An innovative software with a user-friendly interface for calculation of differential phase contrast (DPC) scanning transmission electron microscopy images (integrated iDPC- and differentiated dDPC-STEM) is presented. The underlying algorithm is described and the program functionalities are demonstrated on the examples of Li5OsO6, α-Ga2O3, and LiCoO2. The software supports interpretation of DPC-STEM images, which is crucial for qualitative and quantitative analysis of crystal structures and defects.
{"title":"Differential phase contrast STEM image calculation software – Magnifier","authors":"I.S. Pavlov , B.I. Kineev , A.V. Morozov , A.M. Abakumov , A.L. Vasiliev","doi":"10.1016/j.ultramic.2024.114035","DOIUrl":"10.1016/j.ultramic.2024.114035","url":null,"abstract":"<div><p>An innovative software with a user-friendly interface for calculation of differential phase contrast (DPC) scanning transmission electron microscopy images (integrated iDPC- and differentiated dDPC-STEM) is presented. The underlying algorithm is described and the program functionalities are demonstrated on the examples of Li<sub>5</sub>OsO<sub>6</sub>, α-Ga<sub>2</sub>O<sub>3</sub>, and LiCoO<sub>2</sub>. The software supports interpretation of DPC-STEM images, which is crucial for qualitative and quantitative analysis of crystal structures and defects.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":"266 ","pages":"Article 114035"},"PeriodicalIF":2.1,"publicationDate":"2024-08-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142088296","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-21DOI: 10.1016/j.ultramic.2024.114034
Bavley Guerguis , Ramya Cuduvally , Richard J.H. Morris , Gabriel Arcuri , Brian Langelier , Nabil Bassim
This study investigates the impact of the surface electric field on the quantification accuracy of boron (B) implanted silicon (Si) using atom probe tomography (APT). The Si Charge-State Ratio (CSR(Si) = Si2+/Si+) was used as an indirect measure of the average apex electric field during analysis. For a range of electric fields, the accuracy of the total implanted dose and the depth profile shape determined by APT was evaluated against the National Institute of Standards and Technology Standard Reference Material 2137. The radial (non-)uniformity of the detected B was also examined. At a higher surface electric field (i.e., a greater CSR(Si)), the determined B dose converges on the certified dose. Additionally, the depth profile shape tends towards that derived by secondary ion mass spectrometry. This improvement coincides with a more uniform radial B distribution, evidenced by desorption maps. In contrast, for lower surface electric fields (i.e., a lower CSR(Si)), the B dose is significantly underestimated, and the depth profile is artificially stretched. The desorption maps also indicate a highly inhomogeneous B emission localized around the center of the detector, which is believed to be an artifact of B surface migration on the tip of the sample. For the purposes of routine investigations of semiconductor devices using APT, these results illustrate the potential origin of quantification artifacts and their severity at different operating conditions, thus providing pathways towards best practices for accurate and repeatable measurements.
本研究利用原子探针断层扫描(APT)技术研究了表面电场对硼(B)植入硅(Si)量化精度的影响。在分析过程中,硅电荷态比(CSR(Si) = Si2+/Si+)被用来间接测量平均顶点电场。对于一定范围的电场,通过 APT 确定的总植入剂量和深度剖面形状的准确性与美国国家标准与技术研究院标准参考材料 2137 进行了对比评估。此外,还检测了检测到的 B 的径向(非)均匀性。在较高的表面电场(即较大的 CSR(Si))下,测定的 B 剂量与认证剂量趋同。此外,深度剖面的形状也趋向于二次离子质谱法得出的形状。这一改进与解吸图显示的更均匀的辐射 B 分布相吻合。相反,对于较低的表面电场(即较低的 CSR(Si)),B 剂量被明显低估,深度剖面被人为拉伸。解吸图还显示,探测器中心周围的 B 发射极不均匀,据信这是 B 在样品顶端表面迁移的假象。就使用 APT 对半导体器件进行常规研究而言,这些结果说明了量化伪影的潜在来源及其在不同操作条件下的严重程度,从而为实现准确、可重复测量的最佳实践提供了途径。
{"title":"The impact of electric field strength on the accuracy of boron dopant quantification in silicon using atom probe tomography","authors":"Bavley Guerguis , Ramya Cuduvally , Richard J.H. Morris , Gabriel Arcuri , Brian Langelier , Nabil Bassim","doi":"10.1016/j.ultramic.2024.114034","DOIUrl":"10.1016/j.ultramic.2024.114034","url":null,"abstract":"<div><p>This study investigates the impact of the surface electric field on the quantification accuracy of boron (B) implanted silicon (Si) using atom probe tomography (APT). The Si Charge-State Ratio (CSR(Si) = Si<sup>2+</sup>/Si<sup>+</sup>) was used as an indirect measure of the average apex electric field during analysis. For a range of electric fields, the accuracy of the total implanted dose and the depth profile shape determined by APT was evaluated against the National Institute of Standards and Technology Standard Reference Material 2137. The radial (non-)uniformity of the detected B was also examined. At a higher surface electric field (i.e., a greater CSR(Si)), the determined B dose converges on the certified dose. Additionally, the depth profile shape tends towards that derived by secondary ion mass spectrometry. This improvement coincides with a more uniform radial B distribution, evidenced by desorption maps. In contrast, for lower surface electric fields (i.e., a lower CSR(Si)), the B dose is significantly underestimated, and the depth profile is artificially stretched. The desorption maps also indicate a highly inhomogeneous B emission localized around the center of the detector, which is believed to be an artifact of B surface migration on the tip of the sample. For the purposes of routine investigations of semiconductor devices using APT, these results illustrate the potential origin of quantification artifacts and their severity at different operating conditions, thus providing pathways towards best practices for accurate and repeatable measurements.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":"266 ","pages":"Article 114034"},"PeriodicalIF":2.1,"publicationDate":"2024-08-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142084316","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-15DOI: 10.1016/j.ultramic.2024.114024
Aydin Sabouri, Carla Sofia Perez-Martinez
Genetic algorithm (GA) and particle swarm optimisation (PSO) techniques have been integrated with the differential algebra (DA) method in charged particle optics to optimise an Einzel lens. The DA method is a robust and efficient tool for the calculation of aberration coefficients of electrostatic lenses, which makes use of nonstandard analysis for ray tracing a particle as it is subjected to the field generated by a lens. In this study, initial populations of lenses with random geometrical configurations are generated. These initial populations are then subjected to GA and PSO algorithms to alter the geometry of each lens for a set number of iterations. The lens performance is evaluated by calculating the spot size using the aberrations coefficients up to third-order generated by the DA method. Moreover, a focusing column comprising two lenses and a Wien filter was optimised using GA method.
遗传算法(GA)和粒子群优化(PSO)技术与带电粒子光学中的微分代数(DA)方法相结合,对艾因泽尔透镜进行了优化。DA 方法是计算静电透镜像差系数的一种稳健而高效的工具,它利用非标准分析方法对粒子在透镜产生的场中进行射线追踪。在这项研究中,生成了具有随机几何配置的透镜初始群。然后对这些初始种群采用 GA 和 PSO 算法,在设定的迭代次数内改变每个透镜的几何形状。通过使用 DA 方法生成的三阶以下像差系数计算光斑大小,对透镜性能进行评估。此外,还使用 GA 方法优化了由两个透镜和一个维恩滤波器组成的聚焦柱。
{"title":"Design of electrostatic lenses through genetic algorithm and particle swarm optimisation methods integrated with differential algebra","authors":"Aydin Sabouri, Carla Sofia Perez-Martinez","doi":"10.1016/j.ultramic.2024.114024","DOIUrl":"10.1016/j.ultramic.2024.114024","url":null,"abstract":"<div><p>Genetic algorithm (GA) and particle swarm optimisation (PSO) techniques have been integrated with the differential algebra (DA) method in charged particle optics to optimise an Einzel lens. The DA method is a robust and efficient tool for the calculation of aberration coefficients of electrostatic lenses, which makes use of nonstandard analysis for ray tracing a particle as it is subjected to the field generated by a lens. In this study, initial populations of lenses with random geometrical configurations are generated. These initial populations are then subjected to GA and PSO algorithms to alter the geometry of each lens for a set number of iterations. The lens performance is evaluated by calculating the spot size using the aberrations coefficients up to third-order generated by the DA method. Moreover, a focusing column comprising two lenses and a Wien filter was optimised using GA method.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":"266 ","pages":"Article 114024"},"PeriodicalIF":2.1,"publicationDate":"2024-08-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S0304399124001037/pdfft?md5=9ee61526d5fad6281eea6fdb455bebe3&pid=1-s2.0-S0304399124001037-main.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142058301","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-06DOI: 10.1016/j.ultramic.2024.114021
M. Ivanov, J. Pereiro
The convergent-beam low energy electron diffraction technique has been proposed as a novel method to gather local structural and electronic information from crystalline surfaces during low-energy electron microscopy. However, the approach suffers from high complexity of the resulting diffraction patterns. We show that Convolutional Autoencoders trained on CBLEED patterns achieve a highly structured latent space. The latent space is then used to estimate structural parameters with sub-angstrom accuracy. The low complexity of the neural networks enables real time application of the approach during experiments with low latency.
{"title":"Autoencoder latent space sensitivity to material structure in convergent-beam low energy electron diffraction","authors":"M. Ivanov, J. Pereiro","doi":"10.1016/j.ultramic.2024.114021","DOIUrl":"10.1016/j.ultramic.2024.114021","url":null,"abstract":"<div><p>The convergent-beam low energy electron diffraction technique has been proposed as a novel method to gather local structural and electronic information from crystalline surfaces during low-energy electron microscopy. However, the approach suffers from high complexity of the resulting diffraction patterns. We show that Convolutional Autoencoders trained on CBLEED patterns achieve a highly structured latent space. The latent space is then used to estimate structural parameters with sub-angstrom accuracy. The low complexity of the neural networks enables real time application of the approach during experiments with low latency.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":"266 ","pages":"Article 114021"},"PeriodicalIF":2.1,"publicationDate":"2024-08-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S0304399124001001/pdfft?md5=2b44dc788be0de80f016aef2e3c8c553&pid=1-s2.0-S0304399124001001-main.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142048702","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-05DOI: 10.1016/j.ultramic.2024.114022
Saleh Gholam, Joke Hadermann
Nowadays, 3D Electron Diffraction (3DED) is widely used for the structure determination of sub-micron-sized particles. In this work, we investigate the influence of the acceleration voltage on the quality of 3DED datasets acquired on BaTiO3 nanoparticles. Datasets were acquired using a wide range of beam energies, from common, high acceleration voltages (300 kV and 200 kV) to medium (120 kV and 80 kV) and low acceleration voltages (60 kV and 30 kV). It was observed that, in the integration process, Rint increases as the beam energy is reduced, which is mainly due to the increased dynamical scattering. Nevertheless, the structure was solved successfully in all cases. The structure refinement was comparable for all beam energies with small deficiencies such as negative atomic displacements for the heaviest atom in the structure, barium. Including extinction correction in the refinement noticeably improved the model for low acceleration voltages, probably due to higher beam absorption in these cases. Dynamical refinement, however, shows superior results for higher acceleration voltages, since the dynamical refinement calculations currently ignore inelastic scattering effects.
{"title":"The effect of the acceleration voltage on the quality of structure determination by 3D-electron diffraction","authors":"Saleh Gholam, Joke Hadermann","doi":"10.1016/j.ultramic.2024.114022","DOIUrl":"10.1016/j.ultramic.2024.114022","url":null,"abstract":"<div><p>Nowadays, 3D Electron Diffraction (3DED) is widely used for the structure determination of sub-micron-sized particles. In this work, we investigate the influence of the acceleration voltage on the quality of 3DED datasets acquired on BaTiO<sub>3</sub> nanoparticles. Datasets were acquired using a wide range of beam energies, from common, high acceleration voltages (300 kV and 200 kV) to medium (120 kV and 80 kV) and low acceleration voltages (60 kV and 30 kV). It was observed that, in the integration process, R<sub>int</sub> increases as the beam energy is reduced, which is mainly due to the increased dynamical scattering. Nevertheless, the structure was solved successfully in all cases. The structure refinement was comparable for all beam energies with small deficiencies such as negative atomic displacements for the heaviest atom in the structure, barium. Including extinction correction in the refinement noticeably improved the model for low acceleration voltages, probably due to higher beam absorption in these cases. Dynamical refinement, however, shows superior results for higher acceleration voltages, since the dynamical refinement calculations currently ignore inelastic scattering effects.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":"266 ","pages":"Article 114022"},"PeriodicalIF":2.1,"publicationDate":"2024-08-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141997404","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-08-02DOI: 10.1016/j.ultramic.2024.114023
Romy Poppe, Joke Hadermann
The diffraction patterns of crystalline materials with local order contain sharp Bragg reflections as well as highly structured diffuse scattering. In this study, we quantitatively show how the diffuse scattering in three-dimensional electron diffraction (3D ED) data is influenced by various parameters, including the data acquisition mode, the detector type and the use of an energy filter. We found that diffuse scattering data used for quantitative analysis are preferably acquired in selected area electron diffraction (SAED) mode using a CCD and an energy filter. In this study, we also show that the diffuse scattering in 3D ED data can be obtained with a quality comparable to that from single-crystal X-ray diffraction. As electron diffraction requires much smaller crystal sizes than X-ray diffraction, this opens up the possibility to investigate the local structure of many technologically relevant materials for which no crystals large enough for single-crystal X-ray diffraction are available.
具有局部有序性的晶体材料的衍射图样包含尖锐的布拉格反射以及高度结构化的漫散射。在本研究中,我们定量展示了三维电子衍射(3D ED)数据中的漫散射如何受到各种参数的影响,包括数据采集模式、探测器类型和能量滤波器的使用。我们发现,用于定量分析的漫散射数据最好使用 CCD 和能量滤波器在选区电子衍射(SAED)模式下获取。在这项研究中,我们还发现三维电子衍射数据中的漫散射数据质量可与单晶 X 射线衍射数据相媲美。由于电子衍射所需的晶体尺寸比 X 射线衍射小得多,这就为研究许多技术相关材料的局部结构提供了可能,因为这些材料没有足够大的晶体来进行单晶 X 射线衍射。
{"title":"Optimization of three-dimensional electron diffuse scattering data acquisition","authors":"Romy Poppe, Joke Hadermann","doi":"10.1016/j.ultramic.2024.114023","DOIUrl":"10.1016/j.ultramic.2024.114023","url":null,"abstract":"<div><p>The diffraction patterns of crystalline materials with local order contain sharp Bragg reflections as well as highly structured diffuse scattering. In this study, we quantitatively show how the diffuse scattering in three-dimensional electron diffraction (3D ED) data is influenced by various parameters, including the data acquisition mode, the detector type and the use of an energy filter. We found that diffuse scattering data used for quantitative analysis are preferably acquired in selected area electron diffraction (SAED) mode using a CCD and an energy filter. In this study, we also show that the diffuse scattering in 3D ED data can be obtained with a quality comparable to that from single-crystal X-ray diffraction. As electron diffraction requires much smaller crystal sizes than X-ray diffraction, this opens up the possibility to investigate the local structure of many technologically relevant materials for which no crystals large enough for single-crystal X-ray diffraction are available.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":"265 ","pages":"Article 114023"},"PeriodicalIF":2.1,"publicationDate":"2024-08-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141914131","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-07-25DOI: 10.1016/j.ultramic.2024.114019
Stefan Manuel Noisternig , Christian Rentenberger , Christoph Gammer , H. Peter Karnthaler , Jani Kotakoski
Beside its main purpose as a high-end tool in material analysis reaching the atomic scale for structure, chemical and electronic properties, aberration-corrected scanning transmission electron microscopy (STEM) is increasingly used as a tool to manipulate materials down to that very same scale. In order to obtain exact and reproducible results, it is essential to consider the interaction processes and interaction ranges between the electron beam and the involved materials. Here, we show in situ that electron beam-induced etching in a low-pressure oxygen atmosphere can extend up to a distance of several nm away from the Ångström-size electron beam, usually used for probing the sample. This relatively long-range interaction is related to beam tails and inelastic scattering involved in the etching process. To suppress the influence of surface diffusion, we measure the etching effect indirectly on isolated nm-sized holes in a 2 nm thin amorphous carbon foil that is commonly used as sample support in STEM. During our experiments, the electron beam is placed inside the nanoholes so that most electrons cannot directly participate in the etching process. We characterize the etching process from measuring etching rates at multiple nanoholes with different distances between the hole edge and the electron beam.
{"title":"Probing the interaction range of electron beam-induced etching in STEM by a non-contact electron beam","authors":"Stefan Manuel Noisternig , Christian Rentenberger , Christoph Gammer , H. Peter Karnthaler , Jani Kotakoski","doi":"10.1016/j.ultramic.2024.114019","DOIUrl":"10.1016/j.ultramic.2024.114019","url":null,"abstract":"<div><p>Beside its main purpose as a high-end tool in material analysis reaching the atomic scale for structure, chemical and electronic properties, aberration-corrected scanning transmission electron microscopy (STEM) is increasingly used as a tool to manipulate materials down to that very same scale. In order to obtain exact and reproducible results, it is essential to consider the interaction processes and interaction ranges between the electron beam and the involved materials. Here, we show in situ that electron beam-induced etching in a low-pressure oxygen atmosphere can extend up to a distance of several nm away from the Ångström-size electron beam, usually used for probing the sample. This relatively long-range interaction is related to beam tails and inelastic scattering involved in the etching process. To suppress the influence of surface diffusion, we measure the etching effect indirectly on isolated nm-sized holes in a 2 nm thin amorphous carbon foil that is commonly used as sample support in STEM. During our experiments, the electron beam is placed inside the nanoholes so that most electrons cannot directly participate in the etching process. We characterize the etching process from measuring etching rates at multiple nanoholes with different distances between the hole edge and the electron beam.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":"265 ","pages":"Article 114019"},"PeriodicalIF":2.1,"publicationDate":"2024-07-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S0304399124000986/pdfft?md5=485b4dbb0b43d77ef1652630b9d48731&pid=1-s2.0-S0304399124000986-main.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141847185","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-07-22DOI: 10.1016/j.ultramic.2024.114009
Anup Sharma , Shuo Zhang , Jing Fu , Deepak Marla
Laser micromachining can serve as a coarse machining step during sample preparation for high-resolution characterization methods leading to swift sample preparation. However, selecting the right laser parameters is crucial to minimize the heat-affected zone, which can potentially compromise the microstructure of the specimen. This study focuses on evaluating the size of heat-affected zone in laser annular milling, aiming to ascertain a minimal scan diameter that safeguards the inner region of micropillars against thermal damage. A computational model based on the finite element method was utilized to simulate the laser heating process. To validate the simulation results, a picosecond pulsed laser is then used to machine the micropillars of Al and Si. The laser-machined samples were subjected to surface and microstructural analysis using Scanning Electron Microscope (SEM) and Electron Backscatter Diffraction (EBSD) scans. The length of heat affected zone obtained from simulations was approximately 6 m for silicon and 12 m for aluminum. The diameter of micropillars formed with laser machining was 10 m for silicon 26 m for aluminum. The core of the pillars was preserved with less than one degree of microstructural misorientations making it suitable for further processing for preparing specimens for techniques like APT and TEM. For silicon micropillars, the preserved central region has a diameter of 6 m and for aluminum its around 20–24 m. Additionally, the study determines the minimum scan diameter that can be achieved using the given laser machining setup across a range of common materials.
{"title":"Investigation of thermal effects of laser micromachining for APT and TEM specimen preparation: A modeling and experimental study","authors":"Anup Sharma , Shuo Zhang , Jing Fu , Deepak Marla","doi":"10.1016/j.ultramic.2024.114009","DOIUrl":"10.1016/j.ultramic.2024.114009","url":null,"abstract":"<div><p>Laser micromachining can serve as a coarse machining step during sample preparation for high-resolution characterization methods leading to swift sample preparation. However, selecting the right laser parameters is crucial to minimize the heat-affected zone, which can potentially compromise the microstructure of the specimen. This study focuses on evaluating the size of heat-affected zone in laser annular milling, aiming to ascertain a minimal scan diameter that safeguards the inner region of micropillars against thermal damage. A computational model based on the finite element method was utilized to simulate the laser heating process. To validate the simulation results, a picosecond pulsed laser is then used to machine the micropillars of Al and Si. The laser-machined samples were subjected to surface and microstructural analysis using Scanning Electron Microscope (SEM) and Electron Backscatter Diffraction (EBSD) scans. The length of heat affected zone obtained from simulations was approximately 6 <span><math><mi>μ</mi></math></span>m for silicon and 12 <span><math><mi>μ</mi></math></span>m for aluminum. The diameter of micropillars formed with laser machining was 10 <span><math><mi>μ</mi></math></span>m for silicon 26 <span><math><mi>μ</mi></math></span>m for aluminum. The core of the pillars was preserved with less than one degree of microstructural misorientations making it suitable for further processing for preparing specimens for techniques like APT and TEM. For silicon micropillars, the preserved central region has a diameter of 6 <span><math><mi>μ</mi></math></span>m and for aluminum its around 20–24 <span><math><mi>μ</mi></math></span>m. Additionally, the study determines the minimum scan diameter that can be achieved using the given laser machining setup across a range of common materials.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":"265 ","pages":"Article 114009"},"PeriodicalIF":2.1,"publicationDate":"2024-07-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141736710","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-07-20DOI: 10.1016/j.ultramic.2024.114020
Christoph Mahr , Jakob Stahl , Beeke Gerken , Florian F. Krause , Marco Schowalter , Tim Grieb , Lutz Mädler , Andreas Rosenauer
Structural and chemical characterization of nanomaterials provides important information for understanding their functional properties. Nanomaterials with characteristic structure sizes in the nanometer range can be characterized by scanning transmission electron microscopy (STEM). In conventional STEM, two-dimensional (2D) projection images of the samples are acquired, information about the third dimension is lost. This drawback can be overcome by STEM tomography, where the three-dimensional (3D) structure is reconstructed from a series of projection images acquired using various projection directions. However, 3D measurements are expensive with respect to acquisition and evaluation time. Furthermore, the method is hardly applicable to beam-sensitive materials, i.e. samples that degrade under the electron beam. For this reason, it is desirable to know whether sufficient information on structural and chemical information can be extracted from 2D-projection measurements. In the present work, a comparison between 3D-reconstruction and 2D-projection characterization of structure and mixing in nanoparticle hetero-aggregates is provided. To this end, convolutional neural networks are trained in 2D and 3D to extract particle positions and material types from the simulated or experimental measurement. Results are used to evaluate structure, particle size distributions, hetero-aggregate compositions and mixing of particles quantitatively and to find an answer to the question, whether an expensive 3D characterization is required for this material system for future characterizations.
{"title":"Characterization of structure and mixing in nanoparticle hetero-aggregates using convolutional neural networks: 3D-reconstruction versus 2D-projection","authors":"Christoph Mahr , Jakob Stahl , Beeke Gerken , Florian F. Krause , Marco Schowalter , Tim Grieb , Lutz Mädler , Andreas Rosenauer","doi":"10.1016/j.ultramic.2024.114020","DOIUrl":"10.1016/j.ultramic.2024.114020","url":null,"abstract":"<div><p>Structural and chemical characterization of nanomaterials provides important information for understanding their functional properties. Nanomaterials with characteristic structure sizes in the nanometer range can be characterized by scanning transmission electron microscopy (STEM). In conventional STEM, two-dimensional (2D) projection images of the samples are acquired, information about the third dimension is lost. This drawback can be overcome by STEM tomography, where the three-dimensional (3D) structure is reconstructed from a series of projection images acquired using various projection directions. However, 3D measurements are expensive with respect to acquisition and evaluation time. Furthermore, the method is hardly applicable to beam-sensitive materials, i.e. samples that degrade under the electron beam. For this reason, it is desirable to know whether sufficient information on structural and chemical information can be extracted from 2D-projection measurements. In the present work, a comparison between 3D-reconstruction and 2D-projection characterization of structure and mixing in nanoparticle hetero-aggregates is provided. To this end, convolutional neural networks are trained in 2D and 3D to extract particle positions and material types from the simulated or experimental measurement. Results are used to evaluate structure, particle size distributions, hetero-aggregate compositions and mixing of particles quantitatively and to find an answer to the question, whether an expensive 3D characterization is required for this material system for future characterizations.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":"265 ","pages":"Article 114020"},"PeriodicalIF":2.1,"publicationDate":"2024-07-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S0304399124000998/pdfft?md5=f158e30e11578d894c5ad319e0ff62f4&pid=1-s2.0-S0304399124000998-main.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141851250","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-07-08DOI: 10.1016/j.ultramic.2024.114008
Abinash Kumar , Elizaveta Tiukalova , Kartik Venkatraman, Andrew Lupini, Jordan A. Hachtel, Miaofang Chi
Cryogenic Scanning/Transmission Electron Microscopy has been established as a leading method to image sensitive biological samples and is now becoming a powerful tool to understand materials' behavior at low temperatures. However, achieving precise local temperature calibration at low temperatures remains a challenge, which is especially crucial for studying phase transitions and emergent physical properties in quantum materials. In this study, we employ electron energy loss spectroscopy (EELS) to measure local cryogenic specimen temperatures. We use the temperature-dependent characteristics of aluminum's bulk plasmon peak in EEL spectra, which shifts due to changes in electron density caused by thermal expansion and contraction. We successfully demonstrate the versatility of this method by calibrating different liquid nitrogen cooling holders in various microscopes, regardless of whether a monochromated or non-monochromated electron beam is used. Temperature discrepancies between the actual temperature and the setpoint temperatures are identified across a range from room temperature to 100 K. This work demonstrates the importance of temperature calibrations at intermediate temperatures and presents a straightforward, robust method for calibrating local temperatures of cryogenically-cooled specimens in electron microscopes.
低温扫描/透射电子显微镜已成为对敏感生物样品进行成像的主要方法,现在正成为了解材料低温行为的有力工具。然而,在低温下实现精确的局部温度校准仍然是一项挑战,这对于研究量子材料的相变和新出现的物理性质尤为重要。在本研究中,我们采用电子能量损失光谱(EELS)来测量局部低温试样温度。我们利用 EEL 光谱中铝的体等离子体峰随温度变化的特性,该特性会因热膨胀和收缩引起的电子密度变化而移动。通过校准各种显微镜中的不同液氮冷却支架,我们成功证明了这种方法的通用性,无论使用的是单色还是非单色电子束。这项工作证明了在中间温度下进行温度校准的重要性,并提出了校准电子显微镜中低温冷却试样局部温度的简单、可靠的方法。
{"title":"Calibrating cryogenic temperature of TEM specimens using EELS","authors":"Abinash Kumar , Elizaveta Tiukalova , Kartik Venkatraman, Andrew Lupini, Jordan A. Hachtel, Miaofang Chi","doi":"10.1016/j.ultramic.2024.114008","DOIUrl":"10.1016/j.ultramic.2024.114008","url":null,"abstract":"<div><p>Cryogenic Scanning/Transmission Electron Microscopy has been established as a leading method to image sensitive biological samples and is now becoming a powerful tool to understand materials' behavior at low temperatures. However, achieving precise local temperature calibration at low temperatures remains a challenge, which is especially crucial for studying phase transitions and emergent physical properties in quantum materials. In this study, we employ electron energy loss spectroscopy (EELS) to measure local cryogenic specimen temperatures. We use the temperature-dependent characteristics of aluminum's bulk plasmon peak in EEL spectra, which shifts due to changes in electron density caused by thermal expansion and contraction. We successfully demonstrate the versatility of this method by calibrating different liquid nitrogen cooling holders in various microscopes, regardless of whether a monochromated or non-monochromated electron beam is used. Temperature discrepancies between the actual temperature and the setpoint temperatures are identified across a range from room temperature to 100 K. This work demonstrates the importance of temperature calibrations at intermediate temperatures and presents a straightforward, robust method for calibrating local temperatures of cryogenically-cooled specimens in electron microscopes.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":"265 ","pages":"Article 114008"},"PeriodicalIF":2.1,"publicationDate":"2024-07-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141701765","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}