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Comparative 1-Propanol Vapor Sensing Performance of 3D MAPbBr3 and 2D (PEA)2PbBr4 3D MAPbBr3和2D (PEA)2PbBr4对1-丙醇气敏性能的比较
IF 6.2 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2026-01-21 DOI: 10.1002/aelm.202500628
Paul Hänsch, Jacopo Pinna, Francesco Modena, Giuseppe Portale, Maria Antonietta Loi
Metal halide perovskites have emerged as a highly promising class of materials, garnering immense scientific and technological interest in recent years. Their exceptional properties make them particularly attractive for a wide range of optoelectronic applications, most notably in high-efficiency solar cells and advanced photodetectors. Beyond these uses, hybrid perovskite materials have also demonstrated potential as sensitive platforms for detecting volatile organic compounds, further expanding their technological relevance. It has been demonstrated that the adsorption of these organic molecules can passivate surface defects, which improves the conductance of the perovskite layer. Here, we show that methylammonium lead bromide (MAPbBr3) and 2-phenylethylammonium lead bromide ((PEA)2PbBr4) are highly effective in sensing 1-propanol, which has been identified as biomarker for lung cancer. Both systems exhibit a response time of 1 s, and a recovery time of 1.7 and 14 s for MAPbBr3 and (PEA)2PbBr4, respectively. Going from a 3D to a 2D structure allows us to tailor electronic properties and trap density states, thereby greatly enhancing gas sensitivity. Both systems show a remarkable maximum response of 106 and 107 at 6000 and 7000 ppm, respectively, and a low detection limit of 90 ppm.
近年来,金属卤化物钙钛矿已成为一种极具发展前景的材料,引起了科学界和技术界的极大兴趣。它们的特殊性能使它们在广泛的光电应用中特别有吸引力,尤其是在高效太阳能电池和先进光电探测器中。除了这些用途之外,混合钙钛矿材料也显示出作为检测挥发性有机化合物的敏感平台的潜力,进一步扩大了它们的技术相关性。研究表明,这些有机分子的吸附可以钝化表面缺陷,从而提高钙钛矿层的电导率。在这里,我们发现甲基溴化铅铵(MAPbBr3)和2-苯乙基溴化铅铵(PEA)2PbBr4)对1-丙醇的检测非常有效,而1-丙醇是肺癌的生物标志物。MAPbBr3和(PEA)2PbBr4的响应时间均为1 s,恢复时间分别为1.7 s和14 s。从3D到2D结构使我们能够定制电子特性和陷阱密度状态,从而大大提高气体灵敏度。两种系统在6000 ppm和7000 ppm下的最大响应分别为106和107,低检测限为90 ppm。
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引用次数: 0
Human Skin-Inspired Flexible Pressure Sensor with Multi-Modulus Porous Structure 基于皮肤的多模量多孔结构柔性压力传感器
IF 6.2 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2026-01-21 DOI: 10.1002/aelm.202500629
Hyeongmin Park, Jinsung Kim, Minwoo Kim, Changhyun Noh, Sumin Myoung, Hyeona Lim, Jaehee Han, Chulhwan Park, Chungryong Choi, Eunho Lee, Sungjun Park, Daegun Kim, Giwon Lee
Despite significant advances being made in pressure sensor technologies, driven by increasing demand for wearable devices, future Internet of Things (IoT) applications, and electronic skin (e-skin), critical challenges persist in achieving high sensitivity, high pressure resolution, rapid response, and a wide linear range. Here, we report a cost-effective and easy-to-fabricate pressure sensor that simultaneously achieves high sensitivity and an extensive linear operating range by emulating the multi-modulus structure of human skin. Typically, these two properties are inversely related, rendering their simultaneous optimization highly challenging. Our sensor design employs a porous structure, composed of two layers of distinct moduli; this is achieved by precisely adjusting the base to crosslinker ratio of polydimethylsiloxane mixed with multi-walled carbon nanotubes (MWCNTs). The synergistic effect of the MWCNTs and porous structure results in a high sensitivity (2.24 kPa1), while the dual-modulus configuration extends the linear response (up to 45 kPa). Moreover, the sensor demonstrates excellent reproducibility and can maintain a stable response even after 6000 cycles of mechanical deformation at 15 kPa. These findings underscore the sensor's efficacy in diverse pressure detection scenarios and its potential for applications in human–machine interface systems and soft robotics.
尽管在可穿戴设备、未来物联网(IoT)应用和电子皮肤(e-skin)需求不断增长的推动下,压力传感器技术取得了重大进展,但在实现高灵敏度、高压力分辨率、快速响应和宽线性范围方面仍然存在关键挑战。在这里,我们报告了一种成本效益高且易于制造的压力传感器,通过模拟人体皮肤的多模量结构,同时实现了高灵敏度和广泛的线性工作范围。通常情况下,这两个属性是负相关的,这使得它们的同时优化非常具有挑战性。我们的传感器设计采用多孔结构,由两层不同的模组组成;这是通过精确调整多壁碳纳米管(MWCNTs)混合聚二甲基硅氧烷的碱与交联剂的比例来实现的。MWCNTs和多孔结构的协同效应导致了高灵敏度(2.24 kPa−1),而双模量结构扩展了线性响应(高达45 kPa)。此外,该传感器具有出色的再现性,即使在15 kPa的机械变形6000次循环后也能保持稳定的响应。这些发现强调了传感器在各种压力检测场景中的有效性,以及它在人机界面系统和软机器人中的应用潜力。
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引用次数: 0
Metal–Insulator–Insulator–Metal (MIIM) Ag/SnO 2 /Al 2 O 3 /Ag Diodes Fabricated by Ultraprecise Dispensing and Atomic Layer Deposition 金属-绝缘体-绝缘体-金属(MIIM) Ag/ sno2 / al2o3 /Ag二极管的超精密点胶和原子层沉积
IF 6.2 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2026-01-17 DOI: 10.1002/aelm.202500615
Aboubacar Savadogo, Klaus Huska, Rohit D. Chavan, Thomas Nyachoti Nyangonda, Jan Feßler, Bernard Odhiambo Aduda, Ulrich Wilhelm Paetzold, Uli Lemmer, Mohamed Hussein
Currently, high‐frequency, ultra‐fast, and tunneling diodes are mainly fabricated using traditional lithography and evaporation techniques, typically limited to wafer sizes. This work introduces a new method for fabricating metal–insulator–insulator–metal (MIIM) diodes using ultra‐precise dispensing (UPD) printing techniques, providing a practical alternative to traditional lithography. Enabling highly precise material deposition, minimizing waste and boosting manufacturing efficiency. Both bottom and top electrodes of the MIIM diode are silver(Ag) and fabricated via UPD, while atomic layer deposition (ALD) is employed to deposit the insulating layers. 1 nm of tin oxide(SnO 2 ) and 1 nm of aluminum oxide(Al 2 O 3 ) sandwiched between the electrodes: The Ag/SnO 2 /Al 2 O 3 /Ag MIIM diode has a contact area of ca. 5.4 µm × 4.0 µm determined by FIB‐SEM. A quantum simulator based on the Wentzel‐Kramers‐Brillouin (WKB) method is used to analyze the diode's performance and shows agreement with measurement results. The electrical characterization of the fabricated MIIM device exhibits a tunneling current in the nano‐ to microampere range, a zero‐bias responsivity of −1.31 A/W, and dynamic resistance of 39.56 kΩ. Combining ultra‐precise printing with innovative insulators provides a promising pathway to large‐scale, low‐cost production of high‐performance MIM diodes for energy harvesting, high‐frequency rectification, and flexible applications electronics.
目前,高频、超高速和隧道二极管主要使用传统的光刻和蒸发技术制造,通常限于晶圆尺寸。这项工作介绍了一种使用超精密点胶(UPD)印刷技术制造金属-绝缘体-绝缘体-金属(MIIM)二极管的新方法,为传统光刻提供了一种实用的替代方案。实现高精度的材料沉积,最大限度地减少浪费,提高制造效率。MIIM二极管的下电极和上电极均为银(Ag),并通过UPD制备,而绝缘层采用原子层沉积(ALD)沉积。1 nm的氧化锡(SnO 2)和1 nm的氧化铝(Al 2o3)夹在电极之间:通过FIB - SEM测定,Ag/SnO 2 /Al 2o3 /Ag MIIM二极管的接触面积约为5.4 μ m × 4.0 μ m。利用基于WKB (Wentzel - Kramers - Brillouin)方法的量子模拟器对二极管的性能进行了分析,结果与测量结果一致。制备的MIIM器件的电学特性显示出纳米至微安范围内的隧道电流,零偏响应率为- 1.31 a /W,动态电阻为39.56 kΩ。将超精密印刷与创新的绝缘体相结合,为大规模、低成本生产用于能量收集、高频整流和柔性电子应用的高性能MIM二极管提供了一条有前途的途径。
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引用次数: 0
Reconfigurable Combinational Logic Operations Using Triple‐Gated Feedback Field‐Effect Transistors for Logic‐In‐Memory Computing 使用三门控反馈场效应晶体管的可重构组合逻辑运算,用于逻辑内存计算
IF 6.2 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2026-01-17 DOI: 10.1002/aelm.202500536
Dongki Kim, Yunwoo Shin, Hyojoo Heo, Kyoungah Cho, Sangsig Kim
Reconfigurability in logic‐in‐memory (LIM) enables highly integrated circuits to be used in data‐intensive applications by performing several logic operations within a single circuit structure. In this study, the reconfigurable LIM (R‐LIM) cell consisted of eight triple‐gated feedback field‐effect transistors (TG FBFETs) that were shared equally in the pull‐up and pull‐down networks. Because of the reconfigurable characteristics of the TG FBFET, the R‐LIM cell performed AND, OR, NOT, and XOR operations without redesign of the circuit topology. Furthermore, the 2 × 2 R‐LIM cell array executed half‐adder, half‐subtractor, 1:2 demultiplexer, and 4:2 encoder operations using a combination of AND, OR, NOT, and XOR operations. The logic results remained without an external power supply because of the memory characteristics of the TG FBFET used as a component of the R‐LIM cell. The results of this study provide an effective method for designing highly integrated circuits for data‐intensive computing systems.
逻辑内存(LIM)的可重构性使高度集成电路能够在单个电路结构中执行多个逻辑操作,从而用于数据密集型应用。在这项研究中,可重构的LIM (R - LIM)单元由8个三门反馈场效应晶体管(TG fbfet)组成,这些晶体管在上拉和下拉网络中平均共享。由于TG FBFET的可重构特性,R - LIM单元无需重新设计电路拓扑即可执行AND, OR, NOT和XOR操作。此外,2 × 2 R‐LIM单元阵列使用与、或、非和异或操作组合执行半加、半减、1:2解复用和4:2编码器操作。由于用作R - LIM电池组件的TG FBFET的存储特性,在没有外部电源的情况下,逻辑结果仍然保持不变。本研究结果为设计数据密集型计算系统的高集成电路提供了一种有效的方法。
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引用次数: 0
Enhanced Dielectric Constant by Al Gradient Doping on Atomic‐Layer‐Deposited HfO 2 ‐Based Metal–Insulator–Metal Capacitor 原子层沉积HfO - 2基金属-绝缘体-金属电容器Al梯度掺杂提高介电常数
IF 6.2 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2026-01-16 DOI: 10.1002/aelm.202500679
Taelim Lee, Jungwoo Bong, Hyunjin Lee, Ho‐Sung Lee, Hyeon‐Sik Jang, Hee‐Tae Kim, Jae‐Hyun Lee, Byung Jin Cho, Yeon‐Ho Choi, Hagyoul Bae, Taehwan Moon, Keun Heo
As industries increasingly demand larger data capacities and faster processing, enhancing the capacitance of metal–insulator–metal (MIM) capacitors becomes crucial. This study investigates the effect of aluminum (Al) gradient doping on the dielectric constant of HfO 2 ‐based MIM capacitors. Compared with conventional uniform doping, gradient doping more effectively accelerates the transition of HfO 2 to its high‐ k tetragonal phase, leading to higher capacitance. The study also explores factors such as the annealing temperature and atomic layer deposition conditions to optimize the high‐ k performance. Capacitors were fabricated and tested with gradient and uniform doping under 400°C, 500°C, and 600°C annealing conditions. Gradient doping significantly reduces the leakage current by an order of magnitude. The uniformly doped capacitors exhibit a dielectric constant of ∼44.7 and an equivalent oxide thickness (EOT) of 0.96 nm, whereas those with gradient doping achieve a dielectric constant of ∼60.7, which is the highest k ‐value of HfO 2 reported to date, and an EOT of 0.71 nm, representing a 35.8% improvement in dielectric constant and a 0.25 nm reduction in EOT. These findings highlight the potential of gradient doping to enhance MIM capacitor performance for high‐capacitance applications.
随着工业日益需要更大的数据容量和更快的处理速度,提高金属-绝缘体-金属(MIM)电容器的电容变得至关重要。本文研究了铝梯度掺杂对HfO - 2基MIM电容器介电常数的影响。与常规均匀掺杂相比,梯度掺杂更有效地加速了HfO向高钾四方相的转变,从而获得了更高的电容。研究还探讨了退火温度和原子层沉积条件等因素来优化高k性能。在400°C, 500°C和600°C退火条件下,采用梯度和均匀掺杂制备电容器并进行测试。梯度掺杂使漏电流显著降低一个数量级。均匀掺杂的电容器的介电常数为~ 44.7,等效氧化物厚度(EOT)为0.96 nm,而梯度掺杂的电容器的介电常数为~ 60.7,这是迄今为止报道的HfO 2的最高k值,EOT为0.71 nm,介电常数提高了35.8%,EOT降低了0.25 nm。这些发现突出了梯度掺杂在高电容应用中提高MIM电容器性能的潜力。
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引用次数: 0
MIM-Diode-Like Rectification in Lateral 1T/1H/1T-MoS2 Homojunctions via Interfacial Dipole Engineering 基于界面偶极子工程的横向1T/1H/1T‐MoS 2同质结中MIM‐二极管‐类整流
IF 5.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2026-01-14 DOI: 10.1002/aelm.202500607
Elias Eckmann, Ersoy Şaşıoğlu, Nicki F. Hinsche, Ingrid Mertig

Lateral 2D tunnel diodes that reproduce metal-insulator-metal (MIM)-diode-like rectification without using dissimilar contacts are attractive for scalable nanoelectronics. MoS2 can exist in both the semiconducting 1H phase and the metallic 1T phase, enabling phase-engineered homojunctions within a single material. First-principles electronic structure and quantum transport calculations show that phase-engineered 1T/1H/1T–MoS2 homojunctions exhibit pronounced MIM-diode-like rectification originating from interfacial charge transfer at asymmetric 1T/1H interfaces. The charge transfer establishes interface dipole steps that impose a built-in potential drop across the 1H barrier, thereby generating a trapezoidal tunnel barrier at zero bias. In contrast, symmetric 1T/1H interfaces do not form an interface dipoles and show no rectification. To clarify the microscopic origin, a lateral graphene/hexagonal-boron-nitride/graphene junction is analyzed as a minimal MIM diode analogue with a simple interface and well-defined barrier, confirming that interface-induced dipoles, rather than work-function difference, enable the effect. The mechanism operates entirely within a single monolayer material system and does not rely on out-of-plane stacking, highlighting compatibility with phase patterning in 2D semiconductors. These results establish lateral 1T/1H/1TMoS2 as a fully 2D, single-material platform for MIM-diode-like rectification and identify the interface-dipole engineering as a general strategy for designing ultrathin lateral tunnel diodes that can serve as building blocks for high-frequency detectors and energy-harvesting devices.

在不使用不同触点的情况下再现金属-绝缘体-金属(MIM) -二极管-类整流的横向2D隧道二极管对于可扩展的纳米电子学具有吸引力。mos2可以存在于半导体1H相和金属1T相中,从而在单一材料中实现相工程的同质结。第一性原理电子结构和量子输运计算表明,相位工程的1T/1H/1T - mos 2同质结表现出明显的MIM -二极管样整流,源于不对称1T/1H界面上的界面电荷转移。电荷转移建立了界面偶极子步骤,在1H势垒上施加了内置的电位下降,从而在零偏置下产生了梯形隧道势垒。相反,对称的1T/1H界面不形成界面偶极子,也没有整流。为了澄清微观起源,横向石墨烯/六方氮化硼/石墨烯结被分析为最小的MIM二极管模拟物,具有简单的界面和定义良好的势垒,证实了界面诱导的偶极子,而不是功函数差异,能够实现这种效果。该机制完全在单个单层材料系统中运行,不依赖于面外堆叠,突出了与二维半导体相图的兼容性。这些结果建立了横向1T/1H/1TMoS 2作为MIM二极管整流的全2D单材料平台,并确定了界面偶极子工程作为设计超薄横向隧道二极管的一般策略,可以作为高频探测器和能量收集设备的构建模块。
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引用次数: 0
Ferroelectric–Electrolyte Hybrid Gate Dielectrics for Organic Synaptic Transistors with Long-Term Plasticity 具有长期可塑性的有机突触晶体管用铁电-电解质混合栅介电材料
IF 5.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2026-01-14 DOI: 10.1002/aelm.202500598
Minsub Lee, Donghee Shin, Jaehui Cheon, Sumin Lee, Chanwoo Park, Jaegyun Im, Jaegeun Lee, Jin Hong Lee, Jong S. Park, Beomjin Jeong

Organic electrochemical transistors (OECTs) have been of tremendous interest for neuromorphic memories thanks to their excellent device uniformity, facile processibility and biocompatibility. One of the hurdles for precise emulation of synaptic functions is poor long-term plasticity, mainly originated by facile diffusion of mobile ions between a channel and an electrolyte gate dielectric. Herein, we present that a gate dielectric of ferroelectric poly(vinylidene fluoride-co-trifluoroethylene) [P(VDF-TrFE)], blended with an ionic liquid of 1-ethyl-3-methylimidazolium bis(trifluoromethylsulfonyl) imide ([EMIM][TFSI]), is beneficial for enhancing long-term plasticity for OECTs. Comparative studies for P(VDF-TrFE) and nonferroelectric fluorinated polymers indicate that polar ferroelectric β-phase crystals assist regulation of mobile ions in a nonvolatile manner, leading to a large memory window with an ON/OFF drain current ratio of ∼103. The ferroelectric OECT exhibits long-term potentiation (LTP) and long-term depression (LTD) characteristics, and long-term retention time of >103 s with distinguishable synaptic weight states. Our strategy provides a simple route for emulation of long-term synaptic behavior, potentially applicable for diverse sort of electrochemical synapses.

有机电化学晶体管(OECTs)由于其优异的器件均匀性、易于加工和生物相容性而受到神经形态记忆领域的极大关注。精确模拟突触功能的障碍之一是长期可塑性差,这主要是由于通道和电解质栅介电之间的移动离子容易扩散造成的。在此,我们提出了一种铁电聚偏氟乙烯- co -三氟乙烯(P(VDF - TrFE)) [P(VDF - TrFE)]的栅极介质,与1 -乙基- 3 -甲基咪唑双(三氟甲基磺酰基)亚胺([EMIM][TFSI])离子液体混合,有利于提高oect的长期可塑性。对P(VDF - TrFE)和非铁电氟化聚合物的比较研究表明,极性铁电β相晶体有助于以非易失性的方式调节移动离子,导致一个大的记忆窗口,其ON/OFF漏极电流比为~ 10.3。铁电OECT表现出长时程增强(LTP)和长时程抑制(LTD)的特征,长时程保留时间为103 s,突触重量状态可区分。我们的策略为模拟长期突触行为提供了一种简单的途径,可能适用于各种电化学突触。
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引用次数: 0
Concurrent Sensing and Communications Based on Intelligent Metasurfaces 基于智能元表面的并发感知与通信
IF 5.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2026-01-12 DOI: 10.1002/aelm.202500594
Hanting Zhao, Menglin Wei, Mingyi Li, Jiawen Xu, Jing Jin, Qixing Wang, Chunju Shao, Haiyu Ding, Lianlin Li

Intelligent metasurface (IM), a kind of ultrathin engineered structure composed of real-time controllable elements, has gained intensive attention in the areas of wireless communications and sensing over the past decade, owing to its unique capability of artificial intelligence (AI) empowered electromagnetic (EM) beam manipulation. Yet, it remains an open challenge in developing integrated sensing and communications (ISAC) scheme with the lower consumption of energy and frequency spectrum, the lower hardware cost, the better information security, etc. Here, we propose an IM-assisted concurrent ISAC (C-ISAC in short) scheme in the context of the direct antenna modulation (DAM) by sharing selectively a set of IM coding patterns for the concurrent 16-amplitude-phase-shift-keying (16-APSK) communications and sensing (human gesture recognition here). Moreover, the residual energies associated with low-power DAM symbols, that is traditionally wasted in conventional DAM communications, have been recycled for the purpose of wireless sensing in our approach, leading to the reuse of hardware and energy for ISAC. Thereby, this design is capable of not only addressing the issue of energy inefficiency involved in conventional DAM communications, but also enabling the simultaneous symbol-level signal transmission and sensing. We have implemented a prototype using a 1-bit phase-quantized IM, and experimentally demonstrated its superior ISAC's performance in terms of energy efficiency consistent with theoretical predictions. The presented method shows great potential for applications in smart homes, low-altitude economy, intelligent transportation, smart factories, and robotics.

智能超表面(IM)是一种由实时可控元件组成的超薄工程结构,由于其独特的人工智能(AI)电磁波束操纵能力,在过去十年中在无线通信和传感领域受到了广泛关注。然而,如何开发低能耗、低频谱、低硬件成本、高信息安全性的集成传感与通信(ISAC)方案仍然是一个悬而未决的挑战。本文提出了一种直接天线调制(DAM)背景下的IM辅助并发ISAC(简称C-ISAC)方案,该方案通过选择性地共享一组IM编码模式,用于并发16幅相移键控(16-APSK)通信和传感(这里是人类手势识别)。此外,传统上在传统DAM通信中浪费的与低功耗DAM符号相关的剩余能量已在我们的方法中被回收用于无线传感目的,从而导致ISAC的硬件和能量的重用。因此,该设计不仅能够解决传统DAM通信中涉及的能源效率低下的问题,而且还能够同时实现符号级信号传输和感知。我们使用1位相位量化IM实现了一个原型,并通过实验证明了其在能量效率方面的优越性能与理论预测一致。该方法在智能家居、低空经济、智能交通、智能工厂和机器人等领域具有巨大的应用潜力。
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引用次数: 0
AI-Assisted Bioelectronics for Personalized Health Management 用于个性化健康管理的人工智能辅助生物电子学
IF 5.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2026-01-12 DOI: 10.1002/aelm.202500744
Huiwen Xiong, Changhao Dai, Xuting Chen, Jilie Kong, Dacheng Wei, Xueen Fang, Wenhao Weng

Personalized health management aims to promote, maintain, and restore the health of individuals. Despite the ever-lasting research efforts involved in personalized healthcare bioelectronics, current healthcare platforms still face barriers such as costly facilities, specialized operations, and resource-limited applications. Therefore, personalized and user-friendly healthcare bioelectronics are urgently needed. Among emerging solutions, the integration of artificial intelligence (AI) and advanced bioelectronics is a pivotal approach that merges intelligent algorithms with multi-functional healthcare design. This review summarizes the latest advances in AI-assisted bioelectronics, aiming to provide a possible strategy for personalized healthcare applications. Initially, a brief survey is provided to discuss the material design, device fabrication, AI-hardware integration, and performance assessment of AI-assisted bioelectronics. The subsequent contents focus on the implementation of AI-assisted healthcare bioelectronics across health monitoring, early diagnosis, therapeutic treatment, and rehabilitation. Finally, we discuss the current challenges and prospective future developments in closed-loop healthcare bioelectronics, ultimately empowering individuals with control over their own health.

个性化健康管理旨在促进、维护和恢复个人的健康。尽管个性化医疗保健生物电子学的研究工作持续不断,但目前的医疗保健平台仍然面临着诸如昂贵的设施、专业操作和资源有限的应用等障碍。因此,个性化和人性化的医疗保健生物电子学是迫切需要的。在新兴的解决方案中,人工智能(AI)和先进生物电子学的集成是将智能算法与多功能医疗保健设计相结合的关键方法。本文综述了人工智能辅助生物电子学的最新进展,旨在为个性化医疗保健应用提供可能的策略。首先,简要介绍了人工智能辅助生物电子学的材料设计、器件制造、人工智能硬件集成和性能评估。随后的内容侧重于在健康监测、早期诊断、治疗治疗和康复方面实施人工智能辅助医疗保健生物电子。最后,我们讨论了闭环医疗保健生物电子学的当前挑战和未来发展前景,最终使个人能够控制自己的健康。
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引用次数: 0
High-Performance and Energy-Efficient Sub-5 nm 2D Double-Gate MOSFETs Based on Silicon Arsenide Monolayers 基于砷化硅单层的高性能、高能效sub - 5nm二维双栅mosfet
IF 6.2 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2026-01-12 DOI: 10.1002/aelm.202500701
Dogukan Hazar Ozbey, Engin Durgun
The continuous demand for high-performance (HP), energy-efficient transistors is driving research beyond conventional silicon-based metal-oxide-semiconductor field-effect transistors (MOSFETs), which face critical scaling limits. To address this challenge, new channel materials and device architectures are being explored. Here, we investigate sub-5 nm double-gate (DG) MOSFETs based on 2D SiAs using first-principles calculations combined with the non-equilibrium Green's function (NEGF) formalism. SiAs monolayers exhibit an indirect bandgap of 1.58 eV and favorable electronic characteristics for device applications. We evaluate key performance metrics, including the on/off current ratio (Ion/Ioff), subthreshold swing (SS), gate capacitance (Cg), intrinsic delay time (τ), and power–delay product (PDP). Underlap (UL) architectures with 1–2 nm extensions enhance device performance, yielding on-state currents (Ion) up to 1206 µA µm−1, in line with the International Technology Roadmap for Semiconductors (ITRS) 2028 HP requirements. The SS values (112–142 mV dec−1) together with minimized τ and PDP indicate the suitability of SiAs transistors for ultra-scaled, energy-efficient technologies. Our findings highlight 2D SiAs as a promising candidate to overcome the scaling challenges of traditional MOSFETs and to advance next-generation semiconductor devices.
对高性能(HP)、高能效晶体管的持续需求推动了传统硅基金属氧化物半导体场效应晶体管(mosfet)的研究,后者面临着关键的缩放限制。为了应对这一挑战,人们正在探索新的通道材料和器件架构。在这里,我们使用第一性原理计算结合非平衡格林函数(NEGF)形式来研究基于二维SiAs的sub- 5nm双栅(DG) mosfet。SiAs单层具有1.58 eV的间接带隙和良好的电子特性,适合器件应用。我们评估了关键性能指标,包括开/关电流比(Ion/Ioff)、亚阈值摆幅(SS)、栅极电容(Cg)、固有延迟时间(τ)和功率延迟积(PDP)。1 - 2 nm扩展的Underlap (UL)架构可提高器件性能,产生高达1206 μ A μ m−1的导通电流(Ion),符合国际半导体技术路线图(ITRS) 2028 HP要求。SS值(112-142 mV dec−1)以及最小化τ和PDP表明SiAs晶体管适合超尺度节能技术。我们的研究结果突出了2D SiAs作为克服传统mosfet缩放挑战和推进下一代半导体器件的有希望的候选者。
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引用次数: 0
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Advanced Electronic Materials
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