Pub Date : 2024-05-31DOI: 10.1016/j.micrna.2024.207890
Yuchuan Ding , Yong Chen , MaoHua Wang
In this work, we investigated the effects of Si doping on the oxygen vacancy defects in SnO2 nanoparticles for detecting changes in humidity levels. XRD measurements showed that all samples exhibit tetragonal rutile phase and the crystallite structure of SnO2 was tuned with Si content increasing. XPS analysis revealed more oxygen vacancies defects (the percentage of OV increases from 11.52 % to 19.02 %) were confirmed to be produced, accelerating chemisorption of water molecules on Si doped SnO2 surface. Additionally, we discussed the various situations involving the utilization of electrons and holes corresponding to the different states of oxygen vacancies via photoluminescence spectroscopy. The humidity sensing results exhibited that the 5 mol% Si doped SnO2 humidity sensor shows high sensitivity, low hysteresis (5.7 %) and fast response/recovery times (7 s/10 s) range from 11 % to 95 % relative humidity. The chemical mechanisms for enhancement in humidity performance induced by oxygen vacancy defects formed on SnO2 surface is proposed.
{"title":"Oxygen vacancy-dependent humidity sensing performance induced by Si doping on SnO2 nanoparticles","authors":"Yuchuan Ding , Yong Chen , MaoHua Wang","doi":"10.1016/j.micrna.2024.207890","DOIUrl":"https://doi.org/10.1016/j.micrna.2024.207890","url":null,"abstract":"<div><p>In this work, we investigated the effects of Si doping on the oxygen vacancy defects in SnO<sub>2</sub> nanoparticles for detecting changes in humidity levels. XRD measurements showed that all samples exhibit tetragonal rutile phase and the crystallite structure of SnO<sub>2</sub> was tuned with Si content increasing. XPS analysis revealed more oxygen vacancies defects (the percentage of O<sub>V</sub> increases from 11.52 % to 19.02 %) were confirmed to be produced, accelerating chemisorption of water molecules on Si doped SnO<sub>2</sub> surface. Additionally, we discussed the various situations involving the utilization of electrons and holes corresponding to the different states of oxygen vacancies via photoluminescence spectroscopy. The humidity sensing results exhibited that the 5 mol% Si doped SnO<sub>2</sub> humidity sensor shows high sensitivity, low hysteresis (5.7 %) and fast response/recovery times (7 s/10 s) range from 11 % to 95 % relative humidity. The chemical mechanisms for enhancement in humidity performance induced by oxygen vacancy defects formed on SnO<sub>2</sub> surface is proposed.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2024-05-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141244853","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-05-28DOI: 10.1016/j.micrna.2024.207879
K. Hasanirokh , A. Naifar
A quantitative numerical exploration is conducted to scrutinize the combined effects of size and dielectric confinement consequences on the electronic and optical characteristics of spherical multilayered quantum dot CdSe/ZnS/CdSe/ZnS (SMLQD) and its inverted configuration ZnS/CdSe/ZnS/CdSe (ISMLQD) buried into two oxides: HfO2 and SiO2. By employing the effective mass approximation (EMA) and the density matrix approach (DMA), the derived quantized electron energy states and their associated wave functions were obtained by solving the Schrödinger equation in a spherical coordinates. The dipole transition element, both real and imaginary parts of the effective complex dielectric function (ECDF) as well as its linear, nonlinear and total counterparts are brought out for various values of inner core radii, number density of QDs and incident photon intensity. In addition, a specific analysis of electron probability distributions is provided to gain a clearer understanding of the underlying physical factors. Our findings point to a notable influence of these mentionned factors on the computed coefficients. The study unveils that the dielectric mismatch occurring at the system/oxide interfaces plays a crucial role in modifying the electronic structure and a substantial impact on both linear and third-order nonlinear components is witnessed.
{"title":"Theoretical insights into size and dielectric confinement: Unraveling real and imaginary parts of the effective complex dielectric function in spherical multilayered quantum dots with oxide interfaces","authors":"K. Hasanirokh , A. Naifar","doi":"10.1016/j.micrna.2024.207879","DOIUrl":"https://doi.org/10.1016/j.micrna.2024.207879","url":null,"abstract":"<div><p>A quantitative numerical exploration is conducted to scrutinize the combined effects of size and dielectric confinement consequences on the electronic and optical characteristics of spherical multilayered quantum dot CdSe/ZnS/CdSe/ZnS (SMLQD) and its inverted configuration ZnS/CdSe/ZnS/CdSe (ISMLQD) buried into two oxides: HfO<sub>2</sub> and SiO<sub>2</sub>. By employing the effective mass approximation (EMA) and the density matrix approach (DMA), the derived quantized electron energy states and their associated wave functions were obtained by solving the Schrödinger equation in a spherical coordinates. The dipole transition element, both real and imaginary parts of the effective complex dielectric function (ECDF) as well as its linear, nonlinear and total counterparts are brought out for various values of inner core radii, number density of QDs and incident photon intensity. In addition, a specific analysis of electron probability distributions is provided to gain a clearer understanding of the underlying physical factors. Our findings point to a notable influence of these mentionned factors on the computed coefficients. The study unveils that the dielectric mismatch occurring at the system/oxide interfaces plays a crucial role in modifying the electronic structure and a substantial impact on both linear and third-order nonlinear components is witnessed.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2024-05-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141302826","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Enhancing the photosensitivity and response speed of transition metal dichalcogenides (TMDs)-based photodetectors through the construction of semiconductor heterostructures poses an ongoing challenge in optoelectronic devices field. In this study, we conducted a systematic investigation using first-principles calculations to explore the characteristics of MXene/TMDs heterostructures, specifically focusing on the Zr2CO2/WS2 heterostructure. Computational analysis verifies that the Zr2CO2/WS2 heterostructure displays a type II band alignment, which facilitates efficient carrier separate transportation within the heterostructure. In both the zigzag and armchair directions, the heterostructure formation enhances the carrier mobilities. Furthermore, modulation of the heterostructure is accomplished by applying external electric fields and axial stress. Notably, the light absorption ability of the Zr2CO2/WS2 heterostructure is more sensitive to external electric fields rather than interlayer distance. Overall, Zr2CO2/WS2 van der Waals heterostructures offer inherent advantages for the development of high-performance photodetectors.
{"title":"Electronic and optical properties of Zr2CO2/WS2 van der Waals heterostructures: First-principles study","authors":"Rui Zhou , Hua Tong , Qingguo Xu , Rui Zhang , Guoqiang Hao","doi":"10.1016/j.micrna.2024.207880","DOIUrl":"https://doi.org/10.1016/j.micrna.2024.207880","url":null,"abstract":"<div><p>Enhancing the photosensitivity and response speed of transition metal dichalcogenides (TMDs)-based photodetectors through the construction of semiconductor heterostructures poses an ongoing challenge in optoelectronic devices field. In this study, we conducted a systematic investigation using first-principles calculations to explore the characteristics of MXene/TMDs heterostructures, specifically focusing on the Zr<sub>2</sub>CO<sub>2</sub>/WS<sub>2</sub> heterostructure. Computational analysis verifies that the Zr<sub>2</sub>CO<sub>2</sub>/WS<sub>2</sub> heterostructure displays a type II band alignment, which facilitates efficient carrier separate transportation within the heterostructure. In both the zigzag and armchair directions, the heterostructure formation enhances the carrier mobilities. Furthermore, modulation of the heterostructure is accomplished by applying external electric fields and axial stress. Notably, the light absorption ability of the Zr<sub>2</sub>CO<sub>2</sub>/WS<sub>2</sub> heterostructure is more sensitive to external electric fields rather than interlayer distance. Overall, Zr<sub>2</sub>CO<sub>2</sub>/WS<sub>2</sub> van der Waals heterostructures offer inherent advantages for the development of high-performance photodetectors.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2024-05-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S2773012324001298/pdfft?md5=b193e84997b486c9c78614a8c02e7f19&pid=1-s2.0-S2773012324001298-main.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141239122","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-05-27DOI: 10.1016/j.micrna.2024.207881
Tasnim Tareq Ferdous , Sadia Sultana Urmi , Md Abdul Kaium Khan , Mohammad Abdul Alim
All-inorganic Cs2TiIxBr(6-x)-based perovskite solar cells (PSCs) are recently attracting a lot of attention for their tunable bandgaps, earth abundance, non-toxicity, and ultra-stability. Among the Cs2TiIxBr(6-x) family of materials, Cs2TiI2Br4 with a bandgap of ∼1.38 eV has the potential to be an excellent single junction solar cell material with a theoretically higher Shockley-Queisser limit of power conversion efficiency (PCE). Its excellent optoelectronic properties make it a potential candidate for being the highest-performing PSC from the Cs2TiIxBr(6-x) family. In our study, a total of eight hole transport materials (P3HT, PTAA, Spiro-OMeTAD, PEDOT:Pss, CuSCN, CuI, NiO, and MoO3) and six electron transport materials (PCBM, TiO2, CdS, SnO2, ZnO, and IGZO) were investigated to select suitable charge transport materials. The defect densities of interface and absorber, different absorber layer thicknesses, several metal work functions, series-shunt resistance, and temperature were investigated to derive the conditions for optimum performance. After thorough investigation, we derived four novel devices with the combination of all the organic and inorganic charge transport materials to provide optimum performance. Among them, the combination of inorganic SnO2 and CuSCN as electron and hole transport layer respectively achieved the highest PCE of 23.41 %.
{"title":"Carrier transport layer engineering of Cs2TiI2Br4 halide double perovskite solar cell via SCAPS 1D: Approaching the Shockley-Queisser limit","authors":"Tasnim Tareq Ferdous , Sadia Sultana Urmi , Md Abdul Kaium Khan , Mohammad Abdul Alim","doi":"10.1016/j.micrna.2024.207881","DOIUrl":"10.1016/j.micrna.2024.207881","url":null,"abstract":"<div><p>All-inorganic Cs<sub>2</sub>TiI<sub>x</sub>Br<sub>(6-x)</sub>-based perovskite solar cells (PSCs) are recently attracting a lot of attention for their tunable bandgaps, earth abundance, non-toxicity, and ultra-stability. Among the Cs<sub>2</sub>TiI<sub>x</sub>Br<sub>(6-x)</sub> family of materials, Cs<sub>2</sub>TiI<sub>2</sub>Br<sub>4</sub> with a bandgap of ∼1.38 eV has the potential to be an excellent single junction solar cell material with a theoretically higher Shockley-Queisser limit of power conversion efficiency (PCE). Its excellent optoelectronic properties make it a potential candidate for being the highest-performing PSC from the Cs<sub>2</sub>TiI<sub>x</sub>Br<sub>(6-x)</sub> family. In our study, a total of eight hole transport materials (P3HT, PTAA, Spiro-OMeTAD, PEDOT:Pss, CuSCN, CuI, NiO, and MoO<sub>3</sub>) and six electron transport materials (PCBM, TiO<sub>2</sub>, CdS, SnO<sub>2</sub>, ZnO, and IGZO) were investigated to select suitable charge transport materials. The defect densities of interface and absorber, different absorber layer thicknesses, several metal work functions, series-shunt resistance, and temperature were investigated to derive the conditions for optimum performance. After thorough investigation, we derived four novel devices with the combination of all the organic and inorganic charge transport materials to provide optimum performance. Among them, the combination of inorganic SnO<sub>2</sub> and CuSCN as electron and hole transport layer respectively achieved the highest PCE of 23.41 %.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2024-05-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141193477","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
A novel double deck gate field plate structure on a normally-off AlGaN/GaN HEMT is proposed and compared with the conventional no field plate structure. Several passivation materials with relative permittivity (εr) ranging from 3.9 to 22 is taken into consideration to study the breakdown and DC characteristics. The implementation of field plate along with a higher εr material helps in improving breakdown voltage (VBr) as they both decrease the electric field at the gate's drain edge. Aiming device optimization several field plate configurations are studied including tri field plate structure, dual field plate structures and single gate FP structure. Extensive analysis in these structures are done with different lengths of the field plates and distance between source and drain. Distance between source and drain (LSD) is varied from 8.4 to 13.4 μm, source FP lengths (LS_FP) varies from 1 to 7 μm, gate FP lengths (LG_FP) varies from 0.9 to 2.3 μm and drain FP lengths (LD_FP) varies from 0.2 to 4.9 μm. In all scenarios with varying LSD, VBr rises with increasing LSD. For source, gate and drain FP lengths variation, VBr decreases as it gets longer because the electric field becomes very high. As the distance between the FP edge and the drain becomes narrower with increase in FP lengths, the breakdown occurs at lower voltage. At LSD 13.4 μm, this novel double deck gate FP structure with conventional drain field plate structure gives highest VBr of 1660 V and a small Ron of 2.39 Ω mm as compared to other structures. It also outperforms the other three structures in FT (9.84 GHz) at this particular LSD. Analysis of the simulated structures shows that the union of gate-drain field plate boosts the VBr while decreasing the Ron, resulting in improved electrical performance and a wider application range.
{"title":"Novel double deck gate field plate structure on a normally-off AlGaN/GaN HEMT- An extensive analysis","authors":"Pichingla Kharei, Achinta Baidya, Niladri Pratap Maity, Abhijyoti Ghosh, Mrs Zonunmawii","doi":"10.1016/j.micrna.2024.207874","DOIUrl":"https://doi.org/10.1016/j.micrna.2024.207874","url":null,"abstract":"<div><p>A novel double deck gate field plate structure on a normally-off AlGaN/GaN HEMT is proposed and compared with the conventional no field plate structure. Several passivation materials with relative permittivity (ε<sub>r</sub>) ranging from 3.9 to 22 is taken into consideration to study the breakdown and DC characteristics. The implementation of field plate along with a higher ε<sub>r</sub> material helps in improving breakdown voltage (V<sub>Br</sub>) as they both decrease the electric field at the gate's drain edge. Aiming device optimization several field plate configurations are studied including tri field plate structure, dual field plate structures and single gate FP structure. Extensive analysis in these structures are done with different lengths of the field plates and distance between source and drain. Distance between source and drain (L<sub>SD</sub>) is varied from 8.4 to 13.4 μm, source FP lengths (L<sub>S_FP</sub>) varies from 1 to 7 μm, gate FP lengths (L<sub>G_FP</sub>) varies from 0.9 to 2.3 μm and drain FP lengths (L<sub>D_FP</sub>) varies from 0.2 to 4.9 μm. In all scenarios with varying L<sub>SD</sub>, V<sub>Br</sub> rises with increasing L<sub>SD</sub>. For source, gate and drain FP lengths variation, V<sub>Br</sub> decreases as it gets longer because the electric field becomes very high. As the distance between the FP edge and the drain becomes narrower with increase in FP lengths, the breakdown occurs at lower voltage. At L<sub>SD</sub> 13.4 μm, this novel double deck gate FP structure with conventional drain field plate structure gives highest V<sub>Br</sub> of 1660 V and a small R<sub>on</sub> of 2.39 Ω mm as compared to other structures. It also outperforms the other three structures in F<sub>T</sub> (9.84 GHz) at this particular L<sub>SD</sub>. Analysis of the simulated structures shows that the union of gate-drain field plate boosts the V<sub>Br</sub> while decreasing the R<sub>on</sub>, resulting in improved electrical performance and a wider application range.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2024-05-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141285954","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-05-25DOI: 10.1016/j.micrna.2024.207877
Madhulika Verma, Sachin Agrawal
In this paper, a metal strip loaded doping less TFET (MS-DLTFET) biomarker with four cavities is proposed for SARs-CoV-2 detection virus. The results demonstrate that the proposed device offers an improved biomarker performance by introducing the charged plasma concept and the metal strips. The electrical parameters such as electron tunneling rate, drain current (Ids), current ratio (ION/IOFF), threshold voltage (Vth) are evaluated through simulations by immobilized dielectric constant (k) and charge density (ρ) of the bioelements in the nano-gap cavities. In addition, their sensitivity is also calculated with respect to air. The results depict that the proposed device tenders better performance in terms of Ids, ION/IOFF and Vth sensitivity as compared to existing devices. The device's response time under varying k and ρ values are investigated. The non-uniform cavity configurations formed due to steric hindrance effect are studied. It is found that concave configuration offers the best performance compared to other. Furthermore, the cavity size analysis is also performed to optimize the device performance.
{"title":"Metal inserted doping less dielectrically modulated TFET biomarker for SARs-CoV-2 detection","authors":"Madhulika Verma, Sachin Agrawal","doi":"10.1016/j.micrna.2024.207877","DOIUrl":"https://doi.org/10.1016/j.micrna.2024.207877","url":null,"abstract":"<div><p>In this paper, a metal strip loaded doping less TFET (MS-DLTFET) biomarker with four cavities is proposed for SARs-CoV-2 detection virus. The results demonstrate that the proposed device offers an improved biomarker performance by introducing the charged plasma concept and the metal strips. The electrical parameters such as electron tunneling rate, drain current (I<sub><em>ds</em></sub>), current ratio (I<sub><em>ON</em></sub>/I<sub><em>OFF</em></sub>), threshold voltage (V<sub><em>th</em></sub>) are evaluated through simulations by immobilized dielectric constant (<em>k</em>) and charge density (<em>ρ</em>) of the bioelements in the nano-gap cavities. In addition, their sensitivity is also calculated with respect to air. The results depict that the proposed device tenders better performance in terms of I<sub><em>ds</em></sub>, I<sub><em>ON</em></sub>/I<sub><em>OFF</em></sub> and V<sub><em>th</em></sub> sensitivity as compared to existing devices. The device's response time under varying <em>k</em> and <em>ρ</em> values are investigated. The non-uniform cavity configurations formed due to steric hindrance effect are studied. It is found that concave configuration offers the best performance compared to other. Furthermore, the cavity size analysis is also performed to optimize the device performance.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2024-05-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141163837","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-05-25DOI: 10.1016/j.micrna.2024.207878
Hu Lu , Ningning Su , Junqiang Wang , Heng Ti , Shasha Wu , Mengwei Li
van der Waals heterostructures can enable adjustment of graphene's electronic properties, which is important for the application of graphene-based electronic devices. The structural, electronic and optical properties of heterostructures composed of graphene and β-Si3N4 under different strain conditions are studied in this paper using first-principle calculation. The result shows that the heterojunction constituted with β-Si3N4 opens a small bandgap at the Brillouin zone Γ, which is about 0.099 eV, and the bandgap is highly sensitive to the direction and magnitude of strain. Under uniaxial compressive (tensile) strain, the heterojunction bandgap increases linearly, reaching 1.901 eV and 1.614 eV at −11 % and 11 %, respectively; under biaxial strain, the heterojunction bandgap decreases linearly with the compressive strain, decreasing to 0.087 eV at −11 %, and increases linearly with the tensile strain, reaching 0.113 eV at 11 %. And the rate of the bandgap under uniaxial strain is larger than that under biaxial strain, which suggests that the uniaxial strain regulation is more effective. Optical property study shows that uniaxial (biaxial) compressive strain improves the light absorption of the heterojunction in the blue-ultraviolet region band, especially when the uniaxial compressive strain reaches 9 %, the light absorption of the heterojunction increases significantly in the whole spectral interval. These research results will provide a theoretical basis for the practical applications of graphene and β-Si3N4 heterostructures in the fields of pressure sensors and optical modulators.
{"title":"Effects of the in-plane uniaxial and biaxial strains on the electronic and optical properties of the graphene/β-Si3N4 heterostructure","authors":"Hu Lu , Ningning Su , Junqiang Wang , Heng Ti , Shasha Wu , Mengwei Li","doi":"10.1016/j.micrna.2024.207878","DOIUrl":"10.1016/j.micrna.2024.207878","url":null,"abstract":"<div><p>van der Waals heterostructures can enable adjustment of graphene's electronic properties, which is important for the application of graphene-based electronic devices. The structural, electronic and optical properties of heterostructures composed of graphene and β-Si<sub>3</sub>N<sub>4</sub> under different strain conditions are studied in this paper using first-principle calculation. The result shows that the heterojunction constituted with β-Si<sub>3</sub>N<sub>4</sub> opens a small bandgap at the Brillouin zone Γ, which is about 0.099 eV, and the bandgap is highly sensitive to the direction and magnitude of strain. Under uniaxial compressive (tensile) strain, the heterojunction bandgap increases linearly, reaching 1.901 eV and 1.614 eV at −11 % and 11 %, respectively; under biaxial strain, the heterojunction bandgap decreases linearly with the compressive strain, decreasing to 0.087 eV at −11 %, and increases linearly with the tensile strain, reaching 0.113 eV at 11 %. And the rate of the bandgap under uniaxial strain is larger than that under biaxial strain, which suggests that the uniaxial strain regulation is more effective. Optical property study shows that uniaxial (biaxial) compressive strain improves the light absorption of the heterojunction in the blue-ultraviolet region band, especially when the uniaxial compressive strain reaches 9 %, the light absorption of the heterojunction increases significantly in the whole spectral interval. These research results will provide a theoretical basis for the practical applications of graphene and β-Si<sub>3</sub>N<sub>4</sub> heterostructures in the fields of pressure sensors and optical modulators.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2024-05-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141193478","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
In the present work, impact of various mechanical strains on the optoelectronic properties of monolayer ReS2 (m-ReS2) are investigated by using density functional theory. The bandgap of monolayer is determined to be 1.44 eV and 1.31 eV when computed using PBE and PBE + SOC methods. The monolayer displays outstanding electronic and optical tunability under biaxial compressive and shear strains. Under strain variations of 0 %–8 %, the bandgap for biaxial compression varies from 1.44 eV (1.31 eV) to 0.54 eV (0 eV), whereas for shear xx-yy strains, it varies from 1.44 eV (1.31 eV) to 0.34 eV (0.28 eV) when calculated using PBE (PBE + SOC) methods. A semiconductor-to-metal transition is observed for higher values of biaxial compressive strain. A pronounced impact of strain on the optical characteristics is likewise observed. We noticed that the absorption edge of monolayer ReS2 shifts from 1.32 eV to 0.50 eV with a 0 %–8 % increase in biaxial compression, leading to an 11 % red shift in wavelength per 1 % strain change. Moreover, high optical absorption (5 × 105 cm−1), lying from infrared to UV region is observed. The present study points out that strain engineering can be an efficient tool for modifying both the electronic and optical properties of m-ReS2 and may open new avenues for using this material in future optoelectronic applications.
本研究利用密度泛函理论研究了各种机械应变对单层 ReS2(m-ReS2)光电特性的影响。使用 PBE 和 PBE + SOC 方法计算得出单层的带隙分别为 1.44 eV 和 1.31 eV。在双轴压缩和剪切应变下,单层薄膜显示出卓越的电子和光学可调性。在应变变化率为 0%-8% 的情况下,双轴压缩带隙从 1.44 eV (1.31 eV) 到 0.54 eV (0eV),而在 xx-yy 剪切应变下,使用 PBE(PBE + SOC)方法计算的带隙从 1.44 eV (1.31 eV) 到 0.34 eV (0.28 eV)。双轴压缩应变值越高,半导体向金属的转变越明显。同样,我们还观察到应变对光学特性的明显影响。我们注意到,当双轴压缩率增加 0%-8% 时,单层 ReS2 的吸收边沿会从 1.32 eV 移至 0.50 eV,每 1% 的应变变化会导致 11% 的波长红移。此外,还观察到从红外线到紫外线区域的高光学吸收(5 × 105 cm-1)。本研究指出,应变工程是改变 m-ReS2 电子和光学特性的有效工具,并可能为这种材料在未来光电应用中的使用开辟新途径。
{"title":"Tailoring the electronic and optical properties of ReS2 monolayer using strain engineering","authors":"Priyanka , Ritu , Vinod Kumar , Ramesh Kumar , Fakir Chand","doi":"10.1016/j.micrna.2024.207873","DOIUrl":"https://doi.org/10.1016/j.micrna.2024.207873","url":null,"abstract":"<div><p>In the present work, impact of various mechanical strains on the optoelectronic properties of monolayer ReS<sub>2</sub> (<em>m</em>-ReS<sub>2</sub>) are investigated by using density functional theory. The bandgap of monolayer is determined to be 1.44 eV and 1.31 eV when computed using PBE and PBE + SOC methods. The monolayer displays outstanding electronic and optical tunability under biaxial compressive and shear strains. Under strain variations of 0 %–8 %, the bandgap for biaxial compression varies from 1.44 eV (1.31 eV) to 0.54 eV (0 eV), whereas for shear xx-yy strains, it varies from 1.44 eV (1.31 eV) to 0.34 eV (0.28 eV) when calculated using PBE (PBE + SOC) methods. A semiconductor-to-metal transition is observed for higher values of biaxial compressive strain. A pronounced impact of strain on the optical characteristics is likewise observed. We noticed that the absorption edge of monolayer ReS<sub>2</sub> shifts from 1.32 eV to 0.50 eV with a 0 %–8 % increase in biaxial compression, leading to an 11 % red shift in wavelength per 1 % strain change. Moreover, high optical absorption (5 × 10<sup>5</sup> cm<sup>−1</sup>), lying from infrared to UV region is observed. The present study points out that strain engineering can be an efficient tool for modifying both the electronic and optical properties of <em>m</em>-ReS<sub>2</sub> and may open new avenues for using this material in future optoelectronic applications.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2024-05-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141090704","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-05-21DOI: 10.1016/j.micrna.2024.207875
Pankaj Kumar , Kalyan Koley , Subindu Kumar
The single-event-transient (SET) effect due to heavy ions and alpha particles irradiation on n-type gate-all-around tunnel field effect transistor (GAA TFET) and n-type gate-all-around MOSFET (GAA MOSFET) has been carried out. Due to differences in carrier injection mechanisms, the generated electron-hole pairs (EHPs) due to high-energy particles (HEPs) act differently on the device. In addition, the impact of HEPs (i.e., heavy ions and alpha particles) on several locations along the channel are analyzed followed by the analysis of different energies of heavy ions and alpha particles irradiation on the device. Further, the impact of varying striking angles of HEPs on the device is also analyzed to get a close match as practically exposed device characteristic. Finally, the bipolar gain of the device has been analyzed which shows GAA TFET device has more immunity toward heavy ions strike and weak immunity toward alpha particle strikes when compared to the GAA MOSFET counterpart.
我们研究了重离子和阿尔法粒子辐照对 n 型全栅极隧道场效应晶体管(GAA TFET)和 n 型全栅极 MOSFET(GAA MOSFET)产生的单事件瞬态(SET)效应。由于载流子注入机制不同,高能粒子(HEP)产生的电子-空穴对(EHP)对器件的作用也不同。此外,还分析了高能粒子(即重离子和阿尔法粒子)对通道沿线多个位置的影响,然后分析了不同能量的重离子和阿尔法粒子辐照对器件的影响。此外,还分析了重离子和阿尔法粒子的不同照射角度对器件的影响,以获得与实际暴露的器件特性相近的匹配度。最后,对器件的双极增益进行了分析,结果表明与 GAA MOSFET 相比,GAA TFET 器件对重离子辐照有更强的抗扰性,而对α粒子辐照的抗扰性较弱。
{"title":"Comparative analysis of heavy ions and alpha particles impact on gate-all-around TFETs and gate-all-around MOSFETs","authors":"Pankaj Kumar , Kalyan Koley , Subindu Kumar","doi":"10.1016/j.micrna.2024.207875","DOIUrl":"https://doi.org/10.1016/j.micrna.2024.207875","url":null,"abstract":"<div><p>The single-event-transient (SET) effect due to heavy ions and alpha particles irradiation on n-type gate-all-around tunnel field effect transistor (GAA TFET) and n-type gate-all-around MOSFET (GAA MOSFET) has been carried out. Due to differences in carrier injection mechanisms, the generated electron-hole pairs (EHPs) due to high-energy particles (HEPs) act differently on the device. In addition, the impact of HEPs (i.e., heavy ions and alpha particles) on several locations along the channel are analyzed followed by the analysis of different energies of heavy ions and alpha particles irradiation on the device. Further, the impact of varying striking angles of HEPs on the device is also analyzed to get a close match as practically exposed device characteristic. Finally, the bipolar gain of the device has been analyzed which shows GAA TFET device has more immunity toward heavy ions strike and weak immunity toward alpha particle strikes when compared to the GAA MOSFET counterpart.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2024-05-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141095703","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-05-17DOI: 10.1016/j.micrna.2024.207872
Hameed Ur Rehman , Wengang Bi , Naveed Ur Rahman , Ahmad Zeb , Inayatul Haq , Fang Wang , Yuhuai Liu
P-AlGaN EBLs are usually used to control the overflow of electrons from the multiple quantum wells (MQWs) in AlGaN-based deep ultraviolet (DUV) edge-emitting laser diodes (EELDs). They're specially designed to prevent the excess flow of electrons from the MQW. This control is essential for maintaining the laser's efficiency and performance. Using optimized parameters of Al composition through theoretical calculations using Crosslight software helps certify the electrically driven EELD functions effectively within the desired operational range. In this study, the traditional p-AlGaN EBL within the electrically driven EELD is substituted with an undoped AlGaN EBL. This modification aims to raise the effective barrier height of the conduction band, and thus effectively stopping the electron leakage while improving the injection of holes. By optimizing the aluminum composition in the current research, efforts are made to lower the threshold current (Ith) and elevate the overall enactment of the graded undoped AlGaN EBL EELD. Various structural designs, including both conventional and undoped configurations, have been successfully created and analyzed in this study. Particular attention was given to investigating the impact of grading techniques applied to the electron-blocking layer. The graded undoped AlGaN EBL EELD performed better than the highly doped AlGaN EBL EELD due to the minimized free carrier absorption loss. Specifically, it shows higher slope efficiency (S.E) of 1.45 W/A and a significantly lower Ith of 790 mA. A new AlGaN EBL EELD design was tested with different layers. The ones with a graded undoped EBLs performed better than traditional AlGaN EBL EELD, improving power efficiency. The graded undoped EBLs setup also reduced the threshold current compared to traditional AlGaN EBL EELD.
{"title":"Investigation on the performance of deep ultraviolet edge emitting laser diodes using graded undoped AlGaN electron blocking layer (EBL)","authors":"Hameed Ur Rehman , Wengang Bi , Naveed Ur Rahman , Ahmad Zeb , Inayatul Haq , Fang Wang , Yuhuai Liu","doi":"10.1016/j.micrna.2024.207872","DOIUrl":"10.1016/j.micrna.2024.207872","url":null,"abstract":"<div><p>P-AlGaN EBLs are usually used to control the overflow of electrons from the multiple quantum wells (MQWs) in AlGaN-based deep ultraviolet (DUV) edge-emitting laser diodes (EELDs). They're specially designed to prevent the excess flow of electrons from the MQW. This control is essential for maintaining the laser's efficiency and performance. Using optimized parameters of Al composition through theoretical calculations using Crosslight software helps certify the electrically driven EELD functions effectively within the desired operational range. In this study, the traditional p-AlGaN EBL within the electrically driven EELD is substituted with an undoped AlGaN EBL. This modification aims to raise the effective barrier height of the conduction band, and thus effectively stopping the electron leakage while improving the injection of holes. By optimizing the aluminum composition in the current research, efforts are made to lower the threshold current (I<sub>th</sub>) and elevate the overall enactment of the graded undoped AlGaN EBL EELD. Various structural designs, including both conventional and undoped configurations, have been successfully created and analyzed in this study. Particular attention was given to investigating the impact of grading techniques applied to the electron-blocking layer. The graded undoped AlGaN EBL EELD performed better than the highly doped AlGaN EBL EELD due to the minimized free carrier absorption loss. Specifically, it shows higher slope efficiency (S.E) of 1.45 W/A and a significantly lower I<sub>th</sub> of 790 mA. A new AlGaN EBL EELD design was tested with different layers. The ones with a graded undoped EBLs performed better than traditional AlGaN EBL EELD, improving power efficiency. The graded undoped EBLs setup also reduced the threshold current compared to traditional AlGaN EBL EELD.</p></div>","PeriodicalId":100923,"journal":{"name":"Micro and Nanostructures","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2024-05-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141036826","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}