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Efficient address generator architectures for IEEE 802.16e WiMAX deinterleaver based on SPAM approach 基于SPAM方法的IEEE 802.16e WiMAX脱交织器的高效地址生成器体系结构
IF 1.4 4区 工程技术 Q4 COMPUTER SCIENCE, HARDWARE & ARCHITECTURE Pub Date : 2025-08-11 DOI: 10.1007/s10470-025-02477-y
Vivek Karthick Perumal, Ramesh Jayabalan, Thiruvenkadam Krishnan, Dhanasekaran Selvaraj

This paper presents a VLSI implementation of a Synchronous Pipelined Array Multiplier (SPAM)-based address generation architecture designed for a WiMAX deinterleaver. The proposed design enhances throughput and reduces latency by adding parallelism within the array multiplier, specifically designed for efficient WiMAX deinterleaver. The architecture maintains synchronization with WiMAX operations and focuses on low power consumption, making it compatible for integration into energy-efficient systems. Simulation results demonstrate superior performance in terms of speed, power efficiency, and throughput, highlighting the architecture's suitability for high-performance WiMAX systems, particularly in wireless broadband communication. The proposed SPAM-based address generator is 58% and 18% faster than LUT-based and MUX-based systems, respectively. It also achieves 45% and 15% lower power consumption, respectively. Implemented in 45 nm CMOS technology, the proposed multiplier better performs the LUT-based architecture in Power-Delay Product (PDP) and Area-Delay Product (ADP) by 71% and 37%, respectively.

本文提出了一种基于同步流水线阵列乘子(SPAM)的地址生成架构的VLSI实现,该架构是为WiMAX去交织器设计的。提出的设计通过在阵列乘法器中增加并行性来提高吞吐量并降低延迟,该阵列乘法器专为高效的WiMAX去交织器而设计。该架构与WiMAX操作保持同步,并专注于低功耗,使其能够兼容集成到节能系统中。仿真结果显示了在速度、功率效率和吞吐量方面的卓越性能,突出了该架构对高性能WiMAX系统的适用性,特别是在无线宽带通信中。所提出的基于spam的地址生成器比基于lut和基于mux的系统分别快58%和18%。它的功耗也分别降低了45%和15%。该乘法器采用45纳米CMOS技术实现,在功率延迟产品(PDP)和面积延迟产品(ADP)方面的性能分别比基于lutt的架构高71%和37%。
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引用次数: 0
User clustering and power allocation based deep learning enabled hybrid feedback shark Lion optimization 基于深度学习的用户聚类和功率分配实现了混合反馈的鲨鱼狮优化
IF 1.4 4区 工程技术 Q4 COMPUTER SCIENCE, HARDWARE & ARCHITECTURE Pub Date : 2025-08-07 DOI: 10.1007/s10470-025-02460-7
Kasula Raghu, Puttha Chandrasekhar Reddy

The Non-orthogonal multiple access (NOMA) systems have become a hopeful one that addresses the need for fifth-generation (5G) communication while resolving the issues with spectrum scarcity. NOMA’s major objective is to improve the spectrum utilization while sacrificing an effective utilization of resources. Therefore, this work designed an efficient user clustering as well the power allocation scheme with the aid of deep learning (DL) enabled White Feedback Sea Lion Optimization (WFSLnO). Here, the downlink femtocell NOMA power consumption scheme includes one macro-base Station (BS) contained by a cluster of femtocell BSs. In addition, user clustering is accomplished by Deep Fuzzy Clustering (DFC), in which the user grouping parameters like Signal-to-Interference-plus-Noise-ratio (SINR), position, initial power, and channel gain are utilized. Moreover, the Backpropagation Neural Network (BPNN) is employed for the power allocation process. Furthermore, the proposed WFSLnO optimized the BPNN’s hyperparameters. Here, the WFSLnO enabled BPNN’s power allocation performance is revealed by considering the metrics including energy efficiency, achievable rate, throughput, and sum rate, as well as the corresponding values achieved are 2.975 Mbits/sec, 0.039 Mbits/Joules, 18.49 Mbits/sec and 0.631Mbps.

在解决频谱稀缺问题的同时,非正交多址(NOMA)系统已成为解决第五代(5G)通信需求的一种有希望的系统。NOMA的主要目标是在牺牲资源有效利用的同时提高频谱利用率。因此,本文设计了一种高效的用户聚类以及基于深度学习(DL)的白反馈海狮优化(WFSLnO)的功率分配方案。在这里,下行链路的飞蜂窝NOMA功耗方案包括一个由一组飞蜂窝基站包含的宏基站(BS)。此外,利用信噪比(SINR)、位置、初始功率和信道增益等用户分组参数,通过深度模糊聚类(DFC)实现用户聚类。在功率分配过程中采用了反向传播神经网络(BPNN)。此外,所提出的WFSLnO对BPNN的超参数进行了优化。本文通过考虑能量效率、可达速率、吞吐量和和速率等指标,揭示了WFSLnO使能的BPNN的功率分配性能,相应的值分别为2.975 Mbits/sec、0.039 Mbits/Joules、18.49 Mbits/sec和0.631Mbps。
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引用次数: 0
DS pOTFT 8T: Analysis of Dual data aware SRAM cell employing pentacene ditch formation on BGBC OTFT and LaxNb(1-x) Oy layer for high-speed, low-leakage flexible computing devices DS pott8t:在BGBC OTFT和LaxNb(1-x) Oy层上形成并五苯沟槽的双数据感知SRAM单元分析,用于高速、低泄漏柔性计算设备
IF 1.4 4区 工程技术 Q4 COMPUTER SCIENCE, HARDWARE & ARCHITECTURE Pub Date : 2025-08-02 DOI: 10.1007/s10470-025-02461-6
Surbhi Bharti, Ashwni Kumar

This work presents a novel Dual-Split Bottom Gate Bottom Contact (BGBC) 8T Static Random Access Memory (DS-pOTFT 8T SRAM) architecture featuring p+ doped pentacene ditched formation as the active channel material on LaxNb(1-x)Oy dielectric substrate. The innovative design addresses critical challenges in conventional silicon-based and organic thin-film transistor (OTFT) memory systems, including bitline (BL) leakage current, write-read conflicts, and subthreshold instability that increasingly plague System-on-Chip (SoCs) applications. Comprehensive Silvaco ATLAS simulations demonstrate exceptional performance improvements as 66% reduction in off-state leakage current compared to T6T designs and 39% versus DC8T architectures, while achieving 58% energy savings per bit operation. The dual data-aware word-line control mechanism enhances write static noise margin by 64%, increasing stability from 220 mV to 280 mV under low-voltage conditions. Read operations demonstrate 56(times), 45(times), 36(times), and 28(times) performance improvements over 6T, 7T, 8T, and 9T configurations respectively, while write operations show 32(times), 41(times), 15(times), and 7(times) enhancements. Power consumption analysis reveals substantial reductions by factors of 54(times)-79(times) during read operations and approximately 59x-82(times) during write operations compared to baseline architectures. The strategic p+ doped ditch layer formation significantly improves charge carrier mobility while maintaining ultra-low leakage power of 0.6 nW. Write latency reduction of 22% and 40% improvement in read stability, combined with fastest write operation of about 19 pS, position this architecture as superior to existing Hybrid 6T pOTFT (H6T), Takamiya’s 6T (T6T), dual-threshold 8T CNTFET (DC8T), Fukuda 6T (F6T), data-scheme PMOS-NMOS 10T (DS10T), and BLE10T based SRAM designs. With only 12–15% area overhead, the DS-pOTFT 8T SRAM offers exceptional scalability for Computing-in-Memory (CIM) applications, flexible electronics and edge AI accelerators where energy efficiency and noise tolerance are paramount, representing a transformative advancement in next-generation memory architecture design.

本文提出了一种新的双裂底栅底接触(BGBC) 8T静态随机存取存储器(DS-pOTFT 8T SRAM)结构,该结构采用p+掺杂的并五苯沟槽结构作为LaxNb(1-x)Oy介电衬底上的有源沟道材料。该创新设计解决了传统硅基和有机薄膜晶体管(OTFT)存储系统面临的关键挑战,包括位线(BL)漏电流、写读冲突和亚阈值不稳定性,这些问题日益困扰着片上系统(soc)应用。全面的Silvaco ATLAS模拟显示了卓越的性能改进为66% reduction in off-state leakage current compared to T6T designs and 39% versus DC8T architectures, while achieving 58% energy savings per bit operation. The dual data-aware word-line control mechanism enhances write static noise margin by 64%, increasing stability from 220 mV to 280 mV under low-voltage conditions. Read operations demonstrate 56(times), 45(times), 36(times), and 28(times) performance improvements over 6T, 7T, 8T, and 9T configurations respectively, while write operations show 32(times), 41(times), 15(times), and 7(times) enhancements. Power consumption analysis reveals substantial reductions by factors of 54(times)-79(times) during read operations and approximately 59x-82(times) during write operations compared to baseline architectures. The strategic p+ doped ditch layer formation significantly improves charge carrier mobility while maintaining ultra-low leakage power of 0.6 nW. Write latency reduction of 22% and 40% improvement in read stability, combined with fastest write operation of about 19 pS, position this architecture as superior to existing Hybrid 6T pOTFT (H6T), Takamiya’s 6T (T6T), dual-threshold 8T CNTFET (DC8T), Fukuda 6T (F6T), data-scheme PMOS-NMOS 10T (DS10T), and BLE10T based SRAM designs. With only 12–15% area overhead, the DS-pOTFT 8T SRAM offers exceptional scalability for Computing-in-Memory (CIM) applications, flexible electronics and edge AI accelerators where energy efficiency and noise tolerance are paramount, representing a transformative advancement in next-generation memory architecture design.
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引用次数: 0
Design of 6 nm double gate MOSFET and its circuit level applications 6nm双栅MOSFET的设计及其电路级应用
IF 1.4 4区 工程技术 Q4 COMPUTER SCIENCE, HARDWARE & ARCHITECTURE Pub Date : 2025-08-01 DOI: 10.1007/s10470-025-02467-0
Shrabanti Kundu, Jyotsna Kumar Mandal

This study introduces the virtual fabrication and electrical characteristics of a 6 nm double-gate transistor, utilizing Hafnium Dioxide (HfO₂) as the high-k dielectric material and Indium Gallium Arsenide (InGaAs), Slicon Germenum (SiGe), Gallium Nitride (GaN) as the substrate. A comparative analysis of SiGe, InGaAs and GaN as substrate materials is performed. For low-power security circuit applications, this article provides a thorough performance analysis of Double Gate Metal-Oxide-Semiconductor Field-Effect Transistors (DG MOSFETs). With the increasing demand for energy-efficient electronic devices, semiconductor technologies are continually evolving to meet these requirements. InGaAs offer improved gate capacitance and reduced leakage current, making them attractive candidates for enhancing the performance of DG MOSFETs in low-power applications. Based on the simulation results, the optimal values of threshold voltage (VTH) is 0.66 V, drive current (ION) is 2.4 × 10−3 A/µm, leakage current (IOFF) is 3.59 × 10–12 A/µm, Drain Induced Barrier Lowering (DIBL) is 0.08 mV/V and subthreshold slope (SS) is 70.76 mV/dec. The device operates satisfactorily when the suggested work is compared to the current one. The 6 nm DG-MOSFET, which exhibits greater efficiency with reduced power consumption and less latency, is used to build a security-based encryption method. In circuit-level applications, the lower power consumption and more effective operation enable the addition of an additional hardware-based security layer, thereby preventing unwanted access. Nanoscale security circuits allow the development of smaller and more compact devices, such as in wearable technology, autonomous vehicles or embedded IoT devices.

本文介绍了以二氧化铪(HfO₂)为高k介电材料,砷化铟镓(InGaAs)、锗硅(SiGe)、氮化镓(GaN)为衬底的6纳米双栅晶体管的虚拟制造及其电学特性。对SiGe、InGaAs和GaN作为衬底材料进行了比较分析。对于低功耗安全电路应用,本文提供了双栅金属氧化物半导体场效应晶体管(DG mosfet)的全面性能分析。随着对节能电子器件的需求不断增加,半导体技术也在不断发展以满足这些要求。InGaAs提供了更好的栅极电容和更低的泄漏电流,使其成为提高低功耗应用中DG mosfet性能的有吸引力的候选者。仿真结果表明,最优阈值电压(VTH)为0.66 V,驱动电流(ION)为2.4 × 10−3 A/µm,泄漏电流(IOFF)为3.59 × 10 - 12 A/µm,漏极抑制(DIBL)为0.08 mV/V,亚阈值斜率(SS)为70.76 mV/dec。将建议的工作与目前的工作进行比较,该装置的工作令人满意。6nm DG-MOSFET具有更高的效率,更低的功耗和更短的延迟,用于构建基于安全的加密方法。在电路级应用中,更低的功耗和更有效的操作可以增加一个额外的基于硬件的安全层,从而防止不必要的访问。纳米级安全电路允许开发更小、更紧凑的设备,例如可穿戴技术、自动驾驶汽车或嵌入式物联网设备。
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引用次数: 0
Enhancing phase noise performance in cross-coupled LC oscillators through switch transistor current shaping 通过开关晶体管电流整形提高交叉耦合LC振荡器的相位噪声性能
IF 1.4 4区 工程技术 Q4 COMPUTER SCIENCE, HARDWARE & ARCHITECTURE Pub Date : 2025-07-23 DOI: 10.1007/s10470-025-02458-1
Komeil Yazdani, Ali Jalali, Omid Hashemipour

This paper presents an innovative structural modification to enhance the phase noise performance of cross-coupled LC oscillators, a critical component in high-performance RF and wireless communication systems. The proposed architecture reduces phase noise while simultaneously increasing the output oscillation frequency. The key mechanism for noise reduction involves shaping the current of the switch transistors by minimizing their conduction angle precisely at the zero-crossing points of the output oscillation. The oscillator operates in the C-band at 4.02 GHz, making it suitable for radar, satellite communication, and 5G applications. At a 100 kHz offset, the phase noise is measured at − 111.25 dBc/Hz, and at a 1 MHz offset, it reaches − 132.16 dBc/Hz. Simulations were performed using Cadence software with TSMC_0.18 µm_RF CMOS technology at a 1.8 V supply voltage. The oscillator achieves a peak-to-peak output voltage of 2.26 V while consuming only 4.11mW of power. To validate the design under realistic conditions, a full-custom layout was implemented, and post-layout simulations were conducted using extracted parasitics. The post-layout results confirmed minimal degradation in performance and demonstrated that the proposed oscillator maintains competitive figure-of-merit values, highlighting its robustness and practical viability for integrated RF applications.

本文提出了一种创新的结构修改,以提高交叉耦合LC振荡器的相位噪声性能,交叉耦合LC振荡器是高性能射频和无线通信系统的关键部件。该结构降低了相位噪声,同时提高了输出振荡频率。降低噪声的关键机制包括通过精确地在输出振荡的过零点处最小化其导通角来塑造开关晶体管的电流。该振荡器工作在4.02 GHz的c波段,适用于雷达、卫星通信和5G应用。在100khz偏置时,相位噪声测量值为- 111.25 dBc/Hz,在1mhz偏置时,相位噪声测量值为- 132.16 dBc/Hz。在1.8 V电源电压下,采用TSMC_0.18µm_RF CMOS技术,利用Cadence软件进行仿真。该振荡器的峰对峰输出电压为2.26 V,而功耗仅为4.11mW。为了在现实条件下验证设计,实现了全自定义布局,并使用提取的寄生进行了布局后仿真。布局后的结果证实了性能的最小退化,并证明了所提出的振荡器保持具有竞争力的性能值,突出了其在集成射频应用中的鲁棒性和实际可行性。
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引用次数: 0
A 4 A 10 MHz capacitive isolated gate driver with 5 V to 25 V output voltage for WBG FETs 一个4a 10mhz电容隔离栅极驱动器,输出电压为5v至25v,用于WBG场效应管
IF 1.4 4区 工程技术 Q4 COMPUTER SCIENCE, HARDWARE & ARCHITECTURE Pub Date : 2025-07-21 DOI: 10.1007/s10470-025-02443-8
Yuan Xu, Dejin Zhou, Fuwei Shen, Renxia Ning, Ningye He, Zhenhai Chen, Huang Wei

A gate drive circuit with high speed, low delay and wide output voltage range is designed which can meet the driving requirements of GaN and SiC FETs in this paper. In order to improve the switching frequency and reduce the input/output delay a high speed output drive circuit with a wide gate voltage range and a low delay OOK TX/RX circuit are proposed. A 10 MHz capacitive isolated gate driver IC with output current of 4 A and output gate voltage of 5 V-25 V is realized in 180 nm BCD process. The test results show that the gate driver achieves the rise and fall time of 1.0 ns and 1.5 ns respectively under 5.0 V supply, and the rise and fall time of 2.5 ns and 3.2 ns respectively under 25 V supply with 10 MHz frequency, and the delay time is 22.5 ns and 25 ns respectively for 5.0 V and 25 V supply.

本文设计了一种高速、低延迟、宽输出电压范围的栅极驱动电路,可以满足GaN和SiC场效应管的驱动要求。为了提高开关频率,降低输入输出延迟,提出了宽栅极电压范围的高速输出驱动电路和低延迟的OOK TX/RX电路。采用180 nm的BCD工艺,实现了输出电流为4 A、输出门电压为5 V-25 V的10 MHz电容隔离栅驱动IC。测试结果表明,栅极驱动器在5.0 V电压下的上升时间和下降时间分别为1.0 ns和1.5 ns,在10 MHz频率下的25 V电压下的上升时间和下降时间分别为2.5 ns和3.2 ns,在5.0 V和25 V电压下的延迟时间分别为22.5 ns和25 ns。
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引用次数: 0
Neural network based frequency adaptive digital predistortion of RF power amplifiers 基于神经网络的射频功率放大器频率自适应数字预失真
IF 1.4 4区 工程技术 Q4 COMPUTER SCIENCE, HARDWARE & ARCHITECTURE Pub Date : 2025-07-21 DOI: 10.1007/s10470-025-02466-1
Funda Daylak, Serdar Ozoguz, Lida Kouhalvandi, Oguz Bayat

Linearization of power amplifiers (PAs) is a big challenge in high-dimensional radio frequency (RF) designs, and to tackle this drawback we propose an adaptive strategy with the combination of neural networks (NNs) and band-pass filters for input signals with different frequencies that results in reduced computational costs. The proposed linearization approach is based on utilization of NN for modeling the PA and band-pass filters for contributing to frequency adaptability without feedback loop. Thus, even if the frequency of the input signal changes, the system may still produce linear output. The proposed model consists of sub-digital predistortion (DPD) blocks where each sub-DPD block generates DPD coefficients only for the specified frequency range. Thanks to sub-DPD blocks without feedback, the computational load of the model is reduced and computation time is saved. To validate the proposed model, the PA is first characterized using the neural network. Then, the frequency of the input signal is determined via band-pass filtering. Based on this frequency information, the corresponding NN-based sub-DPD block is activated to linearize the PA’s nonlinear behavior. For the presented PA that is operating from 1.7 GHz to 2 GHz, four different input signal frequencies values as 1.7 GHz, 1.9 GHz, 2.1 GHz, 2.4 GHz respectively are carried out. The achieved results prove that the proposed model provides improved PA modeling and nonlinear compensation compared to the other methods. The 1-dB compression point of the PA is measured as–6.88 dBm without DPD, 4.49 dBm with look-up table-based DPD, and 7 dBm with NN-based DPD.

功率放大器(PAs)的线性化是高维射频(RF)设计中的一大挑战,为了解决这一缺点,我们提出了一种结合神经网络(nn)和带通滤波器的自适应策略,用于不同频率的输入信号,从而降低了计算成本。提出的线性化方法是基于利用神经网络对PA和带通滤波器进行建模,以提高频率自适应性,而不需要反馈环路。因此,即使输入信号的频率发生变化,系统仍可能产生线性输出。该模型由子数字预失真(DPD)块组成,每个子DPD块仅在指定的频率范围内生成DPD系数。由于采用了无反馈的子dpd块,减少了模型的计算量,节省了计算时间。为了验证所提出的模型,首先使用神经网络对PA进行表征。然后,通过带通滤波确定输入信号的频率。基于该频率信息,相应的基于nn的子dpd块被激活以线性化PA的非线性行为。对于工作在1.7 GHz ~ 2 GHz的放大器,分别进行了1.7 GHz、1.9 GHz、2.1 GHz、2.4 GHz四个不同的输入信号频率值。实验结果表明,与其他方法相比,该模型具有更好的PA建模和非线性补偿能力。无DPD时,PA的1 db压缩点为6.88 dBm,基于查找表的DPD时为4.49 dBm,基于神经网络的DPD时为7 dBm。
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引用次数: 0
Optimization of performance parameters of differential ring oscillator using Taguchi DoE and Pareto ANOVA techniques for fast-setting PLL frequency synthesizer 基于田口DoE和Pareto方差分析的快速整定锁相环频率合成器差动环振荡器性能参数优化
IF 1.4 4区 工程技术 Q4 COMPUTER SCIENCE, HARDWARE & ARCHITECTURE Pub Date : 2025-07-19 DOI: 10.1007/s10470-025-02468-z
Archana Singhal, Jyoti Sharma, Dheeraj Singh Rajput, Dharmendar Boolchandani, C. Periasamy

This paper presents the optimization of a differential ring oscillator (DRO) with dual control voltage using the Taguchi design of experiments (DoE) method and Pareto ANOVA for statistical performance analysis. A 3-stage DRO is designed, focusing on three key MOSFET width parameters (Win, Wc1, Wc2), identified as critical to circuit behavior. Taguchi and ANOVA, performed using Minitab, determine the significance and optimal values of these parameters. Circuit simulations using SCL 180 nm CMOS technology and Cadence Virtuoso confirm the analytical predictions. The optimized DRO achieves a wide tuning range of 95.22% (0.5–10.44 GHz), low phase noise of–108.65 dBc/Hz at 1 MHz offset, and power consumption of 5.74 mW. A PLL frequency synthesizer is designed using this DRO, achieving a fast lock time of 0.4 (mu)s, low jitter (5 ps), minimal reference spur, compact area (0.027 (text {mm}^{2})), and total power consumption of 9.45 mW at 1.8 V power supply. A new figure-of-merit (FoM) is also proposed. The synthesizer is suitable for applications in 5G, radar, satellite communications, MRI, GNSS, automotive systems, defense, and wireless power transfer.

采用田口实验设计(DoE)方法和Pareto方差分析对双控制电压差动环振荡器(DRO)进行了优化设计。设计了一个3级DRO,重点关注三个关键的MOSFET宽度参数(Win, Wc1, Wc2),这些参数被确定为电路行为的关键。使用Minitab进行田口分析和方差分析,确定这些参数的显著性和最优值。利用SCL 180nm CMOS技术和Cadence Virtuoso进行的电路仿真证实了分析预测。优化后的DRO实现了95.22的宽调谐范围% (0.5–10.44 GHz), low phase noise of–108.65 dBc/Hz at 1 MHz offset, and power consumption of 5.74 mW. A PLL frequency synthesizer is designed using this DRO, achieving a fast lock time of 0.4 (mu)s, low jitter (5 ps), minimal reference spur, compact area (0.027 (text {mm}^{2})), and total power consumption of 9.45 mW at 1.8 V power supply. A new figure-of-merit (FoM) is also proposed. The synthesizer is suitable for applications in 5G, radar, satellite communications, MRI, GNSS, automotive systems, defense, and wireless power transfer.
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引用次数: 0
Implementation and analysis of axon hillock neuron circuits using 28 nm FD-SOI MOSFET: original design and modifications 利用28nm FD-SOI MOSFET实现和分析轴突丘神经元电路:原始设计和修改
IF 1.4 4区 工程技术 Q4 COMPUTER SCIENCE, HARDWARE & ARCHITECTURE Pub Date : 2025-07-19 DOI: 10.1007/s10470-025-02464-3
Sasi Kiran Suddarsi, Sandeep Moparthi, Gopikant Kumar, Harika Ganta, Saranya Sri Peddapudi, Harshitha Goru, Gopi Krishna Saramekala

Neuromorphic engineering has garnered significant interest for its potential in creating energy-efficient and highly parallel computing systems. One of the key components of such systems is the neuron circuit, especially Axon Hillock, which plays a vital role in signal integration and propagation. This paper explores the design of Axon Hillock (A-H) neuron circuits using a 28 nm Fully Depleted Silicon on Insulator (FD-SOI) MOSFET due to its advantages over Bulk CMOS. The original A-H neuron circuit undergoes two distinct modifications. In the first modification, original differential amplifier’s functionality is replaced with the inherent inverter threshold voltage, resulting in a reduced transistor count, lower power consumption of 26.3 µW, and an improved frequency of 9.18 kHz. The second modification involves replacing the differential amplifier with a low-threshold 2-transistor (2-T) based differential circuit, achieving a nearly 50% reduction in power consumption (16.8 µW) and a 1 kHz frequency boost (9.78 kHz) compared to the original A-H neuron circuit. Further, the third modified circuit eliminates the differential amplifier, membrane capacitance (Cmem), and other control transistors, transforming it into a low-power variant. This circuit has a power consumption of 6.9 pW and an increased frequency of 63.34 kHz, nearly 18-fold increase compared to the original A-H neuron circuit.

神经形态工程因其在创造高能效和高度并行计算系统方面的潜力而引起了极大的兴趣。神经元回路,特别是轴突丘是神经系统的关键组成部分之一,它在信号的整合和传播中起着至关重要的作用。由于其优于Bulk CMOS的优点,本文探讨了使用28 nm完全耗尽绝缘体上硅(FD-SOI) MOSFET设计轴突山丘(a - h)神经元电路。原始的A-H神经元回路经历了两种不同的修改。在第一次修改中,原始差分放大器的功能被固有的逆变器阈值电压所取代,从而减少了晶体管数量,降低了26.3µW的功耗,并提高了9.18 kHz的频率。第二种改进包括用低阈值2晶体管(2-T)差分电路取代差分放大器,与原始的a - h神经元电路相比,功耗降低近50%(16.8µW),频率提升1 kHz (9.78 kHz)。此外,第三种改进电路消除了差分放大器,膜电容(Cmem)和其他控制晶体管,将其转变为低功耗变体。该电路的功耗为6.9 pW,频率提高了63.34 kHz,比原来的a - h神经元电路提高了近18倍。
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引用次数: 0
Validation and verification of low power and area efficient fault model methods using 16nm technology 采用16nm技术的低功耗和面积高效故障模型方法的验证和验证
IF 1.4 4区 工程技术 Q4 COMPUTER SCIENCE, HARDWARE & ARCHITECTURE Pub Date : 2025-07-15 DOI: 10.1007/s10470-025-02424-x
Nagapuri Sahithi, Jyothi Lavudya, E. Krishnahari

With the advancement of Very Large-Scale Integration (VLSI), the integration of a high number of transistors on a single chip has significantly improved performance but also increased vulnerability to faults. To address this, we propose and validate fault-tolerant, low-power, and area-efficient circuit designs using 16nm CMOS technology. In this study, a comprehensive fault modeling approach is developed and demonstrated through two representative digital circuits-a full adder and a multiplexer. These circuits are used as case studies to evaluate the proposed fault models under both transient and permanent fault scenarios, including “stuck-at” fault conditions. Two self-repairing multiplexer architectures are introduced: one utilizing additional circuitry to correct faults, and another enabling internal gate-level self-repair. Both designs can detect and recover from single and multiple faults effectively. Furthermore, the full adder architecture incorporates error recovery mechanisms, enhancing system reliability. The proposed designs are simulated and validated using Tanner EDA at 16nm technology node, confirming their efficiency in terms of power, area, and fault tolerance.

随着超大规模集成电路(VLSI)的发展,在单个芯片上集成大量晶体管大大提高了性能,但也增加了故障的脆弱性。为了解决这个问题,我们提出并验证了采用16nm CMOS技术的容错、低功耗和面积效率电路设计。在这项研究中,开发了一种全面的故障建模方法,并通过两个代表性的数字电路-全加法器和多路复用器进行了演示。这些电路被用作案例研究,以评估在瞬态和永久故障场景下提出的故障模型,包括“卡在”故障条件下。介绍了两种自修复多路复用器结构:一种是利用附加电路来纠正故障,另一种是实现内部门级自修复。两种设计都能有效地检测和恢复单故障和多故障。此外,全加法器架构还包含了错误恢复机制,提高了系统的可靠性。采用Tanner EDA在16nm技术节点上对所提出的设计进行了仿真和验证,验证了其在功耗、面积和容错性方面的效率。
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Analog Integrated Circuits and Signal Processing
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