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Theoretical study on the effect of temperature gradient on contact-free scanning for scanning ion conductance microscopy 关于温度梯度对扫描离子电导显微镜非接触扫描影响的理论研究
IF 2.1 3区 工程技术 Q2 MICROSCOPY Pub Date : 2024-09-14 DOI: 10.1016/j.ultramic.2024.114054

Scanning ion-conductance microscopy (SICM) is a non-contact, high-resolution, and in-situ scanning probe microscope technique, it can be operated in probing the physical and chemical properties of biological samples such as living cells. Recently, using SICM to study the effects of microenvironment changes such as temperature changes on response of the biological samples has attracted significant attention. However, in this temperature gradient condition, one of the crucial but still unclear issues is the scanning feedback types and safe threshold. In this paper, a theoretical study of effect of the temperature gradient in electrolyte or sample surface on the SICM safe ion-current threshold is conducted using three-dimensional Poisson-Nernst-Planck, Navier-Stokes and energy equations. Two temperature gradient types, sample surface and two types of pipettes with different ratio of inner and outer radii are included, respectively. The results demonstrate that the local temperature of the electrolyte and then sample surface significantly affect the ion flow, shape of the approach curves and thus safe threshold in SICM pipette probe for contact-free scanning. There is a current-increased and decreased phases for approaching the surface with higher temperature and two current-decreased phases for surface with lower temperature. Based on this shape feature of approach curves, the change rate of current is analysis to illustrate the possibility for contact-free scanning of slope object. The results indicate that with the decrease of the normalized tip-surface distance, the coupling effect of large slope angle and local high temperature makes the increase in change rate of ion current not significant and then it challenging to realize contact-free scanning especially for higher surface temperature.

扫描离子导电显微镜(SICM)是一种非接触、高分辨率、原位扫描探针显微镜技术,可用于探测活细胞等生物样品的物理和化学特性。近来,利用 SICM 研究微环境变化(如温度变化)对生物样本响应的影响已引起广泛关注。然而,在这种温度梯度条件下,扫描反馈类型和安全阈值是一个关键但仍不明确的问题。本文利用三维泊松-奈恩斯特-普朗克方程、纳维-斯托克斯方程和能量方程,对电解液或样品表面的温度梯度对 SICM 安全离子电流阈值的影响进行了理论研究。分别包括两种温度梯度类型、样品表面和两种内外半径比不同的移液管。结果表明,电解质和样品表面的局部温度会显著影响离子流、接近曲线的形状,进而影响 SICM 移液管探针进行非接触扫描的安全阈值。在接近温度较高的表面时,会出现一个电流增加和减少阶段,而在接近温度较低的表面时,会出现两个电流减少阶段。根据接近曲线的形状特征,分析了电流的变化率,以说明对斜面物体进行非接触扫描的可能性。结果表明,随着归一化针尖-表面距离的减小,大斜角和局部高温的耦合效应使得离子电流变化率的增加并不显著,因此实现无接触扫描具有挑战性,尤其是在表面温度较高的情况下。
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引用次数: 0
Maximizing the notional area in single tip field emitters 最大化单尖端场发射器的名义面积
IF 2.1 3区 工程技术 Q2 MICROSCOPY Pub Date : 2024-09-13 DOI: 10.1016/j.ultramic.2024.114049

One of the critical aspects in advancing high-brightness field emitter devices is determining the conditions under which single-tip emitters should be constructed to optimize their emission area. Recent experiments have explored varying the axis ratio ξ of the cap of a single-tip emitter, ranging from an oblate semi-spheroid to a prolate shape, mounted on a nearly cylindrical conducting body. In this work, we present a strategy, based on high-accuracy computer simulations using the finite element technique, to maximize the emission area of those single-tip emitters. Importantly, our findings indicate that the notional emission area achieves its maximum when the emitter’s cap is adjusted to an oblate semi-spheroid with a characteristic axis ratio ξC0.85. We do a comparison of notional emission area as a function of ξ for an ellipsoidal emitter on a post and compare these results from other emitter configurations, which are feasible to fabricate.

推动高亮度场发射器设备发展的关键之一是确定单尖端发射器的构造条件,以优化其发射区域。最近的实验探索了改变安装在近似圆柱形导电体上的单尖发射器帽的轴比ξ,从扁球形半球形到长球形不等。在这项工作中,我们利用有限元技术,在高精度计算机模拟的基础上提出了一种策略,以最大限度地扩大这些单尖端发射器的发射面积。重要的是,我们的研究结果表明,当发射器的帽被调整为特征轴比ξC≈0.85的扁球形半球体时,名义发射面积达到最大。我们比较了立柱上椭圆形发射器的名义发射面积与 ξ 的函数关系,并将这些结果与其他可行的发射器配置进行了比较。
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引用次数: 0
Atomic resolution scanning transmission electron microscopy at liquid helium temperatures for quantum materials 液氦温度下用于量子材料的原子分辨率扫描透射电子显微镜
IF 2.1 3区 工程技术 Q2 MICROSCOPY Pub Date : 2024-09-07 DOI: 10.1016/j.ultramic.2024.114039

Fundamental quantum phenomena in condensed matter, ranging from correlated electron systems to quantum information processors, manifest their emergent characteristics and behaviors predominantly at low temperatures. This necessitates the use of liquid helium (LHe) cooling for experimental observation. Atomic resolution scanning transmission electron microscopy combined with LHe cooling (cryo-STEM) provides a powerful characterization technique to probe local atomic structural modulations and their coupling with charge, spin and orbital degrees-of-freedom in quantum materials. However, achieving atomic resolution in cryo-STEM is exceptionally challenging, primarily due to sample drifts arising from temperature changes and noises associated with LHe bubbling, turbulent gas flow, etc. In this work, we demonstrate atomic resolution cryo-STEM imaging at LHe temperatures using a commercial side-entry LHe cooling holder. Firstly, we examine STEM imaging performance as a function of He gas flow rate, identifying two primary noise sources: He-gas pulsing and He-gas bubbling. Secondly, we propose two strategies to achieve low noise conditions for atomic resolution STEM imaging: either by temporarily suppressing He gas flow rate using the needle valve or by acquiring images during the natural warming process. Lastly, we show the applications of image acquisition methods and image processing techniques in investigating structural phase transitions in Cr2Ge2Te6, CuIr2S4, and CrCl3. Our findings represent an advance in the field of atomic resolution electron microscopy imaging for quantum materials and devices at LHe temperatures, which can be applied to other commercial side-entry LHe cooling TEM holders.

凝聚态物质中的基本量子现象,从相关电子系统到量子信息处理器,主要在低温下表现出它们的突发性特征和行为。这就需要使用液氦(LHe)冷却进行实验观察。结合液氦冷却的原子分辨率扫描透射电子显微镜(低温扫描透射电子显微镜)提供了一种强大的表征技术,用于探测量子材料中的局部原子结构调制及其与电荷、自旋和轨道自由度的耦合。然而,要在低温-STEM 中实现原子分辨率却极具挑战性,这主要是由于温度变化引起的样品漂移以及与低温气泡、湍流气流等相关的噪音。在这项工作中,我们使用商用侧入式 LHe 冷却支架演示了 LHe 温度下的原子分辨率低温 STEM 成像。首先,我们研究了 STEM 成像性能与 He 气体流速的函数关系,确定了两个主要噪声源:氦气脉冲和氦气冒泡。其次,我们提出了实现原子分辨率 STEM 成像低噪声条件的两种策略:利用针阀暂时抑制氦气流速或在自然升温过程中获取图像。最后,我们展示了图像采集方法和图像处理技术在研究 Cr2Ge2Te6、CuIr2S4 和 CrCl3 结构相变中的应用。我们的研究成果代表了在 LHe 温度下对量子材料和器件进行原子分辨率电子显微镜成像领域的进步,可应用于其他商用侧入式 LHe 冷却 TEM 架。
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引用次数: 0
Development of a liquid-helium free cryogenic sample holder with mK temperature control for autonomous electron microscopy. 开发用于自主电子显微镜的 mK 温度控制无液氦低温样品支架。
IF 2.1 3区 工程技术 Q2 MICROSCOPY Pub Date : 2024-09-07 DOI: 10.1016/j.ultramic.2024.114037
X He, R Kostin, E Knight, M G Han, J Mun, I Bozovic, C Jing, Y Zhu

The automated and autonomous cryogenic transmission electron microscopy (Cryo-EM) demands a sample holder capable of maintaining temperatures below 10 K with precise control, long holding times, and minimal helium use. Rising to this challenge, we initiated an ambitious project to develop a novel closed-cycle cryocooler-based cryogenic sample holder that operates without the use of liquid helium and the consumption of gaseous helium. This article presents the design, construction, and experimental testing of the initial prototype, which achieves an ultimate temperature of 5.6 K with exceptional stability close to 1mK, while providing a wide temperature control range from 295 K to 5.6 K, marking a clear advancement in cryo-EM holder development. While the prototype was not designed for atomic resolution imaging and thus lacks a sturdy support system to mitigate mechanical vibrations from the cryocooler's pulsed tube, this innovative approach successfully demonstrates proof of concept. It offers unprecedented capabilities for state-of-the-art cryogenic microscopy and microanalysis in materials and biological sciences.

自动和自主低温透射电子显微镜(Cryo-EM)要求样品架能够保持 10 K 以下的温度,并且能够精确控制、保持时间长、氦气用量少。为了应对这一挑战,我们启动了一个雄心勃勃的项目,开发一种基于闭合循环低温冷却器的新型低温样品架,该样品架无需使用液氦和消耗气态氦。这篇文章介绍了最初原型的设计、建造和实验测试,它的极限温度达到了 5.6 K,稳定性接近 1mK,同时提供了从 295 K 到 5.6 K 的宽温度控制范围,标志着低温电子显微镜支架开发的明显进步。虽然原型并非为原子分辨率成像而设计,因此缺乏一个坚固的支撑系统来减轻低温冷却器脉冲管产生的机械振动,但这种创新方法成功地证明了概念。它为材料和生物科学领域最先进的低温显微镜和显微分析提供了前所未有的能力。
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引用次数: 0
Determination of five-parameter grain boundary characteristics in nanocrystalline Ni-W by scanning precession electron diffraction tomography 利用扫描前驱电子衍射层析技术测定纳米晶 Ni-W 中的五参数晶界特征
IF 2.1 3区 工程技术 Q2 MICROSCOPY Pub Date : 2024-09-06 DOI: 10.1016/j.ultramic.2024.114038

Determining the full five-parameter grain boundary characteristics from experiments is essential for understanding grain boundaries impact on material properties, improving related models, and designing advanced alloys. However, achieving this is generally challenging, in particular at nanoscale, due to their 3D nature. In our study, we successfully determined the grain boundary characteristics of an annealed nickel-tungsten alloy (NiW) nanocrystalline needle-shaped specimen (tip) containing twins using Scanning Precession Electron Diffraction (SPED) Tomography. The presence of annealing twins in this face-centered cubic (fcc) material gives rise to common reflections in the SPED diffraction patterns, which challenges the reconstruction of orientation-specific virtual dark field (VDF) images required for tomographic reconstruction of the 3D grain shapes. To address this, an automated post-processing step identifies and deselects these shared reflections prior to the reconstruction of the VDF images. Combined with appropriate intensity normalization and projection alignment procedures, this approach enables high-fidelity 3D reconstruction of the individual grains contained in the needle-shaped sample volume. To probe the accuracy of the resulting boundary characteristics, the twin boundary surface normal directions were extracted from the 3D voxelated grain boundary map using a 3D Hough transform. For the sub-set of coherent Σ3 boundaries, the expected {111} grain boundary plane normals were obtained with an angular error of <3° for boundary sizes down to 400 nm². This work advances our ability to precisely characterize and understand the complex grain boundaries that govern material properties.

从实验中确定完整的五参数晶界特性对于了解晶界对材料特性的影响、改进相关模型和设计先进合金至关重要。然而,由于晶界的三维性质,实现这一目标通常具有挑战性,尤其是在纳米尺度上。在我们的研究中,我们利用扫描前序电子衍射 (SPED) 层析技术成功测定了含有孪晶的退火镍钨合金(NiW)纳米晶针状试样(尖端)的晶界特征。这种面心立方(fcc)材料中存在退火孪晶,导致 SPED 衍射图样中出现共同反射,这给重建三维晶粒形状断层扫描所需的特定取向虚拟暗场(VDF)图像带来了挑战。为了解决这个问题,在重建 VDF 图像之前,一个自动化的后处理步骤会识别并取消选择这些共用反射。结合适当的强度归一化和投影对齐程序,这种方法能够高保真地重建针形样品体积中包含的单个晶粒的三维图像。为了探测所得到的边界特征的准确性,使用三维 Hough 变换从三维体素化晶粒边界图中提取了孪生边界表面法线方向。对于相干 Σ3 边界子集,获得了预期的{111}晶粒边界平面法线,其角度误差为 <3°,边界尺寸小至 400 nm²。这项工作提高了我们精确表征和理解影响材料特性的复杂晶界的能力。
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引用次数: 0
Clustering characteristic diffraction vectors in 4-D STEM data sets from overlapping structures in nanocrystalline and amorphous materials 从纳米晶体和非晶体材料的重叠结构中对 4-D STEM 数据集中的特征衍射矢量进行聚类
IF 2.1 3区 工程技术 Q2 MICROSCOPY Pub Date : 2024-09-03 DOI: 10.1016/j.ultramic.2024.114040

We describe a method for identifying and clustering diffraction vectors in four-dimensional (4-D) scanning transmission electron microscopy data to determine characteristic diffraction patterns from overlapping structures in projection. First, the data is convolved with a 4-D kernel, then diffraction vectors are identified and clustered using both density-based clustering and a metric that emphasizes rotational symmetries. The method works well for both crystalline and amorphous samples and in high- and low-dose experiments. A simulated dataset of overlapping aluminum nanocrystals provides performance metrics as a function of Poisson noise and the number of overlapping structures. Experimental data from an aluminum nanocrystal sample shows similar performance. For an amorphous Pd77.5Cu6Si16.5 thin film, experiments measuring glassy structure show strong evidence of 4- and 6-fold symmetry structures. A significant background arises from the diffraction of overlapping structures. Quantifying this background helps to separate contributions from single, rotationally symmetric structures vs. apparent symmetries arising from overlapping structures in projection.

我们介绍了一种在四维(4-D)扫描透射电子显微镜数据中识别和聚类衍射向量的方法,以确定投影重叠结构的特征衍射模式。首先,用四维核对数据进行卷积,然后使用基于密度的聚类和一种强调旋转对称性的度量来识别和聚类衍射向量。该方法在晶体和非晶体样品以及高剂量和低剂量实验中都能很好地发挥作用。重叠纳米铝晶体的模拟数据集提供了与泊松噪声和重叠结构数量相关的性能指标。铝纳米晶体样品的实验数据也显示了类似的性能。对于无定形 Pd77.5Cu6Si16.5 薄膜,测量玻璃状结构的实验显示了 4 倍和 6 倍对称结构的有力证据。重叠结构的衍射产生了大量背景。量化这种背景有助于区分单一旋转对称结构与投影重叠结构产生的表观对称性。
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引用次数: 0
Differential phase contrast from electrons that cause inner shell ionization 引起内壳电离的电子产生的差分相位对比
IF 2.1 3区 工程技术 Q2 MICROSCOPY Pub Date : 2024-08-26 DOI: 10.1016/j.ultramic.2024.114036

Differential Phase Contrast (DPC) imaging, in which deviations in the bright field beam are in proportion to the electric field, has been extensively studied in the context of pure elastic scattering. Here we discuss differential phase contrast formed from core-loss scattered electrons, i.e. those that have caused inner shell ionization of atoms in the specimen, using a transition potential approach for which we study the number of final states needed for a converged calculation. In the phase object approximation, we show formally that differential phase contrast formed from core-loss scattered electrons is mainly a result of preservation of elastic contrast. Through simulation we demonstrate that whether the inelastic DPC images show element selective contrast depends on the spatial range of the ionization interaction, and specifically that when the energy loss is low the delocalisation can lead to contributions to the contrast from atoms other than that ionized. We further show that inelastic DPC images remain robustly interpretable to larger thicknesses than is the case for elastic DPC images, owing to the incoherence of the inelastic wavefields, though subtleties due to channelling remain. Lastly, we show that while a very high dose will be needed for sufficient counting statistics to discern differential phase contrast from core-loss scattered electrons, there is some enhancement of the signal-to-noise ratio with thickness that makes inelastic DPC imaging more achievable for thicker samples.

差分相位对比(Differential Phase Contrast,DPC)成像是指明场光束的偏差与电场成正比,在纯弹性散射的背景下已被广泛研究。在这里,我们讨论了由核心损耗散射电子形成的差分相位对比,即那些引起试样中原子内壳电离的电子,我们使用过渡势方法研究了收敛计算所需的最终状态数量。在相位对象近似中,我们正式证明了核心损耗散射电子形成的差分相位对比主要是弹性对比保留的结果。通过模拟,我们证明了非弹性 DPC 图像是否显示元素选择性对比取决于电离相互作用的空间范围,特别是当能量损耗较低时,脱域会导致电离原子以外的原子对对比的贡献。我们进一步表明,与弹性 DPC 图像相比,由于非弹性波场的不一致性,非弹性 DPC 图像在更大的厚度上仍可保持稳健的可解释性,尽管由于导流而产生的微妙之处依然存在。最后,我们还表明,虽然需要很高的剂量才能获得足够的计数统计量来辨别核心损耗散射电子的不同相位对比,但随着厚度的增加,信噪比也会有所提高,这使得非弹性 DPC 成像更适用于较厚的样品。
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引用次数: 0
Differential phase contrast STEM image calculation software – Magnifier 差分相衬 STEM 图像计算软件 - 放大镜
IF 2.1 3区 工程技术 Q2 MICROSCOPY Pub Date : 2024-08-22 DOI: 10.1016/j.ultramic.2024.114035

An innovative software with a user-friendly interface for calculation of differential phase contrast (DPC) scanning transmission electron microscopy images (integrated iDPC- and differentiated dDPC-STEM) is presented. The underlying algorithm is described and the program functionalities are demonstrated on the examples of Li5OsO6, α-Ga2O3, and LiCoO2. The software supports interpretation of DPC-STEM images, which is crucial for qualitative and quantitative analysis of crystal structures and defects.

本文介绍了一种创新软件,该软件具有友好的用户界面,可用于计算微分相衬(DPC)扫描透射电子显微镜图像(集成 iDPC- 和微分 dDPC-STEM)。该软件描述了基本算法,并以 Li5OsO6、α-Ga2O3 和 LiCoO2 为例演示了程序功能。该软件支持对 DPC-STEM 图像的解读,这对晶体结构和缺陷的定性和定量分析至关重要。
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引用次数: 0
The impact of electric field strength on the accuracy of boron dopant quantification in silicon using atom probe tomography 电场强度对利用原子探针层析成像技术量化硅中硼掺杂物精度的影响
IF 2.1 3区 工程技术 Q2 MICROSCOPY Pub Date : 2024-08-21 DOI: 10.1016/j.ultramic.2024.114034

This study investigates the impact of the surface electric field on the quantification accuracy of boron (B) implanted silicon (Si) using atom probe tomography (APT). The Si Charge-State Ratio (CSR(Si) = Si2+/Si+) was used as an indirect measure of the average apex electric field during analysis. For a range of electric fields, the accuracy of the total implanted dose and the depth profile shape determined by APT was evaluated against the National Institute of Standards and Technology Standard Reference Material 2137. The radial (non-)uniformity of the detected B was also examined. At a higher surface electric field (i.e., a greater CSR(Si)), the determined B dose converges on the certified dose. Additionally, the depth profile shape tends towards that derived by secondary ion mass spectrometry. This improvement coincides with a more uniform radial B distribution, evidenced by desorption maps. In contrast, for lower surface electric fields (i.e., a lower CSR(Si)), the B dose is significantly underestimated, and the depth profile is artificially stretched. The desorption maps also indicate a highly inhomogeneous B emission localized around the center of the detector, which is believed to be an artifact of B surface migration on the tip of the sample. For the purposes of routine investigations of semiconductor devices using APT, these results illustrate the potential origin of quantification artifacts and their severity at different operating conditions, thus providing pathways towards best practices for accurate and repeatable measurements.

本研究利用原子探针断层扫描(APT)技术研究了表面电场对硼(B)植入硅(Si)量化精度的影响。在分析过程中,硅电荷态比(CSR(Si) = Si2+/Si+)被用来间接测量平均顶点电场。对于一定范围的电场,通过 APT 确定的总植入剂量和深度剖面形状的准确性与美国国家标准与技术研究院标准参考材料 2137 进行了对比评估。此外,还检测了检测到的 B 的径向(非)均匀性。在较高的表面电场(即较大的 CSR(Si))下,测定的 B 剂量与认证剂量趋同。此外,深度剖面的形状也趋向于二次离子质谱法得出的形状。这一改进与解吸图显示的更均匀的辐射 B 分布相吻合。相反,对于较低的表面电场(即较低的 CSR(Si)),B 剂量被明显低估,深度剖面被人为拉伸。解吸图还显示,探测器中心周围的 B 发射极不均匀,据信这是 B 在样品顶端表面迁移的假象。就使用 APT 对半导体器件进行常规研究而言,这些结果说明了量化伪影的潜在来源及其在不同操作条件下的严重程度,从而为实现准确、可重复测量的最佳实践提供了途径。
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引用次数: 0
Design of electrostatic lenses through genetic algorithm and particle swarm optimisation methods integrated with differential algebra 通过与微分代数相结合的遗传算法和粒子群优化方法设计静电透镜
IF 2.1 3区 工程技术 Q2 MICROSCOPY Pub Date : 2024-08-15 DOI: 10.1016/j.ultramic.2024.114024

Genetic algorithm (GA) and particle swarm optimisation (PSO) techniques have been integrated with the differential algebra (DA) method in charged particle optics to optimise an Einzel lens. The DA method is a robust and efficient tool for the calculation of aberration coefficients of electrostatic lenses, which makes use of nonstandard analysis for ray tracing a particle as it is subjected to the field generated by a lens. In this study, initial populations of lenses with random geometrical configurations are generated. These initial populations are then subjected to GA and PSO algorithms to alter the geometry of each lens for a set number of iterations. The lens performance is evaluated by calculating the spot size using the aberrations coefficients up to third-order generated by the DA method. Moreover, a focusing column comprising two lenses and a Wien filter was optimised using GA method.

遗传算法(GA)和粒子群优化(PSO)技术与带电粒子光学中的微分代数(DA)方法相结合,对艾因泽尔透镜进行了优化。DA 方法是计算静电透镜像差系数的一种稳健而高效的工具,它利用非标准分析方法对粒子在透镜产生的场中进行射线追踪。在这项研究中,生成了具有随机几何配置的透镜初始群。然后对这些初始种群采用 GA 和 PSO 算法,在设定的迭代次数内改变每个透镜的几何形状。通过使用 DA 方法生成的三阶以下像差系数计算光斑大小,对透镜性能进行评估。此外,还使用 GA 方法优化了由两个透镜和一个维恩滤波器组成的聚焦柱。
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引用次数: 0
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Ultramicroscopy
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