首页 > 最新文献

Advanced Electronic Materials最新文献

英文 中文
Masthead: (Adv. Electron. Mater. 8/2024) 刊头:(Adv.)
IF 5.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-08-09 DOI: 10.1002/aelm.202470029
{"title":"Masthead: (Adv. Electron. Mater. 8/2024)","authors":"","doi":"10.1002/aelm.202470029","DOIUrl":"10.1002/aelm.202470029","url":null,"abstract":"","PeriodicalId":110,"journal":{"name":"Advanced Electronic Materials","volume":"10 8","pages":""},"PeriodicalIF":5.3,"publicationDate":"2024-08-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/aelm.202470029","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141910341","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Optimizing the Ferroelectric Performance of Hf0.5Zr0.5O2 Epitaxial Film by La0.67Sr0.33MnO3 Capping Layer 通过 La0.67Sr0.33MnO3 盖层优化 Hf0.5Zr0.5O2 外延薄膜的铁电性能
IF 5.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-08-05 DOI: 10.1002/aelm.202400136
Kuan Liu, Kai Liu, Xingchang Zhang, Feng Jin, Jie Fang, Enda Hua, Huan Ye, Jinfeng Zhang, Zhengguo Liang, Qiming Lv, Wenbin Wu, Chao Ma, Lingfei Wang

Hafnium-oxide-based ferroelectrics have garnered considerable research interest, primarily for their robust ferroelectricity at the nanoscale and their high compatibility with complementary metal-oxide-semiconductors processes. However, the impact of electrodes on the ferroelectric properties of hafnium-oxide layer, particularly that of top electrodes, is not yet fully understood even in the simplest capacitor geometry. In this study, the La0.67Sr0.33MnO3/Hf0.5Zr0.5O2 (LSMO/HZO) epitaxial heterostructure is utilized as a model system to conduct a systematic comparative study on ferroelectricity between the LSMO/HZO (H-LS) bilayer and LSMO/HZO/LSMO (LS-H-LS) trilayer samples. In comparison to the H-LS sample, the LS-H-LS sample exhibits a more uniform polar domain configuration and larger ferroelectric polarization. Moreover, the LS-H-LS sample exhibits significant improvements in leakage, endurance, and retention. These substantial enhancements in ferroelectricity are likely due to interfacial stress imposed by the LSMO capping layer and its capacity to accommodate extra oxygen vacancies. These results underscore the pivotal role of oxide-based top electrodes in determining the ferroelectricity of hafnium-oxide-based heterostructures, providing crucial insights for optimizing the performance of innovative ferroelectric devices.

基于氧化铪的铁电体已经引起了相当大的研究兴趣,主要是因为它们在纳米尺度上具有强大的铁电性,而且与互补金属氧化物半导体工艺具有很高的兼容性。然而,即使在最简单的电容器几何形状中,电极对氧化铪层铁电特性的影响,尤其是顶部电极的影响,还没有得到充分了解。本研究以 La0.67Sr0.33MnO3/Hf0.5Zr0.5O2 (LSMO/HZO) 外延异质结构为模型系统,对 LSMO/HZO (H-LS) 双层样品和 LSMO/HZO/LSMO (LS-H-LS) 三层样品的铁电性进行了系统比较研究。与 H-LS 样品相比,LS-H-LS 样品表现出更均匀的极域构型和更大的铁电极化。此外,LS-H-LS 样品在漏电、耐久性和保持力方面也有显著改善。这些铁电性的大幅提高可能是由于 LSMO 盖层施加的界面应力及其容纳额外氧空位的能力。这些结果凸显了氧化物基顶层电极在决定氧化铪基异质结构铁电性方面的关键作用,为优化创新铁电器件的性能提供了重要启示。
{"title":"Optimizing the Ferroelectric Performance of Hf0.5Zr0.5O2 Epitaxial Film by La0.67Sr0.33MnO3 Capping Layer","authors":"Kuan Liu,&nbsp;Kai Liu,&nbsp;Xingchang Zhang,&nbsp;Feng Jin,&nbsp;Jie Fang,&nbsp;Enda Hua,&nbsp;Huan Ye,&nbsp;Jinfeng Zhang,&nbsp;Zhengguo Liang,&nbsp;Qiming Lv,&nbsp;Wenbin Wu,&nbsp;Chao Ma,&nbsp;Lingfei Wang","doi":"10.1002/aelm.202400136","DOIUrl":"10.1002/aelm.202400136","url":null,"abstract":"<p>Hafnium-oxide-based ferroelectrics have garnered considerable research interest, primarily for their robust ferroelectricity at the nanoscale and their high compatibility with complementary metal-oxide-semiconductors processes. However, the impact of electrodes on the ferroelectric properties of hafnium-oxide layer, particularly that of top electrodes, is not yet fully understood even in the simplest capacitor geometry. In this study, the La<sub>0.67</sub>Sr<sub>0.33</sub>MnO<sub>3</sub>/Hf<sub>0.5</sub>Zr<sub>0.5</sub>O<sub>2</sub> (LSMO/HZO) epitaxial heterostructure is utilized as a model system to conduct a systematic comparative study on ferroelectricity between the LSMO/HZO (H-LS) bilayer and LSMO/HZO/LSMO (LS-H-LS) trilayer samples. In comparison to the H-LS sample, the LS-H-LS sample exhibits a more uniform polar domain configuration and larger ferroelectric polarization. Moreover, the LS-H-LS sample exhibits significant improvements in leakage, endurance, and retention. These substantial enhancements in ferroelectricity are likely due to interfacial stress imposed by the LSMO capping layer and its capacity to accommodate extra oxygen vacancies. These results underscore the pivotal role of oxide-based top electrodes in determining the ferroelectricity of hafnium-oxide-based heterostructures, providing crucial insights for optimizing the performance of innovative ferroelectric devices.</p>","PeriodicalId":110,"journal":{"name":"Advanced Electronic Materials","volume":"10 10","pages":""},"PeriodicalIF":5.3,"publicationDate":"2024-08-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/aelm.202400136","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141895212","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Printed Memristors: An Overview of Ink, Materials, Deposition Techniques, and Applications 印刷型 Memristors:油墨、材料、沉积技术和应用概述
IF 5.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-08-02 DOI: 10.1002/aelm.202400212
Miguel Franco, Asal Kiazadeh, Rodrigo Martins, Senentxu Lanceros-Méndez, Emanuel Carlos

Industry 4.0 is accelerating the growth of connected devices, resulting in an exponential increase in generated data. The current semiconductor technology is facing challenges in miniaturization and power consumption, demanding for more efficient computation where new materials and devices need to be implemented. One of the most promising candidates for the next technological leap is the memristor. Due to their up-scale manufacturing, the majority of memristors employed conventional deposition techniques (physical and chemical vapor deposition), which can be highly costly. Recently, printed memristors have gained a lot of attention because of their potential for large-scale, fast, and affordable manufacturing. They can also help to reduce material waste, which supports the transition to a more sustainable and environmentally friendly economy. This review provides a perspective on the potential of printed electronics in the fabrication of memristive devices, presenting an overview of the main printing techniques, most suitable for memristors development. Additionally, it focuses on the materials used for the switching layer by comparing its performance. Ultimately, the application of printed memristors is highlighted by showing the tremendous evolution in this field, as well as the main challenges and opportunities that printed memristors are expected to face in the following years.

工业 4.0 正在加速互联设备的增长,导致生成的数据呈指数级增长。当前的半导体技术正面临着微型化和功耗方面的挑战,需要更高效的计算,因此需要采用新材料和新器件。忆阻器是最有希望实现下一次技术飞跃的候选器件之一。由于需要大规模制造,大多数忆阻器都采用了传统的沉积技术(物理和化学气相沉积),成本非常高昂。最近,印刷忆阻器因其大规模、快速和经济实惠的制造潜力而备受关注。它们还有助于减少材料浪费,从而支持向更可持续、更环保的经济转型。本综述从印刷电子技术在制造忆阻器方面的潜力的角度,概述了最适合开发忆阻器的主要印刷技术。此外,还通过比较开关层所用材料的性能,重点介绍了这些材料。最后,通过展示印刷忆阻器在这一领域的巨大发展,以及印刷忆阻器在未来几年将面临的主要挑战和机遇,重点介绍了印刷忆阻器的应用。
{"title":"Printed Memristors: An Overview of Ink, Materials, Deposition Techniques, and Applications","authors":"Miguel Franco,&nbsp;Asal Kiazadeh,&nbsp;Rodrigo Martins,&nbsp;Senentxu Lanceros-Méndez,&nbsp;Emanuel Carlos","doi":"10.1002/aelm.202400212","DOIUrl":"10.1002/aelm.202400212","url":null,"abstract":"<p>Industry 4.0 is accelerating the growth of connected devices, resulting in an exponential increase in generated data. The current semiconductor technology is facing challenges in miniaturization and power consumption, demanding for more efficient computation where new materials and devices need to be implemented. One of the most promising candidates for the next technological leap is the memristor. Due to their up-scale manufacturing, the majority of memristors employed conventional deposition techniques (physical and chemical vapor deposition), which can be highly costly. Recently, printed memristors have gained a lot of attention because of their potential for large-scale, fast, and affordable manufacturing. They can also help to reduce material waste, which supports the transition to a more sustainable and environmentally friendly economy. This review provides a perspective on the potential of printed electronics in the fabrication of memristive devices, presenting an overview of the main printing techniques, most suitable for memristors development. Additionally, it focuses on the materials used for the switching layer by comparing its performance. Ultimately, the application of printed memristors is highlighted by showing the tremendous evolution in this field, as well as the main challenges and opportunities that printed memristors are expected to face in the following years.</p>","PeriodicalId":110,"journal":{"name":"Advanced Electronic Materials","volume":"10 10","pages":""},"PeriodicalIF":5.3,"publicationDate":"2024-08-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/aelm.202400212","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141877643","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Advancement in Carbon Nanotubes Optoelectronic Devices for Terahertz and Infrared Applications 太赫兹和红外应用领域碳纳米管光电器件的进展
IF 5.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-07-26 DOI: 10.1002/aelm.202400124
Yue Wang, Guangcheng Sun, Xiaoju Zhang, Xiang Zhang, Zijian cui

Benefiting from the outstanding optical, thermal, electrical, and mechanical properties, carbon nanotubes (CNTs) hold significant potential in the fields of materials, physics, chemistry, biology, as well as emerging disciplines such as electronics and optoelectronics. This paper provides a comprehensive review of the latest developments of CNTs optoelectronic devices operating in the terahertz (THz) and infrared (IR) wave range. At the beginning of this review, the unique structural characteristics of CNTs are introduced, overviewing their fundamental electronic structure, and emphasizing their impact on optoelectronics behavior. Further, on various synthesis techniques are discussion employed for the growth of single nanotube and the preparation of CNTs films. The penultimate section, the optical properties of CNTs are analyzed within the THz and IR spectral region and overview the application of THz time-domain spectroscopy in extracting key material parameters of CNTs, and further discuss the theoretical models describing THz conductivity in CNTs. In the end, the most promising CNTs-based device concepts are highlighted for sources, detectors, modulators, absorbers, and sensors within in THz and IR frequency band. This comprehensive review provides a valuable insight into the utilization of CNTs across various aspects of THz and IR optoelectronic devices.

得益于出色的光学、热学、电学和机械特性,碳纳米管(CNTs)在材料、物理学、化学、生物学以及电子学和光电子学等新兴学科领域具有巨大潜力。本文全面综述了在太赫兹(THz)和红外(IR)波段工作的 CNTs 光电器件的最新发展。文章首先介绍了碳纳米管的独特结构特征,概述了其基本电子结构,并强调了其对光电行为的影响。此外,还讨论了用于生长单根纳米管和制备 CNTs 薄膜的各种合成技术。倒数第二部分分析了 CNT 在太赫兹和红外光谱区域内的光学特性,概述了太赫兹时域光谱在提取 CNT 关键材料参数方面的应用,并进一步讨论了描述 CNT 太赫兹传导性的理论模型。最后,重点介绍了太赫兹和红外频段中最有前景的基于 CNTs 的源器件、探测器、调制器、吸收器和传感器概念。这篇全面的综述为我们深入了解太赫兹和红外光电子器件各方面对碳纳米管的利用提供了宝贵的资料。
{"title":"Advancement in Carbon Nanotubes Optoelectronic Devices for Terahertz and Infrared Applications","authors":"Yue Wang,&nbsp;Guangcheng Sun,&nbsp;Xiaoju Zhang,&nbsp;Xiang Zhang,&nbsp;Zijian cui","doi":"10.1002/aelm.202400124","DOIUrl":"10.1002/aelm.202400124","url":null,"abstract":"<p>Benefiting from the outstanding optical, thermal, electrical, and mechanical properties, carbon nanotubes (CNTs) hold significant potential in the fields of materials, physics, chemistry, biology, as well as emerging disciplines such as electronics and optoelectronics. This paper provides a comprehensive review of the latest developments of CNTs optoelectronic devices operating in the terahertz (THz) and infrared (IR) wave range. At the beginning of this review, the unique structural characteristics of CNTs are introduced, overviewing their fundamental electronic structure, and emphasizing their impact on optoelectronics behavior. Further, on various synthesis techniques are discussion employed for the growth of single nanotube and the preparation of CNTs films. The penultimate section, the optical properties of CNTs are analyzed within the THz and IR spectral region and overview the application of THz time-domain spectroscopy in extracting key material parameters of CNTs, and further discuss the theoretical models describing THz conductivity in CNTs. In the end, the most promising CNTs-based device concepts are highlighted for sources, detectors, modulators, absorbers, and sensors within in THz and IR frequency band. This comprehensive review provides a valuable insight into the utilization of CNTs across various aspects of THz and IR optoelectronic devices.</p>","PeriodicalId":110,"journal":{"name":"Advanced Electronic Materials","volume":"10 10","pages":""},"PeriodicalIF":5.3,"publicationDate":"2024-07-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/aelm.202400124","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141768547","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Performance Enhancement of Tricalcium Phosphate Film for Bioelectronics with Bio-Friendly Supercritical Fluids Desorption Technology 利用生物友好型超临界流体解吸技术提高生物电子学用磷酸三钙薄膜的性能
IF 5.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-07-23 DOI: 10.1002/aelm.202400066
Zehui Peng, Mingqiang Wang, Lei Li, Xinqing Duan, Huangbai Liu, Mingge Wang, Jie Wang, Chang-Kuan Chang

In the rapidly advancing field of bioelectronics, searching for materials that combine superior insulating properties with biocompatibility is crucial, especially for implantable electronic devices. Traditional insulators in mature CMOS processes, though effective, lack biocompatibility, necessitating the exploration of alternative materials. This study introduces tricalcium phosphate (Ca3(PO4)2), a primary component of human bones, and teeth, as an insulating layer material for the first time. High-quality, thickness-controlled Ca3(PO4)2 films are fabricated using magnetron sputtering, and their electrical insulation, stability, and optical transparency have been thoroughly evaluated. To further optimize the insulation performance of Ca3(PO4)2, particularly against residual impurities, and fabrication-induced defects, a bio-friendly low-temperature supercritical fluid desorption (LTSCF-Desorption) technique is developed, effectively removing impurities, repairing defects, and improving the interface states. After LTSCF-Desorption treatment, the leakage current of the Ca3(PO4)2 films is reduced by 30%, along with the enhancements of the films' stability and transmittance. Further material analysis clarified the internal mechanisms behind the improvement of the Ca3(PO4)2 films. Overall, this study not only broadens the application scenarios of Ca3(PO4)2 in bioelectronics but also develops a bio-friendly supercritical desorption technique, providing a new pathway for optimizing the performance of bioelectronic devices and materials.

在飞速发展的生物电子学领域,寻找兼具优异绝缘性能和生物兼容性的材料至关重要,尤其是对于植入式电子设备而言。成熟 CMOS 工艺中的传统绝缘体虽然有效,但缺乏生物兼容性,因此有必要探索替代材料。本研究首次将人类骨骼和牙齿的主要成分磷酸三钙(Ca3(PO4)2)引入绝缘层材料。研究人员利用磁控溅射技术制作了高质量、厚度可控的 Ca3(PO4)2 薄膜,并对其电绝缘性能、稳定性和光学透明度进行了全面评估。为了进一步优化 Ca3(PO4)2 的绝缘性能,特别是针对残留杂质和制造引起的缺陷,开发了一种生物友好型低温超临界流体解吸(LTSCF-Desorption)技术,可有效去除杂质、修复缺陷并改善界面状态。经过 LTSCF-解吸处理后,Ca3(PO4)2 薄膜的漏电流降低了 30%,同时薄膜的稳定性和透射率也得到了提高。进一步的材料分析阐明了 Ca3(PO4)2 薄膜改善背后的内部机制。总之,这项研究不仅拓宽了 Ca3(PO4)2 在生物电子学中的应用范围,而且开发了一种生物友好型超临界解吸技术,为优化生物电子器件和材料的性能提供了一条新途径。
{"title":"Performance Enhancement of Tricalcium Phosphate Film for Bioelectronics with Bio-Friendly Supercritical Fluids Desorption Technology","authors":"Zehui Peng,&nbsp;Mingqiang Wang,&nbsp;Lei Li,&nbsp;Xinqing Duan,&nbsp;Huangbai Liu,&nbsp;Mingge Wang,&nbsp;Jie Wang,&nbsp;Chang-Kuan Chang","doi":"10.1002/aelm.202400066","DOIUrl":"10.1002/aelm.202400066","url":null,"abstract":"<p>In the rapidly advancing field of bioelectronics, searching for materials that combine superior insulating properties with biocompatibility is crucial, especially for implantable electronic devices. Traditional insulators in mature CMOS processes, though effective, lack biocompatibility, necessitating the exploration of alternative materials. This study introduces tricalcium phosphate (Ca<sub>3</sub>(PO<sub>4</sub>)<sub>2</sub>), a primary component of human bones, and teeth, as an insulating layer material for the first time. High-quality, thickness-controlled Ca<sub>3</sub>(PO<sub>4</sub>)<sub>2</sub> films are fabricated using magnetron sputtering, and their electrical insulation, stability, and optical transparency have been thoroughly evaluated. To further optimize the insulation performance of Ca<sub>3</sub>(PO<sub>4</sub>)<sub>2</sub>, particularly against residual impurities, and fabrication-induced defects, a bio-friendly low-temperature supercritical fluid desorption (LTSCF-Desorption) technique is developed, effectively removing impurities, repairing defects, and improving the interface states. After LTSCF-Desorption treatment, the leakage current of the Ca<sub>3</sub>(PO<sub>4</sub>)<sub>2</sub> films is reduced by 30%, along with the enhancements of the films' stability and transmittance. Further material analysis clarified the internal mechanisms behind the improvement of the Ca<sub>3</sub>(PO<sub>4</sub>)<sub>2</sub> films. Overall, this study not only broadens the application scenarios of Ca<sub>3</sub>(PO<sub>4</sub>)<sub>2</sub> in bioelectronics but also develops a bio-friendly supercritical desorption technique, providing a new pathway for optimizing the performance of bioelectronic devices and materials.</p>","PeriodicalId":110,"journal":{"name":"Advanced Electronic Materials","volume":"10 9","pages":""},"PeriodicalIF":5.3,"publicationDate":"2024-07-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/aelm.202400066","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141754376","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Acceleration and Deceleration Behavior of Skyrmion Controlled by Curvature Gradient in Elliptical-Ring Track 用曲率梯度控制 Skyrmion 在椭圆环形轨道上的加速和减速行为
IF 5.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-07-18 DOI: 10.1002/aelm.202400080
Na Cai, Yan Liu

The potential of skyrmions as information carriers in spintronic devices has garnered significant attention. In this paper, the study investigates the current driven movement behavior of skyrmions in elliptical-ring tracks (ERTs). The findings suggest that the curvature gradient of ERTs can either increase or decrease skyrmion velocity. The increase in velocity aids in transmitting skyrmions, while the decrease in velocity helps in intercepting them. Based on the transmission and interception of skyrmion controlled by the curvature gradient of the ERT, the study has designed diode, logic NOT, AND, and OR gates. The feasibility and robustness of these devices are demonstrated through micromagnetic simulations. The research provides valuable insights and recommendations for designing skyrmion-based devices with curved geometries.

在自旋电子器件中,天离子作为信息载体的潜力已引起人们的极大关注。本文研究了椭圆环轨道(ERT)中电流驱动的天体运动行为。研究结果表明,椭圆环轨道的曲率梯度可以提高或降低天离子的速度。速度的增加有助于发射天雷子,而速度的降低则有助于拦截天雷子。根据 ERT 曲率梯度控制的天空粒子传输和拦截,研究设计了二极管、逻辑 NOT、AND 和 OR 门。通过微磁模拟,证明了这些装置的可行性和稳健性。这项研究为设计具有弯曲几何形状的基于天离子的器件提供了宝贵的见解和建议。
{"title":"Acceleration and Deceleration Behavior of Skyrmion Controlled by Curvature Gradient in Elliptical-Ring Track","authors":"Na Cai,&nbsp;Yan Liu","doi":"10.1002/aelm.202400080","DOIUrl":"10.1002/aelm.202400080","url":null,"abstract":"<p>The potential of skyrmions as information carriers in spintronic devices has garnered significant attention. In this paper, the study investigates the current driven movement behavior of skyrmions in elliptical-ring tracks (ERTs). The findings suggest that the curvature gradient of ERTs can either increase or decrease skyrmion velocity. The increase in velocity aids in transmitting skyrmions, while the decrease in velocity helps in intercepting them. Based on the transmission and interception of skyrmion controlled by the curvature gradient of the ERT, the study has designed diode, logic NOT, AND, and OR gates. The feasibility and robustness of these devices are demonstrated through micromagnetic simulations. The research provides valuable insights and recommendations for designing skyrmion-based devices with curved geometries.</p>","PeriodicalId":110,"journal":{"name":"Advanced Electronic Materials","volume":"10 10","pages":""},"PeriodicalIF":5.3,"publicationDate":"2024-07-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/aelm.202400080","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141726116","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Ultrahigh Performance UV Photodetector by Inserting an Al2O3 Nanolayer in NiO/n-Si 通过在镍氧化物/n-硅中插入 Al2O3 纳米层实现超高性能紫外线光电探测器
IF 5.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-07-15 DOI: 10.1002/aelm.202300909
Xingzhao Ma, Libin Tang, Menghan Jia, Yuping Zhang, Wenbin Zuo, Yuhua Cai, Rui Li, Liqing Yang, Kar Seng Teng

Ultraviolet (UV) photodetectors have gained much attention due to their numerous important applications ranging from environmental monitoring to space communication. To date, most p-NiO/n-Si heterojunction photodetectors (HPDs) exhibit poor UV responsivity and slow response. This is mainly due to a small valence band offset (ΔEV) at the NiO/Si interface and a high density of dangling bonds at the silicon surface. Herein, an UV HPD consisting of NiO/Al2O3/n-Si is fabricated using magnetron sputtering technique. The HPD has a large rectification ratio of 2.4 × 105. It also exhibits excellent UV responsivity (R) of 15.8 A/W at −5 V and and detectivity (D*) of 1.14 × 1013 Jones at −4 V, respectively. The excellent performance of the HPD can be attributed to the defect passivation at the interfaces of the heterojunction and the efficient separation of photogenerated carriers by the Al2O3 nanolayer. The external quantum efficiency (EQE) of the HPD as high as 5.4 × 103%, hence implying a large optical gain due to carrier proliferation resulting from impact ionization. Furthermore, the ultrafast response speed with a rise time of 80 µs and a decay time of 184 µs are obtained.

紫外线(UV)光电探测器因其从环境监测到空间通信等众多重要应用而备受关注。迄今为止,大多数 p-NiO/n-Si 异质结光电探测器(HPD)的紫外响应性较差,响应速度较慢。这主要是由于氧化镍/硅界面的价带偏移(ΔEV)较小,以及硅表面的悬空键密度较高。在此,利用磁控溅射技术制造了一种由 NiO/Al2O3/n-Si 组成的 UV HPD。这种 HPD 的整流比高达 2.4 × 105。它还表现出优异的紫外响应率(R),在 -5 V 时为 15.8 A/W ,在 -4 V 时的检测率(D*)为 1.14 × 1013 Jones。HPD 的优异性能可归功于异质结界面上的缺陷钝化以及 Al2O3 纳米层对光生载流子的有效分离。HPD 的外部量子效率(EQE)高达 5.4 × 103%,这意味着撞击电离产生的载流子增殖带来了巨大的光增益。此外,还获得了上升时间为 80 微秒、衰减时间为 184 微秒的超快响应速度。
{"title":"Ultrahigh Performance UV Photodetector by Inserting an Al2O3 Nanolayer in NiO/n-Si","authors":"Xingzhao Ma,&nbsp;Libin Tang,&nbsp;Menghan Jia,&nbsp;Yuping Zhang,&nbsp;Wenbin Zuo,&nbsp;Yuhua Cai,&nbsp;Rui Li,&nbsp;Liqing Yang,&nbsp;Kar Seng Teng","doi":"10.1002/aelm.202300909","DOIUrl":"10.1002/aelm.202300909","url":null,"abstract":"<p>Ultraviolet (UV) photodetectors have gained much attention due to their numerous important applications ranging from environmental monitoring to space communication. To date, most p-NiO/n-Si heterojunction photodetectors (HPDs) exhibit poor UV responsivity and slow response. This is mainly due to a small valence band offset (Δ<i>E</i><sub>V</sub>) at the NiO/Si interface and a high density of dangling bonds at the silicon surface. Herein, an UV HPD consisting of NiO/Al<sub>2</sub>O<sub>3</sub>/n-Si is fabricated using magnetron sputtering technique. The HPD has a large rectification ratio of 2.4 × 10<sup>5</sup>. It also exhibits excellent UV responsivity (<i>R</i>) of 15.8 A/W at −5 V and and detectivity (<i>D*</i>) of 1.14 × 10<sup>13</sup> Jones at −4 V, respectively. The excellent performance of the HPD can be attributed to the defect passivation at the interfaces of the heterojunction and the efficient separation of photogenerated carriers by the Al<sub>2</sub>O<sub>3</sub> nanolayer. The external quantum efficiency (<i>EQE</i>) of the HPD as high as 5.4 × 10<sup>3</sup>%, hence implying a large optical gain due to carrier proliferation resulting from impact ionization. Furthermore, the ultrafast response speed with a rise time of 80 µs and a decay time of 184 µs are obtained.</p>","PeriodicalId":110,"journal":{"name":"Advanced Electronic Materials","volume":"10 9","pages":""},"PeriodicalIF":5.3,"publicationDate":"2024-07-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/aelm.202300909","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141624852","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Secondary Order RC Sensor Neuron Circuit for Direct Input Encoding in Spiking Neural Network 用于尖峰神经网络直接输入编码的二级阶 RC 传感器神经元电路
IF 5.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-07-11 DOI: 10.1002/aelm.202400075
Simiao Yang, Deli Li, Jiuchao Feng, Binchen Gong, Qing Song, Yue Wang, Zhen Yang, Yonghua Chen, Qi Chen, Wei Huang

In spiking neural networks (SNNs), artificial sensor neurons are crucial for converting real-world analog information into encoded spikes. However, existing SNNs face challenges due to the inefficient implementation of input sensor neurons. Here, this study proposes an SNN-compatible spike mode sensor, designed to directly convert analog current signals into real-time encoded spikes, feeding the SNN concurrently. The input sensor neuron is realized using a stable neuron circuit employing a threshold switching (TS) memristor and secondary order RC block. This design enables time delay-free spike firing, operates at low voltage, and offers a wide signal sensing range. Furthermore, this study presents an expression delineating the relationship between the pulse emission properties of the circuit and the parameters of its components, laying the basis for circuit components design and development. Analytical analysis confirms the sensor's efficacy in implementing rate-based and time-to-first spike encoding schemes. Integrating the sensor into SNNs as the input layer for image training and recognition tasks yields an impressive accuracy of 87.58% on the MNIST dataset, showcasing its applicability as a crucial interface between the physical world and the SNN framework.

在尖峰神经网络(SNN)中,人工传感器神经元对于将真实世界的模拟信息转换为编码尖峰至关重要。然而,由于输入传感器神经元的实现效率低下,现有的尖峰神经网络面临着挑战。在此,本研究提出了一种与 SNN 兼容的尖峰模式传感器,旨在将模拟电流信号直接转换为实时编码尖峰信号,并同时为 SNN 供电。输入传感器神经元是通过采用阈值开关(TS)忆阻器和二级阶 RC 块的稳定神经元电路实现的。这种设计实现了无时间延迟的尖峰发射,工作电压低,信号感应范围广。此外,这项研究还提出了一个表达式,描述了电路的脉冲发射特性与其元件参数之间的关系,为电路元件的设计和开发奠定了基础。分析证实了传感器在实施基于速率和时间-首次尖峰编码方案方面的功效。将传感器集成到 SNN 中作为图像训练和识别任务的输入层,在 MNIST 数据集上获得了令人印象深刻的 87.58% 的准确率,展示了其作为物理世界和 SNN 框架之间重要接口的适用性。
{"title":"Secondary Order RC Sensor Neuron Circuit for Direct Input Encoding in Spiking Neural Network","authors":"Simiao Yang,&nbsp;Deli Li,&nbsp;Jiuchao Feng,&nbsp;Binchen Gong,&nbsp;Qing Song,&nbsp;Yue Wang,&nbsp;Zhen Yang,&nbsp;Yonghua Chen,&nbsp;Qi Chen,&nbsp;Wei Huang","doi":"10.1002/aelm.202400075","DOIUrl":"10.1002/aelm.202400075","url":null,"abstract":"<p>In spiking neural networks (SNNs), artificial sensor neurons are crucial for converting real-world analog information into encoded spikes. However, existing SNNs face challenges due to the inefficient implementation of input sensor neurons. Here, this study proposes an SNN-compatible spike mode sensor, designed to directly convert analog current signals into real-time encoded spikes, feeding the SNN concurrently. The input sensor neuron is realized using a stable neuron circuit employing a threshold switching (TS) memristor and secondary order RC block. This design enables time delay-free spike firing, operates at low voltage, and offers a wide signal sensing range. Furthermore, this study presents an expression delineating the relationship between the pulse emission properties of the circuit and the parameters of its components, laying the basis for circuit components design and development. Analytical analysis confirms the sensor's efficacy in implementing rate-based and time-to-first spike encoding schemes. Integrating the sensor into SNNs as the input layer for image training and recognition tasks yields an impressive accuracy of 87.58% on the MNIST dataset, showcasing its applicability as a crucial interface between the physical world and the SNN framework.</p>","PeriodicalId":110,"journal":{"name":"Advanced Electronic Materials","volume":"10 10","pages":""},"PeriodicalIF":5.3,"publicationDate":"2024-07-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/aelm.202400075","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141597452","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Volatile and Nonvolatile Dual-Mode Switching Operations in an Ag-Ag2S Core-Shell Nanoparticle Atomic Switch Network Ag-Ag2S 核壳纳米粒子原子开关网络中的挥发性和非挥发性双模开关操作
IF 5.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-07-10 DOI: 10.1002/aelm.202300709
Oradee Srikimkaew, Saverio Ricci, Matteo Porzani, Thien Tan Dang, Yusuke Nakaoka, Yuki Usami, Daniele Ielmini, Hirofumi Tanaka

This paper proposes a nanoparticle-based atomic switch network memristive device, capable of both volatile and nonvolatile switching operations, which have not been previously reported for this material. The operational modes can be determined by altering the compliance current, demonstrating high stability over 100 cycles. Analysis of the conduction mechanism using IV curves reveals switching characteristics consistent with space-charge-limited current conduction during the set process and ohmic behavior in the reset state. Furthermore, this study analyzes these dual-operational modes in devices with varying electrode spacings. The results indicate that a wider spacing necessitated a higher compliance current for the volatile-to-nonvolatile transition, underscoring the significance of interconnection. These findings facilitate the integration of neuron and synapse functions within a single atomic switch network device, thereby advancing neuromorphic systems.

本文提出了一种基于纳米粒子的原子开关网络忆阻器,能够同时进行易失性和非易失性开关操作,这种材料以前从未报道过。操作模式可通过改变顺应电流来确定,在 100 个周期内表现出很高的稳定性。利用 I-V 曲线对传导机制进行的分析表明,开关特性与设定过程中的空间电荷限制电流传导和复位状态下的欧姆行为一致。此外,本研究还分析了不同电极间距器件中的这些双重工作模式。结果表明,更宽的间距需要更高的顺应电流来实现挥发性到非挥发性的转换,这突出了互连的重要性。这些发现有助于将神经元和突触功能整合到单个原子开关网络装置中,从而推动神经形态系统的发展。
{"title":"Volatile and Nonvolatile Dual-Mode Switching Operations in an Ag-Ag2S Core-Shell Nanoparticle Atomic Switch Network","authors":"Oradee Srikimkaew,&nbsp;Saverio Ricci,&nbsp;Matteo Porzani,&nbsp;Thien Tan Dang,&nbsp;Yusuke Nakaoka,&nbsp;Yuki Usami,&nbsp;Daniele Ielmini,&nbsp;Hirofumi Tanaka","doi":"10.1002/aelm.202300709","DOIUrl":"10.1002/aelm.202300709","url":null,"abstract":"<p>This paper proposes a nanoparticle-based atomic switch network memristive device, capable of both volatile and nonvolatile switching operations, which have not been previously reported for this material. The operational modes can be determined by altering the compliance current, demonstrating high stability over 100 cycles. Analysis of the conduction mechanism using <i>I</i>–<i>V</i> curves reveals switching characteristics consistent with space-charge-limited current conduction during the set process and ohmic behavior in the reset state. Furthermore, this study analyzes these dual-operational modes in devices with varying electrode spacings. The results indicate that a wider spacing necessitated a higher compliance current for the volatile-to-nonvolatile transition, underscoring the significance of interconnection. These findings facilitate the integration of neuron and synapse functions within a single atomic switch network device, thereby advancing neuromorphic systems.</p>","PeriodicalId":110,"journal":{"name":"Advanced Electronic Materials","volume":"10 10","pages":""},"PeriodicalIF":5.3,"publicationDate":"2024-07-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/aelm.202300709","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141566500","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Masthead: (Adv. Electron. Mater. 7/2024) 刊头:(Adv.)
IF 5.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-07-10 DOI: 10.1002/aelm.202470027
{"title":"Masthead: (Adv. Electron. Mater. 7/2024)","authors":"","doi":"10.1002/aelm.202470027","DOIUrl":"https://doi.org/10.1002/aelm.202470027","url":null,"abstract":"","PeriodicalId":110,"journal":{"name":"Advanced Electronic Materials","volume":"10 7","pages":""},"PeriodicalIF":5.3,"publicationDate":"2024-07-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/aelm.202470027","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141583742","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
期刊
Advanced Electronic Materials
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1