Pub Date : 2024-12-09DOI: 10.1109/TPS.2024.3506423
{"title":"Member ad suite","authors":"","doi":"10.1109/TPS.2024.3506423","DOIUrl":"https://doi.org/10.1109/TPS.2024.3506423","url":null,"abstract":"","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"52 9","pages":"4531-4531"},"PeriodicalIF":1.3,"publicationDate":"2024-12-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10786902","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142797894","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-12-09DOI: 10.1109/TPS.2024.3495352
Jacob Stephens;Tom Huiskamp;Weihua Jiang;Chunqi Jiang;Ravi Joshi
{"title":"Guest Editorial Special Issue on Pulsed Power Science and Technology","authors":"Jacob Stephens;Tom Huiskamp;Weihua Jiang;Chunqi Jiang;Ravi Joshi","doi":"10.1109/TPS.2024.3495352","DOIUrl":"https://doi.org/10.1109/TPS.2024.3495352","url":null,"abstract":"","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"52 9","pages":"4234-4234"},"PeriodicalIF":1.3,"publicationDate":"2024-12-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10786887","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142797923","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-12-09DOI: 10.1109/TPS.2024.3511216
{"title":"Member ad suite","authors":"","doi":"10.1109/TPS.2024.3511216","DOIUrl":"https://doi.org/10.1109/TPS.2024.3511216","url":null,"abstract":"","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"52 9","pages":"4231-4231"},"PeriodicalIF":1.3,"publicationDate":"2024-12-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10786873","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142810529","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Stacked Blumlein pulse generators are crucial for compact and solid-state pulsed power systems, facing a challenge for high efficiency. The study established a theoretical calculation model including electromagnetic coupling mechanism and proposed an improved design for the structure of inner conductors connected in parallel. Theoretical wave propagation analysis compares the output characteristics of two structures: inner conductors connected in series (traditional) and in parallel (improved). Calculation results show that the parallel structure exhibits a higher output voltage efficiency under the same conditions. Furthermore, PSPICE simulations verify the effect of coupled transmission lines on output waveform quality and voltage efficiency. The coupled transmission lines degrade waveform quality, with the electrical length determining distortion degree and characteristic impedance affecting voltage amplitude. Experimental tests confirm the superior voltage stacking efficiency of the structure of inner conductors connected in parallel. A 96.1% voltage efficiency with a five-stage Blumlein at 489-V charging voltage and 500- $Omega $ load impedance was achieved, generating an output pulse with a pulsewidth of 72 ns and a rise time of 17 ns.
{"title":"Study on a Coaxial Stacked Blumlein Pulse Generator With Inner Conductors Connected in Parallel","authors":"Shuang Yang;Ruixin Yu;Jingjing Sun;Yijie Sun;Rong Chen;Jingming Gao","doi":"10.1109/TPS.2024.3501306","DOIUrl":"https://doi.org/10.1109/TPS.2024.3501306","url":null,"abstract":"Stacked Blumlein pulse generators are crucial for compact and solid-state pulsed power systems, facing a challenge for high efficiency. The study established a theoretical calculation model including electromagnetic coupling mechanism and proposed an improved design for the structure of inner conductors connected in parallel. Theoretical wave propagation analysis compares the output characteristics of two structures: inner conductors connected in series (traditional) and in parallel (improved). Calculation results show that the parallel structure exhibits a higher output voltage efficiency under the same conditions. Furthermore, PSPICE simulations verify the effect of coupled transmission lines on output waveform quality and voltage efficiency. The coupled transmission lines degrade waveform quality, with the electrical length determining distortion degree and characteristic impedance affecting voltage amplitude. Experimental tests confirm the superior voltage stacking efficiency of the structure of inner conductors connected in parallel. A 96.1% voltage efficiency with a five-stage Blumlein at 489-V charging voltage and 500-\u0000<inline-formula> <tex-math>$Omega $ </tex-math></inline-formula>\u0000 load impedance was achieved, generating an output pulse with a pulsewidth of 72 ns and a rise time of 17 ns.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"52 10","pages":"5241-5248"},"PeriodicalIF":1.3,"publicationDate":"2024-12-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142890224","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
A scheme of symmetric ridge loading of the top and bottom shorting cavities of an extended interaction cavity is proposed in this article for the broadbanding of an extended interaction klystron (EIK). While implementing this scheme, the periodicity of the ladder circuit has not been changed. In order to demonstrate the efficacy of the ridge loading in broadbanding, 3-D electromagnetic analysis was carried out on a W-band extended interaction cavity structure. The ridge loading is found to reduce the ohmic quality factor of the extended interaction cavity by 25% against that of no loading for the cavity operating at 95 GHz. At the same time, the ridge loading has shown marginal changes on the characteristic impedance and the peak axial electric field of the structure. A particle-in-cell (PIC) analysis has shown an enhancement in the 3-dB hot bandwidth of the ridge-loaded EIK (464 MHz) by around 250% in comparison to an unloaded device (185 MHz).
{"title":"Bandwidth Enhancement of Extended Interaction Klystron by Ridge-Loaded Extended Interaction Cavity","authors":"Vemula Bhanu Naidu;Dipanjan Gope;Subrata Kumar Datta","doi":"10.1109/TPS.2024.3499351","DOIUrl":"https://doi.org/10.1109/TPS.2024.3499351","url":null,"abstract":"A scheme of symmetric ridge loading of the top and bottom shorting cavities of an extended interaction cavity is proposed in this article for the broadbanding of an extended interaction klystron (EIK). While implementing this scheme, the periodicity of the ladder circuit has not been changed. In order to demonstrate the efficacy of the ridge loading in broadbanding, 3-D electromagnetic analysis was carried out on a W-band extended interaction cavity structure. The ridge loading is found to reduce the ohmic quality factor of the extended interaction cavity by 25% against that of no loading for the cavity operating at 95 GHz. At the same time, the ridge loading has shown marginal changes on the characteristic impedance and the peak axial electric field of the structure. A particle-in-cell (PIC) analysis has shown an enhancement in the 3-dB hot bandwidth of the ridge-loaded EIK (464 MHz) by around 250% in comparison to an unloaded device (185 MHz).","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"52 10","pages":"5179-5183"},"PeriodicalIF":1.3,"publicationDate":"2024-12-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142890245","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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