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Two-process model of PSEE from scratched metals 刮伤金属PSEE的两过程模型
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90068-6
Hidemi Shigekawa, Shin-ichi Hyodo

When photoillumination is interrupted, the exoelectron emission from scratched metal samples decays quickly. When the illumination is resumed, however, the recovered exoelectron emission shoots up to a value significantly higher than before and then decreases gradually - a fact overlooked by previous researchers. To explain this “storage effect” in PSEE (photo- stimulated exoelectron emission), the authors have proposed a model, according to which there are two excitation processes competing during PSEE; one is the photoexcitation of the electrons at energy levels within the band gap of surface oxide layers, and the other is the tunneling transition of electrons in bulk metals to occupy the vacant levels of the oxide layers. From the rate equations based on this model and also from the PSEE data obtained for scratched aluminum and zinc, three kinds of quantities, i.e., the number of exo-active sites, the emission rate from the sites and the rate of activating exo-inactive sites, are successfully estimated. Other PSEE phenomena such as the peculiar emission intensity versus time profiles can also be elucidated in view of this model.

当光照射中断时,划痕金属样品的外电子发射迅速衰减。然而,当恢复照明时,恢复的外电子发射会急剧上升到一个明显高于之前的值,然后逐渐下降,这是以前的研究人员忽略的一个事实。为了解释PSEE(光激发外电子发射)中的这种“存储效应”,作者提出了一个模型,根据该模型,PSEE过程中存在两个相互竞争的激发过程;一种是表面氧化层带隙内能级电子的光激发,另一种是大块金属中电子的隧穿跃迁,以占据氧化层的空能级。根据基于该模型的速率方程和获得的划痕铝和锌的PSEE数据,成功地估计了三种数量,即外活性位点的数量、位点的发射率和外活性位点的激活率。其他PSEE现象,如特殊的发射强度随时间分布,也可以根据该模型来解释。
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引用次数: 0
Improvement in the adhesion of thin films to semiconductors and oxides using electron and photon irradiation 利用电子和光子辐照改善薄膜对半导体和氧化物的附着力
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90238-7
J. Gazecki, G.A. Sai-Halasz , R.G. Elliman , A. Kellock, G.L. Nyberg, J.S. Williams

The adhesion enhancement of evaporated metal films on silicon and silicon dioxide substrates following electron and photon irradiation has been investigated. It is shown that an electric field applied across the metal-oxide-semiconductor interface during electron irradiation has a dramatic influence on adhesion enhancement. For photon irradiation, comparative adhesion measurements were undertaken as a function of increasing metal film thickness and different irradiation doses, for photon energies <4, <6 and 10.2 eV. Metal-oxide-semiconductor structures were also biased during photon irradiation to indicate the role of secondary processes such as charge flow to the interface from the oxide. Results indicate that adhesion enhancement can be significant even if the metal film thickness exceeds the photon penetration depth, supporting the view that low-energy secondary excitations are responsible for the stronger bonding configurations. It was also concluded that both electron and photon irradiation give rise not only to increased adhesion but also to increased cohesion within the metal film.

研究了电子和光子辐照对蒸发金属薄膜在硅和二氧化硅衬底上的附着力增强的影响。结果表明,在电子辐照过程中,施加在金属-氧化物-半导体界面上的电场对金属-氧化物-半导体的粘附增强有显著的影响。对于光子辐照,在光子能量为4、6和10.2 eV时,作为增加金属膜厚度和不同辐照剂量的函数,进行了比较粘附测量。在光子辐照过程中,金属-氧化物-半导体结构也有偏倚,以表明二次过程的作用,如从氧化物流向界面的电荷流。结果表明,即使金属膜厚度超过光子穿透深度,附着力也会显著增强,这支持了低能二次激发导致更强的键构型的观点。电子和光子辐照不仅增加了金属膜的附着力,而且增加了金属膜内的内聚力。
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引用次数: 18
Fe/MgO(001) model catalysts: Electron microscopic and spectroscopic studies Fe/MgO(001)模型催化剂:电子显微镜和光谱研究
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90195-3
R.A. Hubert, J.M. Gilles

An ultrathin iron film deposited on a MgO single crystal in UHV is heated up to 500°C. AES/LEED measurements combined with TEM observations performed on small single crystal platelets show that the film is transformed into small particles below 300°C. Around 380°C, surface diffusion induces a spectacular growth of some particles. Upon further heating, the evolution of the system depends on the shape of the particles. In most cases, the particles become square and orient themselves along the MgO(110) direction (epitaxial configuration); however, they are unstable: they progressively dissolve in the MgO matrix, leading to a substitutional (MgxFe1−x)O solid solution. In other cases, the iron particles remain shapeless and stable, suggesting that dissolution only occurs when the particles grow epitaxially.

在超高压条件下,将超薄铁膜沉积在氧化镁单晶上,加热至500℃。AES/LEED测量结合对小单晶片的TEM观察表明,薄膜在300°C以下转变为小颗粒。在380°C左右,表面扩散引起一些粒子的显著生长。进一步加热后,系统的演化取决于粒子的形状。在大多数情况下,粒子变成方形并沿着MgO(110)方向定向(外延结构);然而,它们是不稳定的:它们逐渐溶解在MgO基体中,导致取代的(MgxFe1−x)O固溶体。在其他情况下,铁颗粒保持不变和稳定,这表明只有当颗粒外延生长时才会发生溶解。
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引用次数: 9
The role of hydrogen and boron in a-SiH : B—Electronic and optical properties 氢和硼在a-SiH: b中电子和光学性质的作用
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90224-7
N. Savvides

Measurements of electrical conductivity and optical constants of thin films of a-SiH : B produced with varying hydrogen concentration (CH = 0–30 at%) and boron concentration (CB = 0.1–10 at%) are used to investigate the effects of increasing hydrogenation and doping on the density of states (DOS) of the a-Si network. There exist strong and abnormal dependences of electronic properties on CH and CB which correlate with increasing topological disorder of the a-Si network. For undoped films, concentrations of hydrogen up to 15 at% lead to a general decrease in the density of defect and band-tail states, a redistribution of valence band states, and a widening of the optical gap. A hydrogen content > 15 at% leads to increasing density of localized dangling-bond type states and deep-lying valence band states suggesting substantial topological disorder.

采用不同氢浓度(CH = 0-30 at%)和硼浓度(CB = 0.1-10 at%)制备的a-SiH: B薄膜的电导率和光学常数,研究了加氢和掺杂对a-Si网络态密度(DOS)的影响。电子性质对CH和CB存在强烈的异常依赖,这与a-Si网络拓扑无序度的增加有关。对于未掺杂的薄膜,高达15% at%的氢浓度会导致缺陷态和带尾态密度的普遍降低,价带态的重新分布,以及光学间隙的扩大。氢含量>15 at%导致局域悬垂键型态和深层价带态密度增加,表明存在大量的拓扑无序。
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引用次数: 2
Characteristics of moisture-sensitive Ta2O5/TiO2 ceramic films 水敏Ta2O5/TiO2陶瓷膜的特性
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90216-8
Tatsuo Yamamoto, Hiromi Shimizu

This paper reports on the degradation characteristics of moisture-sensitive Ta2O5/TiO2 ceramic films, whose electrical capacitances change with relative humidity. The fabrication process and the capacitance characteristics of the tested samples are described. The durability tests against the temperature and humidity cycle and against 10 ppm CO or SO2 gas in the atmosphere have been carried out. In order to examine the interaction between water molecules and toxic gases on the ceramic surface, the electrical capacitance and resistance changes are investigated using the samples placed in a vacuum containing traces of CO or SO2 gas to which pure water is subsequently added. Finally, possible physicochemical effects on the electrical characteristics of the ceramic films are proposed.

研究了电容随相对湿度变化的湿敏Ta2O5/TiO2陶瓷膜的降解特性。介绍了样品的制备工艺和电容特性。对温度和湿度循环以及大气中10ppm CO或SO2气体进行了耐久性测试。为了研究水分子与陶瓷表面有毒气体之间的相互作用,将样品放置在含有微量CO或SO2气体的真空中,随后加入纯水,研究了电容和电阻的变化。最后,提出了可能对陶瓷薄膜电学特性产生影响的物理化学因素。
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引用次数: 0
Comparison of properties of thin films of CuInSe2 and its alloys produced by evaporation, RF-sputtering and chemical spray pyrolysis 蒸发、射频溅射和化学喷雾热解制备CuInSe2薄膜及其合金的性能比较
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90197-7
J.J. Loferski, C. Case, M. Kwietniak , P.M. Sarro , L. Castaner , R. Beaulieu

This paper summarizes a six-year research program aimed at preparation and characterization of thin films of the chalcopyrite semiconductor CuInSe2 suitable for photovoltaic solar cells and other semiconductors devices. The thin film deposition methods used were evaporation, flash evaporation, RF-sputtering and chemical spray pyrolysis. Problems with producing films of reproducible properties by these methods are discussed. Gaps in our knowledge of the dependence of the opto-electronic properties of CuInSe2 crystals and films on structural defects and other imperfections are pointed out.

本文总结了一项为期六年的研究计划,旨在制备和表征适用于光伏太阳能电池和其他半导体器件的黄铜矿半导体CuInSe2薄膜。薄膜沉积方法有蒸发法、闪蒸法、射频溅射法和化学喷雾热解法。讨论了用这些方法制备可重复性薄膜的问题。指出了我们对CuInSe2晶体和薄膜的光电性质与结构缺陷和其他缺陷的依赖关系的认识上的空白。
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引用次数: 8
Determination of tunneling transmission probability through thin oxide layer in a tunnel MIS system 隧道MIS系统中薄氧化层隧穿传输概率的测定
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90235-1
A.G. Nassibian, A.K. Duong

A new method is developed to determine the tunneling transmission probability through a thin oxide layer by making use of the switching characteristic of a metal-tunnel oxide-semiconductor thyristor. It is found that the tunneling transmission probability is very sensitive to oxide thickness and is dependent on the voltage drop across the oxide layer.

利用金属-隧道氧化物-半导体晶闸管的开关特性,提出了一种确定薄氧化层隧穿传输概率的新方法。发现隧道传输概率对氧化层厚度非常敏感,并且依赖于氧化层上的电压降。
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引用次数: 2
Charge state fractions of sputtered Ni 溅射镍的电荷态分数
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90045-5
H.-J. Barth, E. Mühling, W. Eckstein

Energy distributions of sputtered Ni ions and neutrals were measured at non-normal incidence of Ne and Ar ions. Only the Ni particles sputtered in a binary collision can be used for the determination of the charge state fractions. Monte Carlo simulations (TRIM SP) were used for the absolute calibration of the total intensity in the binary recoil peak. The charged fractions are found to be less than 10% for energies below 5 keV. The positive fraction is about one order of magnitude larger than the negative and the doubly charged fractions.

在非正态入射下,测量了溅射Ni离子和中性离子的能量分布。只有在二元碰撞中溅射的Ni粒子才能用于电荷态分数的测定。采用蒙特卡罗模拟(TRIM SP)对双后坐力峰的总强度进行了绝对标定。发现能量低于5kev的带电分数小于10%。正电荷部分大约比负电荷部分和双电荷部分大一个数量级。
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引用次数: 1
Off-specular and out-of-plane vibrational electron energy loss spectra of benzene and pyridine adsorbed on Pt(110) 苯和吡啶在Pt(110)上吸附的非镜面和面外振动电子能量损失谱
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90071-6
G.L. Nyberg, S.R. Bare, P. Hofmann, D.A. King, M. Surman

The VEEL spectra of benzene, deuterobenzene, and pyridine adsorbed on Pt(110) at room temperature have been examined in emission planes both coincident with and orthogonal to the plane of incidence. The inelastic peak intensities are found to be almost independent of angle in both directions. This implies that neither of the established mechanisms, nor others presently examined, is an adequate description of the scattering. It also leads to a reassignment of the benzene spectrum.

本文研究了室温下吸附在Pt(110)上的苯、对苯和吡啶在与入射面重合和正交的发射平面上的VEEL光谱。发现非弹性峰值强度在两个方向上几乎与角度无关。这意味着,无论是已建立的机制,还是目前研究的其他机制,都不能充分描述散射。它还会导致苯的光谱重新分配。
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引用次数: 1
Effect of hydrogen pressure on the deposition of amorphous silicon films by tetrode RF sputtering 氢压力对四极射频溅射沉积非晶硅薄膜的影响
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90222-3
Yasuo Gekka, Hiroshi Asai, Tsuyoshi Temma, Yoh-ichi Yasumura

Hydrogenated amorphous silicon (a-Si:H) films were deposited on the surface of quartz substrates using the tetrode RF sputtering technique. The conditions for film deposition were controlled by changing the pressure ratio of hydrogen to argon gas, ξ, in the atmospheric gas. We studied the dependence of the optical and electrical properties of deposited films on ξ, and discuss the complex changes of optical absorption coefficient, α, and electrical conductivity, σ, at ξ ≧ 20% in terms of the silicon-hydrogen configuration from the results of infra-red absorption and SEM measurements.

采用四极射频溅射技术在石英衬底表面制备了氢化非晶硅(a-Si:H)薄膜。通过改变大气中氢气与氩气的压力比ξ来控制薄膜沉积的条件。我们研究了沉积薄膜的光电性能与ξ值的关系,并从红外吸收和扫描电镜的测量结果讨论了在ξ≧20%时硅氢结构的光学吸收系数α和电导率σ的复杂变化。
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引用次数: 3
期刊
Applications of Surface Science
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