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Oxygen vacancy-dependent humidity sensing performance induced by Si doping on SnO2 nanoparticles 二氧化锡纳米颗粒掺杂硅诱导的氧空位湿度传感性能
Pub Date : 2024-05-31 DOI: 10.1016/j.micrna.2024.207890
Yuchuan Ding , Yong Chen , MaoHua Wang

In this work, we investigated the effects of Si doping on the oxygen vacancy defects in SnO2 nanoparticles for detecting changes in humidity levels. XRD measurements showed that all samples exhibit tetragonal rutile phase and the crystallite structure of SnO2 was tuned with Si content increasing. XPS analysis revealed more oxygen vacancies defects (the percentage of OV increases from 11.52 % to 19.02 %) were confirmed to be produced, accelerating chemisorption of water molecules on Si doped SnO2 surface. Additionally, we discussed the various situations involving the utilization of electrons and holes corresponding to the different states of oxygen vacancies via photoluminescence spectroscopy. The humidity sensing results exhibited that the 5 mol% Si doped SnO2 humidity sensor shows high sensitivity, low hysteresis (5.7 %) and fast response/recovery times (7 s/10 s) range from 11 % to 95 % relative humidity. The chemical mechanisms for enhancement in humidity performance induced by oxygen vacancy defects formed on SnO2 surface is proposed.

在这项工作中,我们研究了掺硅对二氧化锡纳米粒子中氧空位缺陷的影响,以检测湿度的变化。XRD 测量结果表明,所有样品都呈现出四方金红石相,二氧化锡的晶粒结构随硅含量的增加而调整。XPS 分析表明,更多的氧空位缺陷(OV 百分比从 11.52% 增加到 19.02%)被证实产生,从而加速了掺硅二氧化锡表面水分子的化学吸附。此外,我们还通过光致发光光谱讨论了不同状态氧空位对应的电子和空穴利用的各种情况。湿度传感结果表明,掺杂了 5 摩尔% Si 的二氧化锡湿度传感器在相对湿度为 11% 至 95% 的范围内表现出高灵敏度、低滞后(5.7%)和快速响应/恢复时间(7 秒/10 秒)。提出了二氧化锡表面形成的氧空位缺陷诱导湿度性能增强的化学机制。
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引用次数: 0
Theoretical insights into size and dielectric confinement: Unraveling real and imaginary parts of the effective complex dielectric function in spherical multilayered quantum dots with oxide interfaces 关于尺寸和介电约束的理论见解:揭示具有氧化物界面的球形多层量子点中有效复介电函数的实部和虚部
Pub Date : 2024-05-28 DOI: 10.1016/j.micrna.2024.207879
K. Hasanirokh , A. Naifar

A quantitative numerical exploration is conducted to scrutinize the combined effects of size and dielectric confinement consequences on the electronic and optical characteristics of spherical multilayered quantum dot CdSe/ZnS/CdSe/ZnS (SMLQD) and its inverted configuration ZnS/CdSe/ZnS/CdSe (ISMLQD) buried into two oxides: HfO2 and SiO2. By employing the effective mass approximation (EMA) and the density matrix approach (DMA), the derived quantized electron energy states and their associated wave functions were obtained by solving the Schrödinger equation in a spherical coordinates. The dipole transition element, both real and imaginary parts of the effective complex dielectric function (ECDF) as well as its linear, nonlinear and total counterparts are brought out for various values of inner core radii, number density of QDs and incident photon intensity. In addition, a specific analysis of electron probability distributions is provided to gain a clearer understanding of the underlying physical factors. Our findings point to a notable influence of these mentionned factors on the computed coefficients. The study unveils that the dielectric mismatch occurring at the system/oxide interfaces plays a crucial role in modifying the electronic structure and a substantial impact on both linear and third-order nonlinear components is witnessed.

本研究采用定量数值方法,仔细研究了埋入两种氧化物中的球形多层量子点 CdSe/ZnSe/CdSe/ZnS(SMLQD)及其倒置构型 ZnS/CdSe/ZnSe/CdSe(ISMLQD)的尺寸和介电约束后果对其电子和光学特性的综合影响:HfO2和SiO2。利用有效质量近似(EMA)和密度矩阵方法(DMA),通过求解球坐标中的薛定谔方程,得到了衍生的量子化电子能态及其相关波函数。根据内核半径、QDs 数量密度和入射光子强度的不同值,得出了偶极过渡元素、有效复介质函数(ECDF)的实部和虚部及其线性、非线性和总对应波函数。此外,我们还对电子概率分布进行了具体分析,以便更清楚地了解潜在的物理因素。我们的研究结果表明,这些被提及的因素对计算系数有显著影响。研究揭示了在系统/氧化物界面发生的介电失配在改变电子结构方面起着至关重要的作用,并对线性和三阶非线性成分产生了重大影响。
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引用次数: 0
Electronic and optical properties of Zr2CO2/WS2 van der Waals heterostructures: First-principles study Zr2CO2/WS2 范德瓦耳斯异质结构的电子和光学特性:第一原理研究
Pub Date : 2024-05-27 DOI: 10.1016/j.micrna.2024.207880
Rui Zhou , Hua Tong , Qingguo Xu , Rui Zhang , Guoqiang Hao

Enhancing the photosensitivity and response speed of transition metal dichalcogenides (TMDs)-based photodetectors through the construction of semiconductor heterostructures poses an ongoing challenge in optoelectronic devices field. In this study, we conducted a systematic investigation using first-principles calculations to explore the characteristics of MXene/TMDs heterostructures, specifically focusing on the Zr2CO2/WS2 heterostructure. Computational analysis verifies that the Zr2CO2/WS2 heterostructure displays a type II band alignment, which facilitates efficient carrier separate transportation within the heterostructure. In both the zigzag and armchair directions, the heterostructure formation enhances the carrier mobilities. Furthermore, modulation of the heterostructure is accomplished by applying external electric fields and axial stress. Notably, the light absorption ability of the Zr2CO2/WS2 heterostructure is more sensitive to external electric fields rather than interlayer distance. Overall, Zr2CO2/WS2 van der Waals heterostructures offer inherent advantages for the development of high-performance photodetectors.

通过构建半导体异质结构来提高基于过渡金属二卤化物(TMDs)的光电探测器的光敏性和响应速度是光电器件领域一直面临的挑战。在本研究中,我们利用第一原理计算进行了系统研究,探索了 MXene/TMDs 异质结构的特性,特别是 Zr2CO2/WS2 异质结构。计算分析证实,Zr2CO2/WS2 异质结构显示出 II 型带排列,这有利于异质结构内载流子的高效分离传输。在 "之 "字形和 "臂 "字形方向上,异质结构的形成增强了载流子迁移率。此外,通过施加外部电场和轴向应力,异质结构还能实现调制。值得注意的是,Zr2CO2/WS2 异质结构的光吸收能力对外部电场比层间距离更敏感。总之,Zr2CO2/WS2 范德瓦尔斯异质结构具有开发高性能光电探测器的固有优势。
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引用次数: 0
Carrier transport layer engineering of Cs2TiI2Br4 halide double perovskite solar cell via SCAPS 1D: Approaching the Shockley-Queisser limit 通过 SCAPS 1D 实现 Cs2TiI2Br4 卤化物双包晶太阳能电池的载流子传输层工程:接近肖克利-奎塞尔极限
Pub Date : 2024-05-27 DOI: 10.1016/j.micrna.2024.207881
Tasnim Tareq Ferdous , Sadia Sultana Urmi , Md Abdul Kaium Khan , Mohammad Abdul Alim

All-inorganic Cs2TiIxBr(6-x)-based perovskite solar cells (PSCs) are recently attracting a lot of attention for their tunable bandgaps, earth abundance, non-toxicity, and ultra-stability. Among the Cs2TiIxBr(6-x) family of materials, Cs2TiI2Br4 with a bandgap of ∼1.38 eV has the potential to be an excellent single junction solar cell material with a theoretically higher Shockley-Queisser limit of power conversion efficiency (PCE). Its excellent optoelectronic properties make it a potential candidate for being the highest-performing PSC from the Cs2TiIxBr(6-x) family. In our study, a total of eight hole transport materials (P3HT, PTAA, Spiro-OMeTAD, PEDOT:Pss, CuSCN, CuI, NiO, and MoO3) and six electron transport materials (PCBM, TiO2, CdS, SnO2, ZnO, and IGZO) were investigated to select suitable charge transport materials. The defect densities of interface and absorber, different absorber layer thicknesses, several metal work functions, series-shunt resistance, and temperature were investigated to derive the conditions for optimum performance. After thorough investigation, we derived four novel devices with the combination of all the organic and inorganic charge transport materials to provide optimum performance. Among them, the combination of inorganic SnO2 and CuSCN as electron and hole transport layer respectively achieved the highest PCE of 23.41 %.

基于铯钛硼的全无机包晶太阳能电池(PSCs)因其可调带隙、地球丰度、无毒性和超稳定性而受到广泛关注。在 CsTiIBr 系列材料中,带隙为∼1.38 eV 的 CsTiIBr 有潜力成为一种优秀的单结太阳能电池材料,理论上具有更高的肖克利-奎塞尔极限功率转换效率(PCE)。其优异的光电特性使其有可能成为铯钛硼家族中性能最高的 PSC。在我们的研究中,共研究了八种空穴传输材料(P3HT、PTAA、Spiro-OMeTAD、PEDOT:Pss、CuSCN、CuI、NiO 和 MoO)和六种电子传输材料(PCBM、TiO、CdS、SnO、ZnO 和 IGZO),以选择合适的电荷传输材料。我们研究了界面和吸收层的缺陷密度、不同的吸收层厚度、几种金属功函数、串并联电阻和温度,从而得出最佳性能的条件。经过深入研究,我们得出了四种新型器件,它们结合了所有有机和无机电荷传输材料,从而实现了最佳性能。其中,无机氧化锡和 CuSCN 分别作为电子和空穴传输层的组合实现了 23.41 % 的最高 PCE。
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引用次数: 0
Novel double deck gate field plate structure on a normally-off AlGaN/GaN HEMT- An extensive analysis 常关断 AlGaN/GaN HEMT 上的新型双层栅场板结构--广泛分析
Pub Date : 2024-05-25 DOI: 10.1016/j.micrna.2024.207874
Pichingla Kharei, Achinta Baidya, Niladri Pratap Maity, Abhijyoti Ghosh, Mrs Zonunmawii

A novel double deck gate field plate structure on a normally-off AlGaN/GaN HEMT is proposed and compared with the conventional no field plate structure. Several passivation materials with relative permittivity (εr) ranging from 3.9 to 22 is taken into consideration to study the breakdown and DC characteristics. The implementation of field plate along with a higher εr material helps in improving breakdown voltage (VBr) as they both decrease the electric field at the gate's drain edge. Aiming device optimization several field plate configurations are studied including tri field plate structure, dual field plate structures and single gate FP structure. Extensive analysis in these structures are done with different lengths of the field plates and distance between source and drain. Distance between source and drain (LSD) is varied from 8.4 to 13.4 μm, source FP lengths (LS_FP) varies from 1 to 7 μm, gate FP lengths (LG_FP) varies from 0.9 to 2.3 μm and drain FP lengths (LD_FP) varies from 0.2 to 4.9 μm. In all scenarios with varying LSD, VBr rises with increasing LSD. For source, gate and drain FP lengths variation, VBr decreases as it gets longer because the electric field becomes very high. As the distance between the FP edge and the drain becomes narrower with increase in FP lengths, the breakdown occurs at lower voltage. At LSD 13.4 μm, this novel double deck gate FP structure with conventional drain field plate structure gives highest VBr of 1660 V and a small Ron of 2.39 Ω mm as compared to other structures. It also outperforms the other three structures in FT (9.84 GHz) at this particular LSD. Analysis of the simulated structures shows that the union of gate-drain field plate boosts the VBr while decreasing the Ron, resulting in improved electrical performance and a wider application range.

本文提出了一种新型的常关断 AlGaN/GaN HEMT 双层栅场板结构,并与传统的无场板结构进行了比较。在研究击穿和直流特性时,考虑了几种相对介电常数(εr)在 3.9 到 22 之间的钝化材料。场板和εr较高的材料有助于提高击穿电压(VBr),因为它们都能降低栅极漏极边缘的电场。为了优化器件,我们研究了几种场板配置,包括三场板结构、双场板结构和单栅极 FP 结构。在这些结构中,对不同长度的场板以及源极和漏极之间的距离进行了广泛的分析。源极和漏极之间的距离(LSD)从 8.4 微米到 13.4 微米不等,源极 FP 长度(LS_FP)从 1 微米到 7 微米不等,栅极 FP 长度(LG_FP)从 0.9 微米到 2.3 微米不等,漏极 FP 长度(LD_FP)从 0.2 微米到 4.9 微米不等。在 LSD 变化的所有方案中,VBr 都随着 LSD 的增加而上升。对于源极、栅极和漏极 FP 长度的变化,由于电场变得非常高,VBr 会随着 FP 长度的增加而降低。随着 FP 长度的增加,FP 边缘和漏极之间的距离变窄,击穿发生在较低的电压下。在 LSD 为 13.4 μm 时,与其他结构相比,这种采用传统漏极板结构的新型双层栅极 FP 结构的 VBr 值最高,达到 1660 V,而 Ron 值仅为 2.39 Ω mm。在此特定 LSD 下,它的 FT(9.84 GHz)也优于其他三种结构。对模拟结构的分析表明,栅漏场板的结合提高了 VBr,同时降低了 Ron,从而改善了电气性能,扩大了应用范围。
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引用次数: 0
Metal inserted doping less dielectrically modulated TFET biomarker for SARs-CoV-2 detection 用于 SARs-CoV-2 检测的金属插入掺杂少介质调制 TFET 生物标记物
Pub Date : 2024-05-25 DOI: 10.1016/j.micrna.2024.207877
Madhulika Verma, Sachin Agrawal

In this paper, a metal strip loaded doping less TFET (MS-DLTFET) biomarker with four cavities is proposed for SARs-CoV-2 detection virus. The results demonstrate that the proposed device offers an improved biomarker performance by introducing the charged plasma concept and the metal strips. The electrical parameters such as electron tunneling rate, drain current (Ids), current ratio (ION/IOFF), threshold voltage (Vth) are evaluated through simulations by immobilized dielectric constant (k) and charge density (ρ) of the bioelements in the nano-gap cavities. In addition, their sensitivity is also calculated with respect to air. The results depict that the proposed device tenders better performance in terms of Ids, ION/IOFF and Vth sensitivity as compared to existing devices. The device's response time under varying k and ρ values are investigated. The non-uniform cavity configurations formed due to steric hindrance effect are studied. It is found that concave configuration offers the best performance compared to other. Furthermore, the cavity size analysis is also performed to optimize the device performance.

本文针对 SARs-CoV-2 检测病毒提出了一种具有四个空腔的金属带负载掺杂少 TFET(MS-DLTFET)生物标记。研究结果表明,通过引入带电等离子体概念和金属带,所提出的器件具有更好的生物标记性能。通过对纳米空腔中生物元素的固定介电常数(k)和电荷密度(ρ)进行模拟,评估了电子隧穿率、漏极电流(Ids)、电流比(ION/IOFF)和阈值电压(Vth)等电气参数。此外,还计算了它们相对于空气的灵敏度。结果表明,与现有装置相比,拟议的装置在 Ids、ION/IOFF 和 Vth 灵敏度方面具有更好的性能。研究了器件在不同 k 和 ρ 值条件下的响应时间。研究了由于立体阻碍效应而形成的非均匀腔配置。结果发现,与其他配置相比,凹形配置具有最佳性能。此外,还对空腔尺寸进行了分析,以优化器件性能。
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引用次数: 0
Effects of the in-plane uniaxial and biaxial strains on the electronic and optical properties of the graphene/β-Si3N4 heterostructure 面内单轴和双轴应变对石墨烯/β-Si3N4 异质结构的电子和光学特性的影响
Pub Date : 2024-05-25 DOI: 10.1016/j.micrna.2024.207878
Hu Lu , Ningning Su , Junqiang Wang , Heng Ti , Shasha Wu , Mengwei Li

van der Waals heterostructures can enable adjustment of graphene's electronic properties, which is important for the application of graphene-based electronic devices. The structural, electronic and optical properties of heterostructures composed of graphene and β-Si3N4 under different strain conditions are studied in this paper using first-principle calculation. The result shows that the heterojunction constituted with β-Si3N4 opens a small bandgap at the Brillouin zone Γ, which is about 0.099 eV, and the bandgap is highly sensitive to the direction and magnitude of strain. Under uniaxial compressive (tensile) strain, the heterojunction bandgap increases linearly, reaching 1.901 eV and 1.614 eV at −11 % and 11 %, respectively; under biaxial strain, the heterojunction bandgap decreases linearly with the compressive strain, decreasing to 0.087 eV at −11 %, and increases linearly with the tensile strain, reaching 0.113 eV at 11 %. And the rate of the bandgap under uniaxial strain is larger than that under biaxial strain, which suggests that the uniaxial strain regulation is more effective. Optical property study shows that uniaxial (biaxial) compressive strain improves the light absorption of the heterojunction in the blue-ultraviolet region band, especially when the uniaxial compressive strain reaches 9 %, the light absorption of the heterojunction increases significantly in the whole spectral interval. These research results will provide a theoretical basis for the practical applications of graphene and β-Si3N4 heterostructures in the fields of pressure sensors and optical modulators.

范德华异质结构可以调整石墨烯的电子特性,这对于石墨烯基电子器件的应用非常重要。本文利用第一性原理计算研究了石墨烯和β-SiN组成的异质结构在不同应变条件下的结构、电子和光学特性。结果表明,由β-SiN构成的异质结在布里渊区Γ处打开了一个很小的带隙,约为0.099 eV,且带隙对应变的方向和大小高度敏感。在单轴压(拉)应变下,异质结带隙呈线性增长,在-11%和11%时分别达到1.901 eV和1.614 eV;在双轴应变下,异质结带隙随压应变呈线性下降,在-11%时下降到0.087 eV,随拉应变呈线性增长,在11%时达到0.113 eV。单轴应变下的带隙速率大于双轴应变下的带隙速率,这表明单轴应变调节更为有效。光学特性研究表明,单轴(双轴)压缩应变提高了异质结在蓝-紫外区带的光吸收,特别是当单轴压缩应变达到 9 % 时,异质结在整个光谱区间的光吸收显著增加。这些研究成果将为石墨烯和β-SiN异质结构在压力传感器和光调制器领域的实际应用提供理论依据。
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引用次数: 0
Tailoring the electronic and optical properties of ReS2 monolayer using strain engineering 利用应变工程定制单层 ReS2 的电子和光学特性
Pub Date : 2024-05-22 DOI: 10.1016/j.micrna.2024.207873
Priyanka , Ritu , Vinod Kumar , Ramesh Kumar , Fakir Chand

In the present work, impact of various mechanical strains on the optoelectronic properties of monolayer ReS2 (m-ReS2) are investigated by using density functional theory. The bandgap of monolayer is determined to be 1.44 eV and 1.31 eV when computed using PBE and PBE + SOC methods. The monolayer displays outstanding electronic and optical tunability under biaxial compressive and shear strains. Under strain variations of 0 %–8 %, the bandgap for biaxial compression varies from 1.44 eV (1.31 eV) to 0.54 eV (0 eV), whereas for shear xx-yy strains, it varies from 1.44 eV (1.31 eV) to 0.34 eV (0.28 eV) when calculated using PBE (PBE + SOC) methods. A semiconductor-to-metal transition is observed for higher values of biaxial compressive strain. A pronounced impact of strain on the optical characteristics is likewise observed. We noticed that the absorption edge of monolayer ReS2 shifts from 1.32 eV to 0.50 eV with a 0 %–8 % increase in biaxial compression, leading to an 11 % red shift in wavelength per 1 % strain change. Moreover, high optical absorption (5 × 105 cm−1), lying from infrared to UV region is observed. The present study points out that strain engineering can be an efficient tool for modifying both the electronic and optical properties of m-ReS2 and may open new avenues for using this material in future optoelectronic applications.

本研究利用密度泛函理论研究了各种机械应变对单层 ReS2(m-ReS2)光电特性的影响。使用 PBE 和 PBE + SOC 方法计算得出单层的带隙分别为 1.44 eV 和 1.31 eV。在双轴压缩和剪切应变下,单层薄膜显示出卓越的电子和光学可调性。在应变变化率为 0%-8% 的情况下,双轴压缩带隙从 1.44 eV (1.31 eV) 到 0.54 eV (0eV),而在 xx-yy 剪切应变下,使用 PBE(PBE + SOC)方法计算的带隙从 1.44 eV (1.31 eV) 到 0.34 eV (0.28 eV)。双轴压缩应变值越高,半导体向金属的转变越明显。同样,我们还观察到应变对光学特性的明显影响。我们注意到,当双轴压缩率增加 0%-8% 时,单层 ReS2 的吸收边沿会从 1.32 eV 移至 0.50 eV,每 1% 的应变变化会导致 11% 的波长红移。此外,还观察到从红外线到紫外线区域的高光学吸收(5 × 105 cm-1)。本研究指出,应变工程是改变 m-ReS2 电子和光学特性的有效工具,并可能为这种材料在未来光电应用中的使用开辟新途径。
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引用次数: 0
Comparative analysis of heavy ions and alpha particles impact on gate-all-around TFETs and gate-all-around MOSFETs 重离子和阿尔法粒子对栅极周围 TFET 和栅极周围 MOSFET 影响的比较分析
Pub Date : 2024-05-21 DOI: 10.1016/j.micrna.2024.207875
Pankaj Kumar , Kalyan Koley , Subindu Kumar

The single-event-transient (SET) effect due to heavy ions and alpha particles irradiation on n-type gate-all-around tunnel field effect transistor (GAA TFET) and n-type gate-all-around MOSFET (GAA MOSFET) has been carried out. Due to differences in carrier injection mechanisms, the generated electron-hole pairs (EHPs) due to high-energy particles (HEPs) act differently on the device. In addition, the impact of HEPs (i.e., heavy ions and alpha particles) on several locations along the channel are analyzed followed by the analysis of different energies of heavy ions and alpha particles irradiation on the device. Further, the impact of varying striking angles of HEPs on the device is also analyzed to get a close match as practically exposed device characteristic. Finally, the bipolar gain of the device has been analyzed which shows GAA TFET device has more immunity toward heavy ions strike and weak immunity toward alpha particle strikes when compared to the GAA MOSFET counterpart.

我们研究了重离子和阿尔法粒子辐照对 n 型全栅极隧道场效应晶体管(GAA TFET)和 n 型全栅极 MOSFET(GAA MOSFET)产生的单事件瞬态(SET)效应。由于载流子注入机制不同,高能粒子(HEP)产生的电子-空穴对(EHP)对器件的作用也不同。此外,还分析了高能粒子(即重离子和阿尔法粒子)对通道沿线多个位置的影响,然后分析了不同能量的重离子和阿尔法粒子辐照对器件的影响。此外,还分析了重离子和阿尔法粒子的不同照射角度对器件的影响,以获得与实际暴露的器件特性相近的匹配度。最后,对器件的双极增益进行了分析,结果表明与 GAA MOSFET 相比,GAA TFET 器件对重离子辐照有更强的抗扰性,而对α粒子辐照的抗扰性较弱。
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引用次数: 0
Investigation on the performance of deep ultraviolet edge emitting laser diodes using graded undoped AlGaN electron blocking layer (EBL) 使用分级未掺杂氮化铝电子阻挡层(EBL)的深紫外边缘发射激光二极管的性能研究
Pub Date : 2024-05-17 DOI: 10.1016/j.micrna.2024.207872
Hameed Ur Rehman , Wengang Bi , Naveed Ur Rahman , Ahmad Zeb , Inayatul Haq , Fang Wang , Yuhuai Liu

P-AlGaN EBLs are usually used to control the overflow of electrons from the multiple quantum wells (MQWs) in AlGaN-based deep ultraviolet (DUV) edge-emitting laser diodes (EELDs). They're specially designed to prevent the excess flow of electrons from the MQW. This control is essential for maintaining the laser's efficiency and performance. Using optimized parameters of Al composition through theoretical calculations using Crosslight software helps certify the electrically driven EELD functions effectively within the desired operational range. In this study, the traditional p-AlGaN EBL within the electrically driven EELD is substituted with an undoped AlGaN EBL. This modification aims to raise the effective barrier height of the conduction band, and thus effectively stopping the electron leakage while improving the injection of holes. By optimizing the aluminum composition in the current research, efforts are made to lower the threshold current (Ith) and elevate the overall enactment of the graded undoped AlGaN EBL EELD. Various structural designs, including both conventional and undoped configurations, have been successfully created and analyzed in this study. Particular attention was given to investigating the impact of grading techniques applied to the electron-blocking layer. The graded undoped AlGaN EBL EELD performed better than the highly doped AlGaN EBL EELD due to the minimized free carrier absorption loss. Specifically, it shows higher slope efficiency (S.E) of 1.45 W/A and a significantly lower Ith of 790 mA. A new AlGaN EBL EELD design was tested with different layers. The ones with a graded undoped EBLs performed better than traditional AlGaN EBL EELD, improving power efficiency. The graded undoped EBLs setup also reduced the threshold current compared to traditional AlGaN EBL EELD.

P-AlGaN EBL 通常用于控制基于 AlGaN 的深紫外(DUV)边缘发射激光二极管(EELD)中多量子阱(MQW)的电子溢出。它们是专门为防止电子从 MQW 过量流出而设计的。这种控制对于保持激光器的效率和性能至关重要。通过使用 Crosslight 软件进行理论计算,对铝成分参数进行优化,有助于确保电驱动 EELD 在所需的工作范围内有效发挥作用。在这项研究中,电驱动 EELD 中的传统 pAlGaN EBL 被未掺杂的 AlGaN EBL 取代。这种修改旨在提高导带的有效势垒高度,从而有效阻止电子泄漏,同时改善空穴注入。在当前的研究中,通过优化铝成分,努力降低阈值电流(Ith),并提高分级未掺杂氮化铝 EBL EELD 的整体性能。本研究成功创建并分析了各种结构设计,包括传统配置和未掺杂配置。研究人员特别关注了应用于电子阻挡层的分级技术的影响。由于自由载流子吸收损耗最小,未掺杂 AlGaN EBL EELD 的分级性能优于高掺杂 AlGaN EBL EELD。具体来说,它的斜率效率(S.E)更高,达到 1.45 W/A,Ith(790 mA)明显更低。我们测试了采用不同层的新型氮化铝 EBL EELD 设计。与传统的 AlGaN EBL EELD 相比,采用分级未掺杂 EBL 的 EELD 性能更好,功率效率更高。与传统的 AlGaN EBL EELD 相比,分级未掺杂 EBL 设置还降低了阈值电流。
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引用次数: 0
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Micro and Nanostructures
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