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2010 Proceedings 60th Electronic Components and Technology Conference (ECTC)最新文献

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Millimeter-wave/THz passive components design using through silicon via (TSV) technology 毫米波/太赫兹无源元件设计采用硅通孔(TSV)技术
Pub Date : 2010-06-01 DOI: 10.1109/ECTC.2010.5490919
Sanming Hu, Lei Wang, Y. Xiong, Jinglin Shi, Bolun Zhang, Dan Zhao, T. Lim, X. Yuan
The 3-D integration using through silicon vias (TSVs) is expected to realize compact circuits and systems with high performance and multi-functionality. Based on the TSV technology, a hairpin bandpass filter and a microstrip patch antenna for millimeter-wave (mmW)/terahertz (THz) application are designed and presented in this paper. Additionally, a novel TSV-based solution for the integration of antennas with front-end circuits is proposed. The TSV-based hairpin bandpass filter has the insertion loss of 6.9 dB at 120 GHz with 20 GHz passband from 110 to 130 GHz, whereas the filter size is only 300 × 250 × 50 µm. The designed antenna is with 10-dB impedance bandwidth of 137 to 146 GHz, the boresight directivity and antenna gain is 3.49 dBi and −3.16 dBi, respectively, and the radiation efficiency is 21.6% which is around twice than that of many conventional on-chip antennas. The TSV-based integration solution is expected to reduce not only the total chip size but also the electromagnetic interference (EMI) effect, which are major concerns in the mmW/THz systems.
利用硅通孔(tsv)技术进行三维集成,有望实现具有高性能和多功能性的紧凑电路和系统。基于TSV技术,设计并实现了一种用于毫米波/太赫兹应用的发夹带通滤波器和微带贴片天线。此外,提出了一种新的基于tsv的天线与前端电路集成方案。基于tsv的发夹带通滤波器在120 GHz时的插入损耗为6.9 dB, 20 GHz通带范围为110 ~ 130 GHz,而滤波器尺寸仅为300 × 250 × 50µm。所设计天线的10db阻抗带宽为137 ~ 146 GHz,轴向指向性和天线增益分别为3.49 dBi和- 3.16 dBi,辐射效率为21.6%,是许多传统片上天线的两倍左右。基于tsv的集成解决方案不仅可以减小芯片总尺寸,还可以减小电磁干扰(EMI)效应,这是毫米波/太赫兹系统中主要关注的问题。
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引用次数: 7
Three chips stacking with low volume solder using single re-flow process 采用单次回流工艺,采用小体积焊料的三片堆垛
Pub Date : 2010-06-01 DOI: 10.1109/ECTC.2010.5490686
N. Khan, D. Wee, O. S. Chiew, Cheryl Sharmani, L. Lim, Hong Yu Li, Shekar Vasarala
Miniaturized 3D package with shorter distances between chips are needed for the mobile and high frequency applications. Chip-to-chip stacking for 3D packaging using conventional assembly method and single step reflow attachment is the most cost-effective. But fine pitch microjoints of stacked chip by single re-flow attachment is challenging due to chip movement during stacking processes, which lead to poor assembly yields. This paper reports a method of stacking chips by thermal tacking and permanent joints are formed simultaneously by single re-flow step. Three chips of 12mm × 12mm size with micro bumps at 100um pitch have been assembled using this approach. Low volume of lead free solder (Sn) has been chosen for the micro-bump interconnections between the chips. The thermal tacking conditions and flip-chip assembly process have been studied in details. The micro-joints quality and reliability have been assessed and reported.
移动和高频应用需要芯片之间距离更短的小型化3D封装。采用常规组装方法和单步回流连接进行三维封装的芯片对芯片堆叠是最具成本效益的。但是,由于芯片在堆积过程中会发生移动,采用单回流连接的方法制备细节距微连接具有一定的挑战性,导致组装良率较低。本文报道了一种用热粘接法叠片的方法,并通过单步回流同时形成永久接头。用这种方法组装了三个12mm × 12mm尺寸的芯片,在100um间距上有微凸起。芯片之间的微凸点互连采用了小体积的无铅焊料(Sn)。对热粘接条件和倒装芯片组装工艺进行了详细研究。对微关节的质量和可靠性进行了评价和报道。
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引用次数: 12
An electrical design and fabrication of a 12-channel optical transceiver with SiP packaging technology 采用SiP封装技术的12通道光收发器的电气设计与制造
Pub Date : 2010-06-01 DOI: 10.1109/ECTC.2010.5490671
Wei Gao, Zhihua Li, Jian Song, Xu Zhang, Feng Chen, Fengman Liu, Yunyan Zhou, Jun Li, H. Xiang, Jing Zhou, Shuhua Liu, Yu Wang, Qidong Wang, Baoxia Li, Zhan Shi, Liqiang Cao, L. Wan
This paper presents an electrical design of a 6.25Gbps×12-channel parallel optical transceiver with SiP packaging technology. Considering such high speed, a low impedance and low noise power distribution network (PDN) is designed to suppress simultaneous switching noise (SSN) and a novel embedded capacitor filter is used to replace the conventional power supply filter. To minimize the impedance discontinuity of electrical channels, a signal integrity (SI) design flow based on Electromagnetic Analysis Method and Circuit Analysis Method is proposed. Following this design flow, the high speed link performs on a large bandwidth. With the electrical design, the optical transceiver is fabricated and tested.
本文介绍了一种采用SiP封装技术的6.25Gbps×12-channel并行光收发器的电气设计。考虑到这种高速度,设计了一种低阻抗、低噪声的配电网络(PDN)来抑制同步开关噪声(SSN),并采用一种新型的嵌入式电容滤波器来取代传统的电源滤波器。为了最大限度地减少电通道的阻抗不连续,提出了一种基于电磁分析法和电路分析法的信号完整性设计流程。按照这个设计流程,高速链路在大带宽上运行。在电气设计的基础上,完成了光收发器的制作和测试。
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引用次数: 5
Deconstructing the myth of percolation in electrically conductive adhesives and its implications 解构导电胶粘剂的渗透神话及其意义
Pub Date : 2010-06-01 DOI: 10.1109/ECTC.2010.5490742
J. Agar, Katy J. Lin, Rongwei Zhang, J. Durden, K. Lawrence, K. Moon, C. Wong
The modern emphasis on green technologies has caused the electronics industry to seek alternative solutions to lead-based interconnections. Electrically conductive adhesive (ECAs) composed of metallic fillers within a polymer matrix have received the majority of the interest in lead-free interconnect technology. However, ECAs are still unable to meet the demands of high performance consumer electronics. Previous research recognized a critical filler concentration where there is a dramatic increase in conductivity, followed by a plateau. Researchers have labeled this transition as evidence of a percolation, implying a continuous interconnected metallic network. Our work comprised of a series of "proof of concept" type experiments deconstructs the myth of percolation and emphasize the functional role of the polymer matrix. From a theoretical standpoint direct metal to metal contact is not feasible since silver particles coated with short chain acids are easily wet by the polymer matrix. Assembly conducted under low mechanical stresses is unable to displace the adsorbed surfactant to form metallic contact. Moreover, preparation of a high K epoxy (Dielectric Constant ~5.5), Co(III) acetylacetonates (Co(III) AcAcs) doped diglycidyl ether of bisphenol F had unstable conductivities orders of magnitude lower than the control samples; under similar applied DC. Dielectric constant has a minimal effect if metal to metal contact is the dominant charge transport mechanism. However, tunneling through materials with high dielectric constant impedes the tunneling efficiency. We clearly demonstrate that charge transport at the interface occurs via secondary conductivity pathways, dominated by thermally assisted tunneling mechanisms. The importance of these secondary conductivity mechanisms is highly dependent on the particle-thin film dielectric interaction. This revolutionary discovery provides a new approach for scientists and engineers to improve the performance of electrically conductive adhesives through the incorporation of electrically functional matrix materials.
现代对绿色技术的重视促使电子行业寻求替代铅基互连的解决方案。导电性胶粘剂(ECAs)由聚合物基体中的金属填料组成,在无铅互连技术中受到了广泛的关注。然而,ECAs仍然无法满足高性能消费电子产品的需求。以前的研究认识到一个临界填料浓度,在那里电导率会急剧增加,然后是一个平台。研究人员将这种转变标记为渗透的证据,这意味着一个连续的相互连接的金属网络。我们的工作包括一系列“概念验证”类型的实验,解构了渗透的神话,强调了聚合物基质的功能作用。从理论上讲,金属与金属之间的直接接触是不可行的,因为涂有短链酸的银粒子很容易被聚合物基质弄湿。在低机械应力下进行的组装不能取代吸附的表面活性剂形成金属接触。此外,制备的高K环氧树脂(介电常数~5.5)、Co(III)乙酰丙酮酸酯(Co(III) AcAcs)掺杂双酚F二甘油酯的电导率比对照样品低几个数量级;在类似的直流作用下。如果金属与金属之间的接触是主要的电荷传输机制,介电常数的影响最小。然而,在高介电常数的材料中穿隧阻碍了隧道效率的提高。我们清楚地证明了界面上的电荷传输是通过二次传导途径发生的,主要是热辅助隧道机制。这些二次电导率机制的重要性高度依赖于粒子-薄膜介电相互作用。这一革命性的发现为科学家和工程师提供了一种新的方法,通过结合电功能基质材料来提高导电粘合剂的性能。
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引用次数: 18
3D TSV transformer design for DC-DC/AC-DC converter 用于DC-DC/AC-DC变换器的三维TSV变压器设计
Pub Date : 2010-06-01 DOI: 10.1109/ECTC.2010.5490761
Bolun Zhang, Y. Xiong, Lei Wang, Sanming Hu, Jinglin Shi, Yi-qi Zhuang, Le-Wei Li, X. Yuan
This paper presents a new concept of 3D transformer structure realized by through silicon via (TSV) technology. A set of different turn ratio transformers have been designed and analyzed. The results show that the proposed 3D TSV transformer possesses good performance with small size. Finally, an AC to DC converter circuit which based on proposed transformer has been designed. The result demonstrates that proposed 3D TSV transformer is suitable for AC to DC converter design.
提出了一种利用硅通孔(TSV)技术实现三维变压器结构的新概念。设计并分析了一套不同匝比的变压器。结果表明,所设计的三维TSV变压器具有体积小、性能好等优点。最后,设计了基于该变压器的交直流变换器电路。结果表明,所提出的三维TSV变压器适用于交直流变换器的设计。
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引用次数: 16
Effects of microstructure evolution on damage accumulation in lead-free solder joints 组织演变对无铅焊点损伤积累的影响
Pub Date : 2010-06-01 DOI: 10.1109/ECTC.2010.5490795
Linlin Yang, L. Yin, B. Roggeman, P. Borgesen
The wear out of lead-free solder joints under realistic loading conditions has been shown to deviate strongly from predictions based on current damage accumulation models. We argue that the deviation must be due to the simultaneous evolution of solder properties and damage. In general, solder properties and fatigue behaviors are determined by microstructure and damage accumulation mechanisms. Literature has reported on effects of precipitate coarsening and recrystallization of SnAgCu solders. However, we show these cannot account for critical trends in isothermal cycling such as repeated drops, bending and vibration. The present paper addresses an additional microstructure evolution path. Thermal aging and room temperature shear fatigue test on SnAgCu solder joints both demonstrated continuous hardness decrease. But precipitate coarsening was not observed in the shear fatigue test. Specially designed sample sectioning allowed the observation of slip bands formation and correlation with cyclic softening in shear fatigue test. In addition, the pattern of slip band formation was shown to be load-dependent, indicating the difference in damage accumulation. The consequences for the prediction of fatigue life under combined loading are discussed.
无铅焊点在实际载荷条件下的磨损与基于当前损伤累积模型的预测有很大的偏差。我们认为,这种偏差一定是由于焊料性能和损伤同时演变造成的。一般来说,焊料的性能和疲劳行为是由显微组织和损伤积累机制决定的。文献报道了沉淀粗化和再结晶对SnAgCu焊料的影响。然而,我们表明这些不能解释等温循环中的关键趋势,如重复下降,弯曲和振动。本文讨论了另一种微观结构演化路径。SnAgCu焊点的热时效和室温剪切疲劳试验均表现出硬度的持续下降。剪切疲劳试验未观察到析出相粗化。特殊设计的试样截面允许观察剪切疲劳试验中滑移带的形成及其与循环软化的关系。此外,滑移带形成的模式与荷载有关,表明损伤积累的差异。讨论了复合载荷下疲劳寿命预测的结果。
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引用次数: 13
Effects of pre-stressing on solder joint failure by pad cratering 预应力对焊盘击穿焊点破坏的影响
Pub Date : 2010-06-01 DOI: 10.1109/ECTC.2010.5490932
V. Raghavan, B. Roggeman, M. Meilunas, P. Borgesen
The present work addresses a significant risk generally overlooked in the design and accelerated testing of high reliability electronics. Manufacturers of servers and other expensive high reliability electronics equipment are becoming increasingly concerned with the risk of solder pad cratering. Their focus is, however, on cratering in testing, handling or transport, while the risk of premature wear-out due to thermal excursions (cycling) in service is completely ignored. This is a result of reliability testing that almost invariably addresses individual loading conditions separately. Under such conditions it is for example extremely rare for electrical failures in thermal cycling or high-cycle vibration testing to be associated with pad cratering. The present paper shows how manufacturers of high reliability equipment intended for mechanically protected or benign service conditions may be missing a significant risk of invisible damage induced in testing, handling or transport which may change the failure mode in service. We present first results of a systematic effort aimed at redefining currently proposed pad cratering test protocols.
目前的工作解决了在高可靠性电子产品的设计和加速测试中通常被忽视的重大风险。服务器和其他昂贵的高可靠性电子设备的制造商越来越关注焊盘击穿的风险。然而,他们的重点是在测试、处理或运输过程中产生的弹坑,而在使用过程中由于热漂移(循环)而导致过早磨损的风险完全被忽视了。这是可靠性测试的结果,这些测试几乎总是单独处理单个负载条件。在这种条件下,在热循环或高周期振动测试中,与垫坑相关的电气故障极为罕见。本文展示了高可靠性设备的制造商是如何为机械保护或良好的服务条件而设计的,他们可能会在测试、处理或运输过程中忽略一个重大的风险,即无形的损坏,这可能会改变服务中的故障模式。我们提出了一个系统的努力,旨在重新定义目前提出的垫坑测试协议的第一个结果。
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引用次数: 14
Effect of die-attach material on performance and reliability of high-power light-emitting diode modules 贴模材料对大功率发光二极管模组性能和可靠性的影响
Pub Date : 2010-06-01 DOI: 10.1109/ECTC.2010.5490640
Xin Li, Xu Chen, G. Lu
Heat dissipation for packaging high-power light-emitting diodes is critically important to performance and reliability of LED lighting modules. The first thermal interface encountered by the heat flow is a die-attach material between the diode chip and its substrate. In this study, three different types of die-attach materials were used to construct 1-Watt GaN LED single-chip modules: a silver epoxy processed by curing; a lead-free solder paste by reflowing; and a nanosilver paste by low-temperature sintering. The modules were aged in an 85°C/85% relative humidity chamber and temperature-cycled between −40°C and 150°C. Luminous fluxes of the aged and cycled modules were measured to determine the effect of die-attach material. Results showed that the LED modules with chips joined by the low-temperature sintered nanosilver paste gave the best performance and long-term stability. This is attributed to high thermal conductivity of the sintered silver joint for improved heat dissipation.
封装大功率发光二极管的散热对LED照明模块的性能和可靠性至关重要。热流遇到的第一个热界面是二极管芯片与其衬底之间的附模材料。在本研究中,使用三种不同类型的模贴材料来构建1瓦GaN LED单芯片模块:一种是经固化处理的环氧银;回流制无铅锡膏;并通过低温烧结制成纳米银浆料。模块在85°C/85%相对湿度的室内老化,温度循环在- 40°C到150°C之间。对老化和循环后的光通量进行了测量,以确定模贴材料对光通量的影响。结果表明,低温烧结纳米银浆料连接芯片的LED模组具有最佳的性能和长期稳定性。这是由于烧结银接头的高导热性,以改善散热。
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引用次数: 15
A new Ni-Zn under bump metallurgy for Pb-free solder bump flip chip application 一种用于无铅碰撞倒装芯片的镍锌碰撞冶金新方法
Pub Date : 2010-06-01 DOI: 10.1109/ECTC.2010.5490894
Hae-Young Cho, Tae-Jin Kim, Young Min Kim, Sun-Chul Kim, Jin-young Park, Young-Ho Kim
We developed an Au/Ni-Zn/Ti under bump metallurgy (UBM) for Pb-free solders. Au/Ni-Zn/Ti and Au/Ni/Ti UBM stacks were deposited on SiO2/Si wafer using conventional magnetron sputtering and Sn solder was electroplated on UBM stacks. Then, Sn solder on UBM were reflowed at 260°C for 15 s and aged at 150°C up to 1000 h. The measurement of film stress using a curvature method showed Ni-Zn films having the very low tensile stress could be obtained by controlling the Ar pressure. Ni3Sn4 intermetallic compound (IMC) was formed on both Ni-Zn UBM and Ni UBM after reflow and IMC thickness increased with aging time. Other IMCs besides Ni3Sn4 were not observed after aging. IMC growth of Ni-Zn UBM was slower than that of Ni. UBM consumption rate of Ni-Zn UBM was also lower than that of Ni UBM. These beneficial results were ascribed to the effect of Zn, which played a role of interdiffusion barrier between Sn and Ni. Our results revealed that Ni-Zn layer is a promising UBM for Pb free solders.
本文研制了一种凸点冶金(UBM)的Au/Ni-Zn/Ti无铅焊料。采用常规磁控溅射技术在SiO2/Si晶片上沉积Au/Ni- zn /Ti和Au/Ni/Ti UBM叠层,并在UBM叠层上电镀Sn焊料。然后,在260°C回流15s,在150°C时效至1000 h。利用曲率法测量薄膜应力表明,通过控制Ar压力可以获得具有极低拉伸应力的Ni-Zn薄膜。Ni3Sn4金属间化合物Ni3Sn4金属间化合物(IMC)在Ni- zn UBM和Ni UBM上回流后均形成,IMC厚度随时效时间的延长而增加。时效后除Ni3Sn4外未观察到其他IMCs。Ni- zn UBM的IMC生长速度比Ni慢。Ni- zn UBM的耗油率也低于Ni UBM。这些有利的结果归因于锌的作用,锌在锡和镍之间发挥了相互扩散屏障的作用。结果表明,Ni-Zn层是一种很有前途的无铅钎料UBM。
{"title":"A new Ni-Zn under bump metallurgy for Pb-free solder bump flip chip application","authors":"Hae-Young Cho, Tae-Jin Kim, Young Min Kim, Sun-Chul Kim, Jin-young Park, Young-Ho Kim","doi":"10.1109/ECTC.2010.5490894","DOIUrl":"https://doi.org/10.1109/ECTC.2010.5490894","url":null,"abstract":"We developed an Au/Ni-Zn/Ti under bump metallurgy (UBM) for Pb-free solders. Au/Ni-Zn/Ti and Au/Ni/Ti UBM stacks were deposited on SiO2/Si wafer using conventional magnetron sputtering and Sn solder was electroplated on UBM stacks. Then, Sn solder on UBM were reflowed at 260°C for 15 s and aged at 150°C up to 1000 h. The measurement of film stress using a curvature method showed Ni-Zn films having the very low tensile stress could be obtained by controlling the Ar pressure. Ni3Sn4 intermetallic compound (IMC) was formed on both Ni-Zn UBM and Ni UBM after reflow and IMC thickness increased with aging time. Other IMCs besides Ni3Sn4 were not observed after aging. IMC growth of Ni-Zn UBM was slower than that of Ni. UBM consumption rate of Ni-Zn UBM was also lower than that of Ni UBM. These beneficial results were ascribed to the effect of Zn, which played a role of interdiffusion barrier between Sn and Ni. Our results revealed that Ni-Zn layer is a promising UBM for Pb free solders.","PeriodicalId":429629,"journal":{"name":"2010 Proceedings 60th Electronic Components and Technology Conference (ECTC)","volume":"150 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117318028","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Alternating-direction explicit FDTD method for three-dimensional full-wave simulation 三维全波模拟的交替方向显式时域有限差分法
Pub Date : 2010-06-01 DOI: 10.1109/ECTC.2010.5490946
S. Aono, M. Unno, H. Asai
In this paper, we propose a new FDTD (Finite-Difference Time-Domain) method using the alternating-direction explicit (ADE) method for the efficient electromagnetic field simulation. This method is based on the ADE method which has been used as the explicit-type finite-difference algorithm for solving diffusion equations. Our approach is the first application of the ADE method to the 3D-FDTD method. Furthermore, we introduce an absorbing boundary condition suitable for the 3D ADE-FDTD method which has been modified from the PML (perfectly matched layer). Finally, the efficiency of the ADE-FDTD method is evaluated by computer simulations.
本文提出了一种利用交替方向显式(ADE)方法进行高效电磁场仿真的时域有限差分(FDTD)方法。该方法是在求解扩散方程的显式有限差分算法ADE方法的基础上发展起来的。我们的方法是将ADE方法首次应用于3D-FDTD方法。此外,我们还引入了一种适用于三维ADE-FDTD方法的吸收边界条件,该边界条件由PML(完美匹配层)改进而来。最后,通过计算机仿真验证了ADE-FDTD方法的有效性。
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引用次数: 9
期刊
2010 Proceedings 60th Electronic Components and Technology Conference (ECTC)
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