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RADECS 97. Fourth European Conference on Radiation and its Effects on Components and Systems (Cat. No.97TH8294)最新文献

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Strategies for millirad sensitivity in PMOS dosimeters PMOS剂量计的毫拉德灵敏度策略
C. Conneely, B. O'Connell, P. Hurley, W. Lane, L. Adams
Previous work at this centre has shown enhanced sensitivity for PMOS dosimeters using a design approach. This is being extended presently to longer chains of devices. Prior to this extension, thermal effects have been investigated and a noise analysis has been undertaken. The need for a temperature compensation technique becomes imperative if the signal/noise ratio is to be improved.
该中心以前的工作表明,使用设计方法提高了PMOS剂量计的灵敏度。目前,这一功能正在扩展到更长的设备链。在扩建之前,已经对热效应进行了调查,并进行了噪声分析。如果要提高信噪比,就必须采用温度补偿技术。
{"title":"Strategies for millirad sensitivity in PMOS dosimeters","authors":"C. Conneely, B. O'Connell, P. Hurley, W. Lane, L. Adams","doi":"10.1109/RADECS.1997.698911","DOIUrl":"https://doi.org/10.1109/RADECS.1997.698911","url":null,"abstract":"Previous work at this centre has shown enhanced sensitivity for PMOS dosimeters using a design approach. This is being extended presently to longer chains of devices. Prior to this extension, thermal effects have been investigated and a noise analysis has been undertaken. The need for a temperature compensation technique becomes imperative if the signal/noise ratio is to be improved.","PeriodicalId":106774,"journal":{"name":"RADECS 97. Fourth European Conference on Radiation and its Effects on Components and Systems (Cat. No.97TH8294)","volume":"19 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-09-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133489585","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 23
Modifications of Fowler-Nordheim injection characteristics in /spl gamma/ irradiated MOS devices /spl γ辐照MOS器件中Fowler-Nordheim注入特性的改变
A. Scarpa, A. Paccagnella, F. Montera, A. Candelori, G. Ghibaudo, G. Pananakakis, G. Ghidini, P. Fuochi
In this work we have investigated how gamma irradiation affects the tunneling conduction mechanism of a 20 nm thick oxide in MOS capacitors. The radiation induced positive charge is rapidly compensated by the injected electrons, and does not impact the gate current under positive injection after the first current-voltage measurement. Only a transient stress induced leakage current at low gate bias is observed. Instead, a radiation induced negative charge has been observed near the polysilicon gate, which enhances the gate voltage needed for Fowler-Nordheim conduction at negative gate bias. No time decay of this charge has been observed. Such charges slightly modify the trapping kinetics of negative charge during subsequent electrical stresses performed at constant current condition.
在这项工作中,我们研究了伽马辐照如何影响20 nm厚氧化物在MOS电容器中的隧穿传导机制。辐射引起的正电荷被注入的电子迅速补偿,并且在第一次电流-电压测量后正注入时不会影响栅极电流。在低栅极偏压下,只观察到瞬态应力引起的泄漏电流。相反,在多晶硅栅极附近观察到辐射诱导的负电荷,这增加了负栅极偏压下福勒-诺德海姆传导所需的栅极电压。没有观察到这种电荷的时间衰减。这些电荷轻微地改变了在恒流条件下进行的后续电应力中负电荷的捕获动力学。
{"title":"Modifications of Fowler-Nordheim injection characteristics in /spl gamma/ irradiated MOS devices","authors":"A. Scarpa, A. Paccagnella, F. Montera, A. Candelori, G. Ghibaudo, G. Pananakakis, G. Ghidini, P. Fuochi","doi":"10.1109/RADECS.1997.698850","DOIUrl":"https://doi.org/10.1109/RADECS.1997.698850","url":null,"abstract":"In this work we have investigated how gamma irradiation affects the tunneling conduction mechanism of a 20 nm thick oxide in MOS capacitors. The radiation induced positive charge is rapidly compensated by the injected electrons, and does not impact the gate current under positive injection after the first current-voltage measurement. Only a transient stress induced leakage current at low gate bias is observed. Instead, a radiation induced negative charge has been observed near the polysilicon gate, which enhances the gate voltage needed for Fowler-Nordheim conduction at negative gate bias. No time decay of this charge has been observed. Such charges slightly modify the trapping kinetics of negative charge during subsequent electrical stresses performed at constant current condition.","PeriodicalId":106774,"journal":{"name":"RADECS 97. Fourth European Conference on Radiation and its Effects on Components and Systems (Cat. No.97TH8294)","volume":"6 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-09-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116151603","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 9
Radiation hard GaAs microwave integrated circuits design 辐射硬砷化镓微波集成电路设计
D. V. Gromov, P.P. Maltcev, A. Nikiforov, S.A. Polevich, S.A. Startcev
The radiation hard microwave integrated circuits (MIC) design technique is presented. The approach is based on the microstrip lines optimization procedure taking into consideration MESFET S-parameters radiation variation. The technique efficiency is demonstrated for MIC amplifier.
介绍了辐射硬微波集成电路的设计技术。该方法基于考虑MESFET s参数辐射变化的微带线优化过程。在MIC放大器上验证了该技术的有效性。
{"title":"Radiation hard GaAs microwave integrated circuits design","authors":"D. V. Gromov, P.P. Maltcev, A. Nikiforov, S.A. Polevich, S.A. Startcev","doi":"10.1109/RADECS.1997.698873","DOIUrl":"https://doi.org/10.1109/RADECS.1997.698873","url":null,"abstract":"The radiation hard microwave integrated circuits (MIC) design technique is presented. The approach is based on the microstrip lines optimization procedure taking into consideration MESFET S-parameters radiation variation. The technique efficiency is demonstrated for MIC amplifier.","PeriodicalId":106774,"journal":{"name":"RADECS 97. Fourth European Conference on Radiation and its Effects on Components and Systems (Cat. No.97TH8294)","volume":"73 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-09-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122139670","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
An instrument for monitoring proton-induced upsets in space electronics 一种监测空间电子设备中质子引起的扰动的仪器
G. Mackay, I. Thomson, I. Adams, R. Nickson, A. Ng, N. Sultan
A small, low power instrument has been developed to monitor proton-induced upsets in space-borne electronics. This instrument will act as a monitor for spacecraft in orbits where single event upsets (SEUs) and other single event effects (SEEs) are considered a significant hazard to on-board electronics. A Flight Model has been designed and built which interfaces with the satellite on-board computer. The instrument has been characterized over the proton energy range 20 MeV to 500 MeV and has no energy dependence. The proton SEU cross section of 2.4/spl times//sup -11/ cm/sup 2//bit is orders of magnitude more sensitive to protons than current flight electronics components. The first instrument will be flown on the STRV 1c satellite in a Geosynchronous Transfer Orbit.
一种小型、低功率的仪器已经被开发出来,用于监测空间电子设备中质子引起的扰动。该仪器将作为轨道上航天器的监测器,其中单事件干扰(seu)和其他单事件影响(see)被认为对机载电子设备构成重大危害。设计并建立了与卫星机载计算机对接的飞行模型。该仪器的质子能量范围在20 MeV到500 MeV之间,没有能量依赖。2.4/spl倍//sup -11/ cm/sup 2//bit的质子SEU截面对质子的敏感性比目前的飞行电子元件高几个数量级。第一个仪器将在地球同步转移轨道上的STRV 1c卫星上飞行。
{"title":"An instrument for monitoring proton-induced upsets in space electronics","authors":"G. Mackay, I. Thomson, I. Adams, R. Nickson, A. Ng, N. Sultan","doi":"10.1109/RADECS.1997.698982","DOIUrl":"https://doi.org/10.1109/RADECS.1997.698982","url":null,"abstract":"A small, low power instrument has been developed to monitor proton-induced upsets in space-borne electronics. This instrument will act as a monitor for spacecraft in orbits where single event upsets (SEUs) and other single event effects (SEEs) are considered a significant hazard to on-board electronics. A Flight Model has been designed and built which interfaces with the satellite on-board computer. The instrument has been characterized over the proton energy range 20 MeV to 500 MeV and has no energy dependence. The proton SEU cross section of 2.4/spl times//sup -11/ cm/sup 2//bit is orders of magnitude more sensitive to protons than current flight electronics components. The first instrument will be flown on the STRV 1c satellite in a Geosynchronous Transfer Orbit.","PeriodicalId":106774,"journal":{"name":"RADECS 97. Fourth European Conference on Radiation and its Effects on Components and Systems (Cat. No.97TH8294)","volume":"21 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-09-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121791973","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
"Electronic components breakdown and disturbance models" 电子元件击穿与扰动模型
J. Brasile, N. Samama
This paper presents new behavioral models of electronic components which are stressed by power pulses. The thermal destruction of bipolar transistors as well as disturbance models for both bipolar and MOS gates are discussed. A study of trends in integrated circuit technology is used to extract the parameters required for the models (such as lithography or doping concentration). These basic models appear to fit published experimental results satisfactorily and they prove to be precise enough to estimate the power needed to disturb or destroy the components under consideration. Finally, predictions up to the year 2000 are given. These illustrate how susceptibility levels of some electronic transistors have evolved and should continue to evolve.
提出了一种新的电子元件在功率脉冲作用下的行为模型。讨论了双极晶体管的热破坏以及双极栅极和MOS栅极的扰动模型。对集成电路技术趋势的研究用于提取模型所需的参数(如光刻或掺杂浓度)。这些基本模型似乎与已发表的实验结果令人满意地吻合,它们被证明是足够精确的,可以估计干扰或破坏所考虑的组件所需的功率。最后,给出了到2000年的预测。这些说明了一些电子晶体管的易感性水平是如何进化的,并且应该继续进化。
{"title":"\"Electronic components breakdown and disturbance models\"","authors":"J. Brasile, N. Samama","doi":"10.1109/RADECS.1997.698885","DOIUrl":"https://doi.org/10.1109/RADECS.1997.698885","url":null,"abstract":"This paper presents new behavioral models of electronic components which are stressed by power pulses. The thermal destruction of bipolar transistors as well as disturbance models for both bipolar and MOS gates are discussed. A study of trends in integrated circuit technology is used to extract the parameters required for the models (such as lithography or doping concentration). These basic models appear to fit published experimental results satisfactorily and they prove to be precise enough to estimate the power needed to disturb or destroy the components under consideration. Finally, predictions up to the year 2000 are given. These illustrate how susceptibility levels of some electronic transistors have evolved and should continue to evolve.","PeriodicalId":106774,"journal":{"name":"RADECS 97. Fourth European Conference on Radiation and its Effects on Components and Systems (Cat. No.97TH8294)","volume":"40 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-09-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125133497","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 9
SEU sensitive depth in a submicron SRAM technology SEU敏感深度的亚微米SRAM技术
C. Detcheverry, R. Ecoffet, S. Duzellier, E. Lorfèvre, G. Bruguier, J. Barak, Y. Lifshitz, J. Palau, J. Gasiot
This work determines experimentally and by simulation the SEU sensitive depth in a 0.6 /spl mu/m SRAM technology. A good correlation is obtained between the two studies in the case of heavy ions deposing energy close to the critical energy. Other simulation results complete the first investigation by studying the minimum sensitive depth for ions deposing higher energies (at greater LET).
这项工作通过实验和模拟确定了0.6 /spl mu/m SRAM技术中SEU的敏感深度。在重离子沉积能量接近临界能量的情况下,两者之间有很好的相关性。其他模拟结果通过研究离子沉积高能量(在更大LET下)的最小敏感深度来完成第一次研究。
{"title":"SEU sensitive depth in a submicron SRAM technology","authors":"C. Detcheverry, R. Ecoffet, S. Duzellier, E. Lorfèvre, G. Bruguier, J. Barak, Y. Lifshitz, J. Palau, J. Gasiot","doi":"10.1109/RADECS.1997.698994","DOIUrl":"https://doi.org/10.1109/RADECS.1997.698994","url":null,"abstract":"This work determines experimentally and by simulation the SEU sensitive depth in a 0.6 /spl mu/m SRAM technology. A good correlation is obtained between the two studies in the case of heavy ions deposing energy close to the critical energy. Other simulation results complete the first investigation by studying the minimum sensitive depth for ions deposing higher energies (at greater LET).","PeriodicalId":106774,"journal":{"name":"RADECS 97. Fourth European Conference on Radiation and its Effects on Components and Systems (Cat. No.97TH8294)","volume":"22 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-09-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125481355","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 9
Annealing of silicon epitaxial power diodes after irradiation at liquid He temperature 液态氦辐照后硅外延功率二极管的退火
V. Berland, P. Galy
Within the framework of the collaboration between CERN and the TUM (Technical University of Munich), irradiation experiments have been carried out at liquid helium temperatures on epitaxial diodes for the superconducting magnet protection of the future Large Hadron Collider (LHC). Two sets of 10 mm diameter diode samples were submitted to an irradiation of 30 kGy dose and 6*10/sup 14/ n/cm/sup 2/ neutron fluence at liquid helium temperature. The radiation-induced degradation has been measured by the increase in the forward voltage. Afterwards, one set of diode samples was stepwise warmed up to about 250 K and, at each step, the recovery in forward voltage was monitored to determine the minimum annealing temperature. The second set of diode samples was thermally annealed with different time intervals at about 100 K and 200 K to determine the minimum annealing time.
在欧洲核子研究中心和慕尼黑工业大学的合作框架内,在液氦温度下对外延二极管进行了辐射实验,用于未来大型强子对撞机(LHC)的超导磁体保护。将两组直径为10 mm的二极管样品在液氦温度下接受30 kGy剂量和6*10/sup 14/ n/cm/sup 2/中子通量的辐照。通过正向电压的增加测量了辐射引起的退化。然后,将一组二极管样品逐步加热到约250 K,并在每一步中监测正向电压的恢复以确定最低退火温度。第二组二极管样品分别在100 K和200 K下进行不同时间间隔的热退火,以确定最小退火时间。
{"title":"Annealing of silicon epitaxial power diodes after irradiation at liquid He temperature","authors":"V. Berland, P. Galy","doi":"10.1109/RADECS.1997.698892","DOIUrl":"https://doi.org/10.1109/RADECS.1997.698892","url":null,"abstract":"Within the framework of the collaboration between CERN and the TUM (Technical University of Munich), irradiation experiments have been carried out at liquid helium temperatures on epitaxial diodes for the superconducting magnet protection of the future Large Hadron Collider (LHC). Two sets of 10 mm diameter diode samples were submitted to an irradiation of 30 kGy dose and 6*10/sup 14/ n/cm/sup 2/ neutron fluence at liquid helium temperature. The radiation-induced degradation has been measured by the increase in the forward voltage. Afterwards, one set of diode samples was stepwise warmed up to about 250 K and, at each step, the recovery in forward voltage was monitored to determine the minimum annealing temperature. The second set of diode samples was thermally annealed with different time intervals at about 100 K and 200 K to determine the minimum annealing time.","PeriodicalId":106774,"journal":{"name":"RADECS 97. Fourth European Conference on Radiation and its Effects on Components and Systems (Cat. No.97TH8294)","volume":"68 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-09-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125519252","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
The simulation of the low dose-rate radiation effect in bipolar devices 双极器件低剂量率辐射效应的模拟
V. Pershenkov, S. Cherepko, V. Belyakov, V. Abramov, V. I. Rusanovsky, A. Sogoyan, V. Rogov, V. N. Ulimov, V. Emelianov, V. S. Nasibullin
Experimental techniques for bipolar low dose-rate effect investigation and simulation are presented. The techniques utilize the bulk and peripheral recombination current separation and infrared illumination during high dose-rate laboratory test.
介绍了双极低剂量率效应研究与模拟的实验技术。该技术在高剂量率的实验室测试中利用了本体和外围复合电流分离和红外照明。
{"title":"The simulation of the low dose-rate radiation effect in bipolar devices","authors":"V. Pershenkov, S. Cherepko, V. Belyakov, V. Abramov, V. I. Rusanovsky, A. Sogoyan, V. Rogov, V. N. Ulimov, V. Emelianov, V. S. Nasibullin","doi":"10.1109/RADECS.1997.698846","DOIUrl":"https://doi.org/10.1109/RADECS.1997.698846","url":null,"abstract":"Experimental techniques for bipolar low dose-rate effect investigation and simulation are presented. The techniques utilize the bulk and peripheral recombination current separation and infrared illumination during high dose-rate laboratory test.","PeriodicalId":106774,"journal":{"name":"RADECS 97. Fourth European Conference on Radiation and its Effects on Components and Systems (Cat. No.97TH8294)","volume":"77 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-09-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130336055","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Proton and electron induced damage processes in organic scintillating fibres 有机闪烁纤维中质子和电子诱导的损伤过程
H. Klose, J. Rauchfuss, M. Sprenger, D. Fink, K. Maier, M. Muller, J. Baehr, R. Nahnhauer, F. Niedermeyer
Scintillating organic fibres were irradiated in a short region (1 cm length) with 70 MeV protons or 2.0 MeV electrons under time-compressed conditions. The damage process of scintillating properties was studied in-situ during the irradiation using two spectrometers. It was found that the dyes recover partially during the irradiation and nearly complete within a few days. The in-situ observed data are quite different from long-term radiation effects.
在时间压缩条件下,用70 MeV的质子或2.0 MeV的电子在短区域(1 cm)内照射闪烁有机纤维。利用两台光谱仪对辐照过程中闪烁性能的破坏过程进行了现场研究。发现染料在辐照过程中部分恢复,在几天内几乎完全恢复。现场观测数据与长期辐射效应有很大不同。
{"title":"Proton and electron induced damage processes in organic scintillating fibres","authors":"H. Klose, J. Rauchfuss, M. Sprenger, D. Fink, K. Maier, M. Muller, J. Baehr, R. Nahnhauer, F. Niedermeyer","doi":"10.1109/RADECS.1997.698966","DOIUrl":"https://doi.org/10.1109/RADECS.1997.698966","url":null,"abstract":"Scintillating organic fibres were irradiated in a short region (1 cm length) with 70 MeV protons or 2.0 MeV electrons under time-compressed conditions. The damage process of scintillating properties was studied in-situ during the irradiation using two spectrometers. It was found that the dyes recover partially during the irradiation and nearly complete within a few days. The in-situ observed data are quite different from long-term radiation effects.","PeriodicalId":106774,"journal":{"name":"RADECS 97. Fourth European Conference on Radiation and its Effects on Components and Systems (Cat. No.97TH8294)","volume":"17 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-09-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128071038","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Thermal and field dependencies of latent relaxation processes in irradiated MOS devices 辐照MOS器件中潜在弛豫过程的热场依赖性
V. Emelianov, A. Sogoyan, S.V. Cherepko, O.V. Meshurov, V.N. Ulimov, A. Chumakov, V. Rogov, A. Nikiforov
Latent interface trap buildup, latent positive charge annealing, and molecular hydrogen annealing response of irradiated MOSFET were studied. The mechanisms of latent process and latent processes implications for hardness assurance are discussed.
研究了辐照MOSFET的潜在界面陷阱形成、潜在正电荷退火和分子氢退火响应。讨论了潜在过程的机理和潜在过程对硬度保证的影响。
{"title":"Thermal and field dependencies of latent relaxation processes in irradiated MOS devices","authors":"V. Emelianov, A. Sogoyan, S.V. Cherepko, O.V. Meshurov, V.N. Ulimov, A. Chumakov, V. Rogov, A. Nikiforov","doi":"10.1109/RADECS.1997.698843","DOIUrl":"https://doi.org/10.1109/RADECS.1997.698843","url":null,"abstract":"Latent interface trap buildup, latent positive charge annealing, and molecular hydrogen annealing response of irradiated MOSFET were studied. The mechanisms of latent process and latent processes implications for hardness assurance are discussed.","PeriodicalId":106774,"journal":{"name":"RADECS 97. Fourth European Conference on Radiation and its Effects on Components and Systems (Cat. No.97TH8294)","volume":"39 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-09-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121146770","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 6
期刊
RADECS 97. Fourth European Conference on Radiation and its Effects on Components and Systems (Cat. No.97TH8294)
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