{"title":"Fabrication of sub-micrometer 3D structures for terahertz oscillators by electron beam gray-tone lithography","authors":"M. Bezhko, S. Suzuki, Shota Iino, M. Asada","doi":"10.1116/6.0001647","DOIUrl":"https://doi.org/10.1116/6.0001647","url":null,"abstract":"","PeriodicalId":17495,"journal":{"name":"Journal of Vacuum Science & Technology B","volume":"82 1","pages":""},"PeriodicalIF":1.4,"publicationDate":"2022-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"73793477","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Molecular dynamics study of silicon atomic layer etching by chorine gas and argon ions","authors":"Joseph R. Vella, D. Humbird, D. Graves","doi":"10.1116/6.0001681","DOIUrl":"https://doi.org/10.1116/6.0001681","url":null,"abstract":"","PeriodicalId":17495,"journal":{"name":"Journal of Vacuum Science & Technology B","volume":"71 1","pages":""},"PeriodicalIF":1.4,"publicationDate":"2022-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74296604","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
A. Ayari, P. Vincent, S. Perisanu, P. Poncharal, S. Purcell
Field emission data are often represented on a Fowler-Nordheim plot, but a new empirical equation has been recently proposed to better analyse experiments. Such an equation is based on approximations of the Murphy and Good model and predicts that a constant parameter κ , depending only on the work function of the emitter, can be extracted from the data. We compared this empirical equation with simulations of the Murphy and Good model in order to determine the range of validity of the approximations and the robustness of the relationship between κ and the work function. We found that κ is constant only over a limited range of electric fields and so depends significantly on the field enhancement factor. This result calls into question the usefulness of the new empirical equation.
{"title":"All field emission models are wrong, … but are any of them useful?","authors":"A. Ayari, P. Vincent, S. Perisanu, P. Poncharal, S. Purcell","doi":"10.1116/6.0001677","DOIUrl":"https://doi.org/10.1116/6.0001677","url":null,"abstract":"Field emission data are often represented on a Fowler-Nordheim plot, but a new empirical equation has been recently proposed to better analyse experiments. Such an equation is based on approximations of the Murphy and Good model and predicts that a constant parameter κ , depending only on the work function of the emitter, can be extracted from the data. We compared this empirical equation with simulations of the Murphy and Good model in order to determine the range of validity of the approximations and the robustness of the relationship between κ and the work function. We found that κ is constant only over a limited range of electric fields and so depends significantly on the field enhancement factor. This result calls into question the usefulness of the new empirical equation.","PeriodicalId":17495,"journal":{"name":"Journal of Vacuum Science & Technology B","volume":"40 1","pages":""},"PeriodicalIF":1.4,"publicationDate":"2022-02-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"81522830","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Yi-Ching Liu, Norleakvisoth Lim, Taylor W. Smith, X. Sang, Jane P. Chang
{"title":"Thermochemical prediction of runaway energetic reactions involving organometallic (Al, In) and silane precursors in deposition tools","authors":"Yi-Ching Liu, Norleakvisoth Lim, Taylor W. Smith, X. Sang, Jane P. Chang","doi":"10.1116/6.0001503","DOIUrl":"https://doi.org/10.1116/6.0001503","url":null,"abstract":"","PeriodicalId":17495,"journal":{"name":"Journal of Vacuum Science & Technology B","volume":"112 1","pages":""},"PeriodicalIF":1.4,"publicationDate":"2022-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"73701730","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
S. Edler, A. Schels, F. Herdl, W. Hansch, M. Bachmann, Markus Dudeck, F. Düsberg, A. Pahlke, M. Hausladen, P. Buchner, R. Schreiner
{"title":"Origin of the current saturation level of p-doped silicon field emitters","authors":"S. Edler, A. Schels, F. Herdl, W. Hansch, M. Bachmann, Markus Dudeck, F. Düsberg, A. Pahlke, M. Hausladen, P. Buchner, R. Schreiner","doi":"10.1116/6.0001554","DOIUrl":"https://doi.org/10.1116/6.0001554","url":null,"abstract":"","PeriodicalId":17495,"journal":{"name":"Journal of Vacuum Science & Technology B","volume":"84 1","pages":""},"PeriodicalIF":1.4,"publicationDate":"2022-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"78204999","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Fundamental study on the selective etching of SiGe and Si in ClF3 gas for nanosheet gate-all-around transistor manufacturing: A first principle study","authors":"Yu-Hao Tsai, Mingmei Wang","doi":"10.1116/6.0001455","DOIUrl":"https://doi.org/10.1116/6.0001455","url":null,"abstract":"","PeriodicalId":17495,"journal":{"name":"Journal of Vacuum Science & Technology B","volume":"16 1","pages":""},"PeriodicalIF":1.4,"publicationDate":"2022-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86105406","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
K. Czarnacka, Jakub Kisała, A. Kociubiński, M. Gęca
{"title":"Technology and measurements of three-layer NiFeCuMo/Ti/NiFeCuMo structures exhibiting the giant magnetoresistance phenomenon","authors":"K. Czarnacka, Jakub Kisała, A. Kociubiński, M. Gęca","doi":"10.1116/6.0001488","DOIUrl":"https://doi.org/10.1116/6.0001488","url":null,"abstract":"","PeriodicalId":17495,"journal":{"name":"Journal of Vacuum Science & Technology B","volume":"10 1","pages":""},"PeriodicalIF":1.4,"publicationDate":"2022-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"80790046","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
T. Kondo, Yusuke Kuroda, Tomoki Shichijo, T. Yanagishita, H. Masuda
{"title":"Formation of ideally ordered porous Ga oxide by anodization of pretextured Ga","authors":"T. Kondo, Yusuke Kuroda, Tomoki Shichijo, T. Yanagishita, H. Masuda","doi":"10.1116/6.0001619","DOIUrl":"https://doi.org/10.1116/6.0001619","url":null,"abstract":"","PeriodicalId":17495,"journal":{"name":"Journal of Vacuum Science & Technology B","volume":"74 1","pages":""},"PeriodicalIF":1.4,"publicationDate":"2022-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"84372676","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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