abstract":"LDH with nitrate in the interlayer and Mg-Al (3:1) in the layer have been synthesized by co-precipitation method. The adsorption of arsenic and phosphate onto MgAlNO3 hydrotalcite was evaluated with respect to pH, contact time, initial concentration and adsorbent dosage. The kinetic data were fitted into the pseudo-first-order equation, and the pseudo-second-order equations, and the intra-particle diffusion model. The results indicate that the pseudo-second-order model generates the best agreement with the experimental data for both arsenic and phosphate suggesting that the adsorption process might involve chemical sorption.","PeriodicalId":426671,"journal":{"name":"2012 IEEE Symposium on Humanities, Science and Engineering Research","volume":"110 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-06-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128000884","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2012-06-24DOI: 10.1109/SHUSER.2012.6268899
M. F. Khamidi, S. A. Farhan, K. Chai, A. Idrus, M. Nuruddin
The conceptual design of a motion detection and base isolation system for earthquake-resistant relief structures is presented. The design process, which applies principles of biomimetics, is inspired by the motion detection ability of birds and fishes and shock isolation ability of woodpeckers' skulls. Concrete blocks with and without base isolators were subjected to shake table tests to evaluate the efficiency of the base isolation system. Results revealed that the base isolation system reduces horizontal acceleration of concrete blocks by approximately 82.00 ± 2.0%.
{"title":"Motion detection and base isolation system for earthquake-resistant relief structures: Application of biomimetics","authors":"M. F. Khamidi, S. A. Farhan, K. Chai, A. Idrus, M. Nuruddin","doi":"10.1109/SHUSER.2012.6268899","DOIUrl":"https://doi.org/10.1109/SHUSER.2012.6268899","url":null,"abstract":"The conceptual design of a motion detection and base isolation system for earthquake-resistant relief structures is presented. The design process, which applies principles of biomimetics, is inspired by the motion detection ability of birds and fishes and shock isolation ability of woodpeckers' skulls. Concrete blocks with and without base isolators were subjected to shake table tests to evaluate the efficiency of the base isolation system. Results revealed that the base isolation system reduces horizontal acceleration of concrete blocks by approximately 82.00 ± 2.0%.","PeriodicalId":426671,"journal":{"name":"2012 IEEE Symposium on Humanities, Science and Engineering Research","volume":"33 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-06-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121058326","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2012-06-24DOI: 10.1109/SHUSER.2012.6268856
W. Z. Yusof, M. S. Mujir, S. S. Isa, A. Ali
In the search for helpful styling cognition for car in the conceptual phase of design, the approach was taken experimentally study car ontology understanding in relation to quality of idea in sketching. The links between these subsets will be able to map the aesthetic intent through shape characteristics and idea. Understanding of ontology is important before a semantic approach could be applied as study shows that students who have knowledge of car ontology can produce better idea-sketching of car styling compared to students who have no knowledge of car ontology.
{"title":"Ontology understanding in enhancing car styling ideation","authors":"W. Z. Yusof, M. S. Mujir, S. S. Isa, A. Ali","doi":"10.1109/SHUSER.2012.6268856","DOIUrl":"https://doi.org/10.1109/SHUSER.2012.6268856","url":null,"abstract":"In the search for helpful styling cognition for car in the conceptual phase of design, the approach was taken experimentally study car ontology understanding in relation to quality of idea in sketching. The links between these subsets will be able to map the aesthetic intent through shape characteristics and idea. Understanding of ontology is important before a semantic approach could be applied as study shows that students who have knowledge of car ontology can produce better idea-sketching of car styling compared to students who have no knowledge of car ontology.","PeriodicalId":426671,"journal":{"name":"2012 IEEE Symposium on Humanities, Science and Engineering Research","volume":"104 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-06-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121373620","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2012-06-24DOI: 10.1109/SHUSER.2012.6268999
S. N. A. M. Halidi, J. Abdullah
User experience and many machine breakdown records of FDM rapid prototyping indicated that moisture effects on Acrylonitrile Butadiene Styrene (ABS) which consequently causes physical, morphological and thermal stability changes to the polymer, is the major cause of problem. These reports claim that these changes may have caused nozzle blockage on the liquefier of the Fused Deposition Modeling (FDM) machine although no thorough investigation were done. Experiments are therefore conducted to verify these assumptions. It has been observed that physical changes do not cause nozzle clogging. The clogging is due to the morphological and thermal stability changes of ABS when the material is exposed to moisture.
{"title":"Moisture effects on the ABS used for Fused Deposition Modeling rapid prototyping machine","authors":"S. N. A. M. Halidi, J. Abdullah","doi":"10.1109/SHUSER.2012.6268999","DOIUrl":"https://doi.org/10.1109/SHUSER.2012.6268999","url":null,"abstract":"User experience and many machine breakdown records of FDM rapid prototyping indicated that moisture effects on Acrylonitrile Butadiene Styrene (ABS) which consequently causes physical, morphological and thermal stability changes to the polymer, is the major cause of problem. These reports claim that these changes may have caused nozzle blockage on the liquefier of the Fused Deposition Modeling (FDM) machine although no thorough investigation were done. Experiments are therefore conducted to verify these assumptions. It has been observed that physical changes do not cause nozzle clogging. The clogging is due to the morphological and thermal stability changes of ABS when the material is exposed to moisture.","PeriodicalId":426671,"journal":{"name":"2012 IEEE Symposium on Humanities, Science and Engineering Research","volume":"10 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-06-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122746704","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2012-06-24DOI: 10.1109/SHUSER.2012.6268906
F. Mohamad, U. Noor, M. Rusop
Amorphous carbon (a-C) thin films have been prepared by thermal chemical vapor deposition (TCVD) technique at different temperature. The preparation involved argon (Ar), and camphor as carrier gas and carbon source respectively. The effects of deposition temperature in the a-C thin film on electrical, structural and optical properties was characterized by using Advantest R6243 DC Voltage Current Source/Monitor and SemiPro Curve Software, Scanning Electron Microscopy (SEM) and UV-VIS-NIR spectroscopy. The current-voltage (I-V) measurement studies demonstrate that the conductivity increased along the deposition temperature. There are also significant changes in structural and optical band gap as deposition temperature varies.
{"title":"Effect of deposition temperature to electrical, structural and optical properties of amorphous carbon thin film prepared by TCVD","authors":"F. Mohamad, U. Noor, M. Rusop","doi":"10.1109/SHUSER.2012.6268906","DOIUrl":"https://doi.org/10.1109/SHUSER.2012.6268906","url":null,"abstract":"Amorphous carbon (a-C) thin films have been prepared by thermal chemical vapor deposition (TCVD) technique at different temperature. The preparation involved argon (Ar), and camphor as carrier gas and carbon source respectively. The effects of deposition temperature in the a-C thin film on electrical, structural and optical properties was characterized by using Advantest R6243 DC Voltage Current Source/Monitor and SemiPro Curve Software, Scanning Electron Microscopy (SEM) and UV-VIS-NIR spectroscopy. The current-voltage (I-V) measurement studies demonstrate that the conductivity increased along the deposition temperature. There are also significant changes in structural and optical band gap as deposition temperature varies.","PeriodicalId":426671,"journal":{"name":"2012 IEEE Symposium on Humanities, Science and Engineering Research","volume":"48 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-06-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128570046","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2012-06-24DOI: 10.1109/SHUSER.2012.6269002
N. Sin, S. Ahmad, M. Musa, M. H. Mamat, M. Rusop
The structure transformation of ZnO thin films properties influenced by substrate temperature deposited by RF Magnetron Sputtering is presented. This project has been focused on electrical, optical and structural properties of ZnO thin films. The effect of variation substrate temperature at 200°C~500°C on the ZnO thin films have been investigated. The thin films were examined using two point probe current-voltage (I-V) measurement (Keithley 2400), UV-Vis-NIR spectrophotometer, field emmision scanning electron microscopy (FESEM) (JEOL JSM 7600F) and atomic force microscope (AFM) (Park System XE-100). ZnO thin films were prepared at 200 watt by a RF magnetron sputtering using ZnO target using glass as the substrate. The IV measurement indicated as the substrate temperature increase, the conductivity of ZnO thin film increase. All films have show high UV absorption properties using UV-VIS spectrophotometer (JASCO 670). The root means square (rms) roughness for ZnO thin film were about (<;8nm) was measured using AFM. The image form FESEM observed that transformation of structure started to change at high temperature (400~500°C).
{"title":"Structure transformation of ZnO thin films properties influenced by substrate temperature deposited by magnetron sputtering","authors":"N. Sin, S. Ahmad, M. Musa, M. H. Mamat, M. Rusop","doi":"10.1109/SHUSER.2012.6269002","DOIUrl":"https://doi.org/10.1109/SHUSER.2012.6269002","url":null,"abstract":"The structure transformation of ZnO thin films properties influenced by substrate temperature deposited by RF Magnetron Sputtering is presented. This project has been focused on electrical, optical and structural properties of ZnO thin films. The effect of variation substrate temperature at 200°C~500°C on the ZnO thin films have been investigated. The thin films were examined using two point probe current-voltage (I-V) measurement (Keithley 2400), UV-Vis-NIR spectrophotometer, field emmision scanning electron microscopy (FESEM) (JEOL JSM 7600F) and atomic force microscope (AFM) (Park System XE-100). ZnO thin films were prepared at 200 watt by a RF magnetron sputtering using ZnO target using glass as the substrate. The IV measurement indicated as the substrate temperature increase, the conductivity of ZnO thin film increase. All films have show high UV absorption properties using UV-VIS spectrophotometer (JASCO 670). The root means square (rms) roughness for ZnO thin film were about (<;8nm) was measured using AFM. The image form FESEM observed that transformation of structure started to change at high temperature (400~500°C).","PeriodicalId":426671,"journal":{"name":"2012 IEEE Symposium on Humanities, Science and Engineering Research","volume":"19 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-06-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130616736","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2012-06-24DOI: 10.1109/SHUSER.2012.6269010
N. M. Yusof, M. Jaffar
The paper gives brief review on two models called as Merton model and KMV-Merton model. Merton model is known as the triggers to the development of many credit risk models. Of all the credit risk models developed, the KMV-Merton model is the most popular. KMV-Merton model is developed to provide probabilistic assessment of firm's likelihood to default. Its ability in forecasting default for firms is proven when most of studies done by researchers and practitioners portray positive results. However in certain circumstances, the model becomes unavailable due to its structural constraints. Therefore, analysis is done on the KMV-Merton model so that modified default probability formulae are obtained for certain circumstances where the model becomes unavailable. Analysis is done using the mathematical approach. Then, the paper did data testing observation to justify the analysis. It is found that the results from the data testing satisfied the analysis done on KMV-Merton model. Thus, it verified that the modified default probability is true. The main contribution of this paper is it able to fill the gap exists in the KMV-Merton model in forecasting default for firms.
{"title":"The analysis of KMV-Merton model in forecasting default probability","authors":"N. M. Yusof, M. Jaffar","doi":"10.1109/SHUSER.2012.6269010","DOIUrl":"https://doi.org/10.1109/SHUSER.2012.6269010","url":null,"abstract":"The paper gives brief review on two models called as Merton model and KMV-Merton model. Merton model is known as the triggers to the development of many credit risk models. Of all the credit risk models developed, the KMV-Merton model is the most popular. KMV-Merton model is developed to provide probabilistic assessment of firm's likelihood to default. Its ability in forecasting default for firms is proven when most of studies done by researchers and practitioners portray positive results. However in certain circumstances, the model becomes unavailable due to its structural constraints. Therefore, analysis is done on the KMV-Merton model so that modified default probability formulae are obtained for certain circumstances where the model becomes unavailable. Analysis is done using the mathematical approach. Then, the paper did data testing observation to justify the analysis. It is found that the results from the data testing satisfied the analysis done on KMV-Merton model. Thus, it verified that the modified default probability is true. The main contribution of this paper is it able to fill the gap exists in the KMV-Merton model in forecasting default for firms.","PeriodicalId":426671,"journal":{"name":"2012 IEEE Symposium on Humanities, Science and Engineering Research","volume":"34 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-06-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123684844","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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