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Some strategies for quantitative scanning Auger electron microscopy 定量扫描俄歇电子显微镜的一些策略
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90046-7
R. Browning , D.C. Peacock, M. Prutton

The general applicability of power law forms of the background in electron spectra is pointed out and exploited for background removal from under Auger peaks. This form of B(E) is found to be extremely sensitive to instrumental alignment and to fault-free construction - an observation which can be used to set up analyser configurations in an accurate way. Also, differences between N(E) and B(E) can be used to derive a spectrometer transmission function T(E). The questions of information density in an energy-analysing spatially-resolving instrument are addressed after reliable instrumental characterization has been established. Strategies involving ratio histograms, showing the population distribution of the ratio of a pair of Auger peak heights, composition scatter diagrams and windowed imaging are discussed and illustrated.

指出了电子能谱中背景幂律形式的一般适用性,并利用幂律形式从俄歇峰下去除背景。这种形式的B(E)被发现对仪器校准和无故障结构极其敏感-这种观察可以用来精确地设置分析仪配置。此外,N(E)和B(E)之间的差异可以用来推导光谱仪透射函数T(E)。在建立了可靠的仪器表征后,解决了能量分析空间分辨仪器中的信息密度问题。讨论并说明了包括比值直方图、成分散点图和窗口成像在内的策略。比值直方图显示了一对俄歇峰高比值的总体分布。
{"title":"Some strategies for quantitative scanning Auger electron microscopy","authors":"R. Browning ,&nbsp;D.C. Peacock,&nbsp;M. Prutton","doi":"10.1016/0378-5963(85)90046-7","DOIUrl":"10.1016/0378-5963(85)90046-7","url":null,"abstract":"<div><p>The general applicability of power law forms of the background in electron spectra is pointed out and exploited for background removal from under Auger peaks. This form of <em>B(E)</em> is found to be extremely sensitive to instrumental alignment and to fault-free construction - an observation which can be used to set up analyser configurations in an accurate way. Also, differences between <em>N(E)</em> and <em>B(E)</em> can be used to derive a spectrometer transmission function <em>T(E)</em>. The questions of information density in an energy-analysing spatially-resolving instrument are addressed after reliable instrumental characterization has been established. Strategies involving ratio histograms, showing the population distribution of the ratio of a pair of Auger peak heights, composition scatter diagrams and windowed imaging are discussed and illustrated.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 145-159"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90046-7","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86184787","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Amorphous silicon solar cells produced by a DC magnetron glow discharge technique 用直流磁控管辉光放电技术制备非晶硅太阳能电池
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90221-1
D.R. McKenzie , G.B. Smith

The production of amorphous silicon solar cells using deposition from a DC magnetron glow discharge is described. The cells have the p-i-n structure with indium tin oxide front contacts. Fill factors of 40% and overall solar efficiencies of around 1.2% were obtained. Investigations were carried out to determine the reasons for deficiencies in the carrier collection efficiency. The cell efficiency was increased by increasing the μτ product of the i-layer. The spectral dependences of carrier collection efficiency, open circuit voltage and fill factors were determined. Comparison with published theoretical models of similar cells showed that for the best cells, surface recombination effects limited the efficiency. Argon used in the p-layer deposition was the most likely cause of these effects.

介绍了用直流磁控管辉光放电沉积法生产非晶硅太阳能电池的方法。电池具有具有氧化铟锡前触点的p-i-n结构。填充系数为40%,整体太阳能效率约为1.2%。进行了调查,以确定载体收集效率不足的原因。通过增加i层的μτ积,提高了电池效率。确定了载流子收集效率、开路电压和填充因子与光谱的关系。与已发表的类似电池的理论模型比较表明,对于最好的电池,表面重组效应限制了效率。p层沉积中使用的氩最有可能是造成这些影响的原因。
{"title":"Amorphous silicon solar cells produced by a DC magnetron glow discharge technique","authors":"D.R. McKenzie ,&nbsp;G.B. Smith","doi":"10.1016/0378-5963(85)90221-1","DOIUrl":"10.1016/0378-5963(85)90221-1","url":null,"abstract":"<div><p>The production of amorphous silicon solar cells using deposition from a DC magnetron glow discharge is described. The cells have the p-i-n structure with indium tin oxide front contacts. Fill factors of 40% and overall solar efficiencies of around 1.2% were obtained. Investigations were carried out to determine the reasons for deficiencies in the carrier collection efficiency. The cell efficiency was increased by increasing the μτ product of the i-layer. The spectral dependences of carrier collection efficiency, open circuit voltage and fill factors were determined. Comparison with published theoretical models of similar cells showed that for the best cells, surface recombination effects limited the efficiency. Argon used in the p-layer deposition was the most likely cause of these effects.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 891-898"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90221-1","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"80176197","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Anisotropic etching during negative ion resputtering 负离子溅射过程中的各向异性蚀刻
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90042-X
Russell Messier, Daniel J. Kester

Negative ion resputtering leads to a nonuniform erosion of material which can result in a wide range of morphological features. These various surface structures are a consequence of focused bombardment processes which are highly sensitive to sputtering system geometry and preparation parameters. The continuous manner in which the features are connected leads to a clearer understanding of each.

负离子溅射导致材料的不均匀侵蚀,这可能导致广泛的形态特征。这些不同的表面结构是聚焦轰击过程的结果,这对溅射系统的几何形状和制备参数高度敏感。特征连接的连续方式可以更清楚地理解每个特征。
{"title":"Anisotropic etching during negative ion resputtering","authors":"Russell Messier,&nbsp;Daniel J. Kester","doi":"10.1016/0378-5963(85)90042-X","DOIUrl":"10.1016/0378-5963(85)90042-X","url":null,"abstract":"<div><p>Negative ion resputtering leads to a nonuniform erosion of material which can result in a wide range of morphological features. These various surface structures are a consequence of focused bombardment processes which are highly sensitive to sputtering system geometry and preparation parameters. The continuous manner in which the features are connected leads to a clearer understanding of each.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 111-117"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90042-X","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"85116260","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Surface compositions of the two phases of differently prepared Ni-Cr-Al and Ni-Cr-Al-Zr samples 不同制备的Ni-Cr-Al和Ni-Cr-Al- zr样品的两相表面组成
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90050-9
M.M. El Gomati, M. Prutton, R.H. Roberts

The surface compositions of the α/β and γ/γ' phases of different metallographic preparations of Ni-15Cr-24Al and Ni-15Cr-24Al-0.3Zr (at%) alloys are presented. Surfaces investigated include a mechanically polished surface for both alloys, a mechanically polished acid etched surface of the Ni-Cr-Al-Zr both before heating and after heating to 600°C for several hours, and the underlying surface of this latter sample exposed by ball cratering. Both phases of all surfaces considered show depletion of Al. It is concluded that the Al depletion is not an artefact of the sample metallographic preparation or the analytical procedure. This is supported by analysis of the composition of a sample scratched in situ under UHV. It is further concluded that the Al depletion is due to oxidation during bakeout. Cr-rich features in both the α/β and γ/γ' phases are reported. An optimal two dimensionally smoothed Cr Auger image is presented showing these features which are considered to be due to the αCr solid solution particles or clustering of these particles in the α/β phase and the Ni solid solution component in the γ/γ' phase.

研究了Ni-15Cr-24Al和Ni-15Cr-24Al-0.3 zr (at%)合金不同金相制备过程中α/β和γ/γ′相的表面组成。所研究的表面包括两种合金的机械抛光表面,Ni-Cr-Al-Zr在加热前和加热至600°C数小时后的机械抛光酸蚀表面,以及后一种样品的下表面。所考虑的所有表面的两相都显示出铝的损耗。由此得出结论,铝的损耗不是样品金相制备或分析过程的人工产物。这是由在特高压下原位划伤的样品的成分分析支持的。进一步得出铝的损耗是由于焙烧过程中的氧化所致。α/β相和γ/γ′相均具有富cr特征。二维光滑Cr俄格图像显示了这些特征,这些特征被认为是由于αCr固溶体颗粒或这些颗粒在α/β相中聚集而Ni固溶体成分在γ/γ′相中。
{"title":"Surface compositions of the two phases of differently prepared Ni-Cr-Al and Ni-Cr-Al-Zr samples","authors":"M.M. El Gomati,&nbsp;M. Prutton,&nbsp;R.H. Roberts","doi":"10.1016/0378-5963(85)90050-9","DOIUrl":"10.1016/0378-5963(85)90050-9","url":null,"abstract":"<div><p>The surface compositions of the α/β and γ/γ' phases of different metallographic preparations of Ni-15Cr-24Al and Ni-15Cr-24Al-0.3Zr (at%) alloys are presented. Surfaces investigated include a mechanically polished surface for both alloys, a mechanically polished acid etched surface of the Ni-Cr-Al-Zr both before heating and after heating to 600°C for several hours, and the underlying surface of this latter sample exposed by ball cratering. Both phases of all surfaces considered show depletion of Al. It is concluded that the Al depletion is not an artefact of the sample metallographic preparation or the analytical procedure. This is supported by analysis of the composition of a sample scratched in situ under UHV. It is further concluded that the Al depletion is due to oxidation during bakeout. Cr-rich features in both the α/β and γ/γ' phases are reported. An optimal two dimensionally smoothed Cr Auger image is presented showing these features which are considered to be due to the αCr solid solution particles or clustering of these particles in the α/β phase and the Ni solid solution component in the γ/γ' phase.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 184-192"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90050-9","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86819138","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
SEM alloyed AuGeNi ohmic contacts to GaAs SEM alloyedGe在既ohmic接触GaAs摄氏度
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90236-3
A.G. Nassibian, T.S. Kalkur

A scanned electron beam from a commercial SEM is used for the localized alloying of vacuum evaporated AuGeNi contacts on n-type GaAs. The contact quality is studied for metallization thickness, 450–1350 Å, for furnace and electron beam alloyed contacts. For the electron beam alloyed method, the contact resistivity decreases with increasing metallization thickness and remains constant for thicknesses above 750 Å. Scanning electron microscopy and electron microprobe analysis shows that electron beam alloyed contacts undergo less redistribution of contact constituents than furnace alloyed contacts. The stability of the contacts is determined by high temperature ageing.

用商用扫描电镜扫描电子束对n型砷化镓上真空蒸发AuGeNi触点进行局部合金化。研究了在金属化厚度450 ~ 1350 Å范围内,电炉和电子束合金触点的接触质量。对于电子束合金化方法,接触电阻率随金属化厚度的增加而减小,当金属化厚度大于750时保持恒定Å。扫描电镜和电子探针分析表明,电子束合金触点比炉合金触点发生较少的触点成分重分布。触点的稳定性由高温老化决定。
{"title":"SEM alloyed AuGeNi ohmic contacts to GaAs","authors":"A.G. Nassibian,&nbsp;T.S. Kalkur","doi":"10.1016/0378-5963(85)90236-3","DOIUrl":"10.1016/0378-5963(85)90236-3","url":null,"abstract":"<div><p>A scanned electron beam from a commercial SEM is used for the localized alloying of vacuum evaporated AuGeNi contacts on n-type GaAs. The contact quality is studied for metallization thickness, 450–1350 Å, for furnace and electron beam alloyed contacts. For the electron beam alloyed method, the contact resistivity decreases with increasing metallization thickness and remains constant for thicknesses above 750 Å. Scanning electron microscopy and electron microprobe analysis shows that electron beam alloyed contacts undergo less redistribution of contact constituents than furnace alloyed contacts. The stability of the contacts is determined by high temperature ageing.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 1019-1026"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90236-3","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86859240","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Some properties of Si(111) and Ge(111) cleaved surfaces at low temperatures 低温下Si(111)和Ge(111)切割表面的一些性质
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90032-7
V.A. Grazhulis, V.F. Kuleshov

Low-temperature experimental results on Ge(111) and Si(111) surfaces prepared by crystal cleavage in ultra-high vacuum (∼ 10-10 Torr), liquid N2, and liquid He are presented and briefly discussed. Some of these results are reanalyzed and new interpretations are suggested.

介绍了在超高真空(~ 10-10 Torr)、液态N2和液态He条件下晶体解理制备Ge(111)和Si(111)表面的低温实验结果,并进行了简要讨论。对其中的一些结果进行了重新分析,并提出了新的解释。
{"title":"Some properties of Si(111) and Ge(111) cleaved surfaces at low temperatures","authors":"V.A. Grazhulis,&nbsp;V.F. Kuleshov","doi":"10.1016/0378-5963(85)90032-7","DOIUrl":"10.1016/0378-5963(85)90032-7","url":null,"abstract":"<div><p>Low-temperature experimental results on Ge(111) and Si(111) surfaces prepared by crystal cleavage in ultra-high vacuum (∼ 10<sup>-10</sup> Torr), liquid N<sub>2</sub>, and liquid He are presented and briefly discussed. Some of these results are reanalyzed and new interpretations are suggested.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 14-24"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90032-7","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"90942605","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
The contribution of kinetic nucleation theories to studies of Volmer-Weber thin film growth 动力学成核理论对Volmer-Weber薄膜生长研究的贡献
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90182-5
B.F. Usher

Extensive study of the vapour deposition of noble metals onto UHV cleaved alkali halide crystal surfaces has made an important contribution to the development of time-dependent nucleation theory. There nevertheless remain significant inconsistencies between results obtained from different studies of identical systems. The role which the time-dependent kinetic approach to nucleation theory has played in the past and that which it might take in the future are discussed.

贵重金属在特高压劈裂碱卤化物晶体表面气相沉积的广泛研究,对时变成核理论的发展作出了重要贡献。然而,从相同系统的不同研究中获得的结果之间仍然存在显著的不一致。讨论了随时间变化的动力学方法在成核理论中过去所起的作用和将来可能发挥的作用。
{"title":"The contribution of kinetic nucleation theories to studies of Volmer-Weber thin film growth","authors":"B.F. Usher","doi":"10.1016/0378-5963(85)90182-5","DOIUrl":"10.1016/0378-5963(85)90182-5","url":null,"abstract":"<div><p>Extensive study of the vapour deposition of noble metals onto UHV cleaved alkali halide crystal surfaces has made an important contribution to the development of time-dependent nucleation theory. There nevertheless remain significant inconsistencies between results obtained from different studies of identical systems. The role which the time-dependent kinetic approach to nucleation theory has played in the past and that which it might take in the future are discussed.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 506-511"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90182-5","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"90953095","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 11
Further studies on the semiconductivity and pyroelectricity of poled and Cd-doped mercury telluride thin films for electronics and engineering 电子和工程用掺杂镉和极化碲化汞薄膜的半导体性和热电性的进一步研究
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90209-0
A. Tawfik, M.M.Abou Sekkina, M.I.Abd El-Ati

The crystalline structure, electrical conductivity, and pyroelectricity of freshly prepared Hg0.7Cd0.30Te thin films have been investigated in detail. It was found that these properties hold good with one another. The roles of Hg migration, non-stoichiometry and degree of crystallinity are clearly indicated. Finally, the optimum conditions were evaluated and recommended for mercury telluride thin films for application in electronic industries and engineering.

研究了新制备的Hg0.7Cd0.30Te薄膜的晶体结构、电导率和热释电性能。人们发现,这些性质彼此保持良好。明确指出了汞迁移、非化学计量学和结晶度的作用。最后,对碲化汞薄膜在电子工业和工程中的应用进行了评价和推荐。
{"title":"Further studies on the semiconductivity and pyroelectricity of poled and Cd-doped mercury telluride thin films for electronics and engineering","authors":"A. Tawfik,&nbsp;M.M.Abou Sekkina,&nbsp;M.I.Abd El-Ati","doi":"10.1016/0378-5963(85)90209-0","DOIUrl":"10.1016/0378-5963(85)90209-0","url":null,"abstract":"<div><p>The crystalline structure, electrical conductivity, and pyroelectricity of freshly prepared Hg<sub>0.7</sub>Cd<sub>0.30</sub>Te thin films have been investigated in detail. It was found that these properties hold good with one another. The roles of Hg migration, non-stoichiometry and degree of crystallinity are clearly indicated. Finally, the optimum conditions were evaluated and recommended for mercury telluride thin films for application in electronic industries and engineering.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 763-771"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90209-0","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"77331567","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
A rigorous diffraction theory for the optical properties of black chrome 黑铬光学性质的严格衍射理论
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90214-4
G.B. Smith, G.H. Derrick, R.C. McPhedran

Quantitative three-dimensional studies of morphology together with analysis of validity of quasistatic effective medium theories show the need for a diffraction treatment of the optical properties of solar selective black chrome. The spectral absorptance A(λ) is calculated for a doubly periodic modulation of chrome overcoated with Cr2O3 or a cermet of Cr2O3 and Cr metal. Various profiles, depths and coating thicknesses are used. Diffraction caused by the surface morphology explains the major features of A(λ) for black chrome. Internal structure is of secondary importance.

三维形貌的定量研究和准静态有效介质理论的有效性分析表明,需要对太阳选择性黑铬的光学性质进行衍射处理。计算了用Cr2O3或Cr2O3 - Cr金属陶瓷包覆铬的双周期调制的光谱吸收系数A(λ)。使用各种型材,深度和涂层厚度。由表面形貌引起的衍射解释了黑铬A(λ)的主要特征。内部结构是次要的。
{"title":"A rigorous diffraction theory for the optical properties of black chrome","authors":"G.B. Smith,&nbsp;G.H. Derrick,&nbsp;R.C. McPhedran","doi":"10.1016/0378-5963(85)90214-4","DOIUrl":"10.1016/0378-5963(85)90214-4","url":null,"abstract":"<div><p>Quantitative three-dimensional studies of morphology together with analysis of validity of quasistatic effective medium theories show the need for a diffraction treatment of the optical properties of solar selective black chrome. The spectral absorptance <em>A</em>(<em>λ</em>) is calculated for a doubly periodic modulation of chrome overcoated with Cr<sub>2</sub>O<sub>3</sub> or a cermet of Cr<sub>2</sub>O<sub>3</sub> and Cr metal. Various profiles, depths and coating thicknesses are used. Diffraction caused by the surface morphology explains the major features of <em>A</em>(<em>λ</em>) for black chrome. Internal structure is of secondary importance.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 813-819"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90214-4","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74856703","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
The growth mode of Cu overlayers on Pd(100) Pd(100)上Cu覆层的生长方式
Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90186-2
H. Asonen, C. Barnes, A. Salokatve, A. Vuoristo

The growth mode of Cu deposits on clean Pd(100) has been studied by means of LEED. AES and angular resolved ultraviolet photoemission spectroscopy. Auger signal versus deposition time curves showed that the growth follows a layer-by-layer mode for two monolayers after which it involves formation of islands as in the Stranski-Krastanov model. Despite the large lattice mismatch between Cu and Pd (7.7%) the substrate p(1×1) LEED pattern persisted with clear distinct spots at least up to the equivalent coverage of 4 ML indicating that Cu starts to grow epitaxially with the Pd lattice constant (pseudomorphic growth). Photoemission results show that the spectrum of the Cu/Pd(100) system does not converge to that of bulk Cu(100) until about 65 ML equivalent coverage. The spectrum below that coverage is composed of separate contributions from the thick regions and from the pseudomorphic basic slab.

利用LEED技术研究了洁净钯(100)表面Cu沉积的生长模式。原子发射光谱和角分辨紫外光谱学。俄歇信号与沉积时间曲线表明,两层单层的生长遵循一层接一层的模式,之后就像斯特兰斯基-克拉斯坦诺夫模型中一样,它涉及到岛屿的形成。尽管Cu和Pd之间存在较大的晶格失配(7.7%),但衬底p(1×1) LEED模式仍然存在清晰的斑点,至少达到4 ML的等效覆盖范围,这表明Cu开始随着Pd晶格常数(伪晶生长)外延生长。光电发射结果表明,Cu/Pd(100)体系的光谱直到65 ML左右的等效覆盖范围才收敛到体Cu(100)的光谱。该覆盖范围以下的频谱由来自厚区和伪晶基板的单独贡献组成。
{"title":"The growth mode of Cu overlayers on Pd(100)","authors":"H. Asonen,&nbsp;C. Barnes,&nbsp;A. Salokatve,&nbsp;A. Vuoristo","doi":"10.1016/0378-5963(85)90186-2","DOIUrl":"10.1016/0378-5963(85)90186-2","url":null,"abstract":"<div><p>The growth mode of Cu deposits on clean Pd(100) has been studied by means of LEED. AES and angular resolved ultraviolet photoemission spectroscopy. Auger signal versus deposition time curves showed that the growth follows a layer-by-layer mode for two monolayers after which it involves formation of islands as in the Stranski-Krastanov model. Despite the large lattice mismatch between Cu and Pd (7.7%) the substrate p(1×1) LEED pattern persisted with clear distinct spots at least up to the equivalent coverage of 4 ML indicating that Cu starts to grow epitaxially with the Pd lattice constant (pseudomorphic growth). Photoemission results show that the spectrum of the Cu/Pd(100) system does not converge to that of bulk Cu(100) until about 65 ML equivalent coverage. The spectrum below that coverage is composed of separate contributions from the thick regions and from the pseudomorphic basic slab.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 556-564"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90186-2","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"83811594","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 16
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Applications of Surface Science
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