首页 > 最新文献

IEEE Transactions on Electromagnetic Compatibility最新文献

英文 中文
Accurate Mathematical Parameter Determination for Double-Exponential Impulse Waveforms With Specified Parameters 带指定参数的双指数脉冲波形的精确数学参数确定
IF 2.1 3区 计算机科学 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-08-29 DOI: 10.1109/temc.2024.3443861
Peerawut Yutthagowith, Yoshihiro Baba
{"title":"Accurate Mathematical Parameter Determination for Double-Exponential Impulse Waveforms With Specified Parameters","authors":"Peerawut Yutthagowith, Yoshihiro Baba","doi":"10.1109/temc.2024.3443861","DOIUrl":"https://doi.org/10.1109/temc.2024.3443861","url":null,"abstract":"","PeriodicalId":55012,"journal":{"name":"IEEE Transactions on Electromagnetic Compatibility","volume":"12 1","pages":""},"PeriodicalIF":2.1,"publicationDate":"2024-08-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142100919","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"计算机科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Failure Analysis of PLCs Under High Power Electromagnetic Pulses 大功率电磁脉冲下 PLC 的故障分析
IF 2.1 3区 计算机科学 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-08-29 DOI: 10.1109/temc.2024.3446845
Yong Li, Jianguo Wang, Haiyan Xie, Hui Yan, Feng Qin, Yayun Dong, Hailiang Qiao, Maoyu Zhang, Xinyang Zhai, Xin Nie, Wei Wang
{"title":"Failure Analysis of PLCs Under High Power Electromagnetic Pulses","authors":"Yong Li, Jianguo Wang, Haiyan Xie, Hui Yan, Feng Qin, Yayun Dong, Hailiang Qiao, Maoyu Zhang, Xinyang Zhai, Xin Nie, Wei Wang","doi":"10.1109/temc.2024.3446845","DOIUrl":"https://doi.org/10.1109/temc.2024.3446845","url":null,"abstract":"","PeriodicalId":55012,"journal":{"name":"IEEE Transactions on Electromagnetic Compatibility","volume":"97 1","pages":""},"PeriodicalIF":2.1,"publicationDate":"2024-08-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142100918","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"计算机科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Chip-Backside Vulnerability to Intentional Electromagnetic Interference in Integrated Circuits 集成电路中芯片背面易受有意电磁干扰影响的问题
IF 2 3区 计算机科学 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-08-28 DOI: 10.1109/TEMC.2024.3440919
Takuya Wadatsumi;Kazuki Monta;Yusuke Hayashi;Takuji Miki;Alkis A. Hatzopoulos;Adrijan Barić;Makoto Nagata
The backside of integrated circuits (ICs) in flip-chip assembly is susceptible to intentional electromagnetic interference due to its open surface. In this article, we propose a model in which conducted current noise from a localized area of the Si substrate on the chip-backside causes errors in complementary metal-oxide-semiconductor (CMOS) digital circuits. This model explains for the first time the mechanism of bit-flip errors in bistable circuits caused by high-voltage pulse (HVP) injection on the backside of the IC. The injected current from the backside of the IC not only flows into the power distribution network, but also charges the gate capacitance of the next stage via p–n junction diodes of body/drain or body/source in N-channel mosfets (NMOS) with twin-well structures, resulting in bit-flip errors. In this study, circuit simulations were performed using a three-dimensional RC network model of the IC chip and an HVP injector. These simulations have shown that the P-well voltage is biased depending on the arrangement of the tap cells, reproducing bit-flip errors in the bistable circuit of a D flip-flop. The simulation results were validated on a fabricated prototype IC chip, which confirmed the trend of data dependency for errors related to the physical layout.
在倒装芯片组装过程中,集成电路(IC)的背面由于是开放表面,很容易受到有意的电磁干扰。在本文中,我们提出了一个模型,在这个模型中,来自芯片背面硅衬底局部区域的传导电流噪声会导致互补金属氧化物半导体(CMOS)数字电路出现误差。该模型首次解释了集成电路背面高压脉冲(HVP)注入导致双稳态电路位翻转错误的机理。从集成电路背面注入的电流不仅会流入配电网络,还会通过双阱结构 N 沟道晶体管(NMOS)中的体/漏极或体/源极 p-n 结二极管对下一阶段的栅极电容充电,从而导致位翻转错误。在这项研究中,使用集成电路芯片的三维 RC 网络模型和 HVP 注入器进行了电路仿真。模拟结果表明,P-阱电压偏置取决于分接单元的排列,从而在 D 型触发器的双稳态电路中再现了位翻转错误。仿真结果在制造的集成电路原型芯片上进行了验证,证实了与物理布局相关的误差的数据依赖趋势。
{"title":"Chip-Backside Vulnerability to Intentional Electromagnetic Interference in Integrated Circuits","authors":"Takuya Wadatsumi;Kazuki Monta;Yusuke Hayashi;Takuji Miki;Alkis A. Hatzopoulos;Adrijan Barić;Makoto Nagata","doi":"10.1109/TEMC.2024.3440919","DOIUrl":"10.1109/TEMC.2024.3440919","url":null,"abstract":"The backside of integrated circuits (ICs) in flip-chip assembly is susceptible to intentional electromagnetic interference due to its open surface. In this article, we propose a model in which conducted current noise from a localized area of the Si substrate on the chip-backside causes errors in complementary metal-oxide-semiconductor (CMOS) digital circuits. This model explains for the first time the mechanism of bit-flip errors in bistable circuits caused by high-voltage pulse (HVP) injection on the backside of the IC. The injected current from the backside of the IC not only flows into the power distribution network, but also charges the gate capacitance of the next stage via p–n junction diodes of body/drain or body/source in N-channel \u0000<sc>mosfet</small>\u0000s (NMOS) with twin-well structures, resulting in bit-flip errors. In this study, circuit simulations were performed using a three-dimensional \u0000<italic>RC</i>\u0000 network model of the IC chip and an HVP injector. These simulations have shown that the P-well voltage is biased depending on the arrangement of the tap cells, reproducing bit-flip errors in the bistable circuit of a D flip-flop. The simulation results were validated on a fabricated prototype IC chip, which confirmed the trend of data dependency for errors related to the physical layout.","PeriodicalId":55012,"journal":{"name":"IEEE Transactions on Electromagnetic Compatibility","volume":"66 5","pages":"1556-1566"},"PeriodicalIF":2.0,"publicationDate":"2024-08-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10654642","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142090377","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"计算机科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Triple Bandstop 2.5D Frequency Selective Surface for Sub-6 GHz 5G Communication 用于 6 千兆赫以下 5G 通信的三重带阻 2.5D 频率选择表面
IF 2 3区 计算机科学 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-08-26 DOI: 10.1109/TEMC.2024.3445292
Kanishka Katoch;Naveen Jaglan;Binod Kumar Kanaujia;Pai-Yen Chen;Ahmed A. Kishk
The design of a miniaturized triple bandstop frequency selective surface (FSS) is presented for 5th generation (5G) communication systems. Meander lines in a spiral shape have been etched on the top and bottom of a dielectric substrate. To increase the electrical length of the FSS, the spirals are interconnected using four vias at the edges. The proposed design with a 5.2 × 5.2 mm2 footprint exhibits a triple bandstop response at sub-6 GHz frequency bands NR n46, LTE 42/LTE43, and LTE 46. The design is simple and cost-effective. As a miniaturized structure with rotational symmetry, it manifests polarization-independent characteristics with a stable frequency response for normal and oblique incident angles up to 84° (simulated) and 60° (measured). The transmission characteristics are verified using simulation and experiments. The proposed design can be used to shield 5G operational devices.
本文介绍了用于第五代(5G)通信系统的小型化三频带阻挡频率选择表面(FSS)的设计。在介质基板的顶部和底部蚀刻了螺旋形蜿蜒线。为了增加 FSS 的电气长度,螺旋边缘使用四个通孔相互连接。所提出的设计占地面积为 5.2 × 5.2 mm2,在 6 GHz 以下频段 NR n46、LTE 42/LTE43 和 LTE 46 具有三重带阻响应。设计简单,成本效益高。作为一种具有旋转对称性的微型结构,它表现出与极化无关的特性,在正入射角和斜入射角分别达到 84°(模拟)和 60°(实测)时具有稳定的频率响应。传输特性通过模拟和实验得到了验证。所提出的设计可用于屏蔽 5G 运营设备。
{"title":"Triple Bandstop 2.5D Frequency Selective Surface for Sub-6 GHz 5G Communication","authors":"Kanishka Katoch;Naveen Jaglan;Binod Kumar Kanaujia;Pai-Yen Chen;Ahmed A. Kishk","doi":"10.1109/TEMC.2024.3445292","DOIUrl":"10.1109/TEMC.2024.3445292","url":null,"abstract":"The design of a miniaturized triple bandstop frequency selective surface (FSS) is presented for 5th generation (5G) communication systems. Meander lines in a spiral shape have been etched on the top and bottom of a dielectric substrate. To increase the electrical length of the FSS, the spirals are interconnected using four vias at the edges. The proposed design with a 5.2 × 5.2 mm\u0000<sup>2</sup>\u0000 footprint exhibits a triple bandstop response at sub-6 GHz frequency bands NR n46, LTE 42/LTE43, and LTE 46. The design is simple and cost-effective. As a miniaturized structure with rotational symmetry, it manifests polarization-independent characteristics with a stable frequency response for normal and oblique incident angles up to 84° (simulated) and 60° (measured). The transmission characteristics are verified using simulation and experiments. The proposed design can be used to shield 5G operational devices.","PeriodicalId":55012,"journal":{"name":"IEEE Transactions on Electromagnetic Compatibility","volume":"66 5","pages":"1420-1429"},"PeriodicalIF":2.0,"publicationDate":"2024-08-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142084860","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"计算机科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A Fault Location Method Based on Polynomial Chaos Expansion for Non-uniform Power Transmission Lines With Uncertainty Parameters 基于多项式混沌展开的非均匀输电线路不确定参数故障定位方法
IF 2 3区 计算机科学 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-08-26 DOI: 10.1109/TEMC.2024.3423006
Shao-Yin He;Yu Song;Andrea Cozza;Yan-Zhao Xie;Zhao-Yang Wang
This article introduces a novel fault location method utilizing polynomial-chaos expansion (PCE) designed specifically for non-uniform transmission lines affected by uncertain parameters. It considers the uncertain parameters arising from height and ground conductivity in transmission lines, examining their impact on conventional fault location methods, such as natural frequency and full-transient analysis approach. These uncertainties lead to considerable location errors, particularly magnified with increasing fault distances. To address this issue, we propose a fault location approach based on PCE and correlation estimation. Simulations cover fault distances ranging from tens to hundreds of kilometers, considering variations in non-uniform line section-lengths, and examining scenarios with single and multiple conductors. Results demonstrate that the proposed method exhibits robustness across different degrees of uncertainty parameters in non-uniform settings, reducing the relative location error to below 1%. In terms of computational efficiency, the PCE method can accelerate calculations by up to 12 times compared to the Monte Carlo method. Furthermore, the PCE method has been validated using fault transient data from an actual 220 kV power line achieving a location error of 2.41%, which demonstrates its practical applicability in real-world power grid scenarios.
本文介绍了一种利用多项式混沌展开(PCE)的新型故障定位方法,该方法专为受不确定参数影响的非均匀输电线路而设计。文章考虑了输电线路中由高度和地面传导性引起的不确定参数,研究了它们对传统故障定位方法(如固有频率和全瞬态分析方法)的影响。这些不确定性会导致相当大的定位误差,尤其是随着故障距离的增加而放大。为解决这一问题,我们提出了一种基于 PCE 和相关性估计的故障定位方法。模拟涵盖了从几十公里到几百公里的故障距离,考虑了非均匀线路截面长度的变化,并研究了单导体和多导体的情况。结果表明,所提出的方法在非均匀环境下不同程度的不确定性参数中表现出稳健性,将相对位置误差降低到 1%以下。在计算效率方面,与蒙特卡罗方法相比,PCE 方法可将计算速度提高 12 倍。此外,PCE 方法还通过实际 220 千伏电力线路的故障瞬态数据进行了验证,其定位误差仅为 2.41%,这证明了该方法在实际电网场景中的实用性。
{"title":"A Fault Location Method Based on Polynomial Chaos Expansion for Non-uniform Power Transmission Lines With Uncertainty Parameters","authors":"Shao-Yin He;Yu Song;Andrea Cozza;Yan-Zhao Xie;Zhao-Yang Wang","doi":"10.1109/TEMC.2024.3423006","DOIUrl":"10.1109/TEMC.2024.3423006","url":null,"abstract":"This article introduces a novel fault location method utilizing polynomial-chaos expansion (PCE) designed specifically for non-uniform transmission lines affected by uncertain parameters. It considers the uncertain parameters arising from height and ground conductivity in transmission lines, examining their impact on conventional fault location methods, such as natural frequency and full-transient analysis approach. These uncertainties lead to considerable location errors, particularly magnified with increasing fault distances. To address this issue, we propose a fault location approach based on PCE and correlation estimation. Simulations cover fault distances ranging from tens to hundreds of kilometers, considering variations in non-uniform line section-lengths, and examining scenarios with single and multiple conductors. Results demonstrate that the proposed method exhibits robustness across different degrees of uncertainty parameters in non-uniform settings, reducing the relative location error to below 1%. In terms of computational efficiency, the PCE method can accelerate calculations by up to 12 times compared to the Monte Carlo method. Furthermore, the PCE method has been validated using fault transient data from an actual 220 kV power line achieving a location error of 2.41%, which demonstrates its practical applicability in real-world power grid scenarios.","PeriodicalId":55012,"journal":{"name":"IEEE Transactions on Electromagnetic Compatibility","volume":"66 5","pages":"1665-1678"},"PeriodicalIF":2.0,"publicationDate":"2024-08-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142084890","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"计算机科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
3-D Printed All-Dielectric Ultrabroadband Microwave Absorber 3-D 打印全介质超宽带微波吸收器
IF 2.1 3区 计算机科学 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-08-23 DOI: 10.1109/temc.2024.3440060
Jyoti Yadav, Rahul Vishwakarma, Mondeep Saikia, Kumar Vaibhav Srivastava, J. Ramkumar
{"title":"3-D Printed All-Dielectric Ultrabroadband Microwave Absorber","authors":"Jyoti Yadav, Rahul Vishwakarma, Mondeep Saikia, Kumar Vaibhav Srivastava, J. Ramkumar","doi":"10.1109/temc.2024.3440060","DOIUrl":"https://doi.org/10.1109/temc.2024.3440060","url":null,"abstract":"","PeriodicalId":55012,"journal":{"name":"IEEE Transactions on Electromagnetic Compatibility","volume":"49 1","pages":""},"PeriodicalIF":2.1,"publicationDate":"2024-08-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142045504","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"计算机科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Low-Frequency Magnetic Shielding of a Double-Layered Planar Shield Against a Parallel Loop 双层平面屏蔽对平行环路的低频磁屏蔽
IF 2 3区 计算机科学 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-08-23 DOI: 10.1109/TEMC.2024.3436551
Yiyi Jing;Sijia Liu;Jiahua Mei;Haidong Liu;Chongqing Jiao
This article theoretically investigates the shielding problem of a double-layered planar shield of infinite extent against the magnetic field generated by a circular loop placed parallel to the shield. First, Moser's formulation of solving the vector wave equation is extended to obtain the exact integral expressions of the shielded fields. Second, the approximate expressions are developed for electrically thick, nonmagnetic, metallic sheets. Also, the conditions to validate the approximate expressions are illimulated. Finally, the calculated results for the aluminum, the low-carbon steel and the permalloy are presented according to the NSA 94-106 setup. Meanwhile, the effects of thickness distribution and sheet-to-sheet spacing are analyzed.
本文从理论上研究了一个无限宽的双层平面屏蔽罩对平行于屏蔽罩的环形线圈所产生的磁场的屏蔽问题。首先,扩展了求解矢量波方程的 Moser 公式,以获得屏蔽场的精确积分表达式。其次,针对电厚、非磁性的金属片开发了近似表达式。此外,还模拟了验证近似表达式的条件。最后,根据 NSA 94-106 设置给出了铝、低碳钢和高合金的计算结果。同时,还分析了厚度分布和薄板间距的影响。
{"title":"Low-Frequency Magnetic Shielding of a Double-Layered Planar Shield Against a Parallel Loop","authors":"Yiyi Jing;Sijia Liu;Jiahua Mei;Haidong Liu;Chongqing Jiao","doi":"10.1109/TEMC.2024.3436551","DOIUrl":"10.1109/TEMC.2024.3436551","url":null,"abstract":"This article theoretically investigates the shielding problem of a double-layered planar shield of infinite extent against the magnetic field generated by a circular loop placed parallel to the shield. First, Moser's formulation of solving the vector wave equation is extended to obtain the exact integral expressions of the shielded fields. Second, the approximate expressions are developed for electrically thick, nonmagnetic, metallic sheets. Also, the conditions to validate the approximate expressions are illimulated. Finally, the calculated results for the aluminum, the low-carbon steel and the permalloy are presented according to the NSA 94-106 setup. Meanwhile, the effects of thickness distribution and sheet-to-sheet spacing are analyzed.","PeriodicalId":55012,"journal":{"name":"IEEE Transactions on Electromagnetic Compatibility","volume":"66 5","pages":"1430-1439"},"PeriodicalIF":2.0,"publicationDate":"2024-08-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142045367","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"计算机科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A Novel Method for Tailoring the Electromagnetic Radiation Emission Limits of Equipment in Complex System 定制复杂系统中设备电磁辐射发射限值的新方法
IF 2 3区 计算机科学 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-08-23 DOI: 10.1109/TEMC.2024.3437434
Yaoyao Li;Youwei Meng;Hao Chen;Houpu Xiao;Shaoxiong Cai
The trend toward integration in systems has led to the unpredictability of electromagnetic compatibility within the system. Fixed radiation emission standards struggle to meet the diverse and complex requirements of specific scenarios, making it essential to design or adjust emission limits for specific equipment. To address this issue, this article investigates a method for tailoring the emission limits standard RE102 of radiation equipment in complex systems that include multiple radiating and sensitive equipment. We establish a radiation coupling network model within the system and propose a solution based on the affine-scaling interior-point method for solving the emission limit indicators. This method abstracts the problem of tailoring radiation emission limits into a single-objective optimization problem. We establish a design cost calculation model for each piece of radiation equipment, with the total system design cost as the optimization objective, to obtain the optimal solution under constraints. Finally, through case design and testing involving multiple radiating equipment and sensitive equipment, the test results demonstrate the effectiveness and reliability of the proposed novel method in different scenarios.
系统集成的趋势导致了系统内电磁兼容性的不可预测性。固定的辐射发射标准难以满足特定场景中多样而复杂的要求,因此必须针对特定设备设计或调整发射限值。为解决这一问题,本文研究了一种方法,用于在包含多种辐射和敏感设备的复杂系统中定制辐射设备的发射限值标准 RE102。我们建立了系统内的辐射耦合网络模型,并提出了一种基于仿射缩放内点法的排放限值指标求解方法。该方法将辐射排放限值的定制问题抽象为单目标优化问题。以系统设计总成本为优化目标,建立各辐射设备的设计成本计算模型,得到约束条件下的最优解。最后,通过涉及多个辐射设备和敏感设备的案例设计和测试,测试结果证明了所提出的新方法在不同场景下的有效性和可靠性。
{"title":"A Novel Method for Tailoring the Electromagnetic Radiation Emission Limits of Equipment in Complex System","authors":"Yaoyao Li;Youwei Meng;Hao Chen;Houpu Xiao;Shaoxiong Cai","doi":"10.1109/TEMC.2024.3437434","DOIUrl":"10.1109/TEMC.2024.3437434","url":null,"abstract":"The trend toward integration in systems has led to the unpredictability of electromagnetic compatibility within the system. Fixed radiation emission standards struggle to meet the diverse and complex requirements of specific scenarios, making it essential to design or adjust emission limits for specific equipment. To address this issue, this article investigates a method for tailoring the emission limits standard RE102 of radiation equipment in complex systems that include multiple radiating and sensitive equipment. We establish a radiation coupling network model within the system and propose a solution based on the affine-scaling interior-point method for solving the emission limit indicators. This method abstracts the problem of tailoring radiation emission limits into a single-objective optimization problem. We establish a design cost calculation model for each piece of radiation equipment, with the total system design cost as the optimization objective, to obtain the optimal solution under constraints. Finally, through case design and testing involving multiple radiating equipment and sensitive equipment, the test results demonstrate the effectiveness and reliability of the proposed novel method in different scenarios.","PeriodicalId":55012,"journal":{"name":"IEEE Transactions on Electromagnetic Compatibility","volume":"66 5","pages":"1478-1489"},"PeriodicalIF":2.0,"publicationDate":"2024-08-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142045503","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"计算机科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Deep Neural Network-Based Surrogate-Assisted Inverse Optimization for High-Speed Interconnects 基于深度神经网络的高速互联代用辅助逆向优化
IF 2.1 3区 计算机科学 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-08-16 DOI: 10.1109/temc.2024.3440055
Quankun Chen, Ling Zhang, Hanzhi Ma, Da Li, Yan Li, En-Xiao Liu, Er-Ping Li
{"title":"Deep Neural Network-Based Surrogate-Assisted Inverse Optimization for High-Speed Interconnects","authors":"Quankun Chen, Ling Zhang, Hanzhi Ma, Da Li, Yan Li, En-Xiao Liu, Er-Ping Li","doi":"10.1109/temc.2024.3440055","DOIUrl":"https://doi.org/10.1109/temc.2024.3440055","url":null,"abstract":"","PeriodicalId":55012,"journal":{"name":"IEEE Transactions on Electromagnetic Compatibility","volume":"40 1","pages":""},"PeriodicalIF":2.1,"publicationDate":"2024-08-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141994370","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"计算机科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A Hybrid 3-D Frequency Selective Structure Featuring Enhanced Stopband Suppression and Reduced Insertion Loss 具有增强的阻带抑制和降低的插入损耗的混合三维选频结构
IF 2.1 3区 计算机科学 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-08-16 DOI: 10.1109/temc.2024.3439013
Pei Zhang, Da Li, Xiaodong An, Yudi Fan, Yan Li, Wenchao Chen, Er-Ping Li
{"title":"A Hybrid 3-D Frequency Selective Structure Featuring Enhanced Stopband Suppression and Reduced Insertion Loss","authors":"Pei Zhang, Da Li, Xiaodong An, Yudi Fan, Yan Li, Wenchao Chen, Er-Ping Li","doi":"10.1109/temc.2024.3439013","DOIUrl":"https://doi.org/10.1109/temc.2024.3439013","url":null,"abstract":"","PeriodicalId":55012,"journal":{"name":"IEEE Transactions on Electromagnetic Compatibility","volume":"24 1","pages":""},"PeriodicalIF":2.1,"publicationDate":"2024-08-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141994371","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"计算机科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
期刊
IEEE Transactions on Electromagnetic Compatibility
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1