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Ultra-high energy storage density and efficiency at low electric fields/voltages in dielectric thin film capacitors through synergistic effects 基于协同效应的介质薄膜电容器在低电场/电压下的超高能量存储密度和效率
IF 9.4 1区 材料科学 Q1 CHEMISTRY, PHYSICAL Pub Date : 2024-11-30 DOI: 10.1016/j.jmat.2024.100980
Jamal Belhadi, Zouhair Hanani, Nick A. Shepelin, Urška Trstenjak, Nina Daneu, Arnold M. Müller, Christof Vockenhuber, Bojan Ambrožič, Vid Bobnar, Gertjan Koster, Mimoun El Marssi, Thomas Lippert, Matjaž Spreitzer
Ensuring reliable and safe operation of high-power electronic devices necessitates the development of high-quality dielectric nano-capacitors with high recoverable energy density (URec) and efficiency (η) at low applied electric fields (E)/voltages. In this work, we demonstrate ultra-high URec and η at low E <500 kV/cm in as-grown epitaxial relaxor ferroelectric (RFE) PMN-33PT films, rivaling those typically achieved in state-of-the-art RFE and antiferroelectric (AFE) materials. The high energy storage properties were achieved using a synergistic strategy involving large polarization, a giant built-in potential/imprint (five times higher than the coercive field), and AFE like behavior. The structural, chemical, and electrical investigations revealed that these achievements mainly arise from the effects of strain, dipole defects, and chemical composition. For instance, at low E, the capacitors exhibit under 160 kV/cm (i.e., 8V) and 400 kV/cm (i.e., 20V), respectively, an ultra- high ΔP (45 μC/cm2 and 60 μC/cm2), UE= URec /E (21 J⸱MV/cm2 and 17 J⸱MV/cm2), and UF=URec/(1–η) (20 J/cm3 and 47 J/cm3) with a robust charge-discharge fatigue endurance and outstanding frequency and thermal stability. Additionally, the designed films exhibit outstanding energy storage performance at higher E up to 2 MV/cm (ΔP ≈ 78 μC/cm2, UE≈ 17.3 J⸱MV/cm2 and UF≈ 288 J/cm3) due to their low leakage current density.
为了保证大功率电子器件的可靠和安全运行,需要开发高质量的介质纳米电容器,该电容器在低外加电场(E)/电压下具有高可回收能量密度(URec)和高效率(η)。在这项工作中,我们在生长的外延弛豫铁电(RFE) PMN-33PT薄膜中展示了在低E <;500 kV/cm下的超高URec和η,可与最先进的RFE和反铁电(AFE)材料相匹敌。高能量存储性能是通过协同策略实现的,包括大极化、巨大的内置电位/印记(比矫顽力场高5倍)和AFE类行为。结构、化学和电学研究表明,这些成就主要是由于应变、偶极子缺陷和化学成分的影响。例如,在低E时,电容器分别在160 kV/cm(即8V)和400 kV/cm(即20V)下表现出超高的ΔP (45 μC/cm2和60 μC/cm2), UE= URec/ E (21 J⸱MV/cm2和17 J⸱MV/cm2), UF=URec/(1 - η) (20 J/cm3和47 J/cm3),具有良好的充放电疲劳耐久性和出色的频率和热稳定性。此外,由于所设计的薄膜具有较低的漏电流密度,在较高的E下具有优异的储能性能,最高可达2 MV/cm (ΔP≈78 μC/cm2, UE≈17.3 J⸱MV/cm2, UF≈288 J/cm3)。
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引用次数: 0
SnO2SnS2/graphene heterojunction composite promotes high-performance sodium ion storage SnO2-SnS2 /石墨烯异质结复合材料促进了高性能钠离子存储
IF 8.4 1区 材料科学 Q1 CHEMISTRY, PHYSICAL Pub Date : 2024-11-30 DOI: 10.1016/j.jmat.2024.100983
Yuanyuan Ma , Ke Ping , Peng Sun , Kaibin Lin , Junjie Guo , Lu Yue , Wenhui Zhang , Xiangwei Wu , Zhaoyin Wen
The design of electrode material nanostructures including reducing material sizes and designing appropriate heterostructures, has great potential in improving charge storage dynamics and enhancing practical performance. In this study, we present the innovative synthesis of SnO2SnS2/graphene heterojunction composite materials via a controlled vulcanization reaction process. The unique structure endows the composite with high electronic conductivity, rapid ion diffusion rates, elevated electrochemical activity, excellent structural stability, and abundant reaction sites, making it a highly efficient anode material for sodium-ion batteries (SIBs). Half-cell tests demonstrate that the SnO2SnS2/r–G composite achieves a first Coulombic efficiency of 77.3% at a high current density of 5 A/g, showing remarkable cycling stability. Remarkably, the composite retains a reversible capacity of 330 mA⋅h/g after 1000 cycles, with a capacity retention rate of 77.5%. Moreover, we elucidate the specific sodium storage mechanisms of the heterojunction composite electrode via in-situ and ex-situ characterization methods. Furthermore, a full battery utilizing Na0.53MnO2 as the cathode and SnO2SnS2/r–G composite as the anode exhibits outstanding rate performance and long-term cycling stability. This method of heterostructure design and fabrication, coupled with the exceptional performance metrics, suggests that the SnO2SnS2/r–G heterostructure is a promising candidate for advanced anode materials in SIBs applications.
电极材料纳米结构的设计包括减小材料尺寸和设计合适的异质结构,在改善电荷存储动力学和提高实用性能方面具有很大的潜力。在这项研究中,我们提出了通过控制硫化反应过程合成SnO2-SnS2/石墨烯异质结复合材料的创新方法。独特的结构使该复合材料具有高电子导电性、离子扩散速度快、电化学活性高、结构稳定性好、反应位点丰富等特点,是一种高效的钠离子电池负极材料。半电池测试表明,SnO2-SnS2 / r-G复合材料在5 a /g的高电流密度下,第一库仑效率达到77.3%,具有显著的循环稳定性。值得注意的是,该复合材料在1000次循环后仍保持330 mA·h/g的可逆容量,容量保持率为77.5%。此外,我们通过原位和非原位表征方法阐明了异质结复合电极的特定钠储存机制。此外,以Na0.53MnO2为阴极,SnO2-SnS2 / r-G复合材料为阳极的全电池具有出色的倍率性能和长期循环稳定性。这种异质结构设计和制造方法,加上优异的性能指标,表明SnO2-SnS2 / r-G异质结构是sib应用中先进阳极材料的有希望的候选材料。
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引用次数: 0
Defect engineering induced phase competition in BNT-based relaxor ferroelectrics for dielectric energy storage 电介质储能用bnt弛豫铁电材料的缺陷工程诱导相竞争
IF 8.4 1区 材料科学 Q1 CHEMISTRY, PHYSICAL Pub Date : 2024-11-29 DOI: 10.1016/j.jmat.2024.100979
Dong-Xu Li , Zhipeng Li , Zong-Yang Shen , Xuhai Shi , Xiaojun Zeng , You Zhang , Wenqin Luo , Fusheng Song , Chao-Feng Wu
Dielectric capacitors are independent in advanced electronics and pulse power systems as an energy storage and conversion medium. However, achieving high energy density at a low electric field remains challenging for dielectric materials to improve the safety of integrated electronic devices. In this work, the strategy of defect engineering-induced phase competition is proposed to improve the polarization behavior and strengthen dielectric temperature stability of (Bi,Na)TiO3 (BNT)-based relaxor ferroelectric, i.e., Na0.325Sr0.245Ba0.105–1.5x0.5xBi0.325+xTiO3 (NSB0.105–1.5x0.5xB0.325+xT) ceramics by changing the ratio of Bi3+/Ba2+. A high recoverable energy density (Wrec = 3.6 J/cm3) is achieved at a relatively low electric field of 160 kV/cm for x = 0.06 composition together with a high dielectric constant of 3142% ± 15% in a wide temperature range of 30–386 °C, which exceeds other lead-free dielectric ceramics at the same electric field. The results demonstrate that NSB0.0150.03B0.385T ceramics are desirable for advanced pulsed power capacitors and will push the development of defect-tuned functionality of dielectric ceramics for energy storage applications.
介质电容器作为一种能量存储和转换介质,在先进的电子和脉冲电源系统中是独立的。然而,如何在低电场条件下实现高能量密度,仍然是电介质材料提高集成电子器件安全性的挑战。本文提出了缺陷工程诱导相竞争的策略,通过改变Bi3+/Ba2+的比例,改善(Bi,Na)TiO3 (BNT)基弛豫铁电陶瓷(Na0.325Sr0.245Ba0.105-1.5x□0.5xBi0.325+xTiO3 (NSB0.105-1.5x□0.5xB0.325+xT)的极化行为和增强介电温度稳定性。在相对较低的电场(160 kV/cm)条件下,x=0.06的成分在30-386℃的宽温度范围内获得了较高的可回收能量密度(Wrec=3.6 J/cm3)和介电常数(3142±15%),超过了在相同电场下的其他无铅介电陶瓷。结果表明,NSB0.015□0.03B0.385T陶瓷是先进脉冲功率电容器的理想选择,并将推动介质陶瓷在储能应用中的缺陷调谐功能的发展。
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引用次数: 0
High entropy engineering boosts thermo-mechanical properties of rare-earth tantalates: Influences of cocktail effects 高熵工程提高稀土钽酸盐热机械性能:鸡尾酒效应的影响
IF 8.4 1区 材料科学 Q1 CHEMISTRY, PHYSICAL Pub Date : 2024-11-29 DOI: 10.1016/j.jmat.2024.100984
Luyang Zhang , Lin Chen , Jiankun Wang , Yuxuan Zhang , Yanhui Chu , Jing Feng
High entropy engineering has been widely used to optimize properties of various materials, and we improve comprehensive performance of rare-earth tantalates RETaO4 (RE is rare earth) by changing configurational entropy in this work. Four medium/high entropy RETaO4 (M/HERT) are successfully prepared, and the variations of disorders and distortion degree of lattices with the increasing configurational entropy are described in detail. It is revealed that M/HERT with the highest configurational entropy does not correspond to the best comprehensive properties. Unexpected variations in properties of M/HERT compared to RETaO4 are observed. By comparing with values obtained from rule of mixture (ROM), it is believed that the cocktail effect exists in M/HERT. The synergistic optimizations of thermo-mechanical properties are realized, including reducing thermal conductivity, increasing thermal expansion coefficients (TECs), and enhancing mechanical properties. M/HERT exhibit excellent high temperature stability and provide a good thermal insulation gradient, which is significant for high-temperature applications of RETaO4. This work serves as an important part for thermal barrier coatings materials with high working temperatures and low thermal conductivity.
高熵工程被广泛应用于各种材料的性能优化,本研究通过改变构型熵来提高稀土钽酸盐RETaO4 (RE为稀土)的综合性能。成功制备了四个中/高熵RETaO4 (M/HERT),并详细描述了晶格无序度和畸变度随构型熵增加的变化规律。结果表明,构型熵最高的M/HERT并不对应最佳的综合性能。与RETaO4相比,M/HERT的性质发生了意想不到的变化。通过与混合规律(ROM)的数值比较,认为M/HERT存在鸡尾酒效应。实现了热工性能的协同优化,包括降低导热系数、提高热膨胀系数(tec)和提高力学性能。M/HERT具有优异的高温稳定性和良好的保温梯度,这对RETaO4的高温应用具有重要意义。这项工作对高工作温度、低导热系数的热障涂层材料具有重要意义。
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引用次数: 0
(001) β-Ga2O3 epitaxial layer grown with in-situ pulsed Al atom assisted method by MOCVD (001)原位脉冲Al原子辅助MOCVD法制备β-Ga2O3同外延层
IF 8.4 1区 材料科学 Q1 CHEMISTRY, PHYSICAL Pub Date : 2024-11-29 DOI: 10.1016/j.jmat.2024.100981
Yunlong He , Yang Liu , Xiaoli Lu , Zhan Wang , Xianqiang Song , Ying Zhou , Xuefeng Zheng , Xiaohua Ma , Yue Hao
In this paper, to overcome the issues of high roughness and defect density in (001) β-Ga2O3 epitaxial films grown by MOCVD, a novel in-situ pulsed Al atom assisted growth method is proposed. Compared to films grown by conventional growth methods, the β-Ga2O3 epitaxial film grown using this method exhibited lower RMS roughness and a smaller FWHM of the (002) peak in the X-ray rocking curve. Additionally, oxygen vacancy defects within the film are significantly reduced, and Al incorporation is relatively limited without inducing lattice distortion. The width of serrations at the substrate-epitaxial layer interface is reduced from 70 nm to 17 nm, demonstrating improved interface flatness. The mechanism of pulsed Al atoms in optimizing homoepitaxial growth of (001) β-Ga2O3 is proposed, including their roles as preferential nucleation sites for Ga atoms, their inhibitory effects on Ga2O formation and desorption, and the enhancement of atomic diffusion while minimizing parasitic side reactions. The phenomenon of epitaxial orientation rotation is observed, and a hypothesis is proposed regarding the causes of the difference in rotation angle and surface flatness. Additionally, Schottky barrier diodes (SBDs) are also fabricated to study the electrical properties of these epitaxial materials. The epitaxial layer obtained through the pulsed Al atom assisted growth method exhibited a breakdown field strength of 1.8 MV/cm. These results demonstrate that the pulsed Al atom assisted growth method may serve as a valuable reference for achieving high-quality (001) β-Ga2O3 epitaxial growth by the MOCVD method.
本文针对MOCVD法生长(001)β-Ga2O3同外延膜存在的高粗糙度和缺陷密度问题,提出了一种原位脉冲Al原子辅助生长方法。与传统生长方法生长的薄膜相比,用这种方法生长的β-Ga2O3外延膜在x射线摇摆曲线上表现出更低的RMS粗糙度和更小的(002)峰的FWHM。此外,薄膜内的氧空位缺陷显著减少,Al的掺入相对有限,不会引起晶格畸变。衬底-外延层界面处的锯齿宽度从70 nm减小到17 nm,表明界面平整度得到改善。提出了脉冲Al原子优化(001)β-Ga2O3同外延生长的机制,包括它们作为Ga原子优先成核位点的作用,它们对Ga2O形成和解吸的抑制作用,以及它们在减少寄生副反应的同时增强原子扩散的作用。观察到外延取向旋转现象,并对旋转角度和表面平整度差异的原因提出了假设。此外,还制作了肖特基势垒二极管(sbd)来研究这些外延材料的电学特性。通过脉冲Al原子辅助生长方法获得的外延层击穿场强为1.8 MV/cm。这些结果表明,脉冲Al原子辅助生长方法可以为MOCVD方法实现高质量的(001)β-Ga2O3外延生长提供有价值的参考。
{"title":"(001) β-Ga2O3 epitaxial layer grown with in-situ pulsed Al atom assisted method by MOCVD","authors":"Yunlong He ,&nbsp;Yang Liu ,&nbsp;Xiaoli Lu ,&nbsp;Zhan Wang ,&nbsp;Xianqiang Song ,&nbsp;Ying Zhou ,&nbsp;Xuefeng Zheng ,&nbsp;Xiaohua Ma ,&nbsp;Yue Hao","doi":"10.1016/j.jmat.2024.100981","DOIUrl":"10.1016/j.jmat.2024.100981","url":null,"abstract":"<div><div>In this paper, to overcome the issues of high roughness and defect density in (001) β-Ga<sub>2</sub>O<sub>3</sub> epitaxial films grown by MOCVD, a novel in-situ pulsed Al atom assisted growth method is proposed. Compared to films grown by conventional growth methods, the β-Ga<sub>2</sub>O<sub>3</sub> epitaxial film grown using this method exhibited lower RMS roughness and a smaller FWHM of the (002) peak in the X-ray rocking curve. Additionally, oxygen vacancy defects within the film are significantly reduced, and Al incorporation is relatively limited without inducing lattice distortion. The width of serrations at the substrate-epitaxial layer interface is reduced from 70 nm to 17 nm, demonstrating improved interface flatness. The mechanism of pulsed Al atoms in optimizing homoepitaxial growth of (001) β-Ga<sub>2</sub>O<sub>3</sub> is proposed, including their roles as preferential nucleation sites for Ga atoms, their inhibitory effects on Ga<sub>2</sub>O formation and desorption, and the enhancement of atomic diffusion while minimizing parasitic side reactions. The phenomenon of epitaxial orientation rotation is observed, and a hypothesis is proposed regarding the causes of the difference in rotation angle and surface flatness. Additionally, Schottky barrier diodes (SBDs) are also fabricated to study the electrical properties of these epitaxial materials. The epitaxial layer obtained through the pulsed Al atom assisted growth method exhibited a breakdown field strength of 1.8 MV/cm. These results demonstrate that the pulsed Al atom assisted growth method may serve as a valuable reference for achieving high-quality (001) β-Ga<sub>2</sub>O<sub>3</sub> epitaxial growth by the MOCVD method.</div></div>","PeriodicalId":16173,"journal":{"name":"Journal of Materiomics","volume":"11 4","pages":"Article 100981"},"PeriodicalIF":8.4,"publicationDate":"2024-11-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142742713","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":1,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Synergistic effects lead to high thermoelectric performance of iodine doped pseudo-binary layered GeSb2Te4 协同效应使掺碘伪二元层状 GeSb2Te4 具有高热电性能
IF 8.4 1区 材料科学 Q1 CHEMISTRY, PHYSICAL Pub Date : 2024-11-22 DOI: 10.1016/j.jmat.2024.100973
Yongjin Chen , Hong Wu , Guang Han , Bin Zhang , Xu Lu , Wenge Yang , Guoyu Wang , Xiaodong Han , Xiaoyuan Zhou
Pseudo-binary layered compound ⅣVI-V2VI3 families show great promise for application in thermoelectrics. Herein, through introducing iodine in GeSb2Te4, several synergistic effects come into being and contribute to outstanding thermoelectric performance. The ITe donor-like defects suppress the hole carrier concentration from 5.72 × 1020 cm−3 to 2.80 × 1020 cm−3. First-principles calculations reveal that iodine doping increases the band gap from 0.253 eV to 0.302 eV and contributes to valence band convergence. Seebeck coefficient value reaches up to 135.7 μV/K at 773 K, and the power factor values are entirely boosted in the whole temperature region, reaching a maximum value of 12.4 μW⸱cm−1⸱K−2 in GeSb2Te3.96I0.04. Moreover, iodine doping simultaneously reduces the lattice and electronic thermal conductivity, leading to the greatly reduced total thermal conductivity from 2.89 W⸱m−1⸱K−1 in pristine sample to 0.89 W⸱m−1⸱K−1 in GeSb2Te3.84I0.16 at 323 K. Finally, a maximum zT ∼1.12 at 773 K and an average zT ∼0.62 over 323–773 K are achieved in GeSb2Te3.88I0.12. This work puts forward an effective strategy to synergistically optimize phonon and carrier transport properties of pseudo-binary compounds through halogen doping, which may be effective in other similar material systems.
伪二元层状化合物 ⅣVI-V2VI3 族在热电领域的应用前景十分广阔。在这里,通过在 GeSb2Te4 中引入碘,产生了几种协同效应,有助于实现出色的热电性能。ITe 供体样缺陷将空穴载流子浓度从 5.72 × 1020 cm-3 抑制到 2.80 × 1020 cm-3。第一原理计算显示,碘掺杂使带隙从 0.253 eV 增加到 0.302 eV,并有助于价带收敛。在 773 K 时,塞贝克系数值高达 135.7 μV/K,功率因数值在整个温度区域都得到了提升,在 GeSb2Te3.96I0.04 中达到了 12.4 μW⸱cm-1⸱K-2的最大值。此外,碘掺杂同时降低了晶格热导率和电子热导率,导致总热导率从原始样品的 2.89 W⸱m-1⸱K-1大幅降低到 0.89 W⸱m-1⸱K-2。最后,在 GeSb2Te3.88I0.12 中,773 K 时的最大 zT ∼ 1.12,323-773 K 时的平均 zT ∼ 0.62。这项工作提出了一种通过掺杂卤素协同优化伪二元化合物声子和载流子输运特性的有效策略,这种策略可能在其他类似材料系统中有效。
{"title":"Synergistic effects lead to high thermoelectric performance of iodine doped pseudo-binary layered GeSb2Te4","authors":"Yongjin Chen ,&nbsp;Hong Wu ,&nbsp;Guang Han ,&nbsp;Bin Zhang ,&nbsp;Xu Lu ,&nbsp;Wenge Yang ,&nbsp;Guoyu Wang ,&nbsp;Xiaodong Han ,&nbsp;Xiaoyuan Zhou","doi":"10.1016/j.jmat.2024.100973","DOIUrl":"10.1016/j.jmat.2024.100973","url":null,"abstract":"<div><div>Pseudo-binary layered compound ⅣVI-V<sub>2</sub>VI<sub>3</sub> families show great promise for application in thermoelectrics. Herein, through introducing iodine in GeSb<sub>2</sub>Te<sub>4</sub>, several synergistic effects come into being and contribute to outstanding thermoelectric performance. The I<sup>Te</sup> donor-like defects suppress the hole carrier concentration from 5.72 × 10<sup>20</sup> cm<sup>−3</sup> to 2.80 × 10<sup>20</sup> cm<sup>−3</sup>. First-principles calculations reveal that iodine doping increases the band gap from 0.253 eV to 0.302 eV and contributes to valence band convergence. Seebeck coefficient value reaches up to 135.7 μV/K at 773 K, and the power factor values are entirely boosted in the whole temperature region, reaching a maximum value of 12.4 μW⸱cm<sup>−1</sup>⸱K<sup>−2</sup> in GeSb<sub>2</sub>Te<sub>3.96</sub>I<sub>0.04</sub>. Moreover, iodine doping simultaneously reduces the lattice and electronic thermal conductivity, leading to the greatly reduced total thermal conductivity from 2.89 W⸱m<sup>−1</sup>⸱K<sup>−1</sup> in pristine sample to 0.89 W⸱m<sup>−1</sup>⸱K<sup>−1</sup> in GeSb<sub>2</sub>Te<sub>3.84</sub>I<sub>0.16</sub> at 323 K. Finally, a maximum <em>zT</em> ∼1.12 at 773 K and an average <em>zT</em> ∼0.62 over 323–773 K are achieved in GeSb<sub>2</sub>Te<sub>3.88</sub>I<sub>0.12</sub>. This work puts forward an effective strategy to synergistically optimize phonon and carrier transport properties of pseudo-binary compounds through halogen doping, which may be effective in other similar material systems.</div></div>","PeriodicalId":16173,"journal":{"name":"Journal of Materiomics","volume":"11 4","pages":"Article 100973"},"PeriodicalIF":8.4,"publicationDate":"2024-11-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142684805","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":1,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Convenient synthesis of hollow tubular In2O3/PDA S-scheme inorganic/organic heterojunction photocatalyst for H2O2 production and its mechanism 方便合成用于产生 H2O2 的中空管状 In2O3/PDA S 型无机/有机异质结光催化剂及其机理
IF 8.4 1区 材料科学 Q1 CHEMISTRY, PHYSICAL Pub Date : 2024-11-22 DOI: 10.1016/j.jmat.2024.100978
Yunhao Ma , Shan Wang , Yingjie Zhang , Bei Cheng , Liuyang Zhang
The development of heterojunction photocatalysts for hydrogen peroxide (H2O2) generation is both environmentally sustainable and cost-effective but presents considerable challenges. In this study, we synthesized hollow tubular indium oxide (In2O3) by calcining In-MIL-68 and subsequently composited it with polydopamine (PDA) via in-situ self-polymerization. This process resulted in the formation of an In2O3/PDA step-scheme (S-scheme) heterojunction. The optimized sample demonstrated H2O2 production rates approximately 2.1 and 4.5 times higher than the pure In2O3 and PDA, respectively. The enhanced photocatalytic performance of the In2O3/PDA composite is the result of several synergistic factors: increased light absorption due to the hollow structure, a larger specific surface area, and high separation efficiency of photo-generated electron-hole pairs facilitated by the S-scheme heterojunction. In-situ irradiated X-ray photoelectron spectroscopy (ISI-XPS) confirmed the charge transfer pathway follows the S-scheme mechanism. This work not only highlights a practical method for constructing inorganic/organic S-scheme heterojunction photocatalysts but also provides a detailed analysis of their underlying mechanisms, paving the way for more efficient and sustainable photocatalytic systems.
开发用于生成过氧化氢(H2O2)的异质结光催化剂既具有环境可持续性,又具有成本效益,但同时也面临着相当大的挑战。在本研究中,我们通过煅烧 In-MIL-68 合成了空心管状氧化铟(In2O3),随后通过原位自聚合将其与多巴胺(PDA)复合。这一过程形成了 In2O3/PDA 阶梯式(S-scheme)异质结。优化样品的 H2O2 生成率分别是纯 In2O3 和 PDA 的约 2.1 倍和 4.5 倍。In2O3/PDA 复合材料光催化性能的增强是几个协同因素共同作用的结果:中空结构增加了光吸收,比表面积增大,S-scheme 异质结促进了光生电子-空穴对的高分离效率。原位辐照 X 射线光电子能谱(ISI-XPS)证实电荷转移途径遵循 S 型机制。这项工作不仅强调了构建无机/有机 S 型异质结光催化剂的实用方法,还详细分析了其基本机制,为建立更高效、更可持续的光催化系统铺平了道路。
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引用次数: 0
Surface oxygen vacancies in amorphous Fe2O3 tailored nonlinear optical properties for ultrafast photonics 无定形 Fe2O3 表面氧空位为超快光子学定制的非线性光学特性
IF 8.4 1区 材料科学 Q1 CHEMISTRY, PHYSICAL Pub Date : 2024-11-21 DOI: 10.1016/j.jmat.2024.100976
Qingxi Zhao, Hongwei Chu, Zhongben Pan, Han Pan, Shengzhi Zhao, Dechun Li
Fe2O3 nanomaterials, as one of the transition metal oxides (TMOs) materials, have garnered attention in ultrafast photonics due to their robust third-order nonlinearity, rapid carrier recovery time, high stability, broad absorption bandwidth and straightforward preparation methods. In order to further enhance the performance of Fe2O3 nanomaterials, oxygen vacancy defects were introduced in the process of preparing the Fe2O3 nanomaterials in this paper. By characterizing the nonlinear optical properties of the prepared Fe2O3 nanomaterials with different surface oxygen vacancy concentrations, we found that Fe2O3 nanomaterials with larger oxygen vacancy content have a deeper modulation depth and the larger third-order nonlinear coefficient. It also indicated that the incorporation of oxygen vacancy defects can significantly enhance the nonlinear optical properties of Fe2O3 nanomaterials. Furthermore, the ultrafast carrier dynamics of Fe2O3 materials with varying concentrations of oxygen vacancies were investigated using femtosecond-resolved transient absorption (TA) spectroscopy, elucidating the microscopic mechanism. Finally, we inserted Fe2O3-based saturable absorbers into Yb- and Er-doped fiber lasers. Noise-like mode-locking operation and multi-pulse mode-locking operation are realized at 1 μm in the Yb-doped fiber laser. Besides, the conventional soliton mode-locking operations with different central wavelengths are realized within 1.5 μm band in an Er-doped fiber laser.
作为过渡金属氧化物(TMOs)材料之一,Fe2O3 纳米材料因其强大的三阶非线性、快速的载流子恢复时间、高稳定性、宽吸收带宽和简单的制备方法而在超快光子学领域备受关注。为了进一步提高 Fe2O3 纳米材料的性能,本文在制备 Fe2O3 纳米材料的过程中引入了氧空位缺陷。通过表征制备的不同表面氧空位浓度的 Fe2O3 纳米材料的非线性光学特性,我们发现氧空位含量较大的 Fe2O3 纳米材料具有更深的调制深度和更大的三阶非线性系数。这也表明,氧空位缺陷的加入能显著增强 Fe2O3 纳米材料的非线性光学特性。此外,我们还利用飞秒分辨瞬态吸收(TA)光谱研究了不同氧空位浓度的 Fe2O3 材料的超快载流子动力学,阐明了其微观机制。最后,我们在掺镱和掺铒光纤激光器中插入了基于 Fe2O3 的可饱和吸收体。我们在掺镱光纤激光器中实现了 1 μm 的类噪声锁模操作和多脉冲锁模操作。此外,掺铒光纤激光器还在 1.5 μm 波段内实现了不同中心波长的传统孤子锁模操作。
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引用次数: 0
High temperature magnetoelectric effect in Fe2TeO6 Fe2TeO6 中的高温磁电效应
IF 8.4 1区 材料科学 Q1 CHEMISTRY, PHYSICAL Pub Date : 2024-11-21 DOI: 10.1016/j.jmat.2024.100977
Guoqing Ma , Di Zhou , Yunlong Xie , Shuhan Zheng , Meifeng Liu , Leili Tan , Zhen Liu , Fei Liu , Yao Li , Zhen Ma , Yongjun Zhang , Lin Lin , Min Zeng , Xiuzhang Wang , Saiyu Wang , Hong Li , Shuai Dong , Jun-Ming Liu
Fe2TeO6 has long been considered as a promising high-temperature magnetoelectric (ME) material, while the magnetoelectricity and magnetic ground state of Fe2TeO6 have not been well characterized or understood yet. In the present work, we report the systematical study of magnetism, ferroelectricity, ME effect, first principles calculation, and Monte Carlo simulation of Fe2TeO6 single crystals. Fe2TeO6 exhibits linear ME effect below TN ∼208 K, and only diagonal ME coefficients appears to be non-zero, which agrees with the magnetic point group 4/m'm'm'. The calculated magnetic ground state agrees with previous neutron diffraction, and the strong intra(inter)-bilayer interactions coincide with the high TN of Fe2TeO6. This work will contribute to the understanding of A2BO6 ME family and the exploration of high temperature ME materials.
一直以来,Fe2TeO6 被认为是一种很有前途的高温磁电(ME)材料,但人们对 Fe2TeO6 的磁电性和磁基态还没有很好的表征和理解。在本研究中,我们报告了对 Fe2TeO6 单晶的磁性、铁电性、ME 效应、第一性原理计算和蒙特卡罗模拟的系统研究。Fe2TeO6 在 TN ∼ 208 K 以下表现出线性 ME 效应,且只有对角线 ME 系数不为零,这与磁点群 4/m'm'm' 相吻合。计算出的磁基态与之前的中子衍射结果一致,而强的层内(层间)相互作用与 Fe2TeO6 的高 TN 相吻合。这项工作将有助于理解 A2BO6 ME 家族和探索高温 ME 材料。
{"title":"High temperature magnetoelectric effect in Fe2TeO6","authors":"Guoqing Ma ,&nbsp;Di Zhou ,&nbsp;Yunlong Xie ,&nbsp;Shuhan Zheng ,&nbsp;Meifeng Liu ,&nbsp;Leili Tan ,&nbsp;Zhen Liu ,&nbsp;Fei Liu ,&nbsp;Yao Li ,&nbsp;Zhen Ma ,&nbsp;Yongjun Zhang ,&nbsp;Lin Lin ,&nbsp;Min Zeng ,&nbsp;Xiuzhang Wang ,&nbsp;Saiyu Wang ,&nbsp;Hong Li ,&nbsp;Shuai Dong ,&nbsp;Jun-Ming Liu","doi":"10.1016/j.jmat.2024.100977","DOIUrl":"10.1016/j.jmat.2024.100977","url":null,"abstract":"<div><div>Fe<sub>2</sub>TeO<sub>6</sub> has long been considered as a promising high-temperature magnetoelectric (ME) material, while the magnetoelectricity and magnetic ground state of Fe<sub>2</sub>TeO<sub>6</sub> have not been well characterized or understood yet. In the present work, we report the systematical study of magnetism, ferroelectricity, ME effect, first principles calculation, and Monte Carlo simulation of Fe<sub>2</sub>TeO<sub>6</sub> single crystals. Fe<sub>2</sub>TeO<sub>6</sub> exhibits linear ME effect below <em>T</em><sub>N</sub> ∼208 K, and only diagonal ME coefficients appears to be non-zero, which agrees with the magnetic point group 4/<em>m</em><em>'m'm'</em>. The calculated magnetic ground state agrees with previous neutron diffraction, and the strong intra(inter)-bilayer interactions coincide with the high <em>T</em><sub>N</sub> of Fe<sub>2</sub>TeO<sub>6</sub>. This work will contribute to the understanding of A<sub>2</sub>BO<sub>6</sub> ME family and the exploration of high temperature ME materials.</div></div>","PeriodicalId":16173,"journal":{"name":"Journal of Materiomics","volume":"11 4","pages":"Article 100977"},"PeriodicalIF":8.4,"publicationDate":"2024-11-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142678337","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":1,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
In situ irradiated XPS investigation on S-scheme ZnIn2S4@COF-5 photocatalyst for enhanced photocatalytic degradation of RhB 原位辐照 XPS 研究用于增强 RhB 光催化降解的 S 型 ZnIn2S4@COF-5 光催化剂
IF 8.4 1区 材料科学 Q1 CHEMISTRY, PHYSICAL Pub Date : 2024-11-20 DOI: 10.1016/j.jmat.2024.100975
Jian Sun , Haowei Liu , Shan Wang , Yingjie Zhang , Chuanbiao Bie , Liuyang Zhang
Recently, the step-scheme (S-scheme) heterojunction has gained significant attention due to its effective electron-hole separation and strong redox capabilities. However, reports on covalent organic framework (COF)-based S-scheme heterojunctions for photocatalytic RhB degradation remain limited. In this study, an S-scheme ZnIn2S4@COF-5 heterojunction photocatalyst was successfully synthesized by growing COF-5 on the surface of ZnIn2S4 nanosheets, achieving efficient RhB degradation. Using 30 mg of ZnIn2S4@COF-5, we degraded 50 mL of an 80×10-6 RhB solution, achieving a 97% removal rate within 90 min. The photocatalytic performance of the ZnIn2S4@COF-5 S-scheme heterojunction was approximately 1.7 times higher than that of ZnIn2S4 and 1.6 times higher than COF-5 alone. Compared to the other reported COF-based S-scheme heterojunctions and commercial photocatalysts, this ZnIn2S4@COF-5 photocatalyst exhibited superior photocatalytic performance. The S-scheme charge transfer mechanism of the ZnIn2S4@COF-5 heterojunction was elucidated through in situ irradiated XPS. Experimental results demonstrate that this rational design not only facilitates the effective separation of photogenerated electrons and holes, but also provides a large surface area and abundant active sites for efficient RhB degradation.
最近,阶梯梯型(S-scheme)异质结因其有效的电子-空穴分离和强大的氧化还原能力而备受关注。然而,有关基于共价有机框架(COF)的 S 型异质结用于光催化降解 RhB 的报道仍然有限。本研究通过在 ZnIn2S4 纳米片表面生长 COF-5 成功合成了一种 S 型 ZnIn2S4@COF-5 异质结光催化剂,实现了对 RhB 的高效降解。使用 30 毫克 COF-5@ ZnIn2S4,我们在 90 分钟内降解了 50 毫升 80 ppm 的 RhB 溶液,去除率达到 97%。COF-5@ ZnIn2S4 S 型异质结的光催化性能是 ZnIn2S4 的约 1.7 倍,是 COF-5 单体的 1.6 倍。与其他已报道的 COF 基 S-scheme异质结和商业光催化剂相比,这种 ZnIn2S4@COF-5 光催化剂表现出更优越的光催化性能。通过原位照射 XPS,阐明了 ZnIn2S4@COF-5 异质结的 S 型电荷转移机制。实验结果表明,这种合理的设计不仅有利于有效分离光生电子和空穴,还为高效降解 RhB 提供了较大的比表面积和丰富的活性位点。
{"title":"In situ irradiated XPS investigation on S-scheme ZnIn2S4@COF-5 photocatalyst for enhanced photocatalytic degradation of RhB","authors":"Jian Sun ,&nbsp;Haowei Liu ,&nbsp;Shan Wang ,&nbsp;Yingjie Zhang ,&nbsp;Chuanbiao Bie ,&nbsp;Liuyang Zhang","doi":"10.1016/j.jmat.2024.100975","DOIUrl":"10.1016/j.jmat.2024.100975","url":null,"abstract":"<div><div>Recently, the step-scheme (S-scheme) heterojunction has gained significant attention due to its effective electron-hole separation and strong redox capabilities. However, reports on covalent organic framework (COF)-based S-scheme heterojunctions for photocatalytic RhB degradation remain limited. In this study, an S-scheme ZnIn<sub>2</sub>S<sub>4</sub>@COF-5 heterojunction photocatalyst was successfully synthesized by growing COF-5 on the surface of ZnIn<sub>2</sub>S<sub>4</sub> nanosheets, achieving efficient RhB degradation. Using 30 mg of ZnIn<sub>2</sub>S<sub>4</sub>@COF-5, we degraded 50 mL of an 80×10<sup>-6</sup> RhB solution, achieving a 97% removal rate within 90 min. The photocatalytic performance of the ZnIn<sub>2</sub>S<sub>4</sub>@COF-5 S-scheme heterojunction was approximately 1.7 times higher than that of ZnIn<sub>2</sub>S<sub>4</sub> and 1.6 times higher than COF-5 alone. Compared to the other reported COF-based S-scheme heterojunctions and commercial photocatalysts, this ZnIn<sub>2</sub>S<sub>4</sub>@COF-5 photocatalyst exhibited superior photocatalytic performance. The S-scheme charge transfer mechanism of the ZnIn<sub>2</sub>S<sub>4</sub>@COF-5 heterojunction was elucidated through <em>in situ</em> irradiated XPS. Experimental results demonstrate that this rational design not only facilitates the effective separation of photogenerated electrons and holes, but also provides a large surface area and abundant active sites for efficient RhB degradation.</div></div>","PeriodicalId":16173,"journal":{"name":"Journal of Materiomics","volume":"11 3","pages":"Article 100975"},"PeriodicalIF":8.4,"publicationDate":"2024-11-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142678338","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":1,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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Journal of Materiomics
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