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AI-Assisted Bioelectronics for Personalized Health Management 用于个性化健康管理的人工智能辅助生物电子学
IF 5.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2026-01-12 DOI: 10.1002/aelm.202500744
Huiwen Xiong, Changhao Dai, Xuting Chen, Jilie Kong, Dacheng Wei, Xueen Fang, Wenhao Weng

Personalized health management aims to promote, maintain, and restore the health of individuals. Despite the ever-lasting research efforts involved in personalized healthcare bioelectronics, current healthcare platforms still face barriers such as costly facilities, specialized operations, and resource-limited applications. Therefore, personalized and user-friendly healthcare bioelectronics are urgently needed. Among emerging solutions, the integration of artificial intelligence (AI) and advanced bioelectronics is a pivotal approach that merges intelligent algorithms with multi-functional healthcare design. This review summarizes the latest advances in AI-assisted bioelectronics, aiming to provide a possible strategy for personalized healthcare applications. Initially, a brief survey is provided to discuss the material design, device fabrication, AI-hardware integration, and performance assessment of AI-assisted bioelectronics. The subsequent contents focus on the implementation of AI-assisted healthcare bioelectronics across health monitoring, early diagnosis, therapeutic treatment, and rehabilitation. Finally, we discuss the current challenges and prospective future developments in closed-loop healthcare bioelectronics, ultimately empowering individuals with control over their own health.

个性化健康管理旨在促进、维护和恢复个人的健康。尽管个性化医疗保健生物电子学的研究工作持续不断,但目前的医疗保健平台仍然面临着诸如昂贵的设施、专业操作和资源有限的应用等障碍。因此,个性化和人性化的医疗保健生物电子学是迫切需要的。在新兴的解决方案中,人工智能(AI)和先进生物电子学的集成是将智能算法与多功能医疗保健设计相结合的关键方法。本文综述了人工智能辅助生物电子学的最新进展,旨在为个性化医疗保健应用提供可能的策略。首先,简要介绍了人工智能辅助生物电子学的材料设计、器件制造、人工智能硬件集成和性能评估。随后的内容侧重于在健康监测、早期诊断、治疗治疗和康复方面实施人工智能辅助医疗保健生物电子。最后,我们讨论了闭环医疗保健生物电子学的当前挑战和未来发展前景,最终使个人能够控制自己的健康。
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引用次数: 0
High-Performance and Energy-Efficient Sub-5 nm 2D Double-Gate MOSFETs Based on Silicon Arsenide Monolayers 基于砷化硅单层的高性能、高能效sub - 5nm二维双栅mosfet
IF 6.2 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2026-01-12 DOI: 10.1002/aelm.202500701
Dogukan Hazar Ozbey, Engin Durgun
The continuous demand for high-performance (HP), energy-efficient transistors is driving research beyond conventional silicon-based metal-oxide-semiconductor field-effect transistors (MOSFETs), which face critical scaling limits. To address this challenge, new channel materials and device architectures are being explored. Here, we investigate sub-5 nm double-gate (DG) MOSFETs based on 2D SiAs using first-principles calculations combined with the non-equilibrium Green's function (NEGF) formalism. SiAs monolayers exhibit an indirect bandgap of 1.58 eV and favorable electronic characteristics for device applications. We evaluate key performance metrics, including the on/off current ratio (Ion/Ioff), subthreshold swing (SS), gate capacitance (Cg), intrinsic delay time (τ), and power–delay product (PDP). Underlap (UL) architectures with 1–2 nm extensions enhance device performance, yielding on-state currents (Ion) up to 1206 µA µm−1, in line with the International Technology Roadmap for Semiconductors (ITRS) 2028 HP requirements. The SS values (112–142 mV dec−1) together with minimized τ and PDP indicate the suitability of SiAs transistors for ultra-scaled, energy-efficient technologies. Our findings highlight 2D SiAs as a promising candidate to overcome the scaling challenges of traditional MOSFETs and to advance next-generation semiconductor devices.
对高性能(HP)、高能效晶体管的持续需求推动了传统硅基金属氧化物半导体场效应晶体管(mosfet)的研究,后者面临着关键的缩放限制。为了应对这一挑战,人们正在探索新的通道材料和器件架构。在这里,我们使用第一性原理计算结合非平衡格林函数(NEGF)形式来研究基于二维SiAs的sub- 5nm双栅(DG) mosfet。SiAs单层具有1.58 eV的间接带隙和良好的电子特性,适合器件应用。我们评估了关键性能指标,包括开/关电流比(Ion/Ioff)、亚阈值摆幅(SS)、栅极电容(Cg)、固有延迟时间(τ)和功率延迟积(PDP)。1 - 2 nm扩展的Underlap (UL)架构可提高器件性能,产生高达1206 μ A μ m−1的导通电流(Ion),符合国际半导体技术路线图(ITRS) 2028 HP要求。SS值(112-142 mV dec−1)以及最小化τ和PDP表明SiAs晶体管适合超尺度节能技术。我们的研究结果突出了2D SiAs作为克服传统mosfet缩放挑战和推进下一代半导体器件的有希望的候选者。
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引用次数: 0
Pinch-Off Mechanism of High-Gain Organic Transistors with Field Plates: Statistical Analysis, Device Simulations and Compact Modeling 具有场极板的高增益有机晶体管的掐断机制:统计分析、器件仿真和紧凑建模
IF 5.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2026-01-10 DOI: 10.1002/aelm.202500585
Kazuki Ono, Ryota Kobayashi, Eva Bestelink, Radu A. Sporea, Satoru Inoue, Yudai Hemmi, Yuji Ikeda, Tatsuo Hasegawa, Hiroyuki Matsui

A field plate is a grounded metal layer underneath the source electrode in thin-film transistors (TFTs) and was found to significantly reduce pinch-off voltage and enhance intrinsic gain (up to 320) of inkjet-printed organic TFTs. The operating mechanism was investigated through automated fabrication and statistical analysis of over 3000 devices with various channel length (L) and field plate length (Lfp​). Crucially, in the saturation regime, transconductance and drain current were governed by Lfp​ rather than L. We propose and validate a new theoretical model, supported by device simulations, which demonstrates that pinch-off occurs not at the drain or source, but at the edge of the field plate. This novel mechanism explains the observed low pinch-off voltage and suggests that device performance can be improved through miniaturization, offering a key advantage over conventional high-gain architectures like source-gated transistors. In addition, the field plate enables to control pinch-off voltage simply by layout change, providing functional versatility. Finally, a compact model was developed to facilitate the design of high-performance printed analog circuits, highlighting the potential of these devices for future flexible electronics.

场极板是薄膜晶体管(TFTs)中源电极下方的接地金属层,可以显著降低针脚电压并提高喷墨印刷有机TFTs的固有增益(高达320)。通过对3000多个具有不同通道长度(L)和场板长度(Lfp)的器件的自动化制造和统计分析,研究了其工作机理。关键是,在饱和状态下,跨导和漏极电流由Lfp而不是l控制。我们提出并验证了一个新的理论模型,该模型得到了器件仿真的支持,该模型证明了掐断不是发生在漏极或源极,而是发生在场板的边缘。这种新机制解释了所观察到的低截断电压,并表明器件性能可以通过小型化来提高,提供了优于传统高增益架构(如源门控晶体管)的关键优势。此外,磁场板可以通过简单的布局改变来控制引脚电压,提供功能上的多功能性。最后,开发了一个紧凑的模型,以促进高性能印刷模拟电路的设计,突出了这些器件在未来柔性电子产品中的潜力。
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引用次数: 0
Robust C–V Ratio Technique for Profiling Defects in Proton-Irradiated 4H-SiC 质子辐照4H - SiC缺陷谱分析的稳健C-V比技术
IF 5.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2026-01-10 DOI: 10.1002/aelm.202500601
Kibeom Kim, Sung Yun Woo, Jeong Hyun Moon, Young Jun Yoon, Jae Hwa Seo

Silicon carbide (SiC) power devices possess exceptional electrical and thermal properties, making them strong candidates for deployment in extreme environments such as space. However, displacement damage induced by high-energy particles remains a critical factor that can compromise long-term reliability, underscoring the need for accurate defect characterization. Conventional C–V doping-profile extraction uses numerical differentiation, which amplifies measurement noise and reduces accuracy and reproducibility. We present an analytical model that removes numerical differentiation by using the ratio of C–V characteristics measured before and after irradiation. This approach enables direct, stable, quantitative extraction of net radiation-induced trap density. To validate the method, we irradiate 4H-SiC Schottky barrier diodes with 55 MeV protons at a fluence of 1 × 1014 cm−2 and compare the extracted trap densities with those from the conventional differentiation-based technique to assess consistency and robustness. Furthermore, based on the extracted trap-density profiles, we introduce a formula for determining an effective trap energy level parameter, which serves as a diagnostic indicator for identifying the dominant displacement-damage mechanisms under high-energy proton irradiation. The proposed analytical model operates at room temperature, requires standard C–V measurements, and serves as a fast, accurate tool for screening displacement damage effects in SiC power devices.

碳化硅(SiC)功率器件具有卓越的电学和热性能,使其成为在太空等极端环境中部署的强大候选者。然而,高能粒子引起的位移损伤仍然是影响长期可靠性的关键因素,因此需要精确的缺陷表征。传统的C-V掺杂剖面提取使用数值微分,这放大了测量噪声,降低了准确性和可重复性。我们提出了一个解析模型,通过使用辐照前后测量的C-V特性的比率来消除数值分化。这种方法能够直接、稳定、定量地提取净辐射诱导阱密度。为了验证该方法,我们用55 MeV的质子在1 × 10 14 cm−2的影响下照射4H - SiC肖特基势垒二极管,并将提取的陷阱密度与传统的基于分化的技术进行比较,以评估一致性和稳健性。此外,基于提取的阱密度曲线,我们引入了一个确定有效阱能级参数的公式,该参数可作为识别高能质子辐照下主要位移损伤机制的诊断指标。所提出的分析模型在室温下运行,需要标准的C-V测量,并可作为筛选SiC功率器件中位移损伤效应的快速,准确的工具。
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引用次数: 0
Interplay Between Structure and Interfacial Interactions in Fe-Gd Synthetic Ferrimagnets Fe-Gd合成铁磁体结构和界面相互作用的相互作用
IF 5.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2026-01-09 DOI: 10.1002/aelm.202500686
Álvaro González-García, Alejandro Álvarez-Chico, Jairo Obando-Guevara, Silvia Gallego, Unai Atxitia, Iulia Cojocariu, Matteo Jugovac, Tevfik Onur Menteş, Andrea Locatelli, Arantzazu Mascaraque, Miguel Ángel González-Barrio

Transition metal–rare earth compounds are promising synthetic ferrimagnets for next-generation spintronic devices, where magnetic domain structure and thermal evolution are key to performance. We studied ultrathin Fe–Gd ferrimagnets grown epitaxially on W(110) by atomic layer deposition, combining element-resolved magnetic microscopy with structural characterization. Comparing Gd/Fe and Fe/Gd bilayers with homogeneous Fe1 − xGdx alloys, we find that Curie temperature (Tc) and domain behavior are governed primarily by crystallinity and interfacial coupling. In crystalline Gd/Fe, the Gd layer remains ferromagnetic up to ∼500 K, far above its bulk Tc, due to strong interfacial coupling. In contrast, poor crystallinity of the Fe layer in Fe/Gd suppresses Fe magnetic order, yielding a reduced common Tc of ∼325 K, similar to the homogeneous alloy (Tc ∼ 345 K). Atomistic spin simulations capture these trends and isolate the role of disorder. Together, these results demonstrate how structural control can be used to tune Curie and compensation temperatures in ultrathin ferrimagnetic heterostructures for ultrafast, energy-efficient spintronic applications.

过渡金属-稀土化合物是下一代自旋电子器件中很有前途的合成铁磁体,其中磁畴结构和热演化是性能的关键。采用原子层沉积的方法,结合元素分辨磁显微镜和结构表征,研究了在W(110)表面外延生长的超薄Fe-Gd铁磁体。将Gd/Fe和Fe/Gd双层与均匀Fe1−xGdx合金进行比较,发现居里温度(Tc)和畴行为主要受结晶度和界面耦合的影响。在Gd/Fe晶体中,由于强界面耦合,Gd层在~ 500 K时仍保持铁磁性,远高于其体积Tc。相反,Fe/Gd中Fe层的结晶度较差,抑制了Fe的磁性秩序,产生降低的普通Tc (~ 325 K),类似于均匀合金(Tc ~ 345 K)。原子自旋模拟捕捉到了这些趋势,并孤立了无序的作用。总之,这些结果展示了如何利用结构控制来调节超薄铁磁异质结构中的居里温度和补偿温度,以实现超快、节能的自旋电子应用。
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引用次数: 0
Thickness Scaling of Integrated Pt/(Al0.9Sc0.1)N/Pt Capacitor Stacks to 30 nm (Adv. Electron. Mater. 1/2026) 集成Pt/(Al0.9Sc0.1)N/Pt电容器层厚度缩放至30 nm (Adv.)板牙。1/2026)
IF 5.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2026-01-07 DOI: 10.1002/aelm.70215
Soshun Doko, Naoko Matsui, Toshikazu Irisawa, Koji Tsunekawa, Nana Sun, Yoshiko Nakamura, Kazuki Okamoto, Hiroshi Funakubo

Ferroelectric Memory

In their Research Article (10.1002/aelm.202500451), Hiroshi Funakubo and co-workers demonstrate that the total thickness of the device stack can be scaled down to 30 nm for the first time while maintaining a remanent polarization exceeding 100 μC cm−2 using an aluminum scandium nitride ((Al,Sc)N) film sandwiched between Pt electrodes. This next-generation nitride ferroelectric material enables aggressive thickness scaling for integration into ferroelectric memory, representing a significant advance for future electronic devices.

铁电存储器研究论文(10.1002/aelm)。(202500451), Hiroshi Funakubo和同事证明,使用夹在Pt电极之间的氮化铝钪((Al,Sc)N)薄膜,可以首次将器件堆栈的总厚度缩小到30 nm,同时保持超过100 μC cm - 2的剩余极化。这种下一代氮化铁电材料能够实现集成到铁电存储器中的侵略性厚度缩放,代表了未来电子器件的重大进步。
{"title":"Thickness Scaling of Integrated Pt/(Al0.9Sc0.1)N/Pt Capacitor Stacks to 30 nm (Adv. Electron. Mater. 1/2026)","authors":"Soshun Doko,&nbsp;Naoko Matsui,&nbsp;Toshikazu Irisawa,&nbsp;Koji Tsunekawa,&nbsp;Nana Sun,&nbsp;Yoshiko Nakamura,&nbsp;Kazuki Okamoto,&nbsp;Hiroshi Funakubo","doi":"10.1002/aelm.70215","DOIUrl":"https://doi.org/10.1002/aelm.70215","url":null,"abstract":"<p><b>Ferroelectric Memory</b></p><p>In their Research Article (10.1002/aelm.202500451), Hiroshi Funakubo and co-workers demonstrate that the total thickness of the device stack can be scaled down to 30 nm for the first time while maintaining a remanent polarization exceeding 100 μC cm<sup>−2</sup> using an aluminum scandium nitride ((Al,Sc)N) film sandwiched between Pt electrodes. This next-generation nitride ferroelectric material enables aggressive thickness scaling for integration into ferroelectric memory, representing a significant advance for future electronic devices.\u0000\u0000 <figure>\u0000 <div><picture>\u0000 <source></source></picture><p></p>\u0000 </div>\u0000 </figure></p>","PeriodicalId":110,"journal":{"name":"Advanced Electronic Materials","volume":"12 1","pages":""},"PeriodicalIF":5.3,"publicationDate":"2026-01-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://advanced.onlinelibrary.wiley.com/doi/epdf/10.1002/aelm.70215","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145915779","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Modeling and Verification of 1/f Noise Mechanisms in FAPbBr 3 Single‐Crystal X‐Ray Detectors FAPbBr - 3单晶X射线探测器中1/f噪声机制的建模与验证
IF 6.2 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2026-01-07 DOI: 10.1002/aelm.202500667
Zhongyu Yang, Qingli Zhang, Yuting Liu, Binbin Liu, Zhiping Zheng, Guangda Niu, Ling Xu
Perovskite‐based direct X‐ray detectors have several advantages of high sensitivity, high spatial resolution and high energy resolution, and perovskite single crystals have lower trap state density and better charge transport ability than polycrystalline materials, thus showing excellent performance in the field of X‐ray detection. However, current perovskite single crystal X‐ray detectors still have some defects, such as high dark current, large electronic noise stability resulting in poor energy spectrum resolution. Crucially, the microscopic origins of electronic noise—specifically the competition between surface and bulk defect contributions—remain under‐explored in perovskite X‐ray detectors. In this work, we demonstrate that surface‐trap‐induced carrier number fluctuations are the dominant mechanism in FAPbBr 3 Schottky devices, a conclusion supported by the distinct defect profiles revealed by Drive‐Level Capacitance Profiling (DLCP). This letter based on the analysis of carrier transport dynamics, an innovative 1/f noise model for perovskite single‐crystal detectors is established, quantitatively characterizing the correlation between the noise power spectrum and defect concentration and depth. Through noise contribution decomposition, it is found that the 1/f noise of the detector is the key noise source affecting the system's energy resolution. Further, by combining the noise voltage spectrum test and defect characterization experiments of FAPbBr 3 single‐crystal devices, the theoretical inference that surface defects are the dominant noise source is verified. This surface reconstruction effectively suppresses the trap‐assisted tunneling and carrier trapping events that fuel the 1/f noise power spectral density, ultimately leading to a record energy resolution of 2.97 keV for 59.5 keV gamma rays. Our work can provide scientific guidance for perovskite in areas such as energy spectrum detection and X‐ray detection.
钙钛矿基直接X射线探测器具有高灵敏度、高空间分辨率和高能量分辨率等优点,且钙钛矿单晶比多晶材料具有更低的阱态密度和更好的电荷输运能力,因此在X射线探测领域表现出优异的性能。然而,目前的钙钛矿单晶X射线探测器仍然存在一些缺陷,如暗电流大,电子噪声稳定性大,导致能谱分辨率差。至关重要的是,在钙钛矿X射线探测器中,电子噪声的微观起源——特别是表面和体缺陷之间的竞争——仍未得到充分探索。在这项工作中,我们证明了表面陷阱诱导的载流子数波动是FAPbBr - 3肖特基器件的主要机制,这一结论得到了驱动级电容分析(DLCP)揭示的明显缺陷谱的支持。本文在分析载流子输运动力学的基础上,建立了钙钛矿单晶探测器的1/f噪声模型,定量表征了噪声功率谱与缺陷浓度和深度之间的关系。通过噪声贡献分解,发现探测器的1/f噪声是影响系统能量分辨率的关键噪声源。结合fapbbr3单晶器件的噪声电压谱测试和缺陷表征实验,验证了表面缺陷是主要噪声源的理论推断。这种表面重建有效地抑制了陷阱辅助隧穿和载流子捕获事件,这些事件会增加1/f噪声功率谱密度,最终导致59.5 keV伽马射线的能量分辨率达到创纪录的2.97 keV。我们的工作可以为钙钛矿在能谱检测和X射线检测等领域的应用提供科学指导。
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引用次数: 0
Clock-Free Optical Communication Based on Interface Defect Control Bimodal Neuromorphic Devices (Adv. Electron. Mater. 1/2026) 基于界面缺陷控制的双模神经形态器件无时钟光通信。板牙。1/2026)
IF 5.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2026-01-07 DOI: 10.1002/aelm.70216
Jiwei Chen, Yihong Sun, Yingjie Luo, Yueyi Sun, Ruolan Wen, Aumber Abbas, Mengqi Che, Changjian Zhou

Neuromorphic Devices

This cover image presents a high-fidelity multimodal optoelectronic transistor, highlighting the incorporation of a composite gate to realize reversible and real-time modulation of photogenerated carrier relaxation. Preliminary simulations illustrate the device's proficiency in high-fidelity optical pulse sequence recognition and clock recovery when integrated into optical communication interfaces. More information can be found in the Research Article by Changjian Zhou and co-workers (10.1002/aelm.202500580).

神经形态器件这张封面图展示了一个高保真的多模态光电晶体管,突出了复合栅极的结合,实现了光生载流子弛化的可逆和实时调制。初步仿真表明,该器件集成到光通信接口后,能够熟练地进行高保真光脉冲序列识别和时钟恢复。更多信息可参见周长健等人的研究文章(10.1002/aelm.202500580)。
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引用次数: 0
Addendum to: Magnetic Field Screening of 2D Materials Revealed by Magnetic Force Microscopy 附录:磁力显微镜显示二维材料的磁场筛选
IF 5.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2026-01-06 DOI: 10.1002/aelm.202500795
Guillermo López-Polín, Miriam Jaafar, Pablo Ares

In our original publication, “Magnetic field screening of 2D materials revealed by magnetic force microscopy,” we demonstrated that few-layer graphene (FLG) exhibits a measurable magnetic field screening effect of approximately 0.5% per graphene layer, as revealed by magnetic force microscopy (MFM). Here, we focus on the broader implications of this phenomenon for devices employing FLG as electrodes in van der Waals heterostructures. We highlight that the cumulative diamagnetic screening of FLG can substantially reduce the effective magnetic field experienced by the active region of a device, which must be considered for accurate quantitative interpretation of magnetic field-dependent measurements. This Addendum clarifies how FLG's intrinsic diamagnetism can influence quantitative analyses and theoretical comparisons, while leaving the qualitative conclusions of our original study unaffected.

在我们的原始出版物“通过磁力显微镜揭示的二维材料的磁场筛选”中,我们证明了几层石墨烯(FLG)表现出可测量的磁场筛选效应,每层石墨烯约为0.5%,正如磁力显微镜(MFM)所显示的那样。在这里,我们关注这种现象对采用FLG作为范德华异质结构电极的器件的更广泛的影响。我们强调,FLG的累积抗磁筛选可以大大降低器件有源区域所经历的有效磁场,这必须考虑到磁场相关测量的准确定量解释。本附录阐明了FLG的内在抗磁性如何影响定量分析和理论比较,而不影响我们原始研究的定性结论。
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引用次数: 0
Environmental Stability and Electronic Properties of Individual Flakes of Ti 2 CT x MXene ti2ct x MXene薄片的环境稳定性和电子性能
IF 6.2 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2026-01-06 DOI: 10.1002/aelm.202500422
Md. Ibrahim Kholil, Alexey Lipatov, Saman Bagheri, Hanna Pazniak, Venera Alimova, Alexander Sinitskii
We present a synthetic procedure for large Ti 2 CT x MXene monolayers with the majority of flakes having sizes of 10–15 µm and the largest ones reaching 40 µm, which are used for device fabrication and electrical measurements on a single‐flake level. We demonstrate that if exposed to ambient conditions, Ti 2 CT x monolayers oxidize in an aqueous solution or on a substrate on a time scale of hours, but multilayer flakes are more resistant to environmental degradation. The partially oxidized monolayer Ti 2 CT x flakes exhibit low electrical conductivity and electron mobility, as well as the semiconducting‐like temperature dependence of resistance with d R /d T < 0. However, the more degradation‐resistant multilayer flakes show electrical conductivity of about 3700 S cm −1 and electron mobility of about 1.6 cm 2 V −1 s −1 , which are among the highest values reported for MXene materials, as well as the metallic temperature dependence of resistance with d R /d T > 0, which is expected for Ti 2 CT x with mixed surface terminations (T x = ─F, ─OH, = O) based on prior theoretical calculations. These results correlate with the electrical measurements of Ti 2 CT x films, which showed that the thicker films exhibit better environmental stability. The characteristics of multilayer flakes suggest high intrinsic electrical conductivity of Ti 2 CT x and justify its potential for electronic applications.
我们提出了一种大型Ti 2 CT x MXene单层的合成方法,大多数薄片的尺寸为10-15 μ m,最大的薄片达到40 μ m,用于器件制造和单片水平的电气测量。我们证明,如果暴露在环境条件下,Ti 2 CT x单层在水溶液或衬底上氧化,时间尺度为数小时,但多层薄片更耐环境降解。部分氧化的单层Ti 2 CT x薄片表现出较低的电导率和电子迁移率,以及与d R /d T <; 0相似的半导体温度依赖性。然而,更耐降解量多层片显示电导率约3700厘米−1和电子迁移率约1.6厘米2 V−1−1,这是最高的价值报告MXene材料,金属电阻与温度的依赖关系以及d R / d T祝辞0,这对Ti预计2 x CT混合表面终端(T x = F──哦,= O)基于之前的理论计算。这些结果与Ti 2 CT x薄膜的电测量结果相关联,表明较厚的薄膜具有更好的环境稳定性。多层薄片的特性表明Ti 2 CT x具有高的本征电导率,并证明其在电子应用方面的潜力。
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引用次数: 0
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