Intelligent characterization of van der Waals semiconductors is an essential process for industrial manufacturing and laboratory fabrication. A combination of microscopic images and artificial intelligence models is an efficient way for wafer-scale layer number identification of van der Waals semiconductors. This methodology overcomes the bottleneck of the conventional manual layer number counting approach, which requires a long period of manual inspection and induces high error rates when distinguishing layers with similar appearance. Here, a convolutional architecture that involves a fused network of ResNet-Inception with Attention Layer (RIAL) is developed for accurate multiclass classification of randomly distributed layers of chemical vapor deposition (CVD)-grown van der Waals semiconductors. RIAL model is first validated on the single-label datasets CIFAR-10/100, and subsequently fine-tuned on the custom-built microscopic image datasets of CVD-grown MoS2. To compare with semantic segmentation, U-Net with Attention Layer (UNAL) is further implemented for pixel-wise classification of multiclass semiconductors. The quantitative analysis of RIAL and UNAL illustrates the versatility of attention convolutional network models in the wafer-scale identification of van der Waals semiconductors.