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Nanoarchitectonics for Non-Volatile Ternary STDP Synapse Using Anti-Ferroelectric Carbon Nanotube Devices 使用反铁电碳纳米管器件的非挥发性三元STDP突触的纳米结构
IF 5.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2026-01-05 DOI: 10.1002/aelm.202500304
Mohammad Khaleqi Qaleh Jooq, Fereshteh Behbahani, Amirali Amirsoleimani, Mostafa Rahimi Azghadi, Saeed Afshar

Anti-ferroelectrics (AFEs) offer unique properties such as double hysteresis window, high endurance, and low latency, making them appealing for neuromorphic computing architectures. This study introduces a novel, compact, and energy-efficient neuromorphic circuit for spike-timing-dependent plasticity (STDP) synapse using AFE field-effect transistors (AFeFETs). Although AFeFETs are volatile and unsuitable for storing synaptic weights, carbon nanotube field-effect transistors (CNTFETs) are employed with multi-threshold operation to achieve nonvolatility by shifting polarization-electric field (P-E) characteristics. By leveraging the tunable hysteresis characteristics and negative differential resistance (NDR) effect of AFeCNTFETs, a nonvolatile ternary weight storage latch is demonstrated to store STDP-governed synaptic weights. Simulation results show that this synapse improves power efficiency by 30% and saves 93% of energy compared to previous works while remaining immune to power outages. This efficient neuromorphic building block paves the way for enhanced neuromorphic learning architectures.

反铁电体(afe)具有双滞后窗口、高耐久性和低延迟等独特特性,这使得它们对神经形态计算架构具有吸引力。本研究采用AFE场效应晶体管(afefet)为峰值时序依赖的可塑性(STDP)突触设计了一种新颖、紧凑、高能效的神经形态电路。尽管效应场效应晶体管具有易失性,不适合存储突触权重,但碳纳米管场效应晶体管(cntfet)采用多阈值操作,通过改变极化电场(P - E)特性来实现非易失性。利用afecntfet的可调迟滞特性和负差分电阻(NDR)效应,证明了一种非易失性三元权重存储锁存器可以存储STDP控制的突触权重。仿真结果表明,与以前的工作相比,该突触的功率效率提高了30%,节省了93%的能量,同时仍然不受断电的影响。这种高效的神经形态构建模块为增强神经形态学习架构铺平了道路。
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引用次数: 0
Reversible and Controllable Transition Between Filamentary and Interfacial Resistive Switching in HfO2-Based Memristors 基于hfo2的忆阻器中丝状和界面电阻开关的可逆和可控转换
IF 6.2 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2026-01-05 DOI: 10.1002/aelm.202500644
Cuo Wu, Hao Shen, Richard Schroedter, Chong Peng, Hampus Hoffman, Stefan Slesazeck, Ronald Tetzlaff, Thomas Mikolajick, Benjamin Max
Reversible weight tuning is critical for edge AI chips, enabling online learning and local inference. Conventionally, the transition from analog interfacial switching to abrupt filamentary switching in memristors is commonly considered irreversible, as high electric fields induce conductive filaments, locking devices in the filamentary state. Here, we report that TiN/HfO2/Pt memristors exhibit stable interfacial switching and achieve voltage-driven, repeatable interfacial-to-filamentary-to-interfacial (I-F-I) transitions. Systematic electrical characterization demonstrates more than 10 stable I-F-I transition sequences, controllable I-F-I transition yield exceeding 40%, a preserved resistance window, and an ON/OFF ratio of about 30. High bias activates a fast digital filamentary mode, while low bias restores a linearly tunable analog interfacial mode. Two defect migration models—soft filament and Schottky emission—elucidate this phenomenon. This analog-digital switching could in the future, enable single-chip training and inference and support reconfigurable logic-in-memory architectures, advancing low-power artificial neural networks as well as neuromorphic computing for edge AI applications.
可逆权重调整对于边缘人工智能芯片至关重要,可以实现在线学习和本地推理。传统上,记忆电阻器从模拟界面开关过渡到突然的丝状开关通常被认为是不可逆的,因为高电场会诱导导电丝,将器件锁定在丝状状态。在这里,我们报告了TiN/HfO2/Pt忆阻器表现出稳定的界面开关,并实现了电压驱动的,可重复的界面到丝状到界面(I-F-I)转换。系统的电学表征证明了超过10个稳定的I-F-I跃迁序列,超过40%的可控I-F-I跃迁率,保留了电阻窗口,ON/OFF比约为30。高偏置激活快速数字丝状模式,而低偏置恢复线性可调模拟接口模式。软细丝和肖特基发射两种缺陷迁移模型解释了这一现象。这种模拟-数字交换可以在未来实现单芯片训练和推理,并支持可重构的内存逻辑架构,推进低功耗人工神经网络以及边缘人工智能应用的神经形态计算。
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引用次数: 0
Extreme Transverse Magnetoresistance in TiZn16 tizn16的极端横向磁阻
IF 5.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2026-01-04 DOI: 10.1002/aelm.202500632
Aaron Chan, Guoxin Zheng, Dechen Zhang, Yuan Zhu, Kaila Jenkins, Kuan-Wen Chen, Haozhe Wang, Weiwei Xie, Brianna Billingsley, Tai Kong, Na Hyun Jo, Lu Li

Extreme magnetoresistance (XMR) is a phenomenon characterized by an increase in resistance by factors of 104–107% when a magnetic field is applied. This phenomenon is found in a number of semimetals such as WTe2, PtSn4, Cd3As2, and LaSb. The origin of XMR is still hotly debated, possibly with different materials having different (or multiple) explanations. Extreme transverse magnetoresistance of up to 8000% at 14 T and 1.8 K is measured in TiZn16, a semimetal with a multitude of bands crossing the Fermi energy, akin to PtSn4. The magnetoresistance is suppressed when the magnetic field is rotated to be parallel to the applied current, similar to PtSn4 and PdSn4. The resistance of TiZn16 follows Kohler's rule, but displays different behavior under an applied transverse field and under a longitudinal magnetic field, suggesting distinct electrical phases. Also present are Shubnikov-de Haas and de Haas-van Alphen oscillations with a transverse magnetic field up to 43 T, showing that despite an insulator-like temperature-resistance curve, charge carriers are still present. This positions TiZn16 as an interesting addition to the investigation of XMR materials as a multi-band metal with complex Fermi surface geometries.

极端磁阻(XMR)是一种现象,其特征是当施加磁场时,电阻会增加10.4% - 10.7%。这种现象在许多半金属中都有发现,如WTe 2、ptsn4、cd3as 2和LaSb。XMR的起源仍然存在激烈的争论,可能不同的材料有不同(或多种)的解释。在14t和1.8 K下,TiZn 16的横向磁阻高达8000%,TiZn 16是一种半金属,具有大量穿越费米能量的能带,类似于PtSn 4。当磁场旋转到与施加电流平行时,磁电阻被抑制,类似于ptsn4和pdsn4。TiZn 16的电阻遵循Kohler规则,但在施加横向磁场和纵向磁场下表现出不同的行为,表明不同的电相。在高达43 T的横向磁场下还存在Shubnikov - de Haas和de Haas - van Alphen振荡,这表明尽管存在类似绝缘体的温度-电阻曲线,但载流子仍然存在。这使得TiZn 16成为XMR材料研究中一个有趣的补充,它是一种具有复杂费米表面几何形状的多波段金属。
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引用次数: 0
Is There A Pure Electronic Ferroelectric? 是否存在纯电子铁电?
IF 5.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-12-30 DOI: 10.1002/aelm.202500683
Xudong Wang, Guichen Teng, Xiangjian Meng, Zhenxiang Cheng, Tie Lin, Hao Shen, Xiaodan Wang, Jianlu Wang, Junhao Chu

Different from traditional ferroelectrics whose polarization stems from ionic displacements mediated by phonons, electronic ferroelectrics exhibit spontaneous polarization originating from polar electronic ordering. Such electronic mechanisms promise devices with ultrafast switching speeds, lower energy consumption, and enhanced resilience to fatigue and depolarization fields inherent in conventional ferroelectrics. While early candidates are restricted to rare oxides and organic charge-transfer salts, emerging systems—particularly 2D van der Waals moiré heterostructures—have significantly broadened this materials landscape. This review comprehensively examines ferroelectrics governed by electronic mechanisms, categorizing them according to microscopic origins, including spin correlations, charge ordering, orbital interactions, charge-transfer instabilities, and excitonic phenomena. Representative materials span multiferroics, molecular crystals, and engineered van der Waals architectures. Crucially, we evaluate whether their ferroelectricity qualifies as purely electronic—defined by the absence of ionic displacements during polarization reversal—synthesizing recent theoretical and experimental advances to establish a unified framework for this evolving paradigm.

与传统铁电体的极化源于声子介导的离子位移不同,电子铁电体表现出由极性电子有序引起的自发极化。这种电子机制有望使器件具有超快的开关速度,更低的能耗,以及对传统铁电体固有的疲劳和去极化场的增强弹性。虽然早期的候选材料仅限于稀有氧化物和有机电荷转移盐,但新兴的体系,特别是二维范德华莫尔异质结构,已经大大拓宽了这一材料领域。这篇综述全面研究了由电子机制控制的铁电体,并根据微观起源对它们进行了分类,包括自旋相关、电荷有序、轨道相互作用、电荷转移不稳定性和激子现象。代表性材料跨越多铁性、分子晶体和工程范德华体系结构。至关重要的是,我们评估了它们的铁电性是否符合纯电子的条件——由极化逆转过程中不存在离子位移来定义——综合了最近的理论和实验进展,为这种不断发展的范式建立了统一的框架。
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引用次数: 0
ALD Reactivity‐Driven 2DEG‐Like Interfacial Conduction in Nanolaminate InGaZnO Transistors toward High‐Mobility and Stable Oxide Electronics 面向高迁移率和稳定氧化物电子的纳米层合InGaZnO晶体管中ALD反应性驱动的2DEG类界面传导
IF 6.2 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-12-24 DOI: 10.1002/aelm.202500642
Yoon‐Seo Kim, Daejung Kim, Ki‐Cheol Song, Yeonhee Lee, Hyeong‐Suk Yoo, Young Jae Kim, Jonghoon Kim, Jin‐Seong Park
Achieving ultrahigh mobility in oxide semiconductors without sacrificing stability has remained a long‐standing challenge owing to their inherent disorder and the tradeoff between mobility and stability. In this study, we demonstrated for the first time that the completeness of atomic layer deposition (ALD) surface reactions is the key factor for the formation of well‐defined vertical heterostructures in amorphous InGaZnO (IGZO) thin films, which in turn trigger quantum confinement effects and 2Delectron gas (2DEG) like interfacial conduction. By comparing high‐reactivity oxygen plasma and low‐reactivity ozone as oxidants, we revealed that only plasma‐assisted ALD achieved complete surface reactions, yielding atomically ordered InO x– (Ga, Zn)O stacks with distinct interfaces. This engineered structure resulted in an exceptional field‐effect mobility (>87 cm 2 V −1 s −1 ) with positive threshold voltage (0.56 V), an apparent two‐step conduction signature, and superior stability of the positive/negative bias temperature stability of 0.35/−0.01 V. Temperature‐dependent transport from room to cryogenic temperature (83K) and high‐temperature annealing (600°C) further confirmed the correlation among reaction completeness, interface quality, and 2DEG‐like interfacial conduction. This study identifies a critical link between ALD surface chemistry and quantum transport in oxides and provides a novel and practical strategy to overcome the mobility–stability tradeoff in next‐generation oxide transistors.
在不牺牲稳定性的情况下实现氧化物半导体的超高迁移率一直是一个长期存在的挑战,因为它们固有的无序性以及迁移率和稳定性之间的权衡。在这项研究中,我们首次证明了原子层沉积(ALD)表面反应的完整性是在非晶InGaZnO (IGZO)薄膜中形成明确的垂直异质结构的关键因素,这反过来又触发量子约束效应和2de电子气体(2DEG)样界面传导。通过比较高反应性氧等离子体和低反应性臭氧作为氧化剂,我们发现只有等离子体辅助ALD才能实现完整的表面反应,生成具有不同界面的原子有序的InO x - (Ga, Zn)O堆叠。这种工程结构在正阈值电压(0.56 V)下具有出色的场效应迁移率(>87 cm 2 V−1 s−1),具有明显的两步传导特征,并且具有优异的正/负偏置温度稳定性(0.35/−0.01 V)。从室温到低温(83K)的温度依赖传输和高温退火(600℃)进一步证实了反应完整性、界面质量和2DEG - like界面传导之间的相关性。本研究确定了ALD表面化学和氧化物中量子输运之间的关键联系,并提供了一种新颖实用的策略来克服下一代氧化物晶体管的迁移率-稳定性权衡。
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引用次数: 0
Pressure Effects on Monolayer FeCl2: Above-Room-Temperature Ferromagnetism with In-Plane Electric Polarization and Interface-Free Magnetic Tunnel Junctions 压力对单层fecl2的影响:具有平面内电极化和无界面磁隧道结的室温以上铁磁性
IF 5.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-12-23 DOI: 10.1002/aelm.202500230
Shubham Tyagi, Paresh C. Rout, Shubham Singh, Udo Schwingenschlögl

We investigate the influence of hydrostatic pressure on the physical properties of monolayer FeCl2${rm FeCl}_2$ for spintronics applications. A phase transition from a ferromagnetic half-metal to a ferromagnetic semiconductor is unveiled at 4.6 GPa, accompanied by a transition from a non-polar (1T) to a polar (1H) structure. We demonstrate that hydrostatic pressure elevates the Curie temperature above room temperature (for example, 618 K at 5 GPa) and enhances the magnetic anisotropy energy (for example, 731 μeV$umu{rm eV}$ per formula unit at 5 GPa). A significant Dzyaloshinskii-Moriya interaction is present in the 1H structure (due to the broken spatial inversion symmetry) and increases with the hydrostatic pressure. Together with the observation of in-plane electric polarization (for example, 1.1 pCcm−1 at 5 GPa), this positions the 1H structure as a pioneer in the class of 2D materials. Exploiting the phase transition of monolayer FeCl2${rm FeCl}_2$, a single-material magnetic tunnel junction is proposed and an outstanding tunneling magnetoresistance ratio is demonstrated.

研究了静水压力对用于自旋电子学的单层材料物理性能的影响。在4.6 GPa下发现了从铁磁性半金属到铁磁性半导体的相变,并伴有从非极性(1T)到极性(1H)结构的转变。我们证明静水压力使居里温度高于室温(例如,在5 GPa时,居里温度为618 K),并增强磁各向异性能(例如,在5 GPa时,每公式单位磁各向异性能为731 K)。在1H结构中存在显著的Dzyaloshinskii - Moriya相互作用(由于空间反演对称性的破坏),并且随着静水压力的增加而增加。再加上对平面内电极化的观察(例如,在5 GPa下,1.1 pCcm−1),这使得1H结构成为2D材料类别的先驱。利用单层的相变,提出了一种单材料磁隧道结,并证明了良好的隧道磁电阻比。
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引用次数: 0
Nitride Ferroelectric Domain Wall Memory for Next-Generation Computing 下一代计算用氮化铁电畴壁存储器
IF 5.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-12-23 DOI: 10.1002/aelm.202500616
Georg Schönweger, Deik Dasenbrook, Niklas Kyoushi, Roberto Guido, Adrian Petraru, Thomas Mikolajick, Uwe Schröder, Hermann Kohlstedt, Simon Fichtner

The emerging nitride ferroelectrics, such as Al1-xScxN promise to significantly advance our current information technology. In particular, two-terminal memristive devices are ideal candidates for artificial intelligence accelerators and in-memory computing due to their simplicity in design, non-volatility and non-destructive readout. The recent discovery of conductive domain walls in Al1-xScxN is a promising enabler for such technology, offering several benefits compared to barrier height modulation- or tunneling-based devices. First, domain walls can be highly conductive and feature high read currents (required for aggressive lateral scaling and fast access times), also in non-epitaxial films without being restricted to the technologically challenging ultrathin thickness regime (<$<$10 nm). Second, nitride ferroelectrics are fully compatible with silicon and GaN technology on which the ferroelectric domain wall memory (FeDMEM) can be integrated with logic circuitry. Third, excellent scalability and temperature resistance of ferroelectric Al1-xScxN were demonstrated, enabling scaled, low-latency edge computing under extreme environmental conditions. In this study, a FeDMEM device consisting of a Pt/Al0.72Sc0.28N/Pt capacitor grown on Si substrates is electrically characterized in-depth, revealing unique peculiarities in the memristive response. A read current density of 350 A/m2 and an ON/OFF ratio of 20 is achieved, allowing for consistent storing of up to eight levels of information.

新兴的氮化铁电体,如Al 1‐x Sc x N,有望显著推进我们当前的信息技术。特别是,由于其设计简单,非易失性和非破坏性读出,双端记忆器件是人工智能加速器和内存计算的理想候选者。最近在Al - 1 - x Sc - x N中发现的导电畴壁是这种技术的一个有前途的推动因素,与基于势垒高度调制或隧道的器件相比,它具有许多优点。首先,畴壁可以具有高导电性和高读取电流(需要侵略性横向缩放和快速访问时间),也可以在非外延薄膜中使用,而不受技术上具有挑战性的超薄厚度范围(10纳米)的限制。其次,氮化铁电体与硅和氮化镓技术完全兼容,铁电畴壁存储器(FeDMEM)可以与逻辑电路集成。第三,展示了铁电Al 1 - x Sc x N的优异可扩展性和耐温性,在极端环境条件下实现了规模化、低延迟的边缘计算。在这项研究中,由生长在Si衬底上的Pt/Al 0.72 Sc 0.28 N/Pt电容器组成的FeDMEM器件进行了深入的电学表征,揭示了记忆响应的独特特性。读取电流密度为350 A/ m2,开/关比为20,可存储多达8个级别的信息。
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引用次数: 0
Recent Progress and Opportunities in Oxide Semiconductor Devices for In‐Memory and Neuromorphic Computing 用于内存和神经形态计算的氧化物半导体器件的最新进展和机遇
IF 6.2 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-12-22 DOI: 10.1002/aelm.202500521
Suwon Seong, Taejun Ha, Sangwook Jung, Wontae Jeong, Yoonyoung Chung
The increasing complexity of artificial intelligence has exposed critical limitations of conventional von Neumann architectures, particularly in terms of data transfer bottlenecks and high energy consumption. Consequently, alternative paradigms such as in‐memory and neuromorphic computing have attracted significant attention. Oxide semiconductors, which have achieved commercial success in the display industry, have recently garnered significant attention for neuromorphic computing applications due to their unique properties, including extremely low leakage current, low processing temperatures, and excellent compatibility with back‐end‐of‐line integration with conventional silicon circuits. This review discusses recent advancements and challenges in oxide semiconductor‐based devices for in‐memory and neuromorphic computing. It explicitly addresses multilevel memory devices optimized for analog multiply‐accumulate operations, highlighting key trade‐offs among retention, endurance, operational speed, and energy efficiency. Neuromorphic synaptic devices utilizing oxide semiconductors are highlighted for their effective emulation of synaptic behaviors for spiking neural networks. Additionally, recent developments in optoelectronic neuromorphic systems and reservoir computing using oxide semiconductors are presented, along with insights into emerging device structures and future opportunities for 3D integration to maximize computing efficiency.
人工智能的日益复杂暴露了传统冯·诺伊曼架构的关键局限性,特别是在数据传输瓶颈和高能耗方面。因此,记忆和神经形态计算等替代范式引起了人们的极大关注。氧化物半导体在显示行业取得了商业上的成功,由于其独特的性能,包括极低的漏电流,低的加工温度,以及与传统硅电路的后端集成的出色兼容性,最近在神经形态计算应用中引起了极大的关注。本文综述了基于氧化物半导体的内存和神经形态计算器件的最新进展和挑战。它明确地解决了针对模拟乘法累积操作优化的多级存储设备,突出了保留,耐用性,操作速度和能源效率之间的关键权衡。利用氧化物半导体的神经形态突触装置因其对脉冲神经网络突触行为的有效模拟而备受关注。此外,还介绍了光电神经形态系统和使用氧化物半导体的储层计算的最新发展,以及对新兴器件结构和3D集成的未来机会的见解,以最大限度地提高计算效率。
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引用次数: 0
Physics-Informed Deep Learning Method for Real-Time Multi-Harmonic Beamforming Based on Space-Time-Coding Metasurface 基于时空编码超表面的实时多谐波束形成的物理信息深度学习方法
IF 5.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-12-22 DOI: 10.1002/aelm.202500595
Jiang Han Bao, Che Liu, Yi Ning Zheng, Lei Zhang, Wen Ming Yu, Lianlin Li, Tie Jun Cui

Space-time-coding metasurfaces (STCMs) enable simultaneous controls of electromagnetic wave across multiple harmonics, but designing high-performance coding sequences in real time remains challenging. Here, we propose an unsupervised physics-informed deep learning framework that can generate optimal spatiotemporal coding patterns for arbitrary single- and dual-beam requirements at each harmonic frequency. The proposed method features three key innovations: physics-informed mechanisms to enable unsupervised learning without requiring paired training data, a dedicated strategy for multi-bit metasurface configurations, and the Conflict Averse Gradient descent (CAGrad) method to coordinate the parameter optimization across harmonics in multi-task learning. Experiments on a 2-bit STCM demonstrate robust beamforming capabilities over five harmonics, achieving an average radiation difference of 1.55 dB and real-time design <0.1s. This is a 4-order-of-magnitude improvement in computational efficiency compared with the particle swarm optimization methods. This work establishes a real-time and physics-aware design paradigm for intelligent metasurfaces in the next-generation wireless systems.

时空编码元表面(stcm)能够同时控制多个谐波的电磁波,但实时设计高性能编码序列仍然具有挑战性。在这里,我们提出了一个无监督的物理信息深度学习框架,该框架可以在每个谐波频率下为任意单束和双束需求生成最佳的时空编码模式。提出的方法具有三个关键创新:物理信息机制,无需配对训练数据即可实现无监督学习,多比特元表面配置的专用策略,以及在多任务学习中协调跨谐波参数优化的冲突厌恶梯度下降(CAGrad)方法。在2位STCM上的实验证明了在五个谐波上的强大波束形成能力,实现了1.55 dB的平均辐射差和0.1s的实时设计。与粒子群优化方法相比,计算效率提高了4个数量级。这项工作为下一代无线系统中的智能元表面建立了一个实时和物理感知的设计范例。
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引用次数: 0
Tunable Dual-Photoconductivity in VS2 Films vs2薄膜的可调谐双光电导率
IF 5.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-12-22 DOI: 10.1002/aelm.202500610
Zhihua Cheng, Tengfei Lu, Chaoyu Chen, Hualong Tao, Zhiqiang Li, Yao Liang, Yongqing Cai, Tianming Lv, Zhiguang Sun, Liyan Zhang, Ying Wang, Baoting Quan, Zheng Wei, Zhihua Zhang

2D semiconducting H-phase vanadium disulfide (VS2) has attracted significant research interest due to its exceptional potential in electronics, optoelectronics, spintronics, and valleytronics. In this work, VS2 thin films are synthesized via chemical vapor deposition for the application of photodetectors, revealing a tunable dual-photoconductivity effect induced by CO2 adsorption and light-assisted desorption. CO2 adsorption led to negative photoconductivity, achieving a remarkable responsivity of ∼2680 A/W and an ultra-high external quantum efficiency of ∼1.3 × 106%. In contrast, VS2 photodetectors free from CO2 adsorption exhibited stable positive photoconductivity, with a maximum responsivity and external quantum efficiency of ∼0.11 A/W and ∼30.47%, respectively. First-principles calculations demonstrate that CO2 exhibits superior adsorption and desorption capabilities on the VS2 surface compared to other ambient gas molecules (e.g., N2, O2, and H2O). This work highlights the profound influence of gas adsorption on the photoconductivity behavior of VS2 thin films, providing critical insights into their optoelectronic properties and enabling non-destructive modulation for advanced device applications.

二维半导体氢相二硫化钒(VS 2)由于其在电子学、光电子学、自旋电子学和谷电子学方面的特殊潜力而引起了人们的极大兴趣。在这项工作中,通过化学气相沉积法合成了用于光电探测器的vs2薄膜,揭示了CO 2吸附和光辅助脱附诱导的可调双光导效应。CO 2吸附导致负光电导率,实现了显著的响应率~ 2680 a /W和超高的外量子效率~ 1.3 × 106%。相比之下,没有CO 2吸附的vs2光电探测器表现出稳定的正光电导率,最大响应率和外量子效率分别为~ 0.11 a /W和~ 30.47%。第一性原理计算表明,与其他环境气体分子(如n2、o2和h2o)相比,co2在VS 2表面表现出优越的吸附和解吸能力。这项工作强调了气体吸附对vs2薄膜的光导行为的深远影响,为其光电特性提供了重要的见解,并为先进器件应用提供了非破坏性调制。
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引用次数: 0
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