Pub Date : 2014-04-13DOI: 10.1109/NEMS.2014.6908762
H. Al-Mumen, Lixin Dong, Wen Li
N-type doping of graphene with long-term air stability represents a significant challenge for practical application of graphene electronics. This paper reports a reversible doping method that uses SU-8 photoresist as a doping and encapsulating material to enable highly air-stable n-type semiconducting properties of graphene. The SU-8 resist simultaneously serves as an effective electron dopant, a dielectric medium, and an excellent encapsulating layer. The air-stable n-type characteristics of the as-doped graphene were verified by Raman spectra and transport properties. The SU-8 doping has minimum damage to the hexagonal lattice of graphene and can be reversed by removing the uncrosslinked SU-8 resist.
{"title":"Highly stable chemical N-doping of graphene nanomesh FET","authors":"H. Al-Mumen, Lixin Dong, Wen Li","doi":"10.1109/NEMS.2014.6908762","DOIUrl":"https://doi.org/10.1109/NEMS.2014.6908762","url":null,"abstract":"N-type doping of graphene with long-term air stability represents a significant challenge for practical application of graphene electronics. This paper reports a reversible doping method that uses SU-8 photoresist as a doping and encapsulating material to enable highly air-stable n-type semiconducting properties of graphene. The SU-8 resist simultaneously serves as an effective electron dopant, a dielectric medium, and an excellent encapsulating layer. The air-stable n-type characteristics of the as-doped graphene were verified by Raman spectra and transport properties. The SU-8 doping has minimum damage to the hexagonal lattice of graphene and can be reversed by removing the uncrosslinked SU-8 resist.","PeriodicalId":22566,"journal":{"name":"The 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","volume":"134 1","pages":"72-76"},"PeriodicalIF":0.0,"publicationDate":"2014-04-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"80586152","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2014-04-13DOI: 10.1109/NEMS.2014.6908829
C. Lu, Yi-Chuan Lin, Kerwin Wang, M. Dai, C. K. Liu, L. Liao, H. Chien, Y. S. Chen
This paper presents a capacitor discharge sintering process with a homemade silver-nickel paste for thermoelectric element interconnections. The paste is a 75 nm silver/nickel composite mixture. Without using any specific atmosphere control, the capacitor discharge is capable of nanoparticle sintering with time-efficient process at room temperature. A 0.01 F capacitor is serially connected to the sample and charged to 10 V (0.5 Joule) for the sintering process. To evaluate the conductivity of the sintered composite, the conductive material is screen-printed on an Al2O3 ceramic substrate; it forms a rectangular tunnel to bridge two silver electrodes. After sintering process, the resistance of the screened conductive pass-way is dropped from 9.47 Ω to 0.35 Ω. The bonding strength and high temperature resistance test results of the sintered composite is also presented in this paper. Without generating a lot of heat, the sintering process can be applicable to flexible electronics.
{"title":"Capacitor discharge sintering with silver-nickel nano-composite in the interconnection of thermoelectric generators","authors":"C. Lu, Yi-Chuan Lin, Kerwin Wang, M. Dai, C. K. Liu, L. Liao, H. Chien, Y. S. Chen","doi":"10.1109/NEMS.2014.6908829","DOIUrl":"https://doi.org/10.1109/NEMS.2014.6908829","url":null,"abstract":"This paper presents a capacitor discharge sintering process with a homemade silver-nickel paste for thermoelectric element interconnections. The paste is a 75 nm silver/nickel composite mixture. Without using any specific atmosphere control, the capacitor discharge is capable of nanoparticle sintering with time-efficient process at room temperature. A 0.01 F capacitor is serially connected to the sample and charged to 10 V (0.5 Joule) for the sintering process. To evaluate the conductivity of the sintered composite, the conductive material is screen-printed on an Al2O3 ceramic substrate; it forms a rectangular tunnel to bridge two silver electrodes. After sintering process, the resistance of the screened conductive pass-way is dropped from 9.47 Ω to 0.35 Ω. The bonding strength and high temperature resistance test results of the sintered composite is also presented in this paper. Without generating a lot of heat, the sintering process can be applicable to flexible electronics.","PeriodicalId":22566,"journal":{"name":"The 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","volume":"53 1","pages":"370-373"},"PeriodicalIF":0.0,"publicationDate":"2014-04-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"89361755","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2014-04-13DOI: 10.1109/NEMS.2014.6908851
Guanwu Zhou, Yulong Zhao, Fangfang Guo
We present a temperature compensation system for silicon piezoresistive pressure sensor based on neural network. This system can be used for measuring the pressure of various media. And the design can simplify the implementing hardware of pressure measurement system. Compared with traditional design, it can output three signals: current signal, digital signal based on RS485 and Zigbee wireless signal, which make the system more practical to use. Due to temperature drift of silicon piezoresistive sensors, a program developed on LabVIEW in PC is used for temperature compensation using neural networks. The efficacy of neural networks has been verified by linearity, zero temperature drift and sensitivity temperature drift of pressure sensor after temperature compensation. After being tested over temperature range and pressure range, the accuracy of pressure measurement system from 0.7%FS (full scale) has been promoted up to 0.2%FS.
{"title":"A temperature compensation system for silicon pressure sensor based on neural networks","authors":"Guanwu Zhou, Yulong Zhao, Fangfang Guo","doi":"10.1109/NEMS.2014.6908851","DOIUrl":"https://doi.org/10.1109/NEMS.2014.6908851","url":null,"abstract":"We present a temperature compensation system for silicon piezoresistive pressure sensor based on neural network. This system can be used for measuring the pressure of various media. And the design can simplify the implementing hardware of pressure measurement system. Compared with traditional design, it can output three signals: current signal, digital signal based on RS485 and Zigbee wireless signal, which make the system more practical to use. Due to temperature drift of silicon piezoresistive sensors, a program developed on LabVIEW in PC is used for temperature compensation using neural networks. The efficacy of neural networks has been verified by linearity, zero temperature drift and sensitivity temperature drift of pressure sensor after temperature compensation. After being tested over temperature range and pressure range, the accuracy of pressure measurement system from 0.7%FS (full scale) has been promoted up to 0.2%FS.","PeriodicalId":22566,"journal":{"name":"The 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","volume":"7 1","pages":"467-470"},"PeriodicalIF":0.0,"publicationDate":"2014-04-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"87435015","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2014-04-13DOI: 10.1109/NEMS.2014.6908793
P. Deng, Wei Ma
In this work, we systematically investigate the nonlinear phenomenon of an electrostatic comb driven micro scanning mirror. The system governing equation is illustrated by Mathieu equation. A numerical model is built in MatLab based on the governing equation. The scanning mirror response in both time and frequency domain is simulated. Results are verified by the investigation vehicle, a fabricated MEMS scanning mirror. The experimental and simulation results have a great agreement on showing the similar parametric response and stiffness softening. Unstable region is also observed and well validated by the model.
{"title":"Nonlinearity investigation of the MEMS scanning mirror with electrostatic comb drive","authors":"P. Deng, Wei Ma","doi":"10.1109/NEMS.2014.6908793","DOIUrl":"https://doi.org/10.1109/NEMS.2014.6908793","url":null,"abstract":"In this work, we systematically investigate the nonlinear phenomenon of an electrostatic comb driven micro scanning mirror. The system governing equation is illustrated by Mathieu equation. A numerical model is built in MatLab based on the governing equation. The scanning mirror response in both time and frequency domain is simulated. Results are verified by the investigation vehicle, a fabricated MEMS scanning mirror. The experimental and simulation results have a great agreement on showing the similar parametric response and stiffness softening. Unstable region is also observed and well validated by the model.","PeriodicalId":22566,"journal":{"name":"The 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","volume":"2013 1","pages":"212-215"},"PeriodicalIF":0.0,"publicationDate":"2014-04-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"88166258","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2014-04-13DOI: 10.1109/NEMS.2014.6908901
Tzu-Chun Liao, K. Liao, Wen-Shiang Chen, J. Yeh
We propose a silver nanoparticle etching technology to fabricate nano/micro surfaces. The behaviors of HIG-82 fibroblasts can be controlled by nano/mirco patterned silicon surface in vitro. The microposts were defined through photolithography and silver nanoparticles assisted etching was used to produce the nanostuctures. After that, the hydrophobic chemical was coated on the surface of nanostructures to form hydrophilic/hydrophobic composite structures. In order to investigate cell connection between microposts, fluorescence dye was used to observe fibroblasts. According to the fluorescence pictures, the major component of connected parts is consisted of f-actin.
{"title":"Fibroblasts connection on nano/micro silicon","authors":"Tzu-Chun Liao, K. Liao, Wen-Shiang Chen, J. Yeh","doi":"10.1109/NEMS.2014.6908901","DOIUrl":"https://doi.org/10.1109/NEMS.2014.6908901","url":null,"abstract":"We propose a silver nanoparticle etching technology to fabricate nano/micro surfaces. The behaviors of HIG-82 fibroblasts can be controlled by nano/mirco patterned silicon surface in vitro. The microposts were defined through photolithography and silver nanoparticles assisted etching was used to produce the nanostuctures. After that, the hydrophobic chemical was coated on the surface of nanostructures to form hydrophilic/hydrophobic composite structures. In order to investigate cell connection between microposts, fluorescence dye was used to observe fibroblasts. According to the fluorescence pictures, the major component of connected parts is consisted of f-actin.","PeriodicalId":22566,"journal":{"name":"The 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","volume":"8 1","pages":"674-677"},"PeriodicalIF":0.0,"publicationDate":"2014-04-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"91152216","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2014-04-13DOI: 10.1109/NEMS.2014.6908877
Zong-Ming Su, Xiao-Sheng Zhang, Haixia Zhang
This paper presents a self-assembled method to fabricate the colloid nanoparticle monolayer based on the evaporation-induced process. The effects of environmental factors on the experimental result have been systematically investigated. After the optimization of the process parameters, the colloid nanoparticle monolayer was achieved with the assistance of PDMS template on the silicon substrate. Following by reactive ion etching process, this simple ordering technique can be utilized to form different patterns for monolayer and bilayers. Hexagon-ordered, high-aspect-ratio silicon nanowires have been fabricated by using pre-ordered nanoparticles as masks in the DRIE procedure. This simple and universal method has potential applications in micro/nano systems, especially for sensors, transistors and photovoltaic devices, etc.
{"title":"Self-assembly of colloid nano particle by evaporation-induced method","authors":"Zong-Ming Su, Xiao-Sheng Zhang, Haixia Zhang","doi":"10.1109/NEMS.2014.6908877","DOIUrl":"https://doi.org/10.1109/NEMS.2014.6908877","url":null,"abstract":"This paper presents a self-assembled method to fabricate the colloid nanoparticle monolayer based on the evaporation-induced process. The effects of environmental factors on the experimental result have been systematically investigated. After the optimization of the process parameters, the colloid nanoparticle monolayer was achieved with the assistance of PDMS template on the silicon substrate. Following by reactive ion etching process, this simple ordering technique can be utilized to form different patterns for monolayer and bilayers. Hexagon-ordered, high-aspect-ratio silicon nanowires have been fabricated by using pre-ordered nanoparticles as masks in the DRIE procedure. This simple and universal method has potential applications in micro/nano systems, especially for sensors, transistors and photovoltaic devices, etc.","PeriodicalId":22566,"journal":{"name":"The 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","volume":"11 1","pages":"572-577"},"PeriodicalIF":0.0,"publicationDate":"2014-04-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"78186748","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2014-04-13DOI: 10.1109/NEMS.2014.6908797
Sen Ren, W. Yuan, Xiaodong Sun, Jinjun Deng, D. Qiao, C. Jiang
A resonant pressure sensor using a dynamically balanced lateral resonator is presented, which employs differential electrostatic comb structure for linear driving and sensing. The sensor is successfully microfabricated through a simple yet reliable micromachining process based on a commercially available silicon-on-insulator wafer with only two masks. Special anchor structure is developed to suppress the vertical position shift of the resonator when the diaphragm deflects, which using suspended connecting trusses to attach the stress-sensitive beam ends of the resonator. The sensor chip is mounted into a custom 16-pin Kovar package with epoxy resin for preliminary measurements. Testing results show that the resonator has a fundamental resonant frequency of 34.17 kHz, and the quality factor is about 1253 at atmospheric pressure, which rises to above 50 000 below 5 Pa. Over the pressure range of 100-380 kPa, the static pressure sensitivity is approximately 10.17 Hz/kPa, with the nonlinearity of 0.02%FS, the hysteresis error of 0.05%FS, and the repeatability error of 0.17%FS.
{"title":"Microfabricated SOI pressure sensor using dynamically balanced lateral resonator","authors":"Sen Ren, W. Yuan, Xiaodong Sun, Jinjun Deng, D. Qiao, C. Jiang","doi":"10.1109/NEMS.2014.6908797","DOIUrl":"https://doi.org/10.1109/NEMS.2014.6908797","url":null,"abstract":"A resonant pressure sensor using a dynamically balanced lateral resonator is presented, which employs differential electrostatic comb structure for linear driving and sensing. The sensor is successfully microfabricated through a simple yet reliable micromachining process based on a commercially available silicon-on-insulator wafer with only two masks. Special anchor structure is developed to suppress the vertical position shift of the resonator when the diaphragm deflects, which using suspended connecting trusses to attach the stress-sensitive beam ends of the resonator. The sensor chip is mounted into a custom 16-pin Kovar package with epoxy resin for preliminary measurements. Testing results show that the resonator has a fundamental resonant frequency of 34.17 kHz, and the quality factor is about 1253 at atmospheric pressure, which rises to above 50 000 below 5 Pa. Over the pressure range of 100-380 kPa, the static pressure sensitivity is approximately 10.17 Hz/kPa, with the nonlinearity of 0.02%FS, the hysteresis error of 0.05%FS, and the repeatability error of 0.17%FS.","PeriodicalId":22566,"journal":{"name":"The 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","volume":"47 1","pages":"229-232"},"PeriodicalIF":0.0,"publicationDate":"2014-04-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"75058667","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2014-04-13DOI: 10.1109/NEMS.2014.6908874
Xian Huang, Jun He, Li Zhang, Fang Yang, Dacheng Zhang
This paper presents a new method for achieving Au/aSi (amorphous Si) eutectic wafer-level bonding. The Si-Glass wafer bonding was conducted with Au layer patterned on glass wafer and amorphous Si layer on silicon wafer. The amorphous Si here was transformed from the single crystal silicon by the Argon implantation process. A novel torsional strength test structure was proposed and applied for characterization of Au/Si bonding strength. The anti-corrosion property of the bonded wafers was evaluated in the KOH thinning process. The performance of the Au/Si bond with respect to the bond area were studied in detail. Results indicated that the Au/a-Si bonding exhibited much better performance compared with the conventional Au/c-Si bonding.
{"title":"Evaluation of Au/a-Si eutectic wafer level bonding process","authors":"Xian Huang, Jun He, Li Zhang, Fang Yang, Dacheng Zhang","doi":"10.1109/NEMS.2014.6908874","DOIUrl":"https://doi.org/10.1109/NEMS.2014.6908874","url":null,"abstract":"This paper presents a new method for achieving Au/aSi (amorphous Si) eutectic wafer-level bonding. The Si-Glass wafer bonding was conducted with Au layer patterned on glass wafer and amorphous Si layer on silicon wafer. The amorphous Si here was transformed from the single crystal silicon by the Argon implantation process. A novel torsional strength test structure was proposed and applied for characterization of Au/Si bonding strength. The anti-corrosion property of the bonded wafers was evaluated in the KOH thinning process. The performance of the Au/Si bond with respect to the bond area were studied in detail. Results indicated that the Au/a-Si bonding exhibited much better performance compared with the conventional Au/c-Si bonding.","PeriodicalId":22566,"journal":{"name":"The 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","volume":"144 1","pages":"560-563"},"PeriodicalIF":0.0,"publicationDate":"2014-04-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"76233792","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
This study evaluates a method for separating magnetic microparticles in a micro channel by using embedded inverted-laser tweezers, a microflow pump, and a micro magnet. Various particles were separated using optical and/or magnetic tweezers, and were identified and counted to determine the dependence of the sorting rate on the channel flow velocity. The particle sorting experiment showed good separation results when the designed channel and magnetic tweezers were used. For magnetic particles, lower flow velocities corresponded to larger separating rates with a maximum separating rate of 81%. When the designed channel and optical tweezers were used, the polystyrene particle separating rate was as high as 94%. When both the optical tweezers and the magnetic tweezers were used, the optical tweezers were more effective in trapping polystyrene particles with flow velocities between 0.09 and 0.25μm/s. For flow velocities between 0.09 and 0.17 μm/s, the separating rate for polystyrene particles reached 95% and the separating rate for magnetic particles reached 85%.
{"title":"Particles sorting in micro-channel using magnetic tweezers and optical tweezers","authors":"Yung-Chiang Chung, Po-Wen Chen, Chao-Ming Fu, Jyun-Hong Jheng","doi":"10.1109/NEMS.2014.6908891","DOIUrl":"https://doi.org/10.1109/NEMS.2014.6908891","url":null,"abstract":"This study evaluates a method for separating magnetic microparticles in a micro channel by using embedded inverted-laser tweezers, a microflow pump, and a micro magnet. Various particles were separated using optical and/or magnetic tweezers, and were identified and counted to determine the dependence of the sorting rate on the channel flow velocity. The particle sorting experiment showed good separation results when the designed channel and magnetic tweezers were used. For magnetic particles, lower flow velocities corresponded to larger separating rates with a maximum separating rate of 81%. When the designed channel and optical tweezers were used, the polystyrene particle separating rate was as high as 94%. When both the optical tweezers and the magnetic tweezers were used, the optical tweezers were more effective in trapping polystyrene particles with flow velocities between 0.09 and 0.25μm/s. For flow velocities between 0.09 and 0.17 μm/s, the separating rate for polystyrene particles reached 95% and the separating rate for magnetic particles reached 85%.","PeriodicalId":22566,"journal":{"name":"The 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","volume":"16 1","pages":"633-634"},"PeriodicalIF":0.0,"publicationDate":"2014-04-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"84462400","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2014-04-13DOI: 10.1109/NEMS.2014.6908838
Chih-Chung Chen, Yu-An Chen, D. Yao
We develop a novel multilayer concentric filter device conjugated with an immune-binding method to achieve enrichment and detection of rare cells in a mass cell population by size based separation. Filter and size-based separation is one of the most efficient, simple and inexpensive method to isolate cells, but it encounters main disadvantages of clogs, cell deformation and insignificant size difference between targeted cell and normal cell. The concentric filter device and method used in this research were designed to create significant size difference and better separation efficiency by clogs reducing to identify rare cell with simple lab instrument. The target rare cells enrichment and detection from a mass cell population is successfully demonstrated by mixing 1:100,000 ratio of targeted MCF-7 and Jurkat cell. The device can be potentially applied for clinical Circulating Tumor Cells (CTCs) detection in the future.
{"title":"Rare cells detection by selective enrichment with a novel multilayer concentric filter device","authors":"Chih-Chung Chen, Yu-An Chen, D. Yao","doi":"10.1109/NEMS.2014.6908838","DOIUrl":"https://doi.org/10.1109/NEMS.2014.6908838","url":null,"abstract":"We develop a novel multilayer concentric filter device conjugated with an immune-binding method to achieve enrichment and detection of rare cells in a mass cell population by size based separation. Filter and size-based separation is one of the most efficient, simple and inexpensive method to isolate cells, but it encounters main disadvantages of clogs, cell deformation and insignificant size difference between targeted cell and normal cell. The concentric filter device and method used in this research were designed to create significant size difference and better separation efficiency by clogs reducing to identify rare cell with simple lab instrument. The target rare cells enrichment and detection from a mass cell population is successfully demonstrated by mixing 1:100,000 ratio of targeted MCF-7 and Jurkat cell. The device can be potentially applied for clinical Circulating Tumor Cells (CTCs) detection in the future.","PeriodicalId":22566,"journal":{"name":"The 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","volume":"3 1","pages":"407-410"},"PeriodicalIF":0.0,"publicationDate":"2014-04-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"85190100","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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