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Masthead: (Adv. Electron. Mater. 6/2024) 刊头:(Adv.)
IF 6.2 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-06-10 DOI: 10.1002/aelm.202470023
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引用次数: 0
Electrolyte-Gated Vertical Transistor Charge Transport Enables Photo-Switching (Adv. Electron. Mater. 6/2024) 电解质门控垂直晶体管电荷传输实现光电转换(Adv.)
IF 6.2 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-06-10 DOI: 10.1002/aelm.202470021
Douglas Henrique Vieira, Gabriel Leonardo Nogueira, Leandro Merces, Carlos César Bof Bufon, Neri Alves

Oxide-Based Electrolyte-Gated Transistors

ZnO-based transistors have been fabricated using an innovative configuration that combines vertical architecture with electrolyte usage (see article number 2300562 by Douglas Henrique Vieira, Neri Alves, and co-workers). The diode counterpart unveils a current–voltage relationship arising from space-charge limited current, which undergoes continuous shift due to the field-effect promoted by the charge accumulation in the source's perforation, driven by its capacitor counterpart. Beyond the transport mechanism, the findings showcase excellence in current switching based on irradiance – a phenomenon analogous to the field-effect.

基于氧化物的电解质门控晶体管ZnO 基晶体管的制造采用了一种创新配置,将垂直结构与电解质的使用相结合(参见 Douglas Henrique Vieira、Neri Alves 及合作者的 2300562 号文章)。二极管的对应物揭示了空间电荷限制电流所产生的电流-电压关系,这种关系在电容器对应物的驱动下,由于源穿孔中电荷积累所产生的场效应而不断发生变化。除了传输机制之外,研究结果还展示了基于辐照度的电流开关的卓越性能--这是一种类似于场效应的现象。
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引用次数: 0
A Bias-Dependent Weight Update Characteristics of Low Power Synaptic Pass-Transistors with a Hf-Doped ZnO Channel Layer 具有掺铪氧化锌沟道层的低功率突触传递晶体管的偏置权重更新特性
IF 5.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-06-04 DOI: 10.1002/aelm.202400108
Danyoung Cha, Jeongseok Pi, Gyoungyeop Do, Nayeong Lee, Kunhee Tae, Sungsik Lee

A study on a bias voltage-dependent weight update characteristics in a sub-threshold region of a low power synaptic pass-transistor (SPT) is presented with a Hf-doped zinc oxide active layer. The SPT is a synaptic thin-film transistor (TFT) in series with a load TFT which is used as a resistive load (RL) to be scaled by a bias voltage (VB). Here, when the VB of the load TFT is modulated, the RL can be changed. With the changed RL, it is expected that the weight update characteristics (i.e., dynamic ratio) and electrical characteristics (i.e., power consumption) of the SPT are varied, respectively, suggesting a trade-off relation between the dynamic ratio and power consumption. To check these, the pulsed characteristics of the fabricated SPT is monitored for different VB, respectively. From experimental results, as increasing VB, it is found that the decreased RL leads to the increase of the power consumption while enhancing the dynamic ratio because a full depression (FD) can be relatively easy. On the other hand, when the VB is reduced, the RL is increased resulting in the decrease of both the power dissipation and the dynamic ratio due to a difficulty of FD.

本研究介绍了采用掺杂 Hf 的氧化锌有源层的低功率突触传递晶体管 (SPT) 在亚阈值区的偏置电压相关权重更新特性。SPT 是一个与负载 TFT 串联的突触薄膜晶体管 (TFT),负载 TFT 用作电阻负载 (RL),由偏置电压 (VB) 来调节。在这里,当负载 TFT 的 VB 被调制时,RL 可以改变。随着 RL 的改变,预计 SPT 的权重更新特性(即动态比率)和电气特性(即功耗)将分别发生变化,这表明动态比率和功耗之间存在权衡关系。为了验证这一点,我们分别监测了不同 VB 下制造的 SPT 的脉冲特性。实验结果表明,随着 VB 的增大,RL 的减小会导致功耗的增加,而动态比则会提高,因为完全压陷(FD)会相对容易。另一方面,当 VB 减小时,RL 会增加,从而导致功率耗散和动态比都因 FD 困难而降低。
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引用次数: 0
Molybdenum Disulfide Memristors for Next Generation Memory and Neuromorphic Computing: Progress and Prospects 用于下一代存储器和神经形态计算的二硫化钼晶体管:进展与前景
IF 5.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-06-04 DOI: 10.1002/aelm.202400121
R. A. Wells, A. W. Robertson

In the last 15 years memristors have been investigated as devices for high-density, low-power, non-volatile, resistive random access memory (ReRAM) beyond Moore's law. They also show potential in neuromorphic logic architectures to overcome the Von–Neumann bottleneck of classical circuitry facilitating better hardware for artificial intelligence (AI) and artificial neural network (ANN) systems. Molybdenum disulfide (MoS2) has emerged as a promising material for memristor devices of monolayer thickness due to its direct bandgap, high carrier mobility and environmental stability. In this review, recent progress in the development of MoS2 memristors the current understanding of the mechanisms behind their function are examined. The remaining obstacles to a commercially viable device principle and how these may be surmounted in light of the rapid progress that has already been made are also discussed.

在过去的 15 年中,忆阻器已被研究用作超越摩尔定律的高密度、低功耗、非易失、电阻式随机存取存储器(ReRAM)的器件。忆阻器在神经形态逻辑架构中也显示出潜力,可以克服经典电路的冯-诺伊曼瓶颈,为人工智能(AI)和人工神经网络(ANN)系统提供更好的硬件。二硫化钼(MoS2)因其直接带隙、高载流子迁移率和环境稳定性,已成为单层厚度忆阻器器件的理想材料。在这篇综述中,我们探讨了开发二硫化钼(MoS2)忆阻器的最新进展,以及目前对其功能背后机制的理解。此外,还讨论了商业上可行的设备原理所面临的其余障碍,以及如何根据已经取得的快速进展克服这些障碍。
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引用次数: 0
Characteristics of MAPbI3 Stacked on the GaN Nanowires-On-Glass 堆叠在玻璃氮化镓纳米线上的 MAPbI3 的特性
IF 5.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-05-30 DOI: 10.1002/aelm.202400095
Kwang Jae Lee, Yeong Jae Kim, Jung-Hong Min, Chun Hong Kang, Ram Chandra Subedi, Huafan Zhang, Latifah Al-Maghrabi, Kwangwook Park, Dante Ahn, Yusin Pak, Tien Khee Ng, Young Min Song, Boon S. Ooi, Osman M. Bakr, Jungwook Min

When implementing optoelectronic devices through the stacking of heterogeneous materials, considering the bandgap offset is crucial for achieving efficient carrier dynamics. In this study, the bandgap offset characteristics are investigated when n-type gallium nitride nanowires (n-GaN NWs) are used as electron transport layers in methylammonium lead iodide (MAPbI3)-based optoelectronic devices. n-GaN NWs are grown on indium-tin-oxide (ITO)-coated glass via the plasma-assisted molecular beam epitaxy (PA-MBE) process to form the “GaN NWs-on-glass” platform. A MAPbI3 thin film is then spin-coated on the GaN NWs-on-glass. X-ray photoelectron spectroscopy (XPS) shows that the valence and conduction band offsets in the MAPbI3/n-GaN heterostructure are 2.19 and 0.40 eV, respectively, indicating a type-II band alignment ideal for optoelectronic applications. Prototype photovoltaic devices stacking perovskite on GaN NWs-on-glass show excellent interfacial charge-transfer ability, photon recycling, and carrier extraction efficiency. As a pioneering step in exploiting the diverse potential of the GaN-on-glass, it is demonstrated that the junction characteristics of MAPbI3/n-GaN NW heterostructures can lead to a variety of optoelectronic device applications.

在通过堆叠异质材料实现光电器件时,考虑带隙偏移对于实现高效载流子动力学至关重要。本研究通过等离子体辅助分子束外延(PA-MBE)工艺,将 n 型氮化镓纳米线(n-GaN NWs)生长在涂有铟锡氧化物(ITO)的玻璃上,形成 "GaN NWs-on-glass "平台。然后在玻璃上的氮化镓氮瓦上旋涂 MAPbI3 薄膜。X 射线光电子能谱(XPS)显示,MAPbI3/n-GaN 异质结构中的价带和导带偏移分别为 2.19 和 0.40 eV,这表明其 II 型带排列非常适合光电应用。在玻璃基氮化镓氮瓦上堆叠过氧化物的光伏器件原型显示出卓越的界面电荷转移能力、光子回收和载流子萃取效率。作为开发玻璃基氮化镓各种潜能的先驱,研究表明 MAPbI3/n-GaN NW 异质结构的结特性可带来各种光电器件应用。
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引用次数: 0
Growth and Photoresponse of WS2/MoSe2 Lateral Heterostructure WS2/MoSe2 侧向异质结构的生长与光响应
IF 5.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-05-30 DOI: 10.1002/aelm.202300842
Mingyuan Sheng, Xi Chang, Xiaojun Mao, Yang Gao, Xiaoyang Xuan, Haifen Xie, Haichuan Mu, Yueping Niu, Shangqing Gong, Min Qian

The heterostructure of two-dimensional transition metal dichalcogenide (TMDC) has garnered extensive attention, for the junction is the building block of a semiconductor device. However, the controllable synthesis of TMDC heterostructures of different transition metals and different chalcogen elements is still challenging because of the etching by atom substitution during the chemical vapor deposition (CVD) process. Here, a Mo─O transition state with lower energy is introduced to the edge of an as-grown MoSe2 by using ultraviolet ozone treatment, to prevent the fast atom substitution of S for Se, and enable a stable growth of WS2/MoSe2 lateral heterostructure. A polymer-free transfer method is developed based on capillary interaction, and atomic structure characterization confirms the high-quality WS2/MoSe2 lateral heterostructure. The WS2/MoSe2 lateral heterostructure photodetector exhibits superior photoresponse compared to WS2 and MoSe2 devices, with a responsivity of 21.87 A W−1 and a detectivity of 4.2 × 1012 Jones at 350 nm. Kelvin probe force microscopy result reveals that the built-in electric field within the heterojunction facilitates the effective separation of photogenerated electron-hole pairs. This study carries profound implications for the CVD growth and polymer-free transfer of TMDC heterostructures in photodetector applications.

二维过渡金属二卤化物(TMDC)的异质结构引起了广泛关注,因为结是半导体器件的基石。然而,由于化学气相沉积(CVD)过程中的原子置换蚀刻,可控合成不同过渡金属和不同查尔根元素的 TMDC 异质结构仍具有挑战性。在这里,通过紫外线臭氧处理,将具有较低能量的 Mo─O 过渡态引入到已生长的 MoSe2 边缘,以防止 S 原子快速置换为 Se 原子,从而实现 WS2/MoSe2 横向异质结构的稳定生长。基于毛细管相互作用开发了一种无聚合物转移方法,原子结构表征证实了高质量的 WS2/MoSe2 横向异质结构。与 WS2 和 MoSe2 器件相比,WS2/MoSe2 横向异质结构光电探测器具有更优越的光响应性能,在 350 纳米波长处的响应率为 21.87 A W-1,探测率为 4.2 × 1012 Jones。开尔文探针力显微镜结果显示,异质结内的内置电场促进了光生电子-空穴对的有效分离。这项研究对光电探测器应用中 TMDC 异质结构的 CVD 生长和无聚合物转移具有深远的意义。
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引用次数: 0
Information Dimension Matching in Memristive Computing System for Analog Deployment of Deep Neural Networks 记忆计算系统中的信息维度匹配,用于深度神经网络的模拟部署
IF 5.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-05-28 DOI: 10.1002/aelm.202400106
Zhe Feng, Zuheng Wu, Xu Wang, Xiuquan Fang, Xumeng Zhang, Jianxun Zou, Jian Lu, Wenbin Guo, Xing Li, Tuo Shi, Zuyu Xu, Yunlai Zhu, Fei Yang, Yuehua Dai, Qi Liu

Memristor, with the ability of analog computing, is widely investigated for improving the computing efficiency of deep neural networks (DNNs) deployment. However, how to fully take advantage of the analog computing ability of memristive computing system (MCS) for DNN deployment is still an open question. Here, a new neural network models deployment scheme, that is, an information dimension matching (IDM) scheme, is proposed to fully take advantage of the analog computing ability of MCS. Furthermore, the spatial and temporal DNN, that is convolutional neural network (CNN) and recurrent neural network (RNN) is used to verify the proposed deployment scheme, respectively. The experimental results indicate that, compared to the traditional deployment schemes, the proposed deployment scheme shows obvious inference accuracy and energy efficiency improvement (>4 × in four-layer DNNs deployment), and the energy efficiency improvement increases dramatically with the layers increment of DNNs. This work paves the path for developing high computing efficiency analog MCS.

为提高深度神经网络(DNN)部署的计算效率,具有模拟计算能力的忆阻器被广泛研究。然而,如何充分利用忆阻器计算系统(MCS)的模拟计算能力来部署 DNN 仍是一个未决问题。本文提出了一种新的神经网络模型部署方案,即信息维度匹配(IDM)方案,以充分利用 MCS 的模拟计算能力。此外,还使用空间和时间 DNN,即卷积神经网络(CNN)和递归神经网络(RNN),分别验证了所提出的部署方案。实验结果表明,与传统的部署方案相比,所提出的部署方案在推理精度和能效方面都有明显的提高(在部署四层 DNN 的情况下提高了 4 倍),而且能效的提高随着 DNN 层数的增加而显著提高。这项工作为开发高计算效率的模拟 MCS 铺平了道路。
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引用次数: 0
Binarized Neural Network Comprising Quasi-Nonvolatile Memory Devices for Neuromorphic Computing 由准非易失性存储器件组成的用于神经形态计算的二值化神经网络
IF 5.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-05-28 DOI: 10.1002/aelm.202400061
Yunwoo Shin, Juhee Jeon, Kyoungah Cho, Sangsig Kim

This study presents a binarized neural network (BNN) comprising quasi-nonvolatile memory (QNVM) devices that operate in a positive feedback loop mechanism and exhibit an extremely low subthreshold swing (≤ 5 mV dec−1) and a high on/off ratio (≥ 107). A pair of QNVM devices are used for a single synaptic cell in a cell array, in which its memory state represents the synaptic weight, and the voltages applied to the pair act as input in a complementary fashion. The array of synaptic cells performs matrix multiply-accumulate (MAC) operations between the weight matrix and input vector using XNOR and current summation. All the results of the MAC operations and vector-matrix multiplications are equivalent. Moreover, the BNN features a high accuracy of 93.32% in the MNIST image recognition simulation owing to high device uniformity (1.35%), which demonstrates the feasibility of compact and high-performance neuromorphic computing.

本研究提出了一种由准非易失性存储器(QNVM)器件组成的二值化神经网络(BNN),该器件在正反馈回路机制中运行,具有极低的阈下摆动(≤ 5 mV dec-1)和较高的开/关比(≥ 107)。细胞阵列中的单个突触细胞使用一对 QNVM 器件,其存储状态代表突触权重,施加到这对器件上的电压以互补方式充当输入。突触单元阵列使用 XNOR 和电流求和法在权重矩阵和输入向量之间进行矩阵乘积 (MAC) 运算。所有 MAC 运算和向量矩阵乘法的结果都是等效的。此外,由于器件均匀性高(1.35%),BNN 在 MNIST 图像识别模拟中的准确率高达 93.32%,这证明了紧凑型高性能神经形态计算的可行性。
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引用次数: 0
A TaOx/TiOy Bilayer Memristor with Enhanced Synaptic Features for Neuromorphic Computing 用于神经形态计算的具有增强突触功能的 TaOx/TiOy 双层膜晶体管
IF 5.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-05-27 DOI: 10.1002/aelm.202400008
Mingmin Zhu, Zhendi Yu, Gao Hu, Kai Yu, Yulong Jiang, Jiawei Wang, Wenjing Dong, Jinming Guo, Yang Qiu, Guoliang Yu, Hao-Miao Zhou

Memristors are a candidate device for artificial neural systems due to their excellent conductance-regulation ability and potential to simulate the characteristics of biological synapses. This study fabricated a Pt/TaOx/TiOy/Ti analog artificial synapse memristor that exhibits excellent multilevel storage property with a large on/off ratio of ≈660 times. The dynamic resistive switching mechanism is well expounded and validated by the reset stopping voltage dependent Schottky fitting results. Moreover, the essential biological synaptic characteristics such as long-term potentiation/depression (LTP/D) and paired-pulse facilitation (PPF) are successfully mimicked with a low pulse energy consumption of 12.69 nJ. A neuromorphic network constructed on the enhanced symmetry and linearity of conductance for this Pt/TaOx/TiOy/Ti memristive device can achieve 92.45% accuracy in recognizing handwritten pattern. These results demonstrate a significant potential for application Pt/TaOx/TiOy/Ti memristor in non-volatile memory and bioinspired neuromorphic systems.

忆阻器因其出色的电导调节能力和模拟生物突触特性的潜力而成为人工神经系统的候选器件。本研究制备了一种 Pt/TaOx/TiOy/Ti 模拟人工突触忆阻器,该忆阻器表现出优异的多级存储特性,具有≈660 倍的大导通/关断比。复位停止电压相关肖特基拟合结果很好地阐述并验证了动态电阻开关机制。此外,还成功模拟了长期延时/抑制(LTP/D)和成对脉冲促进(PPF)等重要的生物突触特性,脉冲能耗低至 12.69 nJ。该 Pt/TaOx/TiOy/Ti Memristive 器件利用增强的对称性和线性电导构建的神经形态网络在识别手写图案方面的准确率达到 92.45%。这些结果表明,Pt/TaOx/TiOy/Ti忆阻器在非易失性存储器和生物启发神经形态系统中的应用潜力巨大。
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引用次数: 0
Electronic Doping in Perovskite Solar Cells 过氧化物太阳能电池中的电子掺杂
IF 5.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-05-26 DOI: 10.1002/aelm.202400090
Zuzanna Molenda, Sylvain Chambon, Dario M. Bassani, Lionel Hirsch

The popularity of metal halide perovskites is in part the result of their versatility in numerous applications. To date, perovskites are used in their intrinsic, undoped form, as the doping of these materials is not yet adequately mastered. Herein, the recently reported electronic doping of CH3NH3PbI3 is employed to fabricate perovskite solar cells in which the interfacial electron transport layer (ETL) is replaced by n-doping of one side of the perovskite film. The doping involves the incorporation of metastable Sm2+ ions that undergo an in situ oxidation to Sm3+, releasing electrons to the conduction band to render the perovskite n-type. In spite of the lack of an ETL, these solar cells have the same efficiency as the samples with the ETL. The open circuit voltage of the doped solar cells increases proportionally to the doping concentration due to the narrowing of the depletion layer thickness at the interface of the perovskite and the top electrode, reaching the value of ≈1 V for the doped ETL-free device, the same as for the reference sample. These proof-of-concept results represent the first step toward perovskite-based devices incorporating a p-n homojunction.

金属卤化物类包晶石之所以广受欢迎,部分原因在于其在众多应用领域的多样性。迄今为止,由于尚未充分掌握这些材料的掺杂技术,因此均以其固有的、未掺杂的形式使用。在本文中,最近报道的 CH3NH3PbI3 电子掺杂被用于制造过氧化物太阳能电池,在这种电池中,过氧化物薄膜的一侧通过 n 掺杂取代了界面电子传输层 (ETL)。这种掺杂涉及掺入可蜕变的 Sm2+ 离子,这些离子在原位氧化成 Sm3+,将电子释放到导带,从而使包晶石成为 n 型。尽管没有 ETL,但这些太阳能电池的效率与带有 ETL 的样品相同。掺杂太阳能电池的开路电压随着掺杂浓度的增加而成正比增加,这是由于包晶和顶部电极界面上的耗尽层厚度变窄所致,无掺杂 ETL 器件的开路电压值≈1 V,与参考样品相同。这些概念验证结果标志着向基于包晶石的 p-n 同结器件迈出了第一步。
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引用次数: 0
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Advanced Electronic Materials
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